JP3193696B2 - Cleaning equipment - Google Patents
Cleaning equipmentInfo
- Publication number
- JP3193696B2 JP3193696B2 JP09516399A JP9516399A JP3193696B2 JP 3193696 B2 JP3193696 B2 JP 3193696B2 JP 09516399 A JP09516399 A JP 09516399A JP 9516399 A JP9516399 A JP 9516399A JP 3193696 B2 JP3193696 B2 JP 3193696B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- tank
- steam
- liquid
- immersion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、浸漬洗浄槽と蒸気
洗浄槽とからなる洗浄装置に関し、特に、連続的な運転
が可能であって、しかも、洗浄性能の向上した洗浄装置
に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus comprising a immersion cleaning tank and a steam cleaning tank, and more particularly to a cleaning apparatus which can be operated continuously and has improved cleaning performance. .
【０００２】[0002]
【発明が解決しようとする課題】本出願人は、高沸点溶
剤や可燃性溶剤を使用できる洗浄装置について提案して
いる（平成７年特許願３２２２８６号、平成８年特許願
２４１２６３号）。この洗浄装置は、１つの洗浄槽によ
って、超音波洗浄と蒸気洗浄と真空乾燥とを実現する点
では優れているが、浸漬洗浄槽と蒸気洗浄槽とを別に設
ける用途も多く、この点を踏まえた装置の完成が望まれ
るところであった。ここで、浸漬洗浄槽と蒸気洗浄槽と
を別に設けたものについて、各社から各種の提案がされ
ているが、蒸気洗浄槽では、仕上げ洗浄として高純度の
洗浄蒸気による洗浄が望まれるところでありこの点の対
策が望まれていた。この発明は、上記の実情に鑑みてな
されたものであって、高性能の洗浄動作を連続的に行う
ことのできる洗浄装置を提供することを課題とする。The present applicant has proposed a cleaning apparatus which can use a high boiling point solvent or a flammable solvent (Japanese Patent Application No. 322286/1995 and Japanese Patent Application No. 241263/1996). Although this cleaning device is excellent in realizing ultrasonic cleaning, steam cleaning and vacuum drying by one cleaning tank, it is often used to separately provide an immersion cleaning tank and a steam cleaning tank. The completion of the device was desired. Here, various proposals have been made by companies for separately providing an immersion cleaning tank and a steam cleaning tank. In the steam cleaning tank, cleaning with high-purity cleaning steam is desired as a finish cleaning. Point measures were desired. The present invention has been made in view of the above situation, and has as its object to provide a cleaning apparatus capable of continuously performing a high-performance cleaning operation.
【０００３】[0003]
【課題を解決するための手段】上記の目的を達成するた
め、本発明は、複数段からなる浸漬洗浄槽（１ａ〜１
ｃ）と、必要に応じて減圧状態にできる蒸気洗浄槽
（２）とによって、浸漬洗浄と蒸気洗浄と真空乾燥とか
らなる洗浄動作を連続的に実現する洗浄装置（ＥＵ）で
あって、初段の浸漬洗浄槽（１ａ）で使用された洗浄液
を受けるダーティタンク（３）と、加熱機構（４ａ）を
備えると共に前記ダーティタンクからの洗浄液を受ける
蒸気発生槽（４）と、前記蒸気発生槽からの洗浄蒸気を
受ける凝縮機構（５，６）と、蒸留再生された洗浄液を
加温状態で貯留する加温槽（５）と、前記蒸気発生槽を
連続的に減圧状態に維持する第１減圧機構（７）と、前
記加温槽からの洗浄液を受け、内部の加熱機構によって
瞬間的に洗浄蒸気を生成する蒸発塔（８）と、前記蒸気
洗浄槽と前記蒸発塔とを一体的に所定の減圧状態にする
第２減圧機構（ＶＰ）とを備え、前記凝縮機構で蒸留再
生された洗浄液は、最終段の浸漬洗浄槽（１ｃ）に供給
され、順次その前段の浸漬洗浄槽で使用されるようにな
っており、蒸留再生された洗浄液を、再度、前記蒸発塔
において蒸発させて洗浄蒸気を生成し蒸気洗浄を行うよ
うにしている。In order to achieve the above object, the present invention provides an immersion washing tank (1a to 1a) having a plurality of stages.
(c) and a steam cleaning tank (2) that can be reduced in pressure as required, a cleaning device (EU) that continuously realizes a cleaning operation including immersion cleaning, steam cleaning, and vacuum drying, A dirty tank (3) for receiving the cleaning liquid used in the immersion cleaning tank (1a), a steam generating tank (4) including a heating mechanism (4a) and receiving the cleaning liquid from the dirty tank, A condensing mechanism (5, 6) for receiving the cleaning steam, a heating tank (5) for storing the distilled and regenerated cleaning liquid in a heated state, and a first depressurization for continuously maintaining the steam generating tank in a depressurized state. A mechanism (7), an evaporating tower (8) that receives the washing liquid from the heating tank and instantaneously generates washing steam by an internal heating mechanism, and integrally forms the evaporating tower and the evaporating tower with a predetermined number. Second pressure reducing mechanism (VP) for reducing pressure Comprising a distillation again at the condensing mechanism
The generated cleaning liquid is supplied to the final immersion cleaning tank (1c).
To be used in the preceding immersion washing tank.
The cleaning liquid regenerated by distillation is again evaporated in the evaporating tower to generate cleaning steam and perform steam cleaning.
【０００４】[0004]
【発明の実施の形態】以下、実施例に基づいて、この発
明を更に詳細に説明する。図１は、実施例に係る洗浄装
置ＥＵの概略構成図を図示したものである。この洗浄装
置ＥＵは、被洗浄物について順次に超音波洗浄などを行
うｎ個の浸漬洗浄槽１ａ〜１ｃと、浸漬洗浄を終えた被
洗浄物について、最終の蒸気洗浄を行い、その後、真空
乾燥させる蒸気洗浄槽２とを中心に構成されている。被
洗浄物は、浸漬洗浄槽１ａ→１ｂ→１ｃの順番に移送さ
れて洗浄されるので、洗浄液は、浸漬洗浄槽１ｃ→１ｂ
→１ａの順番に使用され、使用後の洗浄液は、ダーティ
タンク３に回収されるようになっている。なお、洗浄液
の種類は、特に限定されないが、引火性溶剤や高沸点溶
剤を用いることができ、典型的には、可燃性液体である
炭化水素溶剤を用いる。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in more detail based on embodiments. FIG. 1 illustrates a schematic configuration diagram of a cleaning apparatus EU according to the embodiment. The cleaning apparatus EU includes n immersion cleaning tanks 1a to 1c for sequentially performing ultrasonic cleaning and the like on the object to be cleaned, and performs final steam cleaning on the object to be cleaned after the immersion cleaning, and then performs vacuum drying. And a steam cleaning tank 2. Since the object to be cleaned is transferred and cleaned in the order of the immersion cleaning tanks 1a → 1b → 1c, the cleaning liquid is transferred to the immersion cleaning tank 1c → 1b.
The used washing liquid is collected in the dirty tank 3 in the order of 1a. The type of the cleaning liquid is not particularly limited, but a flammable solvent or a high-boiling solvent can be used. Typically, a flammable liquid hydrocarbon solvent is used.
【０００５】ダーティタンク３に回収された洗浄液は、
加熱機構４ａを備える蒸気発生槽４において減圧状態下
で沸騰された後、加温槽５→第１凝縮器６→エゼクター
７の経路において蒸留再生され、蒸留された再生洗浄液
は、浸漬洗浄槽１ｃに供給されるようになっている。な
お、加温槽５の上部には冷却機構（不図示）が設けられ
ており、蒸気発生槽４からの洗浄蒸気が蒸留再生され
る。一方、加温槽５の下部には、加温機構５ａが設けら
れており、貯留された洗浄液は、沸騰しない程度に加温
されている。The cleaning liquid collected in the dirty tank 3 is
After being boiled under reduced pressure in the steam generation tank 4 provided with the heating mechanism 4a, it is distilled and regenerated in the path of the heating tank 5, the first condenser 6, and the ejector 7, and the distilled regenerated cleaning liquid is converted into the immersion cleaning tank 1c It is supplied to. Note that a cooling mechanism (not shown) is provided above the heating tank 5, and the cleaning steam from the steam generation tank 4 is distilled and regenerated. On the other hand, a heating mechanism 5 a is provided below the heating tank 5, and the stored cleaning liquid is heated to such a degree that it does not boil.
【０００６】加温槽５の洗浄液は、制御弁Ｖ１が開放さ
れたとき、給液ポンプＰ１の動作によって蒸発塔８に供
給される。この実施例では、蒸発塔８は、細長い管状に
形成されており、内部に設けられた加熱機構８ａによっ
て、供給された洗浄液を瞬時に蒸発させるようになって
いる。そして、蒸発塔８で生成された洗浄蒸気は、その
まま洗浄槽２に供給される。なお、この実施例では、蒸
発塔８の下部から洗浄液を供給する一方、蒸発塔８の上
部を蒸気洗浄槽２に連通させているが、この構成に代え
て、蒸発塔８の上部から洗浄液をシャワー状に供給し
て、蒸発塔８の下部を蒸気洗浄槽２に連通させても良
い。そして、この構成の場合には、制御弁Ｖ７を介した
洗浄液の回収流路が不要となる。The cleaning liquid in the heating tank 5 is supplied to the evaporation tower 8 by the operation of the liquid supply pump P1 when the control valve V1 is opened. In this embodiment, the evaporating tower 8 is formed in an elongated tubular shape, and the supplied cleaning liquid is instantaneously evaporated by a heating mechanism 8a provided therein. Then, the cleaning steam generated in the evaporating tower 8 is supplied to the cleaning tank 2 as it is. In this embodiment, while the cleaning liquid is supplied from the lower part of the evaporating tower 8, the upper part of the evaporating tower 8 is communicated with the steam cleaning tank 2, but instead of this configuration, the cleaning liquid is supplied from the upper part of the evaporating tower 8. The water may be supplied in the form of a shower so that the lower part of the evaporating tower 8 communicates with the steam cleaning tank 2. And in the case of this configuration, the recovery flow path of the cleaning liquid via the control valve V7 becomes unnecessary.
【０００７】図示の通り、蒸気洗浄槽２の下部は、制御
弁Ｖ２を介して加温槽５に連通している。なお、加温槽
５に貯留される洗浄液の純度を上げるためには、蒸気洗
浄槽２と加温槽５とを連通させるのに代えて、制御弁Ｖ
６を介して蒸気洗浄槽２とダーティタンク３とを連通さ
せても良い（破線部参照）。蒸気洗浄槽２は、第２凝縮
器９を介して真空ポンプＶＰに接続されており、制御弁
Ｖ３，Ｖ４の開放時には、真空ポンプＶＰによって洗浄
槽２が適宜に減圧されるようになっている。なお、第２
凝縮器９において液化された洗浄蒸気は、制御弁Ｖ５を
介して、加温槽５か又はダーティタンク３に回収される
ようになっている。As shown in the figure, the lower part of the steam cleaning tank 2 communicates with the heating tank 5 via a control valve V2. In order to increase the purity of the cleaning liquid stored in the heating tank 5, instead of connecting the steam cleaning tank 2 and the heating tank 5, the control valve V is used.
The steam cleaning tank 2 and the dirty tank 3 may communicate with each other via 6 (see the broken line). The steam cleaning tank 2 is connected to a vacuum pump VP via a second condenser 9, and when the control valves V3 and V4 are opened, the pressure of the cleaning tank 2 is appropriately reduced by the vacuum pump VP. . The second
The cleaning steam liquefied in the condenser 9 is collected in the heating tank 5 or the dirty tank 3 via the control valve V5.
【０００８】続いて、以上の構成からなる洗浄装置ＥＵ
について、その動作内容を説明する。 〔蒸留再生動作〕本装置ＥＵでは、浸漬洗浄槽１ａ〜１
ｃや蒸気洗浄槽２の動作状態に係わらず、常時、減圧状
態下で洗浄液の蒸留再生がされている。すなわち、蒸気
発生槽４は、加温槽５と第１凝縮器６とを通して、エゼ
クター７に接続されているので、蒸気発生槽４は、常
時、所定の減圧状態になっている。そのため、蒸気発生
槽４の洗浄液は、その沸点が低下することになり、比較
的低い温度で沸騰している。Subsequently, the cleaning apparatus EU having the above configuration
Will be described below. [Distillation regeneration operation] In this apparatus EU, the immersion cleaning tanks 1a to 1
Regardless of the operation state of the steam cleaning tank 2 and c, the cleaning liquid is constantly distilled and regenerated under reduced pressure. That is, since the steam generation tank 4 is connected to the ejector 7 through the heating tank 5 and the first condenser 6, the steam generation tank 4 is always in a predetermined reduced pressure state. Therefore, the cleaning liquid of the steam generation tank 4 has a lower boiling point, and is boiling at a relatively low temperature.
【０００９】蒸気発生槽４で発生した洗浄蒸気は、加温
槽５の上部に伝えられ、加温槽５の上部に設けられた冷
却機構によって一部が凝縮される。一方、凝縮されなか
った洗浄蒸気は、第１凝縮器６において凝縮され、ここ
で蒸留再生された洗浄液は、エゼクター７を介して浸漬
洗浄槽１ｃに伝えられる。以上の通り、図１に示す洗浄
装置ＥＵでは、洗浄液は、浸漬洗浄槽１ｃ→１ｂ→１ａ
の順番に使用されて汚れ、蒸気発生槽４→加温槽５→第
１凝縮器６→エゼクター７の経路において蒸留再生され
ている。そして、蒸気発生槽４は、常時、減圧状態であ
るので、高沸点溶剤を比較的低い温度で連続的に蒸留再
生することができる。The cleaning steam generated in the steam generating tank 4 is transmitted to the upper part of the heating tank 5 and a part thereof is condensed by a cooling mechanism provided on the upper part of the heating tank 5. On the other hand, the cleaning vapor that has not been condensed is condensed in the first condenser 6, and the cleaning liquid regenerated by distillation here is transmitted to the immersion cleaning tank 1 c via the ejector 7. As described above, in the cleaning apparatus EU shown in FIG. 1, the cleaning liquid is immersed in the cleaning tank 1c → 1b → 1a.
, And is distilled and regenerated in the route of the steam generation tank 4 → the heating tank 5 → the first condenser 6 → the ejector 7. And since the steam generating tank 4 is always in a depressurized state, the high boiling point solvent can be continuously distilled and regenerated at a relatively low temperature.
【００１０】〔蒸気洗浄〕浸漬洗浄槽１ａ→１ｂ→１ｃ
において超音波洗浄された被洗浄物は、密閉式の蒸気洗
浄槽２に投入される。その後、制御弁Ｖ３と制御弁Ｖ４
とを開放状態にして真空ポンプＶＰを駆動し、蒸気洗浄
槽２を６０ｍｍＨｇ程度まで減圧する。なお、この状態
では、制御弁Ｖ２と制御弁Ｖ１は閉鎖状態であるが、蒸
発塔８と蒸気洗浄槽２とは連通状態であるので、蒸発塔
８は、蒸気洗浄槽２と同一の減圧状態にある。[Steam cleaning] Immersion cleaning tank 1a → 1b → 1c
The object to be cleaned, which has been subjected to ultrasonic cleaning in, is put into a closed steam cleaning tank 2. Then, control valve V3 and control valve V4
And the vacuum pump VP is driven to reduce the pressure of the steam cleaning tank 2 to about 60 mmHg. In this state, the control valve V2 and the control valve V1 are closed, but the evaporating tower 8 and the steam washing tank 2 are in communication with each other. It is in.
【００１１】蒸発塔８と蒸気洗浄槽２とが所定の減圧状
態に到達したら、次に、制御弁Ｖ１を開放すると共に給
液ポンプＰを駆動させて、加温槽５から蒸発塔８に洗浄
液を供給する。前述したように、加温槽５から供給され
る洗浄液は、適度な加温状態に維持されている。また、
蒸発塔８には加熱機構８ａが設けられ、且つ、蒸発塔８
は減圧状態であるので、加温槽５から供給された洗浄液
は、加熱機構８ａと接触することによって直ちに沸騰
し、発生した洗浄蒸気が蒸気洗浄槽２に供給されること
になる。そして、蒸気洗浄槽２に供給された洗浄蒸気
は、被洗浄物と接触して液化され、被洗浄物を仕上げ洗
浄する。このように、本装置ＥＵでは、洗浄液を蒸発塔
８で再沸騰させて使用するので、蒸気清浄度が向上し確
実な仕上げ洗浄を実現することができる。When the evaporating tower 8 and the vapor cleaning tank 2 reach a predetermined reduced pressure state, the control valve V1 is opened and the liquid supply pump P is driven to cause the cleaning liquid to flow from the heating tank 5 to the evaporating tower 8. Supply. As described above, the cleaning liquid supplied from the heating tank 5 is maintained in a moderately heated state. Also,
The evaporating tower 8 is provided with a heating mechanism 8a.
Is in a depressurized state, the cleaning liquid supplied from the heating tank 5 is immediately boiled by coming into contact with the heating mechanism 8a, and the generated cleaning steam is supplied to the steam cleaning tank 2. Then, the cleaning steam supplied to the steam cleaning tank 2 comes into contact with the object to be cleaned and is liquefied to finish-clean the object to be cleaned. As described above, in the present apparatus EU, the cleaning liquid is reboiled and used in the evaporating tower 8, so that the cleanliness of the steam is improved and the finish cleaning can be reliably performed.
【００１２】このようにして蒸気洗浄が完了すると、加
温槽５からの給液が停止されて制御弁Ｖ１が閉鎖され
る。次に、制御弁Ｖ７と制御弁Ｖ２とが開放されて、蒸
発塔８と蒸気洗浄槽２に残っている洗浄液を回収する。
ここで、加温槽５への回収に代えて、ダーティタンク３
に回収しても良いのは前述の通りであるが、加温槽５は
エゼクター７と連通して減圧されているので、加温槽５
への回収の方が容易である。なお、蒸発塔８の上部から
洗浄液を供給して、蒸発塔８の下部を蒸気洗浄槽２に連
通させる構成を採る場合には、蒸発塔８の洗浄液を回収
する必要はないのは前述の通りである。When the steam cleaning is completed in this way, the liquid supply from the heating tank 5 is stopped, and the control valve V1 is closed. Next, the control valve V7 and the control valve V2 are opened, and the cleaning liquid remaining in the evaporation tower 8 and the steam cleaning tank 2 is collected.
Here, instead of collection in the heating tank 5, the dirty tank 3
As described above, the heating tank 5 communicates with the ejector 7 and is depressurized.
It is easier to recover to When the cleaning liquid is supplied from the upper part of the evaporating tower 8 and the lower part of the evaporating tower 8 is communicated with the steam cleaning tank 2, it is not necessary to collect the cleaning liquid of the evaporating tower 8 as described above. It is.
【００１３】〔真空乾燥〕蒸気洗浄槽２に残存する洗浄
液を回収したら、次に、制御弁Ｖ３と制御弁Ｖ４を開放
して真空ポンプＶＰを駆動し、蒸気洗浄槽２を更に減圧
状態にする。この動作によって、洗浄液の沸点が更に低
下し、被洗浄物の表面に残存している洗浄液が迅速に乾
燥される。真空ポンプＶＰと蒸気洗浄槽２の間には、第
２凝縮器９が設けられているので、乾燥工程において発
生した洗浄蒸気は、第２凝縮器９で再び液化されて回収
され大気に漏洩することはない。なお、第２凝縮器９に
溜まった洗浄液は、適宜なタイミングで制御弁Ｖ５を開
放して回収される。このように、本装置ＥＵでは、蒸気
洗浄槽２に残存する洗浄液を洗浄蒸気は完全に回収され
るので、乾燥後の被洗浄物を取り出した後、引き続き、
次の蒸気洗浄動作を開始することができる。つまり、連
続的な蒸気洗浄動作を実現することができる。[Vacuum drying] After the cleaning liquid remaining in the steam cleaning tank 2 is recovered, the control valve V3 and the control valve V4 are opened and the vacuum pump VP is driven to further reduce the pressure in the steam cleaning tank 2. . By this operation, the boiling point of the cleaning liquid is further lowered, and the cleaning liquid remaining on the surface of the object to be cleaned is quickly dried. Since the second condenser 9 is provided between the vacuum pump VP and the steam cleaning tank 2, the cleaning steam generated in the drying step is liquefied again in the second condenser 9, collected, and leaked to the atmosphere. Never. The cleaning liquid accumulated in the second condenser 9 is recovered by opening the control valve V5 at an appropriate timing. As described above, in the present apparatus EU, the cleaning liquid remaining in the steam cleaning tank 2 is completely recovered from the cleaning vapor, so that after the dried object to be cleaned is taken out,
The next steam cleaning operation can be started. That is, a continuous steam cleaning operation can be realized.
【００１４】図２は、本発明の別の実施例を示す概略構
成図である。この装置ＥＵ’は、浸漬洗浄槽１ｃに残存
する洗浄液が比較的きれい場合に使用されるものであ
り、浸漬洗浄槽１ｃの洗浄液が制御弁Ｖ０を介して加温
槽５に供給される点、及び、蒸気発生槽４で発生した洗
浄蒸気が第１凝縮器６と直接伝えられる点に特徴があ
る。この実施例においても、洗浄液は、浸漬洗浄槽１ｃ
→１ｂ→１ａの順番に使用されて汚れ、蒸気発生槽４→
加温槽５→第１凝縮器６→エゼクター７の経路において
減圧下で連続的に蒸留再生される。また、洗浄液は、適
度に加温された状態で蒸発塔８に供給されるので、高純
度の洗浄蒸気によって被洗浄物を蒸気洗浄することがで
きる。FIG. 2 is a schematic configuration diagram showing another embodiment of the present invention. This apparatus EU 'is used when the cleaning liquid remaining in the immersion cleaning tank 1c is relatively clean, and the cleaning liquid in the immersion cleaning tank 1c is supplied to the heating tank 5 via the control valve V0. Further, the cleaning steam generated in the steam generation tank 4 is directly transmitted to the first condenser 6. Also in this embodiment, the cleaning liquid is the immersion cleaning tank 1c.
It is used in the order of → 1b → 1a and becomes dirty and steam generating tank 4 →
Distillation and regeneration are performed continuously under reduced pressure in the route of the heating tank 5 → the first condenser 6 → the ejector 7. Further, since the cleaning liquid is supplied to the evaporating tower 8 in a state of being appropriately heated, the cleaning target can be steam-cleaned with high-purity cleaning steam.
【００１５】[0015]
【発明の効果】以上説明したように、本発明によれば、
高性能の洗浄動作を連続的に行うことのできる洗浄装置
を実現することができる。As described above, according to the present invention,
A cleaning apparatus capable of continuously performing high-performance cleaning operation can be realized.
【図１】本発明の実施例を示す概略構成図である。FIG. 1 is a schematic configuration diagram showing an embodiment of the present invention.
【図２】本発明の別の実施例を示す概略構成図である。FIG. 2 is a schematic configuration diagram showing another embodiment of the present invention.
１ａ〜１ｃ 浸漬洗浄槽 ２ 蒸気洗浄槽 ＥＵ 洗浄装置 ３ ダーティタンク ４ 蒸気発生槽 ５ 加温槽 ６ 第１凝縮機構 ７ エゼクター（第１減圧機構） ８ 蒸発塔 ＶＰ 真空ポンプ（第２減圧機構） 1a to 1c Immersion washing tank 2 Steam washing tank EU washing apparatus 3 Dirty tank 4 Steam generating tank 5 Heating tank 6 First condensation mechanism 7 Ejector (First pressure reducing mechanism) 8 Evaporation tower VP Vacuum pump (Second pressure reducing mechanism)
Claims (2)
ｃ）と、必要に応じて減圧状態にできる蒸気洗浄槽
（２）とによって、浸漬洗浄と蒸気洗浄と真空乾燥とか
らなる洗浄動作を連続的に実現する洗浄装置（ＥＵ）で
あって、 初段の浸漬洗浄槽（１ａ）で使用された洗浄液を受ける
ダーティタンク（３）と、加熱機構（４ａ）を備えると
共に前記ダーティタンクからの洗浄液を受ける蒸気発生
槽（４）と、前記蒸気発生槽からの洗浄蒸気を受ける凝
縮機構（５，６）と、蒸留再生された洗浄液を加温状態
で貯留する加温槽（５）と、前記蒸気発生槽を連続的に
減圧状態に維持する第１減圧機構（７）と、前記加温槽
からの洗浄液を受け、内部の加熱機構によって瞬間的に
洗浄蒸気を生成する蒸発塔（８）と、前記蒸気洗浄槽と
前記蒸発塔とを一体的に所定の減圧状態にする第２減圧
機構（ＶＰ）とを備え、前記凝縮機構で蒸留再生された
洗浄液は、最終段の浸漬洗浄槽（１ｃ）に供給され、順
次その前段の浸漬洗浄槽で使用されるようになってお
り、蒸留再生された洗浄液を、再度、前記蒸発塔におい
て蒸発させて洗浄蒸気を生成し蒸気洗浄を行うようにし
た洗浄装置。1. An immersion cleaning tank (1a to 1) comprising a plurality of stages.
(c) and a steam cleaning tank (2) that can be reduced in pressure as required, a cleaning apparatus (EU) that continuously realizes a cleaning operation including immersion cleaning, steam cleaning, and vacuum drying. A dirty tank (3) for receiving the cleaning liquid used in the immersion cleaning tank (1a), a steam generating tank (4) including a heating mechanism (4a) and receiving the cleaning liquid from the dirty tank, A condensing mechanism (5, 6) for receiving the cleaning steam, a heating tank (5) for storing the distilled and regenerated cleaning liquid in a heated state, and a first depressurization for continuously maintaining the steam generating tank in a depressurized state. A mechanism (7), an evaporating tower (8) that receives the washing liquid from the heating tank and instantaneously generates washing steam by an internal heating mechanism, and integrally forms the evaporating tower with the evaporating tower. Second pressure reducing mechanism (VP) for reducing pressure Which was distilled and regenerated by the condensation mechanism.
The cleaning liquid is supplied to the last immersion cleaning tank (1c), and
Next, it is used in the immersion washing tank
Ri, distilled regenerated washing liquid, again cleaning apparatus to perform the generated vapor cleaning the cleaning vapor evaporated in the evaporating tower.
通されており、前記蒸発塔の上部から洗浄液をシャワー
状に供給するようになっている請求項１に記載の洗浄装
置。 2. The lower part of the evaporating tower is connected to a steam cleaning tank 2.
Washing liquid from the top of the evaporation tower
2. The cleaning device according to claim 1, wherein the cleaning device is supplied in a form.
Place.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP09516399A JP3193696B2 (en) | 1999-04-01 | 1999-04-01 | Cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP09516399A JP3193696B2 (en) | 1999-04-01 | 1999-04-01 | Cleaning equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000288497A JP2000288497A (en) | 2000-10-17 |
| JP3193696B2 true JP3193696B2 (en) | 2001-07-30 |
Family
ID=14130116
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP09516399A Expired - Fee Related JP3193696B2 (en) | 1999-04-01 | 1999-04-01 | Cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3193696B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6309750B2 (en) * | 2013-12-10 | 2018-04-11 | アクトファイブ株式会社 | Cleaning method and cleaning device |
| JP6961913B2 (en) * | 2016-08-18 | 2021-11-05 | 東洋製罐株式会社 | Cleaning equipment and cleaning method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3393519B2 (en) * | 1994-11-29 | 2003-04-07 | 同和鉱業株式会社 | Method and apparatus for cleaning metal workpieces |
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1999
- 1999-04-01 JP JP09516399A patent/JP3193696B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2000288497A (en) | 2000-10-17 |
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