JP2894093B2 - Adhesive composition and laminated film - Google Patents

Adhesive composition and laminated film

Info

Publication number
JP2894093B2
JP2894093B2 JP4183638A JP18363892A JP2894093B2 JP 2894093 B2 JP2894093 B2 JP 2894093B2 JP 4183638 A JP4183638 A JP 4183638A JP 18363892 A JP18363892 A JP 18363892A JP 2894093 B2 JP2894093 B2 JP 2894093B2
Authority
JP
Japan
Prior art keywords
adhesive
weight
adhesive composition
nitrogen
molecular weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP4183638A
Other languages
Japanese (ja)
Other versions
JPH0625632A (en
Inventor
功 塚越
貢 藤縄
泰史 後藤
共久 太田
豊 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP4183638A priority Critical patent/JP2894093B2/en
Publication of JPH0625632A publication Critical patent/JPH0625632A/en
Application granted granted Critical
Publication of JP2894093B2 publication Critical patent/JP2894093B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/303Surface mounted components, e.g. affixing before soldering, aligning means, spacing means

Landscapes

  • Conductive Materials (AREA)
  • Laminated Bodies (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Adhesive Tapes (AREA)
  • Epoxy Resins (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、例えば液晶パネル等に
おいて、2つの回路基板同士の電極間に形成し、両電極
を接続するのに好適な接着剤組成物に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an adhesive composition formed between electrodes of two circuit boards in a liquid crystal panel or the like and suitable for connecting both electrodes.

【0002】[0002]

【従来の技術】2つの回路基板同士を接着すると共に、
これらの電極間に電気的導通を得る接着剤として、スチ
レン系やポリエステル系などの熱可塑性物質やエポキシ
系やシリコーン系などの熱硬化性物質が知られている。
この場合、接着剤中に導電性粒子を配合し、加圧により
接着剤の厚み方向に電気的接続を得るもの(例えば特開
昭55−104007号公報)と、導電性粒子を用いな
いで接続時の加圧により電極面の微細凹凸により電気接
続を得るもの(例えば特開昭60−262430号公
報)がある。ところで、これらの接着剤による接続にお
いて、電気的接続不良であったり接続後に電子部品や回
路が不良になると、回路間を剥がすなどして接着剤を溶
剤などで除去後に再度良品を接着剤により接続すること
が行われている。この場合、微細回路や電極上の接着剤
を汎用溶剤(例えばアセトン、メチルエチルケトン、ト
ルエン、テトラハイドロフラン、アルコールなど)を用
いて、周辺部に悪影響を与えず、迅速かつ容易に除去で
きることが重要である。接着剤が熱硬化性物質などの場
合、溶剤として例えば、塩化メチレンと酸などよりなる
いわゆるエポキシ剥離剤を用いる場合が多い。
2. Description of the Related Art Along with bonding two circuit boards together,
As an adhesive for obtaining electrical conduction between these electrodes, a styrene-based or polyester-based thermoplastic material, or an epoxy-based or silicone-based thermosetting material is known.
In this case, conductive particles are mixed in the adhesive, and an electrical connection is obtained in the thickness direction of the adhesive by pressure (for example, JP-A-55-104007). There is a method in which electrical connection is obtained by fine irregularities on the electrode surface by pressurization at the time (for example, JP-A-60-262430). By the way, in the connection with these adhesives, if the electrical connection is poor or the electronic components and circuits become defective after the connection, the non-defective products are connected again with the adhesive after removing the adhesive with a solvent etc. by peeling off the circuit etc. That is being done. In this case, it is important that the adhesive on the microcircuit or electrode can be quickly and easily removed using a general-purpose solvent (eg, acetone, methyl ethyl ketone, toluene, tetrahydrofuran, alcohol, etc.) without adversely affecting the peripheral portion. is there. When the adhesive is a thermosetting substance or the like, a so-called epoxy release agent composed of, for example, methylene chloride and an acid is often used as the solvent.

【0003】[0003]

【発明が解決しようとする課題】回路接続部の信頼性、
即ち耐熱性、耐湿性などを考慮した場合、エポキシ系な
どの熱硬化性接着剤が有効である。しかしながら、この
場合の補修方法は、エポキシ剥離剤などの強烈な溶剤を
用いることが一般的である。この場合、再接続部への酸
やハロゲン化物の影響により、回路の腐食や電食が発生
し接続部の信頼性が低下する。一方、熱可塑性接着剤の
場合には耐熱性が不足し、やはり接続部の信頼性が低下
する。本発明は、接続部の信頼性が高くかつ汎用溶剤に
より容易に補修可能な接着剤組成物を提供するものであ
る。
SUMMARY OF THE INVENTION
That is, when heat resistance and moisture resistance are considered, a thermosetting adhesive such as an epoxy-based adhesive is effective. However, the repair method in this case generally uses a strong solvent such as an epoxy release agent. In this case, the influence of the acid or the halide on the reconnection portion causes corrosion or electric corrosion of the circuit, thereby reducing the reliability of the connection portion. On the other hand, in the case of a thermoplastic adhesive, the heat resistance is insufficient, and the reliability of the connection portion is also lowered. An object of the present invention is to provide an adhesive composition having high reliability of a connection portion and easily repairable with a general-purpose solvent.

【0004】[0004]

【課題を解決するための手段】本発明は、ガラス転移温
度(Tg)が0℃以下の窒素基含有ゴムと、重量平均分
子量(MW)が1万以上のOH基含有ポリマと重量平均
分子量が3000以下の固形樹脂とエポキシ樹脂及び潜
在性硬化剤を必須とする接着剤組成物、及び窒素基含有
ゴムを含む層とOH基含有ポリマを含む層とを分離して
形成し、少なくとも前記層のいずれかにエポキシ樹脂お
よび/または潜在性硬化剤を含有一体化してなる積層フ
ィルムに関する。本発明で用いるTgが0℃以下の窒素
基含有ゴムは、窒素基としてニトリルを有するものが代
表的であり、例えばアクリルゴム、ニトリルゴムがあ
る。Tgは硬化前の組成物のタックに影響し、低い方が
所望のタックを広範囲に得やすく、−10℃以下がより
好ましい。組成物の適度のタックは、回路接続時の位置
合わせ性が容易であり作業性が向上するので好ましい。
これらの分子量は10万以上が好適であり、さらに好ま
しくは30万〜120万である。分子量が小さいと接着
剤系の凝集力が低下し高接着力が得にくい。大きすぎる
と他の成分との相溶性が低下し取り扱い難くなる。な
お、本発明でいう分子量は、重量平均分子量(GPC法
によるスチレン換算値)である。これらの窒素基含有ゴ
ムは、水酸基やカルボキシル基などの極性基を含有する
と、エポキシ樹脂との相溶性が向上し均一な外観や特性
を有するフィルムの得られることや、硬化時の反応促進
による短時間硬化を得る点から好ましい。耐湿性の向上
の点からカルボキシル基含有物が特に好ましい。組成物
中に占める窒素基含有ゴムの割合は2%以上、好ましく
は3〜30%、より好ましくは5〜20%である。
SUMMARY OF THE INVENTION The present invention relates to a nitrogen-containing rubber having a glass transition temperature (Tg) of 0 ° C. or less, an OH-containing polymer having a weight average molecular weight (MW) of 10,000 or more, and a weight average molecular weight. An adhesive composition comprising a solid resin of 3000 or less, an epoxy resin and a latent curing agent as essential components, and a layer containing a nitrogen-containing rubber and a layer containing an OH-containing polymer are formed separately, and at least the layer The present invention relates to a laminated film obtained by incorporating an epoxy resin and / or a latent curing agent into any one of them. The nitrogen-containing rubber having a Tg of 0 ° C. or lower used in the present invention is typically a rubber having a nitrile as a nitrogen group, such as an acrylic rubber and a nitrile rubber. Tg affects the tack of the composition before curing, and a lower Tg facilitates obtaining a desired tack over a wide range, and a temperature of -10 ° C or lower is more preferable. An appropriate tack of the composition is preferred because the alignment at the time of circuit connection is easy and the workability is improved.
The molecular weight of these is preferably 100,000 or more, more preferably 300,000 to 1.2 million. If the molecular weight is small, the cohesive strength of the adhesive system is reduced, and it is difficult to obtain high adhesive strength. If it is too large, the compatibility with other components is reduced, and it becomes difficult to handle. The molecular weight referred to in the present invention is a weight average molecular weight (converted into styrene by GPC). When these nitrogen-containing rubbers contain a polar group such as a hydroxyl group or a carboxyl group, the compatibility with the epoxy resin is improved, and a film having a uniform appearance and properties can be obtained. It is preferable from the viewpoint of obtaining time curing. Carboxyl group-containing substances are particularly preferred from the viewpoint of improving moisture resistance. The proportion of the nitrogen-containing rubber in the composition is 2% or more, preferably 3 to 30%, more preferably 5 to 20%.

【0005】OH基含有ポリマについて説明する。これ
らポリマとしては、ポリビニルアセタール、フェノキ
シ、ポリエチレンテレフタレート、ポリウレタンなどや
スチレン、塩化ビニル、オレフィン、エチレン−酢酸ビ
ニル、エチレン系アイオノマ、ポリアミド系などのポリ
マ類がある。分子量が1万以上である理由は、分子量の
大きい程フィルム形成性が容易に得られ、また接続時の
流動性に影響する溶融粘度を広範囲に設定できるためで
あり、分子量1万5千以上8万以下がより好ましい。ま
た分子量が8万以下が好ましい理由は、他の樹脂との相
溶性を得るためである。これらの樹脂は水酸基(OH
基)やカルボキシル基(COOH基)などの極性基を含
有すると、エポキシ樹脂との相溶性が向上し均一な外観
や特性を有するフィルムの得られることや、硬化時の反
応促進による短時間硬化を得る点からも好ましい。短時
間硬化を得る点からOH基含有ポリマが特に好ましい。
The OH group-containing polymer will be described. These polymers include polymers such as polyvinyl acetal, phenoxy, polyethylene terephthalate, polyurethane, and styrene, vinyl chloride, olefin, ethylene-vinyl acetate, ethylene ionomer, and polyamide. The reason why the molecular weight is 10,000 or more is that the larger the molecular weight, the more easily the film formability can be obtained, and the melt viscosity which affects the fluidity at the time of connection can be set in a wide range. 10,000 or less is more preferable. The reason why the molecular weight is preferably not more than 80,000 is to obtain compatibility with other resins. These resins have hydroxyl groups (OH
Group) or a carboxyl group (COOH group) to improve the compatibility with the epoxy resin to obtain a film with uniform appearance and properties, and to shorten the curing time by accelerating the reaction during curing. It is also preferable from the viewpoint of obtaining. An OH group-containing polymer is particularly preferred from the viewpoint of obtaining a short curing time.

【0006】MW3000以下の固形樹脂としては、ロ
ジンやテルペンなどの天然物系樹脂、脂肪族、脂環族、
芳香族、クマロン・インデン、スチレン系などの重合系
樹脂、及びフェノールやキシレン系などの縮合系樹脂な
どがあり、これらの変性体や誘導体がある。これらは単
独もしくは2種類以上混合して用いることができる。こ
れらは接着剤系の凝集力を高める点から軟化点40℃以
上の固形物が好ましい。これら固形樹脂は、組成物のタ
ックの付与に有効であり、加えて接着面へのぬれ性向上
による接着力の向上効果もある。MW3000以上では
組成物中への相溶性が低下し、また溶剤による補修性が
低下するので、MW2000以下が好ましい。これら固
形樹脂はOH基やCOOH基などの極性基を有すると、
接着性が向上しより好ましい。
[0006] Examples of the solid resin having a MW of 3000 or less include natural resin such as rosin and terpene, aliphatic and alicyclic,
There are aromatic resins, polymer resins such as coumarone-indene and styrene, and condensation resins such as phenol and xylene, and modified products and derivatives thereof. These can be used alone or in combination of two or more. These are preferably solids having a softening point of 40 ° C. or higher from the viewpoint of increasing the cohesive force of the adhesive system. These solid resins are effective in imparting tack to the composition, and also have an effect of improving the adhesive force by improving the wettability to the bonding surface. If the MW is 3,000 or more, the compatibility in the composition is reduced, and the repairability by the solvent is reduced. Therefore, the MW is preferably 2,000 or less. When these solid resins have a polar group such as an OH group or a COOH group,
It is more preferable because the adhesiveness is improved.

【0007】本発明に用いるエポキシ樹脂は、例えばエ
ピクロルヒドリンとビスフェノールAやF、D等から誘
導されるビスフェノール型エポキシ樹脂、エピクロルヒ
ドリンとフェノールノボラックやクレゾールノボラック
から誘導されるエポキシノボラック樹脂が代表的であ
り、その他グリシジルアミン、グリシジルエステル、脂
環式、複素環式などの1分子内に2個以上のオキシラン
基を有する各種のエポキシ化合物が適用できる。これら
は単独又は2種類以上混合して用いることが可能であ
る。これらエポキシ樹脂は、不純物イオン(Na+ 、C
- など)や、加水分解性塩素などを300ppm以下
に低減した高純度品を用いることがエレクトロンマイグ
レーション防止のために好ましい。
The epoxy resin used in the present invention is, for example, a bisphenol type epoxy resin derived from epichlorohydrin and bisphenol A, F, D, etc., and an epoxy novolak resin derived from epichlorohydrin and phenol novolak or cresol novolak. In addition, various epoxy compounds having two or more oxirane groups in one molecule such as glycidylamine, glycidyl ester, alicyclic and heterocyclic can be applied. These can be used alone or in combination of two or more. These epoxy resins contain impurity ions (Na + , C
l - etc.) and the like hydrolyzable chlorine using a high purity product was reduced to 300ppm or less preferred in order to prevent electron migration.

【0008】上記したエポキシ樹脂の中では、ビスフェ
ノール型エポキシ樹脂が分子量の異なるグレードが広く
入手可能で、接着性や反応性などを任意に設定できるこ
とから好ましい。中でもビスフェノールF型エポキシ樹
脂は、粘度が特に低いことから他の高分子量物との組み
合わせで流動性を広範囲に設定できることや、液状であ
り粘着性も得やすいこと、補修性に優れることから特に
好ましい。また、1分子内に3個以上のオキシラン基を
有するいわゆる多官能エポキシ樹脂も、組成物の架橋密
度を向上し耐熱性が向上するので好ましいが、溶剤によ
る補修性を保つために組成物中に占める割合を30%以
下として使用できる。
[0008] Among the above epoxy resins, bisphenol type epoxy resins are preferred because grades having different molecular weights are widely available and adhesiveness and reactivity can be arbitrarily set. Among them, bisphenol F-type epoxy resin is particularly preferable because it has a particularly low viscosity, so that fluidity can be set in a wide range in combination with other high molecular weight substances, and that it is liquid and easy to obtain adhesiveness, and is excellent in repairability. . Further, a so-called polyfunctional epoxy resin having three or more oxirane groups in one molecule is also preferable because the crosslink density of the composition is improved and the heat resistance is improved. The occupying ratio can be used as 30% or less.

【0009】潜在性硬化剤としては、イミダゾール系、
ヒドラジド系、三フッ化ホウ素−アミン錯体、アミンイ
ミド、ポリアミンの塩、ジシアンジアミドなど、及びこ
れらの変性物があり、これらは単独または2種以上の混
合体として使用できる。これらはアニオン又はカチオン
重合型などのいわゆるイオン重合性の触媒型硬化剤であ
り、速硬化性を得やすく、また化学当量的な考慮が少な
くて良いことから好ましい。硬化剤としてはその他に、
アミン類、メルカプタン、フェノール、酸無水物等の適
用や前記触媒型硬化剤との併用も可能である。
As the latent curing agent, imidazoles,
There are hydrazide type, boron trifluoride-amine complex, amine imide, polyamine salt, dicyandiamide and the like, and modified products thereof, and these can be used alone or as a mixture of two or more kinds. These are so-called ionic polymerizable catalyst-type curing agents such as anionic or cationic polymerizable types, and are preferable because they can easily obtain rapid curability and require little consideration of chemical equivalents. Other curing agents include
It is also possible to use amines, mercaptans, phenols, acid anhydrides and the like, or to use them in combination with the above-mentioned catalytic curing agent.

【0010】長期保存性と速硬化性という矛盾した特性
の両立が要求される本発明の好ましい形態としては、こ
れらの硬化剤を核としポリウレタン系、ポリエステル系
等の高分子物質や、Ni、Cu等の金属薄膜及びケイ酸
カルシウム等の無機物で被覆したマイクロカプセル型で
あることが好ましい。カプセル型硬化剤の使用に当たっ
て注意すべき点は、カプセルの粒径を例えばフィルム状
接着剤の厚みよりも小さくして保存時のカプセル破壊を
防止することや、カプセルの被覆層の材質を組成物や溶
剤などに対して耐性のあるものとすることである。
In a preferred embodiment of the present invention, which is required to have both contradictory characteristics such as long-term storage property and fast curing property, high molecular substances such as polyurethane and polyester, and Ni, Cu It is preferable to use a microcapsule type coated with a metal thin film such as that described above and an inorganic substance such as calcium silicate. When using the capsule-type curing agent, it should be noted that the capsule particle size is made smaller than the thickness of the film adhesive, for example, in order to prevent capsule breakage during storage, and to make the material of the capsule coating layer a composition. That is, it should be resistant to solvents and solvents.

【0011】本発明の硬化剤の活性温度は50〜200
℃が好ましく、70〜150℃がより好ましい。活性温
度はDSC(示差走査熱量計)を用いて、エポキシ樹脂
と硬化剤の配合物を試料として、室温から10℃/分で
昇温させた時の発熱ピーク温度を示す。
The activation temperature of the curing agent of the present invention is 50 to 200.
C is preferable, and 70 to 150 C is more preferable. The activation temperature indicates a heat generation peak temperature when a mixture of an epoxy resin and a curing agent is used as a sample and the temperature is raised from room temperature at 10 ° C./min using DSC (differential scanning calorimeter).

【0012】組成物中に占める窒素基含有ゴムとOH基
含有ポリマとMW3000以下の固形樹脂との合計割合
は、10〜60%程度であり、15〜55%がより好ま
しい。この量が少ないと溶剤による補修性が不足し、多
いと接続部の信頼性が不足する。上記で得た接着剤組成
物中には、通常の添加剤などとして例えば、充填剤、軟
化剤、促進剤、老化防止剤、着色剤、難燃化剤、チキソ
トロピック剤、カップリング剤及びフェノール樹脂やメ
ラミン樹脂、イソシアネート類などの硬化剤などを含有
することもできる。これらの中では、導電粒子やシリカ
などの充填剤及びシラン、チタン、クロム、ジルコニウ
ム、アルミニウムなどの各系のカップリング剤が特に有
用である。
The total proportion of the rubber containing a nitrogen group, the polymer containing an OH group and the solid resin having a MW of 3000 or less in the composition is about 10 to 60%, preferably 15 to 55%. If the amount is small, the repairability by the solvent is insufficient, and if it is large, the reliability of the connection portion is insufficient. In the adhesive composition obtained above, for example, a filler, a softener, an accelerator, an antioxidant, a coloring agent, a flame retardant, a thixotropic agent, a coupling agent and a phenol may be used as ordinary additives. A curing agent such as a resin, a melamine resin, or an isocyanate may be contained. Among these, fillers such as conductive particles and silica, and coupling agents of various systems such as silane, titanium, chromium, zirconium, and aluminum are particularly useful.

【0013】導電粒子としては、Au、Ag、Ni、C
u、はんだ等の金属粒子やカーボン等があり、これら及
び非導電のガラス、セラミック、プラスチック等に前記
した導電層を被覆などにより形成したものでも良い。さ
らに、前記したような導電粒子を絶縁層で被覆してなる
絶縁被覆粒子や導電粒子と絶縁被覆粒子の併用、及び導
電粒子と非導電性プラスチック粒子などの絶縁粒子との
併用なども、接続回路の高精細化手段として極めて有用
である。前記した各種粒子は単独もしくは2種以上複合
して、種々の目的に応じて用いることができる。プラス
チックを核とした場合や熱溶融金属粒子の場合、加熱加
圧により変形性を有するので接続時に電極との接触面積
が増加し信頼性が向上するので好ましい。導電粒子は0
〜30体積%の広範囲で用途により使い分ける。カップ
リング剤としては、アミノ基やエポキシ基、含有物が接
着性の向上の点から特に好ましい。
As the conductive particles, Au, Ag, Ni, C
u, metal particles such as solder, carbon, and the like, and those obtained by forming the above-described conductive layer on these, non-conductive glass, ceramic, plastic, or the like by coating or the like. Furthermore, the connection circuit also includes insulating coating particles obtained by coating the above-described conductive particles with an insulating layer, or a combination of conductive particles and insulating coating particles, and a combination of conductive particles and insulating particles such as non-conductive plastic particles. This is extremely useful as a means for increasing the definition of the image. The above-mentioned various particles can be used alone or in combination of two or more kinds according to various purposes. In the case of using plastic as a nucleus or hot-melt metal particles, they are deformable by heating and pressing, so that the contact area with the electrode at the time of connection increases and reliability is improved, which is preferable. 0 for conductive particles
Depending on the application, it is used in a wide range of up to 30% by volume. As the coupling agent, an amino group, an epoxy group, or a compound is particularly preferable from the viewpoint of improving the adhesiveness.

【0014】本発明の接着剤組成物は一液型接着剤とし
て、中でもフィルム状接着剤として特に有用である。こ
の場合、例えば上記で得た接着剤組成物を溶剤あるいは
エマルションの場合の分散液などとして液状化して、離
型紙などの剥離性基材上に形成し、あるいは不織布等の
基材に前記配合液を含浸させて剥離性基材上に形成し、
硬化剤の活性温度以下で乾燥し、溶剤あるいは分散液等
を除去すればよい。溶剤の沸点は150℃以下が適用で
きる。沸点が150℃を超すと乾燥に高温を要し、潜在
性硬化剤の活性温度に近いことから潜在性の低下を招
き、低温では乾燥時の作業性が低下する。このため沸点
が60〜150℃が好ましく、70〜130℃がより好
ましい。
The adhesive composition of the present invention is particularly useful as a one-part adhesive, especially as a film adhesive. In this case, for example, the adhesive composition obtained above is liquefied as a solvent or a dispersion in the case of an emulsion, and is formed on a peelable substrate such as release paper, or the compounding solution is applied to a substrate such as a nonwoven fabric. Impregnated to form on a releasable substrate,
What is necessary is just to dry below the activation temperature of a hardening | curing agent, and to remove a solvent or a dispersion liquid. The boiling point of the solvent may be 150 ° C. or less. When the boiling point exceeds 150 ° C., a high temperature is required for drying, and since the temperature is close to the activation temperature of the latent curing agent, the potential is reduced. At a low temperature, the workability during drying is reduced. For this reason, the boiling point is preferably from 60 to 150C, more preferably from 70 to 130C.

【0015】本発明で得た接着剤組成物を用い、窒素基
含有ゴムを含む層とOH基含有ポリマを含む層とを分離
形成し、前記層のいずれかにエポキシ樹脂および/また
は潜在性硬化剤を含有一体化してなる積層フィルムとす
ることも可能である。窒素基含有ゴム及びOH基含有ポ
リマはそれぞれ高分子量なので、エポキシ樹脂および/
または潜在性硬化剤及びその他の配合剤の含有によって
もフィルム形成性に優れる。
Using the adhesive composition obtained in the present invention, a layer containing a rubber containing nitrogen groups and a layer containing a polymer containing OH groups are separately formed, and an epoxy resin and / or a latent cured It is also possible to form a laminated film obtained by incorporating the agent. Since the nitrogen-containing rubber and the OH-containing polymer are each of high molecular weight, the epoxy resin and / or
Alternatively, the film-forming properties are also excellent by containing a latent curing agent and other compounding agents.

【0016】本発明で得た接着剤組成物を用いた回路や
電極の接続について説明する。この方法は、接着剤組成
物を基板上の相対峙する電極間に形成し、加熱加圧によ
り両電極の接触と基板間の接着を得る電極の接続方法で
ある。電極を形成する基板としては、半導体、ガラス、
セラミックなどの無機物、ポリイミド、ポリカーボネー
トなどの有機物、ガラス/エポキシなどのこれら複合体
の各組合わせが適用できる。積層フィルムの場合には、
接着時に接着性と補修性を考慮して接着面の材質を決定
する。
The connection of circuits and electrodes using the adhesive composition obtained in the present invention will be described. In this method, an adhesive composition is formed between opposing electrodes on a substrate, and the electrodes are connected by heating and pressing to obtain contact between the electrodes and adhesion between the substrates. Substrates for forming electrodes include semiconductors, glass,
Inorganic substances such as ceramics, organic substances such as polyimide and polycarbonate, and combinations of these composites such as glass / epoxy can be applied. In the case of a laminated film,
At the time of bonding, the material of the bonding surface is determined in consideration of adhesiveness and repairability.

【0017】[0017]

【作用】本発明によれば、Tgが0℃以下の窒素基含有
ゴムと、MW1万以上のOH基含有ポリマとMW300
0以下の固形樹脂とエポキシ樹脂及び潜在性硬化剤を必
須とする接着剤組成物を用いることにより、接続部の信
頼性が高くかつ汎用溶剤により容易に補修可能である。
この理由は、Tgが0℃以下の窒素基含有ゴムが可とう
性と接着性、MW1万以上のOH基含有ポリマが接着
性、MW3000以下の固形樹脂が溶剤溶解性、エポキ
シ樹脂及び潜在性硬化剤による硬化後の耐熱性の向上、
潜在性硬化剤による保存性と、それぞれ機能を分離する
ことで総合的なバランスが得られるものと考えられる。
According to the present invention, a nitrogen-containing rubber having a Tg of 0 ° C. or less, an OH-containing polymer having a MW of 10,000 or more, and a MW300
By using an adhesive composition essentially including a solid resin of 0 or less, an epoxy resin and a latent curing agent, the connection portion has high reliability and can be easily repaired with a general-purpose solvent.
The reason is that a nitrogen-containing rubber having a Tg of 0 ° C. or less has flexibility and adhesiveness, an OH-containing polymer having a MW of 10,000 or more has adhesiveness, a solid resin having a MW of 3000 or less is soluble in a solvent, epoxy resin and latent curing. Improvement of heat resistance after curing by the agent,
It is considered that the overall balance can be obtained by separating the functions from the storage ability by the latent curing agent and the functions thereof.

【0018】一方、エポキシ樹脂硬化物を海とした時、
高分子量であり架橋密度の低い窒素基含有ゴムとOH基
含有ポリマは、その極性基により金属や酸化金属で構成
される回路類表面に高濃度に吸着形成されて、厚み方向
に傾斜的に存在するものと考えられる。そのため接着界
面は、架橋度の低い窒素基含有ゴムおよび/またはOH
基含有ポリマの高濃度層であるため、比較的低分子量の
固形樹脂の作用とも合わせて汎用溶剤により容易に膨潤
または溶解し、あるいはこの部分がきっかけとなり、海
状の硬化物をも膨潤または溶解し補修可能となる。この
厚み方向に傾斜的に存在する作用効果を、より簡単に得
るのが窒素基含有ゴムを含む層とOH基含有ポリマを含
む層とを分離して形成し、前記層のいずれかにエポキシ
樹脂および/または潜在性硬化剤を含有一体化してなる
積層フィルムである。この場合、汎用溶剤により容易に
膨潤または溶解する層が回路表面に高濃度に接続時から
存在するので、さらに容易に補修が可能である。さら
に、本積層フィルムによれば、エポキシ樹脂と潜在性硬
化剤を分離形成して保存性をさらに向上させたり、窒素
基含有ゴムを含む層とOH基含有ポリマを含む層とで流
動性を変化させて接続時に発生する気泡を抑制すること
もできる。
On the other hand, when the cured epoxy resin is the sea,
Nitrogen-containing rubber and OH-containing polymer with high molecular weight and low crosslink density are adsorbed and formed at high concentration on the surface of circuits composed of metal or metal oxide by their polar groups, and exist in a gradient direction in the thickness direction It is thought to be. Therefore, the bonding interface is low in the degree of cross-linking and contains nitrogen-containing rubber and / or OH.
Because it is a high-concentration layer of a group-containing polymer, it swells or dissolves easily with a general-purpose solvent together with the action of a relatively low-molecular-weight solid resin, or this part triggers the swelling or dissolution of a sea-like cured product It can be repaired. In order to more easily obtain the function and effect existing in the thickness direction, a layer containing a rubber containing a nitrogen group and a layer containing a polymer containing an OH group are formed separately, and an epoxy resin is formed on any of the layers. And / or a laminated film comprising a latent curing agent. In this case, since a layer easily swelling or dissolving with the general-purpose solvent exists on the circuit surface at a high concentration from the time of connection, repair can be performed more easily. Furthermore, according to this laminated film, the epoxy resin and the latent curing agent are separately formed to further improve the preservability, or the fluidity changes between the layer containing the nitrogen-containing rubber and the layer containing the OH-containing polymer. By doing so, bubbles generated at the time of connection can also be suppressed.

【0019】[0019]

【実施例】以下、本発明を実施例に基づいて詳細に説明
する。 実施例1〜6及び比較例1〜4 (1)窒素基含有ゴム ブチルアクリレート25重量部、エチルアクリレート6
5重量部、アクリロニトリル10重量部を主モノマ成分
とし、アクリル酸1.5重量部、ヒドロキシルエチルメ
タアクリレート1重量部を官能基成分としたモノマをパ
ール重合により重合し、アクリル系共重合体を得た(ア
クリルと略)。この共重合体をトルエンに溶解し固形分
10%の溶液とした。この共重合体の粘弾性測定による
tanδピークのTgは−20℃、MWは40万(GP
C法によるスチレン換算値)であった。一方、カルボキ
シル変性ニトリルゴム(Tg−48℃、MW10万、C
NBRと略)をトルエンに溶解し固形分10%の溶液と
した。 (2)組成物の作製 バイロン103(熱可塑性ポリエステル樹脂、分子量2
0,000、水酸基含有、東洋紡株式会社製商品名、1
03と略)をトルエン/ジオキサン=50/50(重量
比)の混合溶剤に溶解して固形分50%の溶液とした。
エピコートYL−983U(ビスフェノールF型高純度
液状エポキシ樹脂、加水分解性塩素イオン110pp
m、油化シェルエポキシ株式会社製商品名、983Uと
略)と、YSポリスタS145(テルペンフェノール樹
脂、軟化点145℃、MW1100、ヤスハラケミカル
株式会社製商品名、S145と略)をそれぞれトルエン
に溶解し固形分50%の溶液とした。これらおよび前記
窒素基含有ゴム溶液とを、表1に示す組み合わせの固形
分比となるように混合した。次いで潜在性硬化剤とし
て、ノバキュア3742(イミダゾール変性体を核と
し、その表面をポリウレタンで被覆してなる平均粒径2
μmのマイクロカプセル型硬化剤をビスフェノールA型
液状エポキシ樹脂中に分散、活性温度124℃、旭化成
工業株式会社製商品名、3742と略)を、固形分比で
30%となるように混合した。上記混合液の固形分10
0重量部に対し、0.5重量部のイソシアネート系シラ
ンカップリング剤と、2体積部の導電粒子(平均粒径5
μmのスチレン−ジビニルベンゼン共重合樹脂球の表面
に金属薄層を有する、プラと略)を添加攪拌し、ポリテ
トラフルオロエチレンフィルム(セパレータ)上にロー
ルコータを用いて塗布後、100℃10分の乾燥によ
り、接着剤層の厚みが20μmのフィルム状物を得た。 (3)評価 このフィルム状物を用いて、ライン幅40μm、ピッチ
80μm、厚み20μmの銅回路上に錫の薄層を有する
フレキシブル回路板(FPC)と、全面に酸化インジウ
ム(ITO)の薄層を有する厚み1.1mmのガラス板
とを回路の位置合わせ後、170℃−30kg/mm2
−20秒により幅2mmで接続した。この際、あらかじ
めFPC上にフィルム状物を貼り付け後70℃−5kg
/mm2−5秒の仮接続を行い、次いでセパレータを剥
離してITOとの接続を行った。結果を表1に示す。表
1において、補修性は上記接続部のFPCをITOから
剥離し、ITO上に残存する一定面積(20×2mm)
の接着剤をアセトンを浸漬した綿棒で拭き取るのに要し
た時間である。また、信頼性は85℃85%RH−50
0h後の接続抵抗値であり、FPCの隣接回路の抵抗2
00点のx+3σで示した。表1から実施例1〜6はい
ずれも良好な補修性と信頼性の両立を得た。一方、比較
例1は窒素基含有ゴムを有しないため、比較例2、4は
OH基含有ポリマを有しないため、比較例3は固形樹脂
を有しないため、それぞれ補修性と信頼性の両立性に劣
った。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail based on embodiments. Examples 1 to 6 and Comparative Examples 1 to 4 (1) Nitrogen group-containing rubber 25 parts by weight of butyl acrylate, ethyl acrylate 6
A monomer having 5 parts by weight, 10 parts by weight of acrylonitrile as a main monomer component, 1.5 parts by weight of acrylic acid, and 1 part by weight of hydroxylethyl methacrylate as a functional group component is polymerized by pearl polymerization to obtain an acrylic copolymer. (Abbreviated as acrylic). This copolymer was dissolved in toluene to form a solution having a solid content of 10%. The tan δ peak Tg of the copolymer measured by viscoelasticity was −20 ° C., and the MW was 400,000 (GP
(Styrene conversion value by method C). On the other hand, carboxyl-modified nitrile rubber (Tg-48 ° C, MW 100,000, C
NBR) was dissolved in toluene to obtain a solution having a solid content of 10%. (2) Preparation of composition Byron 103 (thermoplastic polyester resin, molecular weight 2
0000, containing hydroxyl group, trade name, 1
03) in a mixed solvent of toluene / dioxane = 50/50 (weight ratio) to obtain a solution having a solid content of 50%.
Epicoat YL-983U (bisphenol F type high purity liquid epoxy resin, hydrolyzable chloride ion 110pp
m, a trade name of 983U manufactured by Yuka Shell Epoxy Co., Ltd.) and YS Polyster S145 (terpene phenol resin, softening point 145 ° C., MW1100, trade name of Yashara Chemical Co., Ltd., abbreviated as S145) are each dissolved in toluene. A solution having a solid content of 50% was obtained. These and the nitrogen-containing rubber solution were mixed so as to have a solid content ratio of the combination shown in Table 1. Next, as a latent curing agent, Novacure 3742 (an imidazole-modified nucleus as a nucleus and an average particle diameter of 2 covered with polyurethane) was used.
A microcapsule type curing agent having a thickness of μm was dispersed in a bisphenol A type liquid epoxy resin, and an active temperature of 124 ° C., a trade name of Asahi Chemical Industry Co., Ltd .; Solid content of the above mixture 10
With respect to 0 parts by weight, 0.5 parts by weight of an isocyanate silane coupling agent and 2 parts by volume of conductive particles (average particle size of 5 parts by weight)
a styrene-divinylbenzene copolymer resin sphere having a thin metal layer on the surface of the sphere, which is abbreviated as plastic), stirred and applied on a polytetrafluoroethylene film (separator) using a roll coater, and then at 100 ° C. for 10 minutes. By drying, a film having a thickness of the adhesive layer of 20 μm was obtained. (3) Evaluation Using this film-like material, a flexible circuit board (FPC) having a thin layer of tin on a copper circuit having a line width of 40 μm, a pitch of 80 μm, and a thickness of 20 μm, and a thin layer of indium oxide (ITO) on the entire surface After positioning the circuit with a glass plate having a thickness of 1.1 mm and having a thickness of 170 ° C.-30 kg / mm 2
Connection was made with a width of 2 mm for -20 seconds. At this time, after adhering the film material on FPC in advance, 70 ° C-5kg
/ Mm 2 -5 seconds, and then the separator was peeled off and connected to ITO. Table 1 shows the results. In Table 1, the repairability was determined by peeling the FPC of the connection portion from the ITO and leaving a fixed area (20 × 2 mm) on the ITO.
Is the time required to wipe off the adhesive with a cotton swab soaked in acetone. The reliability is 85 ° C and 85% RH-50.
0h, which is the connection resistance value of the adjacent circuit of the FPC.
It was indicated by x + 3σ of 00 points. From Table 1, Examples 1 to 6 all achieved both good repairability and reliability. On the other hand, Comparative Example 1 does not have a nitrogen-containing rubber, Comparative Examples 2 and 4 do not have an OH-containing polymer, and Comparative Example 3 does not have a solid resin. Inferior.

【0020】[0020]

【表1】 [Table 1]

【0021】実施例7〜10 実施例3と同様であるが、表1に示すようにOH基含有
MW1万以上のポリマ材料の種類を変えた。ここに用い
た材料は、パラプレンP25M(ポリウレタン樹脂、日
本エラストラン株式会社製商品名、25Mと略)、ブチ
ラール3000K(ポリビニルアセタール樹脂、電気化
学工業株式会社製商品名、3000と略)、PKHA
(フェノキシ樹脂、ユニオンカーバイト株式会社製商品
名)、CM8000(可溶性ナイロン樹脂、東レ株式会
社製商品名、8000と略)である。実施例1〜6と同
様に評価した結果を表1に示す。実施例7〜10はいず
れも良好な補修性と信頼性の両立を得た。
Examples 7 to 10 The same as Example 3, but the type of the polymer material having an OH group-containing MW of 10,000 or more was changed as shown in Table 1. The materials used here were Paraprene P25M (polyurethane resin, trade name, manufactured by Nippon Elastran Co., Ltd., abbreviated as 25M), butyral 3000K (polyvinyl acetal resin, trade name, manufactured by Denki Kagaku Kogyo Co., Ltd., abbreviated as 3000), PKHA
(Phenoxy resin, trade name, manufactured by Union Carbide Co., Ltd.) and CM8000 (soluble nylon resin, trade name, manufactured by Toray Industries, Inc., abbreviated to 8000). Table 1 shows the evaluation results in the same manner as in Examples 1 to 6. In all of Examples 7 to 10, good repairability and reliability were both obtained.

【0022】実施例11 実施例2の材料を用いて、窒素基含有ゴムを含む層とO
H基含有のポリマを含む層とを分離形成した。アクリル
とS145と3742の各溶液を固形分10/10/3
0となるように混合した。この混合液をセパレータ上に
ロールコータを用いて塗布後、100℃10分の乾燥に
より接着剤層の厚みが10μmのフィルム状物Aを得
た。一方、103と983Uとを固形分比30/20と
なるように混合し、さらに0.5重量部のエポキシ系シ
ランカップリング剤と、2体積部の導電粒子(プラ)を
添加攪拌し、同様に厚みが10μmのフィルム状物Bを
得た。AとBフィルムを接着剤面が重なるようにして加
圧ロールにより積層した。この時、アクリルとS145
と3742組成物の有する粘着性により、室温で容易に
積層可能であった。フィルム状物Bのセパレータを剥離
してFPCと接続し、次いでフィルム状物Aのセパレー
タを剥離して回路の位置合わせ後、ITOとの接続を行
った。実施例1〜6と同様に評価した結果を表1に示
す。本実施例も良好な補修性と信頼性の両立を得た。本
実施例では特にITO回路面の溶剤補修性に極めて優れ
ていた。
Example 11 Using the material of Example 2, a layer containing a nitrogen-containing rubber and O
A layer containing an H-group-containing polymer was formed separately. Acrylic and each solution of S145 and 3742 are solid content 10/10/3
It was mixed so as to be 0. This mixture was applied on a separator using a roll coater, and then dried at 100 ° C. for 10 minutes to obtain a film A having an adhesive layer thickness of 10 μm. On the other hand, 103 and 983 U were mixed so as to have a solid content ratio of 30/20, and further, 0.5 parts by weight of an epoxy silane coupling agent and 2 parts by volume of conductive particles (plastic) were added and stirred. A film B having a thickness of 10 μm was obtained. The A and B films were laminated by a pressure roll such that the adhesive surfaces overlapped. At this time, acrylic and S145
And 3742, the composition could be easily laminated at room temperature. The separator of the film-shaped material B was peeled off and connected to the FPC, and then the separator of the film-shaped material A was peeled off and the circuit was positioned and then connected to ITO. Table 1 shows the evaluation results in the same manner as in Examples 1 to 6. This embodiment also achieved both good repairability and reliability. In this example, the solvent repairability of the ITO circuit surface was particularly excellent.

【0023】実施例12〜15 実施例11と同様であるが、103の代わりに実施例7
〜10のOH基含有ポリマ材料を用いた。各実施例とも
良好な補修性と信頼性の両立を得た。
Embodiments 12 to 15 Same as embodiment 11 except that the embodiment 7 is replaced with the embodiment 7
An OH group-containing polymer material of 10 to 10 was used. In each example, both good repairability and good reliability were obtained.

【0024】実施例16〜17 実施例3と同様配合(実施例16)と、この配合から導
電粒子を除去した配合(実施例17)を用いた。これら
の配合物をセパレータ上にロールコータを用いて塗布
後、100℃10分の乾燥により溶剤を除去し、接着剤
層の厚みが20μmのフィルム状物を得た。一方、ガラ
ス板上に半導体チップ(3×10mm、高さ0.5m
m、主面の4辺周囲にバンプと呼ばれる50μm角、高
さ20μmの突起した金電極が形成)のバンプ配置と対
応した接続端子を有するITO回路を形成した配線板を
用意した。半導体チップのバンプ面と配線板の回路との
間に前記フィルムを載置した。この時各フィルムは、室
温で粘着性を有しておりバンプ面に簡単に仮接続でき
た。この後セバレータを剥離し、ガラス回路とバンプの
位置合わせを行い、次いで170℃−30g/バンプ−
20秒の加熱加圧で接続した。
Examples 16 to 17 The same formulation as in Example 3 (Example 16) and a formulation in which conductive particles were removed from the formulation (Example 17) were used. After applying these compounds on a separator using a roll coater, the solvent was removed by drying at 100 ° C. for 10 minutes to obtain a film having a thickness of an adhesive layer of 20 μm. On the other hand, a semiconductor chip (3 × 10 mm, height 0.5 m) is placed on a glass plate.
m, a protruding gold electrode having a size of 50 μm square and a height of 20 μm called a bump is formed around four sides of the main surface.) A wiring board on which an ITO circuit having connection terminals corresponding to the bump arrangement was prepared. The film was placed between the bump surface of the semiconductor chip and the circuit of the wiring board. At this time, each film had an adhesive property at room temperature and could be easily temporarily connected to the bump surface. Thereafter, the severator is peeled off, the glass circuit and the bump are aligned, and then 170 ° C.-30 g / bump.
The connection was made by heating and pressing for 20 seconds.

【0025】上記接続品は、接続部への気泡混入がなか
った。接続品の導通チェックを行ったところいずれも良
好な接続であり、バンプ間のショートもなかった。さら
にPCT(プレッシャークッカーテスト)−121℃−
100h後も、各例とも良好だった。接続部断面を走査
型電子顕微鏡で観察したところ、実施例16ではプラス
チック粒子が加圧方向に潰されるように、実施例17で
は一部のバンプが変形して平坦性を得て接続端子と良く
接触していた。これらのことから、両実施例ともバンプ
高さのバラツキに対応可能であった。各実施例の接続品
を接着剤硬化物のTg125℃より高い150℃に加熱
し、硬化物の凝集力を低下させて半導体チップを配線板
から剥離後、アセトン中に浸漬し5分後に洗浄したとこ
ろ、接着剤の除去が可能であった。また、別途各実施例
の接続品をメチルエチルケトン/テトラハイドロフラン
/トルエン=35/35/30(重量比)及びメチルエ
チルケトン/ジメチルホルムアミド/リグロイン=50
/30/20(重量比)よりなる混合溶剤中に浸漬し3
0分後に観察したところ、両浸漬品とも半導体チップは
配線板から剥離し残存した接着剤は膨潤していた。半導
体チップと配線板をメタノール含浸布で洗浄したところ
接着剤の除去が容易であった。
In the above-mentioned connection product, there was no air bubble in the connection portion. When the continuity of the connected products was checked, all the connections were good and there was no short circuit between the bumps. PCT (pressure cooker test)-121 ° C-
After 100 hours, the results were good in each case. When the cross section of the connection portion was observed with a scanning electron microscope, in Example 16, some of the bumps were deformed and flatness was obtained in Example 17 so that the plastic particles were crushed in the pressing direction. I was in contact. From these facts, both examples were able to cope with variations in bump height. The connection product of each example was heated to 150 ° C. higher than the Tg of the adhesive cured product of 125 ° C. to reduce the cohesive force of the cured product, peel the semiconductor chip from the wiring board, dipped in acetone, and washed 5 minutes later. However, the adhesive could be removed. Separately, the connection products of the respective examples were methyl ethyl ketone / tetrahydrofuran / toluene = 35/35/30 (weight ratio) and methyl ethyl ketone / dimethylformamide / ligroin = 50.
3/30/20 (weight ratio)
Observation after 0 minutes revealed that in both the immersed products, the semiconductor chip was separated from the wiring board and the remaining adhesive was swollen. When the semiconductor chip and the wiring board were washed with a cloth impregnated with methanol, the adhesive was easily removed.

【0026】[0026]

【発明の効果】以上詳述したように本発明によれば、接
続部の信頼性が高くかつ汎用溶剤により容易に補修可能
な接着剤組成物を提供することができる。
As described above in detail, according to the present invention, it is possible to provide an adhesive composition having a high reliability of a connection portion and easily repairable with a general-purpose solvent.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 太田 共久 茨城県下館市大字小川1500番地 日立化 成工業株式会社 下館研究所内 (72)発明者 山口 豊 茨城県下館市大字小川1500番地 日立化 成工業株式会社 下館研究所内 (56)参考文献 特開 平6−212139(JP,A) 特開 平5−156229(JP,A) (58)調査した分野(Int.Cl.6,DB名) C09J 163/00 - 163/10 C09J 7/00 B32B 27/00 H01B 1/20 ──────────────────────────────────────────────────の Continuing on the front page (72) Inventor, Kyohisa Ota, 1500, Oji, Oji, Shimodate, Ibaraki Prefecture Hitachi Chemical Co., Ltd., Shimodate Research Institute (72) Inventor, Yutaka Yamaguchi 1500, Oji, Oji, Shimodate, Ibaraki, Hitachi, Ltd. (56) References JP-A-6-212139 (JP, A) JP-A-5-156229 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) C09J 163/00-163/10 C09J 7/00 B32B 27/00 H01B 1/20

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】下記(a)〜(e)成分を必須とする汎用溶剤に
より補修可能な回路接続用接着剤組成物。 (a)ガラス転移温度が0℃以下の窒素基含有ゴム、 (b)重量平均分子量が1万以上のOH基含有ポリマ、 (c)重量平均分子量が3000以下の固形樹脂、 (d)エポキシ樹脂および、 (e)潜在性硬化剤
1. A general-purpose solvent comprising the following components (a) to (e):
An adhesive composition for circuit connection that can be repaired more . (a) a nitrogen-containing rubber having a glass transition temperature of 0 ° C. or less, (b) an OH-containing polymer having a weight-average molecular weight of 10,000 or more, (c) a solid resin having a weight-average molecular weight of 3000 or less, (d) an epoxy resin And (e) a latent curing agent
【請求項2】 接着剤組成物に占める(a)〜(c)の
割合が10〜60%である請求項1記載の接着剤組成
物。
2. The adhesive composition according to claim 1, wherein the proportion of (a) to (c) in the adhesive composition is 10 to 60%.
【請求項3】 ガラス転移温度が0℃以下の窒素基含有
ゴムを含む層と重量平均分子量が1万以上のOH基含有
ポリマを含む層とを分離して形成し、少なくとも前記層
のいずれかに重量平均分子量が3000以下の固形樹
脂、エポキシ樹脂および/または潜在性硬化剤を含有一
体化してなる汎用溶剤により補修可能な回路接続用接着
フィルム。
3. A layer containing a nitrogen-containing rubber having a glass transition temperature of 0 ° C. or less and a layer containing an OH-containing polymer having a weight average molecular weight of 10,000 or more are formed separately. An adhesive film for circuit connection which can be repaired with a general-purpose solvent obtained by integrating a solid resin having a weight average molecular weight of 3000 or less , an epoxy resin and / or a latent curing agent.
JP4183638A 1992-07-10 1992-07-10 Adhesive composition and laminated film Expired - Fee Related JP2894093B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4183638A JP2894093B2 (en) 1992-07-10 1992-07-10 Adhesive composition and laminated film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4183638A JP2894093B2 (en) 1992-07-10 1992-07-10 Adhesive composition and laminated film

Publications (2)

Publication Number Publication Date
JPH0625632A JPH0625632A (en) 1994-02-01
JP2894093B2 true JP2894093B2 (en) 1999-05-24

Family

ID=16139288

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4183638A Expired - Fee Related JP2894093B2 (en) 1992-07-10 1992-07-10 Adhesive composition and laminated film

Country Status (1)

Country Link
JP (1) JP2894093B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009299063A (en) * 2009-07-06 2009-12-24 Sony Chemical & Information Device Corp Electrical apparatus

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002204052A (en) * 2000-12-28 2002-07-19 Hitachi Chem Co Ltd Circuit connecting material and method for connecting circuit terminal using the same as well as connecting structure
JP3981341B2 (en) * 2003-05-27 2007-09-26 住友ベークライト株式会社 Anisotropic conductive adhesive
JP2007009215A (en) * 2006-07-07 2007-01-18 Hitachi Chem Co Ltd Connecting member
JP4702566B2 (en) * 2008-06-16 2011-06-15 ソニーケミカル&インフォメーションデバイス株式会社 Connecting material
JP2009203478A (en) * 2009-05-18 2009-09-10 Hitachi Chem Co Ltd Adhesive for connecting circuit member
FR2954341B1 (en) * 2009-12-21 2014-07-11 Bostik Sa ADHESIVE COMPOSITION RETICULABLE BY HEATING

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009299063A (en) * 2009-07-06 2009-12-24 Sony Chemical & Information Device Corp Electrical apparatus

Also Published As

Publication number Publication date
JPH0625632A (en) 1994-02-01

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