JP2934118B2 - Exposure resistant release agent - Google Patents

Exposure resistant release agent

Info

Publication number
JP2934118B2
JP2934118B2 JP5112920A JP11292093A JP2934118B2 JP 2934118 B2 JP2934118 B2 JP 2934118B2 JP 5112920 A JP5112920 A JP 5112920A JP 11292093 A JP11292093 A JP 11292093A JP 2934118 B2 JP2934118 B2 JP 2934118B2
Authority
JP
Japan
Prior art keywords
component
group
release agent
bonded
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP5112920A
Other languages
Japanese (ja)
Other versions
JPH06322295A (en
Inventor
成昭 牧野
敬司 小林
浩二 鹿沼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Momentive Performance Materials Japan LLC
Original Assignee
GE Toshiba Silicones Co Ltd
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Filing date
Publication date
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は剥離用組成物に関し、さ
らに詳しくは、ヒドロシリル化反応によって硬化し、接
着性ないし粘着性の物質に対して剥離性を示す剥離剤被
膜を形成する組成物であって、塗布面が外気に暴露され
ることにより、剥離性が失われる現象を防止した剥離剤
被膜形成用組成物に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a release composition, and more particularly, to a composition which is cured by a hydrosilylation reaction to form a release agent film exhibiting releasability to an adhesive or tacky substance. In addition, the present invention relates to a composition for forming a release agent film, which prevents a phenomenon in which releasability is lost due to exposure of an application surface to outside air.

【0002】[0002]

【従来の技術】ポリオルガノシロキサンが各種の物質に
対して親和性を示さず、接着性ないし粘着性の物質に対
して剥離性を示すことを利用して、紙をはじめとする各
種繊維、合成樹脂フィルムなど、各種基材の表面に処理
し、架橋反応によって硬化皮膜を形成させて、接着性な
いし粘着性物質に対する剥離剤被膜として用いること
は、よく知られている。
2. Description of the Related Art Utilizing that polyorganosiloxane does not show affinity for various substances and shows releasability for adhesive or tacky substances, it can be used for various fibers such as paper and synthetic. It is well known that a surface of various substrates such as a resin film is treated and a cured film is formed by a crosslinking reaction, and is used as a release agent film for an adhesive or tacky substance.

【0003】このような硬化性ポリオルガノシロキサン
組成物としては、ビニル基含有ポリオルガノシロキサン
と、ケイ素原子に結合した水素原子を有するポリオルガ
ノハイドロジェンシロキサンとを主成分とし、ヒドロシ
リル化反応似よって硬化させる付加反応型の剥離用組成
物;およびシラノール基含有ポリオルガノシロキサンと
前述のようなポリオルガノハイドロジェンシロキサンと
を主成分とし、脱水素縮合によって硬化させる縮合反応
型の剥離用組成物が知られている。付加反応型は縮合反
応型に比べて硬化速度が速く、剥離力の剥離速度依存性
が小さいなどの利点があるので、剥離用組成物として広
く用いられている。しかしながら、付加反応型の剥離用
組成物は、硬化して得られた被膜が外気に暴露されると
剥離性能が失われる現象が見られる。そのため、付加反
応型の剥離用組成物を用いて剥離剤被膜を形成させた剥
離紙や剥離用フィルムを使用して、ラベルや粘着テープ
類を製造する過程で、該被膜が大気に暴露されると、こ
れらの製品が本来の剥離性を発揮できなくなって、剥離
不能になり、品質の重大な低下を招く。
Such a curable polyorganosiloxane composition is mainly composed of a vinyl-containing polyorganosiloxane and a polyorganohydrogensiloxane having a hydrogen atom bonded to a silicon atom, and is cured by a hydrosilylation reaction. There is known an addition-reaction-type stripping composition to be cured; and a condensation-reaction-type stripping composition comprising a silanol group-containing polyorganosiloxane and the above-mentioned polyorganohydrogensiloxane as main components and cured by dehydrogenation condensation. ing. The addition reaction type is widely used as a release composition because it has advantages such as a higher curing speed and a smaller release speed dependency of the release force than the condensation reaction type. However, the addition-removable release composition exhibits a phenomenon in which the release performance is lost when the cured film is exposed to the open air. Therefore, using a release paper or a release film on which a release agent film is formed using an addition-reaction type release composition, the film is exposed to the air in the process of manufacturing labels and adhesive tapes. In such a case, these products cannot exhibit their original peeling property, and cannot be peeled, resulting in a serious deterioration in quality.

【0004】このような問題を解決するために、付加反
応型の剥離用組成物に、アルコール変性ポリオルガノシ
ロキサンやポリエーテル変性ポリオルガノシロキサンを
配合する方法(特開昭55−3460号公報)、および
ポリオルガノハイドロジェンシロキサンの一部として、
片末端のケイ素原子のみにヒドロシリル基を有するもの
を配合する方法(特開平1−217068号公報)が知
られている。しかし、これらの方法は、上述のような大
気への暴露に対する安定性(以下、耐暴露性という)に
ある程度の効果は認められるが十分ではなく、また剥離
剤の接着剤層への移行量を増し、残留接着力を低下させ
るという問題点がある。
In order to solve such a problem, a method of blending an alcohol-modified polyorganosiloxane or a polyether-modified polyorganosiloxane with an addition-reaction type stripping composition (Japanese Patent Application Laid-Open No. 55-3460), And as part of the polyorganohydrogensiloxane,
There is known a method of blending a compound having a hydrosilyl group only at one silicon atom at one end (Japanese Patent Application Laid-Open No. Hei 217068). However, these methods have a certain effect on the stability to exposure to air as described above (hereinafter referred to as exposure resistance), but they are not sufficient, and the transfer amount of the release agent to the adhesive layer is reduced. In addition, there is a problem that the residual adhesive strength decreases.

【0005】[0005]

【発明が解決しようとする課題】本発明は、前述のよう
な付加反応型の剥離用組成物の問題点を解決するもの
で、その目的は、剥離剤の移行性を抑え、残留接着力の
低下を招かずに、耐暴露性を有する剥離剤被膜を与える
付加反応型の剥離用組成物を提供することである。
SUMMARY OF THE INVENTION The present invention solves the above-described problems of the addition-removable release composition, and its object is to suppress the migration of the release agent and reduce the residual adhesive force. An object of the present invention is to provide an addition-removable release composition which gives a release agent film having exposure resistance without causing a decrease.

【0006】[0006]

【課題を解決するための手段】本発明者らは、この課題
を解決するために鋭意検討した結果、付加反応によって
硬化する剥離用組成物において、(B)成分として、後
記の分子構造(I)および(II)の範囲になるように
(B)成分中のSi−H結合含有シロキサン単位の含有
量を選択し;このような(B)成分を、後記(A)成分
に対して特定量含むことによって、硬化により、耐暴露
性が特異的に優れ、かつ剥離剤の移行性が小さく、残留
接着力が大きい剥離剤被膜を与える剥離用組成物が得ら
れることを見出して、本発明を完成するに至った。
Means for Solving the Problems The present inventors have made intensive studies to solve this problem, and as a result, in a peeling composition which is cured by an addition reaction, the following molecular structure (I) is used as the component (B). ) And (II), the content of the siloxane unit containing a Si—H bond in the component (B) is selected; the component (B) is added in a specific amount relative to the component (A) described below. By including, it has been found that by curing, a release composition that gives a release agent film having a specific excellent exposure resistance, a small migration property of the release agent, and a large residual adhesive force can be obtained. It was completed.

【0007】すなわち、本発明は、下記(A)成分、
(B)成分および(C)成分を含む耐暴露性剥離用組成
物に関する。 (A)ケイ素原子に結合したビニル基を1分子中に2個
以上有し、ケイ素原子に結合した残余の有機基がメチル
基またはフェニル基であり、25℃における粘度が50
cP以上であるポリオルガノシロキサン; (B)ケイ素原子に結合した水素原子を1分子中に平均
少なくとも3個有する、式(I)で示される直鎖状およ
び/または式(II)で示される分岐状のポリオルガノハ
イドロジェンシロキサンを、(B)成分のケイ素原子に
結合した水素原子が、(A)成分中のビニル基1個に対
して2.3〜4.0個となる量;
That is, the present invention provides the following component (A):
The present invention relates to an exposure-resistant stripping composition containing the component (B) and the component (C). (A) two or more vinyl groups bonded to a silicon atom in one molecule, and the remaining organic group bonded to the silicon atom is a methyl group or a phenyl group;
a polyorganosiloxane having cP or more; (B) a linear group represented by the formula (I) and / or a branch represented by the formula (II) having an average of at least three hydrogen atoms bonded to silicon atoms in one molecule. The amount of the hydrogenated hydrogen bonded to the silicon atom of the component (B) is 2.3 to 4.0 per one vinyl group in the component (A);

【化3】 (式中、R1 は互いに同一または異なっていてもよく、
水素原子、メチル基またはフェニル基を表し;R2 は互
いに同一または異なっていてもよく、メチル基またはフ
ェニル基を表し;aおよびbはいずれも正の整数を表
し;Si−H結合含有シロキサン単位数の全シロキサン
単位数に対する比が0.45〜0.85である);
Embedded image (Wherein R 1 may be the same or different from each other;
R 2 represents a hydrogen atom, a methyl group or a phenyl group; R 2 may be the same or different, and represents a methyl group or a phenyl group; a and b each represent a positive integer; The ratio of the number to the total number of siloxane units is from 0.45 to 0.85);

【化4】 (式中、R3 は互いに同一または異なっていてもよく、
メチル基またはフェニル基を表し;yは0または正の整
数を表し;xの全シロキサン単位数(x+y+z)に対
する比が0.2〜0.8である); (C)白金または白金化合物 触媒量。
Embedded image (Wherein, R 3 may be the same or different from each other;
A methyl group or a phenyl group; y represents 0 or a positive integer; the ratio of x to the total number of siloxane units (x + y + z) is 0.2 to 0.8); (C) Platinum or platinum compound .

【0008】<(A)成分>(A)成分のポリオルガノ
シロキサンは、本発明の剥離用組成物において、ベース
ポリマーとして用いられる成分である。この(A)成分
は、ケイ素原子に直接結合したビニル基を1分子中に2
個以上有し、このビニル基が、後述の(B)成分のヒド
ロシリル基との反応で網状構造を形成することにより、
硬化して被膜を形成することができる。このビニル基
は、それぞれが異なるケイ素原子に結合していることが
好ましく、シロキサン鎖の末端ケイ素原子、中間ケイ素
原子のいずれに結合していてもよいが、少量のビニル基
の存在で、硬化により機械的強度の優れた被膜を得るた
めには、少なくともシロキサン鎖の末端ケイ素原子にビ
ニル基が結合していることが、より好ましい。
<Component (A)> The polyorganosiloxane of the component (A) is a component used as a base polymer in the release composition of the present invention. The component (A) contains two vinyl groups directly bonded to a silicon atom in one molecule.
This vinyl group forms a network structure by reaction with the hydrosilyl group of the component (B) described below,
It can be cured to form a coating. This vinyl group is preferably bonded to a different silicon atom, and may be bonded to any of the terminal silicon atom and the intermediate silicon atom of the siloxane chain. In order to obtain a film having excellent mechanical strength, it is more preferable that a vinyl group is bonded to at least the terminal silicon atom of the siloxane chain.

【0009】ビニル基の量は、前述のように1分子中に
2個以上であり、硬化性、硬化後の被膜の物性、該被膜
から接着剤層に移行する成分が少なく、残留接着率が高
いこと、およびベースポリマーを製造しやすいことか
ら、ビニル基含有シロキサン単位として、全シロキサン
単位中0.5〜10モル%の範囲であることが好まし
い。
As described above, the amount of the vinyl group is two or more in one molecule, the curability, the physical properties of the cured film, the amount of the component which migrates from the film to the adhesive layer is small, and the residual adhesion ratio is low. It is preferable that the vinyl group-containing siloxane unit is in the range of 0.5 to 10 mol% based on the total siloxane unit, because of its high cost and easy production of the base polymer.

【0010】ケイ素原子に結合したビニル基以外の有機
基は、硬化によって得られる被膜が剥離性、機械的強度
および硬化前の流動性に優れ、さらに本発明の目的であ
る耐暴露性を有することから、実質的にメチル基または
フェニル基である。とくに、被膜に優れた耐暴露性を与
えるには、該有機基の85%以上がメチル基であること
が好ましく、すべてメチル基であることがさらに好まし
い。
An organic group other than a vinyl group bonded to a silicon atom is required that a film obtained by curing has excellent releasability, mechanical strength and fluidity before curing, and also has exposure resistance, which is the object of the present invention. From is substantially a methyl or phenyl group. In particular, in order to give the film excellent exposure resistance, it is preferable that 85% or more of the organic groups are methyl groups, and it is more preferable that all of the organic groups are methyl groups.

【0011】(A)成分のシロキサン骨格は直鎖状でも
分岐状でもよく、被膜に優れた機械的性質を与えるため
に、これらを混合して用いてもよい。粘度は前述のよう
に25℃において50cP以上であり、100cP以上であ
ることが好ましい。粘度が50cP未満では硬化後の被膜
に十分な剥離性と機械的強度を与えることができず、と
くにグラシン紙やクラフト紙のような基材を用いる場
合、粘度が低いと基材への浸み込みが多い傾向があり、
同じ処理量を用いたときの剥離性が劣る。
The siloxane skeleton of the component (A) may be linear or branched, and these may be used in combination to give the coating excellent mechanical properties. As described above, the viscosity is 50 cP or more at 25 ° C., and preferably 100 cP or more. If the viscosity is less than 50 cP, it is not possible to impart sufficient peelability and mechanical strength to the cured film. In particular, when a base material such as glassine paper or kraft paper is used, if the viscosity is low, it will not penetrate the base material. Tend to be
Inferior peelability when using the same processing amount.

【0012】<(B)成分>(B)成分のポリオルガノ
ハイドロジェンシロキサンは、本発明の剥離用組成物に
おいて、架橋剤として用いられる成分である。すなわ
ち、(B)成分中に含まれるヒドロシリル基が(A)成
分中のビニル基との間に付加反応を行うことにより、網
状構造を形成する。そのため、(B)成分中のケイ素原
子に直接結合した水素原子の数は、1分子中に平均少な
くとも3個であり、合成の容易なことと反応性から、前
述の一般式(I)および(II)に示されるように、この
ような水素原子は、それぞれが異なるケイ素原子と結合
して、Si−H結合含有シロキサン単位を形成する。
<Component (B)> The polyorganohydrogensiloxane of component (B) is a component used as a crosslinking agent in the stripping composition of the present invention. That is, a network structure is formed by performing an addition reaction between the hydrosilyl group contained in the component (B) and the vinyl group contained in the component (A). Therefore, the number of hydrogen atoms directly bonded to silicon atoms in the component (B) is an average of at least three in one molecule, and the above-mentioned general formulas (I) and ( As shown in II), such hydrogen atoms combine with different silicon atoms to form Si-H bond-containing siloxane units.

【0013】さらに、該ポリオルガノハイドロジェンシ
ロキサンは、組成物が硬化して耐暴露性に優れた剥離剤
被膜を与えるためには、特定の分子構造、ならびにSi
−H結合含有シロキサン単位数の全シロキサン単位数に
対する比を有することが必要である。このようなポリオ
ルガノハイドロジェンシロキサンは、下記の式(I)で
示される直鎖状ポリオルガノハイドロジェンシロキサ
ン、または式(II)で示される分岐状ポリオルガノハイ
ドロジェンシロキサンであり、これらの混合物でもよ
い。
Further, the polyorganohydrogensiloxane is required to have a specific molecular structure and a specific molecular structure in order to cure the composition to give a release agent film having excellent exposure resistance.
It is necessary to have a ratio of the number of siloxane units containing -H bonds to the total number of siloxane units. Such a polyorganohydrogensiloxane is a linear polyorganohydrogensiloxane represented by the following formula (I) or a branched polyorganohydrogensiloxane represented by the following formula (II). Good.

【0014】[0014]

【化5】 Embedded image

【0015】(式中、R1 、R2 、aおよびbは前述の
とおり)なお、式(I)は単にシロキサン単位の構成比
を示すものであり、該直鎖状ポリオルガノハイドロジェ
ンシロキサンは、ランダム共重合体、ブロック共重合体
のいずれでも差支えなく、前者が一般的である。式
(I)において、両末端のシロキシ基は、R1 が水素原
子でもメチル基またはフェニル基でも差支えない。両末
端のR1 が水素原子である場合、該ポリオルガノハイド
ロジェンシロキサン中のSi−H含有シロキサン単位の
数a´はa+2である。また、片末端のR1 が水素原子
である場合、上記a´はa+1であり、両末端のR1
メチル基またはフェニル基である場合、a´はaに等し
い。本発明において特徴的なことは、このようなa´と
全シロキサン単位の数(a+b+2)の比a´/(a+
b+2)が0.45〜0.85、好ましくは0.45〜
0.75であることで、このことによって、硬化して得
られる剥離剤層に優れた耐暴露性を与えることができ
る。
(Wherein R 1 , R 2 , a and b are as described above) Note that the formula (I) simply shows the constitutional ratio of siloxane units, and the linear polyorganohydrogensiloxane is Any of a random copolymer and a block copolymer may be used, and the former is generally used. In the formula (I), the siloxy groups at both terminals may be such that R 1 is a hydrogen atom, a methyl group or a phenyl group. When R 1 at both ends is a hydrogen atom, the number a ′ of the Si—H-containing siloxane units in the polyorganohydrogensiloxane is a + 2. When R 1 at one end is a hydrogen atom, a ′ is a + 1. When R 1 at both ends is a methyl group or a phenyl group, a ′ is equal to a. What is characteristic in the present invention is that the ratio a '/ (a +) of such a' to the number of all siloxane units (a + b + 2).
b + 2) is from 0.45 to 0.85, preferably from 0.45 to
When it is 0.75, this makes it possible to impart excellent exposure resistance to the release agent layer obtained by curing.

【0016】[0016]

【化6】 Embedded image

【0017】(式中、R3 、x、y及びzは前述のとお
り)式(II)において、R3 2HSiO1/2 単位およびR
3 3SiO1/2 単位はいずれもSiO2 単位に任意の組合
せで結合して、分岐状ポリシロキサンを形成している。
該ポリオルガノハイドロジェンシロキサンにおいて、S
i−H含有シロキサン単位の数はxである。硬化して得
られる剥離剤層に優れた耐暴露性を与えるには、xと全
シロキサン単位の数(x+y+z)との比x/(x+y
+z)が0.20〜0.80の範囲であることが必要で
あり、好ましくは0.30〜0.70である。
(Wherein R 3 , x, y and z are as described above) In the formula (II), R 3 2 HSiO 1/2 units and R
3 3 SiO 1/2 units are bonded in any combination in any SiO 2 units to form a branched polysiloxane.
In the polyorganohydrogensiloxane, S
The number of i-H containing siloxane units is x. In order to impart excellent exposure resistance to the cured release agent layer, the ratio of x to the total number of siloxane units (x + y + z) x / (x + y)
+ Z) must be in the range of 0.20 to 0.80, preferably 0.30 to 0.70.

【0018】式(I)、式(II)のいずれの場合も、ケ
イ素原子に結合した有機基、すなわちR1(水素原子であ
る場合を除く)、R2 およびR3 は、剥離剤層に優れた
耐暴露性を与えることから、メチル基またはフェニル基
であり、分子中に該有機基の85%以上がメチル基であ
ることが好ましく、すべてメチル基であることがさらに
好ましい。
In each of the formulas (I) and (II), the organic group bonded to the silicon atom, that is, R 1 (except when it is a hydrogen atom), R 2 and R 3 are added to the release agent layer. In order to provide excellent exposure resistance, a methyl group or a phenyl group is preferred, and 85% or more of the organic groups in the molecule are preferably methyl groups, and more preferably all are methyl groups.

【0019】粘度はとくに限定されないが、合成および
取扱いの容易なことから、25℃における粘度が500
cP以下であることが好ましい。
The viscosity is not particularly limited, but the viscosity at 25 ° C. is 500 due to the ease of synthesis and handling.
It is preferably cP or less.

【0020】このような(B)成分の配合量は、(B)
成分中のケイ素原子に結合した水素原子が、(A)成分
中のビニル基1個に対して2.3〜4.0個になる量で
あり、このことによって、硬化して得られる剥離剤被膜
が優れた耐暴露性を有する。また、上記の範囲内で、
(B)成分の量は、(A)成分100重量部に対して
0.5〜100重量部になるように、両成分の平均分子
量、ならびに(A)成分のビニル基含有量および(B)
成分のケイ素原子に結合した水素原子の含有量を選定す
ることが好ましい。この量が0.5重量部未満では、
(B)成分を短時間で均一に(A)成分中に分散するこ
とが困難で、作業上の制約を生ずる。また、この量が1
00重量部を越すような組合せでは、残留接着率が低下
し、移行性が悪くなる。
The amount of the component (B) is as follows:
The amount of hydrogen atoms bonded to silicon atoms in the component is 2.3 to 4.0 with respect to one vinyl group in the component (A). The coating has excellent exposure resistance. Also, within the above range,
The amount of the component (B) is 0.5 to 100 parts by weight per 100 parts by weight of the component (A).
It is preferable to select the content of the hydrogen atom bonded to the silicon atom of the component. If this amount is less than 0.5 parts by weight,
It is difficult to uniformly disperse the component (B) in the component (A) in a short time, which imposes operational restrictions. Also, this amount is 1
If the amount exceeds 00 parts by weight, the residual adhesion rate decreases, and the migration property deteriorates.

【0021】<(C)成分>(C)成分の白金または白
金化合物は、(A)成分中のビニル基と(B)成分中の
Si−H結合との間のヒドロシリル化反応に触媒として
働く硬化触媒であり、触媒効果から白金化合物が好まし
い。白金化合物としては、塩化白金酸、塩化白金酸とア
ルコールの反応生成物、白金−オレフィン錯体、白金−
ビニルシロキサン錯体、白金−リン錯体、白金配位化合
物などが例示される。
<Component (C)> The platinum or platinum compound of the component (C) functions as a catalyst for the hydrosilylation reaction between the vinyl group in the component (A) and the Si—H bond in the component (B). It is a curing catalyst, and a platinum compound is preferred from the viewpoint of catalytic effect. Platinum compounds include chloroplatinic acid, reaction products of chloroplatinic acid and alcohol, platinum-olefin complexes, platinum-
Examples thereof include a vinylsiloxane complex, a platinum-phosphorus complex, and a platinum coordination compound.

【0022】(C)成分の配合量は、触媒としての有効
量であり、(A)成分と(B)成分の合計量に対し、通
常、白金原子として1〜500ppm の範囲であり、1〜
300ppm が好ましい。1ppm 未満では硬化が非常に遅
くて実用上の不利があり、また300ppm を越えてもそ
れに見合う硬化速度の向上が期待できず、経済性および
安定性のうえで好ましくない。
The compounding amount of the component (C) is an effective amount as a catalyst, and is usually in the range of 1 to 500 ppm as platinum atom with respect to the total amount of the components (A) and (B).
300 ppm is preferred. If it is less than 1 ppm, curing is extremely slow, which is disadvantageous in practical use. If it exceeds 300 ppm, a corresponding improvement in curing speed cannot be expected, which is not preferable in terms of economy and stability.

【0023】<その他の添加剤>本発明の組成物に、必
要に応じて、本発明の組成物の機能を損なわない範囲
で、公知の添加剤を配合してもよい。このような添加剤
としては、ポリジメチルシロキサン、煙霧質シリカのよ
うな無機質充填剤、ベンガラのような顔料、2−メチル
−3−ブチン−2−オールのような硬化抑制剤、および
2−ヒドロキシ−2−メチル−1−フェニルプロパン−
1−オンのような光増感剤を例示することができる。
<Other Additives> Known additives may be added to the composition of the present invention, if necessary, as long as the function of the composition of the present invention is not impaired. Such additives include inorganic fillers such as polydimethylsiloxane, fumed silica, pigments such as red iron, curing inhibitors such as 2-methyl-3-butyn-2-ol, and 2-hydroxy -2-methyl-1-phenylpropane-
Photosensitizers such as 1-one can be exemplified.

【0024】<使用法>本発明の組成物は、系の見掛粘
度が低いときはそのまま基材に塗布してもよいが、塗布
や処理の作業性を考慮して、溶媒で希釈して用いるのが
一般的である。溶媒としては、ベンゼン、トルエン、キ
シレンなどの芳香族炭化水素;ヘプタン、ヘキサンなど
の脂肪族炭化水素;テトラクロロエチレンなどのハロゲ
ン化炭化水素;酢酸エチル、酢酸ブチルなどのエステ
ル;およびメチルエチルケトン、メチルイソブチルケト
ンなどのケトン;ならびにこれらの混合物が例示され
る。
<Usage Method> The composition of the present invention may be applied to a substrate as it is when the apparent viscosity of the system is low, but it is diluted with a solvent in consideration of workability of application and processing. It is generally used. Examples of the solvent include aromatic hydrocarbons such as benzene, toluene, and xylene; aliphatic hydrocarbons such as heptane and hexane; halogenated hydrocarbons such as tetrachloroethylene; esters such as ethyl acetate and butyl acetate; and methyl ethyl ketone and methyl isobutyl ketone. And mixtures thereof.

【0025】本発明の組成物は、通常、(A)成分およ
び(B)成分、ならびに必要に応じて添加剤や溶媒を混
合しておき、別途用意した(C)成分またはその溶液を
使用直前に混合して、基材に塗布する。必要に応じて、
(B)成分を別途保存してもよいし、硬化抑制剤の存在
下に(A)、(B)成分を混合したものまたはその溶液
を保存してもよい。
The composition of the present invention is usually prepared by mixing the components (A) and (B), and additives and solvents as required, and then preparing the separately prepared component (C) or a solution thereof immediately before use. And apply to the substrate. If necessary,
The component (B) may be stored separately, or a mixture of the components (A) and (B) or a solution thereof may be stored in the presence of a curing inhibitor.

【0026】基材としては、グラシン紙、クラフト紙、
パーチメント紙、ポリエチレンラミネート紙などの紙な
いし紙複合材;およびポリエチレンフィルム、ポリプロ
ピレンフィルムなどのプラスチックフィルムが例示され
るが、これらに限定されるものではない。
As the base material, glassine paper, kraft paper,
Examples include, but are not limited to, paper or paper composites such as parchment paper and polyethylene laminated paper; and plastic films such as polyethylene film and polypropylene film.

【0027】塗布後、溶媒が存在するときは乾燥して溶
媒を除去した後、加熱して硬化させ、基材表面に剥離剤
被膜を形成させる。加熱条件は、通常、温度100〜1
50℃で10〜30秒である。
After the application, if a solvent is present, it is dried to remove the solvent, and then heated and cured to form a release agent film on the surface of the substrate. The heating condition is usually at a temperature of 100 to 1
10 to 30 seconds at 50 ° C.

【0028】[0028]

【発明の効果】本発明の組成物を硬化させて得られる剥
離剤被膜は、残留接着率が高く、剥離剤の移行がないこ
とに加えて、とくに特徴的なことに、耐暴露性に優れて
いる。すなわち、このような剥離剤被膜を形成した剥離
紙や剥離用フィルムは、剥離剤面を外気に暴露しても、
剥離に要する力(剥離力)が重くならないうえに、初期
の残留接着率や移行性を保持するので、品質安定化の点
で有利であり、その工業的意義が大きい。
The release agent film obtained by curing the composition of the present invention has a high residual adhesiveness, no migration of the release agent, and in particular, has excellent exposure resistance. ing. That is, a release paper or a release film on which such a release agent film is formed, even if the release agent surface is exposed to the outside air,
Since the force required for peeling (peeling force) is not increased, and the initial residual adhesion rate and migration property are maintained, it is advantageous in terms of quality stabilization and has great industrial significance.

【0029】[0029]

【実施例】以下の実施例および比較例によって、本発明
をさらに具体的に説明する。本発明は、これらの実施例
によって限定されるものではない。以下の実施例および
比較例において、部は重量部を表し、粘度は25℃にお
ける値を示す。
The present invention will be described more specifically with reference to the following examples and comparative examples. The present invention is not limited by these examples. In the following examples and comparative examples, parts represent parts by weight, and the viscosity indicates a value at 25 ° C.

【0030】実施例および比較例には、(A)成分とし
て下記のA−1〜A−4、(B)成分としてB−1〜B
−8を用いた。ただし、B−5〜B−8は比較のための
ポリオルガノハイドロジェンシロキサンである。なお、
以下の記述、および表1中の単位式において、シロキサ
ン単位を次の略号によって表す。該単位式はシロキサン
単位の構成比を意味し、各ポリシロキサンはランダム共
重合体である。 M :(CH3)3 SiO1/2 単位 M´:(CH3)2 HSiO1/2 単位 Mv :(CH3)2(CH2 =CH)SiO1/2 単位 D :(CH3)2 SiO単位 D´:(CH3)HSiO単位 Dv :(CH3)(CH2 =CH)SiO単位 Dph2 :(C65)2 SiO単位 MOH:HO(CH3)2 SiO1/2 単位 Q :SiO2 単位
Examples and comparative examples include the following components A-1 to A-4 as components (A) and components B-1 to B-4 as components (B).
-8 was used. However, B-5 to B-8 are polyorganohydrogensiloxanes for comparison. In addition,
In the following description and in the unit formula in Table 1, siloxane units are represented by the following abbreviations. The unit formula means the composition ratio of siloxane units, and each polysiloxane is a random copolymer. M: (CH 3) 3 SiO 1/2 units M': (CH 3) 2 HSiO 1/2 units M v: (CH 3) 2 (CH 2 = CH) SiO 1/2 units D: (CH 3) 2 SiO unit D ': (CH 3 ) H SiO unit D v : (CH 3 ) (CH 2 CHCH ) SiO unit D ph2 : (C 6 H 5 ) 2 SiO unit M OH : HO (CH 3 ) 2 SiO 1 / 2 unit Q: SiO 2 unit

【0031】なお、B−2は、M´単位およびQ単位か
らなる分岐状ポリメチルハイドロジェンシロキサンであ
り、重量平均分子量が約900、ケイ素原子に結合した
水素原子の含有量が1.029重量%であった。
B-2 is a branched polymethylhydrogensiloxane composed of M 'units and Q units, having a weight average molecular weight of about 900 and a hydrogen atom content bonded to silicon atoms of 1.029% by weight. %Met.

【0032】(C)成分として用いたC−1は、塩化白
金酸とテトラビニルテトラメチルシクロテトラシロキサ
ンから得られた白金−ビニルシロキサン錯体で、白金含
有量が4,000ppm のものである。硬化抑制剤として
用いたD−2は、2−メチル−3−ブチン−2−オール
である。
C-1 used as the component (C) is a platinum-vinylsiloxane complex obtained from chloroplatinic acid and tetravinyltetramethylcyclotetrasiloxane and has a platinum content of 4,000 ppm. D-2 used as a curing inhibitor is 2-methyl-3-butyn-2-ol.

【0033】表1に示す配合比により、(A)成分、
(B)成分およびC−1、ならびに必要に応じてトルエ
ン、D−1およびD−2を配合し、均一になるまで撹拌
混合して、実施例1〜10および比較例1〜5の処理液
をそれぞれ調製した。
According to the compounding ratio shown in Table 1, the component (A)
(B) The component and C-1 and, if necessary, toluene, D-1 and D-2 are blended, and the mixture is stirred and mixed until the mixture becomes uniform. Was prepared respectively.

【0034】これらの処理液を、密度75g/m2のポリエ
チレンラミネート紙に、乾燥後の塗布量が0.8g/m2
なるように塗布し、110℃に30秒加熱して硬化さ
せ、ポリエチレンラミネート紙の表面に剥離剤被膜を形
成した。
These treatment liquids were applied to a polyethylene laminated paper having a density of 75 g / m 2 so that the coating amount after drying was 0.8 g / m 2 , and cured by heating at 110 ° C. for 30 seconds. A release agent film was formed on the surface of the polyethylene laminated paper.

【0035】[0035]

【表1】 [Table 1]

【0036】得られた剥離剤被膜の評価を、下記のよう
にして行った。その結果、表2に示す結果が得られた。
The obtained release agent film was evaluated as follows. As a result, the results shown in Table 2 were obtained.

【0037】[0037]

【表2】 [Table 2]

【0038】<剥離力(初期)>剥離剤被膜の表面に、
アクリル系溶剤型粘着剤オリバインBPS-8170(東洋イン
キ(株)製、商品名)を、未乾燥厚さが88μm になる
ように塗布し、100℃で3分間乾燥させた。
<Release Force (Initial)>
Acrylic solvent-type pressure-sensitive adhesive Olivine BPS-8170 (trade name, manufactured by Toyo Ink Co., Ltd.) was applied so as to have a wet thickness of 88 μm, and dried at 100 ° C. for 3 minutes.

【0039】次に、単位重量60g/m2の上質紙をその上
に剥り合わせ、全体を幅5cmの短冊型に切断した。これ
を20g/cm2 の荷重のもとに、温度25℃、相対湿度5
0%の条件で1日養生させて、試料とした。この試料
を、引張試験機により、180°方向に速度0.3m/mi
n で引張り、剥離に要する力を測定した。
Next, high-quality paper having a unit weight of 60 g / m 2 was peeled off thereon, and the whole was cut into a strip having a width of 5 cm. This was applied under a load of 20 g / cm 2 at a temperature of 25 ° C. and a relative humidity of 5
After curing for 1 day under the condition of 0%, a sample was obtained. The sample was subjected to a tensile tester at a speed of 0.3 m / mi in the 180 ° direction.
n and the force required for peeling was measured.

【0040】<剥離力(暴露後)>剥離剤被膜を有する
試料、その処理面を上にして、屋外で大気中に4時間暴
露した。これを用いて、初期と同様の方法によって剥離
力を測定した。
<Release Force (After Exposure)> The sample having the release agent coating was exposed outdoors to the air for 4 hours with the treated surface facing upward. Using this, the peeling force was measured by the same method as in the initial stage.

【0041】<残留接着力>剥離剤被膜の表面に、幅
2.5cmのニットー31B 粘着テープ(日東電工(株)
製、商品名)を貼り付けた。これを20g/cm2 の荷重の
もとに、70℃で20時間放置した後、テープを剥離剤
被膜の表面よりはがして、剥離剤に接触していた面をス
テンレス板(JIS C2107)に貼り付け、2kgロ
ーラーで圧着した。これを25℃で3時間養生させたも
のを、引張試験機によって180°の方向に引張り、テ
ープの剥離力(f)を測定した。一方、同種の粘着テー
プをポリテトラフルオロエチレンフィルムに貼り付け、
以後、同様の操作により、このテープの基準剥離力(f
o)を測定した。次式により、残留接着率を算出した。
<Residual adhesive strength> Nitto 31B adhesive tape (width 2.5 cm) (Nitto Denko Corporation)
Product name). After leaving this at 70 ° C. for 20 hours under a load of 20 g / cm 2 , the tape was peeled off from the surface of the release agent coating, and the surface in contact with the release agent was attached to a stainless steel plate (JIS C2107). And pressed with a 2 kg roller. This was cured at 25 ° C. for 3 hours, pulled in a 180 ° direction by a tensile tester, and the peeling force (f) of the tape was measured. On the other hand, the same kind of adhesive tape is stuck on polytetrafluoroethylene film,
Thereafter, by the same operation, the reference peeling force (f
o ) was measured. The residual adhesion rate was calculated by the following equation.

【0042】[0042]

【数1】 (Equation 1)

【0043】<移行性>前述のようにして剥離剤被膜を
設けたポリエチレンラミネート紙を、幅5cmの短冊型に
切断した。剥離剤被膜面に厚さ25μm のPETフィル
ムを貼り合わせて100g/cm2 の荷重をかけ、65℃で
20時間圧着した後、引きはがして、剥離剤と接してい
た方のPETフィルム面にマジックインク(ハイマッキ
ー:ゼブラ(株)製、商品名)で線を引き、インクのは
じき具合を観察して、4段階の評価を行った。
<Migration> The polyethylene laminated paper provided with the release agent coating as described above was cut into a strip having a width of 5 cm. A 25 μm-thick PET film was stuck on the release agent coating surface, a load of 100 g / cm 2 was applied, and the film was pressed at 65 ° C. for 20 hours. A line was drawn with ink (Hi Mackey: manufactured by Zebra Corp., trade name), the degree of repelling of the ink was observed, and a four-stage evaluation was performed.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平4−20570(JP,A) 特開 平2−298550(JP,A) 特開 昭58−19370(JP,A) (58)調査した分野(Int.Cl.6,DB名) C09D 183/05 C09D 183/07 C09D 5/20 C09J 7/02 ────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-4-20570 (JP, A) JP-A-2-298550 (JP, A) JP-A-58-19370 (JP, A) (58) Investigation Field (Int.Cl. 6 , DB name) C09D 183/05 C09D 183/07 C09D 5/20 C09J 7/02

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 下記(A)成分、(B)成分および
(C)成分を含む、接着性または粘着性物質の耐暴露性
剥離剤。 (A)ケイ素原子に結合したビニル基を1分子中に2個
以上有し、ケイ素原子に結合した残余の有機基がメチル
基またはフェニル基であり、25℃における粘度が50
cP以上であるポリオルガノシロキサン; (B)ケイ素原子に結合した水素原子を1分子中に平均
少なくとも3個有する、式(I)で示される直鎖状およ
び/または式(II)で示される分岐状のポリオルガノハ
イドロジェンシロキサンを、(B)成分のケイ素原子に
結合した水素原子が、(A)成分中のビニル基1個に対
して2.3〜4.0個となる量; 【化1】 (式中、R1 は互いに同一または異なっていてもよく、
水素原子、メチル基またはフェニル基を表し;R2 は互
いに同一または異なっていてもよく、メチル基またはフ
ェニル基を表し;aおよびbはいずれも正の整数を表
し;Si−H結合含有シロキサン単位数の全シロキサン
単位数に対する比が0.45〜0.85である); 【化2】 (式中、R3 は互いに同一または異なっていてもよく、
メチル基またはフェニル基を表し;yは0または正の整
数を表し;xの全シロキサン単位数(x+y+z)に対
する比が0.2〜0.8である); (C)白金または白金化合物 触媒量。
1. Exposure resistance of an adhesive or tacky substance containing the following components (A), (B) and (C)
paint remover. (A) two or more vinyl groups bonded to a silicon atom in one molecule, and the remaining organic group bonded to the silicon atom is a methyl group or a phenyl group;
a polyorganosiloxane having cP or more; (B) a linear group represented by the formula (I) and / or a branch represented by the formula (II) having an average of at least three hydrogen atoms bonded to silicon atoms in one molecule. The amount of hydrogen in the form of polyorganohydrogensiloxane in the form of 2.3 to 4.0 hydrogen atoms bonded to silicon atoms in component (B) per vinyl group in component (A); 1) (Wherein R 1 may be the same or different from each other;
R 2 represents a hydrogen atom, a methyl group or a phenyl group; R 2 may be the same or different from each other, and represents a methyl group or a phenyl group; a and b each represent a positive integer; The ratio of the number to the total number of siloxane units is from 0.45 to 0.85); (Wherein, R 3 may be the same or different from each other;
A methyl group or a phenyl group; y represents 0 or a positive integer; the ratio of x to the total number of siloxane units (x + y + z) is 0.2 to 0.8); (C) platinum or a platinum compound .
JP5112920A 1993-05-14 1993-05-14 Exposure resistant release agent Expired - Lifetime JP2934118B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5112920A JP2934118B2 (en) 1993-05-14 1993-05-14 Exposure resistant release agent

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5112920A JP2934118B2 (en) 1993-05-14 1993-05-14 Exposure resistant release agent

Publications (2)

Publication Number Publication Date
JPH06322295A JPH06322295A (en) 1994-11-22
JP2934118B2 true JP2934118B2 (en) 1999-08-16

Family

ID=14598798

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2934118B2 (en)

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FR2903112A1 (en) * 2006-06-29 2008-01-04 Rhodia Recherches & Tech CROSS-LINKABLE SILICONE COMPOSITION FOR THE REALIZATION OF ANTI-ADHESIVE COATINGS FOR FLEXIBLE SUBSTRATES AND ADDITIVE PROMOTER HANGING CONTAINED IN THIS COMPOSITION
JP6877819B2 (en) * 2015-12-25 2021-05-26 旭化成ワッカーシリコーン株式会社 Oil-in-water silicone emulsion composition for release coating and release film using this
JP6702224B2 (en) * 2017-02-17 2020-05-27 信越化学工業株式会社 Addition curable silicone resin composition and die attach material for optical semiconductor device
CN109880523B (en) * 2019-03-18 2021-03-30 苏州世华新材料科技股份有限公司 High-temperature-resistant low-transfer organic silicon release agent and preparation method thereof
JP7176990B2 (en) * 2019-03-27 2022-11-22 リンテック株式会社 Coating liquid of release agent composition and method for producing release film for ceramic green sheet production process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160028378A (en) 2014-09-03 2016-03-11 신에쓰 가가꾸 고교 가부시끼가이샤 Silicone composition for release paper or release film, release paper and release film

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