JPH11305443A5 - - Google Patents
Info
- Publication number
- JPH11305443A5 JPH11305443A5 JP1998115253A JP11525398A JPH11305443A5 JP H11305443 A5 JPH11305443 A5 JP H11305443A5 JP 1998115253 A JP1998115253 A JP 1998115253A JP 11525398 A JP11525398 A JP 11525398A JP H11305443 A5 JPH11305443 A5 JP H11305443A5
- Authority
- JP
- Japan
- Prior art keywords
- carbon atoms
- substituent
- total
- group
- photoresist composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11525398A JP3832786B2 (ja) | 1998-04-24 | 1998-04-24 | ポジ型フォトレジスト組成物 |
| KR10-1999-0012958A KR100533402B1 (ko) | 1998-04-14 | 1999-04-13 | 포지티브 감광성 조성물 |
| US09/292,052 US6207343B1 (en) | 1998-04-14 | 1999-04-14 | Positive photosensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11525398A JP3832786B2 (ja) | 1998-04-24 | 1998-04-24 | ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11305443A JPH11305443A (ja) | 1999-11-05 |
| JPH11305443A5 true JPH11305443A5 (enExample) | 2005-02-24 |
| JP3832786B2 JP3832786B2 (ja) | 2006-10-11 |
Family
ID=14658121
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11525398A Expired - Lifetime JP3832786B2 (ja) | 1998-04-14 | 1998-04-24 | ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3832786B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4121396B2 (ja) | 2003-03-05 | 2008-07-23 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP4115322B2 (ja) | 2003-03-31 | 2008-07-09 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JPWO2010104074A1 (ja) * | 2009-03-10 | 2012-09-13 | 日産化学工業株式会社 | 側鎖にアセタール構造を有するポリマーを含むレジスト下層膜形成組成物及びレジストパターンの形成方法 |
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1998
- 1998-04-24 JP JP11525398A patent/JP3832786B2/ja not_active Expired - Lifetime