JP3673329B2 - 基板処理装置および洗浄方法 - Google Patents
基板処理装置および洗浄方法 Download PDFInfo
- Publication number
- JP3673329B2 JP3673329B2 JP17634896A JP17634896A JP3673329B2 JP 3673329 B2 JP3673329 B2 JP 3673329B2 JP 17634896 A JP17634896 A JP 17634896A JP 17634896 A JP17634896 A JP 17634896A JP 3673329 B2 JP3673329 B2 JP 3673329B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- substrate
- processing
- timing
- cleaning means
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004140 cleaning Methods 0.000 title claims description 332
- 239000000758 substrate Substances 0.000 title claims description 222
- 238000000034 method Methods 0.000 title claims description 98
- 239000010409 thin film Substances 0.000 claims description 36
- 239000007788 liquid Substances 0.000 claims description 33
- 230000002093 peripheral effect Effects 0.000 claims description 21
- 238000011144 upstream manufacturing Methods 0.000 claims description 13
- 229920002120 photoresistant polymer Polymers 0.000 description 26
- 239000000243 solution Substances 0.000 description 16
- 239000002245 particle Substances 0.000 description 10
- 238000001035 drying Methods 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 238000002347 injection Methods 0.000 description 6
- 239000007924 injection Substances 0.000 description 6
- 238000001514 detection method Methods 0.000 description 5
- 238000005507 spraying Methods 0.000 description 5
- 238000003860 storage Methods 0.000 description 4
- 239000000428 dust Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 230000001174 ascending effect Effects 0.000 description 2
- 239000012459 cleaning agent Substances 0.000 description 2
- 230000003111 delayed effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17634896A JP3673329B2 (ja) | 1996-07-05 | 1996-07-05 | 基板処理装置および洗浄方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17634896A JP3673329B2 (ja) | 1996-07-05 | 1996-07-05 | 基板処理装置および洗浄方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004365354A Division JP4006003B2 (ja) | 2004-12-17 | 2004-12-17 | 基板処理装置および洗浄方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH1022204A JPH1022204A (ja) | 1998-01-23 |
| JPH1022204A5 JPH1022204A5 (enExample) | 2004-07-08 |
| JP3673329B2 true JP3673329B2 (ja) | 2005-07-20 |
Family
ID=16012036
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17634896A Expired - Fee Related JP3673329B2 (ja) | 1996-07-05 | 1996-07-05 | 基板処理装置および洗浄方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3673329B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3381776B2 (ja) * | 1998-05-19 | 2003-03-04 | 東京エレクトロン株式会社 | 処理装置および処理方法 |
| JP2009087958A (ja) * | 2006-01-06 | 2009-04-23 | Tokyo Electron Ltd | 洗浄・乾燥処理方法及びその装置並びにそのプログラム |
| US8439051B2 (en) | 2006-05-15 | 2013-05-14 | Tokyo Electron Limited | Method of substrate processing, substrate processing system, and storage medium |
| JP4830751B2 (ja) * | 2006-09-22 | 2011-12-07 | 凸版印刷株式会社 | 基板のアライメント装置 |
| JP4983565B2 (ja) * | 2006-12-20 | 2012-07-25 | 東京エレクトロン株式会社 | 基板洗浄装置、基板洗浄方法及び記憶媒体 |
| JP4694637B2 (ja) * | 2009-06-09 | 2011-06-08 | シャープ株式会社 | 気相成長装置 |
| JP6993871B2 (ja) * | 2017-12-28 | 2022-01-14 | 東京応化工業株式会社 | 塗布装置及び塗布装置の制御方法 |
-
1996
- 1996-07-05 JP JP17634896A patent/JP3673329B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH1022204A (ja) | 1998-01-23 |
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