JP3269818B2 - Surface roughened copper, method for producing the same, and printed circuit board using the same - Google Patents

Surface roughened copper, method for producing the same, and printed circuit board using the same

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Publication number
JP3269818B2
JP3269818B2 JP2000163215A JP2000163215A JP3269818B2 JP 3269818 B2 JP3269818 B2 JP 3269818B2 JP 2000163215 A JP2000163215 A JP 2000163215A JP 2000163215 A JP2000163215 A JP 2000163215A JP 3269818 B2 JP3269818 B2 JP 3269818B2
Authority
JP
Japan
Prior art keywords
etching
copper
ion
copper foil
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000163215A
Other languages
Japanese (ja)
Other versions
JP2001342600A (en
Inventor
昌宏 伊藤
俊郎 久米
恵美子 井垣
正和 棚橋
文雄 越後
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
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Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP2000163215A priority Critical patent/JP3269818B2/en
Publication of JP2001342600A publication Critical patent/JP2001342600A/en
Application granted granted Critical
Publication of JP3269818B2 publication Critical patent/JP3269818B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、表面粗化銅とその
製造方法、及びその表面粗化銅を用いたプリント基板に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface roughened copper, a method for producing the same, and a printed circuit board using the surface roughened copper.

【0002】[0002]

【従来の技術】近年多層プリント基板においては、回路
の小型化、高周波化に伴い益々その使用数が増加してき
ている。これに使用されている粗面化銅箔も高周波にお
いて遅延速度の小さなものや、小面積化に対応した接着
強度を持つことが要求されてきている。
2. Description of the Related Art In recent years, the number of multilayer printed circuit boards used has been increasing with the miniaturization of circuits and the increase in frequency. The surface-roughened copper foil used for this purpose is required to have a low delay speed at a high frequency and have an adhesive strength corresponding to a reduction in area.

【0003】ところで、従来の粗化銅箔の製造方法で
は、粗化銅箔のロールをマイナス極とし銅をプラス極と
して比較的低電流密度で先ず片面だけ粗面化めっきを行
ない、その後に粗面化されていない裏面を同様に粗面化
めっきをするのが通常であった。
In the conventional method for producing a roughened copper foil, a roughened copper foil is rolled into a negative pole, copper is used as a positive pole, and a relatively low current density is used to first perform roughening plating on only one side, and then roughening plating is performed. It was usual that the non-surfaced rear surface was similarly subjected to surface roughening plating.

【0004】しかし、上記粗面化めっきは低電流密度で
行われるためめっき終了までに長時間を要し、製造コス
トが高くなり、めっき液のコントロールも容易でなく、
また、図1に示した従来の粗面化めっきを行なった銅箔
表面の断面模式図から明らかなように、めっき表面の凹
凸が大きなうねり状の形態をなすため、多層プリント基
板に用いた場合にショート不良等が発生するという問題
があった。更に、粗化銅箔と樹脂基板との接着強度も弱
いという問題があった。また、粗化銅箔の表面積も小さ
くなるため、内蔵型コンデンサーを作るにも不利であっ
た。
However, since the surface roughening plating is performed at a low current density, it takes a long time to finish the plating, the manufacturing cost increases, and the control of the plating solution is not easy.
In addition, as is apparent from the schematic cross-sectional view of the copper foil surface subjected to the conventional roughening plating shown in FIG. 1, the unevenness of the plating surface forms a large undulation, so that it is used for a multilayer printed circuit board. However, there is a problem that a short-circuit failure or the like occurs. Further, there is a problem that the adhesive strength between the roughened copper foil and the resin substrate is also weak. Also, the surface area of the roughened copper foil is small, which is disadvantageous for making a built-in capacitor.

【0005】[0005]

【発明が解決しようとする課題】本発明は、前記従来の
問題を解決するため、銅箔と樹脂との密着性を保ち得る
表面粗化銅を簡単で安価な手法で提供することを目的と
する。
SUMMARY OF THE INVENTION An object of the present invention is to provide a roughened surface copper capable of maintaining the adhesion between a copper foil and a resin by a simple and inexpensive method in order to solve the above-mentioned conventional problems. I do.

【0006】[0006]

【課題を解決するための手段】前記目的を達成するため
本発明の表面粗化銅は、表層部に高さ1〜20μmの凹
凸部を設けた銅箔又は銅板であって、前記表層部におけ
る前記凹凸部の占める空間密度が10%以上、90%以
下であることを特徴とする。
In order to achieve the above object, the surface roughened copper of the present invention is a copper foil or a copper plate having a surface layer portion provided with unevenness having a height of 1 to 20 μm. The space density occupied by the uneven portions is not less than 10% and not more than 90%.

【0007】表層部の凹凸の高さが1μmを下回ると接
着強度が低下し、20μmを超えるとエッチングの進行
速度が極端に遅くなる。また、凹凸部の空間密度が10
%を下回り、又は90%を超えると接着強度が低下す
る。
[0007] When the height of the unevenness of the surface layer portion is less than 1 µm, the adhesive strength is reduced. Further, the space density of the uneven portion is 10
%, Or more than 90%, the adhesive strength decreases.

【0008】これにより、本発明は多層プリント基板を
構成する銅箔の表面粗化により、ガラス繊維等の不織布
と樹脂からなるプリント基板との密着性を上げることが
でき、GHz(ギガヘルツ)帯でも使用できるものであ
る。また、カーボンとポリエチレンを混合して硬化して
作るPTC特性電流保護素子用の電極等の樹脂との接合
性を必要とする表面粗化銅箔の製造方法にも利用できる
ものである。
According to the present invention, the adhesion between the nonwoven fabric such as glass fiber and the printed board made of resin can be enhanced by roughening the surface of the copper foil constituting the multilayer printed board, and even in the GHz (GHz) band. It can be used. The present invention can also be used for a method for producing a surface-roughened copper foil that requires bonding properties with a resin such as an electrode for a PTC characteristic current protection element formed by mixing and curing carbon and polyethylene.

【0009】また、本発明の表面粗化銅の製造方法は、
塩化ナトリウム、塩化カリウム、硝酸ナトリウム、硝酸
カリウム、硫酸マグネシウム、炭酸ナトリウム及び炭酸
水素ナトリウムからなる群から選択された少なくとも1
種類の塩と、銅イオンと反応して難溶性の化合物を形成
し得る陰イオンとを含む電解液中で銅箔又は銅板の表面
をエッチングして得た表面粗化銅を、前記陰イオンの添
加量が0.0090質量%以下である前記電解液中で再
度エッチングを行なうことを特徴とする。銅イオンと反
応する陰イオンを供給する塩の添加量は、0.01質量
%から5質量%が好ましい。また、他の塩の添加量も、
0.01質量%から5質量%が好ましい。
Further, the method for producing a roughened copper according to the present invention comprises:
At least one selected from the group consisting of sodium chloride, potassium chloride, sodium nitrate, potassium nitrate, magnesium sulfate, sodium carbonate and sodium hydrogen carbonate
Reacts with various salts and copper ions to form poorly soluble compounds
The surface roughness of copper surfaces of copper foil or copper plate obtained by etching in an electrolyte containing a may anions, added the anion
In the electrolyte having an addition amount of 0.0090% by mass or less.
It is characterized by performing etching once . The amount of the salt that supplies anions that react with copper ions is preferably 0.01% by mass to 5% by mass. Also, the amount of other salts added,
It is preferably from 0.01% by mass to 5% by mass.

【0010】前記陰イオンは、炭酸イオン、フッ素イオ
ン、炭酸水素イオン、水酸イオン、燐酸イオン、ピロ燐
酸イオン、ヨード酸イオン、蓚酸イオン、蟻酸イオン及
びメタ燐酸イオンからなる群から選択された少なくとも
1種類であることが好ましい。
The anion is at least one selected from the group consisting of carbonate ion, fluorine ion, hydrogen carbonate ion, hydroxide ion, phosphate ion, pyrophosphate ion, iodoate ion, oxalate ion, formate ion and metaphosphate ion. One type is preferred.

【0011】また、前記エッチングは、交流エッチング
であることが好ましい。
Further, the etching is preferably an AC etching.

【0012】更に、前記交流エッチングに用いる交流の
周波数は、50Hz以下であることが好ましい。
Further, the AC frequency used for the AC etching is preferably 50 Hz or less.

【0013】前記電解液に添加剤として、バブリングに
よる炭酸ガス又はドライアイスの小片を添加することが
好ましい。これにより、エッチングがより進行する。
It is preferable to add a small piece of carbon dioxide gas or dry ice by bubbling as an additive to the electrolytic solution. Thereby, the etching proceeds further.

【0014】更に、上記の方法により製造した表面粗化
銅を、酸性又はアルカリ性の溶液中で処理又はエッチン
グを行なうことが好ましい。
Further, it is preferable that the roughened copper produced by the above method is treated or etched in an acidic or alkaline solution.

【0015】次に、本発明のプリント基板は、上記表面
粗化銅を導電体として備えている。また、このプリント
基板にはコンデンサーを内蔵させることができる。
Next, the printed circuit board of the present invention includes the above-described surface roughened copper as a conductor. In addition, a capacitor can be built in the printed circuit board.

【0016】[0016]

【発明の実施の形態】通常電解エッチングは電解研磨の
ように金属の表面を平滑にするために行なわれる。その
理由は金属板と対極板を平行に電解液中に置き、金属板
を陽極にして電気化学的にエッチングする時、金属に凹
凸が存在する場合、電流は対極に近い突起部に集中する
ためである。そのため、特にアルミニウムのように陽極
になると酸化物を作るような金属以外では、エッチング
で凹凸をつけることは困難である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Electrolytic etching is usually performed to smooth the surface of a metal like electrolytic polishing. The reason is that when a metal plate and a counter electrode plate are placed in an electrolytic solution in parallel and electrochemically etched using the metal plate as the anode, if there is unevenness in the metal, the current will concentrate on the protrusion near the counter electrode. It is. For this reason, it is difficult to form irregularities by etching, except for a metal such as aluminum, which produces an oxide when it becomes an anode.

【0017】本発明では、電解液中に銅イオンと反応し
て難溶性の化合物を形成し得る陰イオンを添加しておく
ことによって、電解エッチング時に銅イオンが多くなる
突起部に難溶性化合物が生成されてエッチングを阻害
し、陰イオンの到達しにくい凹部がエッチングされやす
いようにすることにより、エッチングで粗面化が図れる
ようにしたものである。
In the present invention, by adding an anion capable of forming a hardly soluble compound by reacting with copper ions in the electrolytic solution, the hardly soluble compound is added to the projections where the amount of copper ions increases during electrolytic etching. The recesses that are generated and hinder the etching and the recesses where the anions do not easily reach are easily etched, so that the etching can be roughened.

【0018】また、エッチング箔の表層部の立体形状が
多角柱、多角台又は多角錐の凹凸を均質に作るために
は、直流エッチングより交流エッチングの方がエッチピ
ットの発生の機会が多く有利である。
Further, in order for the three-dimensional shape of the surface layer portion of the etching foil to uniformly form irregularities of a polygonal prism, a truncated polygon or a polygonal pyramid, AC etching is more advantageous than DC etching in terms of the opportunity for generation of etch pits. is there.

【0019】一般的に交流エッチングの周波数を低くす
るとエッチピットの間隔が大きくなって広い間隔の凹凸
になり、1Hz程度になるとかなり大きな間隔の凹凸が
得られる。一方、エッチングの周波数を高くするとエッ
チピットの間隔が狭くなり細かい凹凸が得られる。より
エッチング周波数を高くして50Hzを超えるとエッチ
ングの進行が事実上停止する。
In general, when the frequency of the AC etching is lowered, the interval between the etch pits is increased and irregularities are formed at a wide interval, and when the frequency is about 1 Hz, irregularities having a considerably large interval are obtained. On the other hand, when the etching frequency is increased, the interval between the etch pits is reduced, and fine irregularities are obtained. If the etching frequency is further increased to exceed 50 Hz, the progress of the etching is practically stopped.

【0020】エッチングの電解液に用いる塩は、銅イオ
ンと錯体を作り易いハロゲンイオンを持った塩でも良
い。また、中性塩と銅イオンと溶けにくい化合物を作る
組み合わせでは酸化銅や塩基性炭酸銅等の沈澱物を表面
に作ることが多いため、エッチング後に酸又はアルカリ
で処理或いは酸又はアルカリ中でエッチングをすること
により沈澱物を取り除く方が良い。
The salt used for the electrolytic solution for etching may be a salt having a halogen ion which easily forms a complex with a copper ion. In addition, since a combination of a neutral salt and a compound that is difficult to dissolve with copper ions often forms a precipitate such as copper oxide or basic copper carbonate on the surface, it is treated with an acid or an alkali after etching or etched in an acid or an alkali. It is better to remove the precipitate by performing

【0021】また、このエッチングで作る粗化面は液組
成や周波数、電流密度や再エッチングによりかなり自由
に凹凸をコントロールできるため、目的に合った表面形
状や粗度を得ることができる。
Further, the roughened surface formed by this etching can control the unevenness considerably freely by the liquid composition, frequency, current density and re-etching, so that a surface shape and roughness suitable for the purpose can be obtained.

【0022】エッチングで得た立体形状は多角柱状であ
ることが多いので、コンデンサーを作りやすい多角台状
にするため、電解液として3000mol/m3の炭酸
水素ナトリウム、3000mol/m3のNaCl、3
000mol/m3のHCl又は3000mol/m3
NaClに炭酸ガスをバブリングしたもので再度エッチ
ングを行なうことができる。
Since the three-dimensional shape obtained by etching is often a polygonal prism, in order to form a polygonal trapezoid in which a capacitor can be easily formed, 3000 mol / m 3 of sodium hydrogen carbonate, 3000 mol / m 3 of NaCl,
Etching can be performed again with 2,000 mol / m 3 HCl or 3000 mol / m 3 NaCl bubbled with carbon dioxide gas.

【0023】図4に本発明で用いるエッチング槽の模式
図を示す。図4において、1は電極、2は試料である他
の電極、3は添加剤の入った電解液、4は電源である。
FIG. 4 is a schematic view of an etching tank used in the present invention. In FIG. 4, 1 is an electrode, 2 is another electrode which is a sample, 3 is an electrolyte containing an additive, and 4 is a power source.

【0024】[0024]

【実施例】以下、実施例を用いて本発明を具体的に説明
する。
The present invention will be specifically described below with reference to examples.

【0025】(実施例1) 3000mol/m3の塩化ナトリウムと、銅イオンと
反応して難溶性の化合物を形成し得る陰イオンを供給す
る添加剤として0.2質量%の炭酸アンモニウムを水に
溶かした電解液中で、試料側の電極に銅箔、他の電極に
カ−ボンを用い、縦60mm、横60mmの試料で1H
zの交流で170mA/cm2の電流密度で5分間エッ
チングを行なったところ、表面粗さRaは10μmであ
った。アルファシアノアクリレート系瞬間接着剤を使用
して縦3mm、横3mm、厚さ0.1mmの銅箔で引っ
張り試験を行なったところ、引っ張り強度は、エッチン
グ前は14.7Nであったのに、エッチング後は36.
3Nになった。エポキシ系、ゴム系接着剤でも同様な傾
向が見られた。周波数が50Hzを超えるとエッチング
が進行しなかった。また、電流密度は高電流密度ほど表
面荒さは大きいという傾向が見られた。PHについて
は、塩酸にてPH4に調節しエッチングを行なったとこ
ろ、引っ張り強度は26.5Nとなったが、PH1では
14.7Nとなり、水酸化ナトリウムでPH11にした
ところ21.6Nとなった。このようにPHによって引
っ張り強度がコントロールできる。
Example 1 0.2% by mass of ammonium carbonate was added to water as an additive to supply 3000 mol / m 3 of sodium chloride and an anion capable of forming an insoluble compound by reacting with copper ions. In the dissolved electrolyte, copper foil was used for the electrode on the sample side, and carbon was used for the other electrode.
When etching was performed at a current density of 170 mA / cm 2 for 5 minutes with an AC current of z, the surface roughness Ra was 10 μm. When a tensile test was performed on a copper foil having a length of 3 mm, a width of 3 mm, and a thickness of 0.1 mm using an alpha cyanoacrylate instant adhesive, the tensile strength was 14.7 N before etching, but the etching was After 36.
It became 3N. A similar tendency was observed with epoxy and rubber adhesives. When the frequency exceeded 50 Hz, etching did not proceed. In addition, it was observed that the higher the current density, the larger the surface roughness. When the pH was adjusted to pH 4 with hydrochloric acid and etched, the tensile strength was 26.5 N, but it was 14.7 N for PH 1 and 21.6 N when it was adjusted to PH 11 with sodium hydroxide. Thus, the tensile strength can be controlled by the PH.

【0026】炭酸アンモニウムの添加量は、0.01質
量%以上で効果があった。炭酸水素アンモニウムでも同
様な効果があった。添加剤として更に請求項3に記載の
ものを少なくても1種類以上、0.01〜5質量%添加
しても同様な効果があった。電解液中の塩についても
求項2に記載の他のものに変えても、又はNaClとK
Brのように混合して用いても大きな差がなかった。ま
た、銅箔の片面及び両面のどちらでも適用可能であるこ
とは言うまでもないことである。浴温を変えても著しい
効果はなかった。また、周波数については0.3Hz以
下の直流でも同様な効果が得られたが、工程管理が難し
かった。0.3〜5Hzでは順調で、1Hzとほぼ同様
な結果が得られた。5Hz以上では周波数の増加ととも
にエッチング量が少なくなり、50Hzを超えるとエッ
チングは事実上停止した。エッチング波形は正弦波が良
いが、矩形波、鋸歯状波、各種パルス波でも良かった。
バイアス有りでも著しい差がなかったが管理が困難にな
った。
The effect was effective when the amount of ammonium carbonate added was 0.01% by mass or more. Ammonium bicarbonate had a similar effect. Similar effects were obtained by adding at least one of the additives described in claim 3 as an additive in an amount of 0.01 to 5% by mass. also for salt in the electrolytic solution
Claim 2 may be replaced with another one, or NaCl and K
Even when used as a mixture such as Br, there was no significant difference. It goes without saying that the present invention can be applied to either one side or both sides of the copper foil. Changing the bath temperature had no significant effect. The same effect was obtained with a direct current of 0.3 Hz or less, but process control was difficult. At 0.3 to 5 Hz, the result was satisfactory and almost the same result as at 1 Hz was obtained. Above 5 Hz, the etching amount decreased with increasing frequency, and above 50 Hz, the etching was practically stopped. The etching waveform is preferably a sine wave, but a rectangular wave, a sawtooth wave, and various pulse waves were also good.
There was no significant difference even with bias, but management became difficult.

【0027】電流密度については、小さいものでは当然
長時間を要し、大きいものでは発熱などの問題があり、
10mA/cm2から700mA/cm2が妥当なところ
であった。エッチング時間については短ければエッチン
グが進まず、長ければ原価的に合わないことや、銅箔の
表層部における凹凸部の占める空間密度が10%を下回
り、密着強度の低下や表面積の低下によるコンデンサー
容量の減少等の問題があり、5秒〜1時間程度が適当な
ところであった。エッチング回数の増加に伴い添加剤を
消費量分だけ添加してやれば良く、炭酸ガスのバブリン
グやドライアイスの小片を添加してやっても良い。更
に、エッチング後に塩基性炭酸銅などの溶け難い生成物
を溶かすために、0.1〜10000mol/m3程度
の塩酸などの酸中でディッピングを0.1秒〜24時間
程度行なうか、又は電解エッチングを0.1秒〜10分
程度行なってやれば樹脂基板との接着強度が2〜3%程
度向上する。
Regarding the current density, a small one naturally takes a long time, and a large one has a problem such as heat generation.
10 mA / cm 2 to 700 mA / cm 2 were appropriate. Regarding the etching time, if the etching time is short, the etching will not proceed, if it is long, the cost will not match, and the space density occupied by the unevenness in the surface layer of the copper foil is less than 10%, the capacitor capacity due to the decrease in adhesion strength and surface area However, there was a problem such as a decrease in the temperature, and about 5 seconds to 1 hour was appropriate. As the number of etchings increases, the additive may be added in an amount corresponding to the consumption amount. Bubbling of carbon dioxide gas or small pieces of dry ice may be added. Further, in order to dissolve a hardly soluble product such as basic copper carbonate after etching, dipping is performed in an acid such as hydrochloric acid of about 0.1 to 10000 mol / m 3 for about 0.1 seconds to 24 hours, or electrolytically. If the etching is performed for about 0.1 second to about 10 minutes, the bonding strength with the resin substrate is improved by about 2 to 3%.

【0028】次に、エッチングした銅箔表面の断面を電
子顕微鏡で観察したところ、図2に示すとおり、多角柱
状の凹凸が観察された。また、表層部における凹凸部の
占める空間密度は、約50%であった。なお、以下の実
施例2〜17でエッチングした銅箔も同様な形状の凹凸
が観察された。
Next, when the cross section of the etched copper foil surface was observed with an electron microscope, as shown in FIG. 2, polygonal columnar irregularities were observed. The space density occupied by the uneven portions in the surface layer was about 50%. In the copper foils etched in Examples 2 to 17 below, unevenness having a similar shape was observed.

【0029】(実施例2) 3000mol/m3の塩化ナトリウムと、銅イオンと
反応して難溶性の化合物を形成し得る陰イオンを供給す
る添加剤として0.2質量%のフッ化アンモニウムを水
に溶かした電解液中で、試料側の電極に銅箔、他の電極
にカ−ボンを用い、縦60mm、横60mmの試料で1
Hzの交流で170mA/cm2の電流密度で5分間エ
ッチングを行なったところ、表面粗さRaは10μmで
あった。アルファシアノアクリレート系瞬間接着剤を使
用して縦3mm、横3mm、厚さ0.1mmの銅箔で引
っ張り試験を行なったところ、引っ張り強度は、エッチ
ング前は14.7Nであったのに、エッチング後は3
4.3Nになった。エポキシ系、ゴム系接着剤でも同様
な傾向が見られた。
Example 2 As an additive for supplying 3000 mol / m 3 of sodium chloride and an anion capable of forming a hardly soluble compound by reacting with copper ions, 0.2% by mass of ammonium fluoride was added to water. In an electrolyte dissolved in water, copper foil was used for the electrode on the sample side and carbon was used for the other electrode.
When etching was performed at a current density of 170 mA / cm 2 at an alternating current of Hz for 5 minutes, the surface roughness Ra was 10 μm. When a tensile test was performed on a copper foil having a length of 3 mm, a width of 3 mm, and a thickness of 0.1 mm using an alpha cyanoacrylate instant adhesive, the tensile strength was 14.7 N before etching, but the etching was After 3
4.3N. A similar tendency was observed with epoxy and rubber adhesives.

【0030】フッ化アンモニウムの添加量は、0.01
質量%以上で効果があった。添加剤として更に請求項3
に記載のものを0.01〜5質量%添加しても同様な効
果があった。電解液中の塩についても請求項2に記載の
他のものに変えても大きな差がなかった。また、銅箔の
片面及び両面のどちらでも適用可能であることは言うま
でもないことである。浴温を変えても著しい効果はなか
った。また、直流エッチングでも同様な効果が得られた
が、工程管理が難しかった。エッチング時間は1時間で
もほぼ同様な結果を得た。
The amount of ammonium fluoride added is 0.01
There was an effect at mass% or more. Claim 3 further as an additive.
The same effect was obtained by adding 0.01 to 5% by mass of those described in (1). The salt in the electrolyte is also described in claim 2.
There was no big difference when I changed to another one. It goes without saying that the present invention can be applied to either one side or both sides of the copper foil. Changing the bath temperature had no significant effect. A similar effect was obtained by DC etching, but process control was difficult. Almost the same result was obtained even when the etching time was 1 hour.

【0031】(実施例3) 3000mol/m3の塩化ナトリウムと、銅イオンと
反応して難溶性の化合物を形成し得る陰イオンを供給す
る添加剤として0.2質量%の燐酸アンモニウムを水に
溶かした電解液中で、試料側の電極に銅箔、他の電極に
カ−ボンを用い、縦60mm、横60mmの試料で1H
zの交流で170mA/cm2の電流密度で5分間エッ
チングを行なったところ、表面粗さRaは9μmであっ
た。アルファシアノアクリレート系瞬間接着剤を使用し
て縦3mm、横3mm、厚さ0.1mmの銅箔で引っ張
り試験を行なったところ、引っ張り強度は、エッチング
前は14.7Nであったのに、エッチング後は31.4
Nになった。エポキシ系、ゴム系接着剤でも同様な傾向
が見られた。また、燐酸や他の燐酸塩でも同様な傾向が
みられた。
(Example 3) As an additive for supplying 3000 mol / m 3 of sodium chloride and an anion capable of forming a hardly soluble compound by reacting with copper ion, 0.2% by mass of ammonium phosphate was added to water. In the dissolved electrolyte, copper foil was used for the electrode on the sample side, and carbon was used for the other electrode.
When etching was performed for 5 minutes at a current density of 170 mA / cm 2 with an alternating current of z, the surface roughness Ra was 9 μm. When a tensile test was performed on a copper foil having a length of 3 mm, a width of 3 mm, and a thickness of 0.1 mm using an alpha cyanoacrylate instant adhesive, the tensile strength was 14.7 N before etching. The rest is 31.4
It became N. A similar tendency was observed with epoxy and rubber adhesives. A similar tendency was observed for phosphoric acid and other phosphates.

【0032】燐酸アンモニウムの添加量は、0.01質
量%以上で効果があった。添加剤として更に請求項3に
記載のものを0.01〜5質量%添加しても同様な効果
があった。電解液中の塩についても請求項2に記載の他
ものに変えても大きな差がなかった。また、銅箔の片
面及び両面のどちらでも適用可能であることは言うまで
もないことである。浴温を変えても著しい効果はなかっ
た。また、直流エッチングでも同様な効果が得られた
が、工程管理が難しかった。
The effect was effective when the addition amount of ammonium phosphate was 0.01% by mass or more. The same effect was obtained even when 0.01 to 5% by mass of the additive described in claim 3 was further added as an additive. The salt in the electrolyte is also described in claim 2.
There was no big difference when I changed it to the one. It goes without saying that the present invention can be applied to either one side or both sides of the copper foil. Changing the bath temperature had no significant effect. A similar effect was obtained by DC etching, but process control was difficult.

【0033】1Hzの交流でエッチング電流680mA
/cm2、エッチング時間5秒で表面粗さRa3μmを
得た。アルファシアノアクリレート系瞬間接着剤を使用
して縦3mm、横3mm、厚さ0.1mmの銅箔で引っ
張り試験を行なったところ、引っ張り強度は、エッチン
グ前は14.7Nであったのに、エッチング後は18.
6Nになった。エポキシ系、ゴム系接着剤でも同様な傾
向がみられた。
An etching current of 680 mA at an alternating current of 1 Hz
/ Cm 2 and an etching time of 5 seconds to obtain a surface roughness Ra of 3 μm. When a tensile test was performed on a copper foil having a length of 3 mm, a width of 3 mm, and a thickness of 0.1 mm using an alpha cyanoacrylate instant adhesive, the tensile strength was 14.7 N before etching, but the etching was After 18.
6N. A similar tendency was observed with epoxy and rubber adhesives.

【0034】(実施例4) 3000mol/m3の塩化ナトリウムと、銅イオンと
反応して難溶性の化合物を形成し得る陰イオンを供給す
る添加剤として0.2質量%のピロ燐酸アンモニウムを
水に溶かした電解液中で、試料側の電極に銅箔、他の電
極にカ−ボンを用い、縦60mm、横60mmの試料で
1Hzの交流で170mA/cm2の電流密度で5分間
エッチングを行なったところ、表面粗さRaは8μmで
あった。アルファシアノアクリレート系瞬間接着剤を使
用して縦3mm、横3mm、厚さ0.1mmの銅箔で引
っ張り試験を行なったところ、引っ張り強度は、エッチ
ング前は14.7Nであったのに、エッチング後は3
7.2Nになった。エポキシ系、ゴム系接着剤でも同様
な傾向が見られた。また、ピロ燐酸や他のピロ燐酸塩で
も同様な傾向がみられた。
Example 4 As an additive for supplying 3000 mol / m 3 of sodium chloride and an anion capable of forming a hardly soluble compound by reacting with copper ions, 0.2% by mass of ammonium pyrophosphate was added to water. Using a copper foil for the electrode on the sample side and carbon for the other electrode, etching was performed for 5 minutes at a current density of 170 mA / cm 2 with an alternating current of 1 Hz using a copper foil for the electrode on the sample side and carbon for the other electrode in the electrolytic solution dissolved in As a result, the surface roughness Ra was 8 μm. When a tensile test was performed on a copper foil having a length of 3 mm, a width of 3 mm, and a thickness of 0.1 mm using an alpha cyanoacrylate instant adhesive, the tensile strength was 14.7 N before etching, but the etching was After 3
7.2N. A similar tendency was observed with epoxy and rubber adhesives. A similar tendency was observed for pyrophosphate and other pyrophosphates.

【0035】ピロ燐酸アンモニウムの添加量は、0.0
1質量%以上で効果があった。添加剤として更に請求項
3に記載のものを0.01〜5質量%添加しても同様な
効果があった。電解液中の塩についても請求項2に記載
の他のものに変えても大きな差がなかった。また、銅箔
の片面及び両面のどちらでも適用可能であることは言う
までもないことである。浴温を変えても著しい効果はな
かった。また、直流エッチングでも同様な効果が得られ
たが、工程管理が難しかった。
The amount of ammonium pyrophosphate added is 0.0
There was an effect at 1% by mass or more. The same effect was obtained even when 0.01 to 5% by mass of the additive described in claim 3 was further added as an additive. The salt in the electrolyte is also described in claim 2.
There was no big difference when I changed to another one. It goes without saying that the present invention can be applied to either one side or both sides of the copper foil. Changing the bath temperature had no significant effect. A similar effect was obtained by DC etching, but process control was difficult.

【0036】(実施例5) 3000mol/m3の塩化ナトリウムと、銅イオンと
反応して難溶性の化合物を形成し得る陰イオンを供給す
る添加剤として0.2質量%のヨード酸アンモニウムを
水に溶かした電解液中で、試料側の電極に銅箔、他の電
極にカ−ボンを用い、縦60mm、横60mmの試料で
1Hzの交流で170mA/cm2の電流密度で5分間
エッチングを行なったところ、表面粗さRaは7μmで
あった。アルファシアノアクリレート系瞬間接着剤を使
用して縦3mm、横3mm、厚さ0.1mmの銅箔で引
っ張り試験を行なったところ、引っ張り強度は、エッチ
ング前は14.7Nであったのに、エッチング後は3
1.4Nになった。エポキシ系、ゴム系接着剤でも同様
な傾向が見られた。
Example 5 As an additive for supplying 3000 mol / m 3 of sodium chloride and an anion capable of reacting with copper ions to form a hardly soluble compound, 0.2% by mass of ammonium iodoate was added to water. Using a copper foil for the electrode on the sample side and carbon for the other electrode, etching was performed for 5 minutes at a current density of 170 mA / cm 2 with an alternating current of 1 Hz using a copper foil for the electrode on the sample side and carbon for the other electrode in the electrolytic solution dissolved in As a result, the surface roughness Ra was 7 μm. When a tensile test was performed on a copper foil having a length of 3 mm, a width of 3 mm, and a thickness of 0.1 mm using an alpha cyanoacrylate instant adhesive, the tensile strength was 14.7 N before etching, but the etching was After 3
1.4N. A similar tendency was observed with epoxy and rubber adhesives.

【0037】ヨード酸アンモニウムの添加量は、0.0
1質量%以上で効果があった。添加剤として更に請求項
3に記載のものを0.01〜5質量%添加しても同様な
効果があった。電解液中の塩についても請求項2に記載
の他のものに変えても大きな差がなかった。また、銅箔
の片面及び両面のどちらでも適用可能であることは言う
までもないことである。浴温を変えても著しい効果はな
かった。また、直流エッチングでも同様な効果が得られ
たが、工程管理が難しかった。
The amount of ammonium iodoate added is 0.0
There was an effect at 1% by mass or more. The same effect was obtained even when 0.01 to 5% by mass of the additive described in claim 3 was further added as an additive. The salt in the electrolyte is also described in claim 2.
There was no big difference when I changed to another one. It goes without saying that the present invention can be applied to either one side or both sides of the copper foil. Changing the bath temperature had no significant effect. A similar effect was obtained by DC etching, but process control was difficult.

【0038】(実施例6) 3000mol/m3の塩化ナトリウムと、銅イオンと
反応して難溶性の化合物を形成し得る陰イオンを供給す
る添加剤として0.2質量%の蓚酸アンモニウムを水に
溶かした電解液中で、試料側の電極に銅箔、他の電極に
カ−ボンを用い、縦60mm、横60mmの試料で1H
zの交流で170mA/cm2の電流密度で5分間エッ
チングを行なったところ、表面粗さRaは8μmであっ
た。アルファシアノアクリレート系瞬間接着剤を使用し
て縦3mm、横3mm、厚さ0.1mmの銅箔で引っ張
り試験を行なったところ、引っ張り強度は、エッチング
前は14.7Nであったのに、エッチング後は26.5
Nになった。エポキシ系、ゴム系接着剤でも同様な傾向
が見られた。また、蓚酸や他の蓚酸塩でも同様な傾向が
みられた。
Example 6 0.2% by mass of ammonium oxalate was added to water as an additive for supplying 3000 mol / m 3 of sodium chloride and an anion capable of forming a hardly soluble compound by reacting with copper ions. In the dissolved electrolyte, copper foil was used for the electrode on the sample side, and carbon was used for the other electrode.
When etching was performed at a current density of 170 mA / cm 2 for 5 minutes with an alternating current of z, the surface roughness Ra was 8 μm. When a tensile test was performed on a copper foil having a length of 3 mm, a width of 3 mm, and a thickness of 0.1 mm using an alpha cyanoacrylate instant adhesive, the tensile strength was 14.7 N before etching, but the etching was After 26.5
It became N. A similar tendency was observed with epoxy and rubber adhesives. A similar tendency was observed for oxalic acid and other oxalates.

【0039】蓚酸アンモニウムの添加量は、0.01質
量%以上で効果があった。添加剤として更に請求項3に
記載のものを0.01〜5質量%添加しても同様な効果
があった。電解液中の塩についても請求項2に記載の他
ものに変えても大きな差がなかった。また、銅箔の片
面及び両面のどちらでも適用可能であることは言うまで
もないことである。浴温を変えても著しい効果はなかっ
た。また、直流エッチングでも同様な効果が得られた
が、工程管理が難しかった。
The effect was effective when the amount of ammonium oxalate added was 0.01% by mass or more. The same effect was obtained even when 0.01 to 5% by mass of the additive described in claim 3 was further added as an additive. The salt in the electrolyte is also described in claim 2.
There was no big difference when I changed it to the one. It goes without saying that the present invention can be applied to either one side or both sides of the copper foil. Changing the bath temperature had no significant effect. A similar effect was obtained by DC etching, but process control was difficult.

【0040】(実施例7) 3000mol/m3の塩化ナトリウムと、銅イオンと
反応して難溶性の化合物を形成し得る陰イオンを供給す
る添加剤として0.2質量%の蟻酸アンモニウムを水に
溶かした電解液中で、試料側の電極に銅箔、他の電極に
カ−ボンを用い、縦60mm、横60mmの試料で1H
zの交流で170mA/cm2の電流密度で5分間エッ
チングを行なったところ、表面粗さRaは9μmであっ
た。アルファシアノアクリレート系瞬間接着剤を使用し
て縦3mm、横3mm、厚さ0.1mmの銅箔で引っ張
り試験を行なったところ、引っ張り強度は、エッチング
前は14.7Nであったのに、エッチング後は28.4
Nになった。エポキシ系、ゴム系接着剤でも同様な傾向
が見られた。また、蟻酸や他の蟻酸塩でも同様な傾向が
みられた。
Example 7 0.2% by mass of ammonium formate was added to water as an additive to supply 3000 mol / m 3 of sodium chloride and an anion capable of forming a hardly soluble compound by reacting with copper ions. In the dissolved electrolyte, copper foil was used for the electrode on the sample side, and carbon was used for the other electrode.
When etching was performed for 5 minutes at a current density of 170 mA / cm 2 with an alternating current of z, the surface roughness Ra was 9 μm. When a tensile test was performed on a copper foil having a length of 3 mm, a width of 3 mm, and a thickness of 0.1 mm using an alpha cyanoacrylate instant adhesive, the tensile strength was 14.7 N before etching. The rest is 28.4
It became N. A similar tendency was observed with epoxy and rubber adhesives. A similar tendency was observed with formic acid and other formate salts.

【0041】蟻酸アンモニウムの添加量は、0.01質
量%以上で効果があった。添加剤として更に請求項3に
記載のものを0.01〜5質量%添加しても同様な効果
があった。電解液中の塩についても請求項2に記載の他
ものに変えても大きな差がなかった。また、銅箔の片
面及び両面のどちらでも適用可能であることは言うまで
もないことである。浴温を変えても著しい効果はなかっ
た。また、直流エッチングでも同様な効果が得られた
が、工程管理が難しかった。
An effect was obtained when the amount of ammonium formate added was 0.01% by mass or more. The same effect was obtained even when 0.01 to 5% by mass of the additive described in claim 3 was further added as an additive. The salt in the electrolyte is also described in claim 2.
There was no big difference when I changed it to the one. It goes without saying that the present invention can be applied to either one side or both sides of the copper foil. Changing the bath temperature had no significant effect. A similar effect was obtained by DC etching, but process control was difficult.

【0042】(実施例8) 3000mol/m3の塩化ナトリウムと、銅イオンと
反応して難溶性の化合物を形成し得る陰イオンを供給す
る添加剤として0.2質量%のメタ燐酸アンモニウムを
水に溶かした電解液中で、試料側の電極に銅箔、他の電
極にカ−ボンを用い、縦60mm、横60mmの試料で
1Hzの交流で170mA/cm2の電流密度で5分間
エッチングを行なったところ、表面粗さRaは8μmで
あった。アルファシアノアクリレート系瞬間接着剤を使
用して縦3mm、横3mm、厚さ0.1mmの銅箔で引
っ張り試験を行なったところ、引っ張り強度は、エッチ
ング前は14.7Nであったのに、エッチング後は2
7.4Nになった。エポキシ系、ゴム系接着剤でも同様
な傾向が見られた。また、メタ燐酸や他のメタ燐酸塩で
も同様な傾向がみられた。
Example 8 As an additive for supplying 3000 mol / m 3 of sodium chloride and an anion capable of reacting with copper ions to form a hardly soluble compound, 0.2% by mass of ammonium metaphosphate was added to water. Using a copper foil for the electrode on the sample side and carbon for the other electrode, etching was performed for 5 minutes at a current density of 170 mA / cm 2 with an alternating current of 1 Hz using a copper foil for the electrode on the sample side and carbon for the other electrode in the electrolytic solution dissolved in As a result, the surface roughness Ra was 8 μm. When a tensile test was performed on a copper foil having a length of 3 mm, a width of 3 mm, and a thickness of 0.1 mm using an alpha cyanoacrylate instant adhesive, the tensile strength was 14.7 N before etching, but the etching was After 2
It became 7.4N. A similar tendency was observed with epoxy and rubber adhesives. A similar tendency was observed for metaphosphoric acid and other metaphosphates.

【0043】メタ燐酸アンモニウムの添加量は、0.0
1質量%以上で効果があった。添加剤として更に請求項
3に記載のものを0.01〜5質量%添加しても同様な
効果があった。電解液中の塩についても請求項2に記載
の他のものに変えても大きな差がなかった。また、銅箔
の片面及び両面のどちらでも適用可能であることは言う
までもないことである。浴温を変えても著しい効果はな
かった。また、直流エッチングでも同様な効果が得られ
たが、工程管理が難しかった。
The amount of ammonium metaphosphate added is 0.0
There was an effect at 1% by mass or more. The same effect was obtained even when 0.01 to 5% by mass of the additive described in claim 3 was further added as an additive. The salt in the electrolyte is also described in claim 2.
There was no big difference when I changed to another one. It goes without saying that the present invention can be applied to either one side or both sides of the copper foil. Changing the bath temperature had no significant effect. A similar effect was obtained by DC etching, but process control was difficult.

【0044】(実施例9) 3000mol/m3の塩化カリウムと、銅イオンと反
応して難溶性の化合物を形成し得る陰イオンを供給する
添加剤として0.2質量%の蟻酸アンモニウムを水に溶
かした電解液中で、試料側の電極に銅箔、他の電極にカ
−ボンを用い、縦60mm、横60mmの試料で1Hz
の交流で170mA/cm2の電流密度で5分間エッチ
ングを行なったところ、表面粗さRaは9μmであっ
た。アルファシアノアクリレート系瞬間接着剤を使用し
て縦3mm、横3mm、厚さ0.1mmの銅箔で引っ張
り試験を行なったところ、引っ張り強度は、エッチング
前は14.7Nであったのに、エッチング後は34.3
Nになった。エポキシ系、ゴム系接着剤でも同様な傾向
が見られた。また、蟻酸や他の蟻酸塩でも同様な傾向が
みられた。
Example 9 As an additive for supplying 3000 mol / m 3 of potassium chloride and an anion capable of reacting with copper ions to form a hardly soluble compound, 0.2% by mass of ammonium formate was added to water. In the melted electrolytic solution, copper foil was used for the electrode on the sample side, and carbon was used for the other electrode.
When etching was performed at a current density of 170 mA / cm 2 for 5 minutes with an alternating current of, the surface roughness Ra was 9 μm. When a tensile test was performed on a copper foil having a length of 3 mm, a width of 3 mm, and a thickness of 0.1 mm using an alpha cyanoacrylate instant adhesive, the tensile strength was 14.7 N before etching. The rest is 34.3
It became N. A similar tendency was observed with epoxy and rubber adhesives. A similar tendency was observed with formic acid and other formate salts.

【0045】蟻酸アンモニウムの添加量は、0.01質
量%以上で効果があった。添加剤として更に請求項3に
記載のものを0.01〜5質量%添加しても同様な効果
があった。電解液中の塩についても請求項2に記載の他
ものに変えても大きな差がなかった。
The effect was effective when the amount of ammonium formate added was 0.01% by mass or more. The same effect was obtained even when 0.01 to 5% by mass of the additive described in claim 3 was further added as an additive. The salt in the electrolyte is also described in claim 2.
There was no big difference when I changed it to the one.

【0046】(実施例10) 3000mol/m3の塩化リチウムと、銅イオンと反
応して難溶性の化合物を形成し得る陰イオンを供給する
添加剤として0.2質量%のメタ燐酸アンモニウムを水
に溶かした電解液中で、試料側の電極に銅箔、他の電極
にカ−ボンを用い、縦60mm、横60mmの試料で1
Hzの交流で170mA/cm2の電流密度で5分間エ
ッチングを行なったところ、表面粗さRaは8μmであ
った。アルファシアノアクリレート系瞬間接着剤を使用
して縦3mm、横3mm、厚さ0.1mmの銅箔で引っ
張り試験を行なったところ、引っ張り強度は、エッチン
グ前は14.7Nであったのに、エッチング後は26.
5Nになった。エポキシ系、ゴム系接着剤でも同様な傾
向が見られた。また、メタ燐酸や他のメタ燐酸塩でも同
様な傾向がみられた。
Example 10 As an additive for supplying 3000 mol / m 3 of lithium chloride and an anion capable of forming a hardly soluble compound by reacting with copper ions, 0.2% by mass of ammonium metaphosphate was added to water. In an electrolyte dissolved in water, copper foil was used for the electrode on the sample side and carbon was used for the other electrode.
When etching was performed at a current density of 170 mA / cm 2 for 5 minutes with an alternating current of Hz, the surface roughness Ra was 8 μm. When a tensile test was performed on a copper foil having a length of 3 mm, a width of 3 mm, and a thickness of 0.1 mm using an alpha cyanoacrylate instant adhesive, the tensile strength was 14.7 N before etching. After 26.
5N. A similar tendency was observed with epoxy and rubber adhesives. A similar tendency was observed for metaphosphoric acid and other metaphosphates.

【0047】メタ燐酸アンモニウムの添加量は、0.0
1質量%以上で効果があった。添加剤として更に請求項
3に記載のものを0.01〜5質量%添加しても同様な
効果があった。電解液中の塩についても請求項2に記載
の他のものに変えても大きな差がなかった。添加剤とし
ては銅との難溶塩や不溶塩を作るのが好ましく、種々の
添加剤でも同様な効果が期待できることは言うまでもな
い。
The amount of ammonium metaphosphate added is 0.0
There was an effect at 1% by mass or more. The same effect was obtained even when 0.01 to 5% by mass of the additive described in claim 3 was further added as an additive. The salt in the electrolyte is also described in claim 2.
There was no big difference when I changed to another one. As an additive, it is preferable to form a hardly soluble salt or an insoluble salt with copper, and it goes without saying that a similar effect can be expected with various additives.

【0048】(実施例11) 3000mol/m3の臭化カリウムと、銅イオンと反
応して難溶性の化合物を形成し得る陰イオンを供給する
添加剤として0.2質量%の蟻酸アンモニウムを水に溶
かした電解液中で、試料側の電極に銅箔、他の電極にカ
−ボンを用い、縦60mm、横60mmの試料で1Hz
の交流で170mA/cm2の電流密度で5分間エッチ
ングを行なったところ、表面粗さRaは9μmであっ
た。アルファシアノアクリレート系瞬間接着剤を使用し
て縦3mm、横3mm、厚さ0.1mmの銅箔で引っ張
り試験を行なったところ、引っ張り強度は、エッチング
前は14.7Nであったのに、エッチング後は31.4
Nになった。エポキシ系、ゴム系接着剤でも同様な傾向
が見られた。また、蟻酸や他の蟻酸塩でも同様な傾向が
みられた。
Example 11 As an additive for supplying 3000 mol / m 3 of potassium bromide and an anion capable of forming a hardly soluble compound by reacting with copper ions, 0.2% by mass of ammonium formate was added to water. In an electrolytic solution dissolved in water, copper foil was used for the electrode on the sample side, and carbon was used for the other electrode.
When etching was performed at a current density of 170 mA / cm 2 for 5 minutes with an alternating current of, the surface roughness Ra was 9 μm. When a tensile test was performed on a copper foil having a length of 3 mm, a width of 3 mm, and a thickness of 0.1 mm using an alpha cyanoacrylate instant adhesive, the tensile strength was 14.7 N before etching. The rest is 31.4
It became N. A similar tendency was observed with epoxy and rubber adhesives. A similar tendency was observed with formic acid and other formate salts.

【0049】蟻酸アンモニウムの添加量は、0.01質
量%以上で効果があった。添加剤として更に請求項3に
記載のものを0.01〜5質量%添加しても同様な効果
があった。電解液中の塩についても請求項2に記載の他
ものに変えても大きな差がなかった。
The effect was effective when the amount of ammonium formate added was 0.01% by mass or more. The same effect was obtained even when 0.01 to 5% by mass of the additive described in claim 3 was further added as an additive. The salt in the electrolyte is also described in claim 2.
There was no big difference when I changed it to the one.

【0050】(実施例12) 3000mol/m3の臭化カリウムと、銅イオンと反
応して難溶性の化合物を形成し得る陰イオンを供給する
添加剤として0.01質量%の蟻酸アンモニウムを水に
溶かした電解液中で、試料側の電極に銅箔、他の電極に
カ−ボンを用い、縦60mm、横60mmの試料で1H
zの交流で170mA/cm2の電流密度で5分間エッ
チングを行なったところ、表面粗さRaは6μmであっ
た。アルファシアノアクリレート系瞬間接着剤を使用し
て縦3mm、横3mm、厚さ0.1mmの銅箔で引っ張
り試験を行なったところ、引っ張り強度は、エッチング
前は14.7Nであったのに、エッチング後は22.5
Nになった。エポキシ系、ゴム系接着剤でも同様な傾向
が見られた。また、蟻酸や他の蟻酸塩でも同様な傾向が
みられた。電解液中の塩についても請求項2に記載の他
ものに変えても大きな差がなかった。
Example 12 As an additive for supplying 3000 mol / m 3 of potassium bromide and an anion capable of forming a hardly soluble compound by reacting with copper ions, 0.01% by mass of ammonium formate was added to water. In an electrolytic solution dissolved in water, copper foil was used for the electrode on the sample side, and carbon was used for the other electrode.
When etching was performed for 5 minutes at a current density of 170 mA / cm 2 with an alternating current of z, the surface roughness Ra was 6 μm. When a tensile test was performed on a copper foil having a length of 3 mm, a width of 3 mm, and a thickness of 0.1 mm using an alpha cyanoacrylate instant adhesive, the tensile strength was 14.7 N before etching, but the etching was After 22.5
It became N. A similar tendency was observed with epoxy and rubber adhesives. A similar tendency was observed with formic acid and other formate salts. The salt in the electrolyte is also described in claim 2.
There was no big difference when I changed it to the one.

【0051】(実施例13) 3000mol/m3の臭化カリウムと、銅イオンと反
応して難溶性の化合物を形成し得る陰イオンを供給する
添加剤として0.001質量%の蟻酸アンモニウムを水
に溶かした電解液中で、試料側の電極に銅箔、他の電極
にカ−ボンを用い、縦60mm、横60mmの試料で1
Hzの交流で170mA/cm2の電流密度で5分間エ
ッチングを行なったところ、表面粗さRaは1.5μm
であった。アルファシアノアクリレート系瞬間接着剤を
使用して縦3mm、横3mm、厚さ0.1mmの銅箔で
引っ張り試験を行なったところ、引っ張り強度は、エッ
チング前は14.7Nであったのに、エッチング後は1
5.7Nになり、大きな効果はなかった。エポキシ系、
ゴム系接着剤でも同様な傾向が見られた。また、蟻酸や
他の蟻酸塩でも同様な傾向がみられた。電解液中の塩に
ついても請求項2に記載の他のものに変えても大きな差
がなかった。また、電解液や添加剤とも濃度は飽和溶液
で行なうのが望ましいが、沈澱物があってもさしつかえ
はない。
Example 13 As an additive for supplying 3000 mol / m 3 of potassium bromide and an anion capable of forming a hardly soluble compound by reacting with copper ion, 0.001% by mass of ammonium formate was added to water. In an electrolyte dissolved in water, copper foil was used for the electrode on the sample side and carbon was used for the other electrode.
When etching was performed for 5 minutes at a current density of 170 mA / cm 2 with an alternating current of Hz, the surface roughness Ra was 1.5 μm.
Met. When a tensile test was performed on a copper foil having a length of 3 mm, a width of 3 mm, and a thickness of 0.1 mm using an alpha cyanoacrylate instant adhesive, the tensile strength was 14.7 N before etching, but the etching was After 1
5.7 N, and there was no significant effect. Epoxy,
A similar tendency was observed for the rubber adhesive. A similar tendency was observed with formic acid and other formate salts. There was no significant difference when the salt in the electrolyte was changed to another one described in claim 2 . It is desirable that the concentration of both the electrolyte and the additive be a saturated solution, but there is no problem even if a precipitate is present.

【0052】(実施例14) 1mol/m3の臭化カリウムと、銅イオンと反応して
難溶性の化合物を形成し得る陰イオンを供給する添加剤
として0.05質量%の蟻酸アンモニウムを水に溶かし
た電解液中で、試料側の電極に銅箔、他の電極にカ−ボ
ンを用い、縦60mm、横60mmの試料で1Hzの交
流で170mA/cm2の電流密度で5分間エッチング
を行なったところ、表面粗さRaは5μmであった。ア
ルファシアノアクリレート系瞬間接着剤を使用して縦3
mm、横3mm、厚さ0.1mmの銅箔で引っ張り試験
を行なったところ、引っ張り強度は、エッチング前は1
4.7Nであったのに、エッチング後は22.5Nにな
った。エポキシ系、ゴム系接着剤でも同様な傾向が見ら
れた。また、蟻酸や他の蟻酸塩でも同様な傾向がみられ
た。
Example 14 As an additive for supplying 1 mol / m 3 of potassium bromide and an anion capable of forming a hardly soluble compound by reacting with copper ions, 0.05% by mass of ammonium formate was added to water. Using a copper foil for the electrode on the sample side and carbon for the other electrode, etching was performed for 5 minutes at a current density of 170 mA / cm 2 with an alternating current of 1 Hz using a copper foil for the electrode on the sample side and carbon for the other electrode in the electrolytic solution dissolved in As a result, the surface roughness Ra was 5 μm. Vertical 3 using alpha cyanoacrylate based instant adhesive
When a tensile test was performed using a copper foil having a thickness of 0.1 mm, a width of 3 mm and a thickness of 0.1 mm, the tensile strength was 1 before etching.
Although it was 4.7N, it became 22.5N after etching. A similar tendency was observed with epoxy and rubber adhesives. A similar tendency was observed with formic acid and other formate salts.

【0053】蟻酸アンモニウムの添加量は、0.01質
量%以上で効果があった。添加剤として更に請求項3に
記載のものを0.01〜5質量%添加しても同様な効果
があった。電解液中の塩も沃化カリウム、パラトルエン
スルホンソーダ等や過塩素酸ソーダ等に変えても大きな
差がなかった。
The effect was effective when the amount of ammonium formate added was 0.01% by mass or more. The same effect was obtained even when 0.01 to 5% by mass of the additive described in claim 3 was further added as an additive. Salts in the electrolyte are also potassium iodide, paratoluene
Even if it is changed to sulfone soda, sodium perchlorate, etc.
There was no difference.

【0054】(実施例15) 0.1mol/m3の臭化カリウムと、銅イオンと反応
して難溶性の化合物を形成し得る陰イオンを供給する添
加剤として0.05質量%の蟻酸アンモニウムを水に溶
かした電解液中で、試料側の電極に銅箔、他の電極にカ
−ボンを用い、縦60mm、横60mmの試料で1Hz
の交流で17mA/cm2の電流密度で50分間エッチ
ングを行なったところ、表面粗さRaは1.7μmであ
った。アルファシアノアクリレート系瞬間接着剤を使用
して縦3mm、横3mm、厚さ0.1mmの銅箔で引っ
張り試験を行なったところ、引っ張り強度は、エッチン
グ前は14.7Nであったのに、エッチング後は16.
7Nになり、大きな効果はなかった。エポキシ系、ゴム
系接着剤でも同様な傾向が見られた。また、蟻酸や他の
蟻酸塩でも同様な傾向がみられた。電解液中の塩も請求
項2に記載の他のものに変えても大きな差がなかった。
また、銅箔の片面及び両面のどちらでも適用可能である
ことは言うまでもないことである。浴温を変えても著し
い効果はなかった。また、直流エッチングでも同様な傾
向が得られた。
Example 15 0.05% by mass of ammonium formate as an additive for supplying 0.1 mol / m 3 of potassium bromide and an anion capable of reacting with copper ions to form a hardly soluble compound In an electrolytic solution of water in water, using copper foil for the electrode on the sample side and carbon for the other electrode, and 1 Hz for a sample 60 mm long and 60 mm wide.
When etching was performed at a current density of 17 mA / cm 2 for 50 minutes with an alternating current of, the surface roughness Ra was 1.7 μm. When a tensile test was performed on a copper foil having a length of 3 mm, a width of 3 mm, and a thickness of 0.1 mm using an alpha cyanoacrylate instant adhesive, the tensile strength was 14.7 N before etching, but the etching was After 16.
7N, no significant effect. A similar tendency was observed with epoxy and rubber adhesives. A similar tendency was observed with formic acid and other formate salts. Request for salt in electrolyte
No significant difference was found even when the composition was changed to another one described in item 2 .
It goes without saying that the present invention can be applied to either one side or both sides of the copper foil. Changing the bath temperature had no significant effect. A similar tendency was obtained in DC etching.

【0055】(実施例16) 3000mol/m3の臭化カリウムと、銅イオンと反
応して難溶性の化合物を形成し得る陰イオンを供給する
添加剤として0.2質量%のアンモニア水を添加した電
解液中で、試料側の電極に銅箔、他の電極にカ−ボンを
用い、縦60mm、横60mmの試料で1Hzの交流で
170mA/cm2の電流密度で5分間エッチングを行
なったところ、表面粗さRaは9μmであった。アルフ
ァシアノアクリレート系瞬間接着剤を使用して縦3m
m、横3mm、厚さ0.1mmの銅箔で引っ張り試験を
行なったところ、引っ張り強度は、エッチング前は1
4.7Nであったのに、エッチング後は26.5Nにな
った。エポキシ系、ゴム系接着剤でも同様な傾向が見ら
れた。
Example 16 0.2% by mass of aqueous ammonia was added as an additive for supplying 3000 mol / m 3 of potassium bromide and an anion capable of forming a hardly soluble compound by reacting with copper ions. In the prepared electrolyte, a sample of 60 mm in length and 60 mm in width was etched at a current density of 170 mA / cm 2 at an alternating current of 1 Hz for 5 minutes using copper foil as an electrode on the sample side and carbon as another electrode. However, the surface roughness Ra was 9 μm. 3m long using alpha cyanoacrylate instant adhesive
When a tensile test was performed using a copper foil having a width of 3 mm and a width of 3 mm and a thickness of 0.1 mm, the tensile strength was 1 before etching.
Although it was 4.7N, it became 26.5N after etching. A similar tendency was observed with epoxy and rubber adhesives.

【0056】添加剤として更に請求項3に記載のものを
0.01〜5質量%添加しても同様な効果があった。電
解液中の塩についても請求項2に記載の他のものに変え
ても大きな差がなかった。また、銅箔の片面及び両面の
どちらでも適用可能であることは言うまでもないことで
ある。浴温を変えても著しい効果はなかった。また、直
流エッチングでも同様な効果が得られたが、工程管理が
難しかった。エッチング時間は1時間でもほぼ同様な結
果を得た。アンモニア水の濃度は、0.01質量%から
5質量%で効果があった。
Similar effects were obtained by adding 0.01 to 5% by mass of the additive described in claim 3 as an additive. There was no significant difference when the salt in the electrolyte was changed to another one described in claim 2 . It goes without saying that the present invention can be applied to either one side or both sides of the copper foil. Changing the bath temperature had no significant effect. A similar effect was obtained by DC etching, but process control was difficult. Almost the same result was obtained even when the etching time was 1 hour. The concentration of ammonia water was effective at 0.01 to 5% by mass.

【0057】(実施例17) 3000mol/m3の臭化カリウムと、銅イオンと反
応して難溶性の化合物を形成し得る陰イオンを供給する
添加剤として炭酸ガスを5dm3/分でバブリングした
電解液中で、試料側の電極に銅箔、他の電極にカ−ボン
を用い、縦60mm、横60mmの試料で1Hzの交流
で170mA/cm2の電流密度で5分間エッチングを
行なったところ、表面粗さRaは9μmであった。アル
ファシアノアクリレート系瞬間接着剤を使用して縦3m
m、横3mm、厚さ0.1mmの銅箔で引っ張り試験を
行なったところ、引っ張り強度は、エッチング前は1
4.7Nであったのに、エッチング後は26.5Nにな
った。エポキシ系、ゴム系接着剤でも同様な傾向が見ら
れた。
Example 17 Carbon dioxide gas was bubbled at 5 dm 3 / min as an additive for supplying 3000 mol / m 3 of potassium bromide and anions capable of forming a hardly soluble compound by reacting with copper ions. A sample of 60 mm long and 60 mm wide was etched with a current of 170 mA / cm 2 at an alternating current of 1 Hz for 5 minutes using a copper foil for the electrode on the sample side and carbon for the other electrode in the electrolytic solution. And the surface roughness Ra was 9 μm. 3m long using alpha cyanoacrylate instant adhesive
When a tensile test was performed using a copper foil having a width of 3 mm and a width of 3 mm and a thickness of 0.1 mm, the tensile strength was 1 before etching.
Although it was 4.7N, it became 26.5N after etching. A similar tendency was observed with epoxy and rubber adhesives.

【0058】添加剤として更に請求項3に記載のものを
0.01〜5質量%添加しても同様な効果があった。電
解液中の塩についても請求項2に記載の他のものに変え
ても大きな差がなかった。また、銅箔の片面及び両面の
どちらでも適用可能であることは言うまでもないことで
ある。浴温を変えても著しい効果はなかった。また、直
流エッチングでも同様な効果が得られたが、工程管理が
難しかった。炭酸ガスの流量は、0.01dm3/分か
ら効果があった。
The same effect was obtained by adding 0.01 to 5% by mass of the additive described in claim 3 as an additive. There was no significant difference when the salt in the electrolyte was changed to another one described in claim 2 . It goes without saying that the present invention can be applied to either one side or both sides of the copper foil. Changing the bath temperature had no significant effect. A similar effect was obtained by DC etching, but process control was difficult. The carbon dioxide gas flow rate was effective from 0.01 dm 3 / min.

【0059】(実施例18) 図2に示すように実施例1〜17でエッチングした多角
柱状の表面部を有する銅箔を、再エッチングすることに
より銅箔の表面部の立体形状が多角台状又は多角錐状と
なり、耐圧が向上することによりコンデンサー電極の片
側とすることができ、コンデンサーの内蔵が可能とな
る。
Example 18 As shown in FIG. 2, the copper foil having the polygonal columnar surface portion etched in Examples 1 to 17 was re-etched to change the three-dimensional shape of the copper foil surface portion into a polygonal trapezoidal shape. Or, it becomes a polygonal pyramid, and can withstand one side of the capacitor electrode by improving the withstand voltage, so that the capacitor can be built in.

【0060】3000mol/m3のHClの電解液中
で、試料側の電極に銅箔、他の電極にカ−ボンを用い、
縦60mm、横60mmの試料で1Hzの交流で170
mA/cm2の電流密度で30秒間再エッチングを行な
ったところ、表面粗さRaは6μmであった。アルファ
シアノアクリレート系瞬間接着剤を使用して縦3mm、
横3mm、厚さ0.1mmの銅箔で引っ張り試験を行な
ったところ、引っ張り強度は、エッチング前は14.7
Nであったのに、エッチング後は19.6Nになった。
エポキシ系、ゴム系接着剤でも同様な傾向が見られた。
In a 3000 mol / m 3 HCl electrolytic solution, a copper foil was used for the electrode on the sample side and carbon was used for the other electrode.
A sample of 60 mm length and 60 mm width is 170
When re-etching was performed at a current density of mA / cm 2 for 30 seconds, the surface roughness Ra was 6 μm. 3mm long using alpha cyanoacrylate instant adhesive,
When a tensile test was performed on a copper foil having a width of 3 mm and a thickness of 0.1 mm, the tensile strength was 14.7 before etching.
Although it was N, it became 19.6N after etching.
A similar tendency was observed with epoxy and rubber adhesives.

【0061】また、塩酸以外にも硫酸、過塩素酸、スル
ホン酸類又は硝酸等の水に可溶性の酸や、苛性ソーダ又
は苛性カリ等の水に可溶性のアルカリも効果があった。
硝酸等の銅をエッチング可能な酸類、塩化第二鉄等の塩
類や過酸化水素等の酸化剤を添加した酸類、塩類又はア
ルカリ類も効果があった。
In addition to hydrochloric acid, water-soluble acids such as sulfuric acid, perchloric acid, sulfonic acids and nitric acid, and water-soluble alkalis such as caustic soda and caustic potash were also effective.
Acids capable of etching copper such as nitric acid, salts such as ferric chloride, and acids, salts or alkalis to which an oxidizing agent such as hydrogen peroxide is added have also been effective.

【0062】電解液中の塩を請求項2に記載の他のもの
に変えると多角台状や多角錐状よりも多角柱状のエッチ
ングがさらに深まる傾向にあった。しかし、電解液中の
塩に請求項2に記載の他のものを使用しても、請求項3
に記載の添加剤である炭酸水素アンモニウムを多くても
0.0090質量%以下の添加に抑えれば多角柱状のエ
ッチングが深まることはなかった。これは、請求項3に
記載された他の添加剤についても同様であった。
When the salt in the electrolytic solution was changed to the one described in claim 2, the polygonal column-shaped etching tended to be deeper than the polygonal trapezoidal or polygonal pyramid. However, even if another salt described in claim 2 is used as the salt in the electrolytic solution, it is also possible to use a salt according to claim 3
If the addition of at most 0.0090% by mass of ammonium bicarbonate as an additive described in (1) was suppressed, the polygonal column-shaped etching did not deepen. This was the same for the other additives described in claim 3.

【0063】この中性塩を使用した場合、沈澱物を取り
除くために酸やアルカリで処理やエッチングをしてやれ
ば良い。銅箔の片面及び両面のどちらでも適用可能であ
ることは言うまでもないことである。浴温を変えても著
しい効果はなかった。また、直流エッチングでも同様な
効果が得られたが、工程管理が難しかった。また、3回
以上のエッチングによれば、さらに細かいエッチングが
可能であることは言うまでもない。
When this neutral salt is used, it may be treated or etched with an acid or alkali to remove the precipitate. It goes without saying that either one side or both sides of the copper foil can be applied. Changing the bath temperature had no significant effect. A similar effect was obtained by DC etching, but process control was difficult. Needless to say, the finer etching can be performed by performing the etching three or more times.

【0064】次に、エッチングした銅箔表面の断面を電
子顕微鏡で観察したところ、図3に示すとおり、多角台
状の凹凸が観察された。
Next, when the cross section of the etched copper foil surface was observed with an electron microscope, as shown in FIG. 3, trapezoidal polygonal irregularities were observed.

【0065】(実施例19) 実施例1〜18でエッチングした多角柱状の表面部を有
する銅箔を、再エッチングすることにより銅箔の表面部
の立体形状が多角台状又は多角錐状なり、耐圧が向上す
ることによりコンデンサー電極の片側とすることがで
き、コンデンサーの内蔵が可能となる。
(Example 19) The copper foil having the polygonal columnar surface portion etched in Examples 1 to 18 was re-etched, so that the three-dimensional shape of the copper foil surface portion became a polygonal trapezoidal shape or a polygonal pyramid shape. By improving the withstand voltage, one side of the capacitor electrode can be provided, and the capacitor can be built in.

【0066】エッチング前の縦60mm、横60mmの
試料で縦10mm、横10mm角のコンデンサーを作る
ために1μmの膜厚にポリエチレンテレフタレート(P
ET)を蒸着した。他の電極としては樹脂混合銀の塗
布、ポリピロールやチオフェンの電解重合や蒸着で作成
して数pFを得た。実施例1及び実施例18の組み合わ
せで容量はエッチング前に比して5倍の十数pFになっ
た。
In order to form a 10 mm square by 10 mm square capacitor with a sample of 60 mm length and 60 mm width before etching, polyethylene terephthalate (P
ET) was deposited. Other electrodes were prepared by applying resin-mixed silver, electrolytic polymerization of polypyrrole and thiophene and vapor deposition to obtain several pF. In the combination of Example 1 and Example 18, the capacitance was ten and several pF, which is five times that before etching.

【0067】[0067]

【発明の効果】以上のように粗面化した銅を製造するた
めに電解液中で電解エッチングを行なうことにより、破
断面が多角柱状や多角台状や多角錐状になるような粗面
化面を得ることが可能となった。これにより安価に粗面
化銅を得ることができ、表面積の大きいコンデンサーの
内蔵も可能となった。また、高周波でも遅延が少なくな
り、樹脂基板との密着性のよい多層プリント基板やPT
C特性電流保護素子を安価に製造することが可能となっ
た。
According to the present invention, by performing electrolytic etching in an electrolytic solution to produce copper having a roughened surface as described above, a roughened surface having a fractured column shape, a polygonal trapezoidal shape, or a polygonal pyramid shape is obtained. It became possible to obtain a surface. As a result, roughened copper can be obtained at low cost, and a capacitor with a large surface area can be built in. In addition, the delay is reduced even at high frequencies, and the multilayer printed circuit board or PT
It has become possible to manufacture the C characteristic current protection element at low cost.

【図面の簡単な説明】[Brief description of the drawings]

【図1】従来の粗面化めっきを行なった銅箔表面の模式
図である。
FIG. 1 is a schematic view of a copper foil surface subjected to conventional roughening plating.

【図2】本発明によりエッチングを行なった銅箔表面の
模式図である。
FIG. 2 is a schematic view of a copper foil surface etched according to the present invention.

【図3】本発明により再エッチングを行なった銅箔表面
の模式図である。
FIG. 3 is a schematic view of a copper foil surface re-etched according to the present invention.

【図4】本発明で用いるエッチング槽の模式図である。FIG. 4 is a schematic view of an etching tank used in the present invention.

【符号の説明】[Explanation of symbols]

1 電極 2 他の電極(試料) 3 電解液 4 電源 1 electrode 2 other electrode (sample) 3 electrolyte 4 power supply

フロントページの続き (72)発明者 棚橋 正和 大阪府門真市大字門真1006番地 松下電 器産業株式会社内 (72)発明者 越後 文雄 大阪府門真市大字門真1006番地 松下電 器産業株式会社内 (56)参考文献 特開2000−204500(JP,A) (58)調査した分野(Int.Cl.7,DB名) C25F 3/02 H05K 1/03 630 H05K 3/38 Continuing on the front page (72) Inventor Masakazu Tanahashi 1006 Kazuma Kadoma, Kadoma City, Osaka Prefecture Inside Matsushita Electric Industrial Co., Ltd. ) References JP-A-2000-204500 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) C25F 3/02 H05K 1/03 630 H05K 3/38

Claims (10)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 表層部に高さ1〜20μmの凹凸部を設
けた銅箔又は銅板であって、前記表層部における前記凹
凸部の占める空間密度が10%以上、90%以下である
ことを特徴とする表面粗化銅。
1. A copper foil or a copper plate having an uneven portion having a height of 1 to 20 μm on a surface layer portion, wherein a space density occupied by the uneven portion in the surface layer portion is 10% or more and 90% or less. Characterized surface roughened copper.
【請求項2】 塩化ナトリウム、塩化カリウム、硝酸ナ
トリウム、硝酸カリウム、硫酸マグネシウム、炭酸ナト
リウム及び炭酸水素ナトリウムからなる群から選択され
た少なくとも1種類の塩と、銅イオンと反応して難溶性
の化合物を形成し得る陰イオンとを含む電解液中で銅箔
又は銅板の表面をエッチングして得た表面粗化銅を、前
記陰イオンの添加量が0.0090質量%以下である前
記電解液中で再度エッチングを行なうことを特徴とする
表面粗化銅の製造方法。
2. At least one salt selected from the group consisting of sodium chloride, potassium chloride, sodium nitrate, potassium nitrate, magnesium sulfate, sodium carbonate and sodium bicarbonate reacts with copper ions to be hardly soluble.
Surface roughened copper obtained by etching the surface of a copper foil or a copper plate in an electrolytic solution containing an anion capable of forming a compound of
Before the addition amount of the anion is 0.0090% by mass or less
A method for producing surface roughened copper, wherein etching is performed again in the electrolytic solution .
【請求項3】 前記陰イオンが、炭酸イオン、フッ素イ
オン、炭酸水素イオン、水酸イオン、燐酸イオン、ピロ
燐酸イオン、ヨード酸イオン、蓚酸イオン、蟻酸イオン
及びメタ燐酸イオンからなる群から選択された少なくと
も1種類である請求項2に記載の表面粗化銅の製造方
法。
3. The anion is selected from the group consisting of carbonate ion, fluorine ion, hydrogen carbonate ion, hydroxide ion, phosphate ion, pyrophosphate ion, iodoate ion, oxalate ion, formate ion and metaphosphate ion. 3. The method for producing surface roughened copper according to claim 2, wherein the method is at least one kind.
【請求項4】 前記エッチングが、交流エッチングであ
る請求項2に記載の表面粗化銅の製造方法。
4. The method according to claim 2, wherein the etching is AC etching.
【請求項5】 前記交流エッチングに用いる交流の周波
数が、50Hz以下である請求項4に記載の表面粗化銅
の製造方法。
5. The method according to claim 4, wherein an AC frequency used for the AC etching is 50 Hz or less.
【請求項6】 前記電解液に添加剤として、バブリング
による炭酸ガス又はドライアイスの小片を添加する請求
項2〜5のいずれかに記載の表面粗化銅の製造方法。
6. The method for producing a surface-roughened copper according to claim 2, wherein a small piece of carbon dioxide gas or dry ice by bubbling is added as an additive to the electrolytic solution.
【請求項7】 請求項2〜のいずれかに記載の方法に
より製造した表面粗化銅を、酸性又はアルカリ性の溶液
中で処理又はエッチングを行なう表面粗化銅の製造方
法。
7. The method of claim 2 the surface roughness of copper was prepared by the method of any one of 6, the manufacturing method of the surface roughening copper performing processing or etching with acid or alkaline solutions.
【請求項8】 請求項1に記載の表面粗化銅を導電体と
して備えたプリント基板。
8. A printed circuit board comprising the surface-roughened copper according to claim 1 as a conductor.
【請求項9】 請求項2〜のいずれかに記載の方法に
より製造した表面粗化銅を導電体として備えたプリント
基板。
9. A printed circuit board with a surface roughness of copper was prepared by the method of any of claims 2-7 as a conductor.
【請求項10】 請求項又はのいずれかに記載のプ
リント基板にコンデンサーを内蔵させたプリント基板。
10. A printed circuit board which has incorporated a condenser to a printed circuit board according to claim 8 or 9.
JP2000163215A 2000-05-31 2000-05-31 Surface roughened copper, method for producing the same, and printed circuit board using the same Expired - Fee Related JP3269818B2 (en)

Priority Applications (1)

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JP2000163215A JP3269818B2 (en) 2000-05-31 2000-05-31 Surface roughened copper, method for producing the same, and printed circuit board using the same

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JP3269818B2 true JP3269818B2 (en) 2002-04-02

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4492806B2 (en) * 2005-07-08 2010-06-30 日本製箔株式会社 Flexible printed wiring board
JP5448710B2 (en) * 2009-10-19 2014-03-19 古河電気工業株式会社 Method and apparatus for producing surface roughened copper sheet
CN114641141A (en) * 2020-12-16 2022-06-17 深南电路股份有限公司 Manufacturing method of circuit board, circuit board and electronic device
CN114438579B (en) * 2021-12-22 2022-12-09 中国电子产品可靠性与环境试验研究所((工业和信息化部电子第五研究所)(中国赛宝实验室)) Copper foil roughening liquid, single-side roughened copper foil, preparation method of single-side roughened copper foil, current collector and battery

Also Published As

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