JP3624528B2 - 投影光学系の結像特性評価方法及び該方法を使用する投影露光装置 - Google Patents

投影光学系の結像特性評価方法及び該方法を使用する投影露光装置 Download PDF

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Publication number
JP3624528B2
JP3624528B2 JP06788396A JP6788396A JP3624528B2 JP 3624528 B2 JP3624528 B2 JP 3624528B2 JP 06788396 A JP06788396 A JP 06788396A JP 6788396 A JP6788396 A JP 6788396A JP 3624528 B2 JP3624528 B2 JP 3624528B2
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Prior art keywords
optical system
photosensitive substrate
projection optical
measurement points
image
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Expired - Fee Related
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JP06788396A
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Japanese (ja)
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JPH09260252A (ja
JPH09260252A5 (enrdf_load_html_response
Inventor
正彦 奥村
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Nikon Corp
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Nikon Corp
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Priority to JP06788396A priority Critical patent/JP3624528B2/ja
Priority to KR1019970010275A priority patent/KR970067585A/ko
Priority to US08/824,219 priority patent/US5985495A/en
Publication of JPH09260252A publication Critical patent/JPH09260252A/ja
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Publication of JP3624528B2 publication Critical patent/JP3624528B2/ja
Publication of JPH09260252A5 publication Critical patent/JPH09260252A5/ja
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Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP06788396A 1996-03-25 1996-03-25 投影光学系の結像特性評価方法及び該方法を使用する投影露光装置 Expired - Fee Related JP3624528B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP06788396A JP3624528B2 (ja) 1996-03-25 1996-03-25 投影光学系の結像特性評価方法及び該方法を使用する投影露光装置
KR1019970010275A KR970067585A (ko) 1996-03-25 1997-03-21 결상특성의 측정방법 및 투영노광방법
US08/824,219 US5985495A (en) 1996-03-25 1997-03-25 Methods for measuring image-formation characteristics of a projection-optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06788396A JP3624528B2 (ja) 1996-03-25 1996-03-25 投影光学系の結像特性評価方法及び該方法を使用する投影露光装置

Publications (3)

Publication Number Publication Date
JPH09260252A JPH09260252A (ja) 1997-10-03
JP3624528B2 true JP3624528B2 (ja) 2005-03-02
JPH09260252A5 JPH09260252A5 (enrdf_load_html_response) 2005-04-07

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JP06788396A Expired - Fee Related JP3624528B2 (ja) 1996-03-25 1996-03-25 投影光学系の結像特性評価方法及び該方法を使用する投影露光装置

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999026278A1 (fr) * 1997-11-14 1999-05-27 Nikon Corporation Dispositif d'exposition, procede de fabrication associe, et procede d'exposition
WO2000030163A1 (fr) * 1998-11-18 2000-05-25 Nikon Corporation Procede et dispositif d'exposition
US6275770B1 (en) * 1999-05-27 2001-08-14 Ipec Precision Inc. Method to remove station-induced error pattern from measured object characteristics and compensate the measured object characteristics with the error
JP3780221B2 (ja) 2002-03-26 2006-05-31 キヤノン株式会社 露光方法及び装置
JP5434353B2 (ja) * 2009-08-06 2014-03-05 株式会社ニコン 表面検査装置および表面検査方法

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JPH09260252A (ja) 1997-10-03

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