JP3146428B2 - Metal composite material and manufacturing method thereof - Google Patents

Metal composite material and manufacturing method thereof

Info

Publication number
JP3146428B2
JP3146428B2 JP16377793A JP16377793A JP3146428B2 JP 3146428 B2 JP3146428 B2 JP 3146428B2 JP 16377793 A JP16377793 A JP 16377793A JP 16377793 A JP16377793 A JP 16377793A JP 3146428 B2 JP3146428 B2 JP 3146428B2
Authority
JP
Japan
Prior art keywords
composite material
metal composite
wire
molybdenum
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP16377793A
Other languages
Japanese (ja)
Other versions
JPH06344497A (en
Inventor
晃 市田
正 有川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ALMT Corp
Original Assignee
ALMT Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ALMT Corp filed Critical ALMT Corp
Priority to JP16377793A priority Critical patent/JP3146428B2/en
Priority to US08/157,295 priority patent/US5493153A/en
Publication of JPH06344497A publication Critical patent/JPH06344497A/en
Application granted granted Critical
Publication of JP3146428B2 publication Critical patent/JP3146428B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Pressure Welding/Diffusion-Bonding (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は,金属複合材料に関し,
詳しくは,半導体素子支持用の電極材料あるいは半導体
素子搭載用基板等に用いられる金属複合材料及びその製
造方法に関する。
The present invention relates to a metal composite material,
More specifically, the present invention relates to a metal composite material used for an electrode material for supporting a semiconductor element or a substrate for mounting a semiconductor element, and a method for manufacturing the same.

【0002】[0002]

【従来の技術】一般に,半導体装置には,アルミニウム
によって形成された放熱板が広く使用されている。ま
た,半導体集積回路をセラミック基板上に搭載し,この
セラミック基板を放熱板に取り付ける形式の半導体集積
回路装置も多数存在している。
2. Description of the Related Art Generally, a heat sink made of aluminum is widely used in semiconductor devices. There are also many semiconductor integrated circuit devices in which a semiconductor integrated circuit is mounted on a ceramic substrate and the ceramic substrate is mounted on a heat sink.

【0003】[0003]

【発明が解決しようとする課題】上述の半導体集積回路
装置を形成する場合,半導体集積回路を構成するシリコ
ン等,半導体材料の熱膨脹係数に近い材料,例えば,モ
リブデン,タングステンのような単独材料,又は,銅/
モリブデン,銅/タングステン等の複合材料が,放熱板
の材料として使用されているが,この種の半導体集積回
路装置は,放熱板の重量が重く,軽量化の点で問題があ
った。
When the above-mentioned semiconductor integrated circuit device is formed, a material close to the thermal expansion coefficient of the semiconductor material such as silicon constituting the semiconductor integrated circuit, for example, a single material such as molybdenum or tungsten, or ,copper/
Composite materials such as molybdenum and copper / tungsten have been used as the material of the heat sink, but this type of semiconductor integrated circuit device has a problem in that the heat sink is heavy and light.

【0004】一方,最近,半導体集積回路装置の軽量化
に対する要求が強くなってきている。
On the other hand, recently, there has been an increasing demand for weight reduction of semiconductor integrated circuit devices.

【0005】このように,軽量化を重視した半導体集積
回路装置においては,半導体集積回路を支持する基板だ
けでなく,放熱板を軽くすることも要求されている。こ
のような要求に応えるためには,放熱板を比較的密度の
低い材料,即ち,軽い材料で構成することが必要である
が,密度の低い材料は,一般にシリコン等の半導体材料
に比較して熱膨張率が高いため,上記軽量化の要求に応
え得る放熱板はいまだ開示されていないのが現状であ
る。
As described above, in a semiconductor integrated circuit device which emphasizes weight reduction, not only a substrate supporting the semiconductor integrated circuit but also a heat radiating plate is required to be light. In order to meet such demands, it is necessary to make the heatsink a relatively low-density material, that is, a light material. However, a low-density material is generally less than a semiconductor material such as silicon. At present, a radiator plate capable of meeting the above-mentioned demand for weight reduction has not yet been disclosed because of its high coefficient of thermal expansion.

【0006】具体的に言えば,本発明者等の実験によれ
ば,軽量化の要求に応えるために,23.0×10-6
上の熱膨脹率及び熱伝導率の間で不適当であるが,熱膨
脹率が10×10-6/℃程度であれば,充分使用に耐え
得ることが判明した。
More specifically, according to experiments performed by the present inventors, in order to meet the demand for weight reduction, it is inappropriate to have a thermal expansion coefficient and a thermal conductivity of 23.0 × 10 −6 or more. However, it was found that if the coefficient of thermal expansion was about 10 × 10 −6 / ° C., it could be sufficiently used.

【0007】そこで,本発明の技術的課題は,軽量化の
要求に応え得るとともに,熱膨張率,熱電導率の点でも
充分な金属複合材料及びその製造方法を提供することに
ある。
Accordingly, it is an object of the present invention to provide a metal composite material which can meet the demand for weight reduction and has a sufficient coefficient of thermal expansion and thermal conductivity, and a method for producing the same.

【0008】[0008]

【課題を解決するための手段】本発明者らは,延性を有
する金属系複合材料を基とし,しかも第1に軽量で低廉
な上,所望する熱特性を有する実用的複合材料の開発を
鋭意努力した結果,Al(エル)とMo又はWとの組み
合わせで,安定生産可能なものを見出した。
Means for Solving the Problems The present inventors diligently develop a practical composite material based on a ductile metal-based composite material, which is firstly lightweight, inexpensive, and has desired thermal characteristics. As a result of our efforts, we have found a stable combination of Al and Mo or W.

【0009】特に,Al(エル)はろう材はんだとの濡
れ性が良くない為,メッキ或いはクラッドを施し,さら
にMoについては,線材を単純に格子状にして挟むか
(以下,格子線),線材を網にすると比較的容易にいわ
ゆるAl(エル)・Mo・Al(エル)の積層構造を有
する複合部品を供し得る。
In particular, since Al (ell) has poor wettability with brazing filler metal solder, plating or cladding is applied, and for Mo, the wire is simply sandwiched in a grid shape (hereinafter referred to as a grid wire). When the wire is formed into a net, a composite component having a so-called Al (ell) .Mo.Al (ell) laminated structure can be provided relatively easily.

【0010】本発明によれば,基材をモリブデンとし,
合せ材をアルミニウムとするAl・Mo・Alとなる積
層構造を有し,10×10-6〜23.0×10-6/℃の
熱膨張係数を有し,前記モリブデンの基材は,網目状の
線材及び格子状の線材のうちの少なくとも一方であるこ
とを特徴とする金属複合材料が得られる。
According to the present invention, the base material is molybdenum,
The molybdenum base material has a laminated structure of Al.Mo.Al using aluminum as a joining material, has a coefficient of thermal expansion of 10 × 10 −6 to 23.0 × 10 −6 / ° C. A metal composite material characterized by being at least one of a wire in a shape and a wire in a lattice shape is obtained.

【0011】この場合,Mo線材に,例えば,Niメッ
キ又はNi薄板をクラッドにより圧着すれば,Al(エ
ル)とMoとを合わせる時のポア(空気溜り)が,Al
(エル)−Moの濡れが向上するため,完全に解消でき
る。また,Al(エル)−Moとの合わせ方としては,
冷間又は温間で圧延すれば良く,網状にしたものは,基
板にした際,Al(エル)の伸びに追随しやすく好まし
い。
In this case, if the Ni wire or the Ni thin plate is press-bonded to the Mo wire with a clad, for example, the pores (air pockets) at the time of joining Al (Mo) with Mo become Al.
(L) -Mo can be completely eliminated because the wettability of Mo is improved. Also, as a method of matching with Al (L) -Mo,
What is necessary is just to roll at a cold or warm state, and what was made into a net | network shape is preferable because it can follow the expansion | extension of Al (ell) when it forms a board | substrate.

【0012】本発明によれば,前記金属複合材料におい
て,前記合せ材は,半田又はロウ付け性を向上させるた
めのメッキ又はクラッドが施されていることを特徴とす
る金属複合材料が得られる。
According to the present invention, the metal composite material is characterized in that the bonding material is plated or clad for improving soldering or brazing properties.

【0013】本発明によれば,前記網目状のモリブデン
線材及び格子状のモリブデンの線材のうちの少なくとも
一方からなる基材に合せ材としてアルミニウムをAl・
Mo・Alとなるように重ねあわせて,圧延加工するこ
とを特徴とする金属複合材料の製造方法が得られる。
According to the present invention, aluminum is used as a matching material for a base material made of at least one of the mesh-like molybdenum wire and the lattice-like molybdenum wire.
A method for producing a metal composite material, characterized by stacking and rolling to obtain Mo · Al, is obtained.

【0014】本発明によれば,前記金属複合材料におい
て,前記合せ材は,半田又はロウ付け性を向上させるた
めのメッキ又はクラッド処理が施されていることを特徴
とする金属複合材料の製造方法が得られる。
According to the present invention, in the metal composite material, the composite material is subjected to plating or cladding for improving solderability or brazing property. Is obtained.

【0015】また,本発明の金属複合材料を放熱基板以
外の目的に使用する場合においては,熱膨張係数が前述
の市場要求(10〜23.0×10-6/℃,密度は4〜
5以下(Al(エル)2 3 又はMoの1/2以下))
の下方もしくはさらに小さいものを狙う場合,Moの線
径を増さず,格子線或いは網を2層以上に積み上げるの
が良い。
When the metal composite material of the present invention is used for a purpose other than a heat-radiating substrate, the coefficient of thermal expansion is in accordance with the above-mentioned market requirements (10-23.0 × 10 −6 / ° C .;
5 below (Al (El) 1/2 or less of the 2 O 3 or Mo))
When aiming at an area below or smaller than the above, it is preferable to stack the grid lines or nets in two or more layers without increasing the wire diameter of Mo.

【0016】[0016]

【実施例】以下,本発明の実施例について説明する。Embodiments of the present invention will be described below.

【0017】(実施例1)線径0.450mmのMo線か
ら呼び寸法710μmの網を作製した。すでに,表層グ
ラファイトは除去してあるため,一般の湿式ニッケルメ
ッキを施し,0.5μmの層厚を施した。次いで,厚さ
10mmのAl(エル)板2枚により,この網を挟み30
0℃にて圧延加工し,全体の層厚が10mmになるまで,
加工した。さらに,表面の平坦性を出すために,冷間圧
延も追加した。これにて,いわゆるMo網を基材とし,
Al(エル)を合せ材とする3層複合材料ができた。
Example 1 A net having a nominal size of 710 μm was prepared from a Mo wire having a wire diameter of 0.450 mm. Since the surface graphite has already been removed, general wet nickel plating is applied to give a layer thickness of 0.5 μm. Next, the mesh is sandwiched between two 10 mm thick Al plates.
Rolling at 0 ° C until the total layer thickness becomes 10mm
processed. In addition, cold rolling was added to increase the surface flatness. With this, the so-called Mo net is used as the base material,
A three-layer composite material using Al as a composite material was obtained.

【0018】図1は,本発明の実施例に係る金属複合材
料の金属組織を示す顕微鏡写真である。この写真で示す
ように,Mo線の周辺には,ポアの見当たらないことが
わかる。
FIG. 1 is a micrograph showing a metal structure of a metal composite material according to an example of the present invention. As shown in this photograph, it can be seen that no pore is found around the Mo line.

【0019】ここで,Al(エル)は亜鉛置換法により
Niメッキを行う。表面を脱脂後市販のアルカリ置換液
(ワールドメタル社AL−20)に,40℃,30秒浸
した後,スマット除去の為,HNO3 系酸液でエッチン
グを行う(上村工業AZ−201)。この後,NaO
H,ZnCl(エル)2 を主成分とする亜鉛置換液(キ
ザイ薬品,スーパージンケート)で表面処理を行い,最
後にワット浴にて,1A/dm2 でNiメッキを行う。
取り出し洗浄後,水素中で410℃×20分焼き付け処
理した所,1μmNiメッキ厚のものが得られた。
Here, Ni (Al) is plated with Ni by a zinc substitution method. After the surface is degreased, it is immersed in a commercially available alkaline replacement solution (AL-20, World Metal Co., Ltd.) for 30 seconds at 40 ° C., and then etched with a HNO 3 -based acid solution to remove smut (AZM-201, Uemura Kogyo). After this, NaO
A surface treatment is performed with a zinc-substituted solution (Hizai Chemical, Super Zincate) containing H, ZnCl (L) 2 as a main component, and finally, Ni plating is performed at 1 A / dm 2 in a Watt bath.
After taking out and washing, the film was baked in hydrogen at 410 ° C. for 20 minutes to obtain a Ni plating thickness of 1 μm.

【0020】この試片にて特性を調べた所,密度2.9
g/cm3 ,熱膨脹係数11.9×10-6/℃,熱伝導
率0.40cal/cm・sec ・℃であった。
When the characteristics of the test piece were examined, the density was 2.9.
g / cm 3 , coefficient of thermal expansion 11.9 × 10 −6 / ° C., and thermal conductivity 0.40 cal / cm · sec · ° C.

【0021】比較例としてWを考えてみる。W板の量産
安定性からみる使い易い板厚さは,0.1mmが限界であ
る。密度を実施例1の1.5倍に当たる4.4g/cm3
すべくAl(エル)・W・Al(エル)の三層構造の合
せ材を試作した場合,熱膨張係数は,8.0×10-6
℃となり,基板周辺の材料と合う望まれている比較的大
きい熱膨脹係数に比べ,かなり小さくなり,適さないも
のになった。
Consider W as a comparative example. From the standpoint of mass production stability of W-plates, the thickness of easy-to-use plates is limited to 0.1 mm. When a composite material having a three-layer structure of Al (Well) / W · Al (Well) was trial-produced to increase the density to 4.4 g / cm 3 , which is 1.5 times that of Example 1, the thermal expansion coefficient was 8. 0 × 10 -6 /
° C, which is much lower than the desired relatively large coefficient of thermal expansion that matches the material around the substrate, making it unsuitable.

【0022】[0022]

【発明の効果】以上説明したように,本発明の金属複合
材料は,内部ポア等無く,量産安定性に優れた金属複合
材料及びその製造方法を提供することができる。
As described above, the metal composite material of the present invention can provide a metal composite material having no internal pores and the like and excellent in mass production stability, and a method for producing the same.

【0023】また,本発明によれば,合せ材料がAl
(エル)であり,被研削性も良好な複合部品及びその製
造方法を提供することができる。
Further, according to the present invention, the joining material is Al
(G), and a composite part with good grindability and a method for producing the same can be provided.

【0024】しかも,本発明によれば,軽量で半田ろう
付け性の良好な放熱基板用の金属複合材料及びその製造
方法を提供することができる。
Moreover, according to the present invention, it is possible to provide a metal composite material for a heat radiation board which is lightweight and has good solder brazing properties, and a method for producing the same.

【0025】また,本発明によれば,比較的熱膨張係数
の大きい範囲,例えば,10〜23×10-6/℃で自由
に特性を調整できる金属複合材料及びその製造方法を提
供することができる。
Further, according to the present invention, it is possible to provide a metal composite material whose characteristics can be freely adjusted in a range having a relatively large coefficient of thermal expansion, for example, 10 to 23 × 10 −6 / ° C., and a method for producing the same. it can.

【0026】しかもまた,前述した半導体素子及びそれ
に係わらないが,この種の金属複合材料は,熱膨脹に着
目した材料への転換の可能性もある。
In addition, there is a possibility that this kind of metal composite material can be converted to a material which focuses on thermal expansion, although not related to the above-described semiconductor device and the above-mentioned metal composite material.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例に係る金属複合材料の金属組織
を示す顕微鏡写真である。
FIG. 1 is a micrograph showing a metal structure of a metal composite material according to an example of the present invention.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) B32B 15/01 B23K 20/04 ────────────────────────────────────────────────── ─── Continued on front page (58) Field surveyed (Int.Cl. 7 , DB name) B32B 15/01 B23K 20/04

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 基材をモリブデンとし,合せ材をアルミ
ニウムとするAl・Mo・Alとなる積層構造を有し,
10×10-6〜23.0×10-6/℃の熱膨張係数を有
し,前記モリブデンの基材は,網目状の線材及び格子状
の線材のうちの少なくとも一方であることを特徴とする
金属複合材料。
1. A laminated structure of Al.Mo.Al with a base material of molybdenum and a bonding material of aluminum,
It has a coefficient of thermal expansion of 10 × 10 −6 to 23.0 × 10 −6 / ° C., and the molybdenum base material is at least one of a mesh wire and a grid wire. Metal composite material.
【請求項2】 請求項1記載の金属複合材料において,
前記合せ材は,半田又はロウ付け性を向上させるための
メッキ又はクラッドが施されていることを特徴とする金
属複合材料。
2. The metal composite material according to claim 1, wherein
A metal composite material, wherein the bonding material is plated or clad for improving solderability or brazing property.
【請求項3】 網目状のモリブデン線材及び格子状のモ
リブデンの線材のうちの少なくとも一方からなる基材に
合せ材としてアルミニウムをAl・Mo・Alとなるよ
うに重ねあわせて,圧延加工することを特徴とする金属
複合材料の製造方法。
3. A method in which aluminum is superimposed on a base material made of at least one of a mesh-like molybdenum wire and a lattice-like molybdenum wire so as to become Al.Mo.Al, and rolled. A method for producing a metal composite material characterized by the following.
【請求項4】 請求項3記載の金属複合材料において,
前記合せ材は,半田又はロウ付け性を向上させるための
メッキ又はクラッド処理が施されていることを特徴とす
る金属複合材料の製造方法。
4. The metal composite material according to claim 3,
A method for manufacturing a metal composite material, wherein the bonding material is subjected to plating or cladding for improving soldering or brazing properties.
JP16377793A 1992-11-26 1993-06-10 Metal composite material and manufacturing method thereof Expired - Fee Related JP3146428B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP16377793A JP3146428B2 (en) 1993-06-10 1993-06-10 Metal composite material and manufacturing method thereof
US08/157,295 US5493153A (en) 1992-11-26 1993-11-26 Plastic-packaged semiconductor device having a heat sink matched with a plastic package

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16377793A JP3146428B2 (en) 1993-06-10 1993-06-10 Metal composite material and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH06344497A JPH06344497A (en) 1994-12-20
JP3146428B2 true JP3146428B2 (en) 2001-03-19

Family

ID=15780525

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16377793A Expired - Fee Related JP3146428B2 (en) 1992-11-26 1993-06-10 Metal composite material and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JP3146428B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3127649A4 (en) * 2014-03-31 2017-08-23 UACJ Corporation Aluminum clad material manufacturing method

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6247593B2 (en) * 2014-05-15 2017-12-13 株式会社Uacj Method for producing aluminum clad material
JP6204247B2 (en) * 2014-03-31 2017-09-27 株式会社Uacj Method for producing aluminum clad material

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3127649A4 (en) * 2014-03-31 2017-08-23 UACJ Corporation Aluminum clad material manufacturing method

Also Published As

Publication number Publication date
JPH06344497A (en) 1994-12-20

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