JP3135719B2 - Method and apparatus for removing residual film around LCD color filter substrate - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a liquid crystal display (L).
The present invention relates to a method and an apparatus for removing a residual film adhered to a peripheral portion of a glass substrate in a process of manufacturing a color filter for CD).

[0002]

2. Description of the Related Art As a color filter of an LCD, for example, a colored polyimide resin film in which a dye or a pigment is dispersed is applied on a surface of a glass substrate (hereinafter simply referred to as a substrate) by a spin coater, and a positive resist is applied thereon. It is manufactured by a method of obtaining a predetermined pattern by exposing, developing and etching. In the process of manufacturing such a color filter, since a colored resin and a positive resist are applied by a spin coater, a part thereof is left as a burred thick film on the peripheral edge of the substrate. The remaining film at the peripheral portion of the substrate is peeled in a later step, and is mixed as a foreign substance into the coating film surface due to falling off and the like, which causes a defect.
A physical removal method of shaving with a brush, cutter, squeegee, or the like has been employed.

[0003]

However, the above-mentioned conventional method of physically removing the residual film at the peripheral portion of the substrate has caused problems such as reattachment of shavings and environmental pollution of a clean room.
An object of the present invention is to solve the conventional problem by dissolving and removing the residual film at the peripheral portion of the substrate by a chemical treatment.

[0004]

According to the present invention, a peripheral portion of a color filter substrate is immersed in a dilute alkaline solution mixed with a surfactant , washed by blowing pure water, and dried by blowing clean air. This is a method for removing the residual film around the LCD color filter substrate, and a substrate setting portion for vertically setting the color filter substrate, a bottom inclination check portion for the color filter substrate, a dilute alkaline liquid immersion portion, and a pure water injection nozzle. A washing unit having a cleaning unit and a drying unit having a clean air injection nozzle are provided side by side. Further, a substrate holding unit which holds the color filter substrate vertically and is rotatable in the vertical direction by the substrate setting unit is provided. Wherein the color filter substrate is moved up, down, left and right so that the color filter substrate is transferred to the respective portions. That.

[0005]

The present invention will be described below in the order of the remaining film removing step. (1) Substrate setting The substrate is set vertically on the substrate setting section. (2) Substrate holding The substrate holding unit is moved to the substrate setting unit, the size of the substrate is determined by a sensor, and the center of the back surface of the substrate is suction-held. (3) Substrate transfer The substrate is transferred to the bottom tilt check unit by the substrate holding unit. (4) Bottom tilt check Check the position and tilt of the bottom of the board with a sensor.
The substrate is rotated by the substrate holding unit so as to be horizontal, and the correction is performed. (5) Substrate transfer The substrate whose bottom has been corrected horizontally is transferred to the dilute alkaline liquid immersion section by the substrate holding section. (6) Peeling treatment In a dilute alkali liquid immersion part, the bottom of the substrate is immersed in a dilute alkaline liquid (normal temperature) such as NaOH or KOH having a concentration of about 3 to 10% to a depth of about 5 mm for a certain time (about 150 seconds). Hold and dissolve the remaining film on the bottom. It is preferable that a surfactant is added to the diluted alkaline solution in order to prevent the diluted alkaline solution from splashing on the pattern portion of the substrate when the substrate is taken in and out. (7) Transferring the substrate The substrate after the peeling process on the bottom is transferred to the washing unit by the substrate holding unit. (8) Rinse treatment In the rinsing part, pure water is sprayed on both surfaces of the substrate from a pure water spray nozzle, and the substrate is moved by the substrate holding part to wash away the dilute alkaline liquid adhering to the substrate, thereby cleaning the bottom of the substrate. . (In the method of immersing the bottom of the substrate in pure water, the diluted alkaline solution adhering to the substrate is mixed with the pure water, so that the substrate cannot be sufficiently washed, or the liquid may splash when the substrate is immersed. (9) Transferring the substrate The substrate after cleaning is transferred to the drying unit by the substrate holding unit. (10) Drying process In the drying unit, clean air is blown onto both surfaces of the substrate from a clean air injection nozzle, and drying is performed while moving the substrate in the substrate holding unit. After the removal of the residual film on one side of the substrate in this manner, the substrate is moved to a predetermined place by the substrate holding unit, rotated by 90 degrees, and then moved again from the substrate transfer of (3) to (10). Is repeated, and the substrate after the processing on the four sides is removed from the substrate holding unit. The removal of the residual film is performed before or after pattern development for each of R, G and B colors due to the process.

[0006]

Embodiments of the present invention will be described below with reference to the drawings. 1 is a front view of the apparatus of the present invention, FIG. 2 is a side view of FIG. 1, and FIG. 3 is a plan view of FIG. 1. On a gantry A, an L-shaped guide plate 12 having a bottom plate portion 14, The guide plate 12 includes a moving body 17 that moves by an air cylinder or the like that moves the guide plate 12 to the suction head 62 side of a substrate holding unit 61 described later, and a moving mechanism 19 that supports a rail 18.
A board setting section 11 to be set on the mold guide plate 12 is provided, and a bottom slope check section 21 for judging the slope of the bottom of the board 1 on which _three sensors 22 ₁ , 22 ₂ , and 22 ₃ are provided below. Have been. Further, on the gantry A, a dilute alkaline liquid immersion section 31 composed of a tank 33 having an open top surface containing a dilute alkaline liquid 32 such as NaOH or KOH having a concentration of 3 to 10%, and a pure water pipe (not shown) are connected. A rinsing unit 41 provided with a pure water injection nozzle 42 for injecting pure water obliquely downward, and a drying unit 51 provided with a clean air injection nozzle 52 connected to a clean air pipe (not shown).
Are juxtaposed. Reference numeral 61 denotes a substrate holding unit which is provided on a movable member 73 which moves horizontally along a horizontal guide 72 so as to be able to move up and down and which can move up and down. A suction head connected to a vacuum source at the lower end thereof to suck the substrate 1. A pulse motor 63 for rotating the suction head 62 and the suction head 62 is provided, and the substrate holding unit 61 can be moved to the substrate setting unit 11, the bottom tilt check unit 21, the dilute alkaline liquid immersion unit 31, the washing unit 41, and the drying unit 51. It has become.

[0007] The substrate 1 is connected to the L
It is set vertically on the mold guide plate 12. Next, the substrate holding unit 61 is moved to the substrate setting unit 11, the substrate 1 is moved to the substrate holding unit 61 together with the L-shaped guide plate 12 by the moving body 17, the size of the substrate is determined by the sensor, and the center of the rear surface of the substrate is moved. The suction head 62 holds by suction. After transferring the substrate 1 to the bottom-side tilt check unit 21, the substrate holding unit 61 holding the substrate 1 by suction holds the three sensors 22 ₁ , 22 ₂ , 22 _3.
The inclination of the bottom of the substrate is detected, and the suction head 62 is rotated by the pulse motor 63 to correct the inclination of the bottom of the substrate horizontally. The substrate 1 whose bottom is corrected horizontally is immersed in the alkaline solution 32 of the dilute alkaline solution immersion section 31 horizontally for a certain period of time by ascending, horizontally moving, and descending the substrate holding portion 61, and adheres to the bottom. The remaining film is dissolved and peeled off. The substrate 1 from which the remaining film on the bottom has been peeled off is lifted, horizontally moved, and lowered again by the substrate holding section 61, and the water washing section 41 is moved again.
Is transferred to the drying unit 51 while being sprayed with pure water from the pure water injection nozzle 41 to both surfaces of the substrate 1 while moving horizontally, and reaches the drying unit 51, and is further moved from the clean air injection nozzle 52 to both surfaces of the substrate 1 while moving horizontally. Clean air is blown and dried. After removing the residual film on one side of the substrate 1 in this manner, the substrate holding unit 61 is moved up, and the suction head 62 is rotated by the pulse motor 63 to rotate the substrate 1 by 90 degrees, and the adjacent one side is rotated. The above operation is repeated, and after the processing of the four sides is completed, the substrate 1 is returned to the substrate setting unit 11 and removed from the substrate holding unit 61, and then the moving body 1
7, the L-shaped guide plate 12 returns to the original position, and is replaced with the next substrate 1.

Further, a preferred embodiment of the bottom inclination check section 21 will be described in detail. The bottom tilt check unit is configured to detect the displacement of the substrate 1 held by the substrate holding
It detects the inclination of the base due to the deviation of the squareness of the sides, corrects the inclination, and immerses the base horizontally in a dilute alkaline liquid. The three sensors 22 ₁ , 22 ₂ , 22 at the bottom
₃ are juxtaposed at the same level at equal intervals, the inclination of the bottom of the substrate is detected with these, and the suction head 6 is
2 is rotated to correct the inclination of the bottom side of the substrate horizontally. By the way, since most of the residual film in the peripheral portion of the substrate is within 5 mm from the end portion, the immersion depth of the bottom of the substrate in the dilute alkaline liquid is within 5 mm, so that it is affected by slight inclination. However, with three sensors of the same level, the detection may flap and the detection time may be too long. Therefore, as shown in FIG. 4, the three sensors 22 ₁ , 22 ₂ , 2
2 ₃ attachment is, for the height direction sensor 22 ₁ and 2
2 ₃ is set to be the same level with respect to the reference plane, the sensor 22 ₂ is lowered by x the level of the sensor 22 ₁ and 22 ₃ between the sensor 22 ₁ and 22 _3. In the left-right direction, the sensor 22 ₂ is on the rotation center line of the substrate, and the sensors 22 ₁ and 22 ₃ are slightly narrower than the width of the substrate.
Set in positions symmetrical with respect to 2 _2. Specifically, the inclination tolerance of the substrate 1, in order to satisfy the conditions within 1mm on both ends of the maximum size 400mm, the distance between the sensor 22 ₁ and 22 _3: 240 mm (for the minimum size 300 mm) sensor The difference between the heights of the sensors 22 ₁ and 22 ₃ and the sensor 22 ₂ (x): 0.2 mm Resolution of the pulse motor 63: 10000 pulses / rotation 0.0036 ° / pulse. It can be changed freely according to the tolerance. FIG. 5 shows an operation flow in the bottom tilt check unit 21 according to the example of FIG. Further, an example of the processing conditions of the present invention is a mixture of a 5% aqueous NaOH solution and a 0.1% surfactant (Afamel F70 manufactured by NOF Corporation) in a volume ratio. Liquid temperature Normal temperature Immersion time 10 seconds When the liquid temperature is increased, the immersion time can be shortened, and the immersion time varies depending on the type and amount of the dye in the remaining film. Immersion depth: 5 mm from the bottom of the substrate. Cleaning Spraying pure water at room temperature. Water pressure 0.3 kgf / cm ² , substrate moving speed 38 mm / sec. Drying Clean air spray at room temperature. Air pressure 2.5kgf / cm
^{2. The} moving speed is 38mm / sec.

[0009]

As described above, according to the present invention, L
The residual film around the CD color filter substrate is chemically dissolved and removed without affecting the pattern portion. The generation of foreign substances due to the peeling of the residual film in the subsequent process is drastically reduced, the defective rate of the color filter is reduced, and the clean room There is no environmental pollution, and an extremely beneficial effect is obtained such that the number of remaining film removal lines is increased in accordance with the number of processed sheets and the automatic supply / discharge unit is installed to reduce the number of workers.

[Brief description of the drawings]

FIG. 1 is a front view showing an embodiment of the apparatus of the present invention.

FIG. 2 is a side view of FIG.

FIG. 3 is a partially omitted plan view of FIG. 1;

FIG. 4 is an enlarged explanatory view of a bottom surface tilt check unit in FIG. 1;

FIG. 5 is a flowchart of an operation of a bottom tilt check unit.

[Explanation of symbols]

Reference Signs List A base 1 substrate 11 substrate setting section 12 L-shaped guide plate 14 bottom plate section 17 moving body 18 rail 19 moving mechanism 21 bottom inclination check section 22 ₁ sensor 22 ₂ sensor 22 ₃ sensor 31 dilute alkaline liquid immersion section 32 dilute alkaline liquid 33 tank Reference Signs List 41 Rinse part 42 Pure water injection nozzle 51 Drying part 52 Clean air injection nozzle 61 Substrate holding part 62 Suction head 63 Pulse motor 72 Horizontal guide 73 Moving member

Continuation of the front page (72) Inventor Tadahiro Furukawa 4-14-12 Koishikawa, Bunkyo-ku, Tokyo Kyodo Printing Co., Ltd. (56) References JP-A-2-157776 (JP, A) JP-A-62-264025 (JP, A) JP-A-4-190362 (JP, A) JP-A-4-20051 (JP, U) (58) Fields investigated (Int. Cl. ⁷ , DB name) G02B 5/20 101 G02F 1 / 13 101 G02F 1/1335 500

Claims (3)

(57) [Claims] 1. The surface of a color filter substrate is surface-active.
A method for removing residual film around an LCD color filter substrate, comprising: immersing in a dilute alkali solution mixed with an agent, cleaning by spraying with pure water, and blowing and drying with clean air. 2. The color filter substrate is set vertically.
Substrate setting part, bottom tilt check of color filter substrate
Section, dilute alkaline liquid immersion section, water washing with pure water injection nozzle
Section, a drying section equipped with a clean air injection nozzle
Further, the color filter substrate is vertically set in the substrate setting section.
A substrate holding portion that holds and can rotate vertically is provided,
The color filter substrate is transferred to the respective portions of the substrate holding portion.
Characterized by being movable up, down, left and right as described above.
Device for removing residual film around the CD color filter substrate. 3. A bottom tilt checker of the color filter substrate.
The lock section has three sensors arranged side by side at the bottom,
Set the level of the center sensor to the same
Ri removing apparatus LCD color filter substrate peripheral portion remaining film according to claim 2, characterized in that low.