JP3272801B2 - Manufacturing method of substrate for liquid crystal panel - Google Patents

Manufacturing method of substrate for liquid crystal panel

Info

Publication number
JP3272801B2
JP3272801B2 JP02134293A JP2134293A JP3272801B2 JP 3272801 B2 JP3272801 B2 JP 3272801B2 JP 02134293 A JP02134293 A JP 02134293A JP 2134293 A JP2134293 A JP 2134293A JP 3272801 B2 JP3272801 B2 JP 3272801B2
Authority
JP
Japan
Prior art keywords
substrate
liquid crystal
crystal panel
manufacturing
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP02134293A
Other languages
Japanese (ja)
Other versions
JPH06235893A (en
Inventor
一生 井上
耕次 西田
敏夫 立道
幸四郎 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP02134293A priority Critical patent/JP3272801B2/en
Publication of JPH06235893A publication Critical patent/JPH06235893A/en
Application granted granted Critical
Publication of JP3272801B2 publication Critical patent/JP3272801B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、液晶表示装置や光シャ
ッタ−などに利用される液晶パネルに用いる液晶パネル
用基板の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a liquid crystal panel substrate used for a liquid crystal panel used for a liquid crystal display device or an optical shutter.

【0002】[0002]

【従来の技術】従来の液晶パネル用基板の製造方法は、
図2に示すように、ガラス基板に透明電極を形成後、ポ
リイミドやポリビニルアルコ−ルなどの配向膜を塗布・
硬化させた後、ナイロンやレイヨンなどの布を用い、そ
の配向膜表面を擦る(ラビングする)ことにより配向性
を付与する。
2. Description of the Related Art A conventional method of manufacturing a substrate for a liquid crystal panel is as follows.
As shown in FIG. 2, after forming a transparent electrode on a glass substrate, an alignment film such as polyimide or polyvinyl alcohol is applied.
After hardening, the orientation is imparted by rubbing (rubbing) the surface of the alignment film using a cloth such as nylon or rayon.

【0003】その後、ラビング後の洗浄方法として、純
水あるいはイソプロピルアルコ−ルなどで、その基板を
湿式洗浄するか、あるいは乾式洗浄として基板を窒素ガ
スなどでブロ−することにより基板表面の異物を除去す
る。
Then, as a cleaning method after rubbing, foreign substances on the substrate surface are cleaned by wet cleaning the substrate with pure water or isopropyl alcohol, or by blowing the substrate with nitrogen gas or the like as dry cleaning. Remove.

【0004】その後、液晶パネルとするために、同じく
図2に示すように、スペーサーを散布するとともにシー
ル印刷し、一定の間隔を保持したこれら2枚の基板を貼
合わせ、シール硬化させ、真空脱気した後、その間に液
晶を封入し、注入口を封じて、偏光板を張り付けるとい
うものであった。
Then, in order to make a liquid crystal panel ,
As shown in FIG. 2, the spacers are scattered and printed with a seal, the two substrates kept at a constant interval are bonded together, the seal is hardened, and after vacuum degassing, the liquid crystal is sealed between them, and the injection port is filled. Was sealed and a polarizing plate was attached.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、従来の
乾式洗浄ではラビング時に付着した基板表面の異物や汚
れは十分にとれないという課題がある。
However, the conventional dry cleaning has a problem that foreign substances and dirt on the substrate surface adhered during rubbing cannot be sufficiently removed.

【0006】また湿式洗浄では最初に水あるいは洗浄剤
が基板にあたる際に圧力の強弱があるのでその部分に配
向の乱れやシミなどが発生してしまうという課題があ
る。
[0006] In the wet cleaning, there is a problem that the pressure is applied when water or a cleaning agent first comes into contact with the substrate, so that the orientation is disturbed or spots are generated in that portion.

【0007】本発明は、上記のような従来の洗浄工程の
課題を考慮し、ゴミや異物がなく、また配向乱れやシミ
などのない表示品位の良好な液晶パネル用基板の製造方
法を提供することを目的とする。
The present invention provides a method for manufacturing a substrate for a liquid crystal panel having good display quality, free from dust and foreign matter, and free from alignment disturbance and spots, in consideration of the problems of the conventional cleaning process as described above. The purpose is to:

【0008】[0008]

【課題を解決するための手段】本発明は、液晶パネル用
の配向膜が形成された基板の前記配向膜にラビング処理
を施し、その後前記基板を水蒸気槽中に保持した後、
いて枚葉式の湿式洗浄を行うことを特徴とする液晶パネ
ル用基板の製造方法である。
Means for Solving the Problems The present invention is subjected to rubbing treatment before Symbol alignment film of the substrate on which the alignment film for liquid crystal panels are formed, after followed by the substrate kept in the steam bath, continued
And performing a single-wafer wet cleaning.

【0009】[0009]

【作用】本発明によれば、ラビング後の洗浄として、先
に基板を水蒸気槽中で保持することにより、配向乱れや
シミなどが発生せず、また、次に枚葉式の湿式洗浄を行
うことによりゴミや異物を除去することができ、その基
板を用いて良好な表示品位の液晶パネルを得ることがで
きる。
According to the present invention, as cleaning after rubbing, the substrate is first held in a steam bath so that alignment disorder and spots do not occur, and a single wafer wet cleaning is performed next. As a result, dust and foreign matter can be removed, and a liquid crystal panel with good display quality can be obtained using the substrate.

【0010】[0010]

【実施例】以下、本発明の実施例について図面を参照し
て説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0011】図1に本発明の一実施例を示す。2枚の透
明なガラス基板1、8上に透明電極膜(ITO膜)2、
7を形成した。このガラス基板1、8を洗浄した後、そ
の上に配向膜3、6としてポリイミドを塗布した後、熱
処理を行い、ポリイミド膜を硬化させ、その後、レイヨ
ンを材質とするラビングクロスを用いてラビング処理を
施した。
FIG. 1 shows an embodiment of the present invention. A transparent electrode film (ITO film) 2 on two transparent glass substrates 1 and 8;
7 was formed. After the glass substrates 1 and 8 are washed, polyimide is applied thereon as alignment films 3 and 6, and then heat treatment is performed to cure the polyimide film, and then rubbing treatment is performed using a rubbing cloth made of rayon. Was given.

【0012】この基板を5分間水蒸気中で保持した後、
湿式洗浄として枚葉式の純水洗浄機を用いて順にシャワ
−洗浄、超音波洗浄、シャワ−洗浄を行った後110℃
の乾燥炉に通し、基板を乾燥させた。
After holding this substrate in steam for 5 minutes,
As a wet cleaning, using a single wafer type pure water cleaning machine, shower cleaning, ultrasonic cleaning, and shower cleaning are sequentially performed, and then 110 ° C.
The substrate was dried by passing through a drying furnace.

【0013】その後一方のガラス基板1の配向膜3を設
けた面にスペ−サ−9として直径6μmのSiO2粒子を
散布し、他方のガラス基板8の配向膜6を設けた面の縁
部にシ−ル樹脂4を塗布し、これら両方の基板1、8を
配向膜3、6面同士が対向するように貼り合わせ、加熱
してシ−ル樹脂4を硬化させた。
Thereafter, SiO 2 particles having a diameter of 6 μm are sprayed as a spacer 9 on the surface of the glass substrate 1 on which the alignment film 3 is provided, and the edge of the surface of the other glass substrate 8 on which the alignment film 6 is provided is provided. A sealing resin 4 was applied to the substrate, and both of the substrates 1 and 8 were bonded together so that the alignment films 3 and 6 faced each other, and heated to cure the sealing resin 4.

【0014】その後真空脱気し、この2枚のガラス基板
1、8間に液晶5を注入し、偏光板10、11を貼付
し、電圧を印加し、配向状態などを調べた。
Thereafter, vacuum degassing was performed, a liquid crystal 5 was injected between the two glass substrates 1 and 8, the polarizing plates 10 and 11 were attached, a voltage was applied, and the alignment state and the like were examined.

【0015】比較例として、ラビング後に水蒸気中に保
持せず湿式洗浄のみを行ったパネル(比較例1)、乾式
洗浄(窒素ガスによるブロ−)を行ったパネル(比較例
2)を作製した。これらの結果を(表1)に示す。
As comparative examples, a panel was prepared by performing only wet cleaning without holding in steam after rubbing (Comparative Example 1), and a panel was performed by performing dry cleaning (blowing with nitrogen gas) (Comparative Example 2). The results are shown in (Table 1).

【0016】[0016]

【表1】 [Table 1]

【0017】(表1)から明らかなように、枚葉式の湿
式洗浄の前に水蒸気処理を行ったパネルは異物などのゴ
ミがなく、また配向性も良好であったが、湿式洗浄のみ
のパネルは配向性が悪く、また乾式洗浄のパネルはゴミ
などの異物が確認された。
As is clear from Table 1, the panel subjected to the steam treatment before the single-wafer wet cleaning had no dust such as foreign matter and had good orientation, but the panel was subjected to only the wet cleaning. The orientation of the panel was poor, and foreign matter such as dust was confirmed on the dry-cleaned panel.

【0019】なお、上記実施例の枚葉式の湿式洗浄では
水を用いたが、界面活性剤や有機溶剤などを用いても良
い。
[0019] Incidentally, in the wet cleaning of the single wafer of Example water is used, such as surfactants and organic solvents may be used.

【0020】また、上記実施例では、本発明2枚の基
板の場合にいて適用したが、本発明は、一方の基板の
みについて用してもかまわない。
Further, the above embodiment is applied to the present invention have One in the case of two substrates, the present invention may be applied for only one of the substrates.

【0021】[0021]

【発明の効果】以上述べたところから明らかなように、
本発明によれば、ゴミや異物がなく、また配向乱れやシ
ミなどのない表示品位の良好な液晶パネルを得ることが
できる。
As is apparent from the above description,
According to the present invention, it is possible to obtain a liquid crystal panel with good display quality, free from dust and foreign matter, and free from alignment disorder and spots.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の製造方法による液晶パネル用基板を用
いた液晶パネルの構成を示す断面図である。
FIG. 1 is a cross-sectional view illustrating a configuration of a liquid crystal panel using a liquid crystal panel substrate according to a manufacturing method of the present invention.

【図2】従来の液晶パネル用基板を含む液晶パネルの製
造方法を示す工程図である。
FIG. 2 is a process chart showing a conventional method for manufacturing a liquid crystal panel including a liquid crystal panel substrate.

【符号の説明】[Explanation of symbols]

1、8 ガラス基板 2、7 電極 3、6 配向膜 4 シ−ル樹脂 5 液晶 9 スペ−サ− 10、11 偏光板 1,8 Glass substrate 2,7 Electrode 3,6 Alignment film 4 Seal resin 5 Liquid crystal 9 Spacer 10,11 Polarizer

───────────────────────────────────────────────────── フロントページの続き (72)発明者 森 幸四郎 大阪府門真市大字門真1006番地 松下電 器産業株式会社内 (56)参考文献 特開 平5−34652(JP,A) 特開 平5−13398(JP,A) 特開 平4−204915(JP,A) (58)調査した分野(Int.Cl.7,DB名) G02F 1/13 101 ────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Koshiro Mori 1006 Kazuma Kadoma, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (56) References JP-A-5-34652 (JP, A) JP-A-5- 13398 (JP, A) JP-A-4-204915 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) G02F 1/13 101

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 液晶パネル用の配向膜が形成された基板
の前記配向膜にラビング処理を施し、その後前記基板を
水蒸気槽中に保持した後、続いて枚葉式の湿式洗浄を行
うことを特徴とする液晶パネル用基板の製造方法。
1. A substrate on which an alignment film for a liquid crystal panel is formed.
Subjected to a rubbing treatment of before Symbol alignment film, then the substrate
A method for manufacturing a substrate for a liquid crystal panel, comprising performing a single-wafer wet cleaning after holding the substrate in a steam bath.
JP02134293A 1993-02-09 1993-02-09 Manufacturing method of substrate for liquid crystal panel Expired - Fee Related JP3272801B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02134293A JP3272801B2 (en) 1993-02-09 1993-02-09 Manufacturing method of substrate for liquid crystal panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02134293A JP3272801B2 (en) 1993-02-09 1993-02-09 Manufacturing method of substrate for liquid crystal panel

Publications (2)

Publication Number Publication Date
JPH06235893A JPH06235893A (en) 1994-08-23
JP3272801B2 true JP3272801B2 (en) 2002-04-08

Family

ID=12052431

Family Applications (1)

Application Number Title Priority Date Filing Date
JP02134293A Expired - Fee Related JP3272801B2 (en) 1993-02-09 1993-02-09 Manufacturing method of substrate for liquid crystal panel

Country Status (1)

Country Link
JP (1) JP3272801B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4843221A (en) * 1986-07-26 1989-06-27 Daiichi Denshi Kogyo Kabushiki Kaisha Electronic card receiving device
JP3517585B2 (en) * 1998-04-23 2004-04-12 株式会社アドバンスト・ディスプレイ Liquid crystal display panel manufacturing method and cleaning device used for the same

Also Published As

Publication number Publication date
JPH06235893A (en) 1994-08-23

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