JP2759533B2 - Manufacturing method of liquid crystal element - Google Patents
Manufacturing method of liquid crystal elementInfo
- Publication number
- JP2759533B2 JP2759533B2 JP1325866A JP32586689A JP2759533B2 JP 2759533 B2 JP2759533 B2 JP 2759533B2 JP 1325866 A JP1325866 A JP 1325866A JP 32586689 A JP32586689 A JP 32586689A JP 2759533 B2 JP2759533 B2 JP 2759533B2
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- Prior art keywords
- cleaning
- liquid crystal
- substrates
- substrate
- manufacturing
- Prior art date
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Description
【発明の詳細な説明】 ［産業上の利用分野］ 本発明は画像等の表示に用いられる液晶素子の製造方
法に関し、詳しくは基板のラビング処理工程後に行なわ
れる洗浄処理を低級アルコール系溶剤たはその特定濃度
の水溶液を洗浄液として使用してかつ２段階に分けて行
なうことによって、液晶、特に強誘電性液晶の配向状態
の均一性を向上せしめた、液晶素子の製造方法に関す
る。Description: FIELD OF THE INVENTION The present invention relates to a method for manufacturing a liquid crystal element used for displaying an image or the like, and more particularly, to a cleaning treatment performed after a rubbing treatment step on a substrate by using a lower alcohol-based solvent. The present invention relates to a method for manufacturing a liquid crystal element in which the uniformity of the alignment state of a liquid crystal, in particular, a ferroelectric liquid crystal is improved by using an aqueous solution having a specific concentration as a cleaning liquid and performing it in two steps.
［従来技術］ 一般に、液晶素子のセルの組立は以下のような一連の
工程で行なわれる。すなわち、先ず一対のガラス基板上
に表示電極を形成した後、上下電極間のショートを防止
するための透明絶縁層、続いて液晶分子の配向を規制す
るための配向膜を上記基板の少なくとも一方にコーティ
ングし、さらにその配向膜にラビング処理を施す。その
後、一方の基板にシール材を印刷法等で塗布し、２枚の
基板を組立接着してセルを作製する。[Prior Art] Generally, a cell of a liquid crystal element is assembled in a series of steps as follows. That is, first, after a display electrode is formed on a pair of glass substrates, a transparent insulating layer for preventing a short circuit between the upper and lower electrodes, and subsequently, an alignment film for regulating alignment of liquid crystal molecules is provided on at least one of the substrates. After coating, the rubbing treatment is performed on the alignment film. Thereafter, a sealing material is applied to one of the substrates by a printing method or the like, and the two substrates are assembled and bonded to form a cell.
そして、上記のセル組立工程においては、配向膜のラ
ビング処理時、すなわち回転体に装着した布等で配向膜
をこする処理の際に基板に少なからず異物が付着するの
で、そのままの状態で基板を組立接着すると所望の基板
間隔（以下、セル・ギャップという）が均一に達成され
ず、セル・ギャップ不良となってしまう。そこで従来
は、ラビング処理工程後に純水を洗浄液として使用して
基板を洗浄処理することによって付着した異物を除去
し、均一なセル・ギャップを得ていた。In the above cell assembling process, at the time of rubbing the alignment film, that is, at the time of rubbing the alignment film with a cloth or the like attached to a rotating body, a considerable amount of foreign matter adheres to the substrate. When the substrates are assembled and bonded, a desired substrate gap (hereinafter, referred to as a cell gap) cannot be achieved uniformly, resulting in a defective cell gap. Therefore, in the related art, after the rubbing process, the substrate is subjected to a cleaning process using pure water as a cleaning solution to remove the adhered foreign substances, thereby obtaining a uniform cell gap.
［発明が解決しようとする課題］ しかしながら、従来のように純水を用いて洗浄処理を
行なった場合、その洗浄処理がラビング効果に少なから
ず悪影響を与え、得られたセルに液晶を注入した後に液
晶の配向状態を観察すると、画質的に悪い表示エリア、
すなわち液晶配向の不均一な部分が発生する確率が高
く、生産歩留りの低下を招いていた。特に、強誘電性液
晶を用いた液晶素子にあっては上記の傾向が顕著で、洗
浄処理の際に水が流れた跡に沿って液晶の配向性が乱
れ、実用に耐える素子を得るのが困難であった。[Problems to be Solved by the Invention] However, when a cleaning process is performed using pure water as in the conventional case, the cleaning process has a considerable adverse effect on the rubbing effect, and after the liquid crystal is injected into the obtained cell. When observing the orientation of the liquid crystal, the display area is poor in image quality,
That is, there is a high probability that a portion where the liquid crystal alignment is non-uniform is high, resulting in a decrease in production yield. In particular, the above tendency is remarkable in a liquid crystal device using a ferroelectric liquid crystal, and the orientation of the liquid crystal is disturbed along the trace of water flowing during the cleaning process, and it is necessary to obtain a device that can withstand practical use. It was difficult.
本発明の目的は、上記従来技術の課題に鑑み、液晶素
子、特にセル・ギャップの極めて狭い強誘電性液晶素子
であってもその全面に亙って均一な配向状態が常時得ら
れ、その結果生産歩留りを著しく向上させることができ
る液晶素子の製造方法を提供することにある。An object of the present invention is to provide a liquid crystal device, particularly a ferroelectric liquid crystal device having an extremely narrow cell gap, in which a uniform alignment state is always obtained over the entire surface thereof. It is an object of the present invention to provide a method for manufacturing a liquid crystal element that can significantly improve the production yield.
［課題を解決するための手段］ 本発明者らは鋭意研究の結果、ラビング処理工程後に
基板を低級アルコール系溶剤またはその濃度10重量％以
上の水溶液で洗浄し、さらに続い低級アルコール系溶剤
またはその濃度50重量％以上の水溶液で再度洗浄するこ
とによって上記課題が解決されることを見出し、本発明
に到達した。[Means for Solving the Problems] As a result of intensive studies, the present inventors have washed the substrate with a lower alcohol-based solvent or an aqueous solution having a concentration of 10% by weight or more after the rubbing treatment step, and further followed by a lower alcohol-based solvent or its The inventors have found that the above-mentioned problems can be solved by washing again with an aqueous solution having a concentration of 50% by weight or more, and have reached the present invention.
すなわち、本発明の液晶素子の製造方法は、 イ）電極を形成し、且つ少なくとも一方に絶縁膜を形成
した一対の基板を用意する工程、 ロ）該一対の基板の少なくとも一方に配向膜を形成する
工程、 ハ）該配向膜にラビング処理を施す工程、 ニ）該ラビング処理された配向膜を有する基板を、低級
アルコール系溶剤の濃度10重量％以上の水溶液を洗浄液
として使用し、洗浄処理する工程（以下、第１洗浄処理
工程という）、 ホ）該ラビング処理された配向膜を有する基板を、低級
アルコール系溶剤または濃度50重量％以上の該溶剤の水
溶液を洗浄液として使用して再び洗浄処理する工程（以
下、第２洗浄処理工程という）、 ト）該一対の基板を対向配置して貼り合せる工程、およ
び チ）該一対の基板間に液晶を配置する工程、 を有する。That is, the method of manufacturing a liquid crystal element according to the present invention includes: a) a step of preparing a pair of substrates on which electrodes are formed and an insulating film formed on at least one of them; b) forming an alignment film on at least one of the pair of substrates. C) rubbing the alignment film; d) cleaning the substrate having the rubbed alignment film by using an aqueous solution of a lower alcohol solvent having a concentration of 10% by weight or more as a cleaning liquid. E) cleaning the substrate having the rubbed alignment film again using a lower alcohol solvent or an aqueous solution of the solvent having a concentration of 50% by weight or more as a cleaning liquid; (Hereinafter, referred to as a second cleaning treatment step), g) a step of arranging and bonding the pair of substrates facing each other, and h) a step of arranging liquid crystal between the pair of substrates.
本発明における第1,第２洗浄処理工程で使用される低
級アルコール系溶剤は、基板上の異物が良好に除去でき
かつラビング効果に影響がないものであればよく特に制
限されないが、好ましくは炭素数１〜５のアルコールで
あり、特に好ましくはイソプロピルアルコール、エチル
アルコールである。また、第1,第２洗浄処理工程各々で
使用する低級アルコール系溶剤は同一であっても異なっ
てもよい。上記溶剤を水溶液にして使用する場合、使用
する水は純水が好ましい。The lower alcohol solvent used in the first and second cleaning treatment steps in the present invention is not particularly limited as long as it can remove foreign substances on the substrate well and does not affect the rubbing effect. Alcohols of formulas 1 to 5, particularly preferably isopropyl alcohol and ethyl alcohol. Further, the lower alcohol solvent used in each of the first and second cleaning treatment steps may be the same or different. When the solvent is used as an aqueous solution, pure water is preferably used.
第1,第２洗浄処理工程で使用する洗浄液の低級アルコ
ール系溶剤濃度は各々上述の範囲内のものであればよい
が、第２洗浄処理工程で使用する洗浄液の低級アルコー
ル系溶剤濃度が50重量％以上でかつ第１洗浄処理工程の
ものと同等もしくはそれ以上であることが好ましい。The concentration of the lower alcohol-based solvent in the cleaning liquid used in the first and second cleaning treatment steps may be within the above range, but the concentration of the lower alcohol-based solvent in the cleaning liquid used in the second cleaning treatment step is 50 wt. %, And preferably equal to or more than that of the first cleaning treatment step.
また、第1,第２洗浄処理工程における洗浄手法として
は、洗浄効果が充分得られるようにそぞれ種々の方法が
適宜採用され、スプレー洗浄、超音波洗浄、ブラシ・ス
クラブ洗浄、ジェット・スプレー洗浄、遠心スプレー洗
浄、リンス洗浄のうちのいずれかまたはそれらを組合せ
た手法が好ましい。第1,第２洗浄処理工程各々の手法は
同一であっても異なってもよく、例えば第1,第２洗浄処
理をそれぞれ超音波洗浄，シャワーリンス洗浄あるいは
ジェット・スプレー洗浄，シャワーリンス洗浄で行なう
組合せが挙げられる。そして、各洗浄処理の際の洗浄時
間等の諸条件は、採用する洗浄手法に応じて基板上の異
物が充分に除去されるように適宜選択される。Various cleaning methods are appropriately employed in the first and second cleaning treatment steps so as to obtain a sufficient cleaning effect, such as spray cleaning, ultrasonic cleaning, brush scrub cleaning, and jet spraying. Washing, centrifugal spray washing, rinsing washing, or a combination thereof is preferred. The techniques of the first and second cleaning processes may be the same or different. For example, the first and second cleaning processes are respectively performed by ultrasonic cleaning, shower rinsing cleaning, jet spray cleaning, and shower rinsing cleaning. Combinations are included. Various conditions such as a cleaning time in each cleaning process are appropriately selected according to a cleaning method to be employed so that foreign substances on the substrate are sufficiently removed.
本発明の製造方法は、通常使用されるすべての液晶素
子を製造する方法として有効であり、特にカイラルスメ
クチックＣ相を有する強誘電性液晶を使用する液晶素子
を製造する場合に好適である。The manufacturing method of the present invention is effective as a method for manufacturing all commonly used liquid crystal elements, and is particularly suitable for manufacturing a liquid crystal element using a ferroelectric liquid crystal having a chiral smectic C phase.
［作用］ 本発明の製造方法においては、ラビング処理後の基板
の洗浄処理を、純水に代えて低級アルコール系溶剤また
はその水溶液を用いて行ない、しかもその処理を２段階
に分けてかつ各々特定濃度の溶液を洗浄液として使用し
て行なうようにしたた、配向膜のラビング効果が害され
ることなく基板上の異物は充分に除去される。そのた
め、その基板を用いて得られた液晶セル中に充填される
液晶は全面的に均一な配向状態となる。[Operation] In the manufacturing method of the present invention, the cleaning treatment of the substrate after the rubbing treatment is performed by using a lower alcohol solvent or an aqueous solution thereof instead of pure water, and the treatment is divided into two stages and each is specified. The foreign matter on the substrate is sufficiently removed without impairing the rubbing effect of the alignment film, which is performed by using a solution having a concentration as a cleaning solution. Therefore, the liquid crystal filled in the liquid crystal cell obtained using the substrate has a uniform alignment state over the entire surface.
［実施例］ 以下、図面を用いて本発明の実施例を詳細に説明す
る。[Example] Hereinafter, an example of the present invention will be described in detail with reference to the drawings.
実施例１〜３および比較例１〜３ 第１図は本発明の製造方法の一例を示すプロセスフロ
ー図である。Examples 1 to 3 and Comparative Examples 1 to 3 FIG. 1 is a process flow chart showing an example of the production method of the present invention.
第１図に示す一連の工程に従って実施例１〜３および
比較例１〜３の液晶素子を各々作製した。The liquid crystal devices of Examples 1 to 3 and Comparative Examples 1 to 3 were produced according to a series of steps shown in FIG.
すなわち、先ず、ITO電極がストライプ状にパターン
形成された一対のガラス基板の表面にSiO2をスパッタ法
によって1000Åの厚さで形成した（絶縁層コート工程：
ステップ１）。続いて、上記基板表面にポリイミド（商
品番号:SP−710、東レ（株）製）を印刷法によって塗布
した後、300℃で60分間焼成して厚さ500Åの配向層を形
成した（配向層コート工程：ステップ２）。次に、上下
基板でラビング方向が直線方向となるように、ポリエス
テル布を巻回装着した回転ドラムを用いて回転数:1000r
pm,処理速度:20mm/secの条件で上記配向層にラビング処
理を施した（ラビング工程：ステップ３）。That is, first, SiO 2 was formed to a thickness of 1000 ° by sputtering on the surfaces of a pair of glass substrates on which ITO electrodes were patterned in a stripe pattern (insulating layer coating step:
Step 1). Subsequently, polyimide (product number: SP-710, manufactured by Toray Industries, Inc.) was applied to the surface of the substrate by a printing method, and then baked at 300 ° C. for 60 minutes to form an alignment layer having a thickness of 500 mm (alignment layer). Coating process: Step 2). Next, using a rotating drum on which a polyester cloth is wound and mounted, so that the rubbing direction on the upper and lower substrates is linear, the number of rotations is 1000 r.
The alignment layer was subjected to a rubbing treatment under the conditions of pm, processing speed: 20 mm / sec (rubbing step: step 3).
その後、得られた基板を第１表に示す溶液中で超音波
洗浄（600W、28Hz、30秒間）した（第１洗浄工程：ステ
ップ４）。第１洗浄終了後、基板を上記溶液中から引上
げ、続いて基板全面に第１表に示す溶液を洗浄液として
用いてシャワーリンスした（第２洗浄工程：ステップ
５）。第２洗浄終了後、基板にN2ガスをブローし、さら
に80℃に15分間維持して基板を乾燥した。Thereafter, the obtained substrate was subjected to ultrasonic cleaning (600 W, 28 Hz, 30 seconds) in a solution shown in Table 1 (first cleaning step: step 4). After the completion of the first cleaning, the substrate was pulled up from the above solution, and then the entire surface of the substrate was rinsed with a solution shown in Table 1 as a cleaning liquid (second cleaning step: step 5). After the completion of the second cleaning, N 2 gas was blown into the substrate, and the substrate was dried at 80 ° C. for 15 minutes.
続いて、片方の基板表面にエポキシ接着剤（商品名：
ストラクト・ボンド、三井東圧（株）製）を印刷し（シ
ール印刷工程：ステップ６）、他方の基板表面には直径
1.5μｍのスペーサ（商品名：シリカ・マイクロビー
ス、触媒化成工業（株）製）を300ケ/mm2の密度で散在
した（スペーサ散布工程：ステップ７）。そして、両基
板を配向配置して組立接着し（貼合せ工程：ステップ
８）、150℃に２時間維持して接着剤を硬化して液晶パ
ネルを作製した（硬化工程：ステップ９）。最後に、得
られた各々の液晶パネル中にスメクチック液晶（商品番
号:CS−1014、チッソ（株）製）を注入し、続いて90℃
に30分間保持した後８時間かけて徐冷して液晶素子を作
製した（注入工程：ステップ10）。Next, an epoxy adhesive (trade name:
Struct Bond (manufactured by Mitsui Toatsu Co., Ltd.) is printed (seal printing process: step 6), and the diameter of the other substrate surface is
1.5 μm spacers (trade name: silica microbeads, manufactured by Catalyst Chemical Industry Co., Ltd.) were scattered at a density of 300 / mm 2 (spacer spraying step: step 7). Then, both substrates were aligned and assembled and bonded (laminating step: step 8), and maintained at 150 ° C. for 2 hours to cure the adhesive to produce a liquid crystal panel (curing step: step 9). Finally, a smectic liquid crystal (product number: CS-1014, manufactured by Chisso Corporation) was injected into each of the obtained liquid crystal panels.
After holding for 30 minutes, the mixture was gradually cooled for 8 hours to produce a liquid crystal element (injection step: Step 10).
上記で得られた各液晶素子中の液晶の配向状態を２枚
の偏光板間で観察した。観察結果を第１表に示し、その
液晶素子中の液晶の結晶構造（液晶分子の配向状態）を
写した写真を第２〜７図に示す。第２図は実施例１、第
３図は実施例２、第４図は実施例３、第５図は比較例
１、第６図は比較例２、第７図は比較例３でそれぞれ得
られた液晶素子中の液晶の結晶構造（液晶分子の配向状
態）の写真である。The alignment state of the liquid crystal in each liquid crystal element obtained above was observed between two polarizing plates. The observation results are shown in Table 1, and photographs showing the crystal structure of the liquid crystal in the liquid crystal element (the alignment state of the liquid crystal molecules) are shown in FIGS. 2 is Example 1, FIG. 3 is Example 2, FIG. 4 is Example 3, FIG. 5 is Comparative Example 1, FIG. 6 is Comparative Example 2, and FIG. 7 is Comparative Example 3. 3 is a photograph of a crystal structure of a liquid crystal in the obtained liquid crystal element (alignment state of liquid crystal molecules).
以上のように、本発明に係る実施例１〜３で得られた
液晶素子にあっては、充填された液晶は全面に亙って均
一かつ良好に配向した。それに対して、本発明の範囲外
である比較例１〜３で得らた液晶素子にあっては、液晶
の配向状態が不均一な箇所が部分的または全面的に発生
した。 As described above, in the liquid crystal devices obtained in Examples 1 to 3 according to the present invention, the filled liquid crystal was uniformly and well aligned over the entire surface. On the other hand, in the liquid crystal devices obtained in Comparative Examples 1 to 3, which are out of the range of the present invention, a portion where the alignment state of the liquid crystal was nonuniform occurred partially or entirely.
実施例４ 超音波洗浄に代わってジェット・スプレー洗浄（3Kg/
cm2、30秒間）を行った以外は実施例１と同様にして液
晶素子を作製した。Example 4 Instead of ultrasonic cleaning, jet spray cleaning (3 kg /
(cm 2 , 30 seconds), and a liquid crystal element was produced in the same manner as in Example 1.
得られた液晶素子中の液晶の配向状態は、実施例１で
得られたものと同様に全面的に均一なモノドメインの配
向状態であった。The alignment state of the liquid crystal in the obtained liquid crystal element was a uniform monodomain alignment state over the entire surface, similarly to that obtained in Example 1.
実施例５ イソプロピルアルコール（IPA）の代わりに市販特級
エチルアルコールを用いた以外は実施例１と同様にして
液晶素子を作製した。Example 5 A liquid crystal device was produced in the same manner as in Example 1 except that a commercially available special grade ethyl alcohol was used instead of isopropyl alcohol (IPA).
得られた液晶素子中の液晶の配向状態は、実施例１で
得られたものと同様に全面的に均一なモノドメインの配
向状態であった。The alignment state of the liquid crystal in the obtained liquid crystal element was a uniform monodomain alignment state over the entire surface, similarly to that obtained in Example 1.
［発明の効果］ 以上説明したように、本発明の製造方法は通常使用さ
れるすべての液晶素子の製造方法として有効であり、本
発明の製造方法によると配向処理面に何ら悪影響を与え
ることなく全面的に均一な液晶配向状態が得られ、従来
より著しく生産歩留りが向上する。[Effects of the Invention] As described above, the manufacturing method of the present invention is effective as a method for manufacturing all commonly used liquid crystal elements, and according to the manufacturing method of the present invention, there is no adverse effect on the alignment-treated surface. A uniform liquid crystal alignment state is obtained over the entire surface, and the production yield is significantly improved as compared with the conventional case.
さらに、強誘電性液晶、特にカイラルスメクチックＣ
相を有する液晶を使用する液晶素子を本発明の製造方法
によって製造することによって、従来作製が困難であっ
た強誘電性液晶の配向が均一な液晶素子を効率良く生産
することが可能となる。Furthermore, ferroelectric liquid crystals, especially chiral smectic C
By manufacturing a liquid crystal element using a liquid crystal having a phase by the manufacturing method of the present invention, it is possible to efficiently produce a liquid crystal element having a uniform orientation of ferroelectric liquid crystal, which has been conventionally difficult to manufacture.
第１図は本発明の製造方法の一例を示すプロセスフロー
図であり、 第２図は実施例１、第３図は実施例２、第４図は実施例
３、第５図は比較例１、第６図は比較例２、第７図は比
較例３でそれぞれ得られた液晶素子中の液晶の結晶構造
の写真である。 1:絶縁層コート工程 2:配向層コート工程 3:ラビング工程 4:第１洗浄工程 5:第２洗浄工程 6:シール印刷工程 7:スペーサ散布工程 8:貼合せ工程 9:硬化工程 10:注入工程FIG. 1 is a process flow chart showing an example of the production method of the present invention. FIG. 2 is Example 1, FIG. 3 is Example 2, FIG. 4 is Example 3, and FIG. 5 is Comparative Example 1. FIG. 6 is a photograph of the crystal structure of the liquid crystal in the liquid crystal element obtained in Comparative Example 2, and FIG. 1: Insulating layer coating step 2: Orientation layer coating step 3: Rubbing step 4: First cleaning step 5: Second cleaning step 6: Seal printing step 7: Spacer spreading step 8: Laminating step 9: Curing step 10: Injection Process
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭64−55530（ＪＰ，Ａ) 特開 昭62−269117（ＪＰ，Ａ) 特開 昭61−245137（ＪＰ，Ａ) (58)調査した分野(Int.Cl.6，ＤＢ名) G02F 1/1337 G02F 1/1337 510 G02F 1/13 101──────────────────────────────────────────────────続 き Continuation of front page (56) References JP-A-64-55530 (JP, A) JP-A-62-269117 (JP, A) JP-A-61-245137 (JP, A) (58) Field (Int.Cl. 6 , DB name) G02F 1/1337 G02F 1/1337 510 G02F 1/13 101
Claims (3)
絶縁膜を形成した一対の基板を用意する工程、 ロ）該一対の基板の少なくとも一方に配向膜を形成する
工程、 ハ）該配向膜にラビング処理を施す工程、 ニ）該ラビング処理された配向膜を有する基板を、低級
アルコール系溶剤の濃度10重量％以上の水溶液を洗浄液
として使用し、洗浄処理する工程、 ホ）該ラビング処理された配向膜を有する基板を、低級
アルコール系溶剤または濃度50重量％以上の該溶剤の水
溶液を洗浄液として使用して再び洗浄処理する工程、 ト）該一対の基板を対向配置して貼り合せる工程、およ
び チ）該一対の基板間に液晶を配置する工程、を有する液
晶素子の製造方法。A) a step of preparing a pair of substrates on which electrodes are formed and an insulating film formed on at least one of them; b) a step of forming an alignment film on at least one of the pair of substrates; c) the alignment Rubbing the film; d) cleaning the substrate having the rubbed alignment film using an aqueous solution of a lower alcohol solvent having a concentration of 10% by weight or more as a cleaning liquid; e) performing the rubbing treatment Cleaning the substrate having the alignment film thus obtained, using a lower alcohol solvent or an aqueous solution of the solvent having a concentration of 50% by weight or more as a cleaning liquid; g) bonding the pair of substrates so as to face each other And h) a step of disposing a liquid crystal between the pair of substrates.
する強誘電性液晶である請求項１に記載の液晶素子の製
造方法。2. The method according to claim 1, wherein the liquid crystal is a ferroelectric liquid crystal having a chiral smectic C phase.
理がそれぞれ、スプレー洗浄、超音波洗浄、ブラシ・ス
クラブ洗浄、ジェット・スプレー洗浄、遠心スプレー洗
浄、リンス洗浄のうちいずれかまたはそれらを組合せた
洗浄手法で行なわれるものである請求項１または２に記
載の液晶素子の製造方法。3. The cleaning treatment in the steps d) and e) is any one of spray cleaning, ultrasonic cleaning, brush scrub cleaning, jet spray cleaning, centrifugal spray cleaning, and rinse cleaning, or a combination thereof. 3. The method for manufacturing a liquid crystal device according to claim 1, wherein the cleaning is performed by a cleaning method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1325866A JP2759533B2 (en) | 1989-12-18 | 1989-12-18 | Manufacturing method of liquid crystal element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1325866A JP2759533B2 (en) | 1989-12-18 | 1989-12-18 | Manufacturing method of liquid crystal element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03186817A JPH03186817A (en) | 1991-08-14 |
| JP2759533B2 true JP2759533B2 (en) | 1998-05-28 |
Family
ID=18181493
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1325866A Expired - Fee Related JP2759533B2 (en) | 1989-12-18 | 1989-12-18 | Manufacturing method of liquid crystal element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2759533B2 (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61245137A (en) * | 1985-04-23 | 1986-10-31 | Canon Inc | Orientation processing method for substrate surface of optical modulating element |
| JPS62269117A (en) * | 1986-05-16 | 1987-11-21 | Stanley Electric Co Ltd | Vertical orientation-treatment of liquid crystal display element |
| JPS6455530A (en) * | 1987-08-26 | 1989-03-02 | Matsushita Electric Ind Co Ltd | Production of liquid crystal display panel |
-
1989
- 1989-12-18 JP JP1325866A patent/JP2759533B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03186817A (en) | 1991-08-14 |
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