JPH08332465A - Washing method and washing device - Google Patents

Washing method and washing device

Info

Publication number
JPH08332465A
JPH08332465A JP16471095A JP16471095A JPH08332465A JP H08332465 A JPH08332465 A JP H08332465A JP 16471095 A JP16471095 A JP 16471095A JP 16471095 A JP16471095 A JP 16471095A JP H08332465 A JPH08332465 A JP H08332465A
Authority
JP
Japan
Prior art keywords
cleaning
washing
liquid
tank
upstream
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16471095A
Other languages
Japanese (ja)
Inventor
Sukeyuki Harada
祐之 原田
Minoru Yamahira
実 山平
Original Assignee
Supiide Fuamu Clean Syst Kk
スピードファムクリーンシステム株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Supiide Fuamu Clean Syst Kk, スピードファムクリーンシステム株式会社 filed Critical Supiide Fuamu Clean Syst Kk
Priority to JP16471095A priority Critical patent/JPH08332465A/en
Publication of JPH08332465A publication Critical patent/JPH08332465A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To provide a washing method and washing device capable of preventing the recontamination of wash during washing. CONSTITUTION: The liquid flow of a washing liquid 2 circulating horizontally in a washing tank 1 is made into unidirectional laminar flow 2a and the wash is moved (2) from downstream toward upstream in this unidirectional laminar flow 2a. Ultrasonic waves are radiated from an ultrasonic vibrator transducer 3 toward the washing liquid 2 during washing. The washing tank 1 has flow regulating plates 4 and 6 for regulating the liquid flow of the washing liquid 2 circulating horizontally in washing tank 1 to the unidirectional laminar flow and a rotating body 12 for holding and moving the wash from downstream to upstream in the unidirectional laminar flow 2a. The contamination of the washing liquid by stains separated from the wash during the washing are fewer in the upstream washing liquid than in the downstream washing liquid and, therefore, the recontamination during the washing is prevented when the wash is moved from downstream to upstream.

Description

【発明の詳細な説明】Detailed Description of the Invention
【0001】[0001]
【産業上の利用分野】本発明は、半導体ウエハ、ハード
ディスクの基板となるアルミニューム板、光学部品、ガ
ラス板、油成分の付着した部品等の被洗浄物の洗浄に適
用して好適な洗浄方法及び洗浄装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is suitable for cleaning semiconductor wafers, aluminum plates serving as substrates for hard disks, optical parts, glass plates, parts to which oil components are adhered, and other suitable cleaning methods. And a cleaning device.
【0002】[0002]
【従来の技術】従来、被洗浄物の汚染を洗浄するための
洗浄方法、洗浄装置が多々知られている。図2には、従
来提案された洗浄装置の一例(特開平6ー106011
号公報参照)を示している。
2. Description of the Related Art Conventionally, various cleaning methods and cleaning apparatuses for cleaning the contamination of an object to be cleaned have been known. FIG. 2 shows an example of a conventionally proposed cleaning device (Japanese Patent Laid-Open No. 6-106101).
(See Japanese Patent Publication).
【0003】図2において、洗浄装置は、洗浄槽20内
の底部に整流装置21を全断面にわたり介装し、上部に
帰還槽22及びオーバーフロー槽23を設け、帰還槽2
2から循環通路24をポンプ25及びフィルター26を
設けて洗浄槽20の底部に接続する。そして前記オーバ
ーフロー槽23からオーバーフローする汚染された粒子
を含有する液27を排出し、残りの洗浄液は前記循環通
路24にて循環させる。その結果、洗浄槽20内におい
ては、洗浄液の上昇流は前記整流装置21にて全断面に
おいて均一な層流となり、洗浄槽20内において、微粒
子の循環を阻止して微粒子を除去する。28は洗浄液供
給口である。
In FIG. 2, the cleaning device has a rectifying device 21 provided at the bottom of the cleaning tank 20 over the entire cross section, and a return tank 22 and an overflow tank 23 provided at the upper portion thereof.
The circulation passage 24 from 2 is connected to the bottom of the cleaning tank 20 by providing a pump 25 and a filter 26. Then, the liquid 27 containing the contaminated particles overflowing from the overflow tank 23 is discharged, and the remaining cleaning liquid is circulated in the circulation passage 24. As a result, in the cleaning tank 20, the upward flow of the cleaning liquid becomes a uniform laminar flow in the entire cross section in the rectifying device 21, and the circulation of the particles is blocked in the cleaning tank 20 to remove the particles. 28 is a cleaning liquid supply port.
【0004】このようにして洗浄槽20内で循環する洗
浄液中の微粒子を効率的に除去することができる。とこ
ろで、前記洗浄装置において、被洗浄物を洗浄槽20内
に入れて洗浄する場合、被洗浄物を洗浄槽20の上方か
ら入れなければならない。一方、前記洗浄装置は洗浄液
を上昇流として循環させているので、洗浄液の上方の洗
浄液層は下方の洗浄液層よりも僅かではあるが被洗浄物
から離れた汚れによって汚染している。そのため、洗浄
した被洗浄物を引き上げる際に、被洗浄物は洗浄液の上
方を通過する際に、再汚染に繋がることになる。
Thus, the fine particles in the cleaning liquid circulating in the cleaning tank 20 can be efficiently removed. By the way, in the said washing | cleaning apparatus, when a to-be-cleaned object is put in the washing tank 20 and it wash | cleans, the to-be-washed object must be put from the upper part of the washing tank 20. On the other hand, since the cleaning device circulates the cleaning liquid as an upward flow, the cleaning liquid layer above the cleaning liquid is contaminated by dirt, which is slightly separated from the object to be cleaned, than the cleaning liquid layer below. Therefore, when the washed object is pulled up, the object to be cleaned leads to recontamination when passing over the cleaning liquid.
【0005】[0005]
【発明が解決しようとする課題】本発明は前記問題点に
鑑み、被洗浄物を再汚染することなく洗浄できる洗浄方
法及び洗浄装置を提供する点にある。
SUMMARY OF THE INVENTION In view of the above problems, the present invention is to provide a cleaning method and a cleaning apparatus capable of cleaning an object to be cleaned without recontaminating it.
【0006】[0006]
【課題を解決するための手段】本発明洗浄方法は、洗浄
槽内を水平に循環する洗浄液の液流を一方向層流とし、
該一方向層流中を下流から上流に向けて被洗浄物を移動
させ、洗浄液に向けて超音波を放射することを特徴とす
る。前記洗浄方法を実現する洗浄装置は、洗浄槽と、該
洗浄槽内を水平に循環する洗浄液の液流を一方向層流に
する整流手段と、該一方向層流中を下流から上流に向け
て被洗浄物を移動させる移動手段と、洗浄液に向けて超
音波を放射する超音波放射手段とを備えることを特徴と
する。洗浄槽を循環する洗浄液流の上流から下流に向け
て僅かに傾斜させても良い。
According to the cleaning method of the present invention, the liquid flow of the cleaning liquid horizontally circulated in the cleaning tank is a unidirectional laminar flow,
The object to be cleaned is moved from the downstream side to the upstream side in the unidirectional laminar flow, and ultrasonic waves are emitted toward the cleaning liquid. A cleaning device that realizes the above-described cleaning method includes a cleaning tank, a rectifying unit that makes a liquid flow of a cleaning liquid horizontally circulating in the cleaning tank a unidirectional laminar flow, and a unidirectional laminar flow from downstream to upstream. And moving means for moving the object to be cleaned, and ultrasonic wave emitting means for emitting ultrasonic waves toward the cleaning liquid. It may be slightly inclined from the upstream side to the downstream side of the cleaning liquid flow circulating in the cleaning tank.
【0007】[0007]
【実施例】本発明洗浄方法の原理は、洗浄液を水平方向
に循環させて被洗浄物を洗浄した場合、被洗浄物から離
れた汚れによる洗浄液の汚染度は、上流の洗浄液が下流
の洗浄液よりも少ないという認識に基づいている。そこ
で、洗浄槽内を水平方向に循環する洗浄液の下流から上
流に向けて被洗浄物を移動させることにより洗浄を行
い、洗浄の終了した被洗浄物を洗浄液の上流側で洗浄槽
から引き上げることにより再汚染を防止することができ
る。
EXAMPLES The principle of the cleaning method of the present invention is that, when the cleaning liquid is circulated in the horizontal direction and the cleaning target is cleaned, the degree of contamination of the cleaning liquid due to the dirt separated from the cleaning target is that the upstream cleaning liquid is lower than the downstream cleaning liquid. It is based on the recognition that there are few. Therefore, cleaning is performed by moving the object to be cleaned from downstream to upstream of the cleaning solution that circulates horizontally in the cleaning tank, and pulling the cleaned object from the cleaning tank on the upstream side of the cleaning solution. Recontamination can be prevented.
【0008】図1には、前記原理に基づく本発明の実施
例の要部縦断面(図1のA)及び要部平面(図1のB)
を示している。図1の(A)及び図1の(B)におい
て、1はステンレス等で構成された洗浄槽であって、該
洗浄槽1内には洗浄液2が供給口14から供給されて満
杯になっている。なお、前記供給口14は、後述する整
流手段を構成する整流板4よりも上流に設けるのが好適
である。
FIG. 1 is a longitudinal sectional view (A in FIG. 1) and a plane view (B in FIG. 1) of a main part of an embodiment of the present invention based on the above principle.
Is shown. In FIGS. 1A and 1B, 1 is a cleaning tank made of stainless steel or the like. There is. It is preferable that the supply port 14 is provided upstream of the straightening plate 4 that constitutes the straightening means described later.
【0009】前記洗浄槽1の底部外側に超音波振動子
3、3が任意個数固定されており、該超音波振動子3か
ら放射された超音波を利用して洗浄液2中に漬けられた
被洗浄物の超音波洗浄を行う。
An arbitrary number of ultrasonic vibrators 3, 3 are fixed to the outside of the bottom of the cleaning tank 1, and ultrasonic waves radiated from the ultrasonic vibrators 3 are used to soak the object in the cleaning liquid 2. Ultrasonic cleaning of the cleaning product.
【0010】4は洗浄槽1の一端側に寄せられて設けた
整流板であって、該整流板4は縦横にマトリックス状に
配列された、例えば円形の貫通孔4aを複数個形成した
ステンレス板から成り、前記洗浄槽1の底板1a、両側
板1b、1cに固定されている。そして、該整流板4に
て洗浄槽1内を水平に循環する洗浄液2を整流して、液
流を一方向層流2aにする。前記整流板4に形成した貫
通孔の大きさは、洗浄液の流量と流速によって適宜決定
する。
Reference numeral 4 denotes a straightening plate provided near one end of the cleaning tank 1. The straightening plate 4 is a stainless steel plate having a plurality of circular through holes 4a arranged in a matrix in the vertical and horizontal directions. And is fixed to the bottom plate 1a and both side plates 1b and 1c of the cleaning tank 1. Then, the rectifying plate 4 rectifies the cleaning liquid 2 that circulates horizontally in the cleaning tank 1 to form a unidirectional laminar flow 2a. The size of the through hole formed in the straightening plate 4 is appropriately determined according to the flow rate and flow rate of the cleaning liquid.
【0011】5は、オーバーフロー槽で、前記整流板4
と同様の形状を備え、貫通孔6aを複数個形成した整流
板6にて前記洗浄槽1と仕切られており、前記循環する
洗浄液2の下流側において、前記貫通孔から流出する洗
浄液及び溢れ出た洗浄液2aを受ける。また、7は、前
記洗浄槽1の外部に並設したリザーブタンクであって、
前記オーバーフロー層5に流出した洗浄液2aをリザー
ブする。該リザーブタンク7には図示しないスキマー等
が設けられており、回収した洗浄液2cの表面を浮遊す
る汚染物などを取り除くのに有効である。このリザーブ
タンク7は、洗浄工程によって必要応じて設ければ良
い。
Reference numeral 5 denotes an overflow tank, which is the rectifying plate 4
The cleaning tank 1 is partitioned by a rectifying plate 6 having a similar shape to that of the through hole 6a, and the cleaning solution and the overflow flowing out from the through hole are provided downstream of the circulating cleaning solution 2. Received cleaning liquid 2a. In addition, 7 is a reserve tank provided in parallel outside the cleaning tank 1,
The cleaning liquid 2a flowing out to the overflow layer 5 is reserved. The reserve tank 7 is provided with a skimmer or the like (not shown) and is effective in removing contaminants and the like floating on the surface of the collected cleaning liquid 2c. The reserve tank 7 may be provided as needed depending on the cleaning process.
【0012】8は、前記オーバーフロー槽5と前記リザ
ーブタンク7とを繋ぐ洗浄液循環通路、9は、前記リザ
ーブタンク7と前記洗浄槽1とを繋ぐ洗浄液循環通路で
あって、洗浄液循環通路9には循環ポンプ10及び汚染
された洗浄液から微粒子などを取り除くフィルタ11が
設けられている。
Reference numeral 8 is a cleaning liquid circulation passage connecting the overflow tank 5 and the reserve tank 7, and 9 is a cleaning liquid circulation passage connecting the reserve tank 7 and the cleaning tank 1. A circulation pump 10 and a filter 11 for removing fine particles from the contaminated cleaning liquid are provided.
【0013】このように構成された洗浄装置において、
新しく洗浄槽1内に供給口14から満杯に供給された洗
浄液2を前記循環ポンプ10にて循環させると、洗浄液
2は前記整流板4及び整流板6にて整流され、上流から
下流のオーバーフロー槽5側へ一様に向かう一方向層流
2aとなる。
In the cleaning device thus constructed,
When the cleaning liquid 2 that is newly supplied into the cleaning tank 1 from the supply port 14 is circulated by the circulation pump 10, the cleaning liquid 2 is rectified by the rectifying plate 4 and the rectifying plate 6, and the overflow tank from the upstream to the downstream. The unidirectional laminar flow 2a is uniformly directed toward the No. 5 side.
【0014】一方、被洗浄物(図示せず)は矢印の向
きに洗浄槽1内に所定保持手段にて保持されて移動し、
前記一方向層流2aの洗浄液2中に漬けられる。この一
方向層流2aの洗浄液2中に漬けられた被洗浄物は、矢
印にて示すように層流2aの下流から層流2aの上流
に向けて、つまり、前記整流板4側に向けて移動させ
る。そして、洗浄の済んだ被洗浄物を矢印に示す向き
に引き上げて次の洗浄工程へ被洗浄物を移動させる。
On the other hand, an object to be cleaned (not shown) moves in the direction of the arrow in the cleaning tank 1 while being held by a predetermined holding means.
It is immersed in the cleaning liquid 2 of the unidirectional laminar flow 2a. The object to be cleaned immersed in the cleaning liquid 2 of the unidirectional laminar flow 2a is directed from the downstream of the laminar flow 2a to the upstream of the laminar flow 2a, that is, toward the side of the current plate 4 as indicated by the arrow. To move. Then, the cleaned object is pulled up in the direction shown by the arrow to move the cleaned object to the next cleaning step.
【0015】また、前記超音波振動子3からは、洗浄液
2に向けて超音波が放射されているので、被洗浄物が層
流2aの下流から上流に向けて移動する間に超音波洗浄
がなされ、被洗浄物に付着した汚染物を超音波洗浄する
ことができる。
Further, since ultrasonic waves are radiated from the ultrasonic oscillator 3 toward the cleaning liquid 2, ultrasonic cleaning is performed while the object to be cleaned moves from the downstream side to the upstream side of the laminar flow 2a. It is possible to ultrasonically clean the contaminants attached to the object to be cleaned.
【0016】図1の(B)において、前記洗浄液2中に
漬けられた被洗浄物は、所定の保持手段(図示せず)に
載せられ、該保持手段は洗浄槽1の長手方向両内側に取
り付けられた回転体12、12に支持されて循環する洗
浄液の下流から上流に向けて移動させる。この場合は前
記回転体12はモータ13にて駆動し回転させれば良い
る。
In FIG. 1B, the object to be cleaned immersed in the cleaning liquid 2 is placed on a predetermined holding means (not shown), and the holding means is provided on both inner sides in the longitudinal direction of the cleaning tank 1. The cleaning liquid supported and circulated by the attached rotating bodies 12, 12 is moved from the downstream side to the upstream side. In this case, the rotating body 12 may be driven by the motor 13 and rotated.
【0017】被洗浄物保持手段の移動は、前記回転体1
2に代えて、被洗浄物を載せた保持手段を吊して被洗浄
物を洗浄液の下流から上流へ向けて移動させても良く、
この場合は、前記回転体12による洗浄液の乱れが発生
せず、層流を安定して得ることができる。
The object to be cleaned holding means is moved by the rotating body 1 as described above.
Instead of 2, the holding means on which the object to be cleaned is placed may be hung to move the object to be cleaned from the downstream side to the upstream side of the cleaning liquid,
In this case, the washing liquid is not disturbed by the rotating body 12, and a laminar flow can be stably obtained.
【0018】また、前記洗浄装置を用いて被洗浄物を洗
浄するに当たり、前記洗浄槽1を循環する洗浄液の上流
から下流に向けて1〜3度、好適には1〜2度の傾斜を
持たせて実施しても良い。
In cleaning the object to be cleaned using the cleaning device, the cleaning liquid circulating in the cleaning tank 1 has an inclination of 1 to 3 degrees, preferably 1 to 2 degrees from the upstream to the downstream. You may carry it out.
【0019】なお、前記洗浄槽1等を循環させる間に洗
浄液2が蒸発などにより減少することがあるので、前記
洗浄液供給口14から必要に応じて適宜補給する。
Since the cleaning liquid 2 may decrease due to evaporation or the like while circulating through the cleaning tank 1 or the like, the cleaning liquid 2 is appropriately replenished from the cleaning liquid supply port 14 as needed.
【0020】[0020]
【発明の効果】以上、本発明洗浄方法及び洗浄装置によ
れば、循環する一方向層流の洗浄液中に被洗浄物を漬け
て、下流から上流に向けて移動させるようにしたから、
洗浄液中を移動中に被洗浄物が再汚染せず洗浄効果が増
し、しかも、洗浄の済んだ被洗浄物を洗浄槽から取り出
す際の再汚染を防止することができる。
As described above, according to the cleaning method and the cleaning apparatus of the present invention, the object to be cleaned is immersed in the circulating one-way laminar cleaning solution and moved from the downstream side to the upstream side.
The object to be cleaned is not re-contaminated while moving in the cleaning liquid, so that the cleaning effect is increased, and further, re-contamination when the cleaned object is taken out from the cleaning tank can be prevented.
【図面の簡単な説明】[Brief description of drawings]
【図1】本発明実施例の要部説明図である。FIG. 1 is an explanatory view of a main part of an embodiment of the present invention.
【図2】従来の洗浄装置の一例を示す図である。FIG. 2 is a diagram showing an example of a conventional cleaning device.
【符号の説明】[Explanation of symbols]
1 洗浄槽 2 洗浄液 2a 洗浄液の一方向層流 3 超音波振動子 4、6 整流板 4a、6a 整流板に形成した貫通孔 1 Cleaning Tank 2 Cleaning Liquid 2a Unidirectional Laminar Flow of Cleaning Liquid 3 Ultrasonic Transducer 4, 6 Rectifier Plate 4a, 6a Through Holes Formed in Rectifier Plate

Claims (7)

    【特許請求の範囲】[Claims]
  1. 【請求項1】 洗浄槽内を水平に循環する洗浄液の液流
    を一方向層流とし、該一方向層流中を下流から上流に向
    けて被洗浄物を移動させることを特徴とする洗浄方法。
    1. A cleaning method, wherein a liquid flow of a cleaning liquid horizontally circulated in a cleaning tank is a unidirectional laminar flow, and an object to be cleaned is moved from the downstream to the upstream in the unidirectional laminar flow. .
  2. 【請求項2】 請求項1の洗浄方法おいて、洗浄液に向
    けて超音波を放射することを特徴とする洗浄方法。
    2. The cleaning method according to claim 1, wherein ultrasonic waves are emitted toward the cleaning liquid.
  3. 【請求項3】 請求項1または請求項2の洗浄方法おい
    て、循環する洗浄液中の汚染物を除去することを特徴と
    する洗浄方法。
    3. The cleaning method according to claim 1 or 2, wherein contaminants in the circulating cleaning liquid are removed.
  4. 【請求項4】 洗浄槽と、該洗浄槽内を水平に循環する
    洗浄液の液流を一方向層流にする整流手段と、該一方向
    層流中を下流から上流に向けて被洗浄物を移動させる移
    動手段を備えることを特徴とする洗浄装置。
    4. A cleaning tank, a rectifying means for making a liquid flow of a cleaning liquid horizontally circulating in the cleaning tank a unidirectional laminar flow, and an object to be cleaned in the unidirectional laminar flow from a downstream side to an upstream side. A cleaning device comprising moving means for moving.
  5. 【請求項5】 請求項4の洗浄装置において、洗浄液に
    向けて超音波を放射する超音波放射手段を備えることを
    特徴とする洗浄装置。
    5. The cleaning apparatus according to claim 4, further comprising ultrasonic wave emitting means for emitting ultrasonic waves toward the cleaning liquid.
  6. 【請求項6】 請求項4または5の洗浄装置において、
    洗浄液を循環させる循環手段と、該循環手段に洗浄液中
    の汚染物を除去するフィルタを設けたことを特徴とする
    洗浄装置。
    6. The cleaning device according to claim 4 or 5,
    A cleaning device comprising: a circulation means for circulating the cleaning liquid; and a filter for removing contaminants in the cleaning liquid, the circulation means.
  7. 【請求項7】 請求項4又は5又は6の洗浄装置におい
    て、洗浄槽を循環する洗浄液流の上流から下流に向けて
    傾斜させることを特徴とする洗浄装置。
    7. The cleaning apparatus according to claim 4, 5 or 6, wherein the cleaning liquid flow circulating in the cleaning tank is inclined from upstream to downstream.
JP16471095A 1995-06-07 1995-06-07 Washing method and washing device Pending JPH08332465A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16471095A JPH08332465A (en) 1995-06-07 1995-06-07 Washing method and washing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16471095A JPH08332465A (en) 1995-06-07 1995-06-07 Washing method and washing device

Publications (1)

Publication Number Publication Date
JPH08332465A true JPH08332465A (en) 1996-12-17

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP16471095A Pending JPH08332465A (en) 1995-06-07 1995-06-07 Washing method and washing device

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7040330B2 (en) * 2003-02-20 2006-05-09 Lam Research Corporation Method and apparatus for megasonic cleaning of patterned substrates
US8327861B2 (en) 2006-12-19 2012-12-11 Lam Research Corporation Megasonic precision cleaning of semiconductor process equipment components and parts
CN109013536A (en) * 2018-07-11 2018-12-18 田康 A kind of silicon powder ultrasonic cleaning equipment

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7040330B2 (en) * 2003-02-20 2006-05-09 Lam Research Corporation Method and apparatus for megasonic cleaning of patterned substrates
US8327861B2 (en) 2006-12-19 2012-12-11 Lam Research Corporation Megasonic precision cleaning of semiconductor process equipment components and parts
CN109013536A (en) * 2018-07-11 2018-12-18 田康 A kind of silicon powder ultrasonic cleaning equipment
CN109013536B (en) * 2018-07-11 2021-08-20 崇义县源德矿业有限公司 Silica flour ultrasonic cleaning device

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