JP3832786B2 - ポジ型フォトレジスト組成物 - Google Patents

ポジ型フォトレジスト組成物 Download PDF

Info

Publication number
JP3832786B2
JP3832786B2 JP11525398A JP11525398A JP3832786B2 JP 3832786 B2 JP3832786 B2 JP 3832786B2 JP 11525398 A JP11525398 A JP 11525398A JP 11525398 A JP11525398 A JP 11525398A JP 3832786 B2 JP3832786 B2 JP 3832786B2
Authority
JP
Japan
Prior art keywords
group
acid
resin
embedded image
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP11525398A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11305443A5 (enExample
JPH11305443A (ja
Inventor
亨 藤森
史郎 丹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP11525398A priority Critical patent/JP3832786B2/ja
Priority to KR10-1999-0012958A priority patent/KR100533402B1/ko
Priority to US09/292,052 priority patent/US6207343B1/en
Publication of JPH11305443A publication Critical patent/JPH11305443A/ja
Publication of JPH11305443A5 publication Critical patent/JPH11305443A5/ja
Application granted granted Critical
Publication of JP3832786B2 publication Critical patent/JP3832786B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP11525398A 1998-04-14 1998-04-24 ポジ型フォトレジスト組成物 Expired - Lifetime JP3832786B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP11525398A JP3832786B2 (ja) 1998-04-24 1998-04-24 ポジ型フォトレジスト組成物
KR10-1999-0012958A KR100533402B1 (ko) 1998-04-14 1999-04-13 포지티브 감광성 조성물
US09/292,052 US6207343B1 (en) 1998-04-14 1999-04-14 Positive photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11525398A JP3832786B2 (ja) 1998-04-24 1998-04-24 ポジ型フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JPH11305443A JPH11305443A (ja) 1999-11-05
JPH11305443A5 JPH11305443A5 (enExample) 2005-02-24
JP3832786B2 true JP3832786B2 (ja) 2006-10-11

Family

ID=14658121

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11525398A Expired - Lifetime JP3832786B2 (ja) 1998-04-14 1998-04-24 ポジ型フォトレジスト組成物

Country Status (1)

Country Link
JP (1) JP3832786B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4121396B2 (ja) 2003-03-05 2008-07-23 富士フイルム株式会社 ポジ型レジスト組成物
JP4115322B2 (ja) 2003-03-31 2008-07-09 富士フイルム株式会社 ポジ型レジスト組成物
JPWO2010104074A1 (ja) * 2009-03-10 2012-09-13 日産化学工業株式会社 側鎖にアセタール構造を有するポリマーを含むレジスト下層膜形成組成物及びレジストパターンの形成方法

Also Published As

Publication number Publication date
JPH11305443A (ja) 1999-11-05

Similar Documents

Publication Publication Date Title
JP3613491B2 (ja) 感光性組成物
JP3587325B2 (ja) ポジ型感光性組成物
JP3679205B2 (ja) ポジ型感光性組成物
KR100524446B1 (ko) 포지티브형 포토레지스트 조성물
JP3802179B2 (ja) ポジ型フォトレジスト組成物
JP3954233B2 (ja) ポジ型フォトレジスト組成物
KR100559949B1 (ko) 포지티브포토레지스트조성물
JPH09309874A (ja) ポジ型感光性組成物
JP4007569B2 (ja) ポジ型電子線又はx線レジスト組成物
JP3773139B2 (ja) ポジ型感光性組成物
US6727036B2 (en) Positive-working radiation-sensitive composition
JP3894260B2 (ja) ポジ型フォトレジスト組成物
JPH09258435A (ja) ポジ型感光性組成物
JP3982958B2 (ja) ポジ型感光性組成物
KR100533402B1 (ko) 포지티브 감광성 조성물
JP3741330B2 (ja) ポジ型フォトレジスト組成物及びそれを用いるパターン形成方法
JP3778391B2 (ja) ポジ型感光性組成物
JP3890358B2 (ja) ポジ型感光性樹脂組成物及びパターン形成方法
KR100458398B1 (ko) 화학증폭형포지티브레지스트조성물
JP3832786B2 (ja) ポジ型フォトレジスト組成物
JPH11295895A (ja) ポジ型フォトレジスト組成物
JP3916188B2 (ja) ポジ型フォトレジスト組成物
JP3907135B2 (ja) ポジ型感光性組成物
JP4272805B2 (ja) ポジ型感放射線性組成物
JP3890375B2 (ja) ポジ型感光性組成物

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20040325

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20040325

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20060324

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20060706

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20060712

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20060714

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090728

Year of fee payment: 3

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090728

Year of fee payment: 3

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090728

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100728

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110728

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110728

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120728

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120728

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130728

Year of fee payment: 7

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term