JP3763666B2 - Method for manufacturing printed wiring board - Google Patents

Method for manufacturing printed wiring board Download PDF

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Publication number
JP3763666B2
JP3763666B2 JP10427998A JP10427998A JP3763666B2 JP 3763666 B2 JP3763666 B2 JP 3763666B2 JP 10427998 A JP10427998 A JP 10427998A JP 10427998 A JP10427998 A JP 10427998A JP 3763666 B2 JP3763666 B2 JP 3763666B2
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JP
Japan
Prior art keywords
hole
printed wiring
wiring board
layer
plating
Prior art date
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Expired - Fee Related
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JP10427998A
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Japanese (ja)
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JPH11298145A (en
Inventor
圭一 岸本
昌己 上前
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Nippon Carbide Industries Co Inc
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Nippon Carbide Industries Co Inc
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Priority to JP10427998A priority Critical patent/JP3763666B2/en
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Description

【0001】
【産業上の利用分野】
本発明は、プリント配線板の製造方法に関する。
【0002】
【従来の技術】
近年、電子機器の小型化に伴いプリント配線板の小型化、高密度化、軽量化、高信頼性などが求められている。これらの要求のためにプリント配線板の製造、加工技術にも開発努力が求められている。例えば、導体幅、導体間隙、スルホール、ビアホールなどの小型化、微細化、高信頼性などが求められている。これらの要求を満たすべき開発努力、改良努力などにより穴あけ加工の改良、エッチング液の改良、メッキ液の改良、温度・時間・速度などの条件の改良、などがなされている。それらの努力において、レーザによる孔あけの技術が多く提案されている。
【0003】
【発明が解決しようとする課題】
しかしながら、レーザによる孔あけ、ビアホールの形成において従来提案の技術では、孔が大きくなる、孔が異形な形となる、導体層と絶縁層の境目での電気的接続の信頼性が悪い、などの問題がある。
【0004】
【課題を解決するための手段】
本発明は、
(1)導体層及び絶縁層を積層しビアホールを有する回路パターンを形成するプリント配線板の製造方法において、導体層を均一に薄層化して9〜1μmの厚みの導体薄層を形成する工程、該導体薄層に穴を形成する工程、該穴よりも広い面にレーザを照射して絶縁層にビアホール用の孔をあけると共に該導体薄層の穴のエッジ部が溶融して該ビアホール用の孔に付着する工程、無電解メッキ及び電解メッキの組み合わせによりメッキを施す工程、及び、サブトラクティブ方法により回路パターンを形成する工程より成ることを特徴とするプリント配線板の製造方法
(2)該ビアホール用の孔に付着することが、該ビアホール用の孔に雪崩れ込む形で付着することである上記(1)に記載のプリント配線板の製造方法、
(3)該ビアホール用の孔が深さ方向にしぼむテーパー状である上記(1)又は(2)に記載のプリント配線板の製造方法、
であり、導体薄層の穴をマスクとして広い面にレーザを照射することによりマスクとしての穴とほぼ同型で同一な径の孔を絶縁層に形成することができるため電気接続の信頼性の
高いプリント配線板を提供することである。
【0005】
以下、本発明に係るプリント配線板の製造方法について詳述する。
本発明に係るプリント配線板の製造方法は、一実施態様の断面図にて工程を示す図1の如く、導体層1及び絶縁層2を積層した基板の該導体層1を均一に薄層化して9〜1μmの厚みの導体薄層3を形成する工程、該導体薄層3に穴4を形成する工程、該導体薄層3をマスクとし該穴4よりも広い面にレーザ6を照射して該絶縁層2にビアホール用の孔5をあける工程、該導体薄層3、該孔5の内壁及び下部導体層にメッキを施してビアホール8及びメッキ層7を形成する工程並びにサブトラクティブ方法により回路パターン9を形成する工程より成ることである。また、必要に応じて表面を保護する塗膜(ソルダレジストなど)が形成される。尚、本発明に係るプリント配線板の製造方法は、図1の一実施態様に限定されるものではない。
【0006】
本発明に係るプリント配線板の製造方法における導体層1は特に限定されるものではない。一般的に使用される銅、ステンレス、ニクロム、タングステン、アルミニウムなどの金属箔がよい。好ましくは、銅箔である。更に好ましくは、大量に使用されている電解銅箔である。また、金属箔の厚さは、10〜40μmが好ましい。更に好ましくは、ハンドリングが容易であり大量に使用されている10〜25μmである。
【0007】
本発明に係るプリント配線板の製造方法における絶縁層2は絶縁性であればよく特に限定するものではない。一般的に使用されている樹脂を主成分とするものでよく、織布、不織布に前記の樹脂を含浸させたものでもよく、有機・無機の充填材を前記の樹脂に充填したものでもよく、また、これらの複合されたものでもよい。
【0008】
本発明に係るプリント配線板の製造方法における導体薄層3を形成する加工方法を特に限定するものではない。一般的に行われている機械的な研磨加工・研削加工、エッチング方法による加工などがある。銅箔を薄層化する方法として好ましくは、アルカリ系、塩化第二銅系、塩化第二鉄系、硫酸/過酸化水素系、亜硫酸塩類系、などによるエッチング方法による加工である。特に好ましくは、エッチングコントロールが容易で、表面粗度が小さく、均一エッチング性の硫酸/過酸化水素系のエッチングによる加工である。また、導体薄層3の厚みは、9〜1μmである。好ましくは、7〜1μmである。更に好ましくは、5〜2μmである。このように薄層化することにより後工程で精確でシャープな穴4が形成できる、また、レーザ加工で僅かに溶融してテーパー型の孔5が形成できる。尚、導体薄層3を形成する工程は、メッキを施す工程の前に行えばよいが、好ましくは、導体薄層とすることにより熱伝導が小さく穴の近傍で該導体薄層が僅かに溶融するためにレーザの照射前であり、より好ましくは、穴を形成する工程で導体層が薄いことにより精確な穴が形成できるため穴の形成前である。
【0009】
本発明に係るプリント配線板の製造方法における導体薄層3に穴4を形成する方法、該穴4の形状を特に限定するものではない。例えば、ドリルによる方法、エッチングによる方法などである。好ましくは、一度に多数個の該穴4が形成できるエッチング方法である。穴の形状としては、例えば円形、三角形、四角形、多角形、ティアドロップ型、などである。
【0010】
本発明に係るプリント配線板の製造方法におけるビアホール8用の孔5を形成する方法は、レーザによる方法であり、穴4よりも広い面に照射することであり、レーザの種類を限定するものではない。照射方法としては、該穴4よりも広い面にレーザを照射することであり、広い面のスポット状のレーザを照射してもよく、小径のレーザ・スポットを広い面に走査させてもよい。導体薄層3がレーザ6のマスクとなり穴4の部分の樹脂層2が除去されて孔5が形成される。該レーザの照射により該樹脂層が除去されて孔が形成されると共に該導体薄層の該穴のエッジが僅かに溶融して広くなり該孔5がテーパー状になる。
【0011】
本発明に係るプリント配線板の製造方法におけるメッキ方法は、特に限定するものでない。一般的に行われている無電解メッキ及び電解メッキの組み合わせにより孔5の内壁面、導体薄層3及び内層の導体層にメッキ層7を積層する。
【0012】
本発明に係るプリント配線板の製造方法における回路パターン9の形成方法は、サブトラクティブ方法により形成されることでありサブトラクティブ方法の工程、材料などを特に限定するものではない。
【0013】
本発明に係るプリント配線板の製造方法で製作されたプリント配線板のビアホールは、孔がテーパー状であり、導体薄層の穴のエッジにおいてメッキ膨れがなくメッキの厚みが均一となり、ビアホールの電気的接続の信頼性が高い。また、電解メッキにより形成されたエッチングファクターの大きいメッキ層をエッチングするために導体ライン幅及び間隙を狭くすることができて配線密度が向上するためにプリント配線板全体が小型化できる。
【0014】
【実施例】
以下、本発明に係るプリント配線板の製造方法の実施例を説明する。尚、本発明に係るプリント配線板の製造方法は以下の実施例に限られるものではない。
【0015】
(実施例1)
図1を用いて実施例1を説明する。内層回路パターンを形成したエポキシ樹脂系の基板に、絶縁樹脂層として約50μmのエポキシ系樹脂(絶縁層)を付着させた厚さ18μmの電解銅箔1(導体層1)及び剥離用フィルムを重ねて真空チャンバーの中で積層した(圧力25Kg、温度180度、時間120分)(図1(a))。剥離用フィルムを剥がし、次に、エッチング液として硫酸/過酸化水素系のエッチング液を用いて前記の積層した基板の該電解銅箔1を全面均一にエッチングして約3μmの電解銅箔薄層3(導体薄層3)を形成した(図1(b))。
【0016】
次に、フォトレジストドライフィルムを該電解銅箔薄層3の上に密着ラミネートし、フォトマスクフィルムを用いて露光・現像を行い、該電解銅箔薄層3のエッチングを行って複数個の穴4(直径が80〜200μmの複数種の円形の穴)を形成した(フォトエッチング方法)(図1(c))。残存のフォトレジストドライフィルムを剥がした。
【0017】
次に、炭酸ガスレーザ装置に前記の穴4を形成した基板を位置決めセットし、約280μmのビーム径の炭酸ガスレーザを該穴4よりも広い面に照射し(パルス幅50μsec)、下部導体層に到達する孔5を形成した(図1(d))。表面を観察したところ該穴4のエッジの該電解銅箔薄層3がわずかに溶融して該孔5に雪崩れ込む形で付着していて、該孔5が深さ方向にしぼむテーパー状であった。続いて一般的なスミア処理を行った。
【0018】
次に、無電解メッキ液を用いて該孔5の内壁、該電解銅箔薄層3及び内部の導体層に銅を析出させ、更に電解メッキにより該孔5の内壁、該電解銅箔薄層3及び内層の導体層に析出厚み約15μmのメッキ層7を形成してビアホール8を形成し、サブトラクティブ方法により該電解銅箔薄層3及び該メッキ層7より成る回路パターン9を形成してプリント配線板を製作した(図1(e))。
【0019】
このように製作したプリント配線板は、穴の直下での孔径が大きくなることもなく、孔が異形となることもなく、孔がテーパー状となり、ビアホールの形成による電気的接続の信頼性が向上した。また、メッキ層7が電解メッキで形成されているためエッチングファクターが大きく回路パターンのサイドエッチング幅が小さく導体ライン幅及び間隙を狭くすることができて配線密度を向上することができた。
【0020】
【発明の効果】
本発明に係るプリント配線板の製造方法は、均一に薄層化した9〜1μmの厚みの導体薄層に穴を形成し、該穴よりも広い面にレーザを照射して孔を形成し、メッキを施してビアホールを形成し、サブトラクティブ方法により回路パターンを形成することである。本発明の製造方法で製造されたプリント配線板は、ビアホールの孔が大きくなることがなく、異形となることがなく、テーパー状となり、ビアホールの形成による電気的接続の信頼性が高くなる。また、メッキ層のエッチングファクターが大きいため高密度の回路パターンが形成できる。
【0021】
【図面の簡単な説明】
【図1】本発明に係るプリント配線板の製造方法による一実施態様を示す工程の断面図である。(a)は、絶縁層に導体層が積層された断面図である。(b)は、該導体層を薄層化して導体薄層を形成した断面図である。(c)は、該導体薄層に穴を形成した図である。(d)は、該穴にレーザを照射して孔を形成する断面図である。(e)図は、メッキを施しビアホールを形成し、更に回路パターンを形成した断面図である。
【0022】
【符号の説明】
1 導体層
2 絶縁層
3 導体薄層
4 穴
5 孔
6 レーザ
7 メッキ層
8 ビアホール
9 回路パターン
[0001]
[Industrial application fields]
The present invention relates to a method for manufacturing a printed wiring board.
[0002]
[Prior art]
In recent years, with the miniaturization of electronic devices, there has been a demand for miniaturization, high density, light weight, high reliability, and the like of printed wiring boards. Because of these demands, development efforts are also required for manufacturing and processing techniques of printed wiring boards. For example, miniaturization, miniaturization, high reliability, etc. of conductor width, conductor gap, through hole, via hole, etc. are required. Improvement of drilling, improvement of etching solution, improvement of plating solution, improvement of conditions such as temperature, time, speed, etc. have been made by development efforts and improvement efforts to meet these requirements. In these efforts, many laser drilling techniques have been proposed.
[0003]
[Problems to be solved by the invention]
However, in the conventional techniques for drilling by laser and forming via holes, the hole becomes large, the hole has an irregular shape, the reliability of electrical connection at the boundary between the conductor layer and the insulating layer is poor, etc. There's a problem.
[0004]
[Means for Solving the Problems]
The present invention
(1) In a method for manufacturing a printed wiring board in which a conductor layer and an insulating layer are laminated to form a circuit pattern having a via hole, a step of uniformly thinning the conductor layer to form a conductor thin layer having a thickness of 9 to 1 μm; Forming a hole in the conductor thin layer, irradiating a laser on a surface wider than the hole to form a hole for a via hole in the insulating layer, and melting an edge portion of the hole in the conductor thin layer; A method of manufacturing a printed wiring board comprising a step of attaching to a hole, a step of plating by a combination of electroless plating and electrolytic plating , and a step of forming a circuit pattern by a subtractive method ,
(2) The method for producing a printed wiring board according to (1), wherein the adhesion to the hole for the via hole is to adhere to the hole for the via hole in the form of snow avalanche,
(3) The method for producing a printed wiring board according to the above (1) or (2), wherein the via hole has a tapered shape that is dented in the depth direction,
With a hole in the thin conductor layer as a mask, a wide surface can be irradiated with a laser to form a hole in the insulating layer that is almost the same type and the same diameter as the mask hole. It is to provide a printed wiring board.
[0005]
Hereafter, the manufacturing method of the printed wiring board concerning this invention is explained in full detail.
The method of manufacturing a printed wiring board according to the present invention uniformly thins the conductor layer 1 of the substrate on which the conductor layer 1 and the insulating layer 2 are laminated as shown in FIG. Forming a thin conductor layer 3 having a thickness of 9 to 1 μm, forming a hole 4 in the thin conductor layer 3, and irradiating a laser 6 on a surface wider than the hole 4 using the thin conductor layer 3 as a mask. A step of forming a via hole 5 in the insulating layer 2, a step of plating the thin conductor layer 3, the inner wall of the hole 5 and the lower conductor layer to form a via hole 8 and a plated layer 7, and a subtractive method. It consists of the process of forming the circuit pattern 9. Further, a coating film (solder resist or the like) for protecting the surface is formed as necessary. In addition, the manufacturing method of the printed wiring board based on this invention is not limited to one embodiment of FIG.
[0006]
The conductor layer 1 in the method for manufacturing a printed wiring board according to the present invention is not particularly limited. Commonly used metal foils such as copper, stainless steel, nichrome, tungsten, and aluminum are preferable. Preferably, it is a copper foil. More preferably, it is the electrolytic copper foil used in large quantities. Moreover, as for the thickness of metal foil, 10-40 micrometers is preferable. More preferably, it is 10 to 25 μm which is easy to handle and is used in large quantities.
[0007]
The insulating layer 2 in the method for manufacturing a printed wiring board according to the present invention is not particularly limited as long as it is insulative. It may be based on a resin that is generally used, may be a woven fabric, a nonwoven fabric impregnated with the resin, or may be filled with an organic / inorganic filler, Also, a composite of these may be used.
[0008]
The processing method which forms the conductor thin layer 3 in the manufacturing method of the printed wiring board which concerns on this invention is not specifically limited. There are mechanical polishing / grinding and etching methods that are generally used. The method for thinning the copper foil is preferably processing by an etching method using an alkali type, cupric chloride type, ferric chloride type, sulfuric acid / hydrogen peroxide type, sulfite type, or the like. Particularly preferred is processing by etching of sulfuric acid / hydrogen peroxide system, which is easy to control etching, has a small surface roughness, and is uniformly etched. Moreover, the thickness of the conductor thin layer 3 is 9-1 micrometer. Preferably, it is 7-1 micrometer. More preferably, it is 5-2 micrometers. By thinning in this way, an accurate and sharp hole 4 can be formed in a later process, and a tapered hole 5 can be formed by slightly melting by laser processing. The step of forming the conductor thin layer 3 may be performed before the step of plating. Preferably, the conductor thin layer has a low heat conduction and the conductor thin layer slightly melts in the vicinity of the hole. Therefore, it is before the laser irradiation, and more preferably before the formation of the hole, because an accurate hole can be formed by the thin conductor layer in the step of forming the hole.
[0009]
The method of forming the hole 4 in the thin conductor layer 3 in the method for manufacturing a printed wiring board according to the present invention, and the shape of the hole 4 are not particularly limited. For example, a method using a drill or a method using etching. Preferably, the etching method can form a large number of the holes 4 at a time. Examples of the shape of the hole include a circle, a triangle, a quadrangle, a polygon, and a teardrop type.
[0010]
The method for forming the hole 5 for the via hole 8 in the method for manufacturing a printed wiring board according to the present invention is a method using a laser, which irradiates a surface wider than the hole 4, and does not limit the type of laser. Absent. The irradiation method is to irradiate a laser with a surface wider than the hole 4, and may irradiate a wide surface spot-like laser, or scan a small laser spot on a wide surface. The thin conductor layer 3 serves as a mask for the laser 6 and the resin layer 2 in the hole 4 is removed to form the hole 5. The resin layer is removed by the laser irradiation to form a hole, and the edge of the hole of the thin conductor layer is slightly melted and widened, and the hole 5 becomes tapered.
[0011]
The plating method in the method for manufacturing a printed wiring board according to the present invention is not particularly limited. A plating layer 7 is laminated on the inner wall surface of the hole 5, the conductor thin layer 3, and the inner conductor layer by a combination of electroless plating and electrolytic plating that is generally performed.
[0012]
The method for forming the circuit pattern 9 in the method for manufacturing a printed wiring board according to the present invention is formed by a subtractive method and does not particularly limit the steps, materials, and the like of the subtractive method.
[0013]
The via hole of the printed wiring board manufactured by the method for manufacturing a printed wiring board according to the present invention has a tapered hole, and there is no plating swelling at the edge of the hole in the thin conductor layer, and the plating thickness is uniform. Connection reliability is high. Further, the conductor line width and the gap can be narrowed to etch the plating layer having a large etching factor formed by electrolytic plating, and the wiring density is improved, so that the entire printed wiring board can be miniaturized.
[0014]
【Example】
Examples of the method for producing a printed wiring board according to the present invention will be described below. In addition, the manufacturing method of the printed wiring board based on this invention is not restricted to a following example.
[0015]
Example 1
Example 1 will be described with reference to FIG. On the epoxy resin substrate on which the inner layer circuit pattern is formed, an electrolytic copper foil 1 (conductor layer 1) having a thickness of 18 μm and an exfoliating film with an epoxy resin (insulating layer) of about 50 μm attached as an insulating resin layer are stacked. Then, they were laminated in a vacuum chamber (pressure 25 kg, temperature 180 degrees, time 120 minutes) (FIG. 1 (a)). The peeling film is peeled off, and then the electrolytic copper foil 1 of the laminated substrate is uniformly etched over the entire surface using a sulfuric acid / hydrogen peroxide-based etching solution as an etching solution. 3 (thin conductor layer 3) was formed (FIG. 1B).
[0016]
Next, a photoresist dry film is closely laminated on the electrolytic copper foil thin layer 3, exposed and developed using a photomask film, and the electrolytic copper foil thin layer 3 is etched to form a plurality of holes. 4 (multiple types of circular holes having a diameter of 80 to 200 μm) were formed (photo etching method) (FIG. 1C). The remaining photoresist dry film was peeled off.
[0017]
Next, the substrate on which the hole 4 is formed is positioned and set in the carbon dioxide laser device, and a carbon dioxide laser having a beam diameter of about 280 μm is irradiated to a surface wider than the hole 4 (pulse width 50 μsec) to reach the lower conductor layer. A hole 5 was formed (FIG. 1 (d)). When the surface was observed, the electrolytic copper foil thin layer 3 at the edge of the hole 4 was slightly melted and adhered to the hole 5 so as to collapse into a snow, and the hole 5 was tapered so as to dent in the depth direction. there were. Subsequently, general smear treatment was performed.
[0018]
Next, copper is deposited on the inner wall of the hole 5, the electrolytic copper foil thin layer 3 and the inner conductor layer using an electroless plating solution, and further, the inner wall of the hole 5 and the electrolytic copper foil thin layer are formed by electrolytic plating. A plating layer 7 having a deposition thickness of about 15 μm is formed on the conductor layer 3 and the inner layer to form a via hole 8, and a circuit pattern 9 comprising the electrolytic copper foil thin layer 3 and the plating layer 7 is formed by a subtractive method. A printed wiring board was manufactured (FIG. 1 (e)).
[0019]
The printed wiring board manufactured in this way does not have a large hole diameter immediately below the hole, the hole does not become irregular, the hole is tapered, and the reliability of electrical connection is improved by forming a via hole. did. Further, since the plating layer 7 is formed by electrolytic plating, the etching factor is large, the side etching width of the circuit pattern is small, the conductor line width and the gap can be narrowed, and the wiring density can be improved.
[0020]
【The invention's effect】
The method for producing a printed wiring board according to the present invention forms a hole by forming a hole in a thin conductor layer having a thickness of 9 to 1 μm that is uniformly thinned, and irradiates a laser on a surface wider than the hole, A via hole is formed by plating, and a circuit pattern is formed by a subtractive method. The printed wiring board manufactured by the manufacturing method of the present invention does not have a large via hole, does not have an irregular shape, has a tapered shape, and has high reliability of electrical connection due to the formation of the via hole. Moreover, since the etching factor of the plating layer is large, a high-density circuit pattern can be formed.
[0021]
[Brief description of the drawings]
FIG. 1 is a cross-sectional view of a process showing an embodiment of a method for producing a printed wiring board according to the present invention. (A) is sectional drawing by which the conductor layer was laminated | stacked on the insulating layer. (B) is sectional drawing which formed the conductor thin layer by thinning this conductor layer. (C) is the figure which formed the hole in this conductor thin layer. (D) is sectional drawing which forms a hole by irradiating a laser to this hole. (E) is a cross-sectional view in which a via hole is formed by plating and a circuit pattern is further formed.
[0022]
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Conductor layer 2 Insulating layer 3 Conductor thin layer 4 Hole 5 Hole 6 Laser 7 Plating layer 8 Via hole 9 Circuit pattern

Claims (3)

導体層及び絶縁層を積層しビアホールを有する回路パターンを形成するプリント配線板の製造方法において、導体層を均一に薄層化して9〜1μmの厚みの導体薄層を形成する工程、該導体薄層に穴を形成する工程、該穴よりも広い面にレーザを照射して絶縁層にビアホール用の孔をあけると共に該導体薄層の穴のエッジ部が溶融して該ビアホール用の孔に付着する工程、無電解メッキ及び電解メッキの組み合わせによりメッキを施す工程、及び、サブトラクティブ方法により回路パターンを形成する工程より成ることを特徴とするプリント配線板の製造方法。In a method of manufacturing a printed wiring board in which a conductor layer and an insulating layer are laminated to form a circuit pattern having via holes, a step of uniformly thinning the conductor layer to form a conductor thin layer having a thickness of 9 to 1 μm, Forming a hole in the layer, irradiating a surface wider than the hole with a laser to form a hole for the via hole in the insulating layer, and melting the edge of the hole in the thin conductor layer to adhere to the hole for the via hole A printed wiring board manufacturing method comprising: a step of performing plating, a step of plating by a combination of electroless plating and electrolytic plating , and a step of forming a circuit pattern by a subtractive method. 該ビアホール用の孔に付着することが、該ビアホール用の孔に雪崩れ込む形で付着することである請求項1に記載のプリント配線板の製造方法。The method for producing a printed wiring board according to claim 1, wherein the adhesion to the hole for the via hole is to adhere to the hole for the via hole in such a manner that it snows. 該ビアホール用の孔が深さ方向にしぼむテーパー状である請求項1又は請求項2に記載のプリント配線板の製造方法。The method for manufacturing a printed wiring board according to claim 1, wherein the via hole has a tapered shape that is dented in the depth direction.
JP10427998A 1998-04-15 1998-04-15 Method for manufacturing printed wiring board Expired - Fee Related JP3763666B2 (en)

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JP10427998A JP3763666B2 (en) 1998-04-15 1998-04-15 Method for manufacturing printed wiring board

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JP10427998A JP3763666B2 (en) 1998-04-15 1998-04-15 Method for manufacturing printed wiring board

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JP3763666B2 true JP3763666B2 (en) 2006-04-05

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JP4722904B2 (en) * 2007-12-17 2011-07-13 イビデン株式会社 Multilayer printed circuit board manufacturing method

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