JP2820722B2 - 高電圧パルス発生回路及びこれを用いた放電励起レーザならびに加速器 - Google Patents
高電圧パルス発生回路及びこれを用いた放電励起レーザならびに加速器Info
- Publication number
- JP2820722B2 JP2820722B2 JP1167365A JP16736589A JP2820722B2 JP 2820722 B2 JP2820722 B2 JP 2820722B2 JP 1167365 A JP1167365 A JP 1167365A JP 16736589 A JP16736589 A JP 16736589A JP 2820722 B2 JP2820722 B2 JP 2820722B2
- Authority
- JP
- Japan
- Prior art keywords
- saturable reactor
- circuit
- main
- voltage
- preset
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/53—Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback
- H03K3/55—Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback the switching device being a gas-filled tube having a control electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
- Generation Of Surge Voltage And Current (AREA)
- Particle Accelerators (AREA)
- Soft Magnetic Materials (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1167365A JP2820722B2 (ja) | 1989-06-29 | 1989-06-29 | 高電圧パルス発生回路及びこれを用いた放電励起レーザならびに加速器 |
DE19904019822 DE4019822A1 (de) | 1989-06-29 | 1990-06-21 | Hochspannungs-pulsgeneratorschaltung und laser und beschleuniger mit einer solchen schaltung |
US07/873,632 US5184085A (en) | 1989-06-29 | 1992-04-22 | High-voltage pulse generating circuit, and discharge-excited laser and accelerator containing such circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1167365A JP2820722B2 (ja) | 1989-06-29 | 1989-06-29 | 高電圧パルス発生回路及びこれを用いた放電励起レーザならびに加速器 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0332215A JPH0332215A (ja) | 1991-02-12 |
JP2820722B2 true JP2820722B2 (ja) | 1998-11-05 |
Family
ID=15848363
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1167365A Expired - Lifetime JP2820722B2 (ja) | 1989-06-29 | 1989-06-29 | 高電圧パルス発生回路及びこれを用いた放電励起レーザならびに加速器 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2820722B2 (enrdf_load_stackoverflow) |
DE (1) | DE4019822A1 (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101424580B1 (ko) * | 2012-12-24 | 2014-08-01 | 한국원자력연구원 | 가속장치 보호 시스템의 자동 리셋 장치 및 그 방법 |
US9263848B2 (en) | 2012-12-03 | 2016-02-16 | Mitsubishi Heavy Industries, Ltd. | Directed-energy irradiating apparatus |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4037388A1 (de) * | 1990-11-22 | 1992-05-27 | Scheibe Hans Joachim Dr | Schaltungsanordnung zur stromversorgung fuer gepulst betriebene vakuumboegen |
AU2601400A (en) * | 1999-01-08 | 2000-07-24 | Quantum Manufacturing Technologies, Inc. | Method of continuously monitoring the operation of a high average power magneticmodulator system |
RU2254650C1 (ru) * | 2004-01-27 | 2005-06-20 | Государственное образовательное учреждение высшего профессионального образования "Красноярский государственный университет" | Компактный импульсный газовый лазер и устройство магнитного сжатия импульса для его возбуждения |
JP5270399B2 (ja) * | 2009-02-24 | 2013-08-21 | 株式会社京三製作所 | 磁気パルス圧縮回路およびパルス電源装置 |
JP6709144B2 (ja) * | 2016-10-24 | 2020-06-10 | ニチコン株式会社 | パルス電源装置 |
CN111416272B (zh) * | 2020-04-26 | 2024-04-02 | 中国科学院合肥物质科学研究院 | 一种准分子激光高压开关的触发及保护电路 |
TW202211734A (zh) * | 2020-05-13 | 2022-03-16 | 美商中子療法股份有限公司 | 加速器組件之過電壓保護技術 |
-
1989
- 1989-06-29 JP JP1167365A patent/JP2820722B2/ja not_active Expired - Lifetime
-
1990
- 1990-06-21 DE DE19904019822 patent/DE4019822A1/de active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9263848B2 (en) | 2012-12-03 | 2016-02-16 | Mitsubishi Heavy Industries, Ltd. | Directed-energy irradiating apparatus |
KR101424580B1 (ko) * | 2012-12-24 | 2014-08-01 | 한국원자력연구원 | 가속장치 보호 시스템의 자동 리셋 장치 및 그 방법 |
Also Published As
Publication number | Publication date |
---|---|
DE4019822C2 (enrdf_load_stackoverflow) | 1992-09-24 |
DE4019822A1 (de) | 1991-01-10 |
JPH0332215A (ja) | 1991-02-12 |
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