JPH08152262A - Circulating and adsorbing apparatus for rare gas separating process - Google Patents

Circulating and adsorbing apparatus for rare gas separating process

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Publication number
JPH08152262A
JPH08152262A JP29513494A JP29513494A JPH08152262A JP H08152262 A JPH08152262 A JP H08152262A JP 29513494 A JP29513494 A JP 29513494A JP 29513494 A JP29513494 A JP 29513494A JP H08152262 A JPH08152262 A JP H08152262A
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rare gas
gas
circulating
column
adsorption
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Japanese (ja)
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Shinichiro Oku
真一郎 奥
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Kawasaki Steel Corp
川崎製鉄株式会社
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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/02Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
    • F25J3/04Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
    • F25J3/04642Recovering noble gases from air
    • F25J3/04745Krypton and/or Xenon
    • F25J3/04751Producing pure krypton and/or xenon recovered from a crude krypton/xenon mixture
    • F25J3/04757Producing pure krypton and/or xenon recovered from a crude krypton/xenon mixture using a hybrid system, e.g. using adsorption, permeation or catalytic reaction
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2200/00Processes or apparatus using separation by rectification
    • F25J2200/04Processes or apparatus using separation by rectification in a dual pressure main column system
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2200/00Processes or apparatus using separation by rectification
    • F25J2200/34Processes or apparatus using separation by rectification using a side column fed by a stream from the low pressure column
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25JLIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2205/00Processes or apparatus using other separation and/or other processing means
    • F25J2205/82Processes or apparatus using other separation and/or other processing means using a reactor with combustion or catalytic reaction

Abstract

PURPOSE: To provide a circulating and adsorbing apparatus for a rare gas refining process in which remaining rare gas can be recovered without discharging into the atmosphere at the time of regenerating an adsorbent.
CONSTITUTION: A circulating and adsorbing apparatus 30 removes acetylene in a rare gas separating process by a sub-zero separating method, and has a heat exchanging tube 31 assembled therein to evaporate to vaporize the liquid rare gas of the residue by feeding heating gas.
COPYRIGHT: (C)1996,JPO

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

【0001】 [0001]

【産業上の利用分野】この発明は、希ガス分離プロセスにおいてアセチレン等の炭化水素除去に用いられている循環吸着装置の改良に関する。 BACKGROUND OF THE INVENTION This invention relates to an improvement in the circulation suction device used for removing hydrocarbon such as acetylene in a rare gas separation process.

【0002】 [0002]

【従来の技術】従来、空気を原料とするネオン(N Conventionally, neon to the air as a raw material (N
e),アルゴン(Ar),クリプトン(Kr),キセノン(Xe)等の希ガス類は、一般的には空気深冷分離法による酸素と窒素の分離工程の副産物として得られる。 e), argon (Ar), krypton (Kr), rare gases such as xenon (Xe) is generally obtained as a byproduct of oxygen and nitrogen separation step by air cryogenic separation method.
その場合、希ガスは、液体空気から分離された液体酸素中に数十ppm含有された粗希ガスとして精留塔から取り出される。 In that case, the rare gas is withdrawn from the rectification column as several tens ppm containing the crude rare gas in liquid oxygen separated from the liquid air. その希薄な粗希ガスは、先ず前段の濃縮塔で濃縮されて液体酸素中濃度0.5 %程度に濃縮されて塔底部から取り出し、希ガス精製装置を経て炭化水素を除去された後、更に後段の濃縮塔で99%の濃度に濃縮されて製品粗希ガスとなりボンベに充填して出荷されている。 Its dilute SoNozomi gas is first concentrated in the front stage of the rectifying column was removed from being concentrated in moderate concentration of 0.5% liquid oxygen column bottom, after the removal of hydrocarbons through a rare gas purifier further subsequent stage concentrated to a concentration of 99% in the concentration tower is shipped by filling the cylinder becomes product SoNozomi gas.

【0003】上記前段の濃縮塔で希ガスを濃縮する際に、液体酸素中に含まれるアセチレン等の炭化水素の除去が行われる。 [0003] When concentrating the rare gas concentration column of the preceding stage, the removal of hydrocarbons such as acetylene contained in the liquid oxygen takes place. これは、特にアセチレンが液体酸素中に過度に濃縮されると爆発の危険性がある(2ppm以下に抑えないと危険とされる)ので、これを循環吸着器で吸着除去するものである。 This is particularly acetylene there is a danger of explosion is excessively concentrated in the liquid oxygen (it is dangerous if kept to 2ppm or less), for adsorbing and removing it in a circular adsorber. 従来の循環吸着器は、粗希ガス濃縮塔の下部の近傍に二台並列に配設されていて、内部にはゲル吸着剤が充填されている。 Conventional circulating adsorbers, two units have been arranged in parallel in the vicinity of the bottom of the crude rare gas concentration column, gel adsorbent is filled therein. そして、粗希ガス濃縮塔内で濃縮された希ガスを含有する液体酸素の一部を塔底部から取り出し、二台のうちの一方の循環吸着器を通過させて再び塔底部に戻す循環を繰り返すことにより、液体酸素中に溶解している炭化水素(アセチレン) Then, a portion of the liquid oxygen containing a crude rare gas concentrated rare gas concentrated in the tower was taken out from the bottom, repeating the circulation back to the one bottom again passed through a circulation adsorbers of two units by, hydrocarbons dissolved in the liquid oxygen (acetylene)
を吸着剤で捕捉分離する。 The capturing separated by the adsorbent.

【0004】しかして、この吸着剤で連続的に吸着できる炭化水素の量(飽和吸着量)には限りがあるため、一般に1週間に1回程度の割合で二台の循環吸着器を交互に切り換えながら操業している。 [0004] Thus, in alternate order in the amount of hydrocarbons (saturated adsorption amount) is limited, generally two sets of circulating adsorber at a rate of about once a week can be continuously adsorbed by the adsorbent It is operating while switching.

【0005】 [0005]

【発明が解決しようとする課題】循環吸着器の切り換えに当たり、使用済の方の循環吸着器は、循環経路から切り離して切り換えが完了した後、吸着剤の再生を行う。 Hits the switching of the circulating adsorber [SUMMARY OF THE INVENTION], circulatory adsorber towards the spent, after switching separately from the circulation path is completed, it performs the regeneration of the adsorbent.
その使用済吸着器内には液化希ガス0.5%を含有する液体酸素が残留しているので、先ずその残留分を除去する必要がある。 Since the liquid oxygen in the used adsorption vessel containing 0.5% liquified noble gas remaining, it is necessary to first remove the residue. 一般に、残留分のうちの幾らかは吸着器内の蒸発ガスの圧力で粗希ガス濃縮塔の内部に押し戻されて回収されるが、残りの大部分は弁を開いて循環吸着器から系外に放出される。 In general, some of the residue is collected is pushed back inside of the crude rare gas concentration column at a pressure of vapor within the adsorber, the outside of the system from the circulation adsorber open most remaining valves It is released to. その後、吸着剤の再生が開始される。 Thereafter, reproduction is started in the adsorbent.

【0006】しかしながら、せっかく粗希ガス濃縮塔で約0.5 %まで濃縮された希ガスを、系外に無駄に放出してしまうことは、希ガス分離プロセス全体の希ガス収率を低下させるという点に問題がある。 However, the rare gas which is enriched with much trouble to about 0.5% crude rare gas concentration column, that is wastefully discharged out of the system is that it reduces the noble gas yields the overall rare gas separation process there is a problem with. この発明は、このような従来の問題点に着目してなされたものであり、吸着剤の再生時に、残留希ガスを大気放出することなく回収することができる希ガス精製プロセス用の循環吸着装置を提供することを目的としている。 The present invention has been made in view of such conventional problems, during regeneration of the adsorbent, circulation adsorption unit rare gas purification process can be recovered without air release residual noble gas is an object of the present invention to provide a.

【0007】 [0007]

【課題を解決するための手段】上記の目的を達成するこの発明は、深冷分離法による希ガス分離プロセスに設置するアセチレン除去のための循環吸着装置であって、加熱用気体を流して装置内残留の液体希ガスを蒸発気化せしめる熱交換用の配管を内部に組み込んだことを特徴とするものである。 To achieve the above object, there is provided a means for solving this invention is a cyclic adsorption unit for acetylene removal for installing a rare gas separation process by cryogenic separation method, apparatus by flowing a heating gas piping the inner residual liquid noble gas vaporized allowed to heat exchanger is characterized in that incorporated therein.

【0008】 [0008]

【作用】循環吸着装置の吸着剤を再生する際に、先ず、 [Action] When reproducing an adsorbent circulating adsorber, firstly,
熱交換用の配管に加熱ガス(例えば空気または窒素ガス)を通して装置内に残留の液体希ガスを加熱し、蒸発気化させる。 Into the apparatus through a heated gas piping for heat exchange (for example, air or nitrogen gas) to heat the residual liquid noble gas, is vaporized. 気化した希ガスは配管を経由してプロセス後段の処理経路に合流せしめて回収する。 Vaporized rare gas is recovered allowed joins the processing path processes subsequent stage through the pipe. 系外への放出量は零である。 Emissions to the outside of the system is zero.

【0009】 [0009]

【実施例】以下、この発明の実施例を図面を参照して説明する。 EXAMPLES The following will be described with reference to the drawings an embodiment of the present invention. 図1は、この発明の一実施例を示す深冷分離法による希ガス分離プロセスのフローシートである。 Figure 1 is a flow sheet of a rare gas separation process by cryogenic separation method showing an embodiment of the present invention. この実施例では、希ガスとして非常に高価なクリプトンKr In this embodiment, very expensive krypton Kr as the rare gas
(沸点−153.4 ℃)の分離の場合を説明する。 We describe a case of the separation of the (boiling point -153.4 ℃).

【0010】図中1は液体空気を酸素O 2と窒素N 2に分留するための複式精留塔で、一部液化した空気が下塔1aに供給され、ここで粗精製された液体空気は塔底3 [0010] figure 1 is a double rectification column for fractionating the liquid air into oxygen O 2 and nitrogen N 2, part liquefied air is supplied to the lower tower 1a, where the crude liquid air the bottom of the column is 3
で38〜40%0 2となり、塔頂4では上塔1bno還流に必要な純度に精製された液体窒素となる。 In the 38 to 40% 0 2, and the liquid nitrogen purified in a purity required for the upper tower 1bno reflux in the top 4. 塔底3内の液体空気は上下塔の圧力差で上塔1bの中央部に供給され、また下塔1bの塔頂4に溜まった窒素は上塔1a Liquid air in the bottom 3 is supplied to the central portion of the upper column 1b at a pressure difference between the upper and lower column, the nitrogen upper tower 1a accumulated at the top 4 of the lower tower 1b
の頂部5に還流液として供給される。 Is feed as reflux to the top 5. 上下の塔の中央部には多管式熱交換器からなる主凝縮器7が設けられ、その管内では窒素ガスの凝縮、管外では液体酸素の蒸発が行われる。 The central portion of the upper and lower tower main condenser 7 is provided consisting of a multi-tube heat exchanger, condensation of the nitrogen gas in the tube, the evaporation of the liquid oxygen in the extravascular performed. 分離された高純度の窒素は上塔1aの頂部5 Top of the high purity nitrogen separated upper column 1a 5
から取り出され、一方酸素ガスは中段の部から取り出される。 Retrieved from, whereas the oxygen gas is withdrawn from the middle part.

【0011】しかして、希ガスを含んだ液体酸素は主凝縮器7より直接に液状で取り出し、粗希ガス濃縮塔11 [0011] Thus, liquid oxygen containing a noble gas directly removed with the liquid from the main condenser 7, crude rare gas concentration column 11
に供給される。 It is supplied to. この実施例の場合、精留塔1から粗希ガス濃縮塔11に送られる液体酸素(希ガス濃度55pp In this embodiment, the liquid oxygen is sent from the fractionator 1 to the crude rare gas concentration column 11 (the rare gas concentration 55pp
m)の供給量は、3000Nm 3 /hである。 supply amount of m) is 3000 Nm 3 / h. この粗希ガス濃縮塔11において、希ガスは濃度約0.5 %まで濃縮され、分離された酸素ガスは塔頂部12から取り出される。 In this SoNozomi gas concentration column 11, the rare gas is concentrated to about 0.5% concentrations, separated oxygen gas is withdrawn from the top 12. 一方、塔底部13からは、希ガス濃度約0.5 %の液体酸素(粗希ガス)が24Nm 3 /hづつ抜き出されて、熱交換器15で約0℃まで加熱された後、粗希ガス配管16を経て希ガス精製装置20に送られる。 On the other hand, from the bottom of the column 13, the rare gas concentration of about 0.5% of the liquid oxygen (crude rare gas) is withdrawn one by 24 Nm 3 / h, after being heated to approximately 0 ℃ in the heat exchanger 15, crude rare gas It is sent to the rare gas purifier 20 via a pipe 16.

【0012】希ガス精製装置20には、アセチレン以外の炭化水素成分を燃焼させて水と炭酸ガスにする炭化水素除去器21と、その生成された水と炭酸ガスとを吸着除去するための並列された二基のタンクを有する吸着分離装置22が設けられている。 [0012] The rare gas purifying device 20, by burning hydrocarbon components other than acetylene hydrocarbon remover 21 to water and carbon dioxide, parallel to adsorb and remove its generated water and carbon dioxide adsorption separation apparatus 22 is provided with a tank of second base that is. 熱交換器15から粗希ガス配管16を経て送られた濃度約0.5 %の粗希ガス中のアセチレン以外の炭素成分と水素は、炭化水素除去器2 Carbon component and hydrogen other than acetylene heat exchanger 15 from the crude dilute through gas pipe 16 sent a concentration of about 0.5% SoNozomi gas is a hydrocarbon remover 2
1で燃焼され、水と炭酸ガスになって吸着分離装置22 Is combusted in 1, adsorption separation apparatus becomes water and carbon dioxide 22
で吸着除去される。 In the adsorption removal.

【0013】こうして、希ガス精製装置20で精製された後、続いて、濃度約0.5 %の粗希ガスは熱交換器15 [0013] Thus, after being purified rare gas purifier 20, followed by concentration of about 0.5% SoNozomi gas heat exchanger 15
を経て後段の希ガス濃縮塔25の中央部に送りこまれて、ここで希ガス濃度約99%に濃縮される。 Is fed to the central portion of the rear stage of the rare gas concentration column 25 through, is concentrated where the rare gas concentration of about 99%. 希ガス濃縮塔25の塔頂部26からは分離された酸素ガスが取り出され、一方塔底部27からは濃度約99%の製品粗希ガスが0.1 Nm 3 /hの割合で抜き出される。 From the top portion 26 of the rare gas concentration column 25 is taken out oxygen gas separated, whereas the bottom of the tower 27 concentration of about 99% of the product SoNozomi gas is withdrawn at a rate of 0.1 Nm 3 / h.

【0014】抜き出した製品粗希ガスは、計量槽28に送られて計量され、所定量づつ製品粗希ガスボンベ29 [0014] withdrawing product SoNozomi gas is metered sent to the weighing tank 28, a predetermined amount at a time product SoNozomi gas cylinder 29
に充填して出荷される。 It is shipped by filling in. 上記希ガス分離プロセスにおける、前段の粗希ガス濃縮塔11の底部の近傍には、アセチレン除去のための循環吸着装置30が配設されている。 In the rare gas separation process, in the vicinity of the bottom of the preceding SoNozomi gas concentration column 11, circulated adsorption device 30 for acetylene removal has been provided. この循環吸着装置30は、吸着剤を充填した二台の吸着槽30a,30bが並列に設けてあり、それぞれを切り換えて交互に使用するようになっている。 The circulating adsorption device 30, the double sets of adsorption tanks 30a filled with an adsorbent, 30b is is provided with parallel, so as alternately used by switching respectively. 循環吸着装置30の各吸着槽30a,30bにはそれぞれ、加熱用気体である空気又は窒素ガスを流す熱交換用配管31 Each adsorption vessel 30a of the circulating suction device 30, each of the 30b, the heat exchange pipe passing air or nitrogen gas is heated gas 31
が内設されている。 There has been internally provided. 循環吸着装置30の底部は粗希ガス濃縮塔11の塔底部13からの配管32が接続され、循環吸着装置30の頂部は配管33を経て粗希ガス濃縮塔11に接続され、これらの配管32,循環吸着装置3 The bottom of the circulating suction device 30 is coarse pipe 32 from the bottom portion 13 of the rare gas concentration tower 11 is connected, the top of the circulating suction device 30 is connected to the crude rare gas concentration column 11 through the pipe 33, these pipes 32 , circulating adsorber 3
0,配管33で循環経路が形成されている。 0, the circulation path pipe 33 is formed.

【0015】上記配管32は分岐延長され、途中に配設された熱交換器40を経て先に述べた粗希ガス配管16 [0015] The pipe 32 is branched extended, crude rare gas pipe mentioned above through a heat exchanger 40 disposed in the middle 16
に接続している。 It is connected to. 熱交換器40には、加熱用ガスである空気または窒素ガスが供給される熱交換用配管41が内設されており、後述するように循環吸着装置30の再生時に回収した希ガスを、粗希ガス配管16で送られる希ガスと同等の温度約0℃にまで加熱して、両者の温度を整合させる機能を有している。 The heat exchanger 40 is internally provided heat exchanging pipe 41 in which air or nitrogen gas is heating gas is supplied, a rare gas recovered during regeneration of the circulating suction device 30 as described later, the crude and heated to a comparable temperature of about 0 ℃ and rare gas delivered by the noble gas pipe 16 has a function of matching the temperature of both.

【0016】以下に、この循環吸着装置30の作用について説明する。 [0016] Hereinafter, a description of the operation of the circulating suction device 30. 循環吸着装置30は、粗希ガス濃縮塔1 Circulating adsorption device 30, the crude rare gas rectifying column 1
1で濃縮された希ガスを含有する液体酸素の一部を塔底部13から取り出し、二台のうちの一方の吸着槽30a A portion of the liquid oxygen containing a concentrated rare gas 1 is taken out from the bottom of the column 13, one of the adsorption vessel 30a of the two-units
を通過させて再び塔底部13に戻す循環を繰り返すことにより、液体酸素中に溶解している主としてアセチレンを吸着剤で捕捉分離することは従来と同様である。 By repeating the circulation was returned to column bottom 13 again passes the, capturing separating mainly acetylene dissolved in the liquid oxygen adsorbent is conventional.

【0017】また同様に、二台の吸着槽30a,30b [0017] Similarly, the two units of the adsorption vessel 30a, 30b
を1週間に1回程度の割合で交互に切り換え、吸着能力が飽和した吸着剤の再生を繰り返しながらながら操業する。 The alternately switched at a rate of about once a week, to operate while repeating the regeneration of the adsorbent which adsorption capacity is saturated. しかして、上記使用済の吸着槽30aを他方の吸着槽30bに切り換え、使用済吸着槽30aの吸着剤を再生する場合は、吸着槽30aの熱交換用配管31に空気または窒素ガスを流して槽内に残留している液体希ガスを加熱し、蒸発気化させる。 Thus, switching the adsorption vessel 30a of the spent on the other adsorption vessel 30b, the case of regenerating the adsorbent of the spent adsorption tank 30a is flushed with air or nitrogen gas to the heat exchanging pipe 31 of the suction tank 30a heating the liquid noble gas remaining in the tank, it is vaporized. 気化した希ガスは、延長されている配管32を通って熱交換器40に至り、ここで約0℃に迄加熱された後、希ガス精製装置20の炭化水素除去器21に入る粗希ガス配管16に合流して回収され、後段の希ガス濃縮塔25に供給される。 Vaporized rare gas, reaches the heat exchanger 40 through the pipe 32 which is extended, wherein after being heated to approximately 0 ° C., the crude rare gas entering the hydrocarbon remover 21 of the rare gas purifier 20 recovered and joins the pipe 16, it is supplied to the subsequent stage of the rare gas concentration column 25.

【0018】したがって、この実施例によれば、循環吸着装置30の一方の吸着槽を再生する際に、槽内の残留希ガス液を外部に無駄に放出する必要は全くなく、希ガスの回収率を向上させることができる。 [0018] Thus, according to this embodiment, when reproducing one adsorption vessel of the circulatory adsorption device 30, uselessly without any need to release the residual noble gas liquid in the tank to the outside, the recovery of noble gases it is possible to improve the rate. 因みに、上記循環吸着装置30の仕様は次の通りとした。 Incidentally, the specifications of the circulating suction device 30 was as follows. 各吸着槽内容積 0.36m 3 (直径600mm×高さ1384mm)。 Each suction tank volume 0.36 m 3 (diameter 600 mm × height 1384mm).

【0019】 吸着剤占有容積 0.216 m 3液貯蔵可能容積 0.144 m 3吸着槽内部に熱交換用配管を保有 この循環吸着装置30を用いて操業したところ、従来の循環吸着装置では周一回の切り換え時に約115Nm 3 [0019] was operated using a sorbent volume occupied 0.216 m 3 liquid storable volume 0.144 m 3 adsorption vessel inside the circulation adsorber possess heat exchange pipe 30, the conventional circulation adsorber week during a single switching about 115Nm 3
の残留液体を系外に放出していがのに対して、その放出分全量を回収することができ、結局希ガス精製プロセス全体の希ガス回収率を約3%向上させることができた。 The residual liquid whereas although not discharged out of the system, the release amount total amount can be recovered, it was possible to eventually improve the rare gas recovery rate of the entire rare gas purification process of about 3%.

【0020】 [0020]

【発明の効果】以上説明したように、この発明によれば、深冷分離法による希ガス分離プロセスに設置するアセチレン除去用の循環吸着装置に熱交換用の配管を組み込み、吸着剤の再生に際して循環吸着装置内の残留液体希ガスを追い出すべく、熱交換用の配管に加熱用気体を流して残留液体希ガスを蒸発気化させるようにしたため、従来のように残留液体希ガスを系外に放出してしまうことがなく、プロセスの希ガス回収率が向上するという効果を奏する。 As described in the foregoing, according to the present invention, incorporating a pipe for heat exchange circulation adsorber for acetylene removal to be installed in a rare gas separation process by cryogenic separation method, when regeneration of the adsorbent to expel residual liquid noble gas in the circulation adsorber, since the residual liquid noble gases by flowing heated gas to the piping for heat exchange and to evaporate vaporize, releasing the residual liquid noble gas out of the system as in the prior art without resulting in an effect that the rare gas recovery process is improved.

【図面の簡単な説明】 BRIEF DESCRIPTION OF THE DRAWINGS

【図1】本発明の循環吸着装置を備えた希ガス精製プロセスの一例を示すプロセスフローチャートである。 1 is a process flow chart showing an example of a rare gas purification process with a circulating suction device of the present invention.

【符号の説明】 DESCRIPTION OF SYMBOLS

30 循環吸着装置 30a 吸着槽 30b 吸着槽 31 熱交換用配管 30 circulating suction device 30a adsorption tank 30b adsorption tank 31 a pipe for the heat exchanger

Claims (1)

    【特許請求の範囲】 [The claims]
  1. 【請求項1】 深冷分離法による希ガス分離プロセスに設置するアセチレン除去のための循環吸着装置であって、加熱用気体を流して装置内残留の液体希ガスを蒸発気化せしめる熱交換用の配管を内部に組み込んだことを特徴とする希ガス精製プロセス用の循環吸着装置。 1. A circulating adsorber for acetylene removal for installing a rare gas separation process by cryogenic separation method, heating gas flushed with the device residual liquid noble gas for heat exchange is evaporated vaporizing circulation adsorber for noble gas purification process, characterized in that incorporated a pipe therein.
JP29513494A 1994-11-29 1994-11-29 Circulating and adsorbing apparatus for rare gas separating process Pending JPH08152262A (en)

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US20100297853A1 (en) * 2008-06-04 2010-11-25 Novellus Method for purifying acetylene gas for use in semiconductor processes
US8435608B1 (en) 2008-06-27 2013-05-07 Novellus Systems, Inc. Methods of depositing smooth and conformal ashable hard mask films
US8563414B1 (en) 2010-04-23 2013-10-22 Novellus Systems, Inc. Methods for forming conductive carbon films by PECVD
US8962101B2 (en) 2007-08-31 2015-02-24 Novellus Systems, Inc. Methods and apparatus for plasma-based deposition
US9023731B2 (en) 2012-05-18 2015-05-05 Novellus Systems, Inc. Carbon deposition-etch-ash gap fill process
US9304396B2 (en) 2013-02-25 2016-04-05 Lam Research Corporation PECVD films for EUV lithography
US9320387B2 (en) 2013-09-30 2016-04-26 Lam Research Corporation Sulfur doped carbon hard masks
US9362133B2 (en) 2012-12-14 2016-06-07 Lam Research Corporation Method for forming a mask by etching conformal film on patterned ashable hardmask
US9589799B2 (en) 2013-09-30 2017-03-07 Lam Research Corporation High selectivity and low stress carbon hardmask by pulsed low frequency RF power

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8962101B2 (en) 2007-08-31 2015-02-24 Novellus Systems, Inc. Methods and apparatus for plasma-based deposition
US20100297853A1 (en) * 2008-06-04 2010-11-25 Novellus Method for purifying acetylene gas for use in semiconductor processes
US8309473B2 (en) * 2008-06-04 2012-11-13 Novellus Systems, Inc. Method for purifying acetylene gas for use in semiconductor processes
US8435608B1 (en) 2008-06-27 2013-05-07 Novellus Systems, Inc. Methods of depositing smooth and conformal ashable hard mask films
US9240320B1 (en) 2008-06-27 2016-01-19 Novellus Systems, Inc. Methods of depositing smooth and conformal ashable hard mask films
US8563414B1 (en) 2010-04-23 2013-10-22 Novellus Systems, Inc. Methods for forming conductive carbon films by PECVD
US9023731B2 (en) 2012-05-18 2015-05-05 Novellus Systems, Inc. Carbon deposition-etch-ash gap fill process
US9362133B2 (en) 2012-12-14 2016-06-07 Lam Research Corporation Method for forming a mask by etching conformal film on patterned ashable hardmask
US9304396B2 (en) 2013-02-25 2016-04-05 Lam Research Corporation PECVD films for EUV lithography
US9618846B2 (en) 2013-02-25 2017-04-11 Lam Research Corporation PECVD films for EUV lithography
US9320387B2 (en) 2013-09-30 2016-04-26 Lam Research Corporation Sulfur doped carbon hard masks
US9589799B2 (en) 2013-09-30 2017-03-07 Lam Research Corporation High selectivity and low stress carbon hardmask by pulsed low frequency RF power

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