JP2782994B2 - Manufacturing method of magnetic head - Google Patents

Manufacturing method of magnetic head

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Publication number
JP2782994B2
JP2782994B2 JP3202859A JP20285991A JP2782994B2 JP 2782994 B2 JP2782994 B2 JP 2782994B2 JP 3202859 A JP3202859 A JP 3202859A JP 20285991 A JP20285991 A JP 20285991A JP 2782994 B2 JP2782994 B2 JP 2782994B2
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JP
Japan
Prior art keywords
film
magnetic
atomic
soft magnetic
head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP3202859A
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Japanese (ja)
Other versions
JPH0546911A (en
Inventor
久美男 名古
博 榊間
博幸 長谷川
高橋  健
瑛昌 沢井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
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Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP3202859A priority Critical patent/JP2782994B2/en
Priority to DE1992614179 priority patent/DE69214179T2/en
Priority to EP92103794A priority patent/EP0502535B1/en
Publication of JPH0546911A publication Critical patent/JPH0546911A/en
Application granted granted Critical
Publication of JP2782994B2 publication Critical patent/JP2782994B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、磁気録画再生装置(V
TR)、磁気録音再生装置、コンピュータ用磁気記録装
置等の磁気記録再生装置に用いられる磁気ヘッドとその
製造方法に関するものである。
BACKGROUND OF THE INVENTION The present invention relates to a magnetic recording and reproducing apparatus (V
TR), a magnetic recording / reproducing device, a magnetic head used in a magnetic recording / reproducing device such as a magnetic recording device for a computer, and a method of manufacturing the same.

【0002】[0002]

【従来の技術】近年の磁気記録分野における高密度記録
化の要求に対して、高保磁力媒体に対応した高性能磁気
ヘッドの開発が進められている。このような磁気ヘッド
としては、(図6)に示すような、軟磁性膜1と絶縁膜
2とをトラック幅方向に交互に積層したコア材料が非磁
性基板3で挟持され、前記コア材料で磁気回路が形成さ
れるタイプの積層型ヘッドや、(図7)に示すような、
磁路の大部分がフェライト5で構成され、磁気的に飽和
しやすい磁気ギャップ6近傍にのみ軟磁性膜7を設けた
磁気ヘッド(MIGヘッドと呼ばれている)が開発され
ている。前記積層型ヘッドはMIGヘッドと比較して、
疑似出力の影響がなく、高周波での摺動ノイズが小さ
く、高周波帯域で高い再生効率が得られるという利点が
ある。
2. Description of the Related Art In response to recent demands for high-density recording in the field of magnetic recording, the development of high-performance magnetic heads compatible with high coercive force media has been promoted. In such a magnetic head, as shown in FIG. 6, a core material in which a soft magnetic film 1 and an insulating film 2 are alternately laminated in the track width direction is sandwiched between non-magnetic substrates 3. A laminated type head in which a magnetic circuit is formed, or as shown in FIG.
A magnetic head (referred to as a MIG head) has been developed in which a magnetic path is mostly formed of ferrite 5 and a soft magnetic film 7 is provided only in the vicinity of a magnetic gap 6 that is easily magnetically saturated. The laminated type head is compared with the MIG head,
There is an advantage that there is no influence of pseudo output, sliding noise at high frequency is small, and high reproduction efficiency can be obtained in a high frequency band.

【0003】また、磁気ヘッドの特性は、それに使用す
るコア材料の材料特性に密接に関連しており、高密度記
録を達成するためには、磁気ヘッドのコア材料の特性と
して、高い飽和磁束密度(主に記録特性に影響)と高透
磁率(主に再生特性に影響)が要求されている。
[0003] The characteristics of the magnetic head are closely related to the material characteristics of the core material used in the magnetic head. To achieve high-density recording, the characteristics of the core material of the magnetic head must be high saturation magnetic flux density. (Mainly affecting recording characteristics) and high magnetic permeability (mainly affecting reproduction characteristics) are required.

【0004】このような要求に対して、前記積層型ヘッ
ドのコア材料として実用化されているセンダストやCo
基非晶質合金では、飽和磁束密度が約1T前後と低く、
更に、高密度記録を実現するためには、これら従来の材
料では飽和磁束密度に限界がある。
[0004] In response to such demands, Sendust and Co have been put to practical use as core materials for the laminated type head.
In the base amorphous alloy, the saturation magnetic flux density is as low as about 1T,
Further, in order to realize high-density recording, these conventional materials have a limit in saturation magnetic flux density.

【0005】そこで、高い飽和磁束密度と高透磁率を有
する軟磁性膜の研究開発が盛んに行なわれている。その
一つとして、Fe-N膜が研究されている。しかし、こ
のFe-N膜は350℃以上の熱処理で軟磁気特性が急
激に劣化し、軟磁気特性の熱的安定性に問題があるた
め、実用化に至っていない。
Therefore, research and development of a soft magnetic film having a high saturation magnetic flux density and a high magnetic permeability have been actively conducted. As one of them, an Fe—N film has been studied. However, this Fe—N film has not been put to practical use because its soft magnetic properties are rapidly deteriorated by heat treatment at 350 ° C. or higher, and there is a problem in the thermal stability of the soft magnetic properties.

【0006】一方、Co基非晶質合金の軟磁性の熱的安
定性と飽和磁束密度を改善した材料として、Co-Nb-
Zr/Co-Nb-Zr-N組成変調窒化膜が開発され、
積層型ヘッドが作製されている(日本応用磁気学会誌
Vol.14 No.2)。
On the other hand, Co-Nb- has been proposed as a material having improved thermal stability of soft magnetism and saturation magnetic flux density of a Co-based amorphous alloy.
Zr / Co-Nb-Zr-N composition modulation nitride film was developed,
A multilayer head is manufactured (Journal of the Japan Society of Applied Magnetics)
Vol.14 No.2).

【0007】[0007]

【発明が解決しようとする課題】ところが、このCo-
Nb-Zr/Co-Nb-Zr-N組成変調窒化膜において
も、飽和磁束密度は高々1.3Tであり、更に保磁力の
高い媒体に対し、十分な記録特性を得るためには、より
高い飽和磁束密度を有するコア材料が要求されている。
また、このCo-Nb-Zr/Co-Nb-Zr-N組成
変調窒化膜は、センダストやCo基非晶質合金の様に、
無磁界中の熱処理で高透磁率が得られず、前述の積層型
ヘッドのコア材料として用いた場合、コア材料として
は、等方的な高透磁率特性が要求されるため、回転磁界
中での熱処理が必要となり、熱処理装置が煩雑になると
いう課題を生じる。
However, this Co-
Even in the Nb-Zr / Co-Nb-Zr-N composition modulation nitride film, the saturation magnetic flux density is at most 1.3 T, and in order to obtain sufficient recording characteristics with respect to a medium having a high coercive force, a higher value is required. A core material having a saturation magnetic flux density is required.
Further, this Co-Nb-Zr / Co-Nb-Zr-N composition modulation nitride film is, like Sendust or Co-based amorphous alloy,
When high magnetic permeability cannot be obtained by heat treatment in the absence of a magnetic field and is used as the core material of the above-mentioned multilayer head, the core material is required to have an isotropic high magnetic permeability characteristic. Heat treatment is required, and the heat treatment apparatus becomes complicated.

【0008】本発明は、ターゲットと基板が平行に対向
した方式のスパッタ法により作製した、特定の組成範
囲、特定の膜構造、及び特定の膜厚を有するFe-Ta-
N系、またはFe-Ta-B-N系軟磁性膜は、簡便な無
磁界中の熱処理においても、高飽和磁束密度と低磁歪の
等方的な高透磁率特性を有するとの発見に基づいてなさ
れたもので、上述の問題点を解決した積層型磁気ヘッド
を提供せんとするものである。
The present invention relates to an Fe—Ta— film having a specific composition range, a specific film structure, and a specific film thickness, which is produced by a sputtering method in which a target and a substrate face in parallel.
Based on the discovery that N-based or Fe-Ta-BN-based soft magnetic films have isotropic high permeability characteristics with high saturation magnetic flux density and low magnetostriction even in a simple heat treatment in the absence of a magnetic field. It is an object of the present invention to provide a laminated magnetic head which solves the above-mentioned problems.

【0009】[0009]

【課題を解決するための手段】膜厚を1〜10μmに構
成した軟磁性膜と膜厚を0.05〜0.5μmに構成した
SiO2、Al23等の絶縁膜とを交互に積層したコア
材料で磁気ヘッドの磁気回路を形成する。軟磁性膜はF
eを主成分とし、Nを5〜17原子%、Taを7〜15
原子%含む組成を有するFe-Ta-N系軟磁性膜、また
はFeを主成分とし、Nを6〜15原子%、Taを7〜
15原子%、Bを0.5〜13原子%含む組成を有する
Fe-Ta-B-N系軟磁性膜とし、ターゲットと基板が
平行に対向した方式のスパッタ法により作製する。磁気
ヘッド加工工程に於ける熱処理は無磁界中で行なって作
製する。
A soft magnetic film having a thickness of 1 to 10 μm and an insulating film such as SiO 2 and Al 2 O 3 having a thickness of 0.05 to 0.5 μm are alternately provided. The magnetic circuit of the magnetic head is formed from the laminated core materials. The soft magnetic film is F
e as a main component, N is 5 to 17 atomic%, and Ta is 7 to 15
Fe-Ta-N-based soft magnetic film having a composition containing at.% Or Fe as a main component, 6 to 15 at.% Of N, and 7 to.
An Fe-Ta-BN soft magnetic film having a composition containing 15 atomic% and B in an amount of 0.5 to 13 atomic% is formed by a sputtering method in which a target and a substrate are opposed in parallel. The heat treatment in the magnetic head processing step is performed in the absence of a magnetic field.

【0010】また、前記Fe-Ta-N系、またはFe-
Ta-B-N系軟磁性膜はTa、N(窒素)、B(ホウ
素)、Taの窒化物、Taのホウ化物の少なくとも1種
以上の元素、あるいは化合物を固溶し、格子が膨張した
α−Feの微結晶とTaの窒化物微粒子またはTaのホ
ウ化物微粒子が混在した微細組織から成る材料とし、前
記α−Feの微結晶の平均粒径が100Å以下、Taの
窒化物微粒子またはTaのホウ化物微粒子の平均粒径が
50Å以下である膜構造のものとする。
In addition, the above-mentioned Fe—Ta—N system or Fe—Ta—N
The Ta-BN-based soft magnetic film solid-dissolves at least one element or compound of Ta, N (nitrogen), B (boron), nitride of Ta, and boride of Ta, and the lattice expands. A material having a microstructure in which α-Fe microcrystals and Ta nitride fine particles or Ta boride fine particles are mixed, and the average particle size of the α-Fe microcrystals is 100 ° or less, and Ta nitride fine particles or Ta Has a film structure in which the average particle size of the boride fine particles is 50 ° or less.

【0011】[0011]

【作用】本発明の構成による磁気ヘッドは、無磁界中の
熱処理において高い飽和磁束密度と低磁歪の等方的な高
透磁率特性を示す軟磁性膜を使用しているので、高保磁
力媒体に対し、優れた記録特性を示し、高周波での摺動
ノイズが小さく、高周波帯域で高い再生効率を実現する
ことが出来る。
The magnetic head according to the present invention uses a soft magnetic film exhibiting a high saturation magnetic flux density and a low magnetostriction and isotropic high magnetic permeability in a heat treatment in the absence of a magnetic field. On the other hand, it exhibits excellent recording characteristics, has low sliding noise at high frequencies, and can achieve high reproduction efficiency in a high frequency band.

【0012】特に、前記Fe-Ta-N系、またはFe-
Ta-B-N系軟磁性膜が、上記膜構造のときに優れた磁
気ヘッド特性が得られる。
In particular, the Fe—Ta—N system or the Fe—Ta—N
When the Ta-BN soft magnetic film has the above film structure, excellent magnetic head characteristics can be obtained.

【0013】また、簡便な無磁界中の熱処理で磁気ヘッ
ドの製造が可能であるため、磁界中熱処理炉のような煩
雑な装置が不要となり、磁気ヘッドの大量生産が可能に
なる。 また、前記Fe-Ta-B-N系軟磁性膜は、F
e-Ta-N系軟磁性膜に比べて、更に高い熱処理温度
で、高飽和磁束密度と低磁歪の良好な軟磁性を実現する
ことが出来、磁気ヘッドを形成する際に高温でガラス接
合が可能となり、ガラスの選択範囲が広がり、接合強度
が充分で、かつ耐摩耗特性に優れた高温熱処理を必要と
するガラスを用いることが出来、磁気ヘッドの信頼性を
高めることが出来る。
Further, since the magnetic head can be manufactured by a simple heat treatment without a magnetic field, a complicated apparatus such as a magnetic field heat treatment furnace is not required, and mass production of the magnetic head becomes possible. Further, the Fe-Ta-BN soft magnetic film is made of F
Compared to the e-Ta-N based soft magnetic film, it is possible to realize good soft magnetism with high saturation magnetic flux density and low magnetostriction at higher heat treatment temperature, and to form glass head at high temperature when forming a magnetic head. This makes it possible to use glass requiring a high-temperature heat treatment, which has a wide selection range of glass, has sufficient bonding strength, and is excellent in abrasion resistance, and can improve the reliability of the magnetic head.

【0014】[0014]

【実施例】【Example】

(実施例1)ターゲットと基板が平行に対向した方式の
スパッタ法であるRF2極スパッタ法により、Fe-T
aの合金ターゲットを用い、Arガス中にN2ガスを導
入し、熱膨張係数115×10-7/゜Cの水冷した非磁
性セラミックス基板上に、Fe-Ta-N系軟磁性膜を膜
厚0.2〜15μmの範囲で形成し、真空中、無磁界中
で550゜Cの温度で1時間の熱処理を行った。これら
の膜の保磁力Hcと各周波数における複素透磁率の実数
部μ'を測定した。その結果、これらの膜の保磁力Hcと
透磁率μ'は、すべて膜面内で等方的であった。作製し
たFe-Ta-N膜の組成は、RBS(ラザフォード後方
散乱)分析の結果、Fe76.5原子%、Ta10.5原
子%、N13原子%であった(以下Fe76.5原子
%、Ta10.5原子%、N13原子%は、Fe76.5
10.513のように記す)。また、これらの膜の飽和磁
束密度は約1.6Tであり、飽和磁歪は絶対値で1×1
-6以下であった。
(Example 1) Fe-T was formed by RF bipolar sputtering, which is a sputtering method in which a target and a substrate faced in parallel.
A Fe—Ta—N-based soft magnetic film is formed on a water-cooled nonmagnetic ceramics substrate having a thermal expansion coefficient of 115 × 10 −7 / ° C. by introducing N 2 gas into Ar gas using the alloy target a. The film was formed in a thickness of 0.2 to 15 μm, and was subjected to a heat treatment at a temperature of 550 ° C. for 1 hour in a vacuum and without a magnetic field. The coercive force Hc of these films and the real part μ ′ of the complex magnetic permeability at each frequency were measured. As a result, the coercive force Hc and the magnetic permeability μ ′ of these films were all isotropic in the film plane. As a result of RBS (Rutherford backscattering) analysis, the composition of the produced Fe-Ta-N film was Fe 76.5 atomic%, Ta 10.5 atomic%, and N 13 atomic% (hereinafter, Fe 76.5 atomic%, Ta 10. 5 atomic% and N 13 atomic% are Fe 76.5 T
a 10.5 N 13 ). The saturation magnetic flux density of these films is about 1.6 T, and the saturation magnetostriction is 1 × 1 in absolute value.
It was 0 -6.

【0015】(図3)に膜厚に対する保磁力Hcの関係
を示す。(図3)より、膜厚1.5μm以上の膜は、8
A/m以下の低い保磁力を示し、優れた軟磁気特性を有
することが分かる。そして、膜厚1.5μm付近を境と
して低膜厚側でHcは急激に増加している。(図4)に
膜厚に対する透磁率μ'の関係を示す。1MHzにおける
μ'は、膜厚1.5〜3μm付近で極大値を示し、膜厚
1.5μm付近を境として低膜厚側で急激に減少し、高
膜厚側で緩やかに減少する傾向を示す。そして、周波数
の増加と共に、膜厚1.5μm以上の高膜厚側でのμ'の
低下が大きくなる傾向を示す。膜厚が1μm未満になる
と、1MHz以上の高周波帯域におけるμ'が1000以
下の低い値を示し、また、膜厚が10μm以上になる
と、5MHz以上の高周波帯域におけるμ'が1000以
下の低い値を示し、ビデオテープレコーダー等に用いる
磁気ヘッドコア材料としては不適である。従って、ビデ
オテープレコーダー等に用いる積層型ヘッドのコア材料
としての各層の軟磁性膜の膜厚が、1〜10μmである
ときに優れたヘッド出力が得られる。
FIG. 3 shows the relationship between the coercive force Hc and the film thickness. According to FIG. 3, a film having a thickness of 1.5 μm or more has a thickness of 8 μm.
It shows that it has a low coercive force of A / m or less and has excellent soft magnetic properties. Then, Hc sharply increases on the lower film thickness side around the film thickness of about 1.5 μm. FIG. 4 shows the relationship between the magnetic permeability μ ′ and the film thickness. Μ ′ at 1 MHz shows a maximum value near the film thickness of 1.5 to 3 μm, rapidly decreases at the low film thickness side near the film thickness of 1.5 μm, and gradually decreases at the high film thickness side. Show. Then, as the frequency increases, the decrease in μ ′ on the high film thickness side of 1.5 μm or more tends to increase. When the film thickness is less than 1 μm, μ ′ in a high frequency band of 1 MHz or more shows a low value of 1000 or less, and when the film thickness is 10 μm or more, μ ′ in a high frequency band of 5 MHz or more has a low value of 1000 or less. However, it is not suitable as a magnetic head core material used for a video tape recorder or the like. Therefore, when the thickness of the soft magnetic film of each layer as the core material of the laminated type head used in a video tape recorder or the like is 1 to 10 μm, an excellent head output can be obtained.

【0016】なお、本実施例では、Fe76.5原子
%、Ta10.5原子%、N13原子%の組成を有する
Fe-Ta-N系軟磁性膜について説明したが、Feを主
成分とし、Nを5〜17原子%含むと共にTaを7〜1
5原子%含む組成を有するFe-Ta-N系軟磁性膜に於
いても、同様の効果を有した。Nが5原子%以下、Ta
が7原子%以下、Feが88原子%以上の組成範囲で
は、いずれの膜厚においても良好な軟磁気特性は得られ
なかった。また、Nが17原子%以上、Taが15原子
%以上、Feが68原子%以下の組成範囲では、膜中F
e含有量の低下により、飽和磁束密度が1T以下に減少
した。
In this embodiment, the Fe—Ta—N soft magnetic film having a composition of 76.5 atomic% of Fe, 10.5 atomic% of Ta, and 13 atomic% of N has been described. 5 to 17 atomic% and Ta is 7-1.
The same effect was obtained in the Fe-Ta-N-based soft magnetic film having a composition containing 5 atomic%. N is 5 atomic% or less, Ta
In a composition range of 7 atomic% or less and Fe of 88 atomic% or more, good soft magnetic characteristics could not be obtained at any film thickness. Further, in a composition range in which N is 17 atomic% or more, Ta is 15 atomic% or more, and Fe is 68 atomic% or less, F
Due to the decrease in the e content, the saturation magnetic flux density was reduced to 1T or less.

【0017】(実施例2) (実施例1)と同様のRF2極スパッタ法により、Fe
-Ta、及びFe-Ta-Bの合金ターゲットを用い、A
rガス中にN2ガスを導入し、膜中B含有量の異なる
(膜中Ta及びN含有量は、ほぼ一定)膜組成を有する
軟磁性膜(膜厚2μm)を熱膨張係数115×10-7
゜Cの水冷した非磁性セラミックス基板上に形成し、膜
中B含有量の効果を検討した。作製した膜は、すべて、
真空中、無磁界中で300〜700゜Cの温度範囲で1
時間の熱処理を行った。作製した膜の組成は、組成分析
の結果、Fe77Ta1112、Fe78.5Ta111.59
Fe76Ta1059、及びFe68Ta111110であっ
た。
(Embodiment 2) By the same RF bipolar sputtering method as in (Embodiment 1), Fe
Using an alloy target of -Ta and Fe-Ta-B, A
An N 2 gas was introduced into the r gas, and a soft magnetic film (thickness: 2 μm) having a film composition with a different B content (Ta and N contents in the film was almost constant) was thermally expanded to 115 × 10 5 -7 /
The film was formed on a water-cooled nonmagnetic ceramic substrate of ゜ C, and the effect of the B content in the film was examined. All the fabricated films are
1 in a temperature range of 300 to 700 ° C in a vacuum and no magnetic field
Time heat treatment was performed. As a result of the composition analysis, the composition of the formed film was determined to be Fe 77 Ta 11 N 12 , Fe 78.5 Ta 11 B 1.5 N 9 ,
Fe 76 Ta 10 B 5 N 9 and Fe 68 Ta 11 B 11 N 10 .

【0018】これらの軟磁性膜の保磁力Hcの熱処理温
度依存性を(図5)に示す。(図5)より、膜中B含有
量0原子%のFe-Ta-N系軟磁性膜では、約550゜
C以上の熱処理温度で軟磁気特性は劣化するが、Bを含
有するFe-Ta-B-N系軟磁性膜は、更に高温の熱処
理温度に於いても、低い保磁力Hc(優れた軟磁気特
性)を示していることが分かる。そして、膜中B含有量
の増加と共に、高温の熱処理温度まで、低い保磁力Hc
を示し、B含有量5原子%の膜では、700゜Cの熱処
理温度に於いても良好な軟磁性を示している。これらの
Fe-Ta-B-N系軟磁性膜は、良好な軟磁性を示す高
温熱処理で高い飽和磁束密度(1.2〜1.6T)と低磁
歪(絶対値で1×10-6以下)を有していた。
FIG. 5 shows the heat treatment temperature dependence of the coercive force Hc of these soft magnetic films. From FIG. 5, in the Fe—Ta—N based soft magnetic film having a B content of 0 atomic%, the soft magnetic characteristics are deteriorated at a heat treatment temperature of about 550 ° C. or more, but the Fe—Ta containing B is It can be seen that the -BN-based soft magnetic film shows a low coercive force Hc (excellent soft magnetic properties) even at a higher heat treatment temperature. Then, as the B content in the film increases, the coercive force Hc decreases until the heat treatment temperature reaches a high temperature.
The film having a B content of 5 atomic% shows good soft magnetism even at a heat treatment temperature of 700 ° C. These Fe-Ta-BN soft magnetic films have high saturation magnetic flux density (1.2 to 1.6 T) and low magnetostriction (1 × 10 -6 or less in absolute value) by high-temperature heat treatment showing good soft magnetism. ).

【0019】従って、Fe-Ta-B-N系軟磁性膜は、
Fe-Ta-N系軟磁性膜よりも高温の熱処理温度で磁気
ヘッドコア材料として、使用することが出来る。
Accordingly, the Fe—Ta—BN soft magnetic film is
It can be used as a magnetic head core material at a heat treatment temperature higher than that of the Fe-Ta-N-based soft magnetic film.

【0020】なお、Feを主成分とし、Nを6〜15原
子%、Taを7〜15原子%含むと共にBを0.5〜1
3原子%含む組成を有するFe-Ta-B-N系軟磁性膜
に於いては、同様の効果を有した。Nが6原子%以下、
Taが7原子%以下、Bが0.5原子%以下、Feが8
6.5原子%以上の組成範囲では、良好な軟磁気特性は
得られなかった。また、Nが15原子%以上、Taが1
5原子%以上、Bが13原子%以上、Feが57原子%
以下の組成範囲では、膜中Fe含有量の低下により、飽
和磁束密度が1T以下に減少した。
It should be noted that Fe is a main component, N is 6 to 15 atomic%, Ta is 7 to 15 atomic%, and B is 0.5 to 1 atomic%.
The same effect was obtained in the Fe-Ta-BN soft magnetic film having a composition containing 3 atomic%. N is 6 atomic% or less,
Ta is 7 at% or less, B is 0.5 at% or less, Fe is 8 at%.
In the composition range of 6.5 atomic% or more, good soft magnetic characteristics could not be obtained. Further, N is 15 atomic% or more, and Ta is 1
5 atomic% or more, B 13 atomic% or more, Fe 57 atomic%
In the following composition range, the saturation magnetic flux density was reduced to 1 T or less due to a decrease in the Fe content in the film.

【0021】また、前記Fe-Ta-N系、及びFe-T
a-B-N系軟磁性膜に添加物元素としてCr元素を0.
1〜2原子%添加したコア材料は、更に優れた耐食性を
併せ持つことが出来た。
In addition, the above-mentioned Fe—Ta—N system and Fe—T
The Cr element as an additive element is added to the a-B-N-based soft magnetic film in an amount of 0.1%.
The core material to which 1 to 2 atomic% was added was able to have more excellent corrosion resistance.

【0022】(実施例3) (実施例1)と同様のRF2極スパッタ法により、熱膨
張係数115×10-7/゜Cの水冷した非磁性セラミッ
クス基板上に、Fe-Ta-N系軟磁性膜を膜厚0.2〜
15μmの範囲で形成し、真空中、無磁界中で550゜
Cの温度で1時間の熱処理を行った。熱膨張係数115
×10-7/゜Cの水冷した非磁性セラミックス基板上
に、(実施例1)で説明したFe76.5原子%、Ta
10.5原子%、N13原子%の組成を有するFe-Ta
-N系軟磁性膜(膜厚3μm)と、SiO2絶縁膜(膜厚
0.2μm)とを交互に積層したコア材料を作製し、無
磁界中の磁気ヘッド加工熱処理工程により、(図6)に
示した積層型ヘッドを作製した。作製した磁気ヘッドの
トラック幅は11μm、ギャップ長0.23μm、ギャ
ップ深さ22μm、コイル巻数は20ターンとした。ヘ
ッド出力の測定は、エンドレス・ヘッドテスター、及び
ドラムテスターを用い、保磁力119400A/mのM
Pテープを使用して、相対速度7m/sおよび21m/
sでの自己録再特性を測定した。(図1)に相対速度7
m/sとした場合、(図2)に相対速度21m/sとし
た場合の各周波数での最適記録電流で記録したときのト
ラック幅、及び巻数で規格化したヘッド出力の周波数特
性を示す。比較として、軟磁性膜としてCo-Nb-Ta
-Zr非晶質膜を用いて、同一形状で作製した積層型ヘ
ッドの規格化したヘッド出力の周波数特性も(図1)及
び(図2)に示した。(図1)及び(図2)より、Fe
-Ta-N系軟磁性膜と、SiO2絶縁膜とを交互に積層
したコア材料を用いた積層型ヘッドは、Co-Nb-Ta
-Zr非晶質膜と、SiO2絶縁膜とを交互に積層したコ
ア材料を用いた積層型ヘッドに比べて、長波長では高い
出力特性を示し、短波長では同等の良好な特性を示して
いる。本実施例では、現在市販されている保磁力119
400A/mのMPテープを使用した場合の自己録再特
性を示したが、本発明の磁気ヘッドは、更に高い保磁力
を有する媒体に対して、更に優れた自己録再特性を示
し、高密度記録を達成することが出来る。
(Embodiment 3) An Fe-Ta-N-based soft magnetic material was deposited on a water-cooled non-magnetic ceramic substrate having a thermal expansion coefficient of 115 × 10 -7 / ° C by the same RF bipolar sputtering method as in (Embodiment 1). When the magnetic film is
A heat treatment was performed at a temperature of 550 ° C. for 1 hour in a vacuum and without a magnetic field. Thermal expansion coefficient 115
On a water-cooled nonmagnetic ceramic substrate of × 10 -7 / ° C, 76.5 atomic% of Fe and Ta described in (Example 1)
Fe-Ta having a composition of 10.5 atomic% and N 13 atomic%
-N based soft magnetic film (thickness 3 μm) and SiO 2 insulating film (thickness 0.2 μm) were alternately laminated to produce a core material. ) Was manufactured. The track width of the manufactured magnetic head was 11 μm, the gap length was 0.23 μm, the gap depth was 22 μm, and the number of coil turns was 20 turns. The head output was measured using an endless head tester and a drum tester.
Using P tape, relative speeds of 7 m / s and 21 m / s
s was measured. (Fig. 1) with relative speed 7
FIG. 2 shows the frequency characteristics of the head output normalized by the track width and the number of windings when recording with the optimum recording current at each frequency when the relative speed is 21 m / s when the speed is m / s (FIG. 2). For comparison, Co-Nb-Ta was used as the soft magnetic film.
The frequency characteristics of the standardized head output of the laminated head manufactured in the same shape using the -Zr amorphous film are also shown in FIG. 1 and FIG. From FIG. 1 and FIG.
-Ta-N system and a soft magnetic film, laminated head using the core material of alternately laminated SiO 2 insulating film, Co-Nb-Ta
Compared with a stacked head using a core material in which a -Zr amorphous film and an SiO 2 insulating film are alternately stacked, a high output characteristic is exhibited at a long wavelength, and the same good characteristic is exhibited at a short wavelength. I have. In the present embodiment, the coercive force 119 currently on the market is used.
Although the self-recording / reproducing characteristics when using an MP tape of 400 A / m were shown, the magnetic head of the present invention showed more excellent self-recording / reproducing characteristics for a medium having a higher coercive force, A record can be achieved.

【0023】なお、本実施例に於いては、膜厚3μmの
Fe-Ta-N系軟磁性膜と、膜厚0.2μmのSiO2
縁膜とを交互に積層したコア材料で、磁気回路を形成し
た積層型磁気ヘッドについて説明したが、前記コア材料
の各層のFe-Ta-N系軟磁性膜の膜厚が1〜10μ
m、各層の絶縁膜の膜厚が0.05〜0.5μmであると
きに同様の効果を有した。
In this embodiment, the magnetic circuit is made of a core material in which an Fe—Ta—N based soft magnetic film having a thickness of 3 μm and a SiO 2 insulating film having a thickness of 0.2 μm are alternately laminated. Has been described, the thickness of the Fe—Ta—N based soft magnetic film of each layer of the core material is 1 to 10 μm.
m, the same effect was obtained when the thickness of the insulating film of each layer was 0.05 to 0.5 μm.

【0024】なお、本実施例では、Fe76.5原子
%、Ta10.5原子%、N13原子%の組成を有する
Fe-Ta-N系軟磁性膜について説明したが、Feを主
成分とし、Nを5〜17原子%含むと共にTaを7〜1
5原子%含む組成を有するFe-Ta-N系軟磁性膜に於
いても、同様の効果を有した。
In the present embodiment, the Fe—Ta—N soft magnetic film having the composition of 76.5 atomic% of Fe, 10.5 atomic% of Ta, and 13 atomic% of N has been described. 5 to 17 atomic% and Ta is 7-1.
The same effect was obtained in the Fe-Ta-N-based soft magnetic film having a composition containing 5 atomic%.

【0025】また、Feを主成分とし、Nを6〜15原
子%、Taを7〜15原子%含むと共にBを0.5〜1
3原子%含む組成を有するFe-Ta-B-N系軟磁性膜
に於いては、同様の効果を有すると共に、Fe-Ta-N
系軟磁性膜に比べて、更に高い熱処理温度で、高飽和磁
束密度と低磁歪の良好な軟磁性を実現することが出来、
磁気ヘッドを形成する際に高温でガラス接合が可能とな
り、ガラスの選択範囲が広がり、接合強度が充分で、か
つ耐摩耗特性に優れた高温熱処理を必要とするガラスを
用いることが出来、磁気ヘッドの信頼性を高めることが
出来た。
Further, Fe is a main component, N is 6 to 15 atomic%, Ta is 7 to 15 atomic%, and B is 0.5 to 1 atomic%.
The Fe-Ta-BN soft magnetic film having a composition containing 3 atomic% has the same effect and has the same effect as Fe-Ta-N.
Compared with the system soft magnetic film, it is possible to realize good soft magnetism with high saturation magnetic flux density and low magnetostriction at higher heat treatment temperature,
When forming a magnetic head, glass bonding can be performed at high temperature, the selection range of glass can be expanded, bonding strength is sufficient, and glass requiring high temperature heat treatment with excellent wear resistance can be used. Was able to increase the reliability.

【0026】[0026]

【0027】なお、本実施例に於けるコア材料は、RF
2極スパッタ法により作製したが、本発明のコア材料の
作製方法は、RF2極スパッタ法に限るものではなく、
直流または高周波による二極、三極、マグネトロン方
式、及びバイアススパッタ法等のターゲットと基板が平
行に対向した方式のスパッタ法においては、同様の効果
を有した。しかしながら、ターゲットと基板が平行に配
置されない方式の対向ターゲット式スパッタ法、あるい
はイオンビームスパッタ法等では、ターゲットから斜め
入射で飛来する原子が基板に付着するため、作製した膜
の透磁率特性に異方性が生じた。その結果、これらの方
法で成膜したコア材料を用いて作製した前記積層型磁気
ヘッドは、良好な出力特性が得られなかった。
The core material in this embodiment is RF
Although it was produced by the bipolar sputtering method, the method of producing the core material of the present invention is not limited to the RF bipolar sputtering method.
The same effect was obtained in a sputtering method in which a target and a substrate faced in parallel, such as a two-pole, three-pole, magnetron method, and a bias sputtering method using direct current or high frequency. However, in the facing target sputtering method or the ion beam sputtering method in which the target and the substrate are not arranged in parallel, atoms flying obliquely from the target adhere to the substrate, so that the magnetic permeability characteristics of the formed film are different. Anisotropy occurred. As a result, the laminated magnetic head manufactured using the core material formed by these methods could not obtain good output characteristics.

【0028】[0028]

【発明の効果】本発明によれば、特定の組成範囲、特定
の膜構造、及び特定の膜厚を有するFe-Ta-N系、ま
たはFe-Ta-B-N系軟磁性膜と絶縁膜とを交互に積
層したコア材料を、ターゲットと基板が平行に対向した
方式のスパッタ法により作製して、磁気回路を形成した
磁気ヘッドであって、かつ、その製造加工工程における
熱処理を無磁界中で行ったものであるから、高保磁力媒
体に対して優れた記録特性を示し、高周波での摺動ノイ
ズが小さく、高周波帯域で高い再生効率を実現すること
が出来る。また、簡便な無磁界中の熱処理で磁気ヘッド
の製造が可能であるため、磁界中熱処理炉のような煩雑
な装置が不要となり、磁気ヘッドの大量生産が可能にな
る。また、Fe-Ta-B-N系軟磁性膜と絶縁膜とが交
互に積層したコア材料で磁気回路を形成した磁気ヘッド
は、Fe-Ta-N系軟磁性膜をコア材料に用いた場合に
比べて、更に高い熱処理温度で、ガラス接合が可能とな
り、ガラス強度が充分で、かつ耐摩耗特性に優れた高温
熱処理を必要とするガラスを用いることが出来、磁気ヘ
ッドの信頼性を高めることが出来る。
According to the present invention, an Fe--Ta--N or Fe--Ta--BN soft magnetic film having a specific composition range, a specific film structure, and a specific film thickness, and an insulating film A magnetic head is formed by forming a magnetic circuit by sputtering a core material in which a target and a substrate are opposed to each other in parallel, and the heat treatment in the manufacturing process is performed in the absence of a magnetic field. Therefore, the recording medium exhibits excellent recording characteristics with respect to a high coercive force medium, has low sliding noise at high frequencies, and can achieve high reproduction efficiency in a high frequency band. Further, since the magnetic head can be manufactured by a simple heat treatment in a magnetic field-free state, a complicated apparatus such as a magnetic field heat treatment furnace is not required, and mass production of the magnetic head becomes possible. In addition, a magnetic head in which a magnetic circuit is formed of a core material in which an Fe-Ta-BN soft magnetic film and an insulating film are alternately laminated has a structure in which an Fe-Ta-N soft magnetic film is used as a core material. Glass can be bonded at a higher heat treatment temperature than that required, and glass that has sufficient glass strength and requires high-temperature heat treatment with excellent wear resistance can be used to increase the reliability of the magnetic head. Can be done.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例で作製した磁気ヘッドの相対速
度7m/sに於ける、周波数に対するヘッド出力の関係
を示す図である。
FIG. 1 is a diagram showing the relationship between head output and frequency at a relative speed of 7 m / s of a magnetic head manufactured in an example of the present invention.

【図2】本発明の実施例で作製した磁気ヘッドの相対速
度21m/sに於ける、周波数に対するヘッド出力の関
係を示す図である。
FIG. 2 is a diagram showing the relationship between head output and frequency at a relative speed of 21 m / s of a magnetic head manufactured in an example of the present invention.

【図3】本発明の実施例で作製した軟磁性膜の膜厚と保
磁力Hcとの関係を示す図である。
FIG. 3 is a diagram showing the relationship between the thickness of a soft magnetic film and the coercive force Hc manufactured in an example of the present invention.

【図4】軟磁性膜の膜厚と複素透磁率の実数部μ'との
関係を示す図である。
FIG. 4 is a diagram showing the relationship between the thickness of a soft magnetic film and the real part μ ′ of complex magnetic permeability.

【図5】軟磁性膜の保磁力Hcと熱処理温度との関係を
示す図である。
FIG. 5 is a diagram showing a relationship between a coercive force Hc of a soft magnetic film and a heat treatment temperature.

【図6】従来提供されている積層型ヘッドの概略図であ
る。
FIG. 6 is a schematic view of a conventionally provided laminated head.

【図7】従来提供されているMIGヘッドの概略図であ
る。
FIG. 7 is a schematic view of a conventionally provided MIG head.

【符号の説明】[Explanation of symbols]

1、7 軟磁性膜 2 絶縁膜 3 非磁性基板 4 非磁性体(ガラス) 5 フェライト 6 磁気ギャップ 8 非磁性体(ガラス) 1, 7 Soft magnetic film 2 Insulating film 3 Non-magnetic substrate 4 Non-magnetic material (glass) 5 Ferrite 6 Magnetic gap 8 Non-magnetic material (glass)

フロントページの続き (72)発明者 高橋 健 大阪府門真市大字門真1006番地 松下電 器産業株式会社内 (72)発明者 沢井 瑛昌 大阪府門真市大字門真1006番地 松下電 器産業株式会社内 (56)参考文献 特開 平2−290004(JP,A) 特開 平2−275605(JP,A) 特開 昭63−254708(JP,A) (58)調査した分野(Int.Cl.6,DB名) G11B 5/127 G11B 5/147Continuing on the front page (72) Inventor Ken Takahashi 1006 Kadoma, Kadoma, Osaka Prefecture Inside Matsushita Electric Industrial Co., Ltd. 56) References JP-A-2-290004 (JP, A) JP-A-2-275605 (JP, A) JP-A-63-254708 (JP, A) (58) Fields investigated (Int. Cl. 6 , (DB name) G11B 5/127 G11B 5/147

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 Fe−Ta−N系軟磁性膜と絶縁膜とを
交互に積層したコア材料で磁気回路が形成され、前記軟
磁性膜がFeを主成分とし、Nを5〜17原子%含むと
共にTaを7〜15原子%含む組成を有する磁気ヘッド
において、 前記コア材料の各層の軟磁性膜の膜厚が1〜10μm、
各層の絶縁膜の膜厚が0.05〜0.5μmであり、か
つターゲットと基板が平行に対向した方式のスパッタ法
により、前記軟磁性膜を基板表面上に作製し、磁気ヘッ
ド加工工程に於ける熱処理を無磁界中で行うことを特徴
とする磁気ヘッドの製造方法。
1. An Fe—Ta—N-based soft magnetic film and an insulating film
A magnetic circuit is formed by alternately laminated core materials, and
When the magnetic film is mainly composed of Fe and contains 5 to 17 atomic% of N,
Magnetic heads both having a composition containing 7 to 15 atomic% of Ta
In the above , the thickness of the soft magnetic film of each layer of the core material is 1 to 10 μm,
The thickness of the insulating film of each layer is 0.05 to 0.5 μm;
Sputtering method with two targets and substrate facing in parallel
The soft magnetic film is formed on the substrate surface by
The feature is that the heat treatment in the doping process is performed in the absence of magnetic field
A method of manufacturing a magnetic head.
【請求項2】 Fe−Ta−B−N系軟磁性膜と絶縁膜
とを交互に積層したコア材料で磁気回路が形成され、前
記軟磁性膜がFeを主成分とし、Nを6〜15原子%、
Taを7〜15原子%含むと共にBを0.5〜13原子
%含む組成を有する磁気ヘッドにおいて、 前記コア材料の各層の軟磁性膜の膜厚が1〜10μm、
各層の絶縁膜の膜厚が0.05〜0.5μmであり、か
つターゲットと基板が平行に対向した方式のスパッタ法
により、前記軟磁性膜を基板表面上に作製し、磁気ヘッ
ド加工工程に於ける熱処理を無磁界中で行うことを特徴
とする磁気ヘッドの製造方法。
2. An Fe-Ta-BN soft magnetic film and an insulating film
A magnetic circuit is formed of a core material in which
The soft magnetic film has Fe as a main component, N at 6 to 15 atomic%,
Containing 7 to 15 atom% of Ta and 0.5 to 13 atom of B
% , The soft magnetic film of each layer of the core material has a thickness of 1 to 10 μm,
The thickness of the insulating film of each layer is 0.05 to 0.5 μm;
Sputtering method with two targets and substrate facing in parallel
The soft magnetic film is formed on the substrate surface by
The feature is that the heat treatment in the doping process is performed in the absence of magnetic field
A method of manufacturing a magnetic head.
JP3202859A 1991-03-06 1991-08-13 Manufacturing method of magnetic head Expired - Fee Related JP2782994B2 (en)

Priority Applications (3)

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JP3202859A JP2782994B2 (en) 1991-08-13 1991-08-13 Manufacturing method of magnetic head
DE1992614179 DE69214179T2 (en) 1991-03-06 1992-03-05 Magnetic button
EP92103794A EP0502535B1 (en) 1991-03-06 1992-03-05 Magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3202859A JP2782994B2 (en) 1991-08-13 1991-08-13 Manufacturing method of magnetic head

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JPH0546911A JPH0546911A (en) 1993-02-26
JP2782994B2 true JP2782994B2 (en) 1998-08-06

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ID=16464380

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Country Link
JP (1) JP2782994B2 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2790451B2 (en) * 1987-04-10 1998-08-27 松下電器産業株式会社 Soft magnetic alloy film containing nitrogen
JPH0744108B2 (en) * 1989-01-26 1995-05-15 富士写真フイルム株式会社 Soft magnetic thin film
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Also Published As

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