JP3385410B2 - Noble gas purification method and apparatus - Google Patents

Noble gas purification method and apparatus

Info

Publication number
JP3385410B2
JP3385410B2 JP17828693A JP17828693A JP3385410B2 JP 3385410 B2 JP3385410 B2 JP 3385410B2 JP 17828693 A JP17828693 A JP 17828693A JP 17828693 A JP17828693 A JP 17828693A JP 3385410 B2 JP3385410 B2 JP 3385410B2
Authority
JP
Japan
Prior art keywords
gas
oxygen
xenon
krypton
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP17828693A
Other languages
Japanese (ja)
Other versions
JPH0735473A (en
Inventor
勝彦 牧之瀬
秀幸 本田
義行 桝井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Nippon Sanso Corp
Original Assignee
Taiyo Nippon Sanso Corp
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Filing date
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Priority to JP17828693A priority Critical patent/JP3385410B2/en
Publication of JPH0735473A publication Critical patent/JPH0735473A/en
Application granted granted Critical
Publication of JP3385410B2 publication Critical patent/JP3385410B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04406Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air using a dual pressure main column system
    • F25J3/04412Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air using a dual pressure main column system in a classical double column flowsheet, i.e. with thermal coupling by a main reboiler-condenser in the bottom of low pressure respectively top of high pressure column
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04642Recovering noble gases from air
    • F25J3/04745Krypton and/or Xenon
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04642Recovering noble gases from air
    • F25J3/04745Krypton and/or Xenon
    • F25J3/04751Producing pure krypton and/or xenon recovered from a crude krypton/xenon mixture
    • F25J3/04757Producing pure krypton and/or xenon recovered from a crude krypton/xenon mixture using a hybrid system, e.g. using adsorption, permeation or catalytic reaction
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2200/00Processes or apparatus using separation by rectification
    • F25J2200/34Processes or apparatus using separation by rectification using a side column fed by a stream from the low pressure column
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2205/00Processes or apparatus using other separation and/or other processing means
    • F25J2205/60Processes or apparatus using other separation and/or other processing means using adsorption on solid adsorbents, e.g. by temperature-swing adsorption [TSA] at the hot or cold end
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2215/00Processes characterised by the type or other details of the product stream
    • F25J2215/34Krypton
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2215/00Processes characterised by the type or other details of the product stream
    • F25J2215/36Xenon
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2235/00Processes or apparatus involving steps for increasing the pressure or for conveying of liquid process streams
    • F25J2235/04Processes or apparatus involving steps for increasing the pressure or for conveying of liquid process streams using a pressure accumulator
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2290/00Other details not covered by groups F25J2200/00 - F25J2280/00
    • F25J2290/62Details of storing a fluid in a tank

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Separation By Low-Temperature Treatments (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、希ガス、特にクリプト
ン及びキセノンの精製方法及び装置に関し、詳しくは、
空気液化分離装置の複精留塔上部塔下部の液化酸素中に
濃縮されるクリプトン及びキセノンを精製する方法及び
装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for purifying rare gases, especially krypton and xenon, and more specifically,
The present invention relates to a method and a device for purifying krypton and xenon which are concentrated in liquefied oxygen in the upper part of a double rectification column and the lower part of an air liquefaction separation device.

【0002】[0002]

【従来の技術】従来から、空気液化分離装置の液化酸素
中に濃縮されるクリプトン及びキセノンを取り出して精
製し、精製後のクリプトン及びキセノンをそれぞれに分
離することが行われている。通常、これらの装置は、上
記液化酸素を精留を主とした操作によりクリプトン90
〜95%及びキセノン5〜7%の濃縮液を得た後、さら
にクリプトンとキセノンとを分離するようにしている。
2. Description of the Related Art Conventionally, krypton and xenon which are concentrated in liquefied oxygen of an air liquefaction separation apparatus are taken out and purified, and the purified krypton and xenon are separated into each. Usually, these devices use krypton 90 by an operation mainly for rectifying the liquefied oxygen.
After obtaining a concentrated solution of .about.95% and xenon of 5 to 7%, krypton and xenon are further separated.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、大気中
に含まれるクリプトン及びキセノンは、極微量であるた
め、連続した精製を行うことができず、一貫した精製工
程を有する装置の製作が困難であった。また、原料であ
る液化酸素中には、大気中に極微量存在する各種成分が
混入しているが、この中で、ハロゲン系不純物、例えば
六フッ化イオウ,フロン13,フロン14,フロン16
等は、通常の希ガスの精製工程に設けられる精留操作や
触媒反応,吸着分離操作等では除去することができず、
さらに濃縮された状態で製品のクリプトンやキセノンの
中に混入することになる。
However, since the amounts of krypton and xenon contained in the atmosphere are extremely small, continuous purification cannot be performed, and it is difficult to manufacture a device having a consistent purification process. It was In addition, liquefied oxygen, which is a raw material, contains various components that are present in the air in extremely small amounts. Among them, halogen-based impurities such as sulfur hexafluoride, Freon 13, Freon 14, Freon 16
Etc. cannot be removed by a rectification operation, a catalytic reaction, an adsorption separation operation, etc., which are usually provided in a rare gas purification step,
It will be mixed in the krypton and xenon of the product in a more concentrated state.

【0004】そこで、最終的に製品クリプトンと製品キ
セノンとを分離する精留操作を行い、製品クリプトン及
び製品キセノンを採取した後、再度クリプトン,キセノ
ンとハロゲン系不純物とを分離する精留操作を行い、こ
れらのハロゲン系不純物を分離除去するようにしてい
た。ところが、精留による分離除去を行うと、製品クリ
プトン及びキセノンの製品収率が低下する問題があっ
た。
Therefore, finally, a rectification operation for separating the product krypton and the product xenon is performed, and after collecting the product krypton and the product xenon, a rectification operation for separating the krypton, xenon and the halogen impurities is performed again. The halogen-based impurities are separated and removed. However, if the separation and removal are performed by rectification, there is a problem that the product yields of the product krypton and xenon decrease.

【0005】また、運転上からも、精留運転を繰り返さ
なければならないため、運転時間が長くなるだけでな
く、非常に高度の運転技術が必要であり、例えば運転の
自動化を阻害する要因となっていた。
Further, since the rectification operation must be repeated from the viewpoint of operation, not only the operation time becomes long, but also an extremely advanced operation technique is required, which becomes a factor that hinders the automation of operation, for example. Was there.

【0006】特に、前述のハロゲン系不純物は、非常に
安定な物質であり、従来、分解,反応により除去するこ
とが困難とされていたが、近年、ゲッター剤を使用する
ことにより反応除去することが可能であることが発表さ
れた。例えば、特公平4−149010号公報には、ゲ
ッター剤としてカルシウム又はマグネシウムを用いるこ
と、及び、必要に応じてこれにチタン,ジルコニウム系
のゲッター剤を併用し、適当な温度、例えば500〜7
00℃まで昇温して処理することによりハロゲン系不純
物を除去できることが記載されている。
In particular, the above-mentioned halogen-based impurities are extremely stable substances, and it has been conventionally difficult to remove them by decomposition and reaction, but in recent years, they have been removed by reaction by using getter agents. It was announced that is possible. For example, in Japanese Examined Patent Publication No. 4-149010, calcium or magnesium is used as a getter agent, and if necessary, a titanium or zirconium-based getter agent is used in combination at an appropriate temperature, for example, 500 to 7.
It is described that halogen-based impurities can be removed by heating to 00 ° C. and treating.

【0007】しかし、上記ゲッター剤による処理は、該
ゲッター剤を充填した反応筒にガスを通して行うもので
あるため、通常、1.5〜2.0kg/cm2 Gの圧力
損失が発生する。したがって、従来の希ガスの精製設備
に単にゲッター剤による処理設備を付加した場合は、圧
力損失に応じた昇圧機も同時に設置する必要があり、設
備費,動力費等のアップとなる。
However, since the treatment with the getter agent is carried out by passing gas through the reaction tube filled with the getter agent, a pressure loss of 1.5 to 2.0 kg / cm 2 G is usually generated. Therefore, when a treatment facility using a getter agent is simply added to the conventional rare gas refining facility, it is necessary to install a booster corresponding to the pressure loss at the same time, resulting in an increase in facility cost, power cost and the like.

【0008】また、通常、クリプトンやキセノンの採取
方法は、最終の分離精留塔から液化窒素中に浸漬した捕
集器に固化させて吸引し、次いで捕集器を加温して昇圧
し、製品ボンベに充填する方式が行われていた。この場
合、製品ボンベ圧力は、捕集器と製品ボンベ及びその連
通管の容量により左右され、製品ボンベの容積が捕集器
と連通管とを合わせた容積よりも大きいほど、製品ボン
ベ内の圧力を高くすることができる。
[0008] Usually, krypton or xenon is collected by solidifying and sucking a collector immersed in liquefied nitrogen from the final separation rectification column, and then heating the collector to raise the pressure, The method of filling the product cylinder was used. In this case, the product cylinder pressure depends on the capacities of the collector, the product cylinder and its communicating pipe. The larger the volume of the product cylinder is than the combined volume of the collector and the communicating pipe, the pressure inside the product cylinder. Can be higher.

【0009】したがって、捕集器と製品ボンベ(充填
台)との間に前述のゲッター剤を使用した反応筒を設置
すると、連通管部分の容積が増大する結果となり、製品
圧力を上げるのが困難になる。さらに、クリプトン及び
キセノンのそれぞれに反応筒を設置する必要があり、ま
た、反応筒の設計圧力も高くなるため、設備費の面でも
問題である。
Therefore, if the reaction tube using the above-mentioned getter agent is installed between the collector and the product cylinder (filling table), the volume of the communication pipe portion is increased and it is difficult to increase the product pressure. become. Furthermore, since it is necessary to install a reaction cylinder in each of krypton and xenon, and the design pressure of the reaction cylinder also becomes high, there is a problem in terms of equipment cost.

【0010】そこで本発明は、上記クリプトン及びキセ
ノン等の希ガスを効率よく分離することができ、しかも
高純度に精製したクリプトン及びキセノン等の希ガスを
得ることができる精製方法及び装置を提供することを目
的としている。
Therefore, the present invention provides a refining method and apparatus capable of efficiently separating the above-mentioned rare gases such as krypton and xenon, and further obtaining highly purified rare gases such as krypton and xenon. Is intended.

【0011】[0011]

【課題を解決するための手段】上記した目的を達成する
ため、本発明の希ガスの精製方法は、空気液化分離装置
から導出されるクリプトン,キセノン等の希ガスを含む
液化酸素中の大部分の酸素及び炭化水素類を除去して液
状に濃縮した希ガスを得る粗精製系と、該粗精製系で濃
縮した液状の希ガス中に残存する炭化水素類,酸素等の
不純物を除去する高純精製系とにより希ガスを精製する
方法において、前記粗精製系で得た液状の希ガスを自己
加圧式貯槽に一時貯留し、該貯槽で加圧して前記高純精
製系に導入し、該高純精製系に設けたゲッターを使用し
たハロゲン系不純物除去工程で希ガス中のハロゲン系不
純物を除去することを特徴としている。なお、本発明に
おける「自己加圧式貯槽」は、液化ガスを貯留する貯槽
に、該貯槽から導出した液化ガスを蒸発させる蒸発器及
び該蒸発器にて蒸発したガスを貯槽に導入する加圧弁を
有する経路を付設したもので、加圧弁を開いて、貯槽か
ら導出した液化ガスを蒸発器を通しながら大気等により
加温して蒸発させ、この蒸発したガスを前記貯槽内に導
入して、該貯槽内を所定の圧力に高めて、この圧力によ
り貯槽内の液化ガスを所望の機器や設備に供給するもの
である
In order to achieve the above-mentioned object, the method for purifying a rare gas according to the present invention is a method for purifying most of liquefied oxygen containing a rare gas such as krypton or xenon derived from an air liquefaction separation device. A crude purification system for removing oxygen and hydrocarbons of the above to obtain a rare gas concentrated in a liquid state, and a high purification system for removing impurities such as hydrocarbons and oxygen remaining in the liquid rare gas concentrated in the crude purification system. In a method of purifying a rare gas by a pure purification system, the liquid rare gas obtained in the crude purification system is temporarily stored in a self-pressurized storage tank, and pressurized in the storage tank to be introduced into the high-purity purification system, It is characterized in that the halogen-based impurities in the rare gas are removed in the halogen-based impurity removal step using a getter provided in the high-purity purification system. In addition, in the present invention
"Self-pressurized storage tank" is a storage tank that stores liquefied gas
And an evaporator and an evaporator for evaporating the liquefied gas discharged from the storage tank.
And a pressure valve for introducing the gas evaporated in the evaporator into the storage tank.
It is equipped with a passage that has a
The liquefied gas derived from the
It is heated and evaporated, and the evaporated gas is introduced into the storage tank.
Then, the inside of the storage tank is raised to a predetermined pressure, and this pressure
Supplying the liquefied gas in the storage tank to the desired equipment and facilities
Is .

【0012】また、本発明方法は、空気液化分離装置か
ら導出されるクリプトン,キセノンを含む液化酸素中の
大部分の酸素及び炭化水素類を除去して液状に濃縮した
クリプトンとキセノンの混合物を得る粗精製系と、該粗
精製系で濃縮した液状混合物中に残存する炭化水素類,
酸素等の不純物を除去し、次いでクリプトンとキセノン
とを精留分離する高純精製系とにより希ガスを精製する
方法において、前記粗精製系で得た液状混合物を自己加
圧式貯槽に一時貯留し、該貯槽で加圧して前記高純精製
系に導入するとともに、前記クリプトンとキセノンとを
精留分離する前段で、液状混合物に含まれるハロゲン系
不純物をゲッターにより除去することを特徴とし、さら
に、空気液化分離装置から導出されるクリプトン及びキ
セノンを含む液化酸素からクリプトン及びキセノンを精
製分離する方法において、前記液化酸素を濃縮塔に導入
して塔底液にクリプトン及びキセノンを濃縮する工程
と、該濃縮塔塔底液をメタンパージ塔に導入して塔頂か
ら酸素ガスによりメタンをパージするメタンパージ工程
と、該メタンパージ塔塔底液を気化して第1触媒反応筒
に導入して含有する炭化水素類と酸素とを反応させる第
1触媒反応工程と、該第1触媒反応筒導出後のガスを第
1吸着器に導入して第1触媒反応工程で生成した水,二
酸化炭素を吸着除去する第1吸着工程と、該第1吸着工
程導出後のガスを塔頂部に凝縮器,塔底部に蒸化器を備
えた脱酸素塔に導入して精留し、塔頂から酸素ガスを導
出除去する脱酸素工程と、該脱酸素塔の塔底液を自己加
圧式貯槽に一時貯留し、該貯槽で加圧して導出する加圧
工程と、該加圧された塔底液を気化して第2触媒反応筒
に導入し、含有する炭化水素類と酸素とを反応させる第
2触媒反応工程と、該第2触媒反応筒導出後のガスを第
2吸着器に導入して第2触媒反応工程で生成した水,二
酸化炭素を吸着除去する第2吸着工程と、第2吸着工程
導出後のガスに水素を添加して第3触媒反応筒に導入
し、含有する酸素と前記水素とを反応させて水とする第
3触媒反応工程と、該第3触媒反応筒導出後のガスを乾
燥器に導入して第3触媒反応工程で生成した水を除去す
る乾燥工程と、該乾燥工程導出後のガスを冷却液化して
過剰に添加された前記水素を分離する気液分離工程と、
該気液分離工程から導出した液を気化してゲッターによ
りハロゲン系不純物を除去するハロゲン系不純物除去工
程と、該ハロゲン系不純物除去工程導出後のガスを塔頂
部に凝縮器,塔底部に蒸化器を備えた分離塔に導入して
精留し、塔底部からキセノンを、塔頂部からクリプトン
を導出する分離工程とを順次行うことを特徴としてい
る。
Further, the method of the present invention removes most of oxygen and hydrocarbons in liquefied oxygen containing krypton and xenon discharged from the air liquefaction separation device to obtain a liquid mixture of krypton and xenon. A crude purification system and hydrocarbons remaining in the liquid mixture concentrated in the crude purification system,
In a method for purifying a rare gas by removing impurities such as oxygen and then by a highly pure purification system for rectifying and separating krypton and xenon, the liquid mixture obtained in the crude purification system is temporarily stored in a self-pressurized storage tank. While being pressurized in the storage tank and introduced into the highly pure purification system, the halogen-based impurities contained in the liquid mixture are removed by a getter before the rectifying and separating the krypton and xenon, and further, In a method for purifying and separating krypton and xenon from liquefied oxygen containing krypton and xenon derived from an air liquefaction separation device, a step of introducing the liquefied oxygen into a concentrating column to concentrate krypton and xenon in a bottom liquid, A methane purging step of introducing the bottom liquid of the concentration tower into the methane purging tower and purging methane from the tower top with oxygen gas, and the methane purging step. A first catalytic reaction step of vaporizing the column bottom liquid and introducing it into the first catalytic reaction tube to react the contained hydrocarbons with oxygen, and the gas after the first catalytic reaction tube is led to the first adsorber. A first adsorption step of introducing and adsorbing and removing water and carbon dioxide produced in the first catalytic reaction step, a gas after the derivation of the first adsorption step were provided with a condenser at the top of the column and a vaporizer at the bottom of the column. Deoxygenation step of introducing into the deoxygenation tower for rectification, derivation and removal of oxygen gas from the top of the tower, and the bottom liquid of the deoxygenation tower is temporarily stored in a self-pressurized storage tank, and pressurized in the storage tank to be discharged And a second catalytic reaction step in which the pressurized column bottom liquid is vaporized and introduced into the second catalytic reaction column to react the contained hydrocarbons with oxygen, and the second catalytic reaction. A second adsorption step of introducing the gas after being discharged from the cylinder into a second adsorber to adsorb and remove water and carbon dioxide produced in the second catalytic reaction step A third catalytic reaction step in which hydrogen is added to the gas after the second adsorption step is introduced and introduced into a third catalytic reaction column, and oxygen contained therein is reacted with the hydrogen to produce water, and the third catalytic reaction A drying step of introducing the gas after the tube is introduced into a drier to remove water generated in the third catalytic reaction step, and a gas after the drying step is cooled and liquefied to separate the excessively added hydrogen. Gas-liquid separation process,
Halogen-based impurity removal step of vaporizing the liquid derived from the gas-liquid separation step to remove halogen-based impurities by a getter, and gas after the halogen-based impurity removal step is vaporized at the top of the condenser and at the bottom of the tower. It is characterized in that it is introduced into a separation column equipped with a vessel for rectification, and xenon is extracted from the bottom of the column and krypton is extracted from the top of the column.

【0013】また、上記本発明方法を実施するための装
置構成としては、空気液化分離装置から導出されるクリ
プトン,キセノン等の希ガスを含む液化酸素中の大部分
の酸素及び炭化水素類を除去して液状に濃縮した希ガス
を得る粗精製系と、該粗精製系で濃縮した液状の希ガス
中に残存する炭化水素類,酸素等の不純物を除去する高
純精製系とを備えた希ガスの精製装置において、前記粗
精製系と高純精製系との間に、前記粗精製系で得た液状
の希ガスを一時貯留し、加圧して前記高純精製系に導入
する自己加圧式貯槽を設置したこと、前記高純精製系
は、希ガス中のハロゲン系不純物を除去するゲッターを
使用したハロゲン系不純物除去装置を備えていること、
空気液化分離装置から導出されるクリプトン,キセノン
を含む液化酸素中の大部分の酸素及び炭化水素類を除去
して液状に濃縮したクリプトンとキセノンの混合物を得
る粗精製系と、該粗精製系で濃縮した液状混合物中に残
存する炭化水素類,酸素等の不純物を除去し、クリプト
ンとキセノンとを精留分離する高純精製系とを備えた希
ガスの精製装置において、前記粗精製系と高純精製系と
の間に、前記粗精製系で得た液状の希ガスを一時貯留
し、加圧して前記高純精製系に導入する自己加圧式貯槽
を設置するとともに、前記クリプトンとキセノンとを精
留分離する精留塔の前段に、ハロゲン系不純物を除去す
るゲッターを使用したハロゲン系不純物除去装置を設置
したこと、さらに、詳しくは、空気液化分離装置から導
出されるクリプトン及びキセノンを含む液化酸素からク
リプトン及びキセノンを精製分離する装置において、前
記液化酸素中のクリプトン及びキセノンを塔底に液状に
濃縮する濃縮塔と、該濃縮塔の塔底液中に含まれるメタ
ンを酸素ガスにより塔頂からパージするメタンパージ塔
と、該メタンパージ塔の塔底液を気化する気化手段と、
該気化器で気化したガス中の炭化水素類と酸素とを反応
させる第1触媒反応筒と、該第1触媒反応筒での反応に
より生成した水,二酸化炭素を吸着除去する第1吸着器
と、該第1吸着器導出後のガスを冷却する冷却手段と、
塔頂部に凝縮器,塔底部に蒸化器を備え、前記冷却手段
で冷却したガスを精留して該ガス中の酸素ガスを塔頂か
ら導出除去する脱酸素塔と、該脱酸素塔の塔底液を一時
貯留する自己加圧式貯槽と、該自己加圧式貯槽で加圧し
て導出した液を気化する気化手段と、該気化したガス中
に含まれる炭化水素類と酸素とを反応させる第2触媒反
応筒と、該第2触媒反応筒での反応で生成した水,二酸
化炭素を吸着除去する第2吸着器と、第2吸着工程導出
後のガスに水素を添加する水素添加手段と、該水素添加
手段で添加された水素と前記ガス中に含まれる酸素とを
反応させる第3触媒反応筒と、該第3触媒反応筒での反
応で生成した水を除去する乾燥手段と、乾燥後のガスを
冷却液化して液化しない水素を分離する気液分離手段
と、該気液分離手段から導出した液を気化する気化手段
と、該気化したガス中のハロゲン系不純物を除去するゲ
ッターを使用したハロゲン系不純物除去手段と、該ハロ
ゲン系不純物除去手段を導出したガスを冷却液化する液
化手段と、該液化手段で液化した液化ガスを精留して塔
底部からキセノンを、塔頂部からクリプトンを導出する
分離精留塔とを備えていることを特徴としている。
Further, as an apparatus configuration for carrying out the method of the present invention, most oxygen and hydrocarbons in liquefied oxygen containing noble gases such as krypton and xenon derived from an air liquefaction separation apparatus are removed. And a highly pure purification system for removing impurities such as hydrocarbons and oxygen remaining in the liquid rare gas concentrated by the crude purification system. In the gas purification apparatus, between the crude purification system and the high-purity purification system, the liquid rare gas obtained in the rough purification system is temporarily stored, and is pressurized to be introduced into the high-purity purification system. A storage tank is installed, the high-purity purification system is equipped with a halogen-based impurity removing device using a getter that removes halogen-based impurities in the rare gas,
A crude purification system for obtaining a liquid mixture of krypton and xenon by removing most of oxygen and hydrocarbons in liquefied oxygen containing krypton and xenon derived from an air liquefaction separator, and the crude purification system. In a rare gas purification apparatus equipped with a high-purity purification system for removing hydrocarbons, impurities such as oxygen remaining in the concentrated liquid mixture, and for rectifying and separating krypton and xenon, a rare gas purification apparatus, Between the pure purification system, the liquid rare gas obtained in the crude purification system is temporarily stored, and a self-pressurized storage tank for introducing the pressurized rare gas into the highly pure purification system is installed, and the krypton and xenon are provided. A halogen-based impurity removal device using a getter that removes halogen-based impurities was installed in front of the rectification column for rectification separation, and more specifically, krypton derived from an air liquefaction separation device. In a device for purifying and separating krypton and xenon from liquefied oxygen containing bismuth and xenon, a concentration column for concentrating the krypton and xenon in the liquefied oxygen into a liquid at the column bottom, and methane contained in the bottom liquid of the concentration column A methane purge tower for purging from the top of the tower with oxygen gas, and a vaporization means for vaporizing the bottom liquid of the methane purge tower,
A first catalytic reaction tube for reacting hydrocarbons and oxygen in the gas vaporized in the vaporizer with oxygen, and a first adsorber for adsorbing and removing water and carbon dioxide produced by the reaction in the first catalytic reaction tube Cooling means for cooling the gas after the first adsorber is discharged,
A deoxygenation tower that is equipped with a condenser at the top of the tower and an evaporator at the bottom of the tower, rectifies the gas cooled by the cooling means, and removes and removes oxygen gas in the gas from the top of the tower; A self-pressurizing storage tank for temporarily storing the bottom liquid, a vaporization means for vaporizing the liquid pressurized by the self-pressurizing storage tank, and a hydrocarbon for reacting oxygen with hydrocarbons contained in the vaporized gas. A two-catalyst reaction tube, a second adsorber for adsorbing and removing water and carbon dioxide produced by the reaction in the second catalytic reaction tube, and a hydrogen adding means for adding hydrogen to the gas after the second adsorption step is derived, A third catalytic reaction tube for reacting the hydrogen added by the hydrogen adding means with oxygen contained in the gas, a drying means for removing water generated by the reaction in the third catalytic reaction tube, and a post-drying Gas-liquid separation means for cooling and liquefying the gas of the above to separate unliquefied hydrogen, and the gas-liquid separation means Vaporizing means for vaporizing the liquid derived from the above, halogen-type impurity removing means using a getter for removing halogen-based impurities in the vaporized gas, and liquefying means for cooling and liquefying the gas derived from the halogen-based impurity removing means And a separation and rectification column for rectifying the liquefied gas liquefied by the liquefying means to derive xenon from the bottom of the column and krypton from the top of the column.

【0014】[0014]

【作 用】上記構成によれば、空気液化分離装置から導
出した液化酸素中のクリプトン,キセノン等の希ガスを
一貫した工程で効率よく高純度に精製することができ
る。
[Operation] According to the above configuration, the rare gas such as krypton and xenon in the liquefied oxygen derived from the air liquefaction separation device can be efficiently purified to high purity in a consistent process.

【0015】[0015]

【実施例】以下、本発明を、図1に示す一実施例に基づ
いてさらに詳細に説明する。まず、空気液化分離装置の
複精留塔1の上部塔下部の主凝縮蒸発器1a部分から、
クリプトン(100〜1000ppm)及びキセノン
(10〜100ppm)が濃縮された液化酸素を導出
し、濃縮塔2に導入する。この濃縮塔2の底部には、窒
素ガス等を加熱源とする蒸化器(リボイラー)3が設け
られており、塔底液を加熱して上昇ガスを生成する。こ
れにより、前記複精留塔1から導入されたクリプトン及
びキセノンを含む液化酸素は、該濃縮塔2による精留
で、塔底部にクリプトン及びキセノンを10〜20倍に
濃縮した濃縮液が得られ、塔頂部からは酸素ガスが管4
に導出される。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in more detail based on an embodiment shown in FIG. First, from the main condenser evaporator 1a portion of the upper column lower part of the double rectification column 1 of the air liquefaction separation device,
Liquefied oxygen in which krypton (100 to 1000 ppm) and xenon (10 to 100 ppm) are concentrated is discharged and introduced into the concentration tower 2. A vaporizer (reboiler) 3 using nitrogen gas or the like as a heating source is provided at the bottom of the concentrating tower 2, and heats the tower bottom liquid to generate rising gas. As a result, the liquefied oxygen containing krypton and xenon introduced from the double rectification column 1 is rectified by the concentration column 2 to obtain a concentrated liquid in which krypton and xenon are concentrated 10 to 20 times at the bottom of the column. , Oxygen gas pipe 4 from the top of the tower
Be derived to.

【0016】上記塔底部の濃縮液には、クリプトン及び
キセノンに加えて、原料である液化酸素中に含まれてい
るメタンも濃縮され、1000ppm程度となることが
ある。これ以上メタン濃度が高まるのは安全上好ましく
ないため、必要に応じてメタンパージ塔5を設け、この
メタンパージ塔5でメタンをパージする。濃縮塔2の底
部の濃縮液は、管6に導出されて該濃縮液の液ヘッドで
自然流入可能な位置に設置されたメタンパージ塔5に還
流液として導入される。このメタンパージ塔5の底部に
は、リボイラー7が設けられており、塔底液を加熱して
上昇ガスを生成している。このメタンパージ塔5の頂部
からは、メタンを多量に含む酸素ガスが管8に抜き出さ
れ、メタンパージ塔5の底部には、クリプトンが約90
00ppm、キセノンが約1000ppmに濃縮される
とともに、原料液化酸素中に含まれていた炭化水素(残
存メタンも含む)が約1000ppmに濃縮される。
In the concentrated liquid at the bottom of the column, in addition to krypton and xenon, methane contained in the liquefied oxygen as a raw material may be concentrated to about 1000 ppm. Since it is not preferable for safety that the methane concentration is further increased, a methane purge tower 5 is provided as necessary, and methane is purged in the methane purge tower 5. The concentrated liquid at the bottom of the concentration tower 2 is led out to a pipe 6 and introduced as a reflux liquid to a methane purge tower 5 installed at a position where the liquid head of the concentrated liquid can naturally flow. A reboiler 7 is provided at the bottom of the methane purge tower 5 and heats the tower bottom liquid to generate rising gas. Oxygen gas containing a large amount of methane is extracted from the top of the methane purge tower 5 into a pipe 8, and about 90 krypton is present at the bottom of the methane purge tower 5.
00 ppm and xenon are concentrated to about 1000 ppm, and hydrocarbons (including residual methane) contained in the raw material liquefied oxygen are concentrated to about 1000 ppm.

【0017】上記液化酸素中への炭化水素の過度の濃縮
は危険であるから、次に、この炭化水素を除去する工程
を行う。この炭化水素除去工程では、まず、メタンパー
ジ塔5の底部から導出した塔底液を、熱交換器9で気化
した後、加熱器10で常温まで昇温し、さらに予熱器1
1で約300℃まで加熱して第1触媒反応筒12に導入
し、含有する炭化水素類と酸素とを反応させ、二酸化炭
素及び水にする。第1触媒反応筒12を導出したガス
は、冷却器13で降温した後、切換え使用される第1吸
着器14の一方に導入され、触媒反応で生成した二酸化
炭素と水が吸着除去される。
Since excessive concentration of hydrocarbons in the liquefied oxygen is dangerous, a step of removing the hydrocarbons is performed next. In this hydrocarbon removal step, first, the tower bottom liquid derived from the bottom of the methane purge tower 5 is vaporized by the heat exchanger 9, then heated to room temperature by the heater 10, and further preheater 1
In step 1, the mixture is heated to about 300 ° C. and introduced into the first catalytic reaction column 12, and the hydrocarbons contained therein are reacted with oxygen to form carbon dioxide and water. The gas discharged from the first catalytic reaction tube 12 is cooled in the cooler 13 and then introduced into one of the first adsorbers 14 which are used by switching, and the carbon dioxide and water generated by the catalytic reaction are adsorbed and removed.

【0018】上記第1の炭化水素除去工程から導出した
ガスは、熱交換器15で冷却されて塔頂部に凝縮器1
6,塔底部にリボイラー17を備えた脱酸素塔18の中
段に導入される。この脱酸素塔18における精留によ
り、塔頂部の凝縮器16部分にはクリプトンを10〜5
0ppm含む酸素ガスが分離して管19から導出されて
除去され、塔底部には、クリプトン90〜95%及びキ
セノン5〜10%、残部が酸素及び微量の炭化水素から
なる液化ガス(粗分離液化ガス)が分離する。
The gas derived from the first hydrocarbon removal step is cooled by the heat exchanger 15 and is condensed at the top of the condenser 1.
6. Introduced into the middle stage of the deoxygenation tower 18 having a reboiler 17 at the bottom of the tower. As a result of the rectification in the deoxygenation tower 18, 10 to 5 krypton is stored in the condenser 16 at the top of the tower.
Oxygen gas containing 0 ppm was separated and led out from the pipe 19 and removed, and a liquefied gas (crude separation liquefaction) composed of 90 to 95% of krypton and 5 to 10% of xenon at the bottom of the column and the balance of oxygen and a small amount of hydrocarbons. Gas) separates.

【0019】ここまでが、通常、連続運転を行う粗精製
系Aであり、上記脱酸素塔18の塔底部の液化ガスは、
弁20を備えた管21に導出され、自己加圧式貯槽22
内に貯留される。該自己加圧式貯槽22は、該貯槽22
に貯留されている液ガスの一部を導出して大気等で蒸発
させる蒸発器25及び該蒸発器25にて蒸発したガスを
前記貯槽22に導入する加圧弁24を備えた経路を、前
記貯槽22に付設したものである。この自己加圧式貯槽
22内の液化ガスは、該液化ガスが所定量、即ち、後工
程で精留分離が可能な量になったときに管23に導出さ
れ、上記残留する酸素や炭化水素とクリプトン及びキセ
ノンとを分離する高純精製系Bに送られる。このとき、
前記脱酸素塔18に接続する管21の弁20が閉じられ
るとともに、加圧弁24が開かれ、蒸発器25で蒸発し
たガスが貯槽22内に導入されることにより、該貯槽2
2内の圧力、すなわち、管23に導出する液を所定の圧
力、例えば8kg/cm2 Gまでの任意の圧力に高める
ことができる。
Up to this point, the crude refining system A is normally operated continuously, and the liquefied gas at the bottom of the deoxygenation tower 18 is
A self-pressurized storage tank 22 led out into a pipe 21 equipped with a valve 20.
It is stored inside. The self-pressurizing storage tank 22 is
Part of the liquid gas stored in
The evaporator 25 for causing the gas evaporated in the evaporator 25 to
The path provided with the pressurizing valve 24 introduced into the storage tank 22 is
It is attached to the storage tank 22. The liquefied gas in the self-pressurized storage tank 22 is led out to the pipe 23 when the liquefied gas reaches a predetermined amount, that is, an amount capable of rectifying and separating in a later step, and is separated from the remaining oxygen and hydrocarbons. It is sent to a highly pure purification system B which separates krypton and xenon. At this time,
The valve 20 of the pipe 21 connected to the deoxygenation tower 18 is closed, the pressurizing valve 24 is opened, and the gas evaporated in the evaporator 25 is introduced into the storage tank 22, whereby the storage tank 2
It is possible to raise the pressure inside 2 to the predetermined pressure, for example, the liquid discharged to the pipe 23 to an arbitrary pressure up to 8 kg / cm 2 G, for example.

【0020】上記管23に導出された液化ガスは、まず
加熱蒸発器26で気化した後、さらに予熱器27で約3
00℃まで加温されて第2触媒反応筒28に導入され、
僅かに残留する炭化水素と酸素とを反応させて、ここで
炭化水素残存量を製品含有許容値以下にする。次に、冷
却器29で冷却された後、第2吸着器30に導入され、
前記触媒反応で生成した二酸化炭素及び水が除去され
る。
The liquefied gas discharged to the pipe 23 is first vaporized in the heating evaporator 26 and then further heated in the preheater 27 to about 3%.
After being heated to 00 ° C. and introduced into the second catalytic reaction cylinder 28,
A slight amount of residual hydrocarbon is reacted with oxygen so that the residual amount of hydrocarbon is reduced to the product content allowable value or less. Next, after being cooled by the cooler 29, it is introduced into the second adsorber 30,
Carbon dioxide and water produced by the catalytic reaction are removed.

【0021】さらに第2吸着器30を導出したガスに、
管31から適量の水素を添加して第3触媒反応筒32に
導入し、残存する酸素を添加した水素と反応させて水に
する。このとき、バルーン33内の回収ガスが、回収ポ
ンプ34,管35を介して前記第2吸着器30を導出し
たガスに導入され、収率の向上が図られる。
Further, in the gas discharged from the second adsorber 30,
An appropriate amount of hydrogen is added from the pipe 31 and introduced into the third catalytic reaction tube 32, and the remaining oxygen is reacted with the added hydrogen to form water. At this time, the recovered gas in the balloon 33 is introduced into the gas discharged from the second adsorber 30 via the recovery pump 34 and the pipe 35, and the yield is improved.

【0022】上記第3触媒反応筒32を導出したガス
は、冷却器36、冷凍式乾燥器37で冷却された後に第
3吸着器38に導入され、生成した水が吸着除去され
て、クリプトン及びキセノンを主成分とし、これに、こ
こまでの工程で分離することができなかったハロゲン系
不純物や、前記管31から過剰に添加された水素の残り
を含むガスとなる。
The gas discharged from the third catalytic reaction tube 32 is cooled by a cooler 36 and a refrigerating dryer 37, and then introduced into a third adsorber 38, where the produced water is adsorbed and removed to produce krypton and krypton. It becomes a gas containing xenon as a main component, and halogen-based impurities that could not be separated in the steps up to this point, and the balance of hydrogen excessively added from the tube 31.

【0023】このようにしてクリプトン及びキセノンが
濃縮されたガスは、熱交換器39で冷却された後、液化
器40に導入されて液化し、クリプトンとキセノンとを
精留分離する分離塔41の中段に導入される。前記液化
器40には、頂部に凝縮器42が設けられており、該凝
縮器42で液化しない水素は、管43から前記バルーン
33に回収される。
The gas thus enriched with krypton and xenon is cooled in the heat exchanger 39, and then introduced into the liquefier 40 to be liquefied and separated in the separation column 41 for rectifying and separating krypton and xenon. Introduced in the middle stage. A condenser 42 is provided on the top of the liquefier 40, and hydrogen that is not liquefied in the condenser 42 is recovered from the pipe 43 to the balloon 33.

【0024】前記分離塔41には、その底部にリボイラ
ー44が設けられるとともに、頂部に凝縮器45が設け
られており、液化器40で液化して分離塔41に導入さ
れたクリプトン及びキセノンからなる混合液化ガスは、
該塔における精留により塔頂部に純度99.995%以
上のクリプトンが分離し、塔底部に純度99.995%
以上のキセノンが液状で分離する。なお、凝縮器45で
凝縮しない低沸点成分は、管46からバルーン33に回
収され、分離塔41で分離したクリプトン及びキセノン
は、それぞれ管47及び管48に導出され、従来と同様
にして捕集器49,50を介して製品ボンベ51,52
に充填される。
The separation tower 41 is provided with a reboiler 44 at the bottom and a condenser 45 at the top, and is composed of krypton and xenon which are liquefied by the liquefier 40 and introduced into the separation tower 41. The mixed liquefied gas is
Fractionation in the column separates krypton having a purity of 99.995% or more at the top and 99.995% of purity at the bottom.
The above xenon is separated in liquid form. The low-boiling point component that is not condensed in the condenser 45 is recovered from the pipe 46 in the balloon 33, and the krypton and xenon separated in the separation column 41 are led out to the pipe 47 and the pipe 48, respectively, and collected in the same manner as in the conventional case. Product cylinders 51, 52 through containers 49, 50
To be filled.

【0025】ここで、前述のように粗精製系Aと高純精
製系Bとの間に自己加圧式貯槽22を設置したことによ
り、高純精製系Bにおける圧力を高めることができ、例
えば、連続運転を行っている粗精製系Aのみを設置して
いる工場から、他の工場に設置されている高純精製系B
に粗分離液化ガスを輸送する際にも、昇圧機を設置する
必要がなくなり、設備費や運転コストの低減が図れる。
Here, by installing the self-pressurizing storage tank 22 between the crude purification system A and the highly purified system B as described above, the pressure in the highly purified system B can be increased. From a factory that only installs a crude refining system A that operates continuously, to a highly pure refining system B that is installed in another factory
Even when the crude separated liquefied gas is transported, it is not necessary to install a booster, and the equipment cost and operating cost can be reduced.

【0026】なお、上記高純精製系Bはバッチ操作で行
われ、自己加圧式貯槽22内の液化ガスが溜まった時点
で起動し、所定量溜まるまでは停止しているが、この間
に、前記第2吸着器30及び第3吸着器38の再生が行
われる。
The high-purity refining system B is operated in a batch operation, and is started when the liquefied gas in the self-pressurizing storage tank 22 is accumulated, and is stopped until a predetermined amount is accumulated. Regeneration of the second adsorber 30 and the third adsorber 38 is performed.

【0027】そして、図2は、前記液化器40で液化さ
れ、分離塔41に導入される液化ガス中に含まれている
ハロゲン系不純物を除去する工程を示すものである。液
化器40で液化され、凝縮器42で凝縮しない水素がほ
よんど分離除去された液化ガスは、液化器40の底部か
ら導出されて加温器53で気化した後、ヒーター54で
500〜700℃に加熱されている反応筒55に導入さ
れる。この反応筒55内には、カルシウム,マグネシウ
ム,チタン及びジルコニウム系等のゲッター剤が充填さ
れており、ガス中に数十ppm含まれているフロン1
3,フロン14,フロン16,Cn m ,六フッ化イオ
ウ等のハロゲン系不純物を、約0.5ppm以下まで反
応除去する。
FIG. 2 shows a step of removing halogen-based impurities contained in the liquefied gas liquefied by the liquefier 40 and introduced into the separation column 41. The liquefied gas that has been liquefied in the liquefier 40 and in which most of the hydrogen not condensed in the condenser 42 has been separated and removed is led out from the bottom of the liquefier 40 and vaporized in the warmer 53, and then 500-700 in the heater 54. It is introduced into the reaction tube 55 which is heated to ° C. The reaction tube 55 is filled with a gettering agent such as a calcium, magnesium, titanium, and zirconium-based material, and the chlorofluorocarbon 1 is contained in the gas at several tens of ppm.
Halogen-based impurities such as 3, Freon 14, Freon 16, C n F m , and sulfur hexafluoride are removed by reaction to about 0.5 ppm or less.

【0028】ハロゲン系不純物が除去されたクリプトン
及びキセノンの混合ガスは冷却器56で常温まで冷却さ
れ、さらに熱交換器57で冷却液化されて分離塔41に
導入される。
The mixed gas of krypton and xenon from which halogen-based impurities have been removed is cooled to room temperature by the cooler 56, further cooled and liquefied by the heat exchanger 57, and introduced into the separation column 41.

【0029】なお、上記ゲッターを使用したハロゲン系
不純物除去工程は、前述の精製工程,充填工程のいずれ
の個所にも設置することは可能であるが、上記のよう
に、液化器40と分離塔41との間にハロゲン系不純物
除去工程を配置することにより、処理ガス中にゲッター
剤と反応する酸素や水素がほとんど含まれていないこと
から、極めて効率よくハロゲン系不純物を反応除去する
ことができる。しかも、前記自己加圧式貯槽22により
反応筒55における圧力損失をカバーできるので、昇圧
機を必要とせずに低コストで実施することができる。
The halogen-based impurity removing step using the getter can be installed at any of the above-mentioned purification step and filling step, but as described above, the liquefier 40 and the separation column are used. By arranging the halogen-based impurity removing step between the first and the second gas generators 41, the processing gas contains almost no oxygen or hydrogen that reacts with the getter agent, so that the halogen-based impurities can be removed extremely efficiently by reaction. . Moreover, since the pressure loss in the reaction tube 55 can be covered by the self-pressurizing storage tank 22, it can be carried out at low cost without the need for a booster.

【0030】また、本発明における上記精製工程の各部
の構成は、上記実施例に限定されるものではなく、製品
採取量等に応じて適宜最適な構成で実施することが可能
である。
Further, the constitution of each part of the above-mentioned purification step in the present invention is not limited to the above-mentioned embodiment, and can be carried out with an optimal constitution according to the amount of product collected and the like.

【0031】[0031]

【発明の効果】以上説明したように、本発明によれば、
粗精製系からの液化ガスを昇圧機を用いずに適宜な圧力
で高純精製系に送ることができるので、両系を離れた場
所に設置しても低コストで送ガスすることができる。特
に、圧力損失を伴う工程、すなわち、ハロゲン系不純物
を除去するゲッターを使用したハロゲン系不純物除去工
程を系内に設けても低コストで運転することが可能にな
り、ハロゲン系不純物を含まない高純度の希ガスを一連
の工程で得ることができ、自動運転も可能になる。
As described above, according to the present invention,
Since the liquefied gas from the crude purification system can be sent to the high-purity purification system at an appropriate pressure without using a booster, even if both systems are installed at distant places, the gas can be sent at low cost. In particular, even if a process involving pressure loss, that is, a halogen-based impurity removing process using a getter that removes halogen-based impurities is provided in the system, it is possible to operate at low cost, and it is possible to operate at high cost without halogen-based impurities. A rare gas of high purity can be obtained in a series of steps, and automatic operation is possible.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の一実施例を示す系統図である。FIG. 1 is a system diagram showing an embodiment of the present invention.

【図2】 ハロゲン系不純物除去工程の系統図である。FIG. 2 is a system diagram of a halogen-based impurity removal process.

【符号の説明】[Explanation of symbols]

1…複精留塔、2…濃縮塔、5…メタンパージ塔、12
…第1触媒反応筒、14…第1吸着器、18…脱酸素
塔、22…自己加圧式貯槽、28…第2触媒反応筒、3
0…第2吸着器、32…第3触媒反応筒、38…第3吸
着器、40…液化器、41…分離塔、55…反応筒、A
…粗精製系、B…高純精製系
1 ... Double rectification tower, 2 ... Concentration tower, 5 ... Methane purge tower, 12
... first catalytic reaction column, 14 ... first adsorber, 18 ... deoxidation tower, 22 ... self-pressurized storage tank, 28 ... second catalytic reaction column, 3
0 ... 2nd adsorption device, 32 ... 3rd catalytic reaction column, 38 ... 3rd adsorption device, 40 ... Liquefier, 41 ... Separation column, 55 ... Reaction column, A
… Coarse purification system, B… High purity purification system

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) F25J 3/00 - 3/08 ─────────────────────────────────────────────────── ─── Continuation of front page (58) Fields surveyed (Int.Cl. 7 , DB name) F25J 3/00-3/08

Claims (8)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 空気液化分離装置から導出されるクリプ
トン,キセノン等の希ガスを含む液化酸素中の大部分の
酸素及び炭化水素類を除去して液状に濃縮した希ガスを
得る粗精製系と、該粗精製系で濃縮した液状の希ガス中
に残存する炭化水素類,酸素等の不純物を除去する高純
精製系とにより希ガスを精製する方法において、前記粗
精製系で得た液状の希ガスを自己加圧式貯槽に一時貯留
し、該貯槽で加圧して前記高純精製系に導入することを
特徴とする希ガスの精製方法。
1. A crude purification system for obtaining a rare gas concentrated to a liquid by removing most of oxygen and hydrocarbons in liquefied oxygen containing a rare gas such as krypton and xenon derived from an air liquefaction separator. In the method for purifying a rare gas by a highly pure purification system that removes impurities such as hydrocarbons and oxygen remaining in the liquid rare gas concentrated in the crude purification system, A method for purifying a rare gas, wherein the rare gas is temporarily stored in a self-pressurized storage tank, pressurized in the storage tank, and introduced into the highly pure purification system.
【請求項2】 前記高純精製系は、希ガス中のハロゲン
系不純物を除去するゲッターを使用したハロゲン系不純
物除去工程を備えていることを特徴とする請求項1記載
の希ガスの精製方法。
2. The method for purifying a rare gas according to claim 1, wherein the high-purity purification system includes a halogen-based impurity removing step using a getter that removes a halogen-based impurity in the rare gas. .
【請求項3】 空気液化分離装置から導出されるクリプ
トン,キセノンを含む液化酸素中の大部分の酸素及び炭
化水素類を除去して液状に濃縮したクリプトンとキセノ
ンの混合物を得る粗精製系と、該粗精製系で濃縮した液
状混合物中に残存する炭化水素類,酸素等の不純物を除
去し、次いでクリプトンとキセノンとを精留分離する高
純精製系とにより希ガスを精製する方法において、前記
粗精製系で得た液状混合物を自己加圧式貯槽に一時貯留
し、該貯槽で加圧して前記高純精製系に導入するととも
に、前記クリプトンとキセノンとを精留分離する前段
で、液状混合物に含まれるハロゲン系不純物をゲッター
により除去することを特徴とする希ガスの精製方法。
3. A crude purification system for obtaining a liquid mixture of krypton and xenon by removing most of oxygen and hydrocarbons in liquefied oxygen containing krypton and xenon derived from an air liquefaction separator. In the method for purifying a rare gas by removing impurities such as hydrocarbons and oxygen remaining in the liquid mixture concentrated by the crude purification system, and then by a high-purity purification system for rectifying and separating krypton and xenon, The liquid mixture obtained in the crude purification system is temporarily stored in a self-pressurization type storage tank, and while being pressurized in the storage tank to be introduced into the high-purity purification system, the krypton and xenon are rectified and separated, and the liquid mixture is formed. A method for purifying a rare gas, which comprises removing halogen-containing impurities contained by a getter.
【請求項4】 空気液化分離装置から導出されるクリプ
トン及びキセノンを含む液化酸素からクリプトン及びキ
セノンを精製分離する方法において、前記液化酸素を濃
縮塔に導入して塔底液にクリプトン及びキセノンを濃縮
する工程と、該濃縮塔塔底液をメタンパージ塔に導入し
て塔頂から酸素ガスによりメタンをパージするメタンパ
ージ工程と、該メタンパージ塔塔底液を気化して第1触
媒反応筒に導入して含有する炭化水素類と酸素とを反応
させる第1触媒反応工程と、該第1触媒反応筒導出後の
ガスを第1吸着器に導入して第1触媒反応工程で生成し
た水,二酸化炭素を吸着除去する第1吸着工程と、該第
1吸着工程導出後のガスを脱酸素塔に導入して精留し、
塔頂から酸素ガスを導出除去する脱酸素工程と、該脱酸
素塔の塔底液を自己加圧式貯槽に一時貯留し、該貯槽で
加圧して導出する加圧工程と、該加圧された塔底液を気
化して第2触媒反応筒に導入し、含有する炭化水素類と
酸素とを反応させる第2触媒反応工程と、該第2触媒反
応筒導出後のガスを第2吸着器に導入して第2触媒反応
工程で生成した水,二酸化炭素を吸着除去する第2吸着
工程と、第2吸着工程導出後のガスに水素を添加して第
3触媒反応筒に導入し、含有する酸素と前記水素とを反
応させて水とする第3触媒反応工程と、該第3触媒反応
筒導出後のガスを乾燥器に導入して第3触媒反応工程で
生成した水を除去する乾燥工程と、該乾燥工程導出後の
ガスを冷却液化して過剰に添加された前記水素を分離す
る気液分離工程と、該気液分離工程から導出した液を気
化してゲッターによりハロゲン系不純物を除去するハロ
ゲン系不純物除去工程と、該ハロゲン系不純物除去工程
導出後のガスを分離塔に導入し、塔底部からキセノン
を、塔頂部からクリプトンを導出する分離工程とを順次
行うことを特徴とする希ガスの精製方法。
4. A method for purifying and separating krypton and xenon from liquefied oxygen containing krypton and xenon, which is derived from an air liquefaction separation device, wherein the liquefied oxygen is introduced into a concentration column to concentrate krypton and xenon in a bottom liquid. And a methane purging step of introducing the concentration tower bottom liquid into a methane purging tower and purging methane from the tower top with oxygen gas, and vaporizing the methane purging tower bottom liquid and introducing it into the first catalytic reaction column. A first catalytic reaction step of reacting contained hydrocarbons with oxygen, and water and carbon dioxide produced in the first catalytic reaction step by introducing the gas after the first catalytic reaction tube is introduced into a first adsorber A first adsorption step of adsorbing and removing, and introducing the gas after derivation of the first adsorption step into a deoxygenation tower for rectification,
A deoxygenation step of discharging and removing oxygen gas from the top of the tower, a pressure step of temporarily storing the bottom liquid of the deoxygenation tower in a self-pressurized storage tank, and pressurizing and discharging in the storage tank, and the pressurized A second catalytic reaction step in which the column bottom liquid is vaporized and introduced into the second catalytic reaction column to react the contained hydrocarbons with oxygen, and the gas after the second catalytic reaction column is led to the second adsorber. The second adsorption step of introducing and adsorbing and removing water and carbon dioxide produced in the second catalytic reaction step, and adding hydrogen to the gas after derivation of the second adsorption step and introducing it into the third catalytic reaction tube to contain it. A third catalytic reaction step of reacting oxygen with the hydrogen to form water, and a drying step of introducing the gas after the third catalytic reaction tube is introduced into a dryer to remove water generated in the third catalytic reaction step. And a gas-liquid separation step of cooling and liquefying the gas after the drying step and separating the excessively added hydrogen. A halogen-based impurity removing step of removing the halogen-based impurities by a getter by vaporizing the liquid derived from the gas-liquid separation step, and introducing the gas after the halogen-based impurity removal step into the separation column to remove xenon from the bottom of the tower. And a separation step of deriving krypton from the top of the column, which is carried out in sequence.
【請求項5】 空気液化分離装置から導出されるクリプ
トン,キセノン等の希ガスを含む液化酸素中の大部分の
酸素及び炭化水素類を除去して液状に濃縮した希ガスを
得る粗精製系と、該粗精製系で濃縮した液状の希ガス中
に残存する炭化水素類,酸素等の不純物を除去する高純
精製系とを備えた希ガスの精製装置において、前記粗精
製系と高純精製系との間に、前記粗精製系で得た液状の
希ガスを一時貯留し、加圧して前記高純精製系に導入す
る自己加圧式貯槽を設置したことを特徴とする希ガスの
精製装置。
5. A crude purification system for obtaining a rare gas concentrated to a liquid by removing most of oxygen and hydrocarbons in liquefied oxygen containing a rare gas such as krypton and xenon derived from an air liquefaction separation device. A high-purity purification system for removing impurities such as hydrocarbons and oxygen remaining in the liquid rare gas concentrated in the rough purification system, A rare gas refining apparatus, characterized in that a self-pressurizing storage tank for temporarily storing the liquid rare gas obtained in the crude refining system and introducing it into the highly pure refining system is installed between the system and the system. .
【請求項6】 前記高純精製系は、希ガス中のハロゲン
系不純物を除去するゲッターを使用したハロゲン系不純
物除去装置を備えていることを特徴とする請求項5記載
の希ガスの精製装置。
6. The rare gas refining apparatus according to claim 5, wherein the high-purity refining system includes a halogen-based impurity removing apparatus using a getter that removes halogen-based impurities in the rare gas. .
【請求項7】 空気液化分離装置から導出されるクリプ
トン,キセノンを含む液化酸素中の大部分の酸素及び炭
化水素類を除去して液状に濃縮したクリプトンとキセノ
ンの混合物を得る粗精製系と、該粗精製系で濃縮した液
状混合物中に残存する炭化水素類,酸素等の不純物を除
去し、クリプトンとキセノンとを精留分離する高純精製
系とを備えた希ガスの精製装置において、前記粗精製系
と高純精製系との間に、前記粗精製系で得た液状の希ガ
スを一時貯留し、加圧して前記高純精製系に導入する自
己加圧式貯槽を設置するとともに、前記クリプトンとキ
セノンとを精留分離する精留塔の前段に、ハロゲン系不
純物を除去するゲッターを使用したハロゲン系不純物除
去装置を設置したことを特徴とする希ガスの精製装置。
7. A crude purification system for obtaining a liquid mixture of krypton and xenon by removing most of oxygen and hydrocarbons in liquefied oxygen containing krypton and xenon derived from an air liquefaction separation device. In a rare gas purification apparatus comprising a highly pure purification system for removing impurities such as hydrocarbons and oxygen remaining in a liquid mixture concentrated in the crude purification system and rectifying and separating krypton and xenon, Between the crude purification system and the highly pure purification system, the liquid rare gas obtained in the roughly purification system is temporarily stored, and a self-pressurized storage tank for introducing the pressurized rare gas into the highly purified system is installed, and An apparatus for purifying noble gases, characterized in that a halogen-based impurity removing device using a getter for removing halogen-based impurities is installed in front of a rectification column for rectifying and separating krypton and xenon.
【請求項8】 空気液化分離装置から導出されるクリプ
トン及びキセノンを含む液化酸素からクリプトン及びキ
セノンを精製分離する装置において、前記液化酸素中の
クリプトン及びキセノンを塔底に液状に濃縮する濃縮塔
と、該濃縮塔の塔底液中に含まれるメタンを酸素ガスに
より塔頂からパージするメタンパージ塔と、該メタンパ
ージ塔の塔底液を気化する気化手段と、該気化器で気化
したガス中の炭化水素類と酸素とを反応させる第1触媒
反応筒と、該第1触媒反応筒での反応により生成した
水,二酸化炭素を吸着除去する第1吸着器と、該第1吸
着器導出後のガスを冷却する冷却手段と、塔頂部に凝縮
器,塔底部に蒸化器を備え、前記冷却手段で冷却したガ
スを精留して該ガス中の酸素ガスを塔頂から導出除去す
る脱酸素塔と、該脱酸素塔の塔底液を一時貯留する自己
加圧式貯槽と、該自己加圧式貯槽で加圧して導出した液
を気化する気化手段と、該気化したガス中に含まれる炭
化水素類と酸素とを反応させる第2触媒反応筒と、該第
2触媒反応筒での反応で生成した水,二酸化炭素を吸着
除去する第2吸着器と、第2吸着工程導出後のガスに水
素を添加する水素添加手段と、該水素添加手段で添加さ
れた水素と前記ガス中に含まれる酸素とを反応させる第
3触媒反応筒と、該第3触媒反応筒での反応で生成した
水を除去する乾燥手段と、乾燥後のガスを冷却液化して
液化しない水素を分離する気液分離手段と、該気液分離
手段から導出した液を気化する気化手段と、該気化した
ガス中のハロゲン系不純物を除去するゲッターを使用し
たハロゲン系不純物除去手段と、該ハロゲン系不純物除
去手段を導出したガスを冷却液化する液化手段と、該液
化手段で液化した液化ガスを精留して塔底部からキセノ
ンを、塔頂部からクリプトンを導出する分離精留塔とを
備えていることを特徴とする希ガスの精製装置。
8. An apparatus for purifying and separating krypton and xenon from liquefied oxygen containing krypton and xenon derived from an air liquefaction separation apparatus, wherein a concentration column for concentrating krypton and xenon in the liquefied oxygen into a liquid at the bottom of the column. A methane purge tower for purging methane contained in the bottom liquid of the concentrating tower from the top with oxygen gas, a vaporization means for vaporizing the bottom liquid of the methane purge tower, and a carbonization in the gas vaporized by the vaporizer. A first catalytic reaction tube for reacting hydrogen with oxygen, a first adsorber for adsorbing and removing water and carbon dioxide produced by the reaction in the first catalytic reaction tube, and a gas after the derivation of the first adsorber A deoxidizing tower for cooling the gas, a condenser at the top of the tower, and an evaporator at the bottom of the tower, and rectifying the gas cooled by the cooling means to remove oxygen gas in the gas from the top of the tower. And the deoxidation A self-pressurized storage tank for temporarily storing the bottom liquid of the column, a vaporization means for vaporizing the liquid that is pressurized by the self-pressurized storage tank, and hydrocarbons and oxygen contained in the vaporized gas. A second catalytic reaction column for reaction, a second adsorber for adsorbing and removing water and carbon dioxide produced by the reaction in the second catalytic reaction column, and a hydrogenation for adding hydrogen to the gas after the second adsorption step is derived. Means, a third catalytic reaction tube for reacting the hydrogen added by the hydrogen adding means with oxygen contained in the gas, and a drying means for removing water produced by the reaction in the third catalytic reaction tube , A gas-liquid separation means for cooling and liquefying the dried gas to separate hydrogen that is not liquefied, a vaporization means for vaporizing a liquid derived from the gas-liquid separation means, and a halogen-based impurity in the vaporized gas A halogen-based impurity removing means using a getter, Liquefaction means for cooling and liquefying the gas derived from the nitrogen-based impurity removal means, and a separation and rectification column for rectifying the liquefied gas liquefied by the liquefaction means to derive xenon from the tower bottom and krypton from the tower top. Noble gas refining device characterized by
JP17828693A 1993-07-19 1993-07-19 Noble gas purification method and apparatus Expired - Fee Related JP3385410B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17828693A JP3385410B2 (en) 1993-07-19 1993-07-19 Noble gas purification method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17828693A JP3385410B2 (en) 1993-07-19 1993-07-19 Noble gas purification method and apparatus

Publications (2)

Publication Number Publication Date
JPH0735473A JPH0735473A (en) 1995-02-07
JP3385410B2 true JP3385410B2 (en) 2003-03-10

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP17828693A Expired - Fee Related JP3385410B2 (en) 1993-07-19 1993-07-19 Noble gas purification method and apparatus

Country Status (1)

Country Link
JP (1) JP3385410B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2213609C1 (en) * 2002-11-15 2003-10-10 Савинов Михаил Юрьевич Method of separation of krypton xenon concentrate and device for realization of this method

Also Published As

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JPH0735473A (en) 1995-02-07

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