JPH11219658A - Plasma display device and its manufacture - Google Patents

Abstract

PROBLEM TO BE SOLVED: To increase the adhesive property of a phosphor, to allow thick coating and to provide high luminance by forming barrier ribs partitioning the space between a back plate and a front plate with a matrix component and hard grains, and exposing the hard grains on the surface into an irregular shape. SOLUTION: Hard grains 2b are contained in a matrix component 2a such as glass and are exposed on the surface of a barrier rib 2 into an irregular shape, thus the phosphor 4 applied on the side face of the barrier rib 2 hardly flows, the adhesive property to the barrier rib 2 is improved, and the phosphor 4 can be applied into a discharge display cell 5 at a uniform thickness with a small coated quantity. Low-melting point glass such as lead boro-silicate glass is used for the material of the matrix 2a, and fine grains with the average grain size 0.1-50 μm made of a metal oxide such as alumina or zirconia are used for the hard grains 2b. The height of the irregular shape is set to 0.1-50 μm in view of the adhesive property of the phosphor 4 and the strength of the barrier rib 2, and the content of the hard grains 2b against the whole barrier rib 2 is set to the range of 0.5-75 vol.% in view of the adhesive property and sintering property.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a plasma display device and a method for manufacturing the same.

[0002]

2. Description of the Related Art In recent years, a plasma display device is a large-area, high-quality image display device that is lightweight, thin, and has no restrictions on installation locations. , Thin and large-screen color display devices and the like.

In this plasma display device, as shown in FIG. 3, a plurality of partitions 2 are formed on a back plate 1, a space between each partition 2 is used as a discharge display cell 5, and an address electrode 3 is provided on the bottom surface. On the other hand, a front plate 6 provided with a discharge electrode 7 is joined to an upper portion of the partition wall 2 so that the discharge display cell 5 is filled with a discharge gas such as a rare gas. Then, plasma is generated by the discharge between the address electrode 3 and the discharge electrode 7, and the discharge display cell 5 is generated by the ultraviolet light emitted from the plasma.
A phosphor (not shown) applied in the inside emits light and is used as a light emitting element of a screen.

[0004] As shown in an enlarged view of the discharge display cell 5 in FIG. 4, a phosphor 4 is applied to the inner surface of the discharge display cell 5, and the coating method is as follows. There is a method using a thick film printing method in which a coating is applied between the partition walls 2 by a screen printing method. At this time, in order to improve the brightness of the panel, a method of applying the phosphor 4 to the side surface of the partition 2 using the fluidity of the phosphor paste applied by the thick film printing method is used.

[0005] The phosphor 4 applied by the above method is
The coating is applied to the entire side surface of the partition wall 2, the coating thickness is uniform, and color mixing with another phosphor 4 between the adjacent partition walls 2 must not occur.

[0006]

However, since the side surfaces of the partition walls 2 are smooth, there is a problem that the adhesion of the applied phosphor 4 is poor.

For this reason, even if the phosphor 4 is applied so as to be in the state as shown in FIG. 2, the phosphor 4 applied to the side surface of the partition wall 2 flows downward. In addition, since the thickness of the phosphor 4 applied to the side surface of the partition 2 becomes thin, there is a disadvantage that the emission luminance cannot be sufficiently increased.

Therefore, as disclosed in Japanese Patent Application Laid-Open No. 7-37511, it has been proposed to make the surface of the partition 2 uneven, but it is extremely difficult to process the surface of the minute partition 2 into an uneven shape. It was difficult.

The present invention has been devised in view of the above problems, and provides a plasma display device having a partition wall 2 on which a phosphor 4 having a sufficient thickness can be applied by a simple manufacturing process. With the goal.

[0010]

According to the present invention, there is provided a discharge display cell having a partition between the rear plate and the front plate which is separated by a certain space and partitioning the space. In a plasma display device comprising a discharge electrode and an address electrode, and a phosphor applied on the inner surface, the partition walls are formed from a matrix component and hard particles, and the hard particles are exposed on the surface to form an uneven shape. It is characterized by.

That is, the present inventors have made intensive studies in view of the above-mentioned problems, and as a result, exposed hard particles to the surface of the partition walls, and the surface unevenness formed by the hard particles can be easily manufactured, and furthermore, the coating can be performed by coating. It has been found that the adhesion of the phosphor obtained can be improved.

Further, according to the present invention, a plurality of partitions are formed on a back plate from a material composed of a matrix component and hard particles, and after baking, the surface of the partitions is subjected to a treatment such as etching or sandblasting to remove the matrix components. The method is characterized by a method of manufacturing a plasma display device including a step of removing and exposing the hard particles to form a concavo-convex shape, applying a phosphor thereon, and joining a front plate.

Further, according to the present invention, a matrix component is applied on a back plate, hard particles are sprayed on the surface, and a molding die is pressed to form a partition having the hard particles exposed on the surface and fired. Later, apply a phosphor on this,
A method for manufacturing a plasma display device including a step of bonding a front plate is characterized.

Further, according to the present invention, a plurality of partitions composed of a matrix component are formed on a back plate, hard particles are sprayed on the surface and fired, and then a phosphor is applied thereon, and the front plate is joined. A method for manufacturing a plasma display device including a step is provided.

That is, according to the present invention, the hard particles can be easily exposed on the surface of the partition wall by the above method,
Thus, an uneven shape can be obtained.

[0016]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described with reference to the drawings.

As shown in an enlarged view of the discharge display cell 5 in FIG. 1, a plurality of barrier ribs 2 are formed on a back plate 1, a space between the barrier ribs 2 is defined as a discharge display cell 5, and an address electrode is provided on the bottom surface. 3 are formed, and the phosphors 4 are applied in the discharge display cells 5. Then, as shown in FIG. 3, a plasma display device can be constructed by joining a front plate 6 provided with a discharge electrode 7 to an upper portion of the partition wall 2 and filling each discharge display cell 5 with a discharge gas. .

Here, in the plasma display device of the present invention,
The partition wall 2 is composed of a matrix component 2a such as glass and hard particles 2b contained therein, and the hard particles 2b are exposed on the surface and have irregularities. For this reason, the phosphor 4 applied to the side surface of the partition wall 2 becomes less likely to flow due to the uneven shape, and the adhesion can be improved.
As a result, the phosphor 4 having a uniform thickness can be applied in the discharge display cell 5 with a small application amount.

The matrix component 2a of the partition 2
As the material of the back plate 1, a low-melting glass such as lead borosilicate glass is used, and as the material of the back plate 1, soda lime glass, various ceramics, or the like is used. As the hard particles 2b, fine powder of a metal oxide such as alumina, zirconia, or titania is used. By containing the hard particles 2b, the strength of the partition walls 2 can be improved and the partition walls 2 can be colored.

The height of the uneven shape formed by the hard particles 2b is preferably in the range of 0.1 to 50 μm. This is because if the thickness is less than 0.1 μm, the effect of improving the adhesion of the phosphor 4 is poor, while if it exceeds 50 μm, the strength of the partition walls 2 is reduced, and the discharge gap is reduced. In addition, in order to obtain such uneven height, the average particle diameter of the hard particles 2b is 0.1 to 50 μm, preferably 1 to 50 μm.
What is necessary is just to make it into the range of 10 micrometers.

Further, the hard particles 2b are preferably contained in the range of 0.5 to 75% by volume with respect to the whole partition wall 2. This is because the effect is poor at less than 0.5% by volume,
If the content exceeds 75% by volume, the sinterability decreases.

Next, the partition wall 2 having such an uneven shape is used.
Will be described.

First, as a material for forming the partition 2, a paste is prepared by mixing a mixed powder of a matrix component 2a such as a low melting point glass powder and hard particles 2b such as a ceramic with a binder. At this time, two types of hard particles 2b for forming the unevenness and hard particles used as a reinforcing material for the partition 2 can be used. In this case, the hard particles 2b for forming the unevenness are formed of the partition 2 Mix immediately before.
Next, using this paste, the partition 2 is formed on the back plate 1 by molding using a mold or the like, and firing is performed.

After firing, the surface of the obtained partition wall 2 is subjected to etching or sandblasting to remove the matrix component 2a and expose the hard particles 2b to the surface to form an uneven shape.

Here, as an etching technique, chemical etching using an acid-based etchant is performed. Specifically, a solution composed of at least one of hydrofluoric acid, nitric acid, sulfuric acid, acetic acid, or the like, or a solution in which ammonia or the like is added to have a buffer function so that the etching rate can be controlled is used. In sand blasting, alumina fine powder is used as a grinding material, and the grinding conditions can be changed by changing the particle size of the grinding material, the blast injection pressure, and the angle to the workpiece.

Next, another embodiment of the present invention will be described.

FIG. 2 is different from the above-described embodiment in that the hard particles 2b are present only on the surface of the partition wall 2 and are not present inside, but the others are the same.

The method of manufacturing such a partition 2 is as follows. First, a paste consisting only of the matrix component 2a is prepared. Next, after this was applied to the entire surface of the back plate 1, the hard particles 2 b were sprayed on the surface, and a mold member was pressed thereon to form the partition 2, and the hard particles 2 b were present only on the surface. When the partition walls 2 are obtained and baked, the hard particles 2b are partially embedded in the partition walls 2 to obtain a structure shown in FIG.

Alternatively, after the partition walls 2 are formed on the back plate 1 using only the matrix component 2a, the hard particles 2
If b is sprayed and fired, the partition walls 2 are melted and the hard particles 2b are embedded in the surface, so that the structure shown in FIG. 2 can be obtained.

The partition walls 2 constituting the above-described plasma display device of the present invention have a tapered shape such that the width decreases toward the front plate 6, whereby the phosphor 4 is formed on the inner surface of the discharge display cell 5. The shape is easy to apply.

[0031]

Embodiment 1 Hereinafter, an embodiment of the present invention will be described.

A low-melting glass made of lead borosilicate glass was used as the matrix component 2a forming the partition walls 2, a ceramic filler made of alumina, zirconia, and titania was used as the hard particles 2b, and a paste was prepared by mixing the two. Particularly with respect to alumina, 5% by weight of alumina having an average particle size of 5 μm with respect to the total powder weight is used.
Was added so that

As the back plate 1, 400 × 500 × 2 mm
Using a soda lime glass substrate of 50 μm
The partition walls 2 were formed with a width and a height of 150 μm and a pitch of 220 μm, and the partition walls 2 were fired in air at a temperature of 550 to 600 ° C.

The obtained back plate 1 was immersed in 30% by volume hydrofluoric acid and etched. After the etching was completed, the acid was washed away with water, and at the same time, ultrasonic irradiation was performed to remove etching dust between the partition walls 2.

When a cross-sectional SEM observation of the obtained back plate 1 was performed, it was confirmed that the surface of the partition 2 had an uneven shape of about 1 to 3 μm. When the paste of the phosphor 4 was applied to the partition wall 2 having the uneven surface by the thick film printing method, a phosphor layer having a thickness of 15 μm could be formed. In addition, since the thickness of the conventional phosphor layer was about 5 to 10 μm, it was found that the coating thickness of the phosphor 4 could be sufficiently increased.

Example 2 In the same manner as in Example 1, a partition 2 was formed on the back plate 1, and before baking, a resin layer was applied on the top of the partition 2 to form a protective layer against sandblasting. did.

Thereafter, the side surfaces of the partition walls 2 were intensively sandblasted, and then the partition walls 2 were fired at 550 to 600 ° C. in air. After the firing, ultrasonic irradiation in water was performed to remove blast debris between the partition walls 2.

When the cross section of the obtained back plate 1 was observed by SEM, it was found that the partition wall 2 had an uneven surface of about 1 to 3 μm. Further, when the paste of the phosphor 4 was applied to the partition walls 2 by a thick film printing method, a phosphor layer having a thickness of 15 μm could be formed, and it was found that the applied thickness could be sufficiently increased similarly to the above-described embodiment.

Example 3 A 400 × 500 × 3 mm glass substrate was used as the back plate 1, and only the matrix component 2 a of the partition wall 2 was uniformly coated with a thickness of several tens μm on this. Next, the hard particles 2b
As a solution, 5% by weight of alumina having an average particle size of 2 μm was added to an organic solvent and dispersed by a dispersant to prepare a solution.
This was uniformly sprayed on the coating film of the matrix component 2a.

A molding die was pressed against the surface to perform pressure molding to form the partition 2. After the firing, the cross section S of the back plate 1 is
As a result of EM observation, a partition wall 2 having a structure as shown in FIG. 2 and having an uneven surface of about 2 to 4 μm was obtained. Further, the phosphor 4 is formed on the partition 2 by a thick film printing method.
When the paste was applied, a phosphor layer having a thickness of 18 μm could be formed, and it was found that the applied thickness could be sufficiently increased.

Example 4 A glass substrate of 400 × 500 × 3 mm was used as the back plate 1, and a partition 2 was formed thereon by pressure molding using only a matrix component 2 a of the partition 2 with a molding die. Next, a solution in which 5% by weight of alumina having an average particle size of 2 μm was added to the organic solvent as the hard particles 2b and dispersed with a dispersant was prepared, and the solution was uniformly sprayed on the surface of the partition walls 2 before firing. did.

Thereafter, firing was performed, and the cross section S of the obtained back plate 1 was obtained.
As a result of EM observation, a partition wall 2 having a structure as shown in FIG. 2 and having an uneven surface of about 2 to 4 μm was obtained. Further, the phosphor 4 is formed on the partition 2 by a thick film printing method.
When the paste was applied, it was found that a phosphor layer of 18 μm could be formed, and the applied thickness could be sufficiently increased.

[0043]

As described above, according to the present invention, in the plasma display device, the partition walls are formed from the matrix component and the hard particles, and the hard particles are exposed on the surface to form the unevenness, so that the gap between the partition walls is improved. Even if a phosphor paste having high fluidity that can be easily filled is used, it is possible to apply a thick phosphor on the side wall of the partition wall, and the yield of the phosphor application step is improved. Further, as a result that the phosphor can be applied thickly to the side wall of the partition, a plasma display device with high luminance and high image quality can be manufactured.

Further, according to the present invention, as a method of manufacturing a plasma display device having the above-mentioned partition walls, after forming a plurality of partition walls from a material comprising a matrix component and hard particles,
Etching on the surface of the partition, sand blasting, etc., to expose the hard particles to provide irregularities, or by embedding the hard particles on the surface of the matrix component to form a partition, the surface in a simple process, A partition having an uneven shape can be manufactured.

[Brief description of the drawings]

FIG. 1 is an enlarged sectional view of a discharge display cell in a plasma display device of the present invention.

FIG. 2 is an enlarged sectional view of a discharge display cell in another embodiment of the plasma display device of the present invention.

FIG. 3 is a cross-sectional view illustrating a configuration of a general plasma display device.

FIG. 4 is an enlarged sectional view of a discharge display cell in a conventional plasma display device.

[Explanation of symbols]

 1: Back plate 2: Partition wall 2a: Matrix component 2b: Hard particle 3: Address electrode 4: Phosphor 5: Discharge display cell 6: Front plate 7: Discharge electrode

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Kiyohiro Sakasegawa 1-4-4 Yamashita-cho, Kokubu-shi, Kagoshima Inside Kyocera Research Institute (72) Inventor Masafumi Kato 1-4-4 Yamashita-cho, Kokubu-shi, Kagoshima Kyocera Shikisha Research Institute

Claims (5)

[Claims] 1. A plurality of partitions partitioning the space between a back plate and a front plate facing each other with a certain space therebetween, and a discharge electrode and an address electrode are provided in a discharge display cell formed between the partitions. Along with the above, in a plasma display device in which a phosphor is applied to an inner wall surface of the discharge display cell, the partition walls are made of a matrix component and hard particles, and the hard particles are exposed on the surface to form an uneven shape. Plasma display device. 2. The hard particles have an average particle size of 0.1 to 50 μm.
2. The plasma display device according to claim 1, wherein the value is within a range of m. 3. A plurality of partitions are formed on a back plate from a material comprising a matrix component and hard particles, and after firing,
Plasma display including a process of etching, sandblasting, etc. on the surface of the partition walls, removing matrix components and exposing hard particles to form irregularities, applying a phosphor thereon, and joining a front plate. Device manufacturing method. 4. Applying a matrix component on a back plate,
By spraying hard particles on the surface and pressing a molding die, forming a partition having the hard particles exposed on the surface, firing it, applying a phosphor thereon, and bonding the front plate A method for manufacturing a plasma display device. 5. A method comprising the steps of: forming a plurality of partition walls made of a matrix component on a back plate, spraying hard particles on the surface thereof, firing them, applying a phosphor thereon, and joining the front plate. A method for manufacturing a plasma display device.