JP3588243B2 - Plasma display device and method of manufacturing the same - Google Patents

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a plasma display device and a method for manufacturing the same.
[0002]
[Prior art]
Plasma display devices are large-area, high-quality image display devices that are lightweight, thin, and are not subject to restrictions on installation locations and the like. Attention has been paid to color display devices and the like.
[0003]
In this plasma display device, as shown in FIG. 3, a plurality of partitions 2 are formed on a back plate 1, a space between the partitions 2 is used as a discharge display cell 5, and an address electrode 3 is formed on the bottom surface. On the other hand, a front plate 6 provided with a discharge electrode 7 is joined to the upper part of the partition wall 2 so that the discharge display cell 5 is filled with a discharge gas such as a rare gas. Then, a plasma is generated by a discharge between the address electrode 3 and the discharge electrode 7, and a phosphor (not shown) applied in the discharge display cell 5 emits light by ultraviolet light emitted from the plasma to emit light on the screen. It is used as
[0004]
As shown in an enlarged view of the discharge display cell 5 in FIG. 4, the phosphor 4 is applied to the inner surface of the discharge display cell 5. There is a method using a thick film printing method of applying between the partition walls 2 by using the method. At this time, in order to improve the brightness of the panel, a method of applying the phosphor 4 to the side surface of the partition 2 using the fluidity of the phosphor paste applied by the thick film printing method is used.
[0005]
The phosphor 4 applied by the above-described method is applied to the entire side surface of the partition wall 2 and has a uniform coating thickness and must not be mixed with another phosphor 4 between the adjacent partition walls 2. .
[0006]
[Problems to be solved by the present invention]
However, since the side surface of the partition 2 is smooth, there is a problem that the adhesion of the applied phosphor 4 is poor.
[0007]
For this reason, even if the phosphor 4 is applied so as to have a state as shown in FIG. 2, the phosphor 4 applied to the side surface of the partition wall 2 flows downward, so that a large amount of the phosphor 4 is required to be applied to the entire wall surface. In addition, since the thickness of the phosphor 4 applied to the side surface of the partition wall 2 is reduced, there is a disadvantage that the emission luminance cannot be sufficiently increased.
[0008]
Thus, as disclosed in Japanese Patent Application Laid-Open No. 7-37511, it has been proposed to make the surface of the partition 2 uneven, but it is extremely difficult to process the surface of the minute partition 2 into an uneven shape. Was.
[0009]
The present invention has been devised in view of the above problems, and has as its object to obtain a plasma display device having a partition 2 to which a phosphor 4 having a sufficient thickness can be applied by a simple manufacturing process. I do.
[0010]
[Means for Solving the Problems]
In view of the above problems, the present invention has a plurality of partitions partitioning the space between a back plate and a front plate facing each other with a certain space therebetween, and a discharge electrode is formed in a discharge display cell formed between the partitions. And a plasma display device comprising an address electrode and a phosphor applied to the inner wall surface of the discharge display cell, wherein the partition walls are composed of a matrix component and hard particles, and the hard particles are exposed on the surface to form an uneven shape. , Characterized in that the hard particles are present only on the surface of the partition wall and not inside.
Further, the hard particles have an average particle diameter in a range of 0.1 to 50 μm.
Further, two kinds of the hard particles for forming the irregularities and the other hard particles used as a reinforcing material of the partition wall are used.
Further, on the back plate, a matrix component is applied, hard particles are sprayed on the surface, and a mold is pressed to form a partition having the hard particles exposed on the surface, and after baking, the phosphor is coated thereon. And bonding the front plate.
Further, on the back plate, after forming a plurality of partitions composed of a matrix component, spray hard particles on the surface and sintering, apply a phosphor on this, it is characterized by including a step of joining the front plate I do.
[0016]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, a reference embodiment of the present invention will be described with reference to the drawings.
[0017]
As shown in an enlarged view of the discharge display cell 5 in FIG. 1, a plurality of partitions 2 are formed on a back plate 1, a space between each partition 2 is formed as a discharge display cell 5, and an address electrode 3 is formed on the bottom surface. Then, the phosphor 4 is applied to the inside of the discharge display cell 5. Then, as shown in FIG. 3, a front plate 6 provided with a discharge electrode 7 is joined to the upper part of the partition wall 2 and a discharge gas is sealed in each discharge display cell 5, whereby a plasma display device can be constructed. .
[0018]
Here, in the plasma display device of the present invention, the partition wall 2 is composed of a matrix component 2a such as glass and the hard particles 2b contained therein, and the hard particles 2b are exposed on the surface and have an uneven shape. Therefore, the fluorescent substance 4 applied to the side surface of the partition wall 2 becomes less likely to flow due to the uneven shape, and the adhesion can be improved. As a result, the phosphor 4 having a uniform thickness can be applied in the discharge display cell 5 with a small application amount.
[0019]
The material of the matrix component 2a of the partition wall 2 is a low-melting glass such as lead borosilicate glass, and the material of the back plate 1 is soda lime glass or various ceramics. As the hard particles 2b, fine powder of a metal oxide such as alumina, zirconia, or titania is used. By containing the hard particles 2b, it is possible to improve the strength of the partition walls 2 and to color the partition walls 2 as well.
[0020]
Further, the height of the concavo-convex shape formed by the hard particles 2b is preferably in the range of 0.1 to 50 μm. This is because if the thickness is less than 0.1 μm, the effect of improving the adhesion of the phosphor 4 is poor, while if it exceeds 50 μm, the strength of the partition walls 2 is reduced, and discharge voids are reduced. In addition, in order to obtain such a height of irregularities, the average particle diameter of the hard particles 2b may be set within a range of 0.1 to 50 μm, preferably 1 to 10 μm.
[0021]
Further, the hard particles 2b are preferably contained in the range of 0.5 to 75% by volume based on the entire partition wall 2. This is because if the content is less than 0.5% by volume, the above effect is poor, and if it exceeds 75% by volume, the sinterability is reduced.
[0022]
Next, a method of manufacturing the partition wall 2 having such an uneven shape will be described.
[0023]
First, as a material for forming the partition wall 2, a paste is prepared by mixing a mixed powder of a matrix component 2a such as a low melting glass powder and a hard particle 2b such as a ceramic with a binder. At this time, two types of hard particles 2b for forming the unevenness and hard particles used as a reinforcing material for the partition 2 can be used. In this case, the hard particles 2b for forming the unevenness are formed of the partition 2 Mix immediately before. Next, using this paste, the partition 2 is formed on the back plate 1 by molding using a mold or the like, and firing is performed.
[0024]
After firing, the surface of the obtained partition wall 2 is subjected to etching or sandblasting to remove the matrix component 2a and expose the hard particles 2b to the surface to form an uneven shape.
[0025]
Here, as an etching method, chemical etching using an acid-based etchant is performed. Specifically, a solution composed of at least one of hydrofluoric acid, nitric acid, sulfuric acid, and acetic acid, or a solution in which ammonia or the like is added to have a buffer function so that the etching rate can be controlled is used. In sand blasting, alumina fine powder is used as a grinding material, and the grinding conditions can be changed by changing the particle size of the grinding material, the blast injection pressure, and the angle with respect to the workpiece.
[0026]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
[0027]
2 is different from the above-described embodiment in that the hard particles 2b are present only on the surface of the partition wall 2 and are not present inside, but are otherwise the same.
[0028]
The method of manufacturing such a partition 2 is as follows. First, a paste consisting only of the matrix component 2a is prepared. Next, after this was applied to the entire surface of the back plate 1, the hard particles 2b were sprayed on the surface thereof, and a mold member was pressed thereon to form the partition walls 2, whereby the hard particles 2b were present only on the surface. When the partition walls 2 are obtained and fired, the hard particles 2b are partially embedded in the partition walls 2 to obtain the structure shown in FIG.
[0029]
Alternatively, after the partition 2 is formed on the back plate 1 using only the matrix component 2a, the hard particles 2b are sprayed on the surface and baked, whereby the partition 2 is melted and the hard particles 2b are embedded in the surface. The structure shown in FIG.
[0030]
Note that the partition wall 2 constituting the above-described plasma display device of the present invention has a tapered shape such that the width decreases toward the front plate 6, thereby facilitating the application of the phosphor 4 to the inner surface of the discharge display cell 5. As a shape.
[0031]
【Example】
Reference Example 1
Hereinafter, reference examples and examples of the present invention will be described.
[0032]
A low-melting-point glass made of lead borosilicate glass was used as the matrix component 2a forming the partition walls 2, a ceramic filler made of alumina, zirconia, and titania was used as the hard particles 2b, and a paste was prepared by mixing the two. Particularly with respect to alumina, alumina having an average particle size of 5 μm was added so as to be 5% by weight based on the total powder weight.
[0033]
A 400 × 500 × 2 mm soda lime glass substrate was used as the back plate 1, and a partition 2 was formed thereon with a width of 50 μm, a height of 150 μm, and a pitch of 220 μm, and the partition 2 was formed in air at a temperature of 550 to 600 ° C. The firing was performed.
[0034]
The obtained back plate 1 was immersed in 30% by volume hydrofluoric acid and etched. After the etching was completed, the acid was washed away with water, and at the same time, ultrasonic irradiation was performed to remove etching dust between the partition walls 2.
[0035]
When a cross-sectional SEM observation of the obtained back plate 1 was performed, it was confirmed that the surface of the partition wall 2 had an uneven shape of about 1 to 3 μm. When the paste of the phosphor 4 was applied to the partition wall 2 having the uneven surface by the thick film printing method, a phosphor layer having a thickness of 15 μm could be formed. In addition, since the thickness of the conventional phosphor layer was about 5 to 10 μm, it was found that the coating thickness of the phosphor 4 could be sufficiently increased.
[0036]
Example 1
In the same manner as in Reference Example 1, the partition 2 was formed on the back plate 1, and before baking, a resin layer was applied on the top of the partition 2 to form a protective layer against sandblasting.
[0037]
Then, after intensively sandblasting the side surfaces of the partition 2, the partition 2 was fired at a temperature of 550 to 600 ° C. in the air. After the firing, ultrasonic irradiation in water was performed to remove blast debris between the partition walls 2.
[0038]
When a cross-sectional SEM observation of the obtained rear plate 1 was performed, it was found that the partition wall 2 had an uneven surface of about 1 to 3 μm. Further, when the paste of the phosphor 4 was applied to the partition walls 2 by a thick film printing method, a phosphor layer having a thickness of 15 μm could be formed, and it was found that the applied thickness could be sufficiently increased similarly to the above-described embodiment.
[0039]
Example 2
A 400 × 500 × 3 mm glass substrate was used as the back plate 1, and only the matrix component 2 a of the partition wall 2 was uniformly coated with a thickness of several tens μm on this. Next, a solution in which 5% by weight of alumina having an average particle size of 2 μm was added to the organic solvent as the hard particles 2b and dispersed with a dispersant was prepared, and this was uniformly sprayed on the coating film of the matrix component 2a. did.
[0040]
A molding die was pressed against this surface to perform pressure molding to form the partition wall 2. After the completion of the firing, a cross-sectional SEM observation of the back plate 1 was performed. As a result, a partition wall 2 having a structure as shown in FIG. 2 and having an uneven surface of about 2 to 4 μm was obtained. Further, when the paste of the phosphor 4 was applied to the partition walls 2 by a thick film printing method, a phosphor layer having a thickness of 18 μm was formed, and it was found that the applied thickness could be sufficiently increased.
[0041]
Example 3
A glass substrate of 400 × 500 × 3 mm was used as the back plate 1, and the partition 2 was formed thereon by pressure molding using only a matrix component 2 a of the partition 2 with a molding die. Next, a solution in which 5% by weight of alumina having an average particle size of 2 μm was added to the organic solvent as the hard particles 2b and dispersed with a dispersant was prepared, and the solution was uniformly sprayed on the surface of the partition wall 2 before firing. .
[0042]
After baking, the obtained back plate 1 was subjected to SEM observation in cross section. As a result, a partition wall 2 having a structure as shown in FIG. 2 and having an uneven surface of about 2 to 4 μm was obtained. Further, when the paste of the phosphor 4 was applied to the partition walls 2 by a thick film printing method, it was found that a phosphor layer of 18 μm could be formed, and the applied thickness could be sufficiently increased.
[0043]
【The invention's effect】
As described above, according to the present invention, in the plasma display device, the partition walls are formed from the matrix component and the hard particles, and the hard particles are exposed on the surface to provide the unevenness, so that the space between the partition walls can be easily filled. Even if a phosphor paste having high fluidity is used, a thick phosphor can be applied to the side wall of the partition wall, and the yield of the phosphor application step is improved. In addition, as a result of the phosphor being applied thickly to the side wall of the partition, a plasma display device with high brightness and high image quality can be manufactured.
[0044]
Further, according to the present invention, by forming the partition walls by embedding the hard particles in the surface of the matrix component, it is possible to manufacture the partition walls having the uneven shape on the surface by a simple process.
[Brief description of the drawings]
FIG. 1 is an enlarged sectional view of a discharge display cell in a plasma display device according to a reference example of the present invention.
FIG. 2 is an enlarged sectional view of a discharge display cell in the embodiment of the plasma display device of the present invention.
FIG. 3 is a cross-sectional view illustrating a configuration of a general plasma display device.
FIG. 4 is an enlarged sectional view of a discharge display cell in a conventional plasma display device.
[Explanation of symbols]
1: Back plate 2: Partition wall 2a: Matrix component 2b: Hard particles 3: Address electrode 4: Phosphor 5: Discharge display cell 6: Front plate 7: Discharge electrode

Claims (5)

A plurality of partitions partitioning the space are provided between a rear plate and a front plate facing each other with a certain space therebetween, and a discharge electrode and an address electrode are provided in a discharge display cell formed between the partitions, and the discharge display is provided. In a plasma display device in which a phosphor is applied to the inner wall surface of a cell, the partition walls are composed of a matrix component and hard particles, and the hard particles are exposed on the surface to form irregularities, and the hard particles are present only on the surfaces of the partition walls. And a plasma display device which does not exist inside . 2. The plasma display device according to claim 1, wherein said hard particles have an average particle size in a range of 0.1 to 50 [mu] m. 2. The plasma display device according to claim 1, wherein two types of the hard particles for forming the uneven shape and other hard particles used as a reinforcing material of the partition wall are used. On the back plate, a matrix component is applied, hard particles are sprayed on the surface, and a molding die is pressed to form a partition having the hard particles exposed on the surface, and after baking, the phosphor is coated thereon. A method for manufacturing a plasma display device, comprising a step of applying and joining a front plate. Production of a plasma display device including a step of forming a plurality of partition walls composed of a matrix component on a back plate, spraying hard particles on the surface and firing the particles, applying a phosphor thereon, and joining the front plate. Method.

Images