JP2924989B2 - ダイヤモンド膜被覆窒化珪素基部材及びその製造方法 - Google Patents

ダイヤモンド膜被覆窒化珪素基部材及びその製造方法

Info

Publication number
JP2924989B2
JP2924989B2 JP4013212A JP1321292A JP2924989B2 JP 2924989 B2 JP2924989 B2 JP 2924989B2 JP 4013212 A JP4013212 A JP 4013212A JP 1321292 A JP1321292 A JP 1321292A JP 2924989 B2 JP2924989 B2 JP 2924989B2
Authority
JP
Japan
Prior art keywords
diamond film
diamond
silicon nitride
film
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP4013212A
Other languages
English (en)
Japanese (ja)
Other versions
JPH05201796A (ja
Inventor
聡 飯尾
正一 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Tokushu Togyo KK
Original Assignee
Nippon Tokushu Togyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Tokushu Togyo KK filed Critical Nippon Tokushu Togyo KK
Priority to JP4013212A priority Critical patent/JP2924989B2/ja
Priority to FR9300653A priority patent/FR2686599B1/fr
Priority to GB9301654A priority patent/GB2263709B/en
Priority to DE4302407A priority patent/DE4302407C2/de
Publication of JPH05201796A publication Critical patent/JPH05201796A/ja
Priority to US08/453,464 priority patent/US5626908A/en
Application granted granted Critical
Publication of JP2924989B2 publication Critical patent/JP2924989B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5001—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with carbon or carbonisable materials
    • C04B41/5002—Diamond
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/85—Coating or impregnation with inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/04—Diamond
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S427/00—Coating processes
    • Y10S427/103—Diamond-like carbon coating, i.e. DLC

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Ceramic Products (AREA)
JP4013212A 1992-01-28 1992-01-28 ダイヤモンド膜被覆窒化珪素基部材及びその製造方法 Expired - Fee Related JP2924989B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP4013212A JP2924989B2 (ja) 1992-01-28 1992-01-28 ダイヤモンド膜被覆窒化珪素基部材及びその製造方法
FR9300653A FR2686599B1 (fr) 1992-01-28 1993-01-22 Procede de production d'un article a base de nitrure de silicium, revetu avec un film de diamant ou d'une matiere similaire.
GB9301654A GB2263709B (en) 1992-01-28 1993-01-28 Method for producing silicon nitride based members with synthetic diamond
DE4302407A DE4302407C2 (de) 1992-01-28 1993-01-28 Verfahren zur Herstellung eines mit einer Schicht aus Diamant beschichteten Elements auf Siliciumnitridbasis
US08/453,464 US5626908A (en) 1992-01-28 1995-05-30 Method for producing silicon nitride based member coated with film of diamond

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4013212A JP2924989B2 (ja) 1992-01-28 1992-01-28 ダイヤモンド膜被覆窒化珪素基部材及びその製造方法

Publications (2)

Publication Number Publication Date
JPH05201796A JPH05201796A (ja) 1993-08-10
JP2924989B2 true JP2924989B2 (ja) 1999-07-26

Family

ID=11826853

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4013212A Expired - Fee Related JP2924989B2 (ja) 1992-01-28 1992-01-28 ダイヤモンド膜被覆窒化珪素基部材及びその製造方法

Country Status (5)

Country Link
US (1) US5626908A (enExample)
JP (1) JP2924989B2 (enExample)
DE (1) DE4302407C2 (enExample)
FR (1) FR2686599B1 (enExample)
GB (1) GB2263709B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7283850B2 (en) 2004-10-12 2007-10-16 Microsoft Corporation Method and apparatus for multi-sensory speech enhancement on a mobile device

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* Cited by examiner, † Cited by third party
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DE69503411T2 (de) * 1994-03-30 1998-11-19 Cummins Engine Co Inc Dichtung zum mechanischen Abdichten einer Kühlmittelpumpe einer Dieselbrennkraftmaschine und Verfahren zu deren Herstellung
US6936310B1 (en) * 1999-04-02 2005-08-30 Sharp Kabushiki Kaisha Plasma processing method
JP4070417B2 (ja) * 2000-03-31 2008-04-02 日本特殊陶業株式会社 窒化珪素質部材及びその製造方法並びに切削工具
US7866342B2 (en) 2002-12-18 2011-01-11 Vapor Technologies, Inc. Valve component for faucet
US7866343B2 (en) 2002-12-18 2011-01-11 Masco Corporation Of Indiana Faucet
US8555921B2 (en) 2002-12-18 2013-10-15 Vapor Technologies Inc. Faucet component with coating
US8220489B2 (en) 2002-12-18 2012-07-17 Vapor Technologies Inc. Faucet with wear-resistant valve component
FR2967231B1 (fr) * 2010-11-04 2012-12-28 Electricite De France Dispositif de raccordement destine a se raccorder a au moins une canalisation
DE102010054875B4 (de) * 2010-12-17 2012-10-31 Eagleburgmann Germany Gmbh & Co. Kg Reibungsarmer Gleitring mit kostengünstiger Diamantbeschichtung
RU2639437C1 (ru) * 2016-06-15 2017-12-21 федеральное государственное бюджетное образовательное учреждение высшего образования "Пермский национальный исследовательский политехнический университет" Способ получения кольца скольжения торцевого уплотнения
US10373477B1 (en) 2016-09-28 2019-08-06 Gojo Industries, Inc. Hygiene compliance modules for dispensers, dispensers and compliance monitoring systems
JP7360202B2 (ja) * 2018-09-28 2023-10-12 広東工業大学 ダイヤモンドコーティング窒化ケイ素セラミック全体ツールの製造方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6059086B2 (ja) * 1980-12-12 1985-12-23 住友電気工業株式会社 被覆セラミツク工具
JPS6059086A (ja) * 1983-09-13 1985-04-05 Kanegafuchi Chem Ind Co Ltd 電解方法
JPH088466B2 (ja) * 1986-07-15 1996-01-29 松下電器産業株式会社 シンセサイザ受信機のロ−タリ−選局方式
US5271971A (en) * 1987-03-30 1993-12-21 Crystallume Microwave plasma CVD method for coating a substrate with high thermal-conductivity diamond material
JP2794111B2 (ja) * 1987-06-09 1998-09-03 京セラ株式会社 ダイヤモンド被覆切削工具
KR920000801B1 (ko) * 1988-02-04 1992-01-23 이데미쯔세끼유가가꾸 가부시기가이샤 다이아몬드박막부착 초경합금의 제조방법
GB8810113D0 (en) * 1988-04-28 1988-06-02 Jones B L Bonded composite
US5006203A (en) * 1988-08-12 1991-04-09 Texas Instruments Incorporated Diamond growth method
GB2228745B (en) * 1989-01-10 1993-09-08 Kobe Steel Ltd Process for the selective deposition of thin diamond film by gas phase synthesis
US4919974A (en) * 1989-01-12 1990-04-24 Ford Motor Company Making diamond composite coated cutting tools
JPH02296782A (ja) * 1989-05-11 1990-12-07 Idemitsu Petrochem Co Ltd ダイヤモンド被覆部材
WO1990015787A1 (fr) * 1989-06-15 1990-12-27 Idemitsu Petrochemical Company Limited Element enrobe de diamant
US5200231A (en) * 1989-08-17 1993-04-06 U.S. Philips Corporation Method of manufacturing polycrystalline diamond layers
JPH03197677A (ja) * 1989-12-25 1991-08-29 Sumitomo Electric Ind Ltd ダイヤモンドコーティング工具及びその製造法
JPH0733301B2 (ja) * 1989-12-28 1995-04-12 日本特殊陶業株式会社 ダイヤモンド類被覆部材およびその製造方法
DE69017404T2 (de) * 1989-12-28 1995-11-09 Idemitsu Petrochemical Co Diamantbeschichteter Sinterkörper und Verfahren zu seiner Herstellung.
GB2240114B (en) * 1990-01-18 1993-03-24 Stc Plc Film nucleation process
JP3033169B2 (ja) * 1990-10-05 2000-04-17 住友電気工業株式会社 ダイヤモンド被覆スローアウェイチップ及びその製造法
CA2044543C (en) * 1990-08-10 1999-12-14 Louis Kimball Bigelow Multi-layer superhard film structure
JPH04202075A (ja) * 1990-11-30 1992-07-22 Sumitomo Electric Ind Ltd ダイヤモンド被覆硬質材料の製造方法
US5242711A (en) * 1991-08-16 1993-09-07 Rockwell International Corp. Nucleation control of diamond films by microlithographic patterning

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7283850B2 (en) 2004-10-12 2007-10-16 Microsoft Corporation Method and apparatus for multi-sensory speech enhancement on a mobile device

Also Published As

Publication number Publication date
GB9301654D0 (en) 1993-03-17
FR2686599B1 (fr) 1998-07-10
GB2263709B (en) 1994-09-28
FR2686599A1 (fr) 1993-07-30
DE4302407A1 (enExample) 1993-07-29
JPH05201796A (ja) 1993-08-10
DE4302407C2 (de) 1997-10-02
US5626908A (en) 1997-05-06
GB2263709A (en) 1993-08-04

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Legal Events

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