JP3066798B2 - Surface treatment method for sliding members - Google Patents

Surface treatment method for sliding members

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Publication number
JP3066798B2
JP3066798B2 JP8271919A JP27191996A JP3066798B2 JP 3066798 B2 JP3066798 B2 JP 3066798B2 JP 8271919 A JP8271919 A JP 8271919A JP 27191996 A JP27191996 A JP 27191996A JP 3066798 B2 JP3066798 B2 JP 3066798B2
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JP
Japan
Prior art keywords
electroless
plating film
heat treatment
content
hardness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP8271919A
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Japanese (ja)
Other versions
JPH1096084A (en
Inventor
眞一 岡本
泰史 山口
義彰 北河
賢一 近藤
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Taiho Kogyo Co Ltd
Original Assignee
Taiho Kogyo Co Ltd
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ロータリー型コン
プレッサー用ベーン又はデファレンシャル、トランスミ
ッション用ワッシャ等の片当り又は局部荷重が加わるよ
うな高負荷で使用される部位に使用されるアルミニウム
合金からなる素材に摺動特性の向上を目的とする表面処
理を施す方法に関するものである。
The present invention relates to a material made of an aluminum alloy used for a part used under a high load such as a vane or a differential for a rotary type compressor, a washer for a transmission, or a partial load to which a local load is applied. The present invention relates to a method for performing a surface treatment for the purpose of improving sliding characteristics.

【0002】[0002]

【従来の技術】上記したコンプレッサーなどでは軽量化
のために相手材がアルミのことが多く、アルミどうしの
摺動となるために次のような表面処理がベーンに施され
ている。その一つでは、例えばベーン表面に耐摩耗性に
優れた無電解Ni−Pめっきもしくは無電解Ni−Bめ
っきを施すことである。次に、無電解Ni−Pめっき皮
膜に硬質物、固体潤滑剤を分散させることにより摺動特
性を向上することも行われている。また、無電解Ni−
Pめっきを300℃以下に加熱することにより硬化させ
耐摩耗性を向上させることも行われている。
2. Description of the Related Art In the above-mentioned compressors and the like, the counterpart material is often aluminum for weight reduction, and the following surface treatment is applied to the vanes to cause sliding between aluminum. One of them is to apply, for example, electroless Ni-P plating or electroless Ni-B plating having excellent wear resistance to the vane surface. Next, the sliding characteristics are also improved by dispersing a hard material and a solid lubricant in the electroless Ni-P plating film. In addition, electroless Ni-
Heating the P plating to 300 ° C. or lower to improve the wear resistance is also performed.

【0003】一般に摺動部材の表面処理に使用されてい
る無電解Ni−PめっきはP含有量が6〜10%の中・
高P型であって、めっき後のHv450〜500の硬度
が熱処理によりHv700〜800という極めて高い硬
度まで上昇する。例えば特開昭64−32087号公報
によるとベーンにNi含有量が8〜10%の無電解Ni
−Pめっき皮膜を形成し、熱処理によりHv700〜8
00程度まで硬度を上昇させている。しかしアルミニウ
ム合金の場合、高い熱処理温度では材料強度を低下させ
るため、熱処理温度に限界があり、実質的にHv500
〜600程度の硬度をもつ皮膜しか得られない。
[0003] In general, electroless Ni-P plating used for surface treatment of sliding members has a P content of 6 to 10%.
It is a high P type, and the hardness of Hv450-500 after plating increases to an extremely high hardness of Hv700-800 by heat treatment. For example, according to Japanese Patent Application Laid-Open No. 64-32087, an electroless Ni having a Ni content of 8 to 10%
-P plating film is formed and Hv700-8 by heat treatment
The hardness is increased to about 00. However, in the case of an aluminum alloy, since the material strength is reduced at a high heat treatment temperature, there is a limit to the heat treatment temperature, and substantially Hv 500
Only a film having a hardness of about 600 can be obtained.

【0004】[0004]

【発明が解決しようとする課題】従来、摺動部材の表面
に施されるNi−Pめっき皮膜は熱処理により高い硬度
が得られる中・高P型のものが使用されていたが、耐摩
耗性は期待されたレベルには達しなかった。特に、ベー
ンの相手材であるロータ、ハウジングのAl−Si合金
中の初晶Siが50μm以上に粗大になりかつ/または
Si粒子個数が300個/mm2 以上と多くなると高P
型無電解めっき皮膜に異常摩耗が発生した。また荷重が
増大したときベーンの面圧が増大し同様に異常摩耗が発
生した。
Conventionally, the Ni-P plating film applied to the surface of the sliding member has been of a medium / high P type which can obtain high hardness by heat treatment. Did not reach the expected level. In particular, if the primary crystal Si in the Al-Si alloy of the rotor and the housing, which is the partner material of the vane, becomes coarse to 50 μm or more and / or the number of Si particles becomes 300 particles / mm 2 or more, the high P
Abnormal wear occurred on the electroless plating film. Further, when the load was increased, the surface pressure of the vane was increased, and abnormal wear was also caused.

【0005】[0005]

【課題を解決するための手段】本発明者は、無電解Ni
−Pめっき皮膜が施されたアルミニウム合金からなる素
材の摺動特性を改良するべく鋭意研究したところ、意外
にも熱処理温度が低い場合の硬度が高い低P型無電解め
っき皮膜に特定の表面硬化処理を施すことが有効である
ことを見出した。この知見により完成した、本発明の第
一の方法は、アルミニウム合金からなる素材の摺動面に
形成されたP含有量が0.1〜5重量%の無電解Ni−
Pめっき皮膜にバレル研摩処理を施す方法であり、本発
明の第二の方法は、アルミニウム合金からなる素材の摺
動面に形成されたP含有量が0.1〜5重量%の無電解
Ni−Pめっき皮膜にショットブラスト処理を施す方法
であり、本発明の第三の方法は、アルミニウム合金から
なる素材の摺動面に形成されたP含有量が0.1〜5重
量%の無電解Ni−Pめっき皮膜にレーザービームを照
射する方法である。本発明の第四の方法は、アルミニウ
ム合金からなる素材の摺動面に形成されたP含有量が
0.1〜5重量%の無電解Ni−Pめっき皮膜に高周波
誘導熱処理を施す方法である。以下、本発明を詳細に説
明する。
The present inventor has proposed an electroless Ni.
After extensive research to improve the sliding characteristics of the aluminum alloy material coated with the -P plating film, surprisingly, a low P-type electroless plating film with a high hardness when the heat treatment temperature is low is specially hardened. It has been found that it is effective to perform the treatment. The first method of the present invention, which has been completed based on this finding, is based on electroless Ni-containing alloy having a P content of 0.1 to 5% by weight formed on a sliding surface of a material made of an aluminum alloy.
The second method of the present invention is a method of subjecting a P plating film to a barrel polishing treatment. The second method of the present invention is a method of electroless Ni having a P content of 0.1 to 5% by weight formed on a sliding surface of a material made of an aluminum alloy. The third method of the present invention is a method of subjecting a P plating film to a shot blast treatment, wherein a P content of 0.1 to 5% by weight is formed on a sliding surface of a material made of an aluminum alloy. This is a method of irradiating the Ni-P plating film with a laser beam. The fourth method of the present invention is a method of subjecting an electroless Ni-P plating film having a P content of 0.1 to 5% by weight formed on a sliding surface of a material made of an aluminum alloy to a high-frequency induction heat treatment. . Hereinafter, the present invention will be described in detail.

【0006】本発明において無電解Ni−Pめっき皮膜
として、P含有量が0.1〜5重量%の低P型を選んで
いるのは、P含有量が少ないためにNiの結晶格子の歪
が少ない結晶質に近く、これにバレル研摩処理、ショッ
トブラスト処理、レーザービーム処理及び高周波誘導熱
処理を施しても結晶が大きく歪まず変形や溶融が一様に
進行するために、摺動特性の上で好ましい結晶構造や高
い皮膜硬さ等の表面状態が得られからである。例えば、
めっき後表面には結晶粒界が認められるが、例えばバレ
ル研摩やショットブラスト処理により表面が押しつぶさ
れるに伴い表面近傍で結晶粒界がなくなり、より平滑で
硬質な状態が得られる。無電解Ni−Pめっき皮膜のP
含有量が0.1%未満であると無電解めっき自体が困難
であり、また耐焼付性の面で摺動特性は優れない。一方
P含有量が5重量%を超えると、組織がNi3 Pと非晶
質構造の複合組織となり易い。この組織ではNi3 P析
出界面、結晶粒界などの変形し易い場所が多いために外
力が加わると不均一変形が起こり易い。またレーザービ
ームによる高密度エネルギーが加えられると、融液の液
相線と固相線の差が大きいために凝固後の偏析が大きく
なり、また融液の流動が激しく結晶歪みが大きくなる。
なお、好ましいP含有量は1〜3重量%である。無電解
Ni−Pめっき皮膜の厚さは5〜40μmが一般的であ
り、より好ましくは10〜20μmである。
In the present invention, the low P type having a P content of 0.1 to 5% by weight is selected as the electroless Ni-P plating film because the P content is small and the strain of the Ni crystal lattice is low. It is almost crystalline, and even if it is subjected to barrel polishing, shot blasting, laser beam treatment, and high-frequency induction heat treatment, the crystal will not be significantly distorted and deformation and melting will proceed uniformly. This is because a preferable crystal structure and a surface state such as high film hardness can be obtained. For example,
Grain boundaries are observed on the surface after plating. However, as the surface is crushed by, for example, barrel polishing or shot blasting, the crystal grain boundaries disappear near the surface, and a smoother and harder state is obtained. P of electroless Ni-P plating film
If the content is less than 0.1%, electroless plating itself is difficult, and sliding characteristics are not excellent in terms of seizure resistance. On the other hand, if the P content exceeds 5% by weight, the structure tends to be a composite structure of Ni 3 P and an amorphous structure. In this structure, since there are many easily deformable places such as a Ni 3 P precipitation interface and a crystal grain boundary, non-uniform deformation is likely to occur when an external force is applied. When high-density energy is applied by a laser beam, segregation after solidification increases due to a large difference between the liquidus line and solidus line of the melt, and the melt flows violently and crystal distortion increases.
The preferred P content is 1 to 3% by weight. The thickness of the electroless Ni—P plating film is generally 5 to 40 μm, and more preferably 10 to 20 μm.

【0007】本発明の第一で採用されるバレル研摩は、
ベーン、研摩媒体としてのポリエステル系メディア材等
のバレル材及び水を回転容器の中に入れて回転もしくは
振動を行い、めっき皮膜表面を平滑にしかつ硬化する処
理である。研摩条件としては、回転数240rpm,時
間5minを好ましく採用することができる。低P無電
解めっき皮膜をバレル研摩した後の組織を、走査型電子
顕微鏡により観察したところ、高P無電解めっき皮膜と
は均一性に本質的に差があった。
The barrel polishing employed in the first embodiment of the present invention is as follows.
This is a process in which a vane, a barrel material such as a polyester-based media material as a polishing medium, and water are put into a rotating container and rotated or vibrated to smoothen and harden the plating film surface. As the polishing conditions, a rotation speed of 240 rpm and a time of 5 min can be preferably adopted. The structure of the low-P electroless plating film after barrel polishing was observed by a scanning electron microscope. As a result, there was essentially a difference in uniformity from the high-P electroless plating film.

【0008】本発明の第二で採用されるショットブラス
ト処理は鋼などの粒子を高速で無電解めっき面に衝突さ
せ、表面に圧縮応力を発生させる処理である。より好ま
しくは、ショットにより無電解Ni−P皮膜の温度を再
結晶温度以上に高めるとともに、めっき表面においてあ
る程度の塑性変形を招いて、めっき直後とは異なる結晶
形態の微細組織を発生させる条件を設定する。具体的に
はショット粒子は、硬度がHv600以上のスチール又
はAl23 等の硬質ビーズ、又はカーボン等を使用
し、粒径は0.03〜0.4mmの範囲とし、投射速度
は80m/sec以上とする。低P無電解めっき皮膜の
組織を光学顕微鏡により観察した写真(倍率1000
倍)を図1に示し、高P無電解めっき皮膜の写真(倍率
1000倍)を図4に示す。この比較より低Pの無電解
めっき皮膜では組織が微細かつ緻密になっていることが
分かる。また、ショットブラスト処理した後の写真(倍
率1000倍)及びバレル研磨した後の写真(倍率10
00倍)を各々図2、3に示す。これら処理をすること
により、組織がさらに微細・緻密になっている。
[0008] The shot blasting process employed in the second aspect of the present invention is a process in which particles such as steel collide with the electroless plating surface at high speed to generate a compressive stress on the surface. More preferably, the conditions for raising the temperature of the electroless Ni-P film by the shot to a temperature equal to or higher than the recrystallization temperature and causing a certain degree of plastic deformation on the plating surface to generate a microstructure having a crystal form different from that immediately after plating are set. I do. The shot particles Specifically, hardness using Hv600 or more steel or hard beads such as Al 2 O 3, or carbon, etc., the particle size in the range of 0.03~0.4Mm, projection speed 80 m / sec or more. Photograph of the structure of the low-P electroless plating film observed with an optical microscope (1000 magnification).
1) and FIG. 4 shows a photograph (1000 times magnification) of the high-P electroless plating film. From this comparison, it can be seen that the structure of the low P electroless plating film is fine and dense. Further, a photograph after the shot blasting treatment (magnification 1000 times) and a photograph after the barrel polishing (magnification 10 times)
2 and 3 are shown in FIGS. By performing these treatments, the structure is further refined and dense.

【0009】本発明の第三で採用されるレーザー照射処
理は、無電解Ni−Pめっき皮膜を瞬間的かつ局部的に
溶融させる処理であって、この結果融液は周囲のNi−
P及び基材に熱を奪われて凝固する。この場合溶融を、
局部的に行うので、融液からの奪熱量が非常に多くなり
急冷凝固となり、PがNi結晶中に強制的に固溶されて
硬化が起こりかつ結晶粒も微細になる。レーザーの種類
としては、特に制限はないが、100〜400W/cm
2 (ビーム面積)程度の出力を有するYAGパルスレー
ザーを好ましく使用することができる。レーザー照射の
操作はレーザーガンと摺動部材を相対移動させ、後者の
全面に順次前者のスポットが照射されるように適宜治具
を使用して行う。
The laser irradiation treatment employed in the third aspect of the present invention is a treatment for instantaneously and locally melting the electroless Ni-P plating film.
The heat is deprived by the P and the base material to solidify. In this case, melting
Since the heat treatment is performed locally, the amount of heat removed from the melt becomes extremely large, causing rapid solidification, and P is forcibly dissolved in the Ni crystal to cause hardening and the crystal grains become fine. The type of laser is not particularly limited, but is 100 to 400 W / cm.
A YAG pulse laser having an output of about 2 (beam area) can be preferably used. The laser irradiation operation is performed by appropriately moving the laser gun and the sliding member, and using an appropriate jig so that the former spot is sequentially irradiated on the entire surface of the latter.

【0010】次に、レーザー照射による硬化の一例を示
す。レーザー照射条件は下記のとおりである。なお表1
よりP=1.0〜4.5%範囲で極めて大きな硬化が起
こることが分かる。 レーザー種類:YAGパルス レーザー出力:100〜400W/cm2 レーザービーム直径:2cm レーザー走査速度:10cm/sec 無電解Ni−P皮膜:厚さ0.02mm
Next, an example of curing by laser irradiation will be described. Laser irradiation conditions are as follows. Table 1
It can be seen that extremely large curing occurs in the range of P = 1.0 to 4.5%. Laser type: YAG pulse Laser output: 100-400 W / cm 2 Laser beam diameter: 2 cm Laser scanning speed: 10 cm / sec Electroless Ni-P coating: thickness 0.02 mm

【0011】 [0011]

【表1】 めっき皮膜硬度(Hv) P含有量(wt%) レーザー照射前 レーザー照射後 0.2 480 490 1.0 640 860 2.0 650 910 3.0 620 870 4.5 580 840 6 550 830 TABLE 1 Plating film hardness (Hv) P content (wt%) Before laser irradiation After laser irradiation 0.2 480 490 1.0 640 860 2.0 650 910 3.0 620 870 4.5 580 840 650 550 830

【0012】本発明の第四で採用される高周波熱処理は
上記したPの強制固溶を高周波誘導加熱により行うもの
である。高周波加熱は母材であるアルミ合金の温度が好
ましくは220℃以下に保たれるようにNiのキュリー
点(631K)をめっき皮膜の温度が超えず、渦電流が
めっき皮膜に集中し母材にはできるだけ流れないように
する必要がある。高周波の周波数は70kHz以上が好
ましい。
The high frequency heat treatment employed in the fourth aspect of the present invention is to perform the above-mentioned forced solid solution of P by high frequency induction heating. In the high-frequency heating, the temperature of the plating film does not exceed the Curie point of Ni (631 K) so that the temperature of the aluminum alloy as the base material is preferably maintained at 220 ° C. or less, and eddy current concentrates on the plating film and the base material Should be as low as possible. The high frequency is preferably 70 kHz or more.

【0013】次に、高周波熱処理による硬化の一例を示
す。高周波熱処理条件は下記のとおりである。なお、表
2によりP=1.0〜4.5%の範囲で極めて大きな硬
化が起こることが分かる。 周波数:100kHz 高周波出力:80KW 無電解Ni−P皮膜:厚さ0.02mm
Next, an example of hardening by high frequency heat treatment will be described. The induction heat treatment conditions are as follows. Table 2 shows that extremely large curing occurs in the range of P = 1.0 to 4.5%. Frequency: 100kHz High frequency output: 80KW Electroless Ni-P coating: thickness 0.02mm

【0014】 [0014]

【表2】 めっき皮膜硬度(Hv) P含有量(wt%) 高周波熱処理前 高周波熱処理後 0.2 480 490 1.0 640 880 2.0 650 920 3.0 620 860 4.5 580 850 6 550 830 [Table 2] Plating film hardness (Hv) P content (wt%) Before induction heat treatment After induction heat treatment 0.2 480 490 1.0 640 880 2.0 650 920 3.0 620 860 4.5 4.5 580 850 6 550 830

【0015】上記した本発明の第一〜第四の処理を施さ
れる低P無電解Ni−Pめっき皮膜の素材に対する密着
性を高めるために下地として中・高P無電解Ni−Pめ
っき皮膜を施すことが好ましい。後者の中・高P皮膜
は、優れた密着性を利用するために下地として利用し、
また上記硬化処理による欠点が現れないように低P無電
解Ni−Pめっき皮膜の下地として使用している。高P
無電解Ni−Pめっき皮膜のP含有量は5〜15重量%
が好ましい。より好ましいP含有量は5〜8重量%であ
る。
In order to enhance the adhesion of the low-P electroless Ni-P plating film subjected to the first to fourth treatments of the present invention to a material, a medium-high P electroless Ni-P plating film is used as a base. Is preferably applied. The latter medium / high P film is used as a base to utilize excellent adhesion,
In addition, it is used as a base for a low-P electroless Ni-P plating film so that the above-mentioned defects caused by the hardening treatment do not appear. High P
The P content of the electroless Ni-P plating film is 5 to 15% by weight.
Is preferred. A more preferred P content is 5 to 8% by weight.

【0016】上記した本発明の第一〜第四の処理を施さ
れる低P無電解Ni−Pめっき皮膜を熱処理により表面
硬化させ、耐摩耗性を向上させることも可能である。図
5は1.9重量%Pを含有する無電解Ni−Pめっき皮
膜の熱処理温度(1時間保持)と表面硬度の関係を示す
グラフであり、図6はアルミニウム合金基材の硬さと熱
処理温度の関係を示すグラフである。ここで、表面硬度
はビッカース硬度計(荷重0.1kg)を使用し、硬さ
はロックウェルB硬度計を使用し、それぞれ試料の表面
硬度を測定することにより求めたものである。すなわち
測定荷重の大小により圧痕深さが異なることを利用して
測定部位を変えたものである。また、図中の符号は3個
の試料を指す。これら図5、6より熱処理は表面硬度を
僅かに増大させるが、220℃以下の熱処理温度ではア
ルミニウム合金基材の硬さをほとんど変化させないこと
が分かる。
The low P electroless Ni-P plating film subjected to the first to fourth treatments of the present invention can be hardened by heat treatment to improve the wear resistance. FIG. 5 is a graph showing the relationship between the heat treatment temperature (maintained for 1 hour) and the surface hardness of the electroless Ni-P plating film containing 1.9 wt% P, and FIG. 6 shows the hardness of the aluminum alloy substrate and the heat treatment temperature. 6 is a graph showing the relationship of. Here, the surface hardness was determined by using a Vickers hardness meter (load: 0.1 kg), and the hardness was determined by measuring the surface hardness of each sample using a Rockwell B hardness meter. That is, the measurement site is changed using the fact that the depth of the indentation differs depending on the magnitude of the measurement load. Reference numerals in the drawing indicate three samples. 5 and 6, it can be seen that the heat treatment slightly increases the surface hardness but hardly changes the hardness of the aluminum alloy base material at a heat treatment temperature of 220 ° C. or less.

【0017】図7は無電解Ni−Pめっき皮膜のP含有
量、表面硬度及び200℃での熱処理時間との関係を示
すグラフである。このグラフより2.8%とP含有量が
低い無電解Ni−Pめっき皮膜の表面硬度は20時間以
上の長時間保持でHv1000程度まで上昇することが
分かる。一方、アルミニウム合金はほとんどの種類が2
20℃で20時間以上熱処理されると、過時効になるの
で適正時効時間が長い2000番系中でも2218合金
を素材として選択することが必要になる。なお、熱処理
時間を10時間未満とすると、ほとんどの熱処理型アル
ミニウム合金が過時効にならない。その中には2214
などの高強度合金もその中に含まれる。素材となるアル
ミニウム合金に対する無電解Ni−Pめっき皮膜の密着
性を高めるために、以下に例示される前処理を行うこと
が好ましい。
FIG. 7 is a graph showing the relationship between the P content of the electroless Ni-P plating film, the surface hardness, and the heat treatment time at 200 ° C. From this graph, it can be seen that the surface hardness of the electroless Ni-P plating film having a low P content of 2.8% increases to about Hv1000 when held for 20 hours or more. On the other hand, most aluminum alloys are 2
If the heat treatment is performed at 20 ° C. for 20 hours or more, overaging occurs, so it is necessary to select the 2218 alloy as a material even in the 2000 series having a long appropriate aging time. If the heat treatment time is less than 10 hours, most heat treatment type aluminum alloys do not overage. Among them is 2214
And other high-strength alloys. In order to increase the adhesion of the electroless Ni-P plating film to the aluminum alloy as a raw material, it is preferable to perform a pretreatment exemplified below.

【0018】アルカリ脱脂(50℃×5分、アルカリ脱
脂材使用) アルカリエッチング(50℃×40秒、NaOH浴) スマット除去(27℃×40秒、硝酸を主成分とする洗
浄浴) 亜鉛置換めっき処理(1)(27℃×25秒、ジンケー
ト浴) 亜鉛剥離(27℃×60秒、50%硝酸) 亜鉛置換めっき処理(2)(27℃×25秒、ジンケー
ト浴)
Alkaline degreasing (50 ° C. × 5 minutes, use of alkaline degreasing agent) Alkaline etching (50 ° C. × 40 seconds, NaOH bath) Smut removal (27 ° C. × 40 seconds, cleaning bath mainly composed of nitric acid) Zinc displacement plating Treatment (1) (27 ° C x 25 seconds, zincate bath) Zinc peeling (27 ° C x 60 seconds, 50% nitric acid) Zinc displacement plating treatment (2) (27 ° C x 25 seconds, zincate bath)

【0019】ショットブラスト、バレル処理、レーザー
ビーム照射などの表面処理後は、処理された面をそのま
ま摺動面として使用するが、高周波熱処理の場合は研磨
処理などを行ってもよい。以上の如く処理された材料は
ロータリーコンプレッサーのベーン、ラジアルプレーン
ベアリング、スラストプレーンベアリングなどとして使
用することができる。続いて本発明の方法で処理された
アルミニウム合金素材が片当りが発生するような高負荷
条件を再現する試験の結果を説明する。
After surface treatment such as shot blasting, barrel treatment, and laser beam irradiation, the treated surface is used as it is as a sliding surface. In the case of high-frequency heat treatment, polishing treatment may be performed. The material treated as described above can be used as a vane, a radial plain bearing, a thrust plain bearing, etc. of a rotary compressor. Next, a description will be given of the results of a test for reproducing a high load condition under which the aluminum alloy material treated by the method of the present invention causes one-side contact.

【0020】[0020]

【実施例】【Example】

実施例1 図8は本実施例における試験方法を説明する概念図であ
って、図中10は本発明の方法または比較方法で処理さ
れたアルミニウム合金素材(AHS−3−T7)、11
はブロック(A390アルミニウム合金、初晶Si平均
粒径30μm)である。素材の寸法は35×14×3m
mである。さらに図8において、θは角度=1°、荷重
Pは150kgf(15.3N),試験時間は5時間、
往復摺動周波数は10Hz,ストロークは6mm,給油
は30mL/hであった。素材は前述の予備表面処理を
行った後、P含有量が1.9重量%の無電解めっきを奥
野製薬工業(株)製めっき液(商品名トップニコロンY
M)を用いて行い、厚さが15μmのめっきを素材の全
面に形成した。めっき後の表面硬度はHv645であっ
た。
Example 1 FIG. 8 is a conceptual diagram illustrating a test method in the present example, in which 10 is an aluminum alloy material (AHS-3-T 7 ) treated by the method of the present invention or the comparative method, 11
Is a block (A390 aluminum alloy, primary crystal Si average particle diameter 30 μm). The dimensions of the material are 35 × 14 × 3m
m. 8, the angle θ is 1 °, the load P is 150 kgf (15.3 N), the test time is 5 hours,
The reciprocating sliding frequency was 10 Hz, the stroke was 6 mm, and the oil supply was 30 mL / h. After performing the above-mentioned preliminary surface treatment, the material is subjected to electroless plating having a P content of 1.9% by weight by using a plating solution (trade name: Top Nicolon Y) manufactured by Okuno Pharmaceutical Co., Ltd.
M), and a plating having a thickness of 15 μm was formed on the entire surface of the material. The surface hardness after plating was Hv645.

【0021】試験に供した表面処理は以下のとおりであ
った。 1.バレル研摩処理 研摩媒体種類:ポリエステル樹脂+ジルコン 研摩媒体量 :1.5kg 液体量 :1.0kg(水) 素材個数 :20個 回転容器体積:0.01m3 回転容器回転数:200rpm 処理時間 :5min 2.ショットブラスト処理 ショット粒材質:Al23 、硬度Hv1000 ショット粒径:200μm平均 ショット投射速度:150m/sec 投射量:50kg/m2 /sec 3.レーザー照射処理 レーザー種類:YAGパルス(東芝社製) レーザー出力:10KW ビーム径当り出力:100〜400W/m2 4.熱処理 200℃、60分の熱処理を行い、その後1の処理を行
った。 5.熱処理 200℃、60分の熱処理を行い、その後2の処理を行
った。 6.熱処理 200℃、60分の熱処理を行い、その後3の処理を行
った。
The surface treatments used for the test were as follows. 1. Barrel polishing treatment Polishing medium type: polyester resin + zircon Polishing medium amount: 1.5 kg Liquid amount: 1.0 kg (water) Material number: 20 Rotating container volume: 0.01 m 3 rotating container rotation speed: 200 rpm Processing time: 5 min 2. 2. Shot blast treatment Shot grain material: Al 2 O 3 , hardness Hv1000 Shot grain size: 200 μm average Shot projection speed: 150 m / sec Projection amount: 50 kg / m 2 / sec Laser irradiation treatment Laser type: YAG pulse (manufactured by Toshiba Corporation) Laser output: 10 kW Output per beam diameter: 100 to 400 W / m 2 4. Heat treatment A heat treatment was performed at 200 ° C. for 60 minutes, and then the first treatment was performed. 5. Heat treatment A heat treatment was performed at 200 ° C. for 60 minutes, and then the second process was performed. 6. Heat treatment A heat treatment was performed at 200 ° C. for 60 minutes, and then the treatment 3 was performed.

【0022】前記した無電解Ni−Pめっきの前の摺動
面に形成された含有量が6重量%の無電解めっきを奥野
製薬工業(株)製めっき液(商品名トップニコロンTO
M)を用いて行い、厚さが2μmの中間めっき素材の全
面に形成した。その後以下の表面処理を行った。 7:1の処理 8:2の処理 9:3の処理 10:4の処理 11:5の処理 12:6の処理
The electroless plating having a content of 6% by weight formed on the sliding surface before the above-described electroless Ni-P plating was plated with a plating solution (trade name: Top Nicolon TO, manufactured by Okuno Pharmaceutical Co., Ltd.).
M), and formed over the entire surface of the intermediate plating material having a thickness of 2 μm. Thereafter, the following surface treatment was performed. 7: 1 processing 8: 2 processing 9: 3 processing 10: 4 processing 11: 5 processing 12: 6 processing

【0023】比較例として次の処理も行った。 (a)上記した低P無電解めっき (b)高P無電解めっき(P含有量=10重量%) (c)上記(b)の高P無電解めっき後低P無電解めっ
き (d)上記(c)の後4の熱処理 試験の結果を表1に示す。
The following processing was also performed as a comparative example. (A) Low P electroless plating described above (b) High P electroless plating (P content = 10% by weight) (c) Low P electroless plating after high P electroless plating of (b) above (d) Table 1 shows the results of the heat treatment test in the fourth step after (c).

【0024】 [0024]

【表1】 処理方法 処理後 供試材 ブロック 備考 の表面 比摩耗量 比摩耗量 硬度(Hv)(10-9mm2 kg-1) (10-9mm2 kg-1 1 680 6.0 1.0 本発明 2 690 5.0 1.0 本発明 3 910 2.2 0.7 本発明 4 810 3.2 0.7 本発明 5 820 2.4 0.6 本発明 6 990 1.9 0.6 本発明 7 680 4.1 0.9 本発明 8 690 3.9 0.8 本発明 9 910 1.7 0.6 本発明 10 750 2.4 0.7 本発明 11 760 3.8 0.9 本発明 12 770 2.9 0.8 本発明 a 650 8.0 1.2 比較例 b 560 12.0 3.0 比較例 c 660 7.6 1.0 比較例 d 740 6.5 0.8 比較例 [Table 1] Treatment method After treatment Test material Block Remark surface Specific wear amount Specific wear amount Hardness (Hv) (10 -9 mm 2 kg -1 ) (10 -9 mm 2 kg -1 ) 1 680 6.0 1.0 The present invention 2 690 5.0 1.0 The present invention 3 910 2.2 0.7 The present invention 4 810 3.2 0.7 The present invention 5 820 2.4 0.6 The present invention 6 990 1.9 0.6 The present invention 7 680 4.1 0.9 The present invention 8 690 3.9 0.8 The present invention 9 910 1.7 0.6 The present invention 10 750 2.4 0.7 The present invention 11 760 3.8 0.9 The present invention 12 770 2.9 0.8 The present invention a 650 8.0 1.2 Comparative example b 560 12.0 3.0 Comparative example c 660 7.6 1.0 Comparative example d 740 6.5 0.8 Comparative example

【0025】表1に示すように本発明の処理方法による
供試財は比較例のものと比較して供試材及びブロックの
摩耗が少ない。
As shown in Table 1, the specimens obtained by the treatment method of the present invention have less wear of the specimens and blocks than those of the comparative examples.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 低P無電解めっき皮膜の組織を光学顕微鏡に
より観察した写真(倍率1000倍)である。
FIG. 1 is a photograph (1000-fold magnification) of the structure of a low-P electroless plating film observed with an optical microscope.

【図2】 低P無電解めっき皮膜をショットブラスト処
理した後の組織を光学顕微鏡により観察した写真(倍率
1000倍)である。
FIG. 2 is a photograph (magnification: 1000 times) of a structure obtained by subjecting a low P electroless plating film to a shot blast treatment and observed by an optical microscope.

【図3】 低P、無電解めっき皮膜をバレル研摩した後
の組織を光学顕微鏡により観察した写真(倍率1000
倍)である。
FIG. 3 is a photograph obtained by observing the structure of a low-P, electroless plating film after barrel polishing by an optical microscope (magnification: 1000).
Times).

【図4】 高P無電解めっき皮膜の写真(倍率1000
倍)である。
FIG. 4 is a photograph of a high-P electroless plating film (magnification: 1000).
Times).

【図5】 P含有量が10重量%の無電解めっき皮膜の
表面硬度と熱処理温度の関係を示すグラフである。
FIG. 5 is a graph showing the relationship between the surface hardness of an electroless plating film having a P content of 10% by weight and the heat treatment temperature.

【図6】 アルミニウム合金基材硬さと熱処理温度の関
係を示すグラフである。
FIG. 6 is a graph showing the relationship between aluminum alloy substrate hardness and heat treatment temperature.

【図7】 P含有量が2.4,6.5,7.1,12重
量%の無電解めっき皮膜の表面硬度と熱処理時間の関係
を示すグラフである。
FIG. 7 is a graph showing the relationship between the surface hardness of an electroless plating film having a P content of 2.4, 6.5, 7.1, and 12% by weight and a heat treatment time.

【図8】 摩耗試験の説明図である。FIG. 8 is an explanatory diagram of a wear test.

フロントページの続き (72)発明者 近藤 賢一 愛知県豊田市緑ケ丘3丁目65番地 大豊 工業株式会社内 (56)参考文献 特開 平7−285032(JP,A) 特開 平5−306650(JP,A) 特開 平8−158058(JP,A) 特開 平5−71525(JP,A) (58)調査した分野(Int.Cl.7,DB名) C23C 18/00 - 18/54 Continuation of the front page (72) Inventor Kenichi Kondo 3-65 Midorigaoka, Toyota City, Aichi Prefecture Inside Taitoyo Kogyo Co., Ltd. (56) References JP-A-7-285032 (JP, A) JP-A 5-306650 (JP, A) JP-A-8-1558058 (JP, A) JP-A-5-71525 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) C23C 18/00-18/54

Claims (7)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 アルミニウム合金からなる素材の摺動面
に形成されたP含有量が1〜3重量%の無電解Ni−P
めっき皮膜にバレル研摩処理を施すことを特徴とする摺
動部材の表面処理方法。
An electroless Ni-P having a P content of 1 to 3% by weight formed on a sliding surface of a material made of an aluminum alloy.
A surface treatment method for a sliding member, comprising subjecting a plating film to barrel polishing.
【請求項2】 アルミニウム合金からなる素材の摺動面
に形成されたP含有量が0.1〜5重量%の無電解Ni
−Pめっき皮膜にショットブラスト処理を施すことを特
徴とする摺動部材の表面処理方法。
2. An electroless Ni having a P content of 0.1 to 5% by weight formed on a sliding surface of a material made of an aluminum alloy.
-A surface treatment method for a sliding member, wherein the P plating film is subjected to a shot blast treatment.
【請求項3】 前記ショットブラスト処理を、前記無電
解Ni−Pめっき皮膜の硬度とほぼ同等以上の硬度を有
する粒子を80m/sec以上の速度で投射することに
より行う請求項2記載の摺動部材の表面処理方法。
3. The slide according to claim 2, wherein the shot blasting is performed by projecting particles having a hardness substantially equal to or higher than the hardness of the electroless Ni—P plating film at a speed of 80 m / sec or higher. Surface treatment method for members.
【請求項4】 前記P含有量が0.1〜5重量%の無電
解Ni−Pめっき皮膜の形成に先立って、P含有量が5
重量%を超え15重量%の無電解Ni‐Pめっき皮膜を
施すことを特徴とする請求項1から3までのいずれか1
項記載の摺動部材の表面処理方法。
4. Prior to the formation of the electroless Ni—P plating film having a P content of 0.1 to 5% by weight, the P content was 5%.
4. The method according to claim 1, wherein an electroless Ni-P plating film of more than 15% by weight is applied.
A surface treatment method for a sliding member according to claim 1.
【請求項5】 前記無電解Ni−Pめっき皮膜に100
〜220℃の熱処理を施すことを特徴とする請求項1か
ら4までのいずれか1項記載の摺動部材の表面処理方
法。
5. An electroless Ni-P plating film having a thickness of 100
The surface treatment method for a sliding member according to any one of claims 1 to 4, wherein a heat treatment is performed at a temperature of up to 220C.
【請求項6】 熱処理時間が0.3〜5時間であること
を特徴とする請求項5記載の摺動部材の表面処理方法。
6. The method according to claim 5, wherein the heat treatment time is 0.3 to 5 hours.
【請求項7】 アルミニウム合金が熱処理型である請求
項1から6までのいずれか1項記載の摺動部材の表面処
理方法。
7. The method for surface treating a sliding member according to claim 1, wherein the aluminum alloy is of a heat treatment type.
JP8271919A 1996-09-20 1996-09-20 Surface treatment method for sliding members Expired - Fee Related JP3066798B2 (en)

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