JP3842468B2 - Probe cleaning method and apparatus - Google Patents

Probe cleaning method and apparatus Download PDF

Info

Publication number
JP3842468B2
JP3842468B2 JP34871398A JP34871398A JP3842468B2 JP 3842468 B2 JP3842468 B2 JP 3842468B2 JP 34871398 A JP34871398 A JP 34871398A JP 34871398 A JP34871398 A JP 34871398A JP 3842468 B2 JP3842468 B2 JP 3842468B2
Authority
JP
Japan
Prior art keywords
probe
tip
air
cleaning
cleaning device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP34871398A
Other languages
Japanese (ja)
Other versions
JP2000174079A (en
Inventor
義栄 長谷川
正義 長谷川
正 杉山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Micronics Japan Co Ltd
Original Assignee
Micronics Japan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronics Japan Co Ltd filed Critical Micronics Japan Co Ltd
Priority to JP34871398A priority Critical patent/JP3842468B2/en
Publication of JP2000174079A publication Critical patent/JP2000174079A/en
Application granted granted Critical
Publication of JP3842468B2 publication Critical patent/JP3842468B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Description

【0001】
【発明の属する技術分野】
本発明は、集積回路のような平板状被検査体の通電試験に用いるプローブカードのプローブを清掃する方法及び装置に関する。
【0002】
【従来の技術】
集積回路の通電試験に用いるプローブカードにおいては、通電試験時にプローブの先端(針先)が集積回路の電極部に押圧されて電極部を擦り、電極部の一部を削り取ることから、電極部の削り屑のような異物がプローブの先端に付着することを避けることができない。
【0003】
そのような異物がプローブの先端に付着していると、プローブの先端と集積回路の電極部との間の電気的接触状態が不確実になり、その結果検査自体が不正確になる。このため、この種のプローブカードにおいては、プローブの先端に付着している除去する清掃作業が行われている。
【0004】
この種の清掃技術の1つとして、圧縮空気をプローブの先端部に吹き付けるものがある。しかし、この従来技術では、付着物の一部は除去されるが、大部分の付着物は除去されない。
【0005】
清掃技術の他の1つとして、シート材に砥粒を塗布して研磨材層を形成したサンドペーパのような研磨部材、スポンジのような基材の表面層に砥流を混入して研磨材層を形成した研磨部材等を用い、プローブの先端を研磨材層に押圧している。
【0006】
しかし、この従来技術では、圧縮空気をプローブの先端部に吹き付ける技術に比べると多量の付着物を除去することはできるが、それでも多くの付着物が除去されることなく残存する。
【0007】
本発明者らは、種々の実験を行った結果、多量の付着物が残存する原因は、プローブ又は付着物が帯電しているためであることを見いだした。図4に示すように、一般的な集積回路の電極部用材料の酸化物であるアルミナは一般に正のイオンを有するのに対し、一般的なプローブ用材料であるタングステンは一般に負のイオンを有する。このため、両者は付着しやすく、分離しにくい。図4において、縦軸はぜーた電位を示し、横軸はpHを示す。
【0008】
【解決しようとする課題】
それゆえに、プローブの清掃技術においては、付着物をプローブから確実に除去することが重要である。
【0009】
【解決手段、作用及び効果】
本発明の清掃方法は、プローブのゼータ電位の極性と同極性にイオン化した空気を1以上のプローブの先端部付近に吹き付けることを含む。また、本発明の清掃装置は、プローブのゼータ電位の極性と同極性にイオン化した空気を1以上のプローブの先端部付近に吹き付けるイオナイザとを含む。
【0010】
イオナイザは、空気をプローブの先端部への付着物の電位と逆の電位にイオン化するように、予め設定される。そのような設定は、プローブ材料により決定することができる。そのような空気がプローブの先端部に吹き付けられると、プローブの先端部への付着物は、電気的に中和されるか、又はプローブ先端部の電位の極性と同極性に帯電され、プローブ先端部から分離されやすい。
【0011】
上記の結果、本発明によれば、そのような付着物は、自然に又は続いて吹き付けられる空気によりプローブの先端部から離される。
【0012】
本発明に係る清掃用方及び装置は、さらに、前記イオン化した空気を前記プローブの先端部付近に吹き付ける間、前記プローブの先端部付近の空気を吸引することを含むことができる。このようにすれば、プローブへの付着物は、プローブ先端部付近の空気と共に吸引されて所定の箇所に集められる。
【0013】
本発明に係る清掃用方及び装置は、さらに、研磨部材を設けてプローブの先端をその研磨部材に押し付けることができる。イオン化した空気を吹き付ける前にプローブ先端を研磨部材に押し付けるならば、多少の付着物が研磨部材により除去されるから、残りの付着物をプローブ先端部の電位の極性に容易に帯電させることができる。イオン化した空気を吹き付けた後にプローブ先端を研磨部材に押し付けるならば、付着物をより確実に除去することができる。
【0014】
【発明の実施の形態】
図1を参照するに、清掃装置10は、集積回路の通電試験に用いるプローブカード12に備えられた複数のプローブ14の先端部の清掃に用いられる。プローブカード12は、複数のプローブ14を配線基板16に配置した既知のものである。
【0015】
清掃装置10は、板状のベース部材20と、ベース部材20の上に配置されたイオナイザ22と、排気用空気通路24とを含む。
【0016】
ベース部材20は、ベース部材20を貫通する吸引口26を中央に有する。吸引口26の上部分は、直径寸法が上方ほど大きい截頭円錐形の形状を有する。
【0017】
イオナイザ22は、空気を正又は負にイオン化する除電装置として市販されている既知のものであり、空気を吸引口26の上方の箇所に向けて斜め上方に噴出する噴出口を有する。イオナイザ22は、高圧空気を図示しない圧縮機からチューブ28を経て受け、その空気をイオン化する。
【0018】
排気用空気通路24は、チューブ、ホース等により形成されており、また一端をベース部材20の下側において吸引口26に連通され、他端を図示しない排気装置に接続されている。
【0019】
図2に示すように、清掃装置10は、吸引口26がプローブ14に向けて上方に開放するように、検査装置30内に少なくとのX方向(図2において、左右方向)へ移動可能に配置される。
【0020】
集積回路32は、検査ステージ34に配置された検査テーブル36に配置されている。検査ステージ34は、検査テーブル36及び集積回路32を、X方向,Y方向(図2において、紙面に垂直の方向),Z方向(図2において、上下方向)及びθ方向(上下方向に伸びる軸線の周りの方向)へ移動させる既知の機構である。
【0021】
イオナイザ22は、空気をプローブの先端部への付着物の電位と逆の電位に、換言すればプローブ材料の帯電と同じ極性にイオン化するように、予め設定される。イオン化すべき極性は、プローブ14の材料の種類、集積回路32の電極部の材料の種類等により決定することができる。
【0022】
集積回路32の通電試験の間、検査ステージ34は検査テーブル36及び集積回路32をプローブカード12に下の検査位置に移動させており、清掃装置10は、検査位置から離れた待機位置に移動されている。
【0023】
清掃時、検査ステージ34は検査テーブル36及び集積回路32を検査位置から待機位置と異なる位置、例えば集積回路の受け渡し位置に移動され、清掃装置10は検査位置に移動される。
【0024】
清掃装置10は、検査位置において、チューブ28を介して圧縮空気をイオナイザ22に受け、その空気をイオナイザ22においてプローブ14の先端部への付着物の電位と逆の電位にイオン化した後イオナイザ22からプローブ14の先端部に噴出する。
【0025】
このように付着物の電位と逆の電位にイオン化された空気がプローブ14の先端部に吹き付けられると、プローブ14の先端部への付着物は、電気的に中和されるか、又はプローブ先端部の電位の極性と同極性に帯電され、プローブ先端部から分離されやすくなり、自然に又は続いて吹き付けられる空気によりプローブの先端部から確実に離される。
【0026】
イオン化した空気の噴出と同時に、清掃装置10は、プローブ14の先端部付近の空気を吸引口26に吸引する。これにより、付着物は、プローブ先端部付近の空気と共に吸引されて所定の箇所に集められる。空気の流れを、図1及び図3において矢印で示す。
【0027】
上記の結果として、清掃装置10によれば、プローブ14への付着物を確実に除去することができる。また、付着物を溶解させる薬品を用いる必要がないから、安全であり、そのような薬品により作業環境を悪化させるおそれがない。
【0028】
図3を参照するに、清掃装置40は、研磨部材42をベース部材20に配置している、研磨部材42は、シート材に砥粒を塗布して研磨材層を形成したもの、又はスポンジのような基材の表面層に砥流を混入して研磨材層を形成したのもであり、プローブ14の真下となる位置に配置されている。
【0029】
ベース部材20の吸引口26は、清掃装置40においては、プローブ14の先端部付近の空気を吸引するように、研磨部材42の周りに開放している。
【0030】
この清掃装置40を用いる場合、イオン化した空気をプローブ14の先端部に吹き付ける前又は吹き付けた後に、プローブ14の先端を研磨材42の研磨材層に押し付ける。
【0031】
イオン化した空気をプローブ14の先端部に吹き付ける前に、プローブ14の先端を研磨部材に押し付けるならば、予め多少の付着物が研磨部材42により除去されるから、残りの付着物をプローブ先端部の電位の極性に容易に帯電させることができる。
【0032】
これに対し、イオン化した空気をプローブ14の先端部に吹き付けた後に、プローブ14の先端を研磨部材42に押し付けるならば、付着物をより確実に除去することができる。
【0033】
本発明は、上記実施例に限定されない。本発明は、集積回路の通電試験用プローブを清掃する技術のみならず、液晶基板のような他の平板状非検査体の通電試験用プローブを清掃する技術にも適用することができる。本発明は、その趣旨を逸脱しない限り、種々変更することができる。
【図面の簡単な説明】
【図1】本発明に係る清掃装置の一実施例を示す正面図である。
【図2】図1に示す清掃装置を配置した検査装置の一実施例を示す図であって、(A)は通電試験時の清掃装置とプローブカードとの位置関係を示し、(B)は清掃地の清掃装置とプローブカードとの位置関係を示す。
【図3】本発明に係る清掃装置の他の実施例を示す正面図である。
【図4】各種の金属材料のゼータ電位とpHとの関係を示す図である。
【符号の説明】
10,40 清掃装置
12 プローブカード
14 プローブ
20 ベース部材
22 イオナイザ
24 排気用空気通路
26 吸引口
30 検査装置
32 集積回路
34 検査ステージ
36 検査テーブル
42 研磨部材
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method and an apparatus for cleaning a probe of a probe card used for an energization test of a flat object to be inspected such as an integrated circuit.
[0002]
[Prior art]
In a probe card used for an energization test of an integrated circuit, the tip (needle tip) of the probe is pressed against the electrode portion of the integrated circuit during the energization test, and the electrode portion is rubbed and a part of the electrode portion is scraped. It is inevitable that foreign matters such as shavings adhere to the tip of the probe.
[0003]
If such foreign matter adheres to the tip of the probe, the electrical contact state between the tip of the probe and the electrode portion of the integrated circuit becomes uncertain, and as a result, the inspection itself becomes inaccurate. For this reason, in this type of probe card, a cleaning operation for removing the adhering to the tip of the probe is performed.
[0004]
One such cleaning technique is to blow compressed air onto the tip of the probe. However, in this prior art, some of the deposits are removed, but most of the deposits are not removed.
[0005]
As another cleaning technique, a polishing member such as a sandpaper formed by applying abrasive grains to a sheet material to form an abrasive layer, and an abrasive layer mixed with a surface layer of a base material such as a sponge. The tip of the probe is pressed against the abrasive layer using a polishing member or the like on which is formed.
[0006]
However, this conventional technique can remove a large amount of deposits as compared with a technique in which compressed air is blown onto the tip of the probe, but still a lot of deposits remain without being removed.
[0007]
As a result of various experiments, the present inventors have found that the reason why a large amount of deposit remains is that the probe or the deposit is charged. As shown in FIG. 4, alumina, which is an oxide of a general integrated circuit electrode material, generally has positive ions, whereas tungsten, which is a general probe material, generally has negative ions. . For this reason, both are easy to adhere and difficult to separate. In FIG. 4, the vertical axis indicates the potential and the horizontal axis indicates the pH.
[0008]
[Problems to be solved]
Therefore, in the probe cleaning technique, it is important to reliably remove deposits from the probe.
[0009]
[Solution, action and effect]
The cleaning method of the present invention includes blowing air ionized to the same polarity as the zeta potential of the probe near the tip of one or more probes. In addition, the cleaning device of the present invention includes an ionizer that blows air ionized to the same polarity as the zeta potential of the probe near the tip of one or more probes.
[0010]
The ionizer is preset so that air is ionized to a potential opposite to the potential of the deposit on the tip of the probe. Such a setting can be determined by the probe material. When such air is blown onto the tip of the probe, the deposit on the probe tip is electrically neutralized or charged to the same polarity as the potential of the probe tip. It is easy to be separated from the part.
[0011]
As a result of the above, according to the present invention, such deposits are separated from the tip of the probe by naturally or subsequently blown air.
[0012]
The cleaning method and apparatus according to the present invention may further include sucking air near the tip of the probe while the ionized air is blown near the tip of the probe. In this way, the deposit on the probe is sucked together with the air near the probe tip and collected at a predetermined location.
[0013]
The cleaning method and apparatus according to the present invention can further provide a polishing member and press the tip of the probe against the polishing member. If the tip of the probe is pressed against the polishing member before the ionized air is blown, some deposits are removed by the polishing member, so that the remaining deposits can be easily charged to the polarity of the potential at the tip of the probe. . If the probe tip is pressed against the polishing member after the ionized air is blown, the deposits can be more reliably removed.
[0014]
DETAILED DESCRIPTION OF THE INVENTION
Referring to FIG. 1, the cleaning device 10 is used for cleaning the tips of a plurality of probes 14 provided in a probe card 12 used for an energization test of an integrated circuit. The probe card 12 is a known card in which a plurality of probes 14 are arranged on a wiring board 16.
[0015]
The cleaning device 10 includes a plate-like base member 20, an ionizer 22 disposed on the base member 20, and an exhaust air passage 24.
[0016]
The base member 20 has a suction port 26 penetrating the base member 20 at the center. The upper part of the suction port 26 has a frustoconical shape with a larger diameter dimension as it goes upward.
[0017]
The ionizer 22 is a known device that is commercially available as a static eliminator that ionizes air positively or negatively, and has a jet outlet that jets air obliquely upward toward a location above the suction port 26. The ionizer 22 receives high-pressure air from a compressor (not shown) through the tube 28 and ionizes the air.
[0018]
The exhaust air passage 24 is formed by a tube, a hose, or the like. One end of the exhaust air passage 24 communicates with the suction port 26 on the lower side of the base member 20 and the other end is connected to an exhaust device (not shown).
[0019]
As shown in FIG. 2, the cleaning device 10 is movable in at least the X direction (left and right in FIG. 2) in the inspection device 30 so that the suction port 26 opens upward toward the probe 14. Be placed.
[0020]
The integrated circuit 32 is disposed on an inspection table 36 disposed on the inspection stage 34. The inspection stage 34 moves the inspection table 36 and the integrated circuit 32 in the X direction, the Y direction (direction perpendicular to the paper surface in FIG. 2), the Z direction (up and down direction in FIG. 2), and the θ direction (axis extending in the up and down direction). It is a known mechanism that moves in the direction around the.
[0021]
The ionizer 22 is set in advance so that air is ionized to a potential opposite to the potential of the deposit on the tip of the probe, in other words, to the same polarity as the charge of the probe material. The polarity to be ionized can be determined by the material type of the probe 14, the material type of the electrode part of the integrated circuit 32, and the like.
[0022]
During the energization test of the integrated circuit 32, the inspection stage 34 moves the inspection table 36 and the integrated circuit 32 to the probe card 12 to a lower inspection position, and the cleaning device 10 is moved to a standby position away from the inspection position. ing.
[0023]
At the time of cleaning, the inspection stage 34 moves the inspection table 36 and the integrated circuit 32 from the inspection position to a position different from the standby position, for example, a delivery position of the integrated circuit, and the cleaning device 10 is moved to the inspection position.
[0024]
The cleaning device 10 receives compressed air from the ionizer 22 through the tube 28 at the inspection position, ionizes the air to the potential opposite to the potential of the deposit on the tip of the probe 14 in the ionizer 22, and then from the ionizer 22. It ejects to the tip of the probe 14.
[0025]
When air ionized to a potential opposite to the potential of the deposit is blown to the tip of the probe 14, the deposit on the tip of the probe 14 is electrically neutralized or the tip of the probe. It is charged with the same polarity as the potential of the probe, and is easily separated from the probe tip, and is reliably separated from the probe tip by air blown naturally or subsequently.
[0026]
Simultaneously with the ejection of ionized air, the cleaning device 10 sucks air near the tip of the probe 14 into the suction port 26. As a result, the adhering matter is sucked together with the air near the tip of the probe and collected at a predetermined location. The air flow is indicated by arrows in FIGS.
[0027]
As a result of the above, according to the cleaning device 10, the deposits on the probe 14 can be reliably removed. Moreover, since it is not necessary to use chemicals that dissolve the deposits, it is safe, and there is no possibility that the working environment will be deteriorated by such chemicals.
[0028]
Referring to FIG. 3, the cleaning device 40 has a polishing member 42 disposed on the base member 20. The polishing member 42 is formed by applying abrasive grains to a sheet material to form an abrasive layer, or a sponge. An abrasive layer was formed by mixing an abrasive flow into the surface layer of such a base material, and it was arranged at a position directly below the probe 14.
[0029]
In the cleaning device 40, the suction port 26 of the base member 20 is open around the polishing member 42 so as to suck air near the tip of the probe 14.
[0030]
When the cleaning device 40 is used, the tip of the probe 14 is pressed against the abrasive layer of the abrasive 42 before or after the ionized air is blown onto the tip of the probe 14.
[0031]
If the tip of the probe 14 is pressed against the polishing member before the ionized air is blown onto the tip of the probe 14, some of the deposits are removed by the polishing member 42 in advance. It can be easily charged to the polarity of the potential.
[0032]
On the other hand, if the tip of the probe 14 is pressed against the polishing member 42 after the ionized air is sprayed on the tip of the probe 14, the deposits can be removed more reliably.
[0033]
The present invention is not limited to the above embodiments. The present invention can be applied not only to a technique for cleaning an energization test probe for an integrated circuit, but also to a technique for cleaning an energization test probe for another flat non-inspection object such as a liquid crystal substrate. The present invention can be variously modified without departing from the gist thereof.
[Brief description of the drawings]
FIG. 1 is a front view showing an embodiment of a cleaning device according to the present invention.
2A and 2B are diagrams showing an embodiment of an inspection apparatus in which the cleaning apparatus shown in FIG. 1 is arranged. FIG. 2A shows the positional relationship between the cleaning apparatus and the probe card during an energization test, and FIG. The positional relationship between the cleaning device in the cleaning area and the probe card is shown.
FIG. 3 is a front view showing another embodiment of the cleaning device according to the present invention.
FIG. 4 is a diagram showing the relationship between zeta potential and pH of various metal materials.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 10, 40 Cleaning device 12 Probe card 14 Probe 20 Base member 22 Ionizer 24 Exhaust air passage 26 Suction port 30 Inspection device 32 Integrated circuit 34 Inspection stage 36 Inspection table 42 Polishing member

Claims (6)

プローブのゼータ電位の極性と同極性にイオン化した空気を1以上の前記プローブの先端部付近に吹き付けることを含む、プローブの清掃方法。Comprising spraying the ionized air in the same polarity as the polarity of the zeta potential of the probe in the vicinity of the tip portion of one or more of said probe, cleaning method of the probe. さらに、前記イオン化した空気を前記プローブの先端部付近に吹き付ける間、前記プローブの先端部付近の空気を吸引することを含む、請求項1に記載の清掃方法。The cleaning method according to claim 1, further comprising sucking air near a tip of the probe while the ionized air is blown near the tip of the probe. さらに、前記イオン化した空気を吹き付ける前に又は吹き付けた後に前記プローブの先端を研磨部材に押し付けることを含む、請求項1又は2に記載の清掃方法。The cleaning method according to claim 1, further comprising pressing the tip of the probe against an abrasive member before or after spraying the ionized air. プローブのゼータ電位の極性と同極性にイオン化した空気を1以上の前記プローブの先端部付近に吹き付けるイオナイザとを含む、プローブの清掃装置。And a ionizer for blowing ionized air into the same polarity as the polarity of the zeta potential of the probe in the vicinity of the tip portion of one or more of the probe, the cleaning device of the probe. さらに、前記プローブの先端部に向けて開放する吸引口を有するベース部材と、前記吸引口に連通された排気用空気通路とを含み、前記イオナイザは前記ベース部材に配置されている、請求項4に記載の清掃装置。The base member having a suction port that opens toward the tip of the probe, and an exhaust air passage communicated with the suction port, wherein the ionizer is disposed in the base member. The cleaning device described in 1. さらに、前記プローブの先端を押し付けるべく前記ベース部材に配置された研磨部材を含む、請求項4又は5に記載の清掃装置。Furthermore, the cleaning apparatus of Claim 4 or 5 containing the grinding | polishing member arrange | positioned at the said base member in order to press the front-end | tip of the said probe.
JP34871398A 1998-12-08 1998-12-08 Probe cleaning method and apparatus Expired - Lifetime JP3842468B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34871398A JP3842468B2 (en) 1998-12-08 1998-12-08 Probe cleaning method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34871398A JP3842468B2 (en) 1998-12-08 1998-12-08 Probe cleaning method and apparatus

Publications (2)

Publication Number Publication Date
JP2000174079A JP2000174079A (en) 2000-06-23
JP3842468B2 true JP3842468B2 (en) 2006-11-08

Family

ID=18398874

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34871398A Expired - Lifetime JP3842468B2 (en) 1998-12-08 1998-12-08 Probe cleaning method and apparatus

Country Status (1)

Country Link
JP (1) JP3842468B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100835467B1 (en) * 2006-12-08 2008-06-04 동부일렉트로닉스 주식회사 Air cleaning unit for probe card
JP2009076776A (en) * 2007-09-21 2009-04-09 Tokyo Electron Ltd Probe device and probe method
KR20200135823A (en) * 2018-03-22 2020-12-03 폼팩터, 인크. Probe tip with built-in skate
CN114405887B (en) * 2020-11-28 2022-12-06 法特迪精密科技(苏州)有限公司 Friction scraping method for testing probe cleaning method
JP7002707B1 (en) * 2021-06-23 2022-02-10 三菱電機株式会社 Inspection equipment

Also Published As

Publication number Publication date
JP2000174079A (en) 2000-06-23

Similar Documents

Publication Publication Date Title
KR100225909B1 (en) Wafer sawing apparatus
KR100642666B1 (en) Nozzle cleaning apparatus and substrate processing apparatus
JP3272612B2 (en) Printing mask cleaning apparatus and method
US9114503B2 (en) Nozzle, a nozzle unit, and a blasting machine
JP2003077987A (en) Substrate holding stage cleaning device and its cleaning method
JP2007165488A (en) Bevel processing method, and bevel processor
JP3842468B2 (en) Probe cleaning method and apparatus
CN111289359A (en) Testing device
CN101204687B (en) Sweeping device of coating head for coating
JPH07256222A (en) Substrate cleaning device
WO2019225853A1 (en) Cleaning device having contact type brush structure
JP2020116665A (en) Holding surface cleaner
JP4256510B2 (en) Workpiece cleaning unit in sandblasting
JPH10256199A (en) Cleaning system for chucking surface
JP2006130372A (en) Sheet cleaning device and sheet processing machine
JP3955424B2 (en) Method for cleaning workpiece holder, polishing apparatus and polishing method
JP2006284898A (en) Method and apparatus for cleaning electro-optical panel
JPH11347942A (en) Micro-shape forming method
JP2001328039A (en) Substrate separating device
JP3453022B2 (en) Developing device
JP2000204354A (en) Abrasive composition for sandblast, sandblasting method using the abrasive composition for sandblast, patterning of low-melting glass using the sandblasting method, and recycling of low-melting glass in the patterning of low- melting glass
JP2002177895A (en) Agent, method, and apparatus for cleaning probe
JP2000024712A (en) Method for removing foreign matter from surface of strip and device therefor
JPH0235961A (en) Dust removing method and apparatus
JPH03169012A (en) Foreign-body removal apparatus of semiconductor substrate

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050124

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20060615

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20060627

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060630

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20060725

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20060810

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120818

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150818

Year of fee payment: 9

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term