JP2848744B2 - Cleaning equipment - Google Patents
Cleaning equipmentInfo
- Publication number
- JP2848744B2 JP2848744B2 JP26947592A JP26947592A JP2848744B2 JP 2848744 B2 JP2848744 B2 JP 2848744B2 JP 26947592 A JP26947592 A JP 26947592A JP 26947592 A JP26947592 A JP 26947592A JP 2848744 B2 JP2848744 B2 JP 2848744B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- plate
- cleaning water
- substrate
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、半導体ウエハや液晶用
のガラス基板やフォトマスク用のガラス基板やサーマル
ヘッド製造用のセラミック基板、プリント基板、アパー
チャマスクなどの板状体を洗浄する洗浄装置に関し、詳
しくは、超音波振動を与えた洗浄水によって板状体を洗
浄する洗浄装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus for cleaning a plate-shaped body such as a semiconductor wafer, a glass substrate for liquid crystal, a glass substrate for a photomask, a ceramic substrate for manufacturing a thermal head, a printed circuit board, and an aperture mask. More specifically, the present invention relates to a cleaning apparatus for cleaning a plate-like body with cleaning water provided with ultrasonic vibration.
【０００２】[0002]
【従来の技術】上述のような洗浄装置としては、従来、
特開昭６３−１２６５８７号公報に開示されているもの
があった。この公知例によれば、プレート状の被洗浄物
に近接して、振動子を取り囲むようにして洗浄液供給ノ
ズルを備えた洗浄装置を設け、洗浄液供給ノズルから被
洗浄物の表面に洗浄液を噴射しながら振動子により超音
波を発生させて洗浄するように構成されている。そし
て、洗浄装置本体の前面部に断面がほぼＶ字型の溝が形
成され、このＶ字型の溝内に洗浄液供給ノズルから供給
された洗浄液を振動板の表面部に滞留させ、振動板の振
動により生じた超音波によって洗浄するように構成され
ている。2. Description of the Related Art Conventionally, as a cleaning apparatus as described above,
There was one disclosed in JP-A-63-126587. According to this known example, a cleaning device provided with a cleaning liquid supply nozzle is provided in the vicinity of a plate-shaped cleaning object so as to surround the vibrator, and the cleaning liquid is sprayed from the cleaning liquid supply nozzle onto the surface of the cleaning object. The ultrasonic wave is generated by the vibrator while cleaning. A groove having a substantially V-shaped cross section is formed in the front portion of the main body of the cleaning device, and the cleaning liquid supplied from the cleaning liquid supply nozzle is retained on the surface of the diaphragm in the V-shaped groove. The cleaning is performed by the ultrasonic waves generated by the vibration.
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、上述し
た公知例の場合、洗浄液に超音波振動を付与するため
に、洗浄装置本体とプレート状の被洗浄物との間に洗浄
液を滞留させているため、一旦被洗浄物から剥離された
異物が滞留中の洗浄液に混入して被洗浄物に再付着し、
洗浄効果が低下する欠点があった。However, in the case of the above-described known example, since the cleaning liquid is subjected to ultrasonic vibration, the cleaning liquid is retained between the cleaning apparatus main body and the plate-shaped object to be cleaned. Foreign matter once separated from the object to be cleaned is mixed into the staying cleaning liquid and adheres again to the object to be cleaned,
There was a disadvantage that the cleaning effect was reduced.
【０００４】本発明は、このような事情に鑑みてなされ
たものであって、請求項１に係る発明の洗浄装置は、簡
単な構成でもって、平面視での装置スペースを極力小さ
くしながら、板状体から一旦剥離された異物が再付着す
ることを防止し、洗浄効果を高くできるようにすること
を目的とし、また、請求項２に係る発明の洗浄装置は、
洗浄効果を一層高くできるようにすることを目的とし、
また、請求項３に係る発明の洗浄装置は、搬送構成を簡
単にするとともに平面視での装置スペースを小さくでき
るようにすることを目的とし、また、請求項４に係る発
明の洗浄装置は、板状体の表裏両面を良好に洗浄できる
ようにすることを目的とする。The present invention has been made in view of such circumstances, and a cleaning apparatus according to the first aspect of the present invention has a simple configuration while minimizing the apparatus space in plan view. An object of the present invention is to prevent foreign matter once peeled off from a plate-like body from reattaching and to enhance a cleaning effect.
The purpose is to be able to further enhance the cleaning effect,
Further, a cleaning device according to a third aspect of the present invention aims to simplify the transport configuration and reduce the space required for the device in a plan view. An object of the present invention is to enable both front and back surfaces of a plate to be cleaned well.
【０００５】[0005]
【課題を解決するための手段】請求項１に係る発明の洗
浄装置は、上述のような目的を達成するために、板状体
を保持して、その板面が上下方向を向く状態で上方に向
けて搬送する搬送手段と、その搬送手段によって搬送さ
れる板状体の外面に、その法線方向または法線方向より
下方を向く状態で洗浄水を吹き付ける洗浄水供給手段
と、板状体の外面に吹き付けられる洗浄水に超音波振動
を発生する超音波発生手段とを備えて構成する。According to a first aspect of the present invention, there is provided a cleaning apparatus, comprising: Conveying means for conveying the cleaning water toward the surface of the plate-shaped body, and washing water supply means for spraying the cleaning water onto the outer surface of the plate-shaped body conveyed by the conveying means in a direction normal to or below the normal direction. And ultrasonic wave generating means for generating ultrasonic vibrations in the cleaning water sprayed on the outer surface of the cleaning water.
【０００６】また、請求項２に係る発明の洗浄装置は、
上述のような目的を達成するために、請求項１に記載の
洗浄水供給手段の下方に、板状体の外面を摺接洗浄する
洗浄具を設けて構成する。[0006] A cleaning apparatus according to a second aspect of the present invention comprises:
In order to achieve the above-mentioned object, a cleaning tool for slidingly cleaning the outer surface of the plate is provided below the cleaning water supply means.
【０００７】また、請求項３に係る発明の洗浄装置は、
上述のような目的を達成するために、請求項１または２
に記載の搬送手段を、板状体を鉛直方向上方に搬送する
ように構成する。[0007] The cleaning apparatus according to the third aspect of the present invention provides
In order to achieve the above-mentioned object, a method according to claim 1 or 2 is provided.
Is configured to transport the plate-like body upward in the vertical direction.
【０００８】また、請求項４に係る発明の洗浄装置は、
上述のような目的を達成するために、請求項１ないし３
のいずれかに記載の洗浄水供給手段を板状体の両面側そ
れぞれに設けて構成する。[0008] A cleaning apparatus according to a fourth aspect of the present invention is a cleaning apparatus comprising:
In order to achieve the above object, claims 1 to 3
The cleaning water supply means according to any one of the above is provided on each of both sides of the plate-like body.
【０００９】[0009]
【作用】請求項１に係る発明の洗浄装置の構成によれ
ば、板状体の外面に超音波振動を付与した洗浄水を吹き
付け、その吹き付けた洗浄水および剥離した異物を、上
方側に逆流させずに、自由落下水流によって吹き付け箇
所から下方に流下することができる。According to the structure of the cleaning apparatus of the first aspect of the present invention, the cleaning water to which the ultrasonic vibration is applied is sprayed on the outer surface of the plate-like body, and the sprayed cleaning water and the separated foreign matter are returned to the upper side. Instead, the free-falling water can flow downward from the spray location.
【００１０】また、請求項２に係る発明の洗浄装置の構
成によれば、超音波振動を付与した洗浄水の供給による
洗浄に先立って、洗浄具でもって異物を摺接洗浄により
除去することができる。Further, according to the structure of the cleaning apparatus of the present invention, it is possible to remove foreign matter by sliding cleaning with a cleaning tool prior to cleaning by supplying cleaning water to which ultrasonic vibration is applied. it can.
【００１１】また、請求項３に係る発明の洗浄装置の構
成によれば、板状体自体の自重を利用し、板状体の途中
箇所において板状体の重量を支持せずに搬送することが
できる。Further, according to the structure of the cleaning apparatus of the third aspect of the present invention, the plate-like body is conveyed without supporting the weight of the plate-like body at an intermediate position of the plate-like body by utilizing its own weight. Can be.
【００１２】また、請求項４に係る発明の洗浄装置の構
成によれば、超音波振動を付与した洗浄水によって、板
状体の両面を洗浄することができる。According to the structure of the cleaning apparatus of the fourth aspect of the present invention, both sides of the plate can be cleaned with the cleaning water to which the ultrasonic vibration is applied.
【００１３】[0013]
【実施例】次に、本発明の実施例を図面を用いて説明す
る。Next, embodiments of the present invention will be described with reference to the drawings.
【００１４】図１は、本発明に係る洗浄装置としての基
板洗浄装置の全体概略側面図、図２は全体概略正面図で
あり、スプロケット１…に巻回したエンドレスのチェー
ン２に吊り下げ部材３が取り付けられ、板状体としての
基板４の上端縁を挟持する基板挟持具５が吊り下げ部材
３に取り付けられ、基板４を板面が鉛直方向を向く状態
で上方に搬送する搬送手段６が構成されている。FIG. 1 is an overall schematic side view of a substrate cleaning apparatus as a cleaning apparatus according to the present invention, and FIG. 2 is an overall schematic front view showing a suspension member 3 suspended on an endless chain 2 wound around sprockets 1. Is mounted on the suspension member 3, and a transporting means 6 for transporting the substrate 4 upward in a state where the board surface is in the vertical direction is provided. It is configured.
【００１５】チェーン２の上方への搬送経路途中に、基
板４の外面に、その法線方向に向かう状態で洗浄水を吹
き付ける洗浄水供給手段としての洗浄水供給ノズル７が
設けられるとともに、その洗浄水供給ノズル７に、基板
４の外面に吹き付けられる洗浄水に超音波振動を発生す
る超音波発生手段としての超音波発信器８が付設され、
チェーン２によって上方に搬送される基板４の表面に、
その法線方向に向かって、超音波振動が付与された洗浄
水を吹き付け、基板４の表面に付着したパーティクルな
どの異物を剥離するとともに、その剥離された異物とと
もに洗浄水を自由落下水流により基板４の表面をつたっ
て流下させ、異物の再付着を防止して洗浄効果を高める
ように構成されている。A cleaning water supply nozzle 7 as cleaning water supply means for spraying cleaning water in a direction normal to the substrate 4 is provided on the outer surface of the substrate 4 in the middle of the transport path above the chain 2. The water supply nozzle 7 is provided with an ultrasonic transmitter 8 as ultrasonic generating means for generating ultrasonic vibrations in the cleaning water sprayed on the outer surface of the substrate 4,
On the surface of the substrate 4 transported upward by the chain 2,
Cleaning water to which ultrasonic vibrations are applied is sprayed in the normal direction to separate foreign substances such as particles adhered to the surface of the substrate 4, and the cleaning water is removed along with the separated foreign substances by a free-falling water flow. It is configured so that the surface of No. 4 is caused to flow down to prevent reattachment of foreign matter and enhance the cleaning effect.
【００１６】前記洗浄水供給ノズル７の下方に、基板４
の外面を摺接洗浄する洗浄具としてのロール状の洗浄ブ
ラシ９が、支持アーム９ａを介して作用位置と非作用位
置とに変位可能に設けられ、超音波振動を付与した洗浄
水の供給による洗浄に先立って、流下洗浄水を利用しな
がら異物を摺接洗浄により除去し、洗浄効果を一層高め
るように構成されている。洗浄具としては、ディスク状
の洗浄ブラシやフェルトを巻き付けて構成したものなど
が適用できる。図中１０，１０は、洗浄ブラシ９による
摺接洗浄の際に基板４が逃げることを防止する押さえロ
ーラを示し、支持アーム１０ａを介して作用位置と非作
用位置とに変位可能に設けられている。The substrate 4 is provided below the cleaning water supply nozzle 7.
A cleaning brush 9 in the form of a roll as a cleaning tool for slidably cleaning the outer surface of the device is provided so as to be displaceable between a working position and a non-working position via a support arm 9a, and is supplied with cleaning water to which ultrasonic vibration is applied. Prior to the cleaning, foreign substances are removed by sliding contact cleaning while using the flowing down cleaning water, so that the cleaning effect is further enhanced. As the cleaning tool, a disk-shaped cleaning brush or a device formed by winding a felt can be used. Reference numerals 10 and 10 in the drawing denote holding rollers for preventing the substrate 4 from escaping during the sliding contact cleaning by the cleaning brush 9, and are provided so as to be displaceable between an operation position and a non-operation position via a support arm 10a. I have.
【００１７】次に、本発明に先立って行った超音波振動
を付与した洗浄水による洗浄効果の確認実験結果につ
き、図３のグラフを用いて説明する。基板を、その板面
が水平方向を向く状態にして搬送し、洗浄水のみを噴出
供給して洗浄する状態Ａ（▲印で付す）、超音波振動を
付与した洗浄水を噴出供給して洗浄する状態Ｂ（□印で
付す）、洗浄水を供給しながらロール状の洗浄ブラシで
摺接洗浄する状態Ｃ（△印で付す）、および、超音波振
動を付与した洗浄水を噴出供給するとともにロール状の
洗浄ブラシで摺接洗浄する状態Ｄ（○印で付す）それぞ
れで洗浄処理し、基板の搬送速度を変えてパーティクル
の残存個数を計測し、基板の搬送速度を横軸に、そし
て、パーティクルの残存個数を縦軸にしてそれぞれプロ
ットした。Next, the results of an experiment for confirming the cleaning effect of the cleaning water to which ultrasonic vibration was applied prior to the present invention will be described with reference to the graph of FIG. The substrate is conveyed with its plate surface facing in the horizontal direction, and cleaning is performed by jetting and supplying only the cleaning water A (marked with a triangle), and cleaning is performed by jetting and supplying cleaning water to which ultrasonic vibration has been applied. State B (marked with □), state C (marked with △) in which the cleaning water is slid and cleaned with a roll-shaped cleaning brush while supplying the cleaning water, and the cleaning water to which ultrasonic vibrations are applied is jetted and supplied. The cleaning process is performed in each of the states D (marked with a circle) where the sliding contact cleaning is performed with a roll-shaped cleaning brush, the number of remaining particles is measured by changing the substrate transport speed, the substrate transport speed is plotted on the horizontal axis, and The remaining number of particles was plotted on the vertical axis.
【００１８】この結果、超音波振動を付与した洗浄水を
噴出供給して洗浄する場合の方が洗浄水のみを噴出供給
して洗浄する場合よりも高い洗浄効果が得られており、
この洗浄において、前述したように、上方に搬送される
基板４の表面に、その法線方向に向かって、超音波振動
が付与された洗浄水を吹き付けるようにすれば、パーテ
ィクルの残存個数を一層減少できることが推測される。As a result, a higher cleaning effect is obtained when the cleaning is performed by jetting and supplying the cleaning water to which the ultrasonic vibration has been applied than when the cleaning is performed by jetting and supplying only the cleaning water.
In this cleaning, as described above, if the cleaning water to which the ultrasonic vibration is applied is sprayed on the surface of the substrate 4 conveyed upward in the normal direction, the remaining number of particles can be further increased. It is presumed that it can be reduced.
【００１９】また、超音波振動を付与した洗浄水を噴出
供給するとともにロール状の洗浄ブラシで摺接洗浄する
場合の方が洗浄水を供給しながらロール状の洗浄ブラシ
で摺接洗浄する場合よりも高い洗浄効果が得られてお
り、この洗浄においても、前述したように、上方に搬送
される基板４の表面に、その法線方向に向かって、超音
波振動が付与された洗浄水を吹き付けるようにすれば、
パーティクルの残存個数を一層減少できることが推測さ
れる。Further, the case where the cleaning water to which ultrasonic vibrations are applied is jetted and supplied and the cleaning is performed by sliding with a roll-shaped cleaning brush is more efficient than the case where the cleaning water is supplied and the cleaning is performed by sliding with a roll-shaped cleaning brush. As described above, also in this cleaning, cleaning water to which ultrasonic vibration is applied is sprayed toward the normal direction of the surface of the substrate 4 which is conveyed upward. By doing so,
It is assumed that the number of remaining particles can be further reduced.
【００２０】しかも、超音波振動を付与した洗浄水を噴
出供給する場合にあっては、基板の搬送速度が速い程洗
浄効果が高くなっており、このことは、基板の搬送速度
が速くなるに伴って剥離したパーティクルの逆流に起因
する再付着による影響が少なくなっているものと考えら
れ、本発明の実施例のように自由落下水流によって逆流
を防止することで、一層再付着による影響を減少して洗
浄効果を高められることが推測される。In addition, in the case where the cleaning water to which ultrasonic vibration is applied is jetted and supplied, the cleaning effect is higher as the substrate transport speed is higher. This means that the substrate transport speed increases. It is considered that the influence of reattachment caused by the backflow of the separated particles is reduced, and the influence of the reattachment is further reduced by preventing the backflow by the free-falling water flow as in the embodiment of the present invention. It is presumed that the cleaning effect can be enhanced by doing so.
【００２１】上記実施例では、基板４を鉛直方向の上方
に向かって搬送しているが、本発明としては、斜め方向
上方に搬送するものでも良い。In the above embodiment, the substrate 4 is transported upward in the vertical direction. However, the present invention may be applied to transport the substrate 4 obliquely upward.
【００２２】搬送手段としては、上述実施例のようなチ
ェーン２で搬送する構成に限らず、例えば、基板４の上
端縁を挟持する挟持部材をチェーンの下端に設け、その
チェーンを巻き取るチェーンブロックを水平方向に搬送
するように構成する、いわゆるホイストクレーンの構成
を利用するなど、各種の変形が可能である。The transport means is not limited to the configuration in which the chain is transported by the chain 2 as in the above-described embodiment. For example, a clamping member for clamping the upper edge of the substrate 4 is provided at the lower end of the chain, and a chain block for winding the chain is provided. Various modifications are possible, such as utilizing a configuration of a so-called hoist crane, which is configured to convey the paper in the horizontal direction.
【００２３】また、請求項１に係る発明の洗浄装置とし
ては、洗浄ブラシ９を設けないものをも含む。また、上
記実施例では、洗浄水供給ノズル７からの洗浄水を、基
板４の表面に対して法線方向に吹き付けているが、基板
４の外面での逆流を生じないように法線方向よりも下向
きに吹き付けるものであれば良い。また、洗浄水供給ノ
ズル７、超音波発信器８および洗浄ブラシ９を基板４の
両面側それぞれに設けても良い。The cleaning device according to the first aspect of the present invention includes a cleaning device without the cleaning brush 9. Further, in the above embodiment, the cleaning water from the cleaning water supply nozzle 7 is sprayed in the normal direction to the surface of the substrate 4. However, the cleaning water is sprayed from the normal direction so as not to cause a backflow on the outer surface of the substrate 4. Also, any material that sprays downward may be used. Further, the cleaning water supply nozzle 7, the ultrasonic transmitter 8 and the cleaning brush 9 may be provided on both sides of the substrate 4.
【００２４】本発明としては、各種の基板を洗浄する基
板洗浄装置に限らず、アパーチャマスクやプラスチック
スなど、要するに、各種の板状体を洗浄する洗浄装置に
適用できる。The present invention can be applied not only to a substrate cleaning apparatus for cleaning various substrates but also to a cleaning apparatus for cleaning various plate-like bodies such as an aperture mask and plastics.
【００２５】[0025]
【発明の効果】以上の説明から明らかなように、請求項
１に係る発明の洗浄装置によれば、板状体を所定の姿勢
で上方に搬送し、その外面に超音波振動を付与した洗浄
水を吹き付けるだけでありながら、その吹き付けた洗浄
水および剥離した異物を吹き付け箇所から下方に流下で
きるから、簡単な構成でありながら、板状体から剥離し
た異物を上方に移動させずに落下でき、板状体に再度付
着することを良好に防止して洗浄効果を高めることがで
きるようになった。また、水平方向でのスペースを小さ
くでき、敷地的に有利である。As is clear from the above description, according to the cleaning apparatus of the first aspect of the present invention, the cleaning apparatus is configured to transport the plate-like body upward in a predetermined posture and apply ultrasonic vibration to the outer surface thereof. The cleaning water sprayed and the separated foreign substances can flow downward from the spraying point while simply spraying water, so that the foreign substances separated from the plate can be dropped without moving upwards with a simple configuration. Thus, it is possible to satisfactorily prevent reattachment to the plate-like body and enhance the cleaning effect. In addition, the space in the horizontal direction can be reduced, which is advantageous for the site.
【００２６】また、請求項２に係る発明の洗浄装置によ
れば、洗浄具により板状体の外面を摺接洗浄して異物を
摺接洗浄により除去した後に、その板状体に、超音波振
動を付与した洗浄水を供給して洗浄処理するから、洗浄
効果をより一層高めることができるようになった。Further, according to the cleaning apparatus of the present invention, after the outer surface of the plate is slid and cleaned by the cleaning tool to remove foreign matter by slid cleaning, the ultrasonic wave is applied to the plate. Since the cleaning treatment is performed by supplying the vibration-applied cleaning water, the cleaning effect can be further enhanced.
【００２７】また、請求項３に係る発明の洗浄装置によ
れば、板状体を鉛直方向に搬送するから、板状体自体の
自重を利用できて板状体の途中箇所において板状体の重
量を支持せずに済み、斜めに搬送する場合に比べて搬送
構成を簡単にでき、しかも、平面視での装置スペースを
小さくできるようになった。According to the cleaning device of the third aspect of the present invention, since the plate is transported in the vertical direction, the weight of the plate itself can be utilized, and the plate is transported in the middle of the plate. It is not necessary to support the weight, the transport configuration can be simplified as compared with the case where the transport is performed diagonally, and the space for the apparatus in a plan view can be reduced.
【００２８】また、請求項４に係る発明の洗浄装置の構
成によれば、超音波振動を付与した洗浄水によって板状
体の両面を洗浄するから、板状体の表裏両面を良好に洗
浄できるようになった。According to the structure of the cleaning apparatus of the fourth aspect of the present invention, since both surfaces of the plate are cleaned with the cleaning water to which ultrasonic vibration is applied, both the front and back surfaces of the plate can be cleaned well. It became so.
【図１】本発明に係る洗浄装置としての基板洗浄装置の
全体概略側面図である。FIG. 1 is an overall schematic side view of a substrate cleaning apparatus as a cleaning apparatus according to the present invention.
【図２】全体概略正面図である。FIG. 2 is an overall schematic front view.
【図３】グラフである。FIG. 3 is a graph.
４…板状体としての基板 ６…搬送手段 ７…洗浄水供給手段としての洗浄水供給ノズル ８…超音波発生手段としての超音波発信器 ９…洗浄具としての洗浄ブラシ 4 ... Substrate as a plate-like body 6 ... Conveying means 7 ... Washing water supply nozzle as cleaning water supply means 8 ... Ultrasonic oscillator as ultrasonic generating means 9 ... Cleaning brush as cleaning tool
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 ＦＩ Ｈ０１Ｌ 21/68 Ｈ０１Ｌ 21/68 Ａ (58)調査した分野(Int.Cl.6，ＤＢ名) H01L 21/30 B08B 3/12 H01L 21/68──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 6 identification code FI H01L 21/68 H01L 21/68 A (58) Field surveyed (Int.Cl. 6 , DB name) H01L 21/30 B08B 3 / 12 H01L 21/68
Claims (4)
を向く状態で上方に向けて搬送する搬送手段と、 前記搬送手段によって搬送される前記板状体の外面に、
その法線方向または法線方向より下方を向く状態で洗浄
水を吹き付ける洗浄水供給手段と、 前記板状体の外面に吹き付けられる洗浄水に超音波振動
を発生する超音波発生手段と、 を備えたことを特徴とする洗浄装置。1. A conveying means for holding a plate-like body and conveying the plate-like body upward in a state where its plate surface faces up and down, and an outer surface of the plate-like body conveyed by the carrying means,
Cleaning water supply means for spraying cleaning water in a state where the cleaning water is directed in the normal direction or downward from the normal direction, and ultrasonic wave generation means for generating ultrasonic vibration in the cleaning water sprayed on the outer surface of the plate-like body. A cleaning device, characterized in that:
に、板状体の外面を摺接洗浄する洗浄具を設けてある洗
浄装置。2. A cleaning device provided below the cleaning water supply means according to claim 1 with a cleaning tool for slidingly cleaning the outer surface of the plate-like body.
板状体を鉛直方向上方に搬送するものである洗浄装置。3. The transport means according to claim 1, wherein:
A cleaning device for transporting a plate-like body vertically upward.
浄水供給手段を板状体の両面側それぞれに設けてある洗
浄装置。4. A cleaning apparatus, wherein the cleaning water supply means according to claim 1 is provided on each of both sides of a plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26947592A JP2848744B2 (en) | 1992-09-10 | 1992-09-10 | Cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26947592A JP2848744B2 (en) | 1992-09-10 | 1992-09-10 | Cleaning equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0697143A JPH0697143A (en) | 1994-04-08 |
| JP2848744B2 true JP2848744B2 (en) | 1999-01-20 |
Family
ID=17472963
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26947592A Expired - Fee Related JP2848744B2 (en) | 1992-09-10 | 1992-09-10 | Cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2848744B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021112156A1 (en) * | 2019-12-06 | 2021-06-10 | 株式会社荏原製作所 | Substrate processing apparatus and substrate processing method |
-
1992
- 1992-09-10 JP JP26947592A patent/JP2848744B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0697143A (en) | 1994-04-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2001246331A (en) | Cleaning device | |
| KR920003879B1 (en) | Surface treatment method of semiconductor substrate | |
| KR100323502B1 (en) | Method of manufacturing liquid crystal display panel and washing machine used for the same | |
| CN101623685A (en) | Protection film covering device and laser processing apparatus | |
| JP2001085496A (en) | Carrying device of plate-like member | |
| KR20190000947A (en) | Apparatus for manufacturing a circuit board | |
| JP2848744B2 (en) | Cleaning equipment | |
| JPH03218016A (en) | Washing method of semiconductor substrate and its equipment | |
| JP2005013960A (en) | Apparatus and method for cleaning substrate | |
| JPH08236498A (en) | Method of air knife drying | |
| JPH0689889A (en) | Wafer washer | |
| JPH05243203A (en) | Ultrasonic washer | |
| JP2837725B2 (en) | Liquid processing equipment for semiconductor wafers | |
| KR20040110391A (en) | substrate treatment apparatus | |
| JP2001170584A (en) | Ultrasonic treatment apparatus | |
| JPH0475341A (en) | Method and apparatus for cleaning semiconductor substrate | |
| JP2862458B2 (en) | Method and apparatus for cleaning substrate to be cleaned | |
| JPS5947457B2 (en) | How to clean semiconductor wafers | |
| JPH02252238A (en) | Cleaning equipment for substrate | |
| JPS6234440Y2 (en) | ||
| JPH11145096A (en) | Cleaning method and cleaning equipment | |
| KR0146272B1 (en) | Method for cleaning board using megasonic | |
| KR101075483B1 (en) | Substrate cleaning apparatus and method using the same | |
| JP2001224993A (en) | Method and device for removing treating liquid from substrate and draining knife used for device therefor | |
| JP3325395B2 (en) | Ultrasonic cleaning equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |