JP2955910B2 - Horizontal axis type substrate drying device - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for draining and drying liquid droplets attached to a thin plate-like substrate to be processed (hereinafter simply referred to as a substrate) such as a semiconductor substrate. The present invention relates to a substrate drying device.

[0002]

2. Description of the Related Art In recent years, in order to further improve the quality of substrate processing, a so-called cassetteless type immersion type substrate processing has been performed. Came to be adopted.
As this type of rotary substrate drying apparatus, conventionally, for example, JP-A-1-25522 according to the proposal of the present applicant is disclosed.
No. 7 is known.

As shown by reference numeral 120 in FIG. 6, a substrate entrance 123 is provided above a peripheral wall 122 of a chamber 121.
A forced exhaust port 126 is formed in the lower part of the peripheral wall, a substrate inlet / outlet 123 of the chamber 121 is closed by a chamber opening / closing lid 140 so as to be openable and closable, and a horizontal shaft type rotor 130 is rotatably provided in the chamber 121. A rotation driving means (not shown) for rotating the horizontal axis rotor 130 is provided outside the chamber 121, and holds the plurality of substrates W in a vertically aligned state with the chuck 108a of the substrate transfer robot so as to be delivered. The substrate holder 145 is fixed to the horizontal-axis rotor 130, and a substrate clamping device 180 for fixing the plurality of substrates W held by the substrate holder 145 to the horizontal-axis rotor 130 is provided.
Is rotated by a rotation driving means, and the liquid droplets adhering to the substrate W are drained and dried.

[0004] The substrate transfer robot holds a plurality of substrates W taken out of a substrate storage cassette (not shown) by the chuck 108a in a state of standing and aligned and transports them to a predetermined position, and transfers the substrates W to a substrate processing tank (not shown). The chuck 108a is formed to have a relatively long dimension in the vertical direction, and is configured to be able to move up and down because the substrate W needs to be immersed in the inside or loaded with the processed substrate W into the substrate drying apparatus. The chuck 108a is connected to the chamber 1
The plurality of substrates W are transferred to and from the substrate holder 145 fixedly mounted on the horizontal shaft rotor 130 by being inserted downward into the inside 21. The chamber opening / closing lid 140 is hinged so that one side thereof can be opened upward by a butterfly bank 141. Reference numeral 127 in FIG. 6 denotes an intake port with a dust filter.

[0005]

The above conventional example has the following disadvantages. Since the chuck 108a is formed to have a relatively long dimension in the vertical direction and is configured to be able to move up and down, there is a limit in increasing the rigidity thereof. Vibrates when the substrate W is inserted downward into the chamber 121.
Due to this vibration, many substrates W vibrate in the holding groove of the chuck 108a, and wear dust (hereinafter, referred to as particles) is generated due to the vibration wear. The present invention has been made in view of such circumstances, and when a substrate is transferred by a substrate transfer robot or when a substrate is lowered and inserted into a chamber of a substrate drying device, particles are generated due to vibration of a chuck. It is an object of the present invention to reduce the occurrence of the problem.

[0006]

In order to solve the above problems SUMMARY OF THE INVENTION In the invention of claim 1, a substrate entrance to the upper portion Yes
Chamber and a chamber lid that the substrate entrance of the chamber <br/> open closes, and the horizontal axis type rotor rotatably provided in the chamber, rotation drive for rotating the horizontal axis type rotors this that The plurality of substrates themselves are erected and aligned between the means and the substrate transport robot that is installed on the horizontal axis rotor and directly holds and transports the plurality of substrates.
Comprising a substrate holder for directly transferring can hold a substrate clamp apparatus for securing a plurality of substrates held by the substrate holder in the horizontal axis type rotors, the horizontal axis type rotors and the substrate holder While being detachably mounted to
A holder clamp device for fixing the substrate holder to the horizontal shaft type rotor is provided on the horizontal shaft type rotor, and a holder raising / lowering means for vertically moving the substrate holder below the horizontal axis type rotor is arranged to be vertically movable. and, by the holder elevating means, by the upper temperature of the substrate holder, it is an Abstract that it has passed can configure a plurality of substrates between the substrate holder and the substrate transfer robot.

Further, in the invention of claim 2, the chamber opening / closing lid is provided with a slide opening / closing device, and is configured to slide back to one side of the chamber entrance / exit of the chamber and open the substrate entrance / exit.

[0008]

[Action] In the present invention of claim 1, lifting the horizontal axis type freely the construction has been the substrate holder detachably attached to the rotor, the holder lifting means disposed vertically movably on the lower side of the horizontal axis type rotors, board Direct transfer of multiple substrates between the holder and the substrate transfer robot
To receive passes. Further, when drying the substrates, the plurality of substrates are fixed to the horizontal shaft type rotor by the holder clamp device together with the substrate holder.

According to the second aspect of the present invention, in addition to the above operation, the chamber opening / closing lid slides to one side, so that the chamber opening / closing lid does not interfere with the substrate transfer robot during the opening / closing operation.

[0010]

Embodiments of the present invention will be described below in more detail with reference to the drawings. FIG. 5 is a schematic diagram of a substrate processing apparatus provided with a horizontal axis type substrate drying apparatus according to the present invention. First, the outline of the substrate processing apparatus will be briefly described.

This substrate processing apparatus includes a loading / unloading section 1 for loading and unloading a cassette C containing a substrate W, and a cassette transfer robot for transferring the cassette C between the loading / unloading section 1 and a substrate transfer section 3 to be described later. 2, a substrate transfer unit 3 for taking out the substrate W from the cassette C or loading the substrate W into the cassette C, and a horizontal axis rotating type substrate drying apparatus 20 according to the present invention. A drying section 4 for draining and drying the substrate W after completion of the above, a plurality of processing tanks 5a, 5b, and 5c, a substrate processing section 5 for collectively immersing and cleaning a large number of substrates W; The unit 3 includes a substrate transport robot 8 that directly holds the plurality of substrates W taken out of the cassette C collectively and transports the substrates W to the substrate processing unit 5 and the drying unit 4.

In the loading / unloading section 1 for loading and unloading the cassette C, the cassette C is loaded and unloaded by a cassette transport robot (not shown) or manually. A cassette table 10
An orientation flat aligning device 11 is provided below the cassette table 10 so as to align the orientation flats of the substrates W in the cassette C positioned and mounted on the cassette table 11 when loading and unloading the cassette C. .

The substrate transfer section 3 includes a horizontally rotatable cassette mounting table 13, a motor 14 for rotating the cassette mounting table 13, and a substrate delivery provided below the cassette mounting table 13 so as to be able to move up and down. Tool 16 and a lifting / lowering drive device 18 for the substrate transfer tool 16.
The direction of the cassette C loaded on the cassette mounting table 13 is changed by 90 ° as necessary, and then the substrate delivery tool 16 is pushed up through the cassette mounting table 13 and the cassette C to lift a plurality of substrates W. The transfer tool 16 is configured to collectively hold and take out the substrate W, transfer the substrate W to the substrate transfer robot 8, or load the processed substrate W received from the substrate transfer robot 8 into the cassette C.

The substrate processing section 5 includes a plurality of processing tanks 5a to 5a.
5c, piping chambers 6a to 6c below each processing tank, and a plurality of types of chemical solution storage containers 7a to 7e arranged below the piping chamber. Each of the processing tanks 5a to 5c The processing tanks 5a to 9 are provided with a freely mounted substrate mounting tool 9 and collectively hold a plurality of substrates W received from the substrate transport robot 8.
5c so as to perform necessary substrate processing and cleaning processing.

Further, as shown in FIG. 5, the substrate transfer robot 8 moves the substrate transfer section 3, the horizontal axis type rotary substrate drying apparatus 20 and the substrate processing section 5 along the guide rail 9,
It can be moved horizontally. Further, as shown in FIG. 1, the substrate transport robot 8 directly collectively directs a plurality of substrates W on a pair of left and right arm rotation shafts 8c in an upright alignment state.
A chuck 8a for contacting and holding;
a has holding grooves 8b for collectively holding the substrates W on its opposing surfaces and on its back surfaces, respectively, and by rotating a pair of left and right arm rotating shafts 8c, the chuck 8a is brought into contact with its opposing surfaces or its back surface. Each of them is configured to be able to switch to a substrate holding posture having an inverted U shape.

That is, the chuck 8a is not movable up and down, and the opposing surfaces of the chuck 8a and the back surfaces thereof are selectively used for holding an unprocessed substrate and for holding a processed substrate. ing. Accordingly, it is not necessary to form the chuck 8a with a long dimension in the vertical direction, but it is possible to increase the rigidity of the chuck 8a to reduce the vibration at the time of conveyance and reduce the generation of particles due to the vibration of the chuck 8a. In addition, by using the chuck for the unprocessed substrate and for the processed substrate properly, the processing quality of the substrate can be further improved.

Hereinafter, a horizontal axis rotating type substrate drying apparatus 20 according to an embodiment of the present invention will be described in detail with reference to FIGS. This horizontal axis rotating type substrate drying apparatus 20 is shown in FIGS.
As shown in FIG. 5, a chamber 21 whose peripheral wall 22 is formed in a substantially circular shape, a horizontal axis rotor 30 rotatably provided in the chamber 21, and a rotor 30 provided outside the chamber 21. , A chamber opening / closing lid 40 for opening and closing the substrate entrance 23 of the chamber 21, a substrate holder 45 detachably mounted on the rotor 30, and the substrate holder A holder lifting means 50 movably provided below the rotor 30 for raising and lowering the holder 45, and a plurality of substrates W and the substrate holders 45 held by the substrate holder 45 are fixed to the rotor 30, respectively. Substrate clamping device 8
0 and a holder clamp device 85.

As shown in FIGS. 1 and 2, a peripheral wall 22 of the chamber 21 is formed in a substantially circular shape. A substrate inlet / outlet 23 is provided at an upper part of the peripheral wall, and a forced exhaust port 26 is provided at a lower part of the peripheral wall. The substrate entrance 23 is closed by a chamber opening / closing lid 40 so as to be openable and closable, and a forced exhaust blower (not shown) is communicated with the forced exhaust port 26 through a drainage drain 27 (see FIG. 5). Further, the chamber opening / closing lid 40 has an upper peripheral wall portion 2 of the chamber peripheral wall 22.
2a is fixed, and the substrate entrance 23 is connected to the upper peripheral wall portion 2
It is configured to be closed via the seal member 24 by 2a. The chamber opening / closing lid 40 is configured to slide and retreat to one side of the substrate entrance 23 of the chamber 21 to open the substrate entrance 23. The slide opening / closing structure will be described later. Also,
An intake port (not shown) for taking in outside air through a filter is provided on a side of the chamber 21.

The horizontal shaft type rotor 30 is shown in FIGS.
, A pair of front and rear rotating flanges 31 and 31 spaced apart at a predetermined interval, and a pair of front and rear rotating flanges 31.
A plurality of connecting rods 32 are connected to each other so as to be integrally rotatable, and support shafts 33 projecting horizontally outward from the respective rotary flanges 31, and each of the support shafts 33 is a vibration-proof supported base 6.
It is rotatably supported by a pair of front and rear machine frames 34 erected at zero. The rotor 30 has an endless belt 37 wound around a driving pulley 36 of a rotary driving means (motor) 35 provided on a base frame 63 and a pulley 38 fixed to a front support shaft 33 outside the chamber 21. It is configured to be hung and rotated. A pair of left and right support members 42, 42 for detachably supporting the substrate holder 45 are provided on the respective opposing surfaces of the pair of front and rear rotating flanges 31, 31.

As shown in FIGS. 1 and 2, the substrate holder 45 includes a bottom plate 46 provided substantially horizontally, a pair of front and rear side plates 47 fixed to both ends of the bottom plate 46, and a pair of front and rear It comprises three board holding rods 48 that are horizontally installed between the side plates 47. At the front and rear ends of the bottom plate 46, a pin engagement hole 43 a into which each engagement pin 43 of the support tool 42 attached to the pair of front and rear rotating flanges 31 is engaged, and A pin engaging hole 51a into which the engaging pin 51 is engaged is formed.
3 and is detachably supported by a support tool 42. Each board holding rod 48 has a board holding groove 4.
8a are formed at an equal pitch, and the substrate transfer robot 8
The plurality of substrates W themselves are directly erected and aligned between them.
It is configured to be held so that it can be delivered .

The holder raising / lowering means 50 is shown in FIGS.
, A pair of front and rear support members 52 supporting the front and rear end portions of the substrate holder 45, and each support member 52 via each slide bearing 61 and abrasion dust elimination device 62 provided on the gantry 60. A push-up rod 53 that can be raised and lowered, a driven nut 54 that supports the lower end of each push-up rod 53, a drive screw 55 that is screwed to each driven nut 54 and that is erected between the upper and lower mounts 60 and 64. It is provided on the lower stand 64,
A drive motor 58 for rotating each drive screw 55 through an endless belt 56, and a pair of front and rear support members 52
Are configured to move up and down between a standby position L indicated by a solid line and an ascending position H indicated by a virtual line in FIG.

That is, the substrate W is exchanged with the substrate transfer robot 8.
At the time of delivery, the substrate holder 45 is raised to the ascending position H beyond the substrate entrance 23 of the chamber 21 by the pair of supports 52 before and after the holder raising / lowering means 50, and the substrate holder 45 and the substrate The plurality of substrates W are transferred to and from the transfer robot 8, and then lowered to move the substrate holder 45 to the support members 42.4 of the pair of front and rear rotary flanges 31.
2 and then, when the rotor 30 is rotated to drain and dry, the pair of front and rear supports 52 are attached to the rotor 30.
Is configured to stand by at a standby position L beside the forced exhaust port 26 on the lower side.

Each of the rotating flanges 31 and the holder raising / lowering means 50 are provided with a detector (not shown), respectively. It is configured to confirm that the respective engaging pins 43 and 51 of the supporting tool 52 are engaged with the pin engaging holes 43a and 51a of the bottom plate 46 of the substrate holder 45, respectively.

Next, a slide opening / closing device for the chamber opening / closing lid 40 will be described. Here, reference numeral 70 shown in FIG. 3 indicates the entire slide opening / closing device. This slide opening and closing device 7
0 denotes a chamber opening / closing lid 4 as shown in FIGS.
0, a pair of front and rear side plates 71 supporting both front and rear end portions, a slider 72 fixed to a lower portion of each side plate 71, and a pair of front and rear guide plates 73 for guiding each slider 72 in the left and right (arrow A) direction in FIG. A guide frame 74 for integrally fixing the left and right ends of each guide plate 73;
A rodless cylinder 75 attached to the front side of the guide machine frame 74 to move the right and left (arrow A) direction.
And an air cylinder 68 that rotates the left end of the guide machine frame 74 in the direction of arrow B via the connecting shaft 78.

The guide frame 74 is supported by a support frame 65 via a connecting shaft 78, a pivot arm 67, and a support shaft 66 of the pivot arm 67, and a right portion of the guide frame 74 is supported by a support frame 65. The slide opening / closing device 70 is rotatably supported by a shaft 79, and operates as follows. First, when the air cylinder 68 is actuated to slightly lift the left side of the guide machine frame 74, the chamber opening / closing lid 40 floats up as shown by an alternate long and short dash line in FIG. And release the pressure contact.

Next, when the rodless cylinder 75 is operated, the output slide portion 76 of the rodless cylinder 75 moves rightward. Then, the slider 72 connected to the output slide portion 76 via the connection block 77 moves rightward, and the chamber opening / closing lid 40 is
As shown by the two-dot chain line in the drawing, the substrate 21 is slid and retracted to one side of the substrate entrance 23 of the chamber 21 to open the substrate entrance 23. By sliding and retracting the chamber opening / closing lid 40 to one side of the substrate entrance 23 in this manner, the chuck 8a of the substrate transfer robot 8 and the chamber 21 can be brought close even during the opening / closing operation of the chamber opening / closing lid 40. Thus, the throughput in transferring the substrate can be improved.

Next, a description will be given of a substrate clamp device 80 and a holder clamp device 85 for fixing the substrate W and the substrate holder 45 to the rotor 30. The substrate clamp device 80 and the holder clamp device 85 are connected to a clamp position indicated by a solid line in FIG. 1 and an unclamped position indicated by a two-dot chain line by a speed-increasing link mechanism (reference numeral 90 in FIG. 4). It is constituted so that it may rotate between.

As shown in FIG. 1, the substrate clamping device 80 penetrates a pair of front and rear rotating flanges 31 constituting the rotor 30 and a pair of left and right rotating shafts 81 rotatably supported. A pair of left and right rotating arms 82 fixed to the front and rear ends of each rotating shaft 81 between the rotating flanges 31, and a pair of left and right rotating arms 82. And a contact fixture 83 for contacting and fixing the plurality of substrates W. Also, as shown in FIG. 1, the holder clamp device 85 is fixed to the front and rear ends of each of the rotating shafts 86 between the same rotating shaft 86 and the rotating flanges 31 to form a set, A pair of left and right rotating arm type contact fixing members 87 are provided.

That is, at the clamp position indicated by the solid line, the substrate W is abutted and fixed by the abutment fixture 83, and the side plates 47 at the front and rear ends of the substrate holder 45 are abuted and fixed by the abutment fixture 87. At the clamp position, the contact fixture 83
87 is opened and retracted to allow the substrate holder 45 to move up and down. The substrate holder 4
When raising / lowering the chamber 5, the lid 4
Keep 0 open.

The speed-increasing link mechanism 90 is attached to the outer surface of each of the rotary flanges 31 so as to form a pair at the front and rear and a pair at the right and left two sets.
The speed increasing link mechanism 90 is provided symmetrically in the left and right direction, and FIG. 4 shows only one set of the left side attached to the front rotating flange 31. This speed increasing link mechanism 90 is fixed to a front end of a rotating shaft 86 of the holder clamping device 85 and a sector-shaped driven arm 91 fixed to a front end of a rotating shaft 81 of the substrate clamping device 80. It comprises a drive arm 97 and a link 94 connecting the driven arm 91 and the drive arm 97.

That is, the rod driving means 105 shown in FIG.
The pivoting operation rod 106 is protruded and pivoted to rotate the tip of the pivot shaft 86 of the holder clamp device 85, thereby performing the clamp / unclamp operation of the holder clamp device 85 and the driving The driven arm 91 is rotated via the arm 97 and the link 94 to perform a clamp / unclamp operation of the substrate clamping device 80.

As shown in FIG. 4, the speed-increasing link mechanism 90 connects the base end of the link 94 to the driven arm 91 with a base pin 93 and connects the distal end of the link 94 with a drive pin 96 by a distal pin 96. 97, the base end of the drive arm 97 is fixed to the rotating shaft 86. At a clamp position shown by a solid line, the drive arm 97 is turned on an extension line from the base pin 93 toward the rotating shaft 86. The moving top dead center P is set, and the distance between the rotating top dead center P and the base end pin 93 is set to the link 9.
4 is configured to be larger than the free length between the pins 93 and 96 at both ends.

The link 94 is formed by an elastic member capable of elastic deformation so as to be curved. As shown in FIG. 4, the concave portion is disposed so as to face outward with respect to the rotation center G of the rotor 30. In the illustrated clamp position, the tip end of the link 94 is positioned by the stopper 104 near the position beyond the rotation top dead center P, and the drive arm 97 and the driven arm 91 are restrained at the clamp position by the elastic restoring force of the link 94. Is configured.

That is, as shown in FIG.
Is rotated about 180 ° from the unclamped position indicated by the two-dot chain line to the clamped position indicated by the solid line, and is positioned near the rotational top dead center P. In the meantime, the link 94 and the driven arm 91 rotate to the positions indicated by the solid lines, respectively.
The link 94 elastically deforms and extends when it exceeds the rotation top dead center P. At a position beyond the rotation top dead center P, the link 94 maintains the clamped state due to its elastic restoring force.

In FIG. 4, reference numerals 101 and 102 denote stoppers of the driven arm 91, respectively, and reference numeral 103 denotes a locking pin for locking a locking portion 95 fixed at an intermediate portion of the link 94. The centrifugal force causes the driven arm 91
Or the link 94, the locking pin 9
5 and the link 94 are locked at the positions indicated by the solid lines, so that the driven arm 91 is reliably prevented from being in the unclamped state.

Reference numeral 98 in FIG. 4 denotes an arc-shaped elongated hole formed through the rotating flange 31 and fixed to the front and rear ends of the driven arm 91 and the rotating shaft 81 of the substrate clamping device 80. The rotating arm 82 is firmly connected to the rotating arm 82 by a connecting bolt 92 inserted through the arc-shaped long hole 98. This is because the pivoting arm 82 of the substrate clamping device 80 and the contact fixing device 8
3 strongly acts on the rotating shaft 81 and the driven arm 9 against the centrifugal force due to the rotation of the rotor 30.
This is to prevent the unit 1 from losing its integrity and rotating.

The present invention is not limited to the above embodiment, and the substrate holder does not exclude a carrier.
Also, it is not necessary to say that the form of the chamber / rotor / substrate holder / holder elevating / lowering means / slider for opening / closing the chamber opening / closing lid can be appropriately modified.

[0038]

According to the first aspect of the present invention, the substrate holder which is removably mounted on the horizontal shaft type rotor is lifted by the holder raising / lowering means which is vertically movable below the horizontal shaft type rotor . since a plurality of substrates and configured to pass directly received between the base plate holder and a substrate transfer robot, the chuck of the substrate transport robots, may be formed with the long dimension in the vertical direction, vertically movable structure Since there is no need to carry out the vibration, the rigidity can be increased and the vibration at the time of conveyance can be reduced. This makes it possible to reduce the generation of particles due to the vibration of the chuck when the substrate is transferred by the substrate transfer robot or when the substrate is inserted downward into the chamber of the substrate drying apparatus. Further, according to the above configuration, the batch delivery of the substrates is performed.
It only needs to be done once, and in this respect particles are generated
Can be suppressed.

According to the second aspect of the present invention, in addition to the above, the chamber opening / closing lid is configured to slide sideways.
Even during the opening / closing operation, interference between the substrate transfer robot and the chamber opening / closing lid can be prevented, and by bringing the transfer robot and the chamber close to each other in advance, it is possible to improve the throughput in transferring the substrate.

[Brief description of the drawings]

FIG. 1 is a vertical sectional front view of a rotary substrate drying apparatus according to the present invention.

FIG. 2 is a vertical sectional side view of the rotary substrate drying apparatus according to the present invention.

FIG. 3 is a front view of an opening / closing device for a chamber opening / closing lid.

FIG. 4 is an operation explanatory view of each clamping device for a substrate and a substrate holder.

FIG. 5 is a schematic vertical sectional view of a substrate processing apparatus provided with a rotary substrate drying apparatus according to the present invention.

FIG. 6 is a diagram corresponding to FIG. 1 of a rotary substrate drying apparatus according to a conventional example.

[Explanation of symbols]

Reference Signs List 8: substrate transport robot, 20: horizontal axis rotating substrate drying apparatus, 21: chamber, 22: chamber peripheral wall, 23: substrate entrance at upper part of peripheral wall, 26: forced exhaust port, 30: horizontal axis rotor, 35: horizontal Rotation driving means of shaft type rotor, 40: chamber opening / closing lid,
45: substrate holder, 50: holder lifting / lowering means,
70: slide opening / closing device, 80: substrate clamping device,
85: Holder clamping device, 90: Speed increasing link mechanism, H: Up position, W: Substrate.

 ──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Hiroyuki Kitazawa 322 Hashizushi Furukawa-cho, Fushimi-ku, Kyoto-shi, Kyoto Prefecture Nippon Screen Manufacturing Co., Ltd. Inside the Nakusai Plant (56) References JP-A-58-9325 (JP, A) JP-A-61-236126 (JP, A) JP-A-1-255227 (JP, A) JP-A-57-124145 (JP, U) JP-A-3-79423 (JP, U) JP-A-4 −26532 (JP, U) Fully open 4-48622 (JP, U) Really open 61-188354 (JP, U)

Claims (2)

(57) [Claims] And 1. A chamber having a substrate entrance to the upper part, a chamber lid that closes the substrate entrance of the chamber open, and the horizontal axis type rotor rotatably provided in the chamber, the horizontal axis of this a rotation driving means for rotating the mold rotor, is bridged to the horizontal axis type rotor, directly holding a plurality of substrates
Multiple substrates between the substrate transport robot
Comprising a substrate holder for directly transferring can hold at itself upright alignment, a substrate clamp apparatus for securing a plurality of substrates held by the substrate holder in the horizontal axis type rotors, and the substrate holding And a holder clamp device for fixing the substrate holder to the horizontal shaft rotor is provided on the horizontal shaft rotor, and a holder is provided below the horizontal shaft rotor. the holder lifting means for lifting the substrate holder arranged vertically movable, by the holder elevating means, by the upper temperature of the substrate holder, a plurality between the substrate holder and the substrate carrying robot A horizontal-axis rotating substrate drying apparatus characterized in that the substrate can be transferred. 2. The horizontal axis rotary type according to claim 1, wherein the chamber opening / closing lid includes a slide opening / closing device, and slides and retreats to one side of the chamber entrance / exit of the chamber to open the substrate entrance / exit. Substrate drying device.