JP3171058B2 - Hydrogen peroxide water purification method - Google Patents
Hydrogen peroxide water purification methodInfo
- Publication number
- JP3171058B2 JP3171058B2 JP14903295A JP14903295A JP3171058B2 JP 3171058 B2 JP3171058 B2 JP 3171058B2 JP 14903295 A JP14903295 A JP 14903295A JP 14903295 A JP14903295 A JP 14903295A JP 3171058 B2 JP3171058 B2 JP 3171058B2
- Authority
- JP
- Japan
- Prior art keywords
- hydrogen peroxide
- exchange resin
- ppb
- metal component
- ion exchange
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Treatment Of Water By Ion Exchange (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、過酸化水素水の精製方
法に関するものでである。更に詳しくは、本発明は、不
純物である金属成分の濃度が極めて低く、よって半導体
の製造プロセスに最適に使用し得る高純度の過酸化水素
水を得ることができる過酸化水素水の精製方法に関する
ものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for purifying aqueous hydrogen peroxide. More specifically, the present invention relates to a method for purifying a hydrogen peroxide solution capable of obtaining a high-purity hydrogen peroxide solution having an extremely low concentration of a metal component as an impurity and thus being optimally usable in a semiconductor manufacturing process. Things.
【０００２】[0002]
【従来の技術】半導体の製造プロセスにおいて、ウエハ
ーの洗浄液の一成分として過酸化水素水が用いられる。
ここで用いられる過酸化水素水は、高度に清浄で純粋で
あることが要求される。特に、過酸化水素水に鉄、アル
ミニウム、ナトリウム、カルシウム、マグネシウムなど
の金属成分が存在すると、得られる半導体の信頼性を著
しく低下させる。一方、半導体の信頼性に対する要求水
準は、近年一層高度なものとなりつつあり、そのために
は各金属成分の濃度を一層低い水準に制御された高純度
の過酸化水素水が必要とされている。2. Description of the Related Art In a semiconductor manufacturing process, an aqueous solution of hydrogen peroxide is used as one component of a cleaning solution for a wafer.
The hydrogen peroxide solution used here is required to be highly clean and pure. In particular, when metal components such as iron, aluminum, sodium, calcium, and magnesium are present in the hydrogen peroxide solution, the reliability of the obtained semiconductor is significantly reduced. On the other hand, the level of reliability required for semiconductors has become higher in recent years, and for that purpose, a high-purity hydrogen peroxide solution in which the concentration of each metal component is controlled to a lower level is required.
【０００３】ところで、過酸化水素水の精製方法とし
て、過酸化水素水をイオン交換樹脂と接触させ、不純物
を吸着除去する方法が知られている。しかしながら、従
来の方法により得られる過酸化水素水は、上記の高度な
要求水準に照らすとき、必ずしも満足し得るものとはい
い難いものであった。[0003] As a method for purifying hydrogen peroxide solution, there is known a method of bringing hydrogen peroxide solution into contact with an ion exchange resin to adsorb and remove impurities. However, the hydrogen peroxide solution obtained by the conventional method is not always satisfactory when illuminated at the above-mentioned high required level.
【０００４】[0004]
【発明が解決しようとする課題】かかる現状において、
本発明が解決しようとする課題は、不純物である金属成
分の濃度が極めて低く、よって半導体の製造プロセスに
最適に使用し得る高純度の過酸化水素水を得ることがで
きる過酸化水素水の精製方法に存するものである。Under such circumstances,
The problem to be solved by the present invention is to purify a hydrogen peroxide solution in which the concentration of a metal component as an impurity is extremely low, so that a high-purity hydrogen peroxide solution that can be optimally used in a semiconductor manufacturing process can be obtained. It is in the method.
【０００５】[0005]
【課題を解決するための手段】すなわち、本発明は、不
純物としての金属成分を含有する粗過酸化水素水をイオ
ン交換樹脂との接触処理に付すことにより高純度過酸化
水素を得る過酸化水素水の精製方法であって、各金属成
分濃度が０．１重量ｐｐｂ以下である高純度鉱酸水溶液
と接触させ、更に各金属成分濃度が０．１重量ｐｐｂ以
下である超純水と接触させることにより前処理したイオ
ン交換樹脂を用いる過酸化水素水の精製方法に係るもの
である。That is, the present invention provides a method for producing high-purity hydrogen peroxide by subjecting a crude hydrogen peroxide solution containing a metal component as an impurity to a contact treatment with an ion exchange resin. A method for purifying water, comprising contacting each metal component with a high-purity mineral acid aqueous solution having a concentration of 0.1 wt ppb or less and further contacting with ultrapure water having each metal component having a concentration of 0.1 wt ppb or less. The present invention relates to a method for purifying hydrogen peroxide using an ion exchange resin which has been pretreated.
【０００６】以下、詳細に説明する。The details will be described below.
【０００７】本発明で精製に付される粗過酸化水素水と
しては、工業的に製造されているアントラキノン法など
により製造される過酸化水素水を用いることができる。
また、いわゆる電子工業用といわれる純度の高い過酸化
水素を用いてもよい。過酸化水素水の濃度については、
特に制限はないが、通常は１〜６５重量％、好ましくは
１〜４０重量％である。[0007] As the crude hydrogen peroxide solution to be purified in the present invention, an aqueous hydrogen peroxide solution produced by an anthraquinone method or the like produced industrially can be used.
Further, high-purity hydrogen peroxide which is so-called for electronic industry may be used. About the concentration of hydrogen peroxide solution,
Although there is no particular limitation, it is usually 1 to 65% by weight, preferably 1 to 40% by weight.
【０００８】本発明で用いられるイオン交換樹脂として
は、カチオン交換樹脂及びアニオン交換樹脂をあげるこ
とができる。カチオン交換樹脂としては、スチレン系強
酸性型のものが好ましい。アニオン交換樹脂としては、
スチレン系強塩基性Ｉ型、同II型、スチレン系弱塩基型
など、過酸化水素水に溶解しないアニオン交換樹脂であ
ればいずれを用いてもよいが、特に好ましいのはスチレ
ン系強塩基性Ｉ型アニオン交換樹脂である。なお、イオ
ン交換樹脂としては、カチオン交換樹脂又はアニオン交
換樹脂の一方のみを用いてもよく、又はその両方を用い
てもよい。The ion exchange resin used in the present invention includes a cation exchange resin and an anion exchange resin. As the cation exchange resin, a strongly acidic styrene resin is preferred. As an anion exchange resin,
Any anion exchange resin that does not dissolve in aqueous hydrogen peroxide such as styrene-based strong basic type I, II, and styrene-based weak base type may be used. Type anion exchange resin. In addition, as an ion exchange resin, only one of a cation exchange resin and an anion exchange resin may be used, or both may be used.
【０００９】本発明は、不純物としての金属成分を含有
する粗過酸化水素水をイオン交換樹脂との接触処理に付
すことにより高純度過酸化水素を得る過酸化水素水の精
製方法であり、いわゆる吸着法に属するものであるが、
該接触処理に先立ち、用いるイオン交換樹脂について、
各金属成分濃度が０．１重量ｐｐｂ以下である高純度鉱
酸水溶液と接触させ、更に各金属成分濃度が０．１重量
ｐｐｂ以下である超純水と接触させることにより前処理
したイオン交換樹脂を用いる必要がある。かかる特徴的
な前処理を施したイオン交換樹脂を用いることにより、
不純物である金属成分の含有量が極めて低い高純度の過
酸化水素水を得ることができるのである。The present invention is a method for purifying a hydrogen peroxide solution that obtains high-purity hydrogen peroxide by subjecting a crude hydrogen peroxide solution containing a metal component as an impurity to a contact treatment with an ion exchange resin. It belongs to the adsorption method,
Prior to the contact treatment, for the ion exchange resin used,
An ion exchange resin pretreated by contacting with a high-purity mineral acid aqueous solution having a concentration of each metal component of 0.1 wt ppb or less and further contacting with ultrapure water having a concentration of each metal component of 0.1 wt ppb or less Must be used. By using an ion exchange resin subjected to such a characteristic pretreatment,
It is possible to obtain a high-purity hydrogen peroxide solution having an extremely low content of metal components as impurities.
【００１０】前処理で用いる鉱酸水溶液としては、塩酸
水溶液、硫酸水溶液などをあげることができる。鉱酸水
溶液は、そのなかに含有される各金属成分濃度が０．１
重量ｐｐｂ以下のものを用いる必要がある。金属成分と
しては、通常、鉄、アルミニウム、ナトリウム、カルシ
ウム、マグネシウムなどがあげられる。ここで用いられ
る高純度の鉱酸水溶液を得る方法としては、市販の高純
度鉱酸を更に単蒸留することにより精製した鉱酸を超純
水で希釈する方法をあげることができる。なお、鉱酸水
溶液としては、濃度３〜９重量％の塩酸が好ましい。Examples of the aqueous solution of mineral acid used in the pretreatment include an aqueous solution of hydrochloric acid and an aqueous solution of sulfuric acid. The aqueous mineral acid solution has a concentration of each metal component of 0.1%.
It is necessary to use one having a weight of ppb or less. The metal component usually includes iron, aluminum, sodium, calcium, magnesium and the like. As a method for obtaining a high-purity aqueous mineral acid solution used here, a method in which a commercially available high-purity mineral acid is further subjected to simple distillation to dilute the purified mineral acid with ultrapure water can be mentioned. As the mineral acid aqueous solution, hydrochloric acid having a concentration of 3 to 9% by weight is preferable.
【００１１】前処理で用いる超純水は、各金属成分濃度
が０．１重量ｐｐｂ以下のものであり、市販の超純水装
置のものを用いることができる。The ultrapure water used in the pretreatment has a concentration of each metal component of 0.1 ppb or less, and a commercially available ultrapure water apparatus can be used.
【００１２】前処理は、イオン交換樹脂について、各金
属成分濃度が０．１重量ｐｐｂ以下である高純度鉱酸水
溶液と接触させ、更に各金属成分濃度が０．１重量ｐｐ
ｂ以下である超純水と接触させることにより行われる。
前処理時のイオン交換樹脂と高純度鉱酸水溶液及び超純
水との各接触は、次のとおり行われる。接触はバッチ法
又はカラム通液法のいずれでもよいが、作業効率の観点
からカラム通液法が好ましい。カラム通液法をとる場
合、前処理に使用する高純度鉱酸又は超純水の通液速度
は、空間速度（以下、「ＳＶ」と記す。）で通常０．１
〜５０ｈｒ-1であるが、より好ましくは１〜１０ｈｒ-1
である。前処理に用いられる高純度鉱酸の量は、イオン
交換樹脂の量の５０倍以上が好ましく、更に好ましくは
１００倍以上である。また、前処理に用いられる超純水
の量は、イオン交換樹脂の量の１０倍以上が好ましく、
更に好ましくは５０倍以上である。接触温度は、通常０
〜８０℃であり、好ましくは１０〜３０℃である。In the pretreatment, the ion exchange resin is brought into contact with a high-purity mineral acid aqueous solution having a metal component concentration of not more than 0.1 wt.
This is performed by contacting with ultrapure water of b or less.
Each contact of the ion exchange resin with the high-purity mineral acid aqueous solution and ultrapure water at the time of pretreatment is performed as follows. The contact may be performed by either a batch method or a column flow method, but the column flow method is preferred from the viewpoint of working efficiency. When the column flow method is used, the flow rate of the high-purity mineral acid or ultrapure water used for the pretreatment is usually 0.1 space velocity (hereinafter referred to as “SV”).
５０50 hr −1 , more preferably 1-10 hr −1
It is. The amount of the high-purity mineral acid used in the pretreatment is preferably at least 50 times, more preferably at least 100 times the amount of the ion exchange resin. Further, the amount of ultrapure water used for the pretreatment is preferably at least 10 times the amount of the ion exchange resin,
More preferably, it is 50 times or more. The contact temperature is usually 0
To 80 ° C, preferably 10 to 30 ° C.
【００１３】不純物としての金属成分を含有する粗過酸
化水素水と前処理が施されたイオン交換樹脂との接触処
理は次のとおり行われる。接触はバッチ法及びカラム通
液法いずれでもよいが、作業効率の観点からカラム通液
法が好ましい。カラム通液法をとる場合の通液速度は、
通常０．１〜５０ｈｒ-1であるが、より好ましくは１〜
１０ｈｒ-1である。接触温度は、通常３０℃以下であ
り、好ましくは１０℃以下である。The contact treatment between a crude hydrogen peroxide solution containing a metal component as an impurity and a pretreated ion exchange resin is performed as follows. The contact may be carried out by either a batch method or a column flow method, but the column flow method is preferred from the viewpoint of working efficiency. The flow rate when using the column flow method is as follows:
Usually 0.1 to 50 hr -1 , but more preferably 1 to 50 hr -1
10 hr -1 . The contact temperature is usually 30 ° C. or lower, preferably 10 ° C. or lower.
【００１４】本発明は、前記のとおり、カチオン交換樹
脂及びアニオン交換樹脂のいずれを用いる場合において
も適用できるが、各樹脂毎の具体的実施方法の例につい
て、以下説明する。As described above, the present invention can be applied to the case where either a cation exchange resin or an anion exchange resin is used. An example of a specific method for each resin will be described below.
【００１５】カチオン交換樹脂を用いる場合、本発明の
前処理を行うことにより水素型のカチオン交換樹脂と
し、その後本発明の接触処理を行えばよい。接触処理の
進行に伴い、樹脂の金属吸着能力が低下するので、再度
本発明の前処理を行い、続いて接触処理を行う。When a cation exchange resin is used, the pretreatment of the present invention may be carried out to obtain a hydrogen-type cation exchange resin, and then the contact treatment of the present invention may be performed. With the progress of the contact treatment, the metal adsorption capacity of the resin is reduced. Therefore, the pretreatment of the present invention is performed again, and then the contact treatment is performed.
【００１６】アニオン交換樹脂を用いる場合、前処理の
うちの高純度鉱酸水溶液を用いる接触を行い、次に水酸
化ナトリウム水溶液などのアルカリ水溶液を用いる接触
を行う、更に炭酸水素ナトリウムなどの重炭酸塩水溶液
又は炭酸ナトリウムなどの炭酸水溶液又を用いる接触を
行うことにより炭酸水素型又は炭酸型とし、その後本発
明の前処理のうちの超純水を用いる接触を行う。かくし
て得られたアニオン交換樹脂を用いて本発明の接触処理
を行えばよい。In the case of using an anion exchange resin, a contact using a high-purity aqueous solution of a mineral acid in the pretreatment is carried out, followed by a contact using an aqueous alkaline solution such as an aqueous sodium hydroxide solution, The contact using a salt solution or an aqueous solution of carbonic acid such as sodium carbonate is performed to form a hydrogen carbonate type or a carbonic acid type, and then the contact using ultrapure water in the pretreatment of the present invention is performed. The contact treatment of the present invention may be performed using the anion exchange resin thus obtained.
【００１７】[0017]
【実施例】以下、本発明を実施例及び比較例により説明
する。なお、金属成分の分析は、ＩＣＰ−ＭＳ法及びフ
レームレス原子吸光法で行った。The present invention will be described below with reference to examples and comparative examples. In addition, the analysis of the metal component was performed by the ICP-MS method and the flameless atomic absorption method.
【００１８】実施例１ 強酸性カチオン交換樹脂であるＩＲ１２０Ｂ（オルガノ
製、Ｎａ型）１６０ｍｌを、内径１６ｍｍ、長さ１２０
０ｍｍのテフロン製カラムに充填し、まず各金属成分濃
度が０．１重量ｐｐｂ以下の超純水でＳＶ＝１０ｈｒ-1
で１時間、上昇流で水洗した。次に、各金属成分濃度が
０．１重量ｐｐｂ以下の６重量％の高純度塩酸水溶液を
下降流ＳＶ＝１．２ｈｒ-1で２５０時間（樹脂量の３０
０倍量）通液した。次いで、樹脂量の１００倍量の超純
水を用いて下降流で水洗し、該カチオン交換樹脂を水素
型に変換した。粗過酸化水素水として、ナトリウム１．
０重量ｐｐｂ、カルシウム１．１重量ｐｐｂ及びマグネ
シウム１．４重量ｐｐｂを含む３１重量％粗過酸化水素
を用い、下降流でＳＶ＝４ｈｒ-1で通液した。カラムか
ら流出する過酸化水素水を捕集し、この中に含まれる金
属成分を分析した結果、ナトリウム１３重量ｐｐｔ、カ
ルシウム１０重量ｐｐｔ及びマグネシウム２重量ｐｐｔ
であった。Example 1 160 ml of a strongly acidic cation exchange resin, IR120B (manufactured by Organo, Na type), having an inner diameter of 16 mm and a length of 120 mm
Packed in a 0 mm Teflon column, and first, SV = 10 hr -1 with ultrapure water having a concentration of each metal component of 0.1 wt ppb or less.
For 1 hour. Next, 30 of each metal component concentration of the high purity hydrochloric acid aqueous solution of 6 wt% of less than 0.1 ppb by weight downflow SV = 1.2 hr -1 250 hours (resin amount
(0 volume). Next, the cation exchange resin was converted to a hydrogen form by washing with downflow using ultrapure water of 100 times the amount of the resin. As crude hydrogen peroxide solution, sodium 1.
Using 31 wt% crude hydrogen peroxide containing 0 wt ppb, 1.1 wt ppb of calcium and 1.4 wt ppb of magnesium, the solution was passed in a downward flow at SV = 4 hr -1 . The hydrogen peroxide solution flowing out of the column was collected, and the metal components contained therein were analyzed. As a result, sodium 13 wt% ppt, calcium 10 wt% ppt, and magnesium 2 wt% ppt were obtained.
Met.
【００１９】実施例２ 強塩基製アニオン交換樹脂であるＳＡ１０Ａ（三菱化学
製、４級アンモニウムＩ型、塩素型）１２０ｍｌを、内
径４０ｍｍ、長さ２５０ｍｍのテフロン製カラムに充填
し、まずＳＶ＝１０ｈｒ-1で１時間、各金属成分濃度が
０．１重量ｐｐｂ以下である超純水で水洗し、次いで各
金属成分濃度が０．１重量ｐｐｂ以下である６重量％塩
酸水溶液をＳＶ＝５ｈｒ-1で２時間通液し超純水で置換
し、更に２Ｎ水酸化ナトリウム水溶液をＳＶ＝５ｈｒ-1
で３時間通液し、水酸型に変換した。再び超純水で置換
してから０．７Ｎ重炭酸ナトリウム水溶液をＳＶ＝５で
２時間通液し、最後に樹脂量の５０倍量の超純水で水洗
し、該アニオン交換樹脂を重炭酸型に変換した。ここま
での通液はすべて上昇流で行った。原料として、鉄３．
６重量ｐｐｂ及びアルミニウム４３重量ｐｐｂを含む３
１重量％粗過酸化水素水を上昇流でＳＶ＝５ｈｒ-1で通
液した。カラムから流出する過酸化水素水を捕集し、こ
の中に含まれる金属成分を分析した結果、鉄２１重量ｐ
ｐｔ及びアルミニウム３２重量ｐｐｔであった。Example 2 A Teflon column having an inner diameter of 40 mm and a length of 250 mm was packed with 120 ml of a strong base anion exchange resin SA10A (manufactured by Mitsubishi Chemical Corporation, quaternary ammonium type I, chlorine type). -1 for 1 hour, washing with ultrapure water having a concentration of each metal component of 0.1 wt ppb or less, and then adding a 6 wt% hydrochloric acid aqueous solution having a concentration of each metal component of 0.1 wt ppb or less to SV = 5 hr − The solution was passed for 2 hours at 1 and replaced with ultrapure water. Further, a 2N aqueous sodium hydroxide solution was added at SV = 5 hr -1.
For 3 hours to convert to the hydroxyl form. After replacement with ultrapure water again, a 0.7N aqueous sodium bicarbonate solution was passed at SV = 5 for 2 hours, and finally, the resin was washed with 50 times the amount of ultrapure water of the resin amount, and the anion exchange resin was subjected to bicarbonate removal. Converted to type. All of the liquid flow up to this point was performed in ascending flow. Iron as a raw material
3 including 6 weight ppb and 43 weight ppb of aluminum
A 1% by weight crude hydrogen peroxide solution was passed through the ascending flow at SV = 5 hr -1 . The hydrogen peroxide solution flowing out of the column was collected, and the metal component contained therein was analyzed.
pt and 32 weight ppt of aluminum.
【００２０】比較例１ アルミニウム３．９重量ｐｐｂ、鉄０．６重量ｐｐｂ、
マグネシウム０．６重量ｐｐｂ及びその他の金属成分
０．３重量ｐｐｂ以下を含んだ塩酸水溶液及びナトリウ
ム０．３重量ｐｐｂ、カルシウム０．１重量ｐｐｂ、そ
の他の金属成分０．１重量ｐｐｂ以下を含んだ純水を用
いた他は、実施例１と同様に行った。その結果、流出液
中の金属成分は、ナトリウム１１５重量ｐｐｔ、カルシ
ウム９５重量ｐｐｔ及びマグネシウム２５重量ｐｐｔで
あった。Comparative Example 1 3.9 weight ppb of aluminum, 0.6 weight ppb of iron,
Hydrochloric acid aqueous solution containing 0.6 weight ppb of magnesium and 0.3 weight ppb or less of other metal components, and 0.1 weight ppb of sodium 0.3 weight ppb, calcium and other metal components of 0.1 weight ppb or less The procedure was performed in the same manner as in Example 1 except that pure water was used. As a result, the metal components in the effluent were 115 wt% ppt of sodium, 95 wt% of ppt of calcium and 25 wt% of ppt of magnesium.
【００２１】比較例２ 比較例１で用いた塩酸と純水を用いた他は、実施例２と
同様にして実施例２で用いたのと同じ粗過酸化水素水の
通液を行った。その結果、流出液中の金属成分は、鉄１
４０重量ｐｐｔ及びアルミニウム１７０重量ｐｐｔであ
った。Comparative Example 2 The same crude hydrogen peroxide solution as used in Example 2 was passed in the same manner as in Example 2 except that hydrochloric acid and pure water used in Comparative Example 1 were used. As a result, the metal component in the effluent is iron 1
The weight was 40 ppt and the weight of aluminum was 170 ppt.
【００２２】[0022]
【発明の効果】以上説明したとおり、本発明により、不
純物である金属成分の濃度が極めて低く、よって半導体
の製造プロセスに最適に使用し得る高純度の過酸化水素
水を得ることができる過酸化水素水の精製方法を提供す
ることができた。As described above, according to the present invention, it is possible to obtain a high-purity hydrogen peroxide solution having an extremely low concentration of a metal component as an impurity and thus being optimally usable in a semiconductor manufacturing process. A method for purifying hydrogen water can be provided.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平７−172805（ＪＰ，Ａ) 特開 平７−187616（ＪＰ，Ａ) 特開 平８−143303（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) C01B 15/013 ＣＡ（ＳＴＮ)────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-7-172805 (JP, A) JP-A-7-187616 (JP, A) JP-A 8-143303 (JP, A) (58) Field (Int. Cl. 7 , DB name) C01B 15/013 CA (STN)
Claims (2)
酸化水素水をイオン交換樹脂との接触処理に付すことに
より高純度過酸化水素を得る過酸化水素水の精製方法で
あって、各金属成分濃度が０．１重量ｐｐｂ以下である
高純度鉱酸水溶液と接触させ、更に各金属成分濃度が
０．１重量ｐｐｂ以下である超純水と接触させることに
より前処理したイオン交換樹脂を用いる過酸化水素水の
精製方法。Claims: 1. A method for purifying a hydrogen peroxide solution to obtain a high-purity hydrogen peroxide by subjecting a crude hydrogen peroxide solution containing a metal component as an impurity to a contact treatment with an ion exchange resin, the method comprising: Use an ion exchange resin pre-treated by contacting with a high-purity mineral acid aqueous solution having a component concentration of 0.1 wt ppb or less and further contacting with ultrapure water having a metal component concentration of 0.1 wt ppb or less. A method for purifying hydrogen peroxide water.
樹脂及び／又は強塩基性アニオン交換樹脂である請求項
１記載の精製方法。2. The purification method according to claim 1, wherein the ion exchange resin is a strongly acidic cation exchange resin and / or a strongly basic anion exchange resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14903295A JP3171058B2 (en) | 1995-06-15 | 1995-06-15 | Hydrogen peroxide water purification method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14903295A JP3171058B2 (en) | 1995-06-15 | 1995-06-15 | Hydrogen peroxide water purification method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08337405A JPH08337405A (en) | 1996-12-24 |
| JP3171058B2 true JP3171058B2 (en) | 2001-05-28 |
Family
ID=15466182
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14903295A Expired - Fee Related JP3171058B2 (en) | 1995-06-15 | 1995-06-15 | Hydrogen peroxide water purification method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3171058B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20210052740A (en) * | 2019-10-31 | 2021-05-11 | 주식회사 삼양사 | Method for purifying sugar-containing solution using acrylic-based ion exchange resin and styrene-based ion exchange resin |
| KR20210052679A (en) | 2019-10-30 | 2021-05-11 | 주식회사 삼양사 | Mixed bed ion exchange resin comprising anion exchange resin and cation exchange resin, method for preparing the same and method for purifying hydrogen peroxide solution using the same |
| KR20210052674A (en) * | 2019-10-30 | 2021-05-11 | 주식회사 삼양사 | Method for preparing ion exchange resin with reduced metal impurity content |
| KR20220056308A (en) * | 2020-10-27 | 2022-05-06 | 주식회사 삼양사 | Method for preparing ion exchange resin with reduced content of metallic impurities |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000228387A (en) * | 1998-12-01 | 2000-08-15 | Tadahiro Omi | Wet cleaner |
| FR2800366B1 (en) * | 1999-10-27 | 2002-05-24 | Air Liquide | PROCESS FOR THE PURIFICATION OF AQUEOUS HYDROGEN PEROXIDE SOLUTIONS |
| JP4056695B2 (en) | 2000-06-21 | 2008-03-05 | 三徳化学工業株式会社 | Method for producing purified hydrogen peroxide water |
| JP5364450B2 (en) * | 2009-06-01 | 2013-12-11 | オルガノ株式会社 | Water treatment device for fuel cell |
| CN104402142B (en) * | 2014-11-26 | 2016-06-01 | 柳州化工股份有限公司 | A kind of method of sewage disinfection treatment in hydrogen dioxide solution production by anthraquinone process industry |
| KR102068477B1 (en) * | 2017-12-28 | 2020-01-21 | 주식회사 삼양사 | Method for purifying hydrogen peroxide solution using anion exchange resin and cation exchange resin |
-
1995
- 1995-06-15 JP JP14903295A patent/JP3171058B2/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20210052679A (en) | 2019-10-30 | 2021-05-11 | 주식회사 삼양사 | Mixed bed ion exchange resin comprising anion exchange resin and cation exchange resin, method for preparing the same and method for purifying hydrogen peroxide solution using the same |
| KR20210052674A (en) * | 2019-10-30 | 2021-05-11 | 주식회사 삼양사 | Method for preparing ion exchange resin with reduced metal impurity content |
| KR102346812B1 (en) | 2019-10-30 | 2022-01-04 | 주식회사 삼양사 | Method for preparing ion exchange resin with reduced metal impurity content |
| KR20210052740A (en) * | 2019-10-31 | 2021-05-11 | 주식회사 삼양사 | Method for purifying sugar-containing solution using acrylic-based ion exchange resin and styrene-based ion exchange resin |
| KR102302447B1 (en) * | 2019-10-31 | 2021-09-17 | 주식회사 삼양사 | Method for purifying sugar-containing solution using acrylic-based ion exchange resin and styrene-based ion exchange resin |
| KR20220056308A (en) * | 2020-10-27 | 2022-05-06 | 주식회사 삼양사 | Method for preparing ion exchange resin with reduced content of metallic impurities |
| KR102499164B1 (en) | 2020-10-27 | 2023-02-14 | 주식회사 삼양사 | Method for preparing ion exchange resin with reduced content of metallic impurities |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08337405A (en) | 1996-12-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR950014206B1 (en) | Method for purifying impure aqueous hydrogen peroxide solution | |
| US5733521A (en) | Process for producing a purified aqueous hydrogen peroxide solution | |
| JP3171058B2 (en) | Hydrogen peroxide water purification method | |
| JPS6260128B2 (en) | ||
| JP3021540B2 (en) | Purification method of alkali metal chloride aqueous solution | |
| US3432267A (en) | Regeneration of anthraquinone working solution used in the production of hydrogen peroxide | |
| JP3724247B2 (en) | Method for purifying hydrogen peroxide water | |
| US5614165A (en) | Process for purification of hydrogen peroxide | |
| JPH0920505A (en) | Purification of hydrogen peroxide aqueous solution | |
| JP3531403B2 (en) | Hydrogen peroxide water purification method | |
| JP4013646B2 (en) | Anion exchange resin, method for producing the same, and method for producing purified hydrogen peroxide water using the same | |
| JPH0912306A (en) | Method for refining aqueous hydrogen peroxide | |
| KR0151325B1 (en) | Production of pure hydrogen iodide | |
| JP3818323B2 (en) | Method for producing purified hydrogen peroxide | |
| JP2694163B2 (en) | Method for producing high-purity silica | |
| KR101121850B1 (en) | Process for the removal of the inorganic acid and metal impurities present in essentially alcoholic solutions of hydrogen peroxide coming from direct synthesis | |
| JP2800043B2 (en) | Purification of impure aqueous hydrogen peroxide solution | |
| JP3900211B2 (en) | Manufacturing method of high purity hydrogen peroxide solution | |
| US5976487A (en) | Process for purifying an aqueous solution of hydrogen peroxide | |
| JP3608211B2 (en) | Manufacturing method of high purity hydrogen peroxide solution | |
| JPH09278416A (en) | Production of high purity hydrogen peroxide solution | |
| KR102346921B1 (en) | Mixed bed ion exchange resin comprising anion exchange resin and cation exchange resin, method for preparing the same and method for purifying hydrogen peroxide solution using the same | |
| JPH11171508A (en) | Purification of aqueous hydrogen peroxide | |
| JP3861932B2 (en) | Method for producing purified hydrogen peroxide | |
| JP2608825B2 (en) | Purification method of aqueous hydrogen peroxide solution |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090323 Year of fee payment: 8 |
|
| RD05 | Notification of revocation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: R3D05 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090323 Year of fee payment: 8 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100323 Year of fee payment: 9 |
|
| LAPS | Cancellation because of no payment of annual fees |