JP3500620B2 - 投影露光方法及び装置 - Google Patents

投影露光方法及び装置

Info

Publication number
JP3500620B2
JP3500620B2 JP25783594A JP25783594A JP3500620B2 JP 3500620 B2 JP3500620 B2 JP 3500620B2 JP 25783594 A JP25783594 A JP 25783594A JP 25783594 A JP25783594 A JP 25783594A JP 3500620 B2 JP3500620 B2 JP 3500620B2
Authority
JP
Japan
Prior art keywords
exposure
mask
photosensitive substrate
exposure mode
mode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP25783594A
Other languages
English (en)
Japanese (ja)
Other versions
JPH08124829A (ja
Inventor
健爾 西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP25783594A priority Critical patent/JP3500620B2/ja
Priority to KR1019950037561A priority patent/KR100383297B1/ko
Publication of JPH08124829A publication Critical patent/JPH08124829A/ja
Priority to US08/906,429 priority patent/US5854671A/en
Priority to US09/572,560 priority patent/US6462807B1/en
Priority to US10/199,324 priority patent/US6707536B2/en
Priority to US10/721,425 priority patent/US6900879B2/en
Application granted granted Critical
Publication of JP3500620B2 publication Critical patent/JP3500620B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
JP25783594A 1993-05-28 1994-10-24 投影露光方法及び装置 Expired - Lifetime JP3500620B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP25783594A JP3500620B2 (ja) 1994-10-24 1994-10-24 投影露光方法及び装置
KR1019950037561A KR100383297B1 (ko) 1994-10-24 1995-10-24 투영노광방법및장치
US08/906,429 US5854671A (en) 1993-05-28 1997-08-05 Scanning exposure method and apparatus therefor and a projection exposure apparatus and method which selectively chooses between static exposure and scanning exposure
US09/572,560 US6462807B1 (en) 1993-05-28 2000-05-16 Projection exposure apparatus and method
US10/199,324 US6707536B2 (en) 1993-05-28 2002-07-22 Projection exposure apparatus
US10/721,425 US6900879B2 (en) 1993-05-28 2003-11-26 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25783594A JP3500620B2 (ja) 1994-10-24 1994-10-24 投影露光方法及び装置

Publications (2)

Publication Number Publication Date
JPH08124829A JPH08124829A (ja) 1996-05-17
JP3500620B2 true JP3500620B2 (ja) 2004-02-23

Family

ID=17311801

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25783594A Expired - Lifetime JP3500620B2 (ja) 1993-05-28 1994-10-24 投影露光方法及び装置

Country Status (2)

Country Link
JP (1) JP3500620B2 (ko)
KR (1) KR100383297B1 (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5896188A (en) * 1996-11-25 1999-04-20 Svg Lithography Systems, Inc. Reduction of pattern noise in scanning lithographic system illuminators
SG103303A1 (en) * 2000-07-07 2004-04-29 Nikon Corp Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method
KR100479639B1 (ko) * 2002-04-06 2005-03-30 재단법인서울대학교산학협력재단 다층 박막의 제조를 위한 화학 기상 증착 장치 및 이를 이용한 다층 박막 증착 방법
WO2012057707A1 (en) * 2010-10-28 2012-05-03 National University Of Singapore Lithography method and apparatus
EP3117191A4 (en) 2014-03-13 2018-03-28 National University of Singapore An optical interference device

Also Published As

Publication number Publication date
KR960015095A (ko) 1996-05-22
KR100383297B1 (ko) 2003-08-21
JPH08124829A (ja) 1996-05-17

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