JP3527735B1 - フッ素ガス発生装置 - Google Patents
フッ素ガス発生装置Info
- Publication number
- JP3527735B1 JP3527735B1 JP2002336406A JP2002336406A JP3527735B1 JP 3527735 B1 JP3527735 B1 JP 3527735B1 JP 2002336406 A JP2002336406 A JP 2002336406A JP 2002336406 A JP2002336406 A JP 2002336406A JP 3527735 B1 JP3527735 B1 JP 3527735B1
- Authority
- JP
- Japan
- Prior art keywords
- gas
- supply line
- inert gas
- hydrogen fluoride
- automatic valve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 61
- 239000011737 fluorine Substances 0.000 title claims abstract description 61
- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 61
- 239000007789 gas Substances 0.000 claims abstract description 133
- 239000011261 inert gas Substances 0.000 claims abstract description 113
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 44
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims abstract description 44
- 150000003839 salts Chemical class 0.000 claims abstract description 7
- 238000003860 storage Methods 0.000 claims description 22
- 238000001514 detection method Methods 0.000 claims description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 10
- 238000011144 upstream manufacturing Methods 0.000 abstract description 8
- 239000007788 liquid Substances 0.000 description 19
- 210000004027 cell Anatomy 0.000 description 14
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 6
- 229910000792 Monel Inorganic materials 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000007711 solidification Methods 0.000 description 4
- 230000008023 solidification Effects 0.000 description 4
- 210000005056 cell body Anatomy 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- PPFMPOUQEOXUNI-UHFFFAOYSA-N F.[Ne] Chemical compound F.[Ne] PPFMPOUQEOXUNI-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- VZPPHXVFMVZRTE-UHFFFAOYSA-N [Kr]F Chemical compound [Kr]F VZPPHXVFMVZRTE-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- ISQINHMJILFLAQ-UHFFFAOYSA-N argon hydrofluoride Chemical compound F.[Ar] ISQINHMJILFLAQ-UHFFFAOYSA-N 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001784 detoxification Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 229910000856 hastalloy Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- VBKNTGMWIPUCRF-UHFFFAOYSA-M potassium;fluoride;hydrofluoride Chemical compound F.[F-].[K+] VBKNTGMWIPUCRF-UHFFFAOYSA-M 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 229910052704 radon Inorganic materials 0.000 description 1
- SYUHGPGVQRZVTB-UHFFFAOYSA-N radon atom Chemical compound [Rn] SYUHGPGVQRZVTB-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/24—Halogens or compounds thereof
- C25B1/245—Fluorine; Compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/02—Process control or regulation
- C25B15/023—Measuring, analysing or testing during electrolytic production
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002336406A JP3527735B1 (ja) | 2002-11-20 | 2002-11-20 | フッ素ガス発生装置 |
| TW092129624A TWI242537B (en) | 2002-11-20 | 2003-10-24 | Fluorine gas generator |
| US10/702,646 US20040108201A1 (en) | 2002-11-20 | 2003-11-07 | Fluorine gas generator |
| EP03026445A EP1422319A3 (en) | 2002-11-20 | 2003-11-19 | Fluorine gas generator |
| KR1020030082052A KR100543647B1 (ko) | 2002-11-20 | 2003-11-19 | 불소가스 발생장치 |
| CNB2003101196923A CN1266031C (zh) | 2002-11-20 | 2003-11-20 | 氟气发生装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002336406A JP3527735B1 (ja) | 2002-11-20 | 2002-11-20 | フッ素ガス発生装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP3527735B1 true JP3527735B1 (ja) | 2004-05-17 |
| JP2004169123A JP2004169123A (ja) | 2004-06-17 |
Family
ID=32212090
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002336406A Expired - Fee Related JP3527735B1 (ja) | 2002-11-20 | 2002-11-20 | フッ素ガス発生装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20040108201A1 (zh) |
| EP (1) | EP1422319A3 (zh) |
| JP (1) | JP3527735B1 (zh) |
| KR (1) | KR100543647B1 (zh) |
| CN (1) | CN1266031C (zh) |
| TW (1) | TWI242537B (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8366886B2 (en) | 2005-08-25 | 2013-02-05 | Toyo Tanso Co., Ltd. | Fluorogas generator |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3569277B1 (ja) * | 2003-05-28 | 2004-09-22 | 東洋炭素株式会社 | ガス発生装置の電流制御方法及び電流制御装置 |
| JP4018726B2 (ja) | 2006-02-07 | 2007-12-05 | 東洋炭素株式会社 | 半導体製造プラント |
| JP4606396B2 (ja) * | 2006-09-15 | 2011-01-05 | 東京エレクトロン株式会社 | 処理ガス供給システム及び処理ガス供給方法 |
| JP5659449B2 (ja) * | 2008-03-04 | 2015-01-28 | カシオ計算機株式会社 | フッ素ガス発生方法 |
| WO2009156304A1 (de) * | 2008-06-25 | 2009-12-30 | Basf Se | Verfahren zum sicheren vermeiden von rückströmung bei der förderung einer flüssigkeit |
| JP5659491B2 (ja) * | 2009-01-30 | 2015-01-28 | セントラル硝子株式会社 | フッ素ガス発生装置を含む半導体製造設備 |
| JP5521372B2 (ja) * | 2009-04-03 | 2014-06-11 | セントラル硝子株式会社 | フッ素ガスのｉｎ−ｓｉｔｕガス混合および希釈システム |
| JP2011084806A (ja) * | 2009-06-29 | 2011-04-28 | Central Glass Co Ltd | フッ素ガス生成装置 |
| JP5581676B2 (ja) * | 2009-12-02 | 2014-09-03 | セントラル硝子株式会社 | フッ素ガス生成装置 |
| JP5544895B2 (ja) * | 2010-01-21 | 2014-07-09 | セントラル硝子株式会社 | フッ素ガス生成装置 |
| SG184131A1 (en) * | 2010-03-26 | 2012-10-30 | Solvay | Method for the supply of fluorine |
| JP5431223B2 (ja) | 2010-03-29 | 2014-03-05 | 東洋炭素株式会社 | 気体発生装置 |
| TWI525042B (zh) * | 2010-09-16 | 2016-03-11 | 首威公司 | 氟化氫供應單元 |
| US20120092950A1 (en) * | 2010-10-15 | 2012-04-19 | Bertrand Michel Jean-Claude Colomb | Low pressure drop blender |
| CN104350181A (zh) * | 2011-12-22 | 2015-02-11 | 索尔维公司 | 用于产生氟的电解池中的液位控制 |
| WO2013092772A1 (en) * | 2011-12-22 | 2013-06-27 | Solvay Sa | Method of feeding hydrogen fluoride into an electrolytic cell |
| CN105089869B (zh) * | 2015-06-04 | 2018-12-14 | 武汉大学 | 一种双套筒式电极用水作燃料的内燃机装置 |
| CN106757145A (zh) * | 2017-03-07 | 2017-05-31 | 洛阳黎明大成氟化工有限公司 | 一种电解槽用氟化氢自动化供料装置及其使用方法 |
| KR20230165878A (ko) | 2018-08-29 | 2023-12-05 | 엠케이에스 인스트루먼츠 인코포레이티드 | 오존수 전달 시스템 및 사용 방법 |
| CN110965078A (zh) * | 2019-12-10 | 2020-04-07 | 中核二七二铀业有限责任公司 | 一种氟化氢供料的自动控制装置 |
| FR3111133A1 (fr) * | 2020-06-04 | 2021-12-10 | Université du Mans | Procede de traitement chimique automatise d’un substrat solide par une ligne de fluoration |
| CN114789915B (zh) * | 2022-04-11 | 2023-10-24 | 福建省龙德新能源有限公司 | 五氟化磷连续自动化生产方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2967466A (en) * | 1956-06-20 | 1961-01-10 | Warren Brothers Road Company | Pavement and method of making the same |
| JPH0353090A (ja) * | 1989-07-18 | 1991-03-07 | Asahi Glass Co Ltd | フッ素の製造方法 |
| JP2809811B2 (ja) * | 1990-04-27 | 1998-10-15 | 三井化学株式会社 | 三弗化窒素ガスの製造方法 |
| US6350425B2 (en) * | 1994-01-07 | 2002-02-26 | Air Liquide America Corporation | On-site generation of ultra-high-purity buffered-HF and ammonium fluoride |
| GB9418598D0 (en) | 1994-09-14 | 1994-11-02 | British Nuclear Fuels Plc | Fluorine cell |
| US6383300B1 (en) * | 1998-11-27 | 2002-05-07 | Tokyo Electron Ltd. | Heat treatment apparatus and cleaning method of the same |
| WO2001077412A1 (fr) * | 2000-04-07 | 2001-10-18 | Toyo Tanso Co., Ltd. | Appareil pour la production de fluor gazeux |
| JP2002164335A (ja) * | 2000-11-27 | 2002-06-07 | Canon Sales Co Inc | 半導体製造装置の洗浄方法及び半導体製造装置 |
| US20040037768A1 (en) * | 2001-11-26 | 2004-02-26 | Robert Jackson | Method and system for on-site generation and distribution of a process gas |
-
2002
- 2002-11-20 JP JP2002336406A patent/JP3527735B1/ja not_active Expired - Fee Related
-
2003
- 2003-10-24 TW TW092129624A patent/TWI242537B/zh not_active IP Right Cessation
- 2003-11-07 US US10/702,646 patent/US20040108201A1/en not_active Abandoned
- 2003-11-19 KR KR1020030082052A patent/KR100543647B1/ko not_active IP Right Cessation
- 2003-11-19 EP EP03026445A patent/EP1422319A3/en not_active Withdrawn
- 2003-11-20 CN CNB2003101196923A patent/CN1266031C/zh not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8366886B2 (en) | 2005-08-25 | 2013-02-05 | Toyo Tanso Co., Ltd. | Fluorogas generator |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20040044371A (ko) | 2004-05-28 |
| JP2004169123A (ja) | 2004-06-17 |
| KR100543647B1 (ko) | 2006-01-20 |
| EP1422319A2 (en) | 2004-05-26 |
| EP1422319A3 (en) | 2011-08-10 |
| CN1502548A (zh) | 2004-06-09 |
| TWI242537B (en) | 2005-11-01 |
| TW200409833A (en) | 2004-06-16 |
| CN1266031C (zh) | 2006-07-26 |
| US20040108201A1 (en) | 2004-06-10 |
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