JP2836888B2 - Cleaning method for plate - Google Patents

Cleaning method for plate

Info

Publication number
JP2836888B2
JP2836888B2 JP2743690A JP2743690A JP2836888B2 JP 2836888 B2 JP2836888 B2 JP 2836888B2 JP 2743690 A JP2743690 A JP 2743690A JP 2743690 A JP2743690 A JP 2743690A JP 2836888 B2 JP2836888 B2 JP 2836888B2
Authority
JP
Japan
Prior art keywords
cleaning
plate
ceramic substrate
cleaning liquid
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2743690A
Other languages
Japanese (ja)
Other versions
JPH03231427A (en
Inventor
忠緒 細谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP2743690A priority Critical patent/JP2836888B2/en
Publication of JPH03231427A publication Critical patent/JPH03231427A/en
Application granted granted Critical
Publication of JP2836888B2 publication Critical patent/JP2836888B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/02Cleaning by methods not provided for in a single other subclass or a single group in this subclass by distortion, beating, or vibration of the surface to be cleaned

Landscapes

  • Cleaning In General (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Description

【発明の詳細な説明】 〔概要〕 板状体の洗浄方法に関し、 スラリー状の異物の洗浄効率を高めることを目的と
し、 板状体の表面に付着したスラリー状の異物を洗浄液に
浸漬して洗浄する、板状体の洗浄方法において、洗浄液
中で板状体よりも軟質で、粒状に形成された固形物を板
状体の表面に噴射する構成とした。
DETAILED DESCRIPTION OF THE INVENTION [Summary] The present invention relates to a method for cleaning a plate-like object, with the object of improving the cleaning efficiency of slurry-like foreign matter, by immersing slurry-like foreign matter adhering to the surface of the plate-like body in a cleaning liquid. In the cleaning method of the plate-like body to be washed, a configuration is adopted in which a solid material which is softer than the plate-like body in the cleaning liquid and formed in a granular form is sprayed on the surface of the plate-like body.

〔産業上の利用分野〕 本発明は、板状体、例えばセラミック基板等の表面か
らスラリー状の異物を洗浄する方法に関する。
[Industrial Application Field] The present invention relates to a method for cleaning slurry-like foreign matter from the surface of a plate-like body, for example, a ceramic substrate.

〔従来の技術〕[Conventional technology]

例えば、シリコンウエハー、セラミック基板等の板状
体はハウジングに収納したり、その表面に保護膜、絶縁
層と金属薄膜からなる表面多層膜等を形成したりするた
めに表面の平面度を正確に形成することが要求されるこ
とがある。そして、シリコン、セラミック等の切削性が
低い難切削性材料の外形の平面度を高めるためにはラッ
プ盤やホーニング盤による精密研削加工が行われる。
For example, plate-like bodies such as silicon wafers and ceramic substrates are housed in a housing, and the flatness of the surface is precisely adjusted in order to form a protective film, a surface multilayer film composed of an insulating layer and a metal thin film, etc. on the surface. May be required to form. Then, in order to increase the flatness of the outer shape of the hard-to-cut material having low machinability such as silicon and ceramic, precision grinding with a lapping machine or a honing machine is performed.

これらの精密研削加工では、被加工物である板状体と
研磨盤のツールとの間に例えばダイヤモンド等の微粒状
の研磨剤を含んだスラリー状の研磨液が供給されるが、
この研磨液は研磨の後の工程、例えば、セラミック基板
の表面に絶縁層と金属薄膜層とからなる表面多層膜を形
成する工程までに除去される必要がある。
In these precision grinding processes, a slurry-like polishing liquid containing a fine-grained abrasive such as diamond is supplied between a plate-like body to be processed and a tool of a polishing machine,
This polishing liquid needs to be removed until a step after polishing, for example, a step of forming a surface multilayer film composed of an insulating layer and a metal thin film layer on the surface of the ceramic substrate.

ところで、板状体の表面から異物を除去する従来の洗
浄方法は、板状体に対して洗浄液を流動させる方法、
洗浄液を振動させる方法、異物を化学的に板状体の
表面から離隔させる方法、これらの方法のうちの同類
のあるいは種類が異なる2以上の方法を併用する方法と
に大別することができる。
By the way, the conventional cleaning method of removing foreign matter from the surface of the plate-like body is a method of flowing a cleaning liquid to the plate-like body,
The method can be roughly classified into a method of vibrating the cleaning liquid, a method of chemically separating foreign matter from the surface of the plate-like body, and a method of using two or more of the same or different types of these methods in combination.

の方法としては、洗浄液に浸漬した板状体を揺動さ
せる方法、洗浄液を板状体に向けて噴射する方法等がそ
の例として挙げられる。また、の方法としては、板状
体を浸漬した洗浄液を超音波振動させる方法がその例と
して挙げられ、の方法としては、洗浄液に水溶性溶剤
を配合する方法や洗浄液に界面活性剤を配合する方法が
挙げられる。更にの方法としては、例えばの方法と
の方法とを併用する方法として、板状体を浸漬した洗
浄液中に多量の気泡を噴出し、洗浄液に流れを生じさせ
るとともに、気泡の破裂により洗浄液を超音波振動させ
る方法等がその例として挙げられる。
Examples of the method include a method of swinging a plate-like body immersed in a cleaning liquid, a method of spraying a cleaning liquid toward the plate-like body, and the like. Examples of the method include a method of ultrasonically oscillating a cleaning liquid immersed in a plate-like body, and the method of mixing a surfactant in the cleaning liquid or a method of mixing a water-soluble solvent in the cleaning liquid. Method. As a further method, for example, a large amount of bubbles are jetted into the cleaning liquid in which the plate-shaped body is immersed to generate a flow in the cleaning liquid, and the cleaning liquid is superposed by bursting the bubbles, as a method in which the method is used in combination with the above method. As an example, a method of oscillating a sound wave is given.

なお、上記の方法は主として洗浄液の動圧によって
板状体の表面から異物を洗い落として分離する方法であ
り、の法は主として洗浄液の圧力変動によって異物を
板状体の表面から分離する方法であり、の方法は異物
と板状体との間の化学的結合をそれよりも強力な異物と
の洗浄液との間の化学的結合力で解離させる方法である
と言える。
Note that the above method is a method of mainly removing foreign matter from the surface of the plate-like body by the dynamic pressure of the cleaning liquid to separate the foreign matter from the surface of the plate-like body. Can be said to be a method in which the chemical bond between the foreign matter and the plate-like body is dissociated by the stronger chemical bond between the foreign matter and the cleaning solution.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

しかしながら、これらの従来の洗浄方法によってセラ
ミック基板からスラリー状の研磨液を洗浄することを試
みたところ、セラミック基板の表面がマイクロクラック
の多い粗荒面であるため、洗浄効率が低く、表面のクリ
ーン度が所定の基準を満たすまで洗浄するには例えば30
分ないし1時間程度のかなり長い時間が必要であること
が分かった。
However, when attempting to clean the slurry-like polishing liquid from the ceramic substrate by these conventional cleaning methods, the surface of the ceramic substrate has a rough surface with many micro cracks, so the cleaning efficiency is low and the surface is not clean. For example, 30 to wash until the degree meets the prescribed criteria
It has been found that a fairly long time, on the order of minutes to an hour, is required.

本発明は、上記の事情を鑑みてなされたものであり、
板状体に付着したスラリー状の異物を高能率に潜像でき
るようにした板状体の洗浄方法を提供することを目的と
する。
The present invention has been made in view of the above circumstances,
It is an object of the present invention to provide a method for cleaning a plate-like body, which enables a slurry-like foreign matter adhering to the plate-like body to form a latent image with high efficiency.

〔課題を解決するための手段〕[Means for solving the problem]

本発明は、例えば第1図に示すように、板状体1の表
面に付着したスラリー状の異物9を洗浄液3に浸漬して
洗浄する、板状体の洗浄方法において、上記の目的を達
成するため、洗浄液3中で板状体1よりも軟質で、粒状
に形成された固形物8を板状体1の表面に噴射する、と
いう手段を講じている。
The present invention achieves the above object in a method for cleaning a plate-like body, in which, as shown in FIG. 1, for example, a slurry-like foreign material 9 attached to the surface of a plate-like body 1 is immersed in a cleaning liquid 3 for cleaning. In order to do so, a means is employed in which the solid material 8 which is softer than the plate-like body 1 in the cleaning liquid 3 and formed in a granular form is sprayed on the surface of the plate-like body 1.

〔作用〕[Action]

本発明においては、噴射された固形物8が板状体1の
表面に衝突する際に板状体1に振動を与えてスラリー状
の異物2を板状体1の表面から離れ易くするとともに、
その固形物8が板状体1の表面から離れ易くなったスラ
リー状の異物2をいわば機械的な力で擦り取る。
In the present invention, when the injected solid 8 collides with the surface of the plate 1, the plate 1 is vibrated to make the slurry foreign matter 2 easily detach from the surface of the plate 1,
The solid matter 8 scrapes off the slurry-like foreign matter 2 which has easily separated from the surface of the plate-like body 1 by a so-called mechanical force.

〔実 施 例〕〔Example〕

以下、本発明の一実施例に係る板状体の洗浄方法及び
この方法を実施するための洗浄装置の一例を、板状体と
してセラミック基板を使用した場合を例に第1図ないし
第3図に基づき説明する。
FIGS. 1 to 3 show an example of a method for cleaning a plate and a cleaning apparatus for performing the method according to an embodiment of the present invention, in which a ceramic substrate is used as the plate. It will be described based on.

この洗浄装置は、第3図に示すように、セラミック基
板1の洗浄に使用する洗浄液2を貯溜する洗浄槽3、純
水12を貯溜する水洗槽13、イソプロピルアルコール等の
揮発性溶剤22を貯溜する水切槽23及び揮発槽33の4つの
槽を備えている。揮発槽33の底部には加熱装置31が設け
られ、揮発槽33内の底部に貯溜されたイソプロピルアル
コール等の揮発性溶剤32を加熱装置31で加熱して蒸発さ
せるように構成している。
As shown in FIG. 3, the cleaning apparatus includes a cleaning tank 3 for storing a cleaning liquid 2 used for cleaning the ceramic substrate 1, a washing tank 13 for storing pure water 12, and a volatile solvent 22 such as isopropyl alcohol. It has four tanks, a draining tank 23 and a volatilizing tank 33. A heating device 31 is provided at the bottom of the volatilization tank 33, and the volatile solvent 32 such as isopropyl alcohol stored in the bottom of the volatilization tank 33 is heated by the heating device 31 to evaporate.

処理されるセラミック基板1は、洗浄槽3内の洗浄液
2に浸漬してスラリー状の異物9(第1図にその一部分
を二重ハッチングで示す)を洗浄され、この後、水洗槽
13で純水14に浸漬して水洗され、水切槽23で例えばイソ
ロピルアルコール等の揮発性溶剤24に浸漬して水切りを
し、更に、揮発槽33内でイソロピルアルコール等の揮発
性溶剤34の蒸気を当てて加熱し、表面に付着した揮発性
溶剤24を蒸発させるという手順に従って洗浄される。
The ceramic substrate 1 to be treated is immersed in the cleaning liquid 2 in the cleaning tank 3 to wash the slurry-like foreign substances 9 (a part of which is shown by double hatching in FIG. 1).
13 immersed in pure water 14 and washed with water, drained in a draining tank 23 by immersing it in a volatile solvent 24 such as isopropyl alcohol, and further drained in a volatile tank 33. The cleaning is performed according to the procedure of heating by applying the vapor of the solvent 34 to evaporate the volatile solvent 24 attached to the surface.

第1図に示すように、上記洗浄槽3にはセラミック基
板1を洗浄するための洗浄液2が収容され、その上方に
はセラミック基板1を保持する治具5を吊り下げるハン
ガー枠4が配置される。
As shown in FIG. 1, the cleaning tank 3 contains a cleaning liquid 2 for cleaning the ceramic substrate 1, and a hanger frame 4 for suspending a jig 5 for holding the ceramic substrate 1 is disposed above the cleaning liquid 2. You.

また、蒸気洗浄槽3の一横側には循環ポンプ6を介在
させた循環パイプ7が接続され、セラミック基板1は洗
浄槽3内の洗浄液2中に、この循環パイプ7の吐出口7a
の正面に位置するように吊り下げられる。
A circulation pipe 7 with a circulation pump 6 interposed is connected to one side of the steam cleaning tank 3, and the ceramic substrate 1 is placed in the cleaning liquid 2 in the cleaning tank 3 and the discharge port 7 a of the circulation pipe 7 is provided.
Suspended in front of the

上記洗浄液2には、直径約10mmのボウル8が例えば10
0個投入される。このボール8は第2図に示すように、
化学的に安定な性質を有し、セラミック基板1よりも軟
質なフッ素樹脂からなる本体8aと、これの内部に埋入さ
れた比重調整用の鉛玉8bとからなり、全体としての比重
がほぼ1.00となるようにしている。そして、これらのボ
ール8が循環ポンプ6を作動させることにより循環パイ
プ7及び洗浄槽3内に生じる水流に乗ってセラミック基
板1の表面に噴射されるようにしている。
The washing liquid 2 contains a bowl 8 having a diameter of about
0 pieces are inserted. This ball 8 is, as shown in FIG.
It has a chemically stable property, a main body 8a made of a fluororesin softer than the ceramic substrate 1, and a lead ball 8b embedded in the main body 8a for adjusting the specific gravity. It is set to 1.00. When the circulation pump 6 is operated, the balls 8 are jetted onto the surface of the ceramic substrate 1 on the water flow generated in the circulation pipe 7 and the cleaning tank 3.

なお、ボール8の直径は循環ポンプ6及び循環パイプ
7の流路断面積を考慮して、循環ポンプ6のポンプ能力
を著しく低下させない範囲で自由に変更してもよい。ま
た、ボール8の本体8aはセラミック基板1よりも軟質の
ものであればよく、例えば塩化ビニル、ポリプロピレ
ン、ポリエチレン等で形成することも可能である。更
に、ボール8に代えて非球形の固形物を使用することも
可能である。
The diameter of the ball 8 may be freely changed in consideration of the cross-sectional area of the circulation pump 6 and the circulation pipe 7 within a range that does not significantly reduce the pumping ability of the circulation pump 6. Further, the main body 8a of the ball 8 only needs to be softer than the ceramic substrate 1, and may be formed of, for example, vinyl chloride, polypropylene, polyethylene or the like. Further, a non-spherical solid can be used instead of the ball 8.

上記洗浄液2としては、純水、水溶性溶剤あるいはこ
れらに界面活性剤を配合した水溶液等、公知の洗浄液を
使用すればよい。ここでは、ボール8の噴射による洗浄
効果の確認が容易になるように、純粋を洗浄液2として
使用した。
As the cleaning liquid 2, a known cleaning liquid such as pure water, a water-soluble solvent, or an aqueous solution in which a surfactant is blended with these may be used. Here, pure was used as the cleaning liquid 2 so that the cleaning effect by the injection of the ball 8 could be easily confirmed.

係る洗浄装置を用いて、ラップ盤で研磨したセラミッ
ク基板1の洗浄を行った。
The ceramic substrate 1 polished by the lapping machine was cleaned by using such a cleaning apparatus.

即ち、ラップ盤に使用される水溶性研磨剤と研磨屑と
を含んだスラリー状の異物9が表面の全面に付着したセ
ラミック基板1を治具5に保持させ、治具5をハンガー
枠4に吊り下げて、セラミック基板1を洗浄液2内で、
上記循環パイプ7の吐出口7aの正面に位置するように吊
り下げた後、循環ポンプ6を作動させ、1〜10m/分程度
の流速の水流を循環パイプ7及び洗浄槽3内にわたって
形成し、ボール8をこの水流に乗せてセラミック基板1
に向かって噴出させた。
That is, the ceramic substrate 1 on which the slurry-like foreign matter 9 containing the water-soluble abrasive and the polishing debris used for the lapping machine adheres to the entire surface is held by the jig 5, and the jig 5 is attached to the hanger frame 4. Hang the ceramic substrate 1 in the cleaning solution 2
After being suspended so as to be located in front of the discharge port 7a of the circulation pipe 7, the circulation pump 6 is operated, and a water flow having a flow rate of about 1 to 10 m / min is formed over the circulation pipe 7 and the washing tank 3. The ball 8 is placed on this water flow and the ceramic substrate 1
Spouted toward.

上記ボール8はセラミック基板1の表面に衝突し、こ
の際にセラミック基板1に振動を与えてスラリーの異物
9をセラミック基板1の表面から離れ易くさせる。ま
た、ボール8がセラミック基板1に衝突する際に、セラ
ミック基板1の表面から離れ易くなった異物9をボール
8によっていわば機械的な力で擦り取ることにより、高
能率な洗浄が行われる。なお、ボール8に付着したスラ
リー状の異物9は、ボール8が互いに衝突することによ
り擦り落とされ、洗浄液2中に混合される。
The ball 8 collides with the surface of the ceramic substrate 1 and, at this time, vibrates the ceramic substrate 1 so that the foreign matter 9 of the slurry is easily separated from the surface of the ceramic substrate 1. In addition, when the ball 8 collides with the ceramic substrate 1, the foreign matter 9 that has easily separated from the surface of the ceramic substrate 1 is scraped off by the ball 8 with a so-called mechanical force, so that highly efficient cleaning is performed. The slurry-like foreign substances 9 attached to the balls 8 are scraped off by the balls 8 colliding with each other, and are mixed into the cleaning liquid 2.

そして、洗浄液2中のセラミック基板1の表面を観察
して十分に洗浄が行われたかどうかが判定された。ここ
では、循環ポンプ6の作動開始から5〜10分で十分に洗
浄が行われたと判定された。この判定を下した後に、セ
ラミック基板1を裏返して、同様の手順で裏面の洗浄を
行い、裏面の洗浄が十分に行われたかどうかが判定され
た。ここでは、セラミック基板1を裏返してから5〜10
分で裏面が十分に洗浄が行われたと判定された。そし
て、この判定を下した後、セラミック基板1を洗浄槽3
から水洗槽13に移して水洗し、水切槽23の溶剤22に浸漬
して水切りをし、更に、揮発槽33で揮発性溶剤32の蒸気
を当ててセラミック基板1の表面の溶剤を揮発させた。
Then, the surface of the ceramic substrate 1 in the cleaning liquid 2 was observed to determine whether the cleaning was sufficiently performed. Here, it was determined that the washing was sufficiently performed within 5 to 10 minutes from the start of the operation of the circulation pump 6. After making this determination, the ceramic substrate 1 was turned over and the back surface was cleaned in the same procedure, and it was determined whether the back surface was sufficiently cleaned. Here, after turning over the ceramic substrate 1, 5-10
It was determined that the back surface was sufficiently cleaned in minutes. After making this determination, the ceramic substrate 1 is removed from the cleaning tank 3.
Then, it was transferred to a washing tank 13 and washed with water, immersed in a solvent 22 of a draining tank 23 for draining, and furthermore, a vapor of a volatile solvent 32 was applied in a volatile tank 33 to volatilize the solvent on the surface of the ceramic substrate 1. .

この処理結果と、洗浄槽3の純水からなる洗浄液2を
超音波振動させる従来法、あるいは、洗浄槽3内の純水
からなる洗浄液2中に加圧空気を供給して気泡を発生さ
せる従来法によって洗浄槽3内で30〜1時間程度洗浄し
た後、水洗、水切り、溶剤揮発の各処理をした場合の処
理結果とを比較して観察したところ、蒸気の実施例に従
って洗浄されたセラミック基板1の表面のクリーン度が
各従来法に従って洗浄されたセラミック基板1の表面の
クリーン度より優れていることが分かった。すなわち、
表裏両面で10〜20分という従来の2/3の洗浄時間で従来
法と同等以上に奇麗に洗浄できることが分かった。
A conventional method of ultrasonically oscillating the processing result and the cleaning liquid 2 made of pure water in the cleaning tank 3 or a conventional method of supplying pressurized air to the cleaning liquid 2 made of pure water in the cleaning tank 3 to generate bubbles. After cleaning for about 30 to 1 hour in the cleaning tank 3 by the method, the results of the processes of water washing, draining, and solvent volatilization were compared and observed, and the ceramic substrate cleaned according to the embodiment of steam was observed. It was found that the cleanliness of the surface of Sample No. 1 was superior to the cleanliness of the surface of the ceramic substrate 1 cleaned according to each conventional method. That is,
It was found that the cleaning time on both the front and back sides was 10 to 20 minutes, which was 2/3 of the conventional cleaning time, and that it could be cleaned as well as the conventional method.

以上板状体としてセラミック基板を例に説明したが、
この発明は電子分品用に使用する他の板状体、例えばシ
リコンウエハー等の洗浄にも使用することができる。
The ceramic substrate has been described as an example of the plate-like body,
The present invention can be used for cleaning other plate-like bodies used for electronic components, for example, silicon wafers.

〔発明の効果〕〔The invention's effect〕

以上のように、本発明によれば、洗浄液中で板状体に
これよりも軟質で粒状に形成された固形物を噴射するの
で、固形物が板状体に当たることにより、板状体の表面
に付着したスラリー状の異物が分離され易くなるととも
に、板状体の表面から分離され易くなった異物が固形物
によっていわば機械的に擦り取られるので、高能率な洗
浄が行われ、洗浄処理時間を短縮できる。
As described above, according to the present invention, since a solid material which is softer and more granularly formed is sprayed on the plate-shaped body in the cleaning liquid, the solid matter hits the plate-shaped body, and the surface of the plate-shaped body is hit. Slurry-like foreign matter adhering to the plate is easily separated, and the foreign matter that is easily separated from the surface of the plate-like body is mechanically rubbed by solids, so to speak, so that highly efficient cleaning is performed, and the cleaning processing time is increased. Can be shortened.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明の一実施例に係るセラミック基板の洗浄
方法の要点を示す斜視図、第2図はその洗浄方法に使用
されるボールの断面図、第3図はその洗浄方法の説明図
である。 図中、 1……セラミック基板(板状体)、 2……洗浄液、 8……ボール、 9……ボール(異物)。
FIG. 1 is a perspective view showing a main point of a method for cleaning a ceramic substrate according to one embodiment of the present invention, FIG. 2 is a sectional view of a ball used in the method, and FIG. It is. In the figure, 1 ... ceramic substrate (plate-like body), 2 ... cleaning liquid, 8 ... ball, 9 ... ball (foreign matter).

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】板状体の表面を洗浄液に浸漬して洗浄す
る、板状体の洗浄方法において、洗浄液中で板状体より
も軟質な固形物を板状体の表面に噴射することを特徴と
する、板状体の洗浄方法。
In a method for cleaning a plate-like body, the surface of the plate-like body is washed by immersing the surface of the plate-like body in a cleaning liquid. A method for cleaning a plate-shaped body, characterized by:
JP2743690A 1990-02-06 1990-02-06 Cleaning method for plate Expired - Lifetime JP2836888B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2743690A JP2836888B2 (en) 1990-02-06 1990-02-06 Cleaning method for plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2743690A JP2836888B2 (en) 1990-02-06 1990-02-06 Cleaning method for plate

Publications (2)

Publication Number Publication Date
JPH03231427A JPH03231427A (en) 1991-10-15
JP2836888B2 true JP2836888B2 (en) 1998-12-14

Family

ID=12221061

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2743690A Expired - Lifetime JP2836888B2 (en) 1990-02-06 1990-02-06 Cleaning method for plate

Country Status (1)

Country Link
JP (1) JP2836888B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6624060B2 (en) * 2002-01-12 2003-09-23 Taiwan Semiconductor Manufacturing Co., Ltd Method and apparatus for pretreating a substrate prior to electroplating
JP5736615B2 (en) * 2011-04-26 2015-06-17 国立大学法人大阪大学 Substrate cleaning method
CN102366748A (en) * 2011-09-20 2012-03-07 谢利荣 Aluminum sheet diagonal flushing device
JP6012321B2 (en) * 2012-07-18 2016-10-25 富士電機株式会社 Power module manufacturing method and manufacturing apparatus
CN114054400B (en) * 2021-11-08 2022-09-27 邹平市供电有限公司 Insulator cleaning device

Also Published As

Publication number Publication date
JPH03231427A (en) 1991-10-15

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