JPS589325A - Self-rotational wafer dryer - Google Patents

Abstract

PURPOSE:To dry up completely and protect a surface from dust, by tightening a wafer edge to a cut at an opposite position of rotational wing on a rotor having a side plate which is divided in two and free to open and close, containing in a hollow of outer tube, and flowing in and out gas for the wing. CONSTITUTION:A partitioner 7 of a rotor 3 is opened at a hinge 9. A designated number of wafers 10 are supported at a cut 8a of a rotational wing 3, and the partitioner 7 is closed. The rotor 3 is placed within a hollow 2 of outer tube 1 and sucked from a hole 5. Gas flows from a hole 4, comes to the rotational wing 3, rotates the rotor 3, and flows out 5. Therefore, the wafers are rapidly and completely dried up by the centrifugal force and gas flow. The rotor 3 and outer tube are easily cleaned up. The wafers are free from dust. A dummy wafer is made unnecessary. The wafers can be dried up efficiently.

Description

[Detailed description of the invention] The present invention relates to a self-rotating wafer dryer.

Generally, during the manufacturing process of semiconductor devices, drying steps (3) and (3) are performed very frequently. This wafer drying process has become particularly important as semiconductor devices become smaller.

The reason for this is that during the drying process, fi particles adhered to the convex surface.]
This is because it was found that if the drying was insufficient, the quality of the thin film would deteriorate when the dryer was used to form a thin film, resulting in a significant decrease in the thickness (h-4).

However, the conventional dryer (01) stores a large number of wafers and arranges a plurality of nine wafers in a rotating container at radial positions with respect to the rotating shaft, and the rotating container is rotated at a predetermined speed. It is rotated into a wafer shape. For this reason, the structure of the device is complicated, and it is not possible to easily and completely remove the debris from the damaged cubes during the drying process from the rotating container. Since it cannot be completely removed, internal humidity increases. the result,
(c) The material was not dried sufficiently; and (c) the fi was generated from inside the rotating container.

The drawback is that it adheres and sticks to convex surfaces. t
In addition, since the cassette rotates eccentrically, if a cassette with a capacity of 0 for the rotating container cannot be prepared, the cassette must be stored in the rotating container in order to balance the rotation. However, it had the disadvantage of extremely poor workability.

The present invention has been made in view of this point K1m, and provides a self-rotating dryer that completely dries the dryer and prevents the generation of oxygen.

Examples of the present invention will be described below.

FIG. 1 is a perspective view of one embodiment of the present invention. In the figure, 1 has a curved part in the center, and a rotating rotor 1, which will be described later, is housed in a hollow part 2 that is just past the curved part. It is an outer cylinder. Outer cylinder 1
Opposing regions of the circumferential side surfaces of Ja are open along the longitudinal direction, and a gas guide plate Ja is formed along the longitudinal direction at the opening edge.

1k is erected, and a gas inlet 4 and a gas outlet 5 are formed. The f2 outlet (ttas) is connected to a suction mechanism (not shown), and the gas inlet (4) also exhausts the gas that has flowed in through the hollow section (2). t, outer cylinder 1
Side wall plates (not shown) that rotatably support the rotary plate 1 are provided on opposing sides of the rotary plate 1.

A heater 6 is embedded in the peripheral wall of the outer cylinder 10 to maintain the inside of the hollow portion 2 at a predetermined temperature. The outer cylinder 1 is made of metal such as stainless steel.

As shown in FIG. 2, the rotating parts 1 housed in the hollow part 2 of the outer cylinder 1 are arranged radially υ from the center of the two side plates 1 between the two opposite side plates 1. In this way, a plurality of rotary blades 8 are installed, and a plurality of notches l& for fixing the peripheral edge of the sea urchin are formed along the longitudinal direction of the sea urchin corresponding to predetermined positions of the opposing rotary blades 8. The second side plate r is formed by two approximately semicircular dividing plates 7a and Fit.
The six-rotation rotor 1, which is abutted openably and closably by a hinge 9 provided at one end of the abutting portion of the dividing plates 7a and 7b, has a peripheral edge in a notch 81L formed in the rotor blade 8. The wafer 10 is held in such a way that it fits in.
The rotating shaft 11 held by the side wall plate of the outer cylinder 1 is centrally protruded from one side of the dividing plate 1a.The material of the 0-rotation rotor l is made of lightweight and corrosion-resistant materials such as Teflon, stainless steel, and aluminum. Any material may be used as long as it has excellent properties.

According to the self-rotating wafer dryer configured in this way, the rotating rotor 30-divided plate Fas r k is opened around the hinge 9, and a predetermined number of wafers A1# is held in the notch 1ira of the rotor I. After closing the dividing plates Fa and Ft+ as shown in FIG.
The suction mechanism connected to K causes the inside of the hollow part 2' to be in a reduced pressure state.If the inside of the hollow part 2 reaches a reduced pressure state, the inlet 4
Gas flows into the gas outlet 5 through the hollow part O. This gas collides with the rotor blades 8 of the rotating rotor I and flows out of the gas outlet IK, causing the rotating rotor 1 in the hollow part 2 to rotate. At the same time, the gas passes through the rotating rotor 1 and flows out from the gas outlet l.

As a result, the wafer 1# held on the rotary row 11 is dried extremely smoothly and completely by the centrifugal force of the rotary row J and the gas penetrating the rotary mechanism 1.

In addition, due to long-term use of O, the wafer 10
Even if it is damaged, the structure K will remain intact because the gas will pass through the rotating solutor J.
outer cylinder 1 that houses the rotating rotor 1
Since the 0 structure also has an extremely simple front structure Kl&, it is possible to prevent damaged debris from the wafer 10 from adhering to the inside of the inner and outer cylinder 1 of the rotating rotor J. 9. Wafer 1 # can be dried by treating the amount stored in the rotor IK as one unit, so it is extremely necessary to prepare the wafers etc. It is possible to efficiently dry 100 wafers.

As explained above, using the self-rotating wafer dryer according to the present invention, the ability to completely dry the wafer and adhere the 01111iKft to the wafer with high workability has a remarkable effect. be.

[Brief explanation of the drawing]

Fig. 1 is a perspective view of one embodiment of the present invention, and Fig. 2 is a perspective view of a rotary unit used in the same embodiment. 1-・Outer tube, G・Hollow part, J・One-rotation rotor, 4-・Gas inlet, 5-F outlet, 6-Knee/, 1-20% Confucian plate, G・Rotor blade, 1a - notch, - applicant's agent
Patent Attorney Takehiko Suzue Figure 1

Claims (1)

[Claims] Two side plates facing each other so as to be openable and closable are arranged opposite each other at a predetermined interval, and a plurality of rotor blades are installed between the two side plates in a radial arrangement from the center of each of the two side plates. A rotating rotor consisting of a notch for fixing the peripheral edge of the rotary blade formed at an opposing position of the rotary blade, and a hollow portion for accommodating the rotating rotor, and a gas A self-rotating wafer dryer characterized by an outer cylinder having an inlet and a gas outlet.