JP3830291B2 - Method for making a grinding wheel - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention provides, for example, end-finishing, chamfering of the outer peripheral surface or inner peripheral surface of a glass substrate disk used for a hard disk of a computer, or a circular, non-circular or linear end of a product made of other glass or various materials. The present invention relates to a polishing method for performing edge finishing, chamfering, and the like of an edge and a method for manufacturing a grindstone used in a polishing apparatus .
[0002]
[Prior art]
For example, a disk-shaped glass substrate, that is, a glass substrate disk is used as a substrate for a computer hard disk. In general, a glass substrate disk is molded into a predetermined disk shape by pressing or a core drill grindstone, and then the outer peripheral portion thereof is finished, and both side surfaces of the inner and outer peripheral portions are approximately 45. Chamfering work is performed at about °.
[0003]
Conventionally, finishing and chamfering operations in the glass substrate disk and on the outer peripheral portion have been performed by a polishing method (plunge cut).
[0004]
The outer peripheral end face finishing and chamfering operations will be described. As shown in FIG. 10, a glass substrate disk 10 as a workpiece is sucked and held on a rotary support shaft 101 with a vacuum suction disk and rotated. A diamond grindstone 100 having a groove 103 formed in a chamfered shape of the outer peripheral portion is mounted on the grindstone shaft 102 and pressed against the outer peripheral portion 11 of the glass substrate disk 10 while rotating the grindstone shaft 102. End face finishing and end face chamfering are performed. Conventionally, the grindstone shaft 102 and the glass substrate disk rotation support shaft 101 are arranged such that the rotation axes O ₃ and O ₁ are parallel to each other. Further, during the inner peripheral end face finishing and chamfering operations, a smaller diamond grindstone 100 is disposed in the inner diameter portion of the glass substrate disk 10 and is performed in the same manner as described above.
[0005]
[Problems to be solved by the invention]
According to such a polishing method, the outer peripheral portion 11 of the glass substrate disk 10 to be polished and the diamond grindstone groove portion 103 are polished in a line contact state. polishing accuracy of, the surface accuracy in accordance with the abrasive diamond grindstone 100 (the surface roughness). In addition, this polishing method has a problem that a high-accuracy polished surface cannot be obtained because the diamond abrasive grains impactly contact the surface to be polished, that is, the inner and outer peripheral portions of the glass substrate disk. is doing.
[0006]
Therefore, conventionally, after the polishing operation, a long polishing process is required for the glass substrate disc and the outer peripheral portion 11. As a result, end finishing and end chamfering of the inner and outer peripheral portions of the glass substrate disc are required. I had to spend a lot of time working. Therefore, there has been a problem that the manufacturing cost of the glass substrate disk 10 is increased.
[0007]
Accordingly, an object of the present invention is to have extremely high surface accuracy (surface roughness), and greatly reduce the time required for the polishing process that has been conventionally required, or as zero, so that the outer periphery or inner portion of the glass substrate disk can be reduced. A grinding wheel used in a polishing method and a polishing apparatus capable of shortening the polishing time for end face finishing and chamfering of the peripheral portion and reducing the manufacturing cost can be manufactured extremely efficiently and with high performance. An object of the present invention is to provide a method for producing a polishing grindstone .
[0008]
Another object of the present invention is to have extremely high surface accuracy (surface roughness), greatly reducing the time required for the polishing process conventionally required, or as a product of glass or various materials. The grinding wheel used in the polishing method and the polishing apparatus that can shorten the polishing time for finishing and chamfering the end face of the circular, non-circular or straight edge and can reduce the manufacturing cost is extremely efficient. It is also desirable to provide a method for producing a polishing wheel that can be produced with high performance .
[0010]
[Means for Solving the Problems]
The above object is achieved by a polishing method and a method for producing a grindstone used in a polishing apparatus according to the present invention .
[0014]
According to the present invention , (a) a step of producing a master grindstone in which the cross-sectional shape of the outer peripheral portion in the plane including the rotation axis is the same as the end cross-sectional shape of the workpiece to be polished;
(B) a step of rotating the master grindstone around the first rotation axis;
(C) a step of rotating and driving the grindstone base metal around a second rotation axis inclined by a predetermined angle (θ) with respect to the first rotation axis;
(D) pressing the outer peripheral portion of the master grindstone against the outer peripheral portion of the grindstone base metal, and forming a groove in the outer peripheral portion of the grindstone base metal;
(E) a step of fixing abrasive grains to the groove portion of the grindstone base metal,
There is provided a method for producing a polishing wheel characterized by comprising the following steps. According to one embodiment, the tilt angle (θ) is 1 ° to 45 °, preferably 5 ° to 15 °.
[0015]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, a method for producing a polishing wheel used in a polishing method and a polishing apparatus according to the present invention will be described in more detail with reference to the drawings.
[0016]
Example 1
In the present embodiment, among the glass substrate disk for a computer, it will be described polishing method definitive the end surface finishing and the end surface chamfering grinding work of the outer peripheral portion, such as an end surface finishing and the end chamfer of products other glass or various materials to It should be understood that is also applicable.
[0017]
1 and 2 show a schematic configuration of an inner and outer diameter polishing machine 1 which is an embodiment of a polishing apparatus for carrying out the above polishing method.
[0018]
According to the present embodiment, the inner and outer diameter polishing machine 1 has a horizontal base 2 installed horizontally and a vertical base 3 attached to the base 2 so as to extend in the vertical direction. The horizontal base 2 is provided with a rotation support shaft 4 with a suction disk that supports a workpiece 10 such as a circular glass substrate disk having a hole in the center by vacuum suction, for example. The rotation support shaft 4 is driven to rotate about a rotation axis O _{1 by} a drive motor M ₁ and can be moved up and down by moving means such as an air cylinder 5.
[0019]
The inner and outer diameter polishing machine 1 includes an inner diameter polishing head 6 that polishes the inner diameter portion (inner peripheral surface) of the glass substrate disk 10 and an outer diameter polishing head 7 that polishes the outer diameter portion (outer peripheral surface) of the glass substrate disk 10. The movable table 20 is provided. The movable table 20 is attached to the attachment surface 3A of the vertical base 3 via the slide table 21 so as to be movable in the horizontal direction. The slide table 21 can also be provided so as to be movable up and down by a slider 22 with respect to the mounting surface 3A of the vertical base 3 as shown in the figure. Since the structure of such a slide table 21 is a technique well-known to those skilled in the art, the detailed description beyond this is abbreviate | omitted.
[0020]
According to this embodiment, polishing wheels 30 and 31 such as diamond wheels are attached to the tips of the inner and outer diameter polishing heads 6 and 7, respectively. In this embodiment, the rotation axis O ₂ of the rotation shaft 6 A of the inner diameter polishing head 6 and the rotation axis O ₃ of the rotation shaft 7 A of the outer diameter polishing head 7 are relative to the rotation axis O ₁ of the glass substrate disk rotation support shaft 4. Inclined by a predetermined angle θ. This point will be described in detail later.
[0021]
In this embodiment, for example, a glass substrate disk 10 having an outer diameter of 96 mm, an inner diameter of 24 mm, and a thickness of 0.8 mm is fixed to the upper end surface of the rotation support shaft 4 with a suction plate, and a predetermined rotation speed, 50 to 50 in this embodiment. While rotating at 200 rpm, the air cylinder 5 is moved up to a predetermined polishing position and installed.
[0022]
Next, the inner and outer diameter polishing heads 6 and 7 are driven to rotate, for example, the inner diameter polishing grindstone 30 at 30000 rpm and the outer diameter polishing grindstone 31 at 3600 rpm to contact the inner and outer diameter portions of the glass substrate disk 10. And polishing. In this embodiment, the inner diameter portion polishing is performed in the same manner as the outer diameter portion polishing. Therefore, in the following description, a method of polishing the outer peripheral portion of the glass substrate disk by the outer diameter polishing grindstone 31 will be described in detail.
[0023]
According to the present embodiment, as will be better understood with reference also to FIG. 3, the diamond grindstone 31 for polishing the outer peripheral portion 11 of the glass substrate disk 10 has a groove portion 32 formed on the outer peripheral surface thereof. Grinding wheel 31 is attached to the wheel spindle 7A of outer diameter polishing head 7, is rotated at a predetermined rotation speed, the rotation axis O ₃ of the wheel spindle. 7A, the rotation axis O ₁ of the glass substrate disk rotation shaft 4 With respect to the angle θ. The inclination angle (θ) is 1 ° to 45 °, preferably 5 ° to 15 °. In this embodiment, the angle is 5 °.
[0024]
As shown in FIGS. 4A, 4B, and 4C, the grindstone that rotates while maintaining the state in which the grindstone shaft 7A is inclined by the angle θ with respect to the glass substrate disk rotation support shaft 4 as described above. The groove portion 32 of 31 is pressed against the outer peripheral portion 11 of the glass substrate disk 10 to finish the end face and chamfer the end face of the outer peripheral portion 11 of the glass substrate disk. At this time, the grindstone 31 may be moved toward the glass substrate disc 10, the glass substrate disc 10 may be moved toward the grindstone 31, and the glass substrate disc 10 and the grindstone 31 are further moved. It is good also as a structure which moves toward each other.
[0025]
According to the present embodiment, as shown in FIG. 5A, the outer peripheral portion 11 of the glass substrate disk 10 is polished with the outer peripheral end surface 10C, and the outer peripheral surfaces 10A, 10B of the disc outer peripheral portion 11 are at an angle α = Chamfering is performed at 45 ° and a distance t = 0.3 mm. Of course, depending on the case, polishing of the outer peripheral end surface 10C may be omitted, or chamfering polishing of one or both of the outer peripheral surfaces 10A and 10B may be omitted.
[0026]
FIG. 5A shows the outer peripheral portion 11 of the glass substrate disk 10 taken along the line AA in FIG. 3, that is, the plane including the rotation axis O ₁ of the glass substrate disk rotation support shaft 4, and the grindstone groove portion 32. FIG. 5B shows the fitting state, and shows the shape of the grindstone groove portion 32 in the plane taken along the line BB in FIG. 3, that is, the plane including the rotation axis O ₃ of the grindstone shaft 7A.
[0027]
According to the present embodiment , the groove 32 of the grindstone 31 is arranged in such a manner that the rotation axis O ₃ of the grindstone shaft 7A is inclined with respect to the rotation axis O ₁ of the glass substrate disk rotation support shaft 4 by an angle θ. It is formed in a shape that fits complementarily to the end face shape of the substrate disk 10. Therefore, in the present embodiment, the cross-sectional shape of the grindstone groove 32 in the plane including the rotation axis O ₃ of the grindstone shaft 7A is such that the groove wall surfaces 32A, 32B, 32C are somewhat curved as shown in FIG. It becomes a shape.
[0028]
FIG. 6 shows the contact area of the glass substrate disk outer peripheral portion 11 and the grindstone groove portion 32 at the time of polishing with hatching. According to the present invention, the conventional glass substrate disk outer peripheral portion 11 and the grindstone groove portion 32 are not subjected to polishing work in a conventional line contact state, but in a surface contact state over a predetermined area, that is, It will be understood that spiral polishing is performed from one surface 10A of the disk 10 to the other surface 10B. Therefore, according to the present invention, at the time of contact polishing between the outer peripheral portion 11 of the glass substrate disk 10 to be polished and the diamond grindstone groove portion 32, the diamond abrasive grains impactly contact the outer peripheral portion 11 of the glass substrate disk. As a result, the polishing accuracy of the outer peripheral portion 11 of the glass substrate disk is greatly improved.
[0029]
According to the present embodiment, # 600 to # 800 are used as the polishing grindstone 31, but the surface roughness Ra of the glass substrate disk outer peripheral portion 11 after polishing is measured by a surface roughness measuring machine (manufactured by Zygo Corporation: It was Ra = 0.3-0.5 micrometer when measured using the non-contact laser measuring machine. It will be understood that the surface accuracy is greatly improved compared to the surface roughness Ra = 5 to 8 μm obtained by the conventional method. In addition, according to the present embodiment, the polishing process after polishing, which has been essential in the past, is unnecessary, or even if necessary, only a short time polishing process is required. For this reason, the conventional chamfering operation requires 40 to 50 seconds. In this embodiment, the chamfered portion having the surface roughness can be obtained by the polishing operation of 20 seconds. Shortening was achieved.
[0030]
Next, the manufacturing method of the grindstone 31 for polishing the glass substrate disk end face according to the present invention will be described.
[0031]
The grinding wheel 31 for polishing the end face of the glass substrate disk can be formed using a conventional profile grinder or the like, but it takes time to form and the production cost increases.
[0032]
According to the present invention, the glass substrate disk end face polishing grindstone 31 can be produced using the inner and outer diameter polishing machine 1.
[0033]
That is, referring to FIG. 7, in this embodiment, at least the shape of the outer peripheral portion 41, that is, the cross-sectional shape of the outer peripheral portion 41 in the plane including the rotation axis is the outer peripheral portion 11 of the glass substrate disk 10 (in some cases A master grindstone 40 such as a diamond grindstone manufactured in the same shape as the end cross-sectional shape of the inner peripheral portion is attached to the glass substrate disk rotation support shaft 4. On the other hand, a disc-shaped glass substrate disk grinding wheel base 31A made of, for example, steel is attached to the grinding wheel shaft 7A of the outer diameter polishing head 7. As described above, the grindstone shaft 7 </ b> A is disposed to be inclined with respect to the rotation support shaft 4 by the angle θ. The inclination angle (θ) is 1 ° to 45 °, preferably 5 ° to 15 °. In this embodiment, the angle is 5 °.
[0034]
7A, 7B, and 7C while maintaining the state where the grindstone shaft 7A to which the glass substrate disk polishing grindstone base 31A is attached is inclined by the angle θ with respect to the rotation shaft 4 in this manner. ), The outer peripheral portion 33 of the grinding wheel base 31A for polishing the glass substrate disk is pressed against the outer diameter portion 41 of the rotating master grindstone 40. At this time, the glass substrate disc polishing grinder base 31A may be moved toward the master grindstone 41, and the master grindstone 41 may be moved toward the glass substrate disc polish grinder base 31A. Furthermore, the master grindstone 41 and the glass substrate disk polishing grindstone base 31A may be moved toward each other.
[0035]
As a result, as shown in FIG. 7C, the rotation axis O ₃ is angled with respect to the rotation axis O ₁ of the glass substrate disk rotation support shaft 4 at the outer peripheral portion of the glass substrate disk polishing grinder 31A. Grooves 32 are formed in a shape that is complementarily fitted to the outer peripheral end face shape of the glass substrate disk 10 while being inclined by θ.
[0036]
Next, diamond abrasive grains are fixed to at least the surface of the groove 32 of the glass substrate disk polishing grinder 31A by, for example, electrodeposition, and the grinding grindstone 31 is produced.
[0037]
The glass substrate disc polishing grindstone 31 produced by such a method can be used in the above-described inner and outer diameter polishing machine 1 to perform the end face finishing and end face chamfering operations of the glass substrate disc 10 for computers extremely efficiently. It was.
[0038]
In the above embodiment has been described about the end surface finishing and the end surface chamfering the outer peripheral portion 11 of the computer for the glass substrate disk 10, also similarly applied to the end surface finishing and the end surface chamfering of the inner peripheral portion of the glass substrate disk 10 computer The same effect can be obtained.
[0039]
Example 2
In the first embodiment has been described about the end surface finishing and the end surface chamfering the outer peripheral portion 11 of the glass substrate disk 10 for the computer, straight, or, glass or various materials having an edge portion curved in a circular or non-circular The present invention can be similarly applied to end face finishing and end face chamfering polishing operations.
[0040]
FIG. 8 and FIG. 9 show an embodiment of end face finishing and end face chamfering polishing of a workpiece 50 such as thin glass having a linear edge 51.
[0041]
In the present embodiment, the thin glass 50 is held in a horizontal or vertical state, for example, and the diamond grindstone 31 having the groove 32 for polishing the thin glass edge 51 is, for example, a grindstone shaft 7A of the outer diameter polishing head 7. And is rotated at a predetermined rotation speed. At this time, the rotation axis O ₃ of the grindstone shaft 7A is predetermined with respect to a perpendicular O ₁ (corresponding to the rotation axis of the glass substrate disk rotation support shaft in the first embodiment) perpendicular to the direction in which the end edge 51 extends. Is inclined at an angle θ. The inclination angle (θ) is 1 ° to 45 °, preferably 5 ° to 15 °. In this embodiment, the angle is 5 °.
[0042]
In this way, while maintaining the state where the grindstone shaft 7A is tilted by the tilt angle θ with respect to the thin glass edge 51, as shown in FIGS. The groove 32 of the grindstone 31 is pressed against the glass edge 51 to finish the end face and chamfer the end face of the glass edge 51. Of course, at this time, the glass sheet 50 may be moved toward the grindstone 31 to press the glass edge 51 into the grindstone groove 32. In this embodiment, the same effect as in the first embodiment can be obtained.
[0043]
Further, the above polishing method is not limited to the chamfering operation of the linear edge portion of the product as described above, and can be similarly applied to a curved edge portion such as a circular shape or a non-circular shape. And similar effects can be obtained.
[0044]
【The invention's effect】
As described above, in the polishing method, the grindstone having a groove formed on the outer peripheral portion is driven to rotate around a rotation axis inclined by a predetermined angle (θ) with respect to the rotation axis of the rotating workpiece. The chamfering and / or end surface polishing of the outer peripheral portion or inner peripheral portion of the workpiece is performed by pressing the groove portion of the grindstone against the outer peripheral portion or inner peripheral portion of the rotating workpiece, or the outer periphery. A grindstone having a groove formed in the part is driven to rotate around a rotation axis inclined by a predetermined angle (θ) with respect to a perpendicular perpendicular to the direction in which the edge of the workpiece extends, and the groove of the grindstone Since the chamfering and / or end surface polishing of the edge of the workpiece is performed by pressing the edge against the edge of the workpiece, it has extremely high surface accuracy (surface roughness), Significantly reduce the time required for the polishing process required, or Or zero, the polishing time for the end surface finishing and chamfering work on the outer peripheral part or inner peripheral part of the glass substrate disk, as well as the circular, non-circular or straight edge part of glass or various products. It is possible to shorten the manufacturing cost.
[0045]
Further, the polishing apparatus includes a horizontal base that is mounted horizontally, the vertical base mounted to extend vertically the horizontal base, is provided in the horizontal base, supporting the workpiece A rotation support shaft that rotates, and a grindstone shaft that supports and rotates a grindstone having a groove formed on the outer periphery in order to polish the outer diameter portion or inner diameter portion of the workpiece. The polishing method can be carried out very effectively because it is configured to be inclined with respect to the support shaft by an angle θ.
[0046]
According to the method for producing a grindstone of the present invention , (a) a step of producing a master grindstone in which the cross-sectional shape of the outer peripheral portion in the plane including the rotation axis is the same as the end cross-sectional shape of the workpiece to be polished; b) a step of rotationally driving the master grindstone around the first rotational axis; (c) a grindstone base metal around the second rotational axis inclined by a predetermined angle (θ) with respect to the first rotational axis. (D) a step of pressing the outer peripheral portion of the master grindstone against the outer peripheral portion of the grindstone base metal to form a groove portion on the outer peripheral portion of the grindstone base metal; and (e) fixing the abrasive grains to the groove portion of the grindstone base metal. Therefore, the grindstone used in the above polishing method and polishing apparatus can be produced very efficiently and with high performance.
[Brief description of the drawings]
FIG. 1 is a side view showing a schematic configuration of a polishing apparatus.
FIG. 2 is a front view showing a schematic configuration of a polishing apparatus.
FIG. 3 is a diagram for explaining an example of a polishing method;
FIG. 4 is a process diagram for explaining an example of a polishing method;
5 is a cross-sectional view showing the shape of a grindstone . FIG. 5 (A) is a cross-sectional view taken along line AA in FIG. 3, and FIG. 5 (B) is taken along line BB in FIG. FIG. 6 is a diagram for explaining a contact polishing region by a polishing method.
FIG. 7 is a process diagram for explaining a method for producing a polishing wheel of the present invention.
FIG. 8 is a view for explaining another embodiment of the polishing method.
FIG. 9 is a process diagram for explaining another embodiment of the polishing method.
FIG. 10 is a diagram for explaining a conventional polishing method.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Polishing apparatus 2 Horizontal base 3 Vertical base 4 Rotation support shaft 7A Grinding wheel shaft 10, 50 Workpiece 11, 51 Outer peripheral part (edge part)
31 Grinding wheel 31A Grinding wheel base metal 32 Grinding wheel groove 40 Master grinding wheel

Claims (2)

(A) a step of producing a master grindstone in which the cross-sectional shape of the outer peripheral portion in the plane including the rotation axis is the same as the end cross-sectional shape of the workpiece to be polished;
(B) a step of rotating the master grindstone around the first rotation axis;
(C) a step of rotating and driving the grindstone base metal around a second rotation axis inclined by a predetermined angle (θ) with respect to the first rotation axis;
(D) pressing the outer peripheral portion of the master grindstone against the outer peripheral portion of the grindstone base metal, and forming a groove in the outer peripheral portion of the grindstone base metal;
(E) a step of fixing abrasive grains to the groove portion of the grindstone base metal,
A method for producing a polishing wheel, comprising the steps of: The method for producing a polishing wheel according to claim 1 , wherein the inclination angle (θ) is 1 ° to 45 °, preferably 5 ° to 15 °.

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