JP2001092119A - Photosensitive paste, display and member for display - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a photosensitive paste capable of forming a good partition wall pattern and giving a partition wall that is blackened after firing to enhance contrast. SOLUTION: The photosensitive paste contains inorganic fine particles and a photosensitive organic component in a ratio of 6:4 to 9:1. When a coating film of 140 μm thickness is formed using the paste, the total light transmittance is >=50% and stimulus specification Y in the XYZ system of color representation after the firing of the coating film is <=15. The paste has good pattern forming property and forms a black partition wall that contributes toward enhancing contrast.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a photosensitive paste, and more particularly to a plasma display panel (PDP).
), Plasma addressed liquid crystal display (PA
It can be used for forming an electron emission (FE, also referred to as field emission) element, an organic electroluminescence (also referred to as organic EL, electroluminescence) element, or a partition of a display using a fluorescent display tube.

[0002]

2. Description of the Related Art A thin and lightweight flat panel display has attracted attention. Liquid crystal displays (also referred to as LCDs) have been actively developed as flat panel displays, but these still have problems such as dark images and narrow viewing angles. As an alternative to this liquid crystal display, displays using PDPs, electron-emitting devices, organic electroluminescent devices or fluorescent display tubes, which are self-luminous discharge-type displays, can obtain brighter images and have a wider viewing angle than LCDs. In addition, since the demand for larger screens and higher definition can be met, the needs are increasing.

The electron-emitting devices include a thermionic electron-emitting device and a cold cathode electron-emitting device. The cold cathode electron-emitting devices include a field emission type (FE type), a metal / insulating layer / metal type (MIM type), and a surface conduction type. An image forming apparatus using such a cold cathode electron source displays an image by irradiating a phosphor with an electron beam emitted from each type of electron-emitting device to generate fluorescent light. In this apparatus, a front glass substrate (also referred to as a face plate) and a rear glass substrate (also referred to as an element substrate) are used by imparting respective functions. A matrix wiring for connecting the electrodes is provided. Since these wirings intersect at the electrode portion of the electron-emitting device, an insulating layer (dielectric layer) for insulation is provided. Further, a partition is formed between the two substrates as an anti-atmospheric pressure support member. An image display device using an electron-emitting device has advantages such as being flat, bright and easy to see.

An organic electroluminescent device that emits light by recombining electrons injected from a cathode and holes injected from an anode in an organic phosphor sandwiched between both electrodes is thin and has high luminance under a low driving voltage. Light emission and multicolor light emission by selecting a fluorescent material are featured and attracted attention.

In manufacturing an organic electroluminescent device, a method of forming a partition and utilizing the same is used as a method of patterning an organic light emitting layer. A grid-like partition is also formed in a display using a fluorescent display tube.

A PDP generates a plasma discharge between an anode electrode and a cathode electrode facing each other in a discharge space partitioned by partitions provided between a front glass substrate and a rear glass substrate, and is sealed in this space. The display is performed by irradiating the phosphor applied to the discharge space with ultraviolet rays generated from the gas.

A plasma addressed liquid crystal (PALC) display is a TFT (thin film transistor) -T
The FT array portion is replaced with a plasma channel, and the structure is basically the same as that of the TFT-LCD except for the plasma portion. A partition having a height of 200 μm is formed, and a plasma generating portion having a structure in which an anode electrode and a cathode electrode made of nickel are opposed to each other is provided between the partition walls, and the PDP technique is applied to the formation thereof.

[0008] These partition walls are formed by a method such as a screen printing method, a sand blast method, an additive method (also referred to as an embedding method), a pressure molding method, a mold transfer method, a photosensitive paste method, or the like.

The screen printing method is the most general method for forming a partition wall, but has difficulty in applying it to a display having a high definition and a large screen. As a method capable of coping with a high definition and large area, a photosensitive paste method of imparting photosensitivity to a glass paste and irradiating active rays such as ultraviolet rays to perform patterning has been developed. Each of the partition wall forming methods can be selected and applied depending on the size of the target display panel member, the definition of the partition wall pattern, and the like. These are all methods of forming a partition pattern, and a firing step is required to obtain a partition.

In the case of a PDP, in a high-definition display, when the partition walls are white, light is reflected from the partition walls during light emission, which is effective in improving brightness. There is a problem that the contrast is reduced.

Japanese Patent Application Laid-Open Nos. 6-144871 and 8
JP-A-17345 and JP-A-10-72240 propose a method for producing a partition wall using a photosensitive paste containing a black pigment. However, since the black pigment absorbs light, the curing depth obtained by one exposure is insufficient, and there is a problem that these methods require multiple exposures. Further, there is no description of the degree of blackness of the obtained partition walls or the improvement of contrast due to blackening.

Japanese Patent Application Laid-Open No. 9-35642 discloses that
To improve contrast, a panel structure in which black partition walls are formed on the front substrate has been proposed.However, it is necessary to align the partition walls of the front plate and the back plate, and the black partition wall of the front plate and the back plate are required. Since it is necessary to form the white partition separately, there is a disadvantage that the process becomes complicated. Further, a screen printing method is used as a method for forming the partition walls, and there is a problem that the partition walls cannot be formed with high accuracy.

[0013]

SUMMARY OF THE INVENTION It is an object of the present invention to provide a photosensitive paste capable of forming a good partition pattern and improving the contrast by blackening the partition obtained after firing. .

[0014]

A light-sensitive paste containing an inorganic material and a light-sensitive organic component in a ratio of 6: 4 to 9: 1 and having a total thickness of 140 μm when formed as a coating film. A photosensitive paste having a ratio of 50% or more and a stimulus value Y of 15 or less in an XYZ color system of a film obtained by baking this coating film is used.

[0015]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The photosensitive paste of the present invention contains inorganic fine particles and a photosensitive organic component. From the balance between the pattern forming property and the binder removing property, the ratio between the inorganic fine particles and the photosensitive organic component is from 6: 4 by weight.
A ratio of 9: 1 is preferred. When the component ratio is within this range, the binder removal property is good, and a good partition pattern can be formed.

The photosensitive paste coating film is exposed to ultraviolet rays to form a partition pattern, and it is essential that the light be transmitted to the bottom of the coating film with as little scattering as possible and as much as possible. It is a necessary condition that the coating film has good light transmittance. The required total light transmittance is 50% or more as measured on a coating film having a thickness of 140 μm as described above, and is preferably 6% or more.
0% or more, more preferably 75% or more.

The transmittance of the present invention is measured using a spectrophotometer (UV-3101PC) manufactured by Shimadzu Corporation under the following conditions.

Sample thickness: 50 μm Sample cell: quartz cell Slit width: 7.5 Measurement speed: SLOW (about 100 nm / min) Light source: halogen lamp White plate: BaSO ₄ (sample side) Secondary white plate: BaSO ₄ (reference side) Incident Angle: 0 degrees, 8 degrees Integrating sphere: 60φ Integrating sphere Integrating sphere window: Entrance window 12 (W) × 20 (H) mm Exit window 12 (W) × 24 (H) mm Photomal window (bottom of sphere) 16 mmφ PbS cell window (upper side of sphere) 16 mmφ Opening ratio of integrating sphere: 12.9% Detector: Photomal and PbS cell The sample for transmittance measurement has a thickness of 140 after drying on a quartz cell.
A photosensitive paste was applied by a screen printing method so as to have a thickness of μm and dried, and was prepared by placing a quartz cell on a sample. The total light transmittance is obtained by measuring the total transmitted light of light incident at an incident angle of 0 degree.

Further, the thickness of the photosensitive paste is 140 μm.
It is preferable that the stimulus value Y in the XYZ color system of the film obtained by baking the applied film is 15 or less. The stimulus value Y represents the degree of blackness of the obtained partition wall. When the stimulus value Y exceeds 15, the stimulus value Y becomes gray,
Reflection during non-discharge is increased, and contrast and color purity are reduced. The stimulus value Y is preferably 6 or less, and more preferably 3 or less, in order to appropriately maintain the contrast.

The tristimulus values XYZ of the light source colors and the chromaticity coordinates x and y obtained therefrom are in accordance with JIS Z8722.
(Measurement method of object colors), is obtained by JIS Z8717 (Method of Measuring the fluorescent object color, JIS Z8701 (XYZ color system and X ₁₀ Y ₁₀ Z ₁₀ guide display colors in the color system method) in the method specified. Generally, a color computer is used as an apparatus for measuring these stimulus values and chromaticity coordinates, but the values displayed in the present invention are color computers SM-7-CH manufactured by Suga Test Instruments Co., Ltd. It was measured under the conditions of 45 ° illumination and 0 ° light reception.

The inorganic fine particles of the present invention have a content of 0.003 to 0.0.
It preferably has a particle size distribution having a peak in the range of 8 μm. Here, when the inorganic fine particles contain a plurality of components, it is preferable that the particles have a peak in the range of 0.003 to 0.08 μm as a result of measuring the particle size distribution including these components. Particle size distribution of the inorganic fine particles of the present invention,
It may have a peak other than the above range and may have a plurality of peaks. These particle size distributions are measured using a particle size distribution analyzer (Microtrac H
RA particle size distribution analyzer Model No. 9320-X10
0). The measurement conditions are as follows.

Measurement amount: 1 g Dispersion condition: ultrasonic dispersion in purified water for 1 to 1.5 minutes. If it is difficult to disperse, it is carried out in a 0.2% aqueous sodium hexametaphosphate solution.

Particle refractive index: It changes depending on the type of inorganic powder.

Solvent index ratio: 1.33 Number of measurements: twice The inorganic fine particles of the present invention have a low melting point glass powder of 50 to 90% by weight and a filler (filler B) having an average particle diameter of 0.003 to 0.08 μm. 50% by weight, and preferably contains 30% by weight or less of a filler (filler A) having an average particle size of 1.5 to 5 μm.

The filler B is composed of Ru, Mn, Ni, Cr,
Fe, Co, and Cu oxides and Si, Ti,
It contains at least one selected from the group consisting of carbides of Ta, Zr and Cr. The filler B can be used by simply mixing it with the low-melting glass powder constituting the inorganic material, or can be used by being melt-mixed. Ru, M
It is preferable that at least one selected from the group consisting of oxides of n, Ni, Cr, Fe, Co, and Cu is melt-mixed with a low-melting glass powder, and a filler B is further mixed and used as a powder.

The oxide selected from the group consisting of the oxides of Ru, Mn, Ni, Cr, Fe, Co, and Cu is not blackened when it is melt-mixed with the low melting point glass powder. The light that is exposed is less absorbed. Further, the filler B is dispersed as very fine nanoparticles in a state where the filler B is blended in the photosensitive paste, and its size is smaller than the wavelength of active light used for exposure, so that light transmission is not hindered. The pattern formability of the photosensitive paste coating film can be kept good. The average particle diameter of the filler B is 0.003 to 0.08 μm.
m is preferable, and more preferably 0.003 to 0.06 μm
m. More preferably, 0.003 to 0.03 μm
m. If it is less than 0.003 μm, it becomes too fine and easily aggregated, and it is technically difficult to uniformly fill and disperse the paste. Therefore, the ultraviolet light may be scattered on the way without reaching the bottom of the coating film, and the pattern formability may be deteriorated. On the other hand, when the average particle diameter exceeds 0.08 μm, the particles become too large and the pattern formability may decrease, which is not preferable. When the particle size is within the above range, the wavelength of the exposure light, 320 to 4
Since it is smaller than 60 nm, even if it is dispersed in the paste, it does not hinder pattern exposure. Therefore, in the paste coating film stage, it does not adversely affect the pattern formation, and effectively acts on the blackening of the partition walls after firing.

The inorganic fine particles of the present invention preferably contain a filler (filler A) having an average particle diameter of 1.5 to 5 μm (filler A) in an amount of 30% by weight or less, together with the above-mentioned filler B as a blackening component. .

The filler A has the effect of maintaining the pattern formation property of the partition wall before firing, the strength of the partition wall after firing, reducing the shrinkage rate of firing, and increasing the shape retention rate. If too much filler A is added, the sintering temperature becomes too high and sintering at 580 ° C. or lower becomes difficult. 580
If the temperature is raised above ℃, the heat resistance of the glass substrate will deteriorate,
The deformation (distortion) of the substrate increases, and it becomes impossible to form the partition walls with high accuracy. It is preferable to use the filler A in a range of 30% by weight or less.

The average particle size of the filler A is selected within a range that optimizes the filling and dispersibility in the paste. The filler A of the present invention has an average particle size of 1.5 to 5 μm.
m is preferable, and more preferably, 1.5 to 3.5 μm
And more preferably 1.5 to 3.0 μm. When the average particle size is smaller than 1.5 μm, the cohesiveness of the powder becomes large, so that the filling and dispersibility in the paste becomes poor, and it becomes difficult to form a high-definition pattern. In addition, since the filler component does not melt in the firing step, if the average particle diameter is more than 5 μm, there is a concern that unevenness at the top of the formed partition wall becomes large and causes problems such as a cause of crosstalk. Is not preferred.

For patterning the photosensitive paste of the present invention, a photolithography technique having steps of pattern exposure and development with ultraviolet rays is used. In this case, it is important to transmit the exposed ultraviolet light to the bottom of the paste coating film, and furthermore, it is necessary to minimize the scattering of the ultraviolet light in the paste film in order to obtain a partition pattern having a desired shape. is important. Therefore, the inorganic fine particles and the photosensitive organic component constituting the paste are sufficiently mixed and kneaded so that the inorganic material is uniformly dispersed, the inorganic fine particles are monodispersed without aggregation, It is important to use a photosensitive paste that satisfies conditions such as matching between the average refractive index of the fine particles and the average refractive index of the photosensitive organic component.

The filler A is selected from a high melting point glass having an average refractive index of 1.45 to 1.65 and cordierite so as to match the average refractive index of the low melting point glass powder and the photosensitive organic component. This is preferable because it does not deteriorate the pattern formability.

As the high melting point glass, a glass transition point of 50
Those having a temperature of 0 to 1200C and a softening point under load of 550 to 1200C are preferred. Such a high-melting glass preferably has a composition containing 15% by weight or more of silicon oxide and 15% by weight of aluminum oxide, respectively. It is valid. Preferred examples of the oxide-converted composition are as follows.

Silicon oxide 15 to 50% by weight Boron oxide 5 to 20% by weight Aluminum oxide 15 to 50% by weight Barium oxide 2 to 10% by weight When high melting glass is used as the filler A, average refraction of the low melting glass to be blended is used. It is preferable to consider composition distribution so as to have an average refractive index that matches the index.

Cordierite has a refractive index of 1.58, and is suitable as the filler A of the present invention.

The low-melting glass powder, which is a main component of the partition walls, has a glass transition point of 400 to 550 ° C. and a softening point under load of 4.
The temperature is preferably from 50 to 600 ° C., and the average refractive index is preferably from 1.5 to 1.65.

Since the partition walls are formed on a glass substrate, the low melting point glass powder preferably has a glass transition point of 400 to 550 ° C. and a softening point under load of 450 to 600 ° C. If the glass transition point is lower than 400 ° C., the firing temperature is too low to allow simultaneous firing with other members such as electrodes and dielectrics, and the binder removal property during firing deteriorates, and undecomposed components remain ( Residual carbon) weakens the adhesion to the substrate glass and may cause separation of the partition walls. By setting the glass transition point to be 400 ° C. or more and the load softening point to be 450 ° C. or more, there is no concern that the glass will be deformed by heat treatment in a later processing step, and the glass transition point will be 550 ° C. or less and the load softening point will be 600 ° C. or less. By doing so, it is possible to form a high-strength partition wall sufficiently melted during firing on a glass substrate.

Glasses containing lead oxide and bismuth oxide have heretofore been used as the low-melting glass having such temperature characteristics. Glasses containing these components have an average refractive index of 1.7 or more. Therefore, it is difficult to match the refractive index with a photosensitive organic component having an average refractive index of about 1.45 to 1.65. Therefore, it is difficult to form a partition pattern having a high aspect ratio and a high definition. In the present invention, a low melting point glass having a glass transition point and a softening point under load within the above ranges and an average refractive index in the range of 1.5 to 1.65, more preferably 1.5 to 1.6 is used. Is preferred.

When forming a fine pattern with a high aspect ratio using a coating film of a photosensitive paste in which inorganic fine particles are dispersed and mixed in a photosensitive organic component, the average refractive index of the constituent components must be matched. is important. If the refractive indices of the constituents are different, an obstacle such as the formation of an unnecessary cured portion between patterns due to light scattering may occur. In order to suppress the scattering of light and allow the active light used for pattern formation to pass to the bottom of the paste coating film, it is desirable that the difference in the average refractive index between the inorganic fine particles and the photosensitive organic component be 0.05 or less. As described above, the refractive index of a general organic component is about 1.45 to 1.65, and in order to match the refractive indexes, the average refractive index of the low melting point glass powder is set to 1.
It is preferable to set it to 5 to 1.65.

The preferred composition of the low-melting glass powder satisfying such thermal properties and average refractive index can be represented as follows in terms of oxide.

Silicon oxide: 5 to 30% by weight Boron oxide: 20 to 45% by weight Aluminum oxide: 10 to 25% by weight At least one of lithium oxide, sodium oxide and potassium oxide: 3 to 15% by weight Strontium oxide and oxidation at least one of barium: 2-15 wt% of magnesium oxide and at least one of calcium oxide: 2 to 15 wt% oxide lithium (Li ₂ O), sodium oxide (Na ₂ O)
And it is preferable to use a glass powder containing at least one kind of 3 to 15 wt% of potassium oxide (K ₂ O). This glass not only facilitates lowering the melting point of the glass and controlling the coefficient of thermal expansion, but also lowers the average refractive index of the glass. The amount of the alkali metal oxide added is 1 to improve the stability of the paste.
It is preferably at most 5% by weight, more preferably at most 10% by weight. If it is less than 3% by weight, it is not sufficient to lower the melting point of the glass. The choice of the alkali species is not particularly limited,
Considering the lowering of the refractive index of glass and the effect of migration by a conductive metal such as silver, lithium oxide is preferred.

The silicon oxide is preferably blended in the range of 5 to 30% by weight. More preferably, it is 10 to 30% by weight. Silicon oxide is essential as a glass network former and is also effective in lowering the refractive index. If it is less than 5% by weight, the glass transition point and the softening point under load are too low, and the coefficient of thermal expansion is too large, which may cause cracks when baked on a glass substrate.
On the other hand, if it exceeds 30% by weight, the glass transition point and the softening point under load become too high, so that it becomes difficult to bake the glass substrate at a temperature of 600 ° C. or lower. The content of silicon oxide is preferably 5 to 30% by weight in consideration of the glass transition point, the softening point under load, the coefficient of thermal expansion, the refractive index, and the chemical durability.

Boron oxide (B ₂ O ₃ ) is 20 to 45% by weight
It is preferable to mix in the range of. More preferably 20
４０40% by weight. Boron oxide is an effective component for lowering the melting point of glass that does not contain heavy metals such as lead and bismuth, and is also very effective for lowering the refractive index. If the boron oxide content is less than 20% by weight, the glass transition point and the softening point under load become too high, so that baking on a glass substrate becomes difficult. On the other hand, if it exceeds 40% by weight, the chemical durability of the glass is lowered, which is not good.

Strontium oxide (SrO) and barium oxide (BaO) are effective components for widening the vitrification range, and are effective components for lowering the melting point of the glass and controlling the coefficient of thermal expansion. preferable. The total amount of strontium oxide and barium oxide is 2-
15% by weight is preferred. If it is less than 2% by weight, the effect of lowering the melting point will be insufficient, and the tendency to devitrify may increase. On the other hand, if the content exceeds 15% by weight, the coefficient of thermal expansion becomes too large, and cracks may occur during baking.

The content of aluminum oxide is preferably 10 to 25% by weight. The addition of aluminum oxide has the effect of expanding and stabilizing the vitrification range. Less than 10% by weight,
Alternatively, if it exceeds 25% by weight, the tendency of devitrification increases.
On the other hand, if it exceeds 25% by weight, the glass transition point and the softening point under load become too high, making baking difficult.

In addition to these components, it is preferable that zinc oxide, calcium oxide, or magnesium oxide be blended in terms of oxide.

It is preferable that zinc oxide is blended in the range of 2 to 15% by weight. Zinc oxide is effective in lowering the melting point without greatly changing the coefficient of thermal expansion of glass. However, when it exceeds 15% by weight, the refractive index becomes too large, and the difference in the refractive index with the organic component is widened to form a pattern. It is not preferable because the property is lowered.

Magnesium oxide and calcium oxide are effective components for suppressing the devitrification of the glass and expanding the vitrification range, and it is preferable to include at least one of them. Magnesium oxide and calcium oxide
The total amount is preferably 2 to 15% by weight. If it is less than 2% by weight, the effect of lowering the melting point is insufficient, and the tendency to devitrify becomes large.
If it exceeds 15% by weight, the coefficient of thermal expansion increases,
Cracks may occur during baking, and the refractive index may increase.

Further, the total amount of magnesium oxide, calcium oxide, strontium oxide, and barium oxide is determined in consideration of the balance between a stable glass structure, a glass transition point, a softening point under load, a coefficient of thermal expansion, a refractive index, and chemical durability. And 2 to 30% by weight are preferred.

The glass powder may contain titanium oxide, zirconium oxide and the like, but the amount is preferably less than 5% by weight. Zirconium oxide is effective in controlling the softening point under load, glass transition point, and electrical insulation of glass.

The thermal expansion coefficient of glass is 70 × 10 ⁻⁷ / K or more.
It is preferably 85 × 10 ⁻⁷ / K. If the coefficient of thermal expansion is less than 70 × 10 ⁻⁷ / K or more than 85 × 10 ⁻⁷ / K, the matching with the soda glass substrate or the high strain point glass substrate for PDP is poor, and the warpage occurs. Is not preferred.

The photosensitive paste of the present invention can be produced, for example, as follows. That is, low melting point glass powders 50 to 9 having an average refractive index of 1.5 to 1.65, a glass transition point of 400 to 550 ° C., and a softening point under load of 450 to 600 ° C.
0% by weight, average particle size 1.5 to 5 μm and refractive index 1.4
Filler A having a content of 5 to 1.65 and a filler B having an average particle size of 0.003 to 0.08 μm.
A photosensitive paste can be obtained by mixing and kneading 50% by weight of inorganic fine particles with a photosensitive organic component. The photosensitive paste thus prepared is applied to a substrate, dried, patterned by photolithography, and the formed pattern is baked to form a partition.

The photosensitive organic component is not limited to this, but is a photosensitive component of a type which becomes photo-curable by a polymerization and / or cross-linking reaction caused by absorbing irradiation light and becomes insoluble in a solvent. It is preferable to use

That is, the photosensitive organic component preferably contains a photosensitive monomer, a photosensitive or non-photosensitive oligomer or polymer as a main component, and contains a photopolymerization initiator. If necessary, the photosensitive organic component may contain an ultraviolet absorber,
Polymerization inhibitors, sensitizers, plasticizers, thickeners, antioxidants, dispersants, and other additives can also be added.

As the photosensitive monomer, a compound having an active carbon-carbon double bond is preferable, and monofunctional and polyfunctional compounds having a vinyl group, an allyl group, an acrylate group, a methacrylate group, an acrylamide group and the like are used.

In particular, a polyfunctional acrylate compound and / or a polyfunctional methacrylate compound may
Those containing 80% by weight are preferred. Since various kinds of compounds have been developed for the polyfunctional acrylate compound and / or the polyfunctional methacrylate compound, it is possible to select from them in consideration of reactivity, refractive index, and the like.

As a method of controlling the refractive index of the photosensitive organic component, a photosensitive monomer having a refractive index of 1.55 to 1.70 is selected and contained, and the average refractive index of the photosensitive organic component is adjusted to that of the inorganic fine particle material. A method of approaching the average refractive index is simple. A photosensitive monomer having such a high refractive index is
It can be selected from an aromatic ring such as a benzene ring or a naphthalene ring, or an acrylate or methacrylate monomer containing a sulfur atom.

As a photosensitive organic component, an oligomer or polymer is added as a component that plays a role in improving the physical properties of a cured product formed by a photoreaction and adjusting the viscosity of the paste.

These oligomers or polymers are
It has a carbon chain skeleton obtained by polymerization or copolymerization of components selected from compounds having a carbon-carbon double bond. In particular, an oligomer or polymer having a weight average molecular weight of 2000 to 60,000, more preferably 3000 to 40,000, having a carboxyl group and an unsaturated double bond in the molecular side chain is used. Since it has a carboxyl group in the side chain, it is possible to provide a photosensitive paste which can be developed with an aqueous alkali solution after photosensitization. The oligomer or polymer having an acid group such as a carboxyl group in the side chain has an acid value of 50 to 140, preferably 70 to 1.
It is preferable to control so as to be in the range of 20.

In order to introduce an unsaturated double bond in order to obtain a photosensitive oligomer or polymer, an oligomer or polymer having a carboxyl group in the side chain may be added to an ethylenically unsaturated compound having a glycidyl group or an isocyanate group or an acrylic compound. An acid chloride, methacrylic acid chloride or allyl chloride may be added. Furthermore, in order to impart photosensitivity by introducing an unsaturated double bond into an oligomer or polymer having a carboxyl group in the side chain as described above, a method of forming a salt bond between the carboxyl group and the amine compound Can also be used. For example, a acrylate or methacrylate group can be used as a photosensitive group by forming a salt bond by reacting dialkylaminoacrylate or dialkylaminomethacrylate. The number of ethylenically unsaturated groups can be appropriately selected depending on reaction conditions.

In order to start the photoreaction by absorbing the energy of actinic rays, it is preferable to further include a photopolymerization initiator. In some cases, a sensitizer may be added to assist the effect of the photopolymerization initiator. Photopolymerization initiators include mechanically different types such as a one-molecule direct cleavage type, an electron transfer between ion pairs, a hydrogen abstraction type, and a two-molecule composite system, and are used by selecting from them.

The photosensitive paste usually has inorganic fine particles, photosensitive monomers, oligomers or polymers, and a photopolymerization initiator as basic components, and if necessary, various components such as other additives and solvents have a predetermined composition. After mixing as described above, it can be manufactured by homogeneously mixing and dispersing with a three-roller or a kneader. The viscosity of the photosensitive paste is adjusted to about 10,000 to 200,000 cps (centipoise) with an organic solvent before use. Organic solvents used at this time include methyl cellosolve, ethyl cellosolve,
Butyl cellosolve, methyl ethyl ketone, dioxane,
Examples thereof include acetone, cyclohexanone, cyclopentanone, isobutyl alcohol, isopropyl alcohol, tetrahydrofuran, dimethyl sulfoxide, γ-butyrolactone, and an organic solvent mixture containing at least one of these.

The photosensitive paste of the present invention is used for forming a partition of a display using a PDP, a plasma addressed liquid crystal display, an electron-emitting device, an organic electroluminescent device and a fluorescent display tube. The partition may be formed directly on the glass substrate, or may be formed on a dielectric layer formed so as to cover an electrode on the glass substrate.
In any case, before applying the photosensitive paste, it is effective to perform surface treatment on the application surface to improve the adhesiveness. For such a surface treatment, a silane coupling agent, a metal alkoxy compound, or the like is used.

The photosensitive paste can be applied by a method such as a screen printing method, a bar coater method, a roll coater method, and a doctor blade method. The coating thickness can be determined in consideration of a desired partition wall height and a firing shrinkage ratio of the paste.

The coated and dried photosensitive paste film is exposed through a photomask to form a partition pattern. At the time of exposure, either a method in which the paste coating film is closely contacted with the photomask or a method in which the paste is applied at a predetermined interval (proximity exposure) may be used. As a light source for exposure, a mercury lamp or a halogen lamp is suitable, but an ultra-high pressure mercury lamp is most often used. Generally, proximity exposure is performed using an ultra-high pressure mercury lamp as a light source. Exposure conditions vary depending on the thickness of the applied paste.
20 seconds using an ultra-high pressure mercury lamp with an output of 0 mW / cm ²
Exposure is preferably performed for 5 minutes.

After the exposure, development is carried out using the difference in solubility between the exposed part and the unexposed part in the developing solution.
An immersion method, a spray method, a brush method, or the like is used. Since the photosensitive paste preferably used in the present invention has a carboxyl group in a side chain, development with an alkaline aqueous solution becomes possible. As the alkali, it is preferable to use an organic alkali aqueous solution because the alkali component can be easily removed during firing. As the organic alkali, an amine compound can be used. Specific examples include tetramethylammonium hydroxide, trimethylbenzylammonium hydroxide, monoethanolamine, diethanolamine and the like. The concentration of the aqueous alkali solution is usually 0.05
To 1% by weight, more preferably 0.1 to 0.5% by weight. If the alkali concentration is too low, the soluble portion will not be completely removed, and if the alkali concentration is too high, the pattern in the exposed portion may be peeled off or eroded. The development is preferably performed at a temperature of 20 to 50 ° C. in terms of process control.

The partition pattern formed from the coating film of the photosensitive paste through the exposure and development steps is then fired in a firing furnace to thermally decompose and remove the organic components, and at the same time, to reduce the low melting point in the inorganic fine particle components. The glass is melted to form inorganic partition walls. The firing atmosphere and temperature vary depending on the properties of the paste and the substrate, but are usually fired in air. As the firing furnace, a batch-type firing furnace or a belt-type continuous firing furnace can be used.

In order to perform batch-type baking, the temperature of the glass substrate on which the partition wall pattern is formed is generally raised from room temperature to about 500 ° C. at a substantially constant speed over several hours, and then set to a baking temperature of 500 to 580. The temperature is raised to 60 ° C. for 5 to 5 hours, and the firing is performed for about 10 to 30 minutes. Since the firing temperature must be lower than the glass transition point of the glass substrate used, there is naturally an upper limit. If the firing temperature is too high or the firing time is too long, defects such as sagging occur in the shape of the partition walls. In addition, when the thermal decomposition characteristics of the photosensitive monomer, photosensitive oligomer or polymer, and various additives contained in the organic component and the thermal characteristics of the glass powder component become unbalanced, the partition walls may be colored brown or the partition walls may be separated from the substrate. Defects such as peeling may occur.

In this manner, various displays or display members on which the partition walls are formed can be obtained. These techniques are preferably applied to a display using a plasma display panel, a plasma addressed liquid crystal display, an electron-emitting device, an organic electroluminescent device, and a fluorescent display tube.

[0069]

EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples. The concentration (%) is% by weight unless otherwise specified. (Example 1) The composition in terms of oxide (analytical value) was 6.8% for lithium oxide, 23% for silicon oxide, 33% for boron oxide, 4.5% for barium oxide, 19.5% for aluminum oxide, and 2.75% for zinc oxide. Low melting glass powder of 8%, 5.8% of magnesium oxide, and 4.6% of calcium oxide was used. The glass transition point of this low melting glass powder was 497 ° C., the softening point under load was 530 ° C., the coefficient of thermal expansion was 75 × 10 ⁻⁷ / K, and the refractive index was 1.58.

The low-melting-point glass component contained 5% of nickel oxide.
And 5% of cobalt oxide were added and melt-mixed at 1300 ° C., and then wet-pulverized to adjust the particle size to obtain an average particle size of 2.3 μm.
Was obtained.

This melt-mixed low melting glass powder 100
Dissolve 0.08 parts by weight of the azo organic dye Sudan IV in acetone with respect to parts by weight, add a dispersing agent, stir uniformly with a homogenizer, and add the glass powder to this solution to disperse uniformly. -After mixing, acetone was evaporated using a rotary evaporator and dried at a temperature of 150 to 200C.

On the other hand, the photosensitive polymer was mixed with γ-butyrolactone so as to form a 40% solution, and stirred with stirring.
Heated to ° C. to dissolve all polymers. The photosensitive polymer used was obtained by subjecting a carboxyl group of a copolymer composed of 40% methacrylic acid, 30% methyl methacrylate and 30% styrene to an addition reaction of 0.4 equivalent of glycidyl methacrylate, and its weight average molecular weight Was 43,000 and the acid value was 95.

A photosensitive monomer (MGP400) and a photopolymerization initiator (IC-369) are added to a photosensitive polymer solution at room temperature.
And a sensitizer (2,4-diethylthioxanthone). Thereafter, this solution was filtered using a 400-mesh filter to produce an organic vehicle.

A low-melting glass powder obtained by melting and mixing the above-mentioned nickel oxide and cobalt oxide, filler B and an organic vehicle were mixed and dispersed with three rollers to obtain a photosensitive paste. As the filler B, nickel oxide and cobalt oxide powders were used. The amount (parts by weight) of each component contained in the photosensitive paste is determined by melting and mixing the low melting glass powder 6
0, nickel oxide powder having an average particle diameter of 0.009 μm6.
8. Cobalt oxide powder having an average particle diameter of 0.004 μm
5, photosensitive polymer 19, photosensitive monomer 7.5, photopolymerization initiator 2.4, and sensitizer 2.4. Mixing ratio (%) of melt-mixed low melting glass powder and filler B component
Is 86.6: 13.4. Further, the ratio (%) between the inorganic fine particles and the organic photosensitive component is 68.9: 31.1.

This photosensitive paste was applied on a 100 mm square glass substrate by screen printing using a 325 mesh screen. Coating and drying were repeated several times to avoid pinholes and the like in the coating film, and the film thickness was adjusted. Drying was performed at 80 ° C. for 10 minutes. Then, it was kept at 80 ° C. for 1 hour and dried. The coating thickness after drying was 180 μm.

Subsequently, a pitch of 150 μm and a line width of 20 μm
20mW / from the top using a negative chrome mask
Proximity exposure was performed using an ultra-high pressure mercury lamp with a cm ² output.
The exposure amount was 500 mJ / cm ² .

Next, a 0.2% aqueous solution of monoethanolamine kept at 35 ° C. is developed by applying a shower for 300 seconds, and then washed with water using a shower spray to remove a space portion that has not been photocured. Thus, a stripe-shaped partition pattern was formed on the glass substrate.

The partition pattern thus obtained was baked in air at 560 ° C. for 30 minutes to form black partition walls. When the cross-sectional shape of the formed partition wall was observed with an electron microscope, the height was 123 μm, the line width at the center of the partition wall was 30 μm,
The pitch was 150 μm. A black partition having a good shape and without peeling was obtained.

The total light transmittance of the coating film and the XY of the fired film
In order to measure the stimulus value Y in the Z color system, a coating film having a dry thickness of 140 μm was separately formed by the same operation as above, and the total light transmittance of the coating film was measured. Further, it is fired to form a fired film, and the stimulus value Y in the XYZ color system is
Was measured. The total light transmittance of the photosensitive paste coating film is 7
At 0%, the stimulus value Y of the fired film in the XYZ color system was 3.

A black partition is formed on the substrate on which the electrodes and the dielectric layer are formed as described above, and a phosphor layer is formed on the side wall and the bottom of the partition. Gas was sealed, and a drive circuit was connected to produce a plasma display panel. Display was performed by applying a voltage to this panel. The brightness at the time of full lighting is measured by Otsuka Electronics MCP
It measured using D-200. Brightness is 350 cd / m ²
And the contrast was as good as 300: 1. Example 2 As filler B, 2.5 parts by weight of cobalt oxide having an average particle diameter of 0.006 μm, 2.9 parts by weight of chromium (III) oxide having an average particle diameter of 0.008 μm, and an average particle diameter of 0.00
Example 1 was repeated except that 4.6 parts by weight of iron (III) oxide of 5 μm was used, and low melting glass powder having the following composition and characteristics was used.

Composition of low-melting glass (analytical value): 3.7% lithium oxide, 5.6% potassium oxide, 1 silicon oxide
3.8%, aluminum oxide 18.7%, boron oxide 3
4.7%, zinc oxide 13.4%, magnesium oxide 1.
2%, calcium oxide 5.0%, barium oxide 3.9
%.

Properties: glass transition point 474 ° C., softening point under load 511 ° C., coefficient of thermal expansion 75 × 10 ⁻⁷ / K, refractive index 1.5
7, average particle size 3.3 μm, maximum particle size 11.0 μm.

A black partition having a good shape and without peeling was obtained. Low melting glass and filler B in inorganic fine particles
Is 85.7: 14.3, and the mixing ratio (%) of the inorganic fine particles and the photosensitive organic component is 69.14.
1: 30.9.

The total light transmittance of the photosensitive paste coating film of this example was 65%, and the stimulus value Y of the fired film in the XYZ color system was 3. In the obtained display, the contrast was improved by the effect of the black partition walls. Example 3 As a photosensitive polymer, "Cyclomer P" ACA210 manufactured by Daicel Chemical Co., Ltd. (acid value: 120, molecular weight: 28,0)
00) was used. Further, a low-melting glass powder having the following composition and characteristics was used.

Composition in terms of oxide (analytical value): 9.1% of lithium oxide, 21.3% of silicon oxide, 32.9% of boron oxide
%, Barium oxide 4%, aluminum oxide 21.9%,
6.3% magnesium oxide, 4.5% calcium oxide.

Properties: glass transition point 472 ° C., softening point under load 515 ° C., coefficient of thermal expansion 83 × 10 ⁻⁷ / K, refractive index 1.59, average particle diameter 2.3 μm, maximum particle diameter 22 μm
m.

As the filler B, an average particle diameter of 0.01
10 parts by weight of ruthenium oxide of μm were used.

Example 1 was repeated except that the above photosensitive polymer, 70 parts by weight of low melting glass powder and metal oxide were used. A black partition having a good shape and without peeling was obtained.

Low melting point glass and filler B in inorganic fine particles
Is 87.5: 12.5, and the mixing ratio (%) of the inorganic fine particles and the photosensitive organic component is 71.8:
28.2.

The total light transmittance of the photosensitive paste coating film of this example was 60%, and the stimulus value Y of the fired film in the XYZ color system was 2. In the obtained display, the contrast was improved by the effect of the black partition walls. Example 4 Example 3 was repeated except that 50 parts by weight of low melting glass powder and 8 parts by weight of cobalt oxide having an average particle diameter of 0.008 μm and 2 parts by weight of nickel oxide having an average particle diameter of 0.014 μm were used as filler B. Was. A black partition having a good shape and without peeling was obtained.

Low melting point glass and filler B in inorganic fine particles
Is 83.3: 16.7, and the mixing ratio (%) of the inorganic fine particles and the photosensitive organic component is 65.6:
34.4.

The photosensitive paste coated film of this example had a total light transmittance of 75%, and the baked film had a stimulus value Y of 12 in the XYZ color system. In the obtained display, the contrast was improved by the effect of the black partition walls. Example 5 Example 3 was repeated except that titanium carbide having an average particle diameter of 0.008 μm was used as the filler B. A black partition having a good shape and without peeling was obtained.

The total light transmittance of the photosensitive paste coating film of this example was 60%, and the stimulus value Y in the XYZ color system of the fired film was 4.2. In the obtained display, the contrast was improved by the effect of the black partition walls. Example 6 Example 3 was repeated, except that tantalum carbide having an average particle diameter of 0.007 μm was used as the filler B, and low melting glass powder having the following composition and characteristics was used.

Composition of low-melting glass (analytical value): 3.6% sodium oxide, 5.3% potassium oxide, 8.4% silicon oxide, 8.2% aluminum oxide, 3% boron oxide
1.4%, zinc oxide 36.3%, magnesium oxide 0.
5%, calcium oxide 2.8%, barium oxide 3.5
%.

Characteristics: glass transition point 483 ° C., softening point under load 519 ° C., coefficient of thermal expansion 76 × 10 ⁻⁷ / K, refractive index 1.6
0, average particle size 3.5 μm, maximum particle size 37.0 μm.

A black partition wall having a good shape and without peeling was obtained. The total light transmittance of the photosensitive paste coating film of this example was 65%, and the stimulus value Y of the fired film in the XYZ color system was 6. In the obtained display, the contrast was improved by the effect of the black partition walls. Example 7 Example 1 was repeated except that 10 parts by weight of a high melting point glass powder having the following composition and properties were added as filler A constituting inorganic fine particles, and a low melting point glass powder having the following composition and properties was used. Was repeated.

Composition of high melting point glass: silicon oxide 38%, boron oxide 10%, barium oxide 5%, calcium oxide 4
%, Aluminum oxide 36%, zinc oxide 2%, magnesium oxide 5%.

Properties of high melting point glass: glass transition point is 65
2 ° C, softening point under load of 746 ° C, coefficient of thermal expansion 43 × 10 ^-7
/ K, average particle size 2.4 μm, average refractive index 1.59.

Composition of low-melting glass (analytical value): 8.9% lithium oxide, 21.6% silicon oxide, 20.7% aluminum oxide, 43.7% boron oxide, 1.2 zinc oxide
%, Magnesium oxide 0.6%, calcium oxide 0.9
%, Barium oxide 2.4%.

Properties of low melting point glass: glass transition point 479
° C, softening point under load of 509 ° C, thermal expansion coefficient 73 × 10 ^-7 /
K, refractive index 1.53, average particle size 3.1 μm, maximum particle size 1
5.6 μm.

A black partition having a good shape and without peeling was obtained.

Low melting glass in inorganic fine particles, filler B
And the mixing ratio (%) of the filler A is 75.7: 11.
7: 12.6, and the mixing ratio (%) of the inorganic fine particles and the photosensitive organic component was 71.8: 28.2.

The total light transmittance of the photosensitive paste coating film of this example was 70%, and the stimulus value Y of the fired film in the XYZ color system was 7. In the obtained display, the contrast was improved by the effect of the black partition walls. Example 8 Example 2 was repeated except that 5 parts by weight of cordierite was added as filler A. A black partition having a good shape and without peeling was obtained.

Low-melting glass in inorganic fine particles, filler B
And the mixing ratio (%) of the filler A is 80: 13.3:
6.7, and the mixing ratio (%) of the inorganic fine particles to the photosensitive organic component was 70.6: 29.5.

The photosensitive paste-coated film of this example had a total light transmittance of 67%, and the baked film had a stimulus value Y of 6 in the XYZ color system. In the obtained display, the contrast was improved by the effect of the black partition walls. Example 9 A display using an electron-emitting device was manufactured by sealing a back substrate on which an electron source in which an electron-emitting device was manufactured was fixed, and a front substrate on which a phosphor layer and a metal back were formed. Between the front substrate and the rear substrate, a support frame and a partition wall (spacer) as an anti-atmospheric pressure support member were produced.

On the substrate on which the surface conduction electron-emitting device and the wiring between the electrodes were formed, the photosensitive paste used in Example 1 was applied and dried by screen printing on the entire surface, and this was repeated to obtain a dried thickness of about 1.0 mm. Was formed. In this coating film, a stripe-shaped opening having a width of 2 mm was formed by 1 cm.
15m output by contacting the photomask with pitch
It was exposed to ultraviolet light using a W / cm ² ultrahigh pressure mercury lamp. The exposure amount was 1.2 J / cm ² .

Next, a second application and drying of the photosensitive paste is performed to form a second coating film having the same thickness as that of the first application. This time, a photomask having an opening width of 1.6 mm is applied to the first application. Alignment was performed so as to correspond to the exposed portion, and exposure was performed similarly. This method is repeated up to the third stage, where the width 1.
A photomask having a 2 mm opening was used. The coating film thus exposed is developed and washed with the same means as in Example 1, and has a platform-like height of three steps 2.3.
A stripe-shaped partition (spacer) pattern having a width of mm was formed. This was fired in air at 560 ° C. for 30 minutes to obtain a back substrate for a display using an electron-emitting device.

On the other hand, a front substrate provided with a black matrix and a phosphor layer which emits light in three primary colors and provided with a metal back was separately prepared and sealed with the rear substrate to obtain a display using electron-emitting devices. In the obtained display, the contrast was improved by the effect of the black partition walls. Example 10 The photosensitive paste used in Example 1 was applied to a glass substrate on which an indium tin oxide (ITO) transparent electrode film was patterned in a stripe shape to obtain a coating film having a thickness of 10 μm. Exposure and development were performed using a striped photomask orthogonal to the ITO electrodes to form a partition pattern having a width of 25 μm. This was fired to form a partition having a width of 20 μm and a height of 7 μm. While rotating the substrate, N, N′-diphenyl-N, N′-di (3-methylphenyl) -1,
1′-diphenyl-4,4′-diamine (TPD)
After depositing 550 Å of an 8-hydroxyquinoline aluminum complex (Alq ₃ ) at 00 Å, the rotation of the substrate was stopped and aluminum was deposited at 1000 Å in a direction perpendicular to the substrate surface. An organic electroluminescent device was obtained by forming a silicon oxide film as a protective layer on the entire surface. The formed black partition had an effect as a black matrix, and the image contrast was improved. Comparative Example 1 In Example 1, when the compounding amount of the filler B was 3.4 parts by weight of nickel oxide and 1.2 parts by weight of cobalt oxide,
The ratio of the low melting point glass powder and the filler B in the inorganic fine particles is 92.9: 7.1. Example 1 was repeated except that the inorganic fine particles were used. Although the total light transmittance of the photosensitive paste coating film was high and showed excellent partition pattern forming properties, the stimulus value Y in the XYZ color system of the obtained fired film was 15 or more, and the partition walls were grayed, The display contrast was reduced. Example 11 Low-melting glass powder as inorganic fine particles and filler B
Example 1 was repeated, except that the mixing ratio of was the same, and the ratio of the inorganic fine particles to the photosensitive organic component was 5.3: 4.7. When the present photosensitive paste was used, there was no problem in the formability of the partition pattern, and a black partition having a good shape and without peeling was obtained. In the obtained display, the contrast was improved by the effect of the black partition walls. However, a change over time in the discharge characteristics was observed, possibly due to insufficient binder removal in the firing step. Description of Abbreviations _{MGP400: X 2 N-CH (} CH 3) -CH 2 - (OCH 2 CH (CH 3)) n -NX 2 X: -CH 2 CH (H) -CH 2 O-CO-C ( CH ₃ ) = CH ₂ n: 2 to 10 IC-369: Irgacure 369 (product of Ciba Geigy) 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butanone-1

[0109]

By using the photosensitive paste of the present invention, it is possible to form black partition walls which have good pattern formability and contribute to improvement of contrast.

──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) H01J 9/24 H01J 9/24 A 11/02 11/02 B F term (Reference) 2H025 AA00 AA03 AB17 AC01 AD01 BC12 BC31 CC12 FA29 4J038 FA011 FA091 FA141 FA161 FA221 GA06 HA076 HA216 HA486 KA03 KA06 KA20 NA18 NA19 PA17 PB08 PB09 PC03 5C012 AA09 BB01 BB07 5C027 AA02 AA09 5C040 GF18 GF19 KA08 KA10 KB28 MA02

Claims (15)

[Claims] 1. A photosensitive paste containing inorganic fine particles and a photosensitive organic component, wherein the inorganic fine particles have a low melting point glass powder of 50 to 90% by weight and an average particle size of 0.003 to 0.
08 μm of a filler (filler B) of 10 to 50% by weight, and the filler B contains Ru, Mn, Ni, Cr,
Fe, Co and Cu oxides and Si, Ti, T
a, containing at least one selected from the group consisting of carbides of a, Zr and Cr, and having a total light transmittance of 50% or more when the photosensitive paste is formed into a coating film having a thickness of 140 μm; X after firing the coating film
A photosensitive paste having a stimulus value Y of 15 or less in a YZ color system. 2. The photosensitive paste according to claim 1, wherein the inorganic fine particles have a particle size distribution having a peak in the range of 0.003 to 0.08 μm. 3. The method according to claim 1, wherein the low melting point glass powder is Ru, Mn, Ni,
2. The photosensitive paste according to claim 1, comprising at least one selected from oxides of Cr, Fe, Co, and Cu. 4. The photosensitive paste according to claim 1, wherein the photosensitive paste contains inorganic fine particles and a photosensitive organic component in a weight ratio of 6: 4 to 9: 1. 5. An inorganic fine particle further having an average particle diameter of 1.5 to 1.5.
2. The photosensitive paste according to claim 1, wherein the photosensitive paste contains 30% by weight or less of a 5 [mu] m filler (Filler A). 6. The filler A has an average refractive index of 1.45 to 1.
The photosensitive paste according to claim 5, wherein 7. The photosensitive paste according to claim 6, wherein the filler A contains at least one selected from cordierite and high melting point glass powder. 8. A high melting glass powder having a glass transition point of 500
The photosensitive paste according to claim 7, which is a glass powder having a softening point under load of from 550 to 1200C. 9. The high melting point glass powder contains the following composition in terms of oxide.
The photosensitive paste as described in the above. Silicon oxide 15-50% by weight Boron oxide 5-20% by weight Aluminum oxide 15-50% by weight Barium oxide 2-10% by weight 10. A low melting glass powder having a glass transition point of 40
2. The photosensitive paste according to claim 1, wherein the photosensitive paste is a glass powder having a softening point under load of from 0 to 550 [deg.] C. 11. The low melting point glass powder has an average refractive index of 1.
The photosensitive paste according to claim 1, wherein the ratio is 5 to 1.65. 12. The photosensitive paste according to claim 1, wherein the low melting point glass powder contains the following composition in terms of oxide. Silicon oxide: 5 to 30% by weight Boron oxide: 20 to 45% by weight Aluminum oxide: 10 to 25% by weight At least one of lithium oxide, sodium oxide and potassium oxide: 3 to 15% by weight Of strontium oxide and barium oxide At least one: 2 to 15% by weight At least one of magnesium oxide and calcium oxide: 2 to 15% by weight 13. A display, wherein a partition is formed by using the photosensitive paste according to claim 1. 14. A display comprising a plasma display panel, a plasma addressed liquid crystal display, a display using an electron-emitting device, a display using an organic electroluminescent device or a display using a fluorescent display tube device. Item 14. The display according to Item 13. 15. A member for a display, wherein a partition is formed by using the photosensitive paste according to claim 1. Description: