JP2987549B2 - Power semiconductor device - Google Patents

Power semiconductor device

Info

Publication number
JP2987549B2
JP2987549B2 JP30952094A JP30952094A JP2987549B2 JP 2987549 B2 JP2987549 B2 JP 2987549B2 JP 30952094 A JP30952094 A JP 30952094A JP 30952094 A JP30952094 A JP 30952094A JP 2987549 B2 JP2987549 B2 JP 2987549B2
Authority
JP
Japan
Prior art keywords
wafer
semiconductor device
chip
power semiconductor
divided
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP30952094A
Other languages
Japanese (ja)
Other versions
JPH08148398A (en
Inventor
健司 上田
修 左右田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sansha Electric Manufacturing Co Ltd
Original Assignee
Sansha Electric Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sansha Electric Manufacturing Co Ltd filed Critical Sansha Electric Manufacturing Co Ltd
Priority to JP30952094A priority Critical patent/JP2987549B2/en
Publication of JPH08148398A publication Critical patent/JPH08148398A/en
Application granted granted Critical
Publication of JP2987549B2 publication Critical patent/JP2987549B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Dicing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、大容量の電力用半導体
装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a large-capacity power semiconductor device.

【0002】[0002]

【従来の技術】従来、サイリスタ、ダイオードなどの大
容量の電力用半導体装置は、3〜6インチのウェハに図
3又は図4に示すように角形チップ12を4個又は2個
のように複数個形成し、このウェハを直線にダイシング
して各角形チップを得て、この角形チップを銅板やモリ
ブデン等の金属板又はセラミックスに半田付けや融着さ
れた金属板のベースに取り付け、さらにパッケージを行
って半導体装置を形成させている。
2. Description of the Related Art Conventionally, a large-capacity power semiconductor device such as a thyristor or a diode has a plurality of square chips 12 such as four or two square chips as shown in FIG. The wafer is diced linearly to obtain each square chip, and the square chip is mounted on a metal plate such as a copper plate or molybdenum or a metal plate soldered or fused to ceramics, and further packaged. To form a semiconductor device.

【0003】[0003]

【発明が解決しようとする課題】図3に示すように、ウ
ェハ1から角形チップを4チップ形成させたときの容量
より1.5倍の容量の角形チップを形成させるには、図
4に示すように同じ大きさのウェハの取り率を2チップ
にする必要がある。この場合は、2倍の容量となり、大
きくなりすぎてウェハの利用率が悪くなっている。そこ
で、図5に示すようにウェハのサイズを1ランク上に
し、取り率を4チップにしている。例えば、当初設計の
ウェハサイズが4インチのとき、ウェハを5インチにす
れば、約1.5の容量を得ることができるが、拡散炉、
露光機などが大きな装置を設置しなければならないなど
の問題点がある。
As shown in FIG. 3, in order to form a square chip having a capacity 1.5 times larger than the capacity when four square chips are formed from the wafer 1, as shown in FIG. As described above, it is necessary to set the removal rate of wafers of the same size to two chips. In this case, the capacity is doubled, and the capacity is too large, and the utilization rate of the wafer is deteriorated. Therefore, as shown in FIG. 5, the size of the wafer is increased by one rank, and the take-up rate is set to 4 chips. For example, when the initially designed wafer size is 4 inches, if the wafer is 5 inches, a capacity of about 1.5 can be obtained.
There are problems such as the necessity of installing a large apparatus for the exposure machine and the like.

【0004】[0004]

【課題を解決するための手段】上記の課題を解決するた
めに、本発明はウェハを2等分、4等分、6等分に分割
して扇状にチップを形成し、上記ウェハをダイシンクし
たチップで形成した。
In order to solve the above-mentioned problems, the present invention divides a wafer into two, four, and six equal parts to form chips in a fan shape, and die-sinks the wafer. Formed with chips.

【0005】[0005]

【作用】ウェハを2等分、4等分、6等分に分割して、
扇状チップを形成すると、扇形チップの面積は角型チッ
プの面積の約1.5倍となる。
[Action] The wafer is divided into two equal parts, four equal parts, and six equal parts,
When the fan-shaped chip is formed, the area of the fan-shaped chip becomes about 1.5 times the area of the square chip.

【0006】[0006]

【実施例】以下にこの発明の半導体装置の実施例を図1
及び図2により説明する。図1において、1は3〜6イ
ンチのウェハであり、このウェハ1を直線にかつ等分に
分割し、扇状でサイリスタ、ダイオード、トランジスタ
などの大容量の4つのチップ2を形成する。このウェハ
を各チップ2に沿って直線的にダイシングして、各チッ
プをベースに取付け、ワイヤリングを行い、さらにパッ
ケージを行って半導体装置を形成する。なお、チップ2
の各コーナー部は丸みを設け、高電圧が印加しないよう
に又は高電流にならないようにしている。
FIG. 1 shows an embodiment of a semiconductor device according to the present invention.
And FIG. In FIG. 1, reference numeral 1 denotes a wafer having a size of 3 to 6 inches. The wafer 1 is divided linearly and equally, and four large-capacity chips 2 such as thyristors, diodes, and transistors are formed in a fan shape. The wafer is linearly diced along each chip 2, each chip is mounted on a base, wiring is performed, and further packaging is performed to form a semiconductor device. Note that chip 2
Each corner is rounded so that a high voltage is not applied or a high current is not applied.

【0007】これにより図1に示すように扇状に4分割
された場合、ウェハの直径をLとすると、各チップ2の
面積S1は数1になる。
As a result, when the wafer is divided into four parts as shown in FIG. 1 and the diameter of the wafer is L, the area S1 of each chip 2 is given by Formula 1.

【0008】[0008]

【数1】 (Equation 1)

【0009】一方、図3に示すように従来の4分割の場
合の各チップ12の面積S2は数2になる。
On the other hand, as shown in FIG. 3, the area S2 of each chip 12 in the case of the conventional four-division is expressed by Equation 2.

【0010】[0010]

【数2】 (Equation 2)

【0011】すなわち、図1に示すように扇状に4分割
された場合は、同じウェハサイズで図3のように4分割
された場合のπ/2すなわち、1.57倍となる。
That is, when the wafer is divided into four parts as shown in FIG. 1, it is π / 2, that is, 1.57 times that when divided into four parts as shown in FIG. 3 with the same wafer size.

【0012】また、図2にしめすものは半円上に2分割
したものであり、この場合も同じウェハサイズで図4の
ように2分割されたチップよりπ/2すなわち1.57
倍となる。
FIG. 2 shows a half-circle divided into two parts. Also in this case, the same wafer size is used to obtain π / 2, that is, 1.57%, from a chip divided into two as shown in FIG.
Double.

【0013】上記実施例のほか、ウェハを扇状に等分に
6分割する場合にも適用できる。この場合も扇状に6分
割されたものの面積は角形チップのπ/2すなわち1.
57倍となる。しかし、8分割以上にすると、ウェハの
中心部の分割が鋭角になりすぎ、チップとして実用上使
用しにくくなる。
In addition to the above embodiment, the present invention can be applied to a case where a wafer is equally divided into six in a fan shape. Also in this case, the area of the fan-shaped divided into six is π / 2 of the square chip, that is, 1.
It becomes 57 times. However, if the division is made into eight or more, the division at the center of the wafer becomes too sharp, and it becomes difficult to use the chip practically.

【0014】また、上記実施例は、ダイシング装置が直
線的にウェハを切断する場合について述べているが、レ
ーザーを用いたダイシング装置ではウェハを3分割、5
分割にすることも可能である。
In the above embodiment, the dicing apparatus cuts the wafer in a straight line. However, the dicing apparatus using a laser divides the wafer into three parts.
It is also possible to divide.

【0015】[0015]

【発明の効果】以上のように本発明は、扇状にチップを
形成すると、扇状のチップの面積は角形のチップの1.
5倍となり、ウェハサイズを1ランク上にする必要がな
い。このため、拡散炉、露光機などは大きな装置を設け
る必要はない。また、ウェハを捨てる部分がないので省
資源となる。
As described above, according to the present invention, when a chip is formed in a fan shape, the area of the fan-shaped chip is 1.
5 times, and it is not necessary to increase the wafer size by one rank. Therefore, it is not necessary to provide a large apparatus such as a diffusion furnace and an exposure machine. In addition, since there is no portion to discard the wafer, resources are saved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の電力用半導体装置の一実施例の平面図
である。
FIG. 1 is a plan view of one embodiment of a power semiconductor device of the present invention.

【図2】本発明の電力用半導体装置の他の実施例の平面
図である。
FIG. 2 is a plan view of another embodiment of the power semiconductor device of the present invention.

【図3】従来の電力用半導体装置の平面図である。FIG. 3 is a plan view of a conventional power semiconductor device.

【図4】従来の電力用半導体装置の平面図である。FIG. 4 is a plan view of a conventional power semiconductor device.

【図5】従来の電力用半導体装置の平面図である。FIG. 5 is a plan view of a conventional power semiconductor device.

【符号の説明】[Explanation of symbols]

1 ウェハ 2 チップ 3 コーナー部 1 wafer 2 chip 3 corner

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) H01L 21/02 H01L 21/301 H01L 21/46 H01L 27/00 H01L 29/00 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 6 , DB name) H01L 21/02 H01L 21/301 H01L 21/46 H01L 27/00 H01L 29/00

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 ウェハを二等分又は四等分又は六等分に
分割して扇状チップを形成し、上記扇状チップをダイシ
ングしたチップで形成した電力用半導体装置。
1. A power semiconductor device formed by dividing a wafer into two, four, or six equal parts to form fan-shaped chips, and dicing the fan-shaped chips.
JP30952094A 1994-11-18 1994-11-18 Power semiconductor device Expired - Fee Related JP2987549B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30952094A JP2987549B2 (en) 1994-11-18 1994-11-18 Power semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30952094A JP2987549B2 (en) 1994-11-18 1994-11-18 Power semiconductor device

Publications (2)

Publication Number Publication Date
JPH08148398A JPH08148398A (en) 1996-06-07
JP2987549B2 true JP2987549B2 (en) 1999-12-06

Family

ID=17993999

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30952094A Expired - Fee Related JP2987549B2 (en) 1994-11-18 1994-11-18 Power semiconductor device

Country Status (1)

Country Link
JP (1) JP2987549B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106952986A (en) * 2017-05-26 2017-07-14 厦门市东太耀光电子有限公司 A kind of LED die cutting method

Also Published As

Publication number Publication date
JPH08148398A (en) 1996-06-07

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