JPH1195180A - Production of liquid electro-optic device - Google Patents

Production of liquid electro-optic device

Info

Publication number
JPH1195180A
JPH1195180A JP25091797A JP25091797A JPH1195180A JP H1195180 A JPH1195180 A JP H1195180A JP 25091797 A JP25091797 A JP 25091797A JP 25091797 A JP25091797 A JP 25091797A JP H1195180 A JPH1195180 A JP H1195180A
Authority
JP
Japan
Prior art keywords
resist layer
liquid crystal
rubbing
oriented film
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP25091797A
Other languages
Japanese (ja)
Inventor
Yoichi Yamashita
陽一 山下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP25091797A priority Critical patent/JPH1195180A/en
Publication of JPH1195180A publication Critical patent/JPH1195180A/en
Withdrawn legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To make it possible to surely remove fine dust and firmly stuck dust by coating at least the surface region of the surface of a first substrate necessary for the function of the device with a resist layer, then removing the resist layer. SOLUTION: Wiring, transparent electrodes, etc., are formed at need on the surface of glass 10 and an oriented film 11 is formed on a display region thereon. The surface formed with the oriented film 11 is then subjected to a rubbing treatment. A photosensitive resist (positive resist) layer 13 is then applied over the entire surface on the surface of the oriented film 11 and more particularly at least the regions, such as the part where the display region of a liquid crystal display device is formed, necessary for the function of the liquid crystal electro-optic device and thereafter, the surface thereof is coated with the oriented film 11. The resist layer 13 which does not affect the rubbing state of the oriented film 11, i.e., the resist layer which does not impair the orientation regulating force to liquid crystal molecules is used. The resist layer 13 is thereafter exposed and cured and is removed by a rinsing liquid consisting of a compsn. which does not affect the oriented film 11 itself and the rubbing state thereof.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は液晶電気光学装置の
製造方法に係り、特に、基板表面にラビング処理を施す
工程を備えた製造方法の改良に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a liquid crystal electro-optical device, and more particularly to an improvement in a manufacturing method including a step of performing a rubbing treatment on a substrate surface.

【0002】[0002]

【従来の技術】従来、液晶表示装置その他の液晶電気光
学装置の製造方法においては、2枚の基板の内面上にそ
れぞれ透明電極を形成し、さらにこの透明電極の上に樹
脂製の配向膜を形成して、この配向膜に対してラビング
処理を施す場合がある。このラビング処理は、2枚の基
板間に挟持される液晶層内の液晶分子の配向方向を所定
の方向に揃えるために行われるものである。
2. Description of the Related Art Conventionally, in a method of manufacturing a liquid crystal display device or another liquid crystal electro-optical device, a transparent electrode is formed on the inner surfaces of two substrates, and a resin alignment film is further formed on the transparent electrode. After the formation, a rubbing process may be performed on the alignment film. This rubbing treatment is performed to align the orientation of liquid crystal molecules in a liquid crystal layer sandwiched between two substrates in a predetermined direction.

【0003】このラビング処理は、通常、配向膜の表面
上を布等によって所定の方向に擦ることによってなされ
る。例えば、ナイロン製のラビング布を周面に貼着した
ラビングローラを回転させながら、基板表面を擦ってい
くことによって、配向膜の表面にほぼ均一な所定方向に
伸びる細かな傷を形成し、液晶分子をこの傷の方向に均
一に配向させる。
This rubbing treatment is usually performed by rubbing the surface of the alignment film in a predetermined direction with a cloth or the like. For example, by rubbing the surface of the substrate while rotating a rubbing roller having a rubbing cloth made of nylon adhered to the peripheral surface, a fine scratch extending substantially in a predetermined direction is formed on the surface of the alignment film, and the liquid crystal is formed. The molecules are oriented uniformly in the direction of this flaw.

【0004】[0004]

【発明が解決しようとする課題】ところで、上記ラビン
グ処理を行うと、基板表面には配向膜やラビング布から
発生した細かな塵埃が多数付着する。このため、ラビン
グ処理を行った後には、基板表面を純水、イソプロピル
アルコール等によって洗浄する必要がある。これらの塵
埃が基板表面に残留したまま次工程に進むと、液晶分子
の配向方向に乱れやばらつきが発生し、特に液晶表示装
置においては表示不良や表示ムラが生じて表示品位が低
下するからである。
By the way, when the rubbing treatment is performed, a large number of fine dusts generated from the alignment film or the rubbing cloth adhere to the substrate surface. Therefore, after performing the rubbing treatment, it is necessary to clean the substrate surface with pure water, isopropyl alcohol, or the like. If these dusts remain on the substrate surface and proceed to the next process, the orientation direction of the liquid crystal molecules will be disturbed or uneven, and especially in a liquid crystal display device, display defects and display unevenness will occur, and the display quality will be reduced. is there.

【0005】しかしながら、上記のような洗浄工程を行
っても、基板表面に付着した微細な塵埃や強固に付着し
た塵埃を除去することは困難であり、このために、従来
においては、表示品位を向上させたり、製品の歩留まり
を高めることが難しいという問題点がある。
[0005] However, it is difficult to remove fine dust adhered to the substrate surface or dust firmly adhered to the substrate surface even by performing the above-described cleaning process. There is a problem that it is difficult to improve or increase the yield of products.

【0006】そこで、本発明は上記問題点を解決するも
のであり、その課題は、液晶電気光学装置の製造方法に
おいて、微細な塵埃や強固に付着した塵埃を容易かつ確
実に除去することが可能であり、液晶電気光学装置の品
位や歩留まりを向上させることができる新規の製造方法
を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made in order to solve the above problems, and an object of the present invention is to provide a method for manufacturing a liquid crystal electro-optical device in which fine dust and firmly adhered dust can be easily and reliably removed. Another object of the present invention is to provide a novel manufacturing method capable of improving the quality and yield of a liquid crystal electro-optical device.

【0007】[0007]

【課題を解決するための手段】上記課題を解決するため
に本発明が講じた手段は、第1の基板の表面にラビング
処理を施し、該第1の基板と第2の基板との間に液晶層
を挟持した状態に構成する液晶電気光学装置の製造方法
において、前記第1の基板の表面にラビング処理を施し
た後に、前記第1の基板の表面のうち少なくとも装置の
機能上必要な表面領域をレジスト層で被覆し、その後、
該レジスト層を除去することを特徴とする。
Means taken by the present invention to solve the above-mentioned problem is to perform a rubbing treatment on a surface of a first substrate, and to provide a rubbing treatment between the first substrate and the second substrate. In a method of manufacturing a liquid crystal electro-optical device configured to sandwich a liquid crystal layer, after performing a rubbing process on a surface of the first substrate, at least a surface necessary for function of the device among the surfaces of the first substrate Cover the area with a resist layer, then
The method is characterized in that the resist layer is removed.

【0008】この手段によれば、レジスト層で被覆した
後、このレジスト層を除去することによって、第1の基
板の表面に堆積したり、付着したりしている、ラビング
時に発生した塵埃を容易に除去することができ、特に、
従来除去困難であった微細な塵埃や強固に付着した塵埃
をも効果的に除去することができる。
[0008] According to this means, after coating with the resist layer and removing the resist layer, dust generated during rubbing, which is deposited or adhered to the surface of the first substrate, can be easily removed. In particular,
Fine dust and firmly adhered dust that have been difficult to remove can be effectively removed.

【0009】ここで、被覆させた前記レジスト層を硬化
させた後に除去することが好ましい。レジスト層の硬化
によって、レジスト層と基板表面上の塵埃との密着性を
高めることができるため、より確実に塵埃を除去するこ
とができる。
Here, it is preferable that the coated resist layer is removed after being cured. Due to the hardening of the resist layer, the adhesion between the resist layer and the dust on the substrate surface can be increased, so that the dust can be more reliably removed.

【0010】[0010]

【発明の実施の形態】次に、添付図面を参照して本発明
に係る実施形態について説明する。図1は本発明に係る
液晶電気光学装置の実施形態を示す概略工程図である。
この実施形態は液晶表示装置の製造方法に適用したもの
であり、特に、TFT(薄膜トランジスタ)等を備えた
アクティブマトリクス型の液晶表示装置の製造工程に用
いるためのものである。
Next, an embodiment according to the present invention will be described with reference to the accompanying drawings. FIG. 1 is a schematic process diagram showing an embodiment of a liquid crystal electro-optical device according to the present invention.
This embodiment is applied to a method of manufacturing a liquid crystal display device, and is particularly used for a manufacturing process of an active matrix type liquid crystal display device having a TFT (thin film transistor) or the like.

【0011】無アルカリガラス等からなるガラス基板1
0の表面上には、図示はしていないが、必要に応じて、
アクティブ素子(上記TFTなど)や配線、透明電極、
カラーフィルタ等を形成し、その上の表示領域に配向膜
11を形成する。この配向膜11は、例えばポリイミ
ド、ポリビニルアルコール等の樹脂を塗布し、所定の条
件で硬化させたものである。
Glass substrate 1 made of non-alkali glass or the like
Although not shown on the surface of 0, if necessary,
Active elements (such as the above TFTs), wiring, transparent electrodes,
A color filter and the like are formed, and an alignment film 11 is formed in a display region thereon. The alignment film 11 is obtained by applying a resin such as polyimide or polyvinyl alcohol and curing the resin under predetermined conditions.

【0012】この状態で、図1(a)に示すように、ガ
ラス基板10の配向膜11が形成された表面にラビング
処理を施す。このラビング処理は、例えば、ラビングロ
ーラ20の周面にナイロン等の繊維によって織られたラ
ビング布21を貼着し、ラビングローラ20をガラス基
板10の表面に対して所定の圧力になるように押し付け
ながら回転させる。
In this state, a rubbing process is performed on the surface of the glass substrate 10 on which the alignment film 11 is formed, as shown in FIG. In this rubbing treatment, for example, a rubbing cloth 21 woven from fibers such as nylon is adhered to the peripheral surface of the rubbing roller 20 and the rubbing roller 20 is pressed against the surface of the glass substrate 10 so as to have a predetermined pressure. Rotate while rotating.

【0013】ガラス基板10は、図示しない搬送装置に
より図示左側から右側に向けて送られるようになってお
り、その結果、ガラス基板10の表面上の配向膜11は
順次ラビング布21によって擦られる。ラビングローラ
20の印加圧力、ラビングローラ20の回転数及びガラ
ス基板10の搬送速度は、工程によるラビング状態を勘
案して適宜の条件に設定される。
The glass substrate 10 is fed from the left side to the right side by a transport device (not shown). As a result, the alignment film 11 on the surface of the glass substrate 10 is sequentially rubbed by the rubbing cloth 21. The applied pressure of the rubbing roller 20, the rotation speed of the rubbing roller 20, and the transport speed of the glass substrate 10 are set to appropriate conditions in consideration of the rubbing state in the process.

【0014】ラビングローラ20のラビング布21によ
ってガラス基板10上の配向膜11が擦られることによ
って、削り取られた微細な配向膜11の破片やラビング
布21の毛等が細かな塵埃として発生する。これらの塵
埃は、配向膜11やラビング布21の表面上に堆積した
り、付着し、或いは空中に舞い上がる。したがって、ラ
ビング工程を経たガラス基板10の表面上には無数の塵
埃12が堆積又は付着している。
When the alignment film 11 on the glass substrate 10 is rubbed by the rubbing cloth 21 of the rubbing roller 20, fine pieces of the alignment film 11 that have been scraped off, hairs of the rubbing cloth 21, and the like are generated as fine dust. These dusts accumulate on or adhere to the surfaces of the alignment film 11 and the rubbing cloth 21 or fly up in the air. Therefore, countless dusts 12 are deposited or adhered on the surface of the glass substrate 10 that has undergone the rubbing step.

【0015】次に、図1(b)に示すように、配向膜1
1の表面上、特に、液晶表示装置の表示領域となる部分
などのように、少なくとも液晶電気光学装置における装
置機能上必要な領域上に全面的に感光性のレジスト(ポ
ジレジスト)層13を塗布し、配向膜11を被覆する。
このレジスト層13は配向膜11のラビング状態に影響
を与えにくいもの、好ましくは影響を与えないもの、す
なわち、液晶分子に対する配向規制力を損なわないもの
を適宜選定して用いる。
Next, as shown in FIG.
A photosensitive resist (positive resist) layer 13 is applied to the entire surface of the liquid crystal electro-optical device, such as a portion to be a display region of a liquid crystal display device, at least over a region required for device functions. Then, the alignment film 11 is covered.
As the resist layer 13, a material that hardly affects the rubbing state of the alignment film 11, preferably one that does not affect the rubbing state, that is, a material that does not impair the alignment control force on the liquid crystal molecules is appropriately selected and used.

【0016】レジスト層13の例としては、配向膜11
のラビング状態に重大な影響を与えない公知の種々の樹
脂製のレジスト材料を用いることができるが、上記のよ
うな配向規制力を損なわないものが特に好ましい。特
に、配向膜11が上記のような材質で形成される場合に
は、配向膜11の膜質やラビング状態に影響を与えにく
い後述するアルコール系のリンス液で除去できるものが
好ましく、例えば、日本合成ゴム社製のJALS381
−RQ等がある。
As an example of the resist layer 13, an alignment film 11
Various known resin resist materials which do not have a significant effect on the rubbing state can be used, but those which do not impair the alignment regulating force as described above are particularly preferable. In particular, when the alignment film 11 is formed of the above-described material, it is preferable that the alignment film 11 can be removed with an alcohol-based rinsing liquid that does not affect the film quality of the alignment film 11 or the rubbing state. JALS381 made by Rubber Co.
-RQ and the like.

【0017】この後、上記レジスト層13を露光して硬
化させ、しかる後に、図1(c)に示すように所定のリ
ンス液にて除去する。このリンス液は上記のように配向
膜11自体やそのラビング状態に影響を与えにくい組成
のものが選定される。例えば、上記例示されたレジスト
層に対して使用できるリンス液としては、アルコール系
のLS1001レジストシンナー(日本合成ゴム社製)
等がある。
Thereafter, the resist layer 13 is exposed and cured, and thereafter, is removed with a predetermined rinsing liquid as shown in FIG. As the rinsing liquid, one having a composition that hardly affects the alignment film 11 itself and the rubbing state thereof is selected as described above. For example, the rinsing liquid that can be used for the resist layer exemplified above is an alcohol-based LS1001 resist thinner (manufactured by Nippon Synthetic Rubber Co., Ltd.).
Etc.

【0018】上記リンス液によってレジスト層13は除
去されるが、そのとき、配向膜11の表面に堆積或いは
付着していた塵埃12は、レジスト層13に密着してい
るため、レジスト層13の除去の際に共に除去される。
この結果、従来除去困難であった微細な塵埃や強固に付
着していた塵埃も取り易くなり、配向膜11の表面を清
浄にすることができる。
The resist layer 13 is removed by the above-mentioned rinsing liquid. At this time, since the dust 12 deposited or adhered on the surface of the alignment film 11 is in close contact with the resist layer 13, the resist layer 13 is removed. Are removed together.
As a result, it is easy to remove fine dust that has been difficult to remove and dust that has firmly adhered, and the surface of the alignment film 11 can be cleaned.

【0019】上記実施形態では、フォトレジストを用い
て塵埃を除去しているが、フォトレジスト以外の他の硬
化特性、例えば熱硬化性を備えたものを用いてもよい。
この場合、特に、意図的に硬化させなくても充分な塵埃
との密着性を得られるものであれば、ことさら硬化工程
を設ける必要はない。
In the above embodiment, dust is removed by using a photoresist, but a material having a curing property other than the photoresist, for example, a thermosetting property may be used.
In this case, it is not particularly necessary to provide a curing step as long as sufficient adhesion to dust can be obtained without intentionally curing.

【0020】また、ラビング処理は上記のような配向膜
に対して施されるとは限らず、例えばガラス基板10の
表面に直接施される場合も考えられる。本実施形態はこ
のような場合にも有効である。
Further, the rubbing treatment is not always performed on the alignment film as described above, but may be performed directly on the surface of the glass substrate 10, for example. The present embodiment is also effective in such a case.

【0021】[0021]

【発明の効果】以上説明したように本発明によれば以下
の効果を奏する。
As described above, according to the present invention, the following effects can be obtained.

【0022】請求項1によれば、レジスト層で被覆した
後、このレジスト層を除去することによって、第1の基
板の表面に堆積したり、付着したりしている、ラビング
時に発生した塵埃を容易に除去することができ、特に、
従来除去困難であった微細な塵埃や強固に付着した塵埃
をも効果的に除去することができる。
According to the first aspect, after covering with the resist layer, the resist layer is removed, so that dust generated during rubbing, which is deposited or adhered to the surface of the first substrate, is removed. Can be easily removed, especially
Fine dust and firmly adhered dust that have been difficult to remove can be effectively removed.

【0023】請求項2によれば、レジスト層の硬化によ
って、レジスト層と基板表面上の塵埃との密着性を高め
ることができるため、より確実に塵埃を除去することが
できる。
According to the second aspect, the adhesion between the resist layer and the dust on the substrate surface can be enhanced by the curing of the resist layer, so that the dust can be more reliably removed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る実施形態の製造工程を示す概略工
程図(a)〜(c)である。
FIG. 1 is a schematic process diagram (a) to (c) showing a manufacturing process of an embodiment according to the present invention.

【符号の説明】[Explanation of symbols]

10 ガラス基板 11 配向膜 12 塵埃 13 レジスト層 Reference Signs List 10 Glass substrate 11 Alignment film 12 Dust 13 Resist layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 第1の基板の表面にラビング処理を施
し、該第1の基板と第2の基板との間に液晶層を挟持し
た状態に構成する液晶電気光学装置の製造方法におい
て、 前記第1の基板の表面にラビング処理を施した後に、前
記第1の基板の表面のうち少なくとも装置の機能上必要
な表面領域をレジスト層で被覆し、その後、該レジスト
層を除去することを特徴とする液晶電気光学装置の製造
方法。
1. A method for manufacturing a liquid crystal electro-optical device, wherein a rubbing process is performed on a surface of a first substrate, and a liquid crystal layer is sandwiched between the first substrate and a second substrate. After subjecting the surface of the first substrate to a rubbing treatment, at least a surface area of the surface of the first substrate necessary for the function of the device is covered with a resist layer, and thereafter, the resist layer is removed. Of manufacturing a liquid crystal electro-optical device.
【請求項2】 請求項1において、被覆させた前記レジ
スト層を硬化させた後に除去することを特徴とする液晶
電気光学装置の製造方法。
2. The method for manufacturing a liquid crystal electro-optical device according to claim 1, wherein the coated resist layer is removed after being cured.
JP25091797A 1997-09-16 1997-09-16 Production of liquid electro-optic device Withdrawn JPH1195180A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25091797A JPH1195180A (en) 1997-09-16 1997-09-16 Production of liquid electro-optic device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25091797A JPH1195180A (en) 1997-09-16 1997-09-16 Production of liquid electro-optic device

Publications (1)

Publication Number Publication Date
JPH1195180A true JPH1195180A (en) 1999-04-09

Family

ID=17214950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25091797A Withdrawn JPH1195180A (en) 1997-09-16 1997-09-16 Production of liquid electro-optic device

Country Status (1)

Country Link
JP (1) JPH1195180A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102819145A (en) * 2012-08-22 2012-12-12 深圳市华星光电技术有限公司 Manufacturing method of liquid crystal panel
US20140057518A1 (en) * 2012-08-22 2014-02-27 Shenzhen China Star Optoelectronics Technology Co., Ltd Manufacturing method of liquid crystal panel

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102819145A (en) * 2012-08-22 2012-12-12 深圳市华星光电技术有限公司 Manufacturing method of liquid crystal panel
US20140057518A1 (en) * 2012-08-22 2014-02-27 Shenzhen China Star Optoelectronics Technology Co., Ltd Manufacturing method of liquid crystal panel
WO2014029116A1 (en) * 2012-08-22 2014-02-27 深圳市华星光电技术有限公司 Manufacturing method for liquid crystal panel
US9229255B2 (en) * 2012-08-22 2016-01-05 Shenzhen China Star Optoelectronics Technology Co., Ltd. Manufacturing method of liquid crystal panel

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