JP2703426B2 - Circuit board - Google Patents

Circuit board

Info

Publication number
JP2703426B2
JP2703426B2 JP21198691A JP21198691A JP2703426B2 JP 2703426 B2 JP2703426 B2 JP 2703426B2 JP 21198691 A JP21198691 A JP 21198691A JP 21198691 A JP21198691 A JP 21198691A JP 2703426 B2 JP2703426 B2 JP 2703426B2
Authority
JP
Japan
Prior art keywords
conductor
circuit
metal layer
wiring conductor
circuit conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP21198691A
Other languages
Japanese (ja)
Other versions
JPH0555718A (en
Inventor
憲一 合原
隆一 井村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP21198691A priority Critical patent/JP2703426B2/en
Publication of JPH0555718A publication Critical patent/JPH0555718A/en
Application granted granted Critical
Publication of JP2703426B2 publication Critical patent/JP2703426B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は混成集積回路装置等に使
用される回路基板に関し、より詳細には内部にタングス
テン(W) 、モリブデン(Mo)、マンガン(Mn)等の高融点金
属粉末から成る配線導体を、外表面に銅(Cu)から成る回
路導体を有する回路基板の改良に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a circuit board used for a hybrid integrated circuit device or the like, and more particularly to a circuit board containing a high melting point metal powder such as tungsten (W), molybdenum (Mo), and manganese (Mn). The present invention relates to an improvement of a circuit board having a wiring conductor made of copper (Cu) on the outer surface.

【0002】[0002]

【従来の技術】従来、半導体素子等の能動部品や抵抗
器、コンデンサ等の受動部品を多数搭載し、所定の電子
回路を構成するようになした混成集積回路装置は、通
常、アルミナセラミックス等の電気絶縁材料から成り、
内部にタングステン(W) 、モリブデン(Mo)、マンガン(M
n)等の高融点金属から成る配線導体を埋設した絶縁基体
の外表面に銅(Cu)から成る回路導体をその一部が前記配
線導体と接続するようにして被着させた構造の回路基板
を準備し、次に前記回路基板の表面に半導体素子やコン
デンサ、抵抗器等を載置させるとともに各々の電極端子
を回路導体に半田(Sn-Pb合金) 等を介し接合させること
によって形成されている。
2. Description of the Related Art Conventionally, a hybrid integrated circuit device which mounts a large number of active parts such as semiconductor elements and passive parts such as resistors and capacitors and forms a predetermined electronic circuit is usually made of alumina ceramics or the like. Made of electrically insulating material,
Inside tungsten (W), molybdenum (Mo), manganese (M
n) A circuit board having a structure in which a circuit conductor made of copper (Cu) is attached to an outer surface of an insulating base in which a wiring conductor made of a high melting point metal such as a metal is embedded so that a part of the circuit conductor is connected to the wiring conductor. Prepared, and then formed by mounting a semiconductor element, a capacitor, a resistor, etc. on the surface of the circuit board and joining each electrode terminal to a circuit conductor via solder (Sn-Pb alloy) or the like. I have.

【0003】尚、かかる従来の混成集積回路装置等に使
用される回路基板は一般にセラミックスの積層技術及び
スクリーン印刷等の厚膜技術を採用することによって製
作されており、具体的には以下の方法によって製作され
る。
A circuit board used in such a conventional hybrid integrated circuit device is generally manufactured by employing a ceramic laminating technique and a thick film technique such as screen printing. Produced by

【0004】即ち、まず、アルミナ(Al 2 O 3 ) 、シ
リカ(SiO2 ) 、マグネシア(MgO) 、カルシア(CaO) 等の
電気絶縁性に優れたセラミックス原料粉末に有機溶剤、
溶媒を添加混合して複数枚のセラミック生シートを得る
とともに該各セラミック生シートの上下面にタングステ
ン、モリブデン、マンガン等の高融点金属粉末から成る
導電ペーストを従来周知のスクリーン印刷等の厚膜手法
を採用することによって所定パターンに印刷塗布する。
[0004] First, an organic solvent is added to a ceramic raw material powder such as alumina (Al 2 O 3 ), silica (SiO 2 ), magnesia (MgO), and calcia (CaO) which has excellent electrical insulation properties.
A solvent is added and mixed to obtain a plurality of ceramic raw sheets, and a conductive paste made of a high melting point metal powder such as tungsten, molybdenum, manganese or the like is formed on the upper and lower surfaces of each ceramic raw sheet by a conventionally known thick film method such as screen printing. Is applied in a predetermined pattern by printing.

【0005】次に前記各セラミック生シートを積層
し、積層体を得るとともにこれを約1500℃の温度で焼成
し、内部及び表面にタングステン、モリブデン、マンガ
ン等の高融点金属から成る配線導体を有する絶縁基体を
得る。
Next, the respective ceramic green sheets are laminated to obtain a laminate, which is fired at a temperature of about 1500 ° C., and has a wiring conductor made of a refractory metal such as tungsten, molybdenum, manganese or the like inside and on the surface. Obtain an insulating substrate.

【0006】そして最後に前記絶縁基体の外表面に、
銅(Cu)粉末に有機溶剤、溶媒を添加混合して得た銅ペー
ストを従来周知のスクリーン印刷法によりその一部が前
記配線導体と接続するようにして塗布させるとともにこ
れを中性雰囲気( 窒素雰囲気)中、約900 ℃の温度で焼
成し、銅粉末を絶縁基体及び配線導体上に被着させるこ
とによって製品としての回路基板となる。
Finally, on the outer surface of the insulating substrate,
A copper paste obtained by adding and mixing an organic solvent and a solvent to copper (Cu) powder is applied by a well-known screen printing method so that a part of the copper paste is connected to the wiring conductor, and the paste is applied to a neutral atmosphere (nitrogen atmosphere). (Atmosphere) at a temperature of about 900 ° C., and a copper powder is deposited on the insulating substrate and the wiring conductor to obtain a circuit board as a product.

【0007】[0007]

【発明が解決しようとする課題】しかしながら、近時、
半導体素子は高密度化、高集積化が急激に進み、単位面
積、単位体積あたりの発熱量が急増してきたこと、絶縁
基体を構成するアルミナセラミックスはその熱伝導率が
約20W/m ・K と低いこと等から回路基板に半導体素子を
搭載し作動させた場合、半導体素子の発する熱は外部に
良好に伝達吸収されずに半導体素子自身に蓄積してしま
い、その結果、半導体素子が高温となって半導体素子に
熱破壊を起こさせたり、特性に熱変化を与え、誤動作を
生じさせたりするという欠点を有していた。
However, recently,
Semiconductor elements are rapidly increasing in density and integration, and the amount of heat generated per unit area and unit volume is increasing rapidly.The thermal conductivity of alumina ceramics that constitute the insulating base is about 20 W / mK. When a semiconductor device is mounted on a circuit board for operation because of its low temperature, the heat generated by the semiconductor device is not transmitted and absorbed well to the outside and accumulates in the semiconductor device itself, resulting in a high temperature of the semiconductor device. Therefore, there is a disadvantage that the semiconductor element is thermally destructed or a characteristic is changed by heat to cause a malfunction.

【0008】また前記従来の回路基板は配線導体を形成
するタングステン、モリブデン、マンガン等と回路導体
を形成する銅との濡れ性( 反応性)が悪く、そのため配
線導体の一部に回路導体を被着させたとしても両者は強
固に密着せず、その結果、配線導体と回路導体との間の
電気的導通が極めて悪いという欠点も有していた。
In addition, the conventional circuit board has poor wettability (reactivity) between tungsten, molybdenum, manganese or the like forming the wiring conductor and copper forming the circuit conductor, so that a part of the wiring conductor is covered with the circuit conductor. Even when they are attached, they do not adhere firmly, and as a result, there is also a drawback that the electrical conduction between the wiring conductor and the circuit conductor is extremely poor.

【0009】[0009]

【課題を解決するための手段】本発明は窒化アルミニウ
ム質焼結体から成り、タングステン、モリブデンの少な
くとも1種から成る配線導体を設けた絶縁基体の外表面
に、銅から成る回路導体をその一部が前記配線導体と接
触するようにして被着させた回路基板であって、前記絶
縁基体は少なくとも配線導体が被着される表面に酸化物
膜を有し、且つ配線導体と回路導体との接触部に、ニッ
ケル、コバルトの少なくとも1種とタングステン、モリ
ブデンの少なくとも1種の合金から成る中間金属層が介
在していることを特徴とするものである。
According to the present invention, a circuit conductor made of copper is formed on an outer surface of an insulating substrate provided with a wiring conductor made of at least one of tungsten and molybdenum. A circuit board having a portion contacted with the wiring conductor, the insulating base having an oxide film on at least a surface on which the wiring conductor is to be adhered, An intermediate metal layer made of an alloy of at least one of nickel and cobalt and at least one of tungsten and molybdenum is interposed in the contact portion.

【0010】[0010]

【実施例】次に本発明を添付図面に基づき詳細に説明す
る。図1は本発明の回路基板を説明するための一部拡大
断面図であり、1 は電気絶縁性の材料から成る絶縁基体
である。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. FIG. 1 is a partially enlarged sectional view for explaining a circuit board of the present invention, and 1 is an insulating base made of an electrically insulating material.

【0011】前記絶縁基体1 は、窒化アルミニウム質焼
結体から成り、窒化アルミニウム粉末(AlN) に焼結助剤
としての酸化イットリウム(Y2 O 3 ) 、カルシア(CaO)
等の粉末及び適当な有機溶剤、溶媒を添加混合して泥漿
物を作るとともにこれをドクターブレード法を採用する
ことによってセラミックグリーンシート( セラミック生
シート) を形成し、しかる後、前記セラミックグリーン
シートに適当な穴あけ加工を施すとともに複数枚積層
し、還元雰囲気中、約1800℃の温度で焼成することによ
って製作される。
The insulating substrate 1 is made of an aluminum nitride sintered body. Aluminum nitride powder (AlN) is mixed with yttrium oxide (Y 2 O 3 ) and calcia (CaO) as a sintering aid.
Powder and an appropriate organic solvent, and a solvent are added and mixed to form a slurry, and a doctor blade method is used to form a ceramic green sheet (ceramic green sheet). It is manufactured by performing appropriate drilling and stacking a plurality of sheets, and firing at a temperature of about 1800 ° C. in a reducing atmosphere.

【0012】前記絶縁基体1 を構成する窒化アルミニウ
ム質焼結体はその熱伝導率が80.0W/m ・K 以上と高く、
熱を伝導し易いため絶縁基体1 に発熱量が多い半導体素
子を搭載させたとしても該半導体素子の発する熱は絶縁
基体1 が良好に吸収し、その結果、半導体素子は常に低
温として熱破壊したり、特性に熱変化を生じ、誤動作し
たりすることはなくなる。
The aluminum nitride sintered body constituting the insulating base 1 has a high thermal conductivity of 80.0 W / m · K or more,
Even if a semiconductor element that generates a large amount of heat is mounted on the insulating base 1 because it easily conducts heat, the heat generated by the semiconductor element is well absorbed by the insulating base 1, and as a result, the semiconductor element always breaks down at a low temperature and is thermally destroyed. Or a thermal change in the characteristics, and a malfunction does not occur.

【0013】また前記絶縁基体1 にはその内部から上面
に導出する配線導体2 が設けてあり、該配線導体2 はタ
ングステン、モリブデンの少なくとも1 種より形成され
ている。
The insulating substrate 1 is provided with a wiring conductor 2 extending from the inside to the upper surface, and the wiring conductor 2 is formed of at least one of tungsten and molybdenum.

【0014】前記配線導体2 はタングテン、モリブデ
ン、マンガンの粉末に有機溶剤、溶媒を添加混合して導
体ペーストを作り、該導体ペーストを前記セラミックグ
リーンシートの上下面にスクリーン印刷等により所定パ
ターンに印刷塗布させておくことによって絶縁基体1 の
内部及び表面に被着形成される。
The wiring conductor 2 is prepared by adding an organic solvent and a solvent to a powder of tungsten, molybdenum, and manganese to form a conductor paste, and printing the conductor paste on the upper and lower surfaces of the ceramic green sheet in a predetermined pattern by screen printing or the like. By being applied, it is adhered to the inside and the surface of the insulating base 1.

【0015】前記配線導体2 はその露出外表面で少なく
とも後述する回路導体4 が被着される部位にニッケル、
コバルトの少なくとも1 種とタングステン、モリブデン
の少なくとも1 種の合金から成る中間金属層3 が被着形
成されており、該中間金属層3 は配線導体2 の露出外表
面に電解メッキ、無電解メッキ等のメッキ法や従来周知
の厚膜手法により被着形成される。前記中間金属層3 は
これを構成する金属、即ち、ニッケル、コバルトの少な
くとも1 種とタングステン、モリブデンの少なくとも1
種との合金が配線導体2 と回路導体4 の両方に濡れ性(
反応性) が良く、配線導体2 上に回路導体4 を被着させ
た場合、両者は完全に密着して両者間の電気的導通を極
めて優れたものと為す。
The wiring conductor 2 has nickel on its exposed outer surface at least at a portion where a circuit conductor 4 to be described later is attached.
An intermediate metal layer 3 made of an alloy of at least one of cobalt and at least one of tungsten and molybdenum is formed on the exposed outer surface of the wiring conductor 2 by electrolytic plating, electroless plating, or the like. And a thick film method known in the art. The intermediate metal layer 3 is composed of at least one of the constituent metals, that is, at least one of nickel and cobalt and at least one of tungsten and molybdenum.
The alloy with the seed wets both the wiring conductor 2 and the circuit conductor 4 (
When the circuit conductor 4 is adhered on the wiring conductor 2, the two are completely adhered to each other, and the electrical conduction between them is extremely excellent.

【0016】尚、前記中間金属層3 を構成する金属は銅
(Cu)と相互拡散し難い金属であり、そのため配線導体2
上に中間金属層3 を間に挟んで回路導体4 を被着させた
としても回路導体4 の銅の一部が配線導体2 に直接接触
することは一切なく、これによっても配線導体2 と回路
導体4 との密着性をより完全なものとし、両者の電気的
導通を極めて良好となすこともできる。
The metal constituting the intermediate metal layer 3 is copper.
(Cu)
Even when the circuit conductor 4 is attached with the intermediate metal layer 3 interposed therebetween, part of the copper of the circuit conductor 4 does not directly contact the wiring conductor 2 at all, and this also allows The adhesion to the conductor 4 can be made more complete, and the electrical continuity between the two can be made extremely good.

【0017】また前記中間金属層3 はタングステン、モ
リブデンの少なくとも1 種の合計重量がニッケル、コバ
ルトの少なくとも1 種の合計重量100 に対し2.0 %未満
となると銅の拡散の抑止効果が弱まり、回路導体4 を構
成する銅の一部が中間金属層3 内を拡散して配線導体2
に直接接触し、配線導体2 と回路導体4 との密着性を劣
化させてしまう傾向にあり、また50.0%を越えると中間
金属層3 と回路導体4との濡れ性( 反応性) が悪くな
り、回路導体4 を配線導体2 に密着性良く被着させるこ
とができなくなる傾向にあることから中間金属層3 はタ
ングステン、モリブデンの少なくとも1 種の合計重量を
ニッケル、コバルトの少なくとも1 種の合計重量100 に
対し2.0 乃至50.0%の範囲としておくことが好ましい。
When the total weight of at least one of tungsten and molybdenum is less than 2.0% with respect to the total weight of at least one of nickel and cobalt 100, the effect of suppressing the diffusion of copper is reduced. 4 is partially diffused in the intermediate metal layer 3
Directly, the adhesiveness between the wiring conductor 2 and the circuit conductor 4 tends to be deteriorated, and if it exceeds 50.0%, the wettability (reactivity) between the intermediate metal layer 3 and the circuit conductor 4 deteriorates. Since the circuit conductor 4 tends to be unable to adhere to the wiring conductor 2 with good adhesion, the total weight of at least one of tungsten and molybdenum is the total weight of at least one of nickel and cobalt. It is preferable to set the range of 2.0 to 50.0% with respect to 100.

【0018】また前記中間金属層3 にホウ素を0.1 乃至
5.0 重量%、あるいはリンを2.0 乃至15.0重量%含有さ
せておくと中間金属層3 表面に酸化膜が形成されるのを
抑制し、中間金属層3 と回路導体4 との密着性をより良
好となすことができる。従って前記中間金属層3 には0.
1 乃至5.0 重量%のホウ素、あるいは2.0 乃至15.0重量
%のリンを含有させておくことが好ましい。
The intermediate metal layer 3 contains boron in an amount of 0.1 to
When 5.0% by weight or 2.0 to 15.0% by weight of phosphorus is contained, the formation of an oxide film on the surface of the intermediate metal layer 3 is suppressed, and the adhesion between the intermediate metal layer 3 and the circuit conductor 4 is improved. I can do it. Therefore, the intermediate metal layer 3 has 0.
It is preferable to contain 1 to 5.0% by weight of boron or 2.0 to 15.0% by weight of phosphorus.

【0019】更にまた前記中間金属層3 はその厚みが0.
1 μm 未満であると回路導体4 を形成する銅の拡散を完
全に防止することができず、回路導体4 の一部が中間金
属層3 を拡散して配線導体2 に直接接触し、配線導体2
と回路導体4 との密着性が劣化する傾向にあり、また1
0.0μm を越えると中間金属層3 に内部応力によるクラ
ックが発生し、回路導体4 の一部が中間金属層3 のクラ
ックを介して配線導体2に直接接触し、配線導体2 と回
路導体4 との密着性が劣化する傾向にあることから中間
金属層3 の厚みは0.1 乃至10.0μm の範囲としておくこ
とが好ましい。
Further, the intermediate metal layer 3 has a thickness of 0.1 mm.
If the thickness is less than 1 μm, the diffusion of copper forming the circuit conductor 4 cannot be completely prevented, and a part of the circuit conductor 4 diffuses through the intermediate metal layer 3 and directly contacts the wiring conductor 2 to form a wiring conductor. Two
And the circuit conductor 4 tends to deteriorate.
If the thickness exceeds 0.0 μm, a crack occurs due to internal stress in the intermediate metal layer 3, and a part of the circuit conductor 4 directly contacts the wiring conductor 2 via the crack in the intermediate metal layer 3, and the wiring conductor 2 and the circuit conductor 4 It is preferable that the thickness of the intermediate metal layer 3 be in the range of 0.1 to 10.0 μm because the adhesion of the intermediate metal layer tends to deteriorate.

【0020】前記配線導体2 に被着させた中間金属層3
の外表面及び絶縁基体1 の外表面には銅から成る回路導
体4 が被着されており、該回路導体4 には半導体素子等
の能動部品や抵抗器、コンデンサ等の受動部品の各電極
端子が接続される。
The intermediate metal layer 3 attached to the wiring conductor 2
A circuit conductor 4 made of copper is adhered to the outer surface of the substrate and the outer surface of the insulating base 1, and the circuit conductor 4 has electrode terminals of active components such as semiconductor elements and passive components such as resistors and capacitors. Is connected.

【0021】また前記絶縁基体1 の少なくとも回路導体
4 が被着される表面には酸化物膜5が形成されており、
該酸化物膜5 は回路導体4 と絶縁基体1 との被着強度を
強固となし、これによって回路導体4 は絶縁基体1 の表
面に極めて強固に被着する。
Also, at least a circuit conductor of the insulating base 1
An oxide film 5 is formed on the surface on which
The oxide film 5 makes the adhesion strength between the circuit conductor 4 and the insulating substrate 1 strong, whereby the circuit conductor 4 adheres very firmly to the surface of the insulating substrate 1.

【0022】尚、前記酸化物膜5 は絶縁基体1 を大気
中、1000〜1200℃の温度で焼成し、窒化アルミニウムを
酸化アルミニウム(Al2 O 3 ) に変えることによって形
成され、その厚みが0.5 μm 未満であると回路導体4 の
絶縁基体1 に対する被着強度が弱いものとなる傾向にあ
り、また3.0 μm を越えると酸化物膜5 と絶縁基体1 と
の接合強度が低下する傾向にあることから酸化物膜5 の
厚みは0.5 乃至3.0 μmの範囲、より好適には0.8 乃至
2.0 μm の範囲としておくことが好ましい。
The oxide film 5 is formed by sintering the insulating substrate 1 in the air at a temperature of 1000 to 1200 ° C. to convert aluminum nitride to aluminum oxide (Al 2 O 3 ). If it is less than μm, the adhesion strength of the circuit conductor 4 to the insulating substrate 1 tends to be weak, and if it exceeds 3.0 μm, the bonding strength between the oxide film 5 and the insulating substrate 1 tends to decrease. Therefore, the thickness of the oxide film 5 is in the range of 0.5 to 3.0 μm, more preferably 0.8 to 3.0 μm.
It is preferable to set the range to 2.0 μm.

【0023】また前記回路導体4 は銅の粉末に、例えば
PbO 、B 2 O 3 、SiO 2 、Al2 O 3 、Na2 O 、K 2 O 、
CaO 、ZnO 等から成るガラス粉末と有機溶剤、溶媒とを
添加混合して金属ペーストを作り、該金属ペーストをそ
の一部が配線導体2 に被着させた中間金属層3 と接触す
るようにして絶縁基体1 の外表面に印刷塗布し、しかる
後、これを中性雰囲気中、約800 ℃の温度で焼成するこ
とによって絶縁基体1の外表面に被着される。この場
合、配線導体2 の外表面には回路導体4 が拡散し難く、
回路導体4 と濡れ性( 反応性)の良い中間金属層3 が介
在されているため配線導体2 に回路導体4 を密着性よ
く、且つ両者の電気的導通を良好として被着させること
ができる。
The circuit conductor 4 is made of copper powder, for example,
PbO, B 2 O 3, SiO 2, Al 2 O 3, Na 2 O, K 2 O,
A glass paste made of CaO, ZnO, or the like, an organic solvent, and a solvent are added and mixed to form a metal paste, and the metal paste is brought into contact with the intermediate metal layer 3 that is partially adhered to the wiring conductor 2. The outer surface of the insulating substrate 1 is applied by printing, and then fired in a neutral atmosphere at a temperature of about 800 ° C. to adhere to the outer surface of the insulating substrate 1. In this case, the circuit conductor 4 hardly spreads on the outer surface of the wiring conductor 2,
Since the intermediate metal layer 3 having good wettability (reactivity) is interposed between the circuit conductor 4 and the circuit conductor 4, the circuit conductor 4 can be adhered to the wiring conductor 2 with good adhesion and good electrical continuity between them.

【0024】更に前記回路導体4 に含まれるガラスはそ
の添加量が0.2 重量%未満であると回路導体4 を絶縁基
体1 に強固に被着させるのが困難となる傾向にあり、ま
た8.0 重量%を越えると回路導体4 の半田濡れ性( 反応
性) が劣化し、回路導体4 に半導体素子や抵抗器等を半
田を介し強固に接合させるのが困難となる傾向にあるこ
とから回路導体4 に添加含有されるガラスはその添加量
を0.2 乃至8.0 重量%の範囲としておくことが好まし
い。
Further, if the amount of glass contained in the circuit conductor 4 is less than 0.2% by weight, it becomes difficult to firmly adhere the circuit conductor 4 to the insulating base 1, and 8.0% by weight. When the temperature exceeds the limit, the solder wettability (reactivity) of the circuit conductor 4 deteriorates, and it becomes difficult to firmly join a semiconductor element or a resistor to the circuit conductor 4 via solder. It is preferable that the amount of glass to be added is in the range of 0.2 to 8.0% by weight.

【0025】かくしてこの回路基板はその表面に半導体
素子や抵抗器、コンデンサ等が載置され、該半導体素子
等を回路導体に半田を介し接合させることによって混成
集積回路装置となる。
Thus, the circuit board has a semiconductor device, a resistor, a capacitor, and the like mounted on the surface thereof, and the semiconductor device and the like are joined to circuit conductors via solder to form a hybrid integrated circuit device.

【0026】尚、本発明は上述の実施例に限定されるも
のではなく、本発明の要旨を逸脱しない範囲であれば種
々の変更は可能であり、例えば回路導体4の外表面に金
(Au)から成る被覆層を0.1 乃至5.0 μm の厚みに層着さ
せておくと回路導体4 の酸化腐食を有効に防止するとと
もに半導体素子や抵抗器、コンデンサ等の電極端子を回
路導体4 により強固に接合させることができる。
It should be noted that the present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the scope of the present invention.
If a coating layer made of (Au) is applied to a thickness of 0.1 to 5.0 μm, oxidation corrosion of the circuit conductor 4 is effectively prevented, and the electrode terminals of semiconductor elements, resistors, capacitors, etc. are more firmly connected to the circuit conductor 4. Can be joined.

【0027】また回路導体4 の外表面にニッケル(Ni)、
鉄(Fe)、マンガン(Mn)の少なくとも1 種を主成分とする
被覆層を0.2 乃至12.0μm の厚みに層着させておくと該
被覆層が回路導体4 に半導体素子やコンデンサ等の電極
端子を半田を介して接合させる際、回路導体4 と半田と
の濡れ性を改善し、回路導体4 に半導体素子やコンデン
サ等の電極端子を強固に接合させることができる。
The outer surface of the circuit conductor 4 has nickel (Ni),
If a coating layer containing at least one of iron (Fe) and manganese (Mn) as a main component is applied to a thickness of 0.2 to 12.0 μm, the coating layer is applied to the circuit conductor 4 so that electrode terminals of a semiconductor element, a capacitor or the like can be formed. When soldering is performed via solder, the wettability between the circuit conductor 4 and the solder is improved, and electrode terminals such as semiconductor elements and capacitors can be firmly joined to the circuit conductor 4.

【0028】[0028]

【発明の効果】本発明の回路基板によれば絶縁基体を熱
伝導率が高い窒化アルミニウム質焼結体で形成したこと
から発熱量が多い半導体素子を搭載しても該半導体素子
の発する熱は絶縁基体が良好に吸収し、その結果、半導
体素子を常に低温として熱破壊させたり、特性に熱変化
を生じ、誤動作させたりすることはない。
According to the circuit board of the present invention, since the insulating substrate is formed of an aluminum nitride sintered body having a high thermal conductivity, even when a semiconductor element having a large amount of heat is mounted, the heat generated by the semiconductor element can be reduced. As a result, the semiconductor substrate is not absorbed by the insulating substrate, and as a result, the semiconductor element is not always thermally degraded at a low temperature, or a characteristic does not change and a malfunction does not occur.

【0029】また配線導体と回路導体との接触部にニッ
ケル、コバルトの少なくとも1 種とタングステン、モリ
ブデンの少なくとも1 種の合金から成る中間金属層を配
したことから配線導体と回路導体とを両者間の電気的導
通を良好として密着性良く被着させることができる。
Further, since an intermediate metal layer made of at least one kind of nickel and cobalt and at least one kind of alloy of tungsten and molybdenum is disposed at a contact portion between the wiring conductor and the circuit conductor, the wiring conductor and the circuit conductor are separated from each other. Can be adhered with good adhesion and good electrical conduction.

【0030】更に絶縁基体の少なくとも回路導体が被着
される部位に酸化物膜を形成したこらとから絶縁基体に
回路導体を極めて強固に被着させることもできる。
Further, since an oxide film is formed on at least a portion of the insulating base on which the circuit conductor is to be attached, the circuit conductor can be very firmly attached to the insulating base.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明にかかる回路基板を説明するための一部
拡大断面図である。
FIG. 1 is a partially enlarged cross-sectional view for explaining a circuit board according to the present invention.

【符号の説明】[Explanation of symbols]

1・・・絶縁基体 2・・・配線導体 3・・・中間金属層 4・・・回路導体 5・・・酸化物膜 DESCRIPTION OF SYMBOLS 1 ... Insulating base 2 ... Wiring conductor 3 ... Intermediate metal layer 4 ... Circuit conductor 5 ... Oxide film

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】窒化アルミニウム質焼結体から成り、タン
グステン、モリブデンの少なくとも1種から成る配線導
体を設けた絶縁基体の外表面に、銅から成る回路導体を
その一部が前記配線導体と接触するようにして被着させ
た回路基板であって、前記絶縁基体は少なくとも配線導
体が被着される表面に酸化物膜を有し、且つ配線導体と
回路導体との接触部に、ニッケル、コバルトの少なくと
も1種とタングステン、モリブデンの少なくとも1種の
合金から成る中間金属層が介在していることを特徴とす
る回路基板。
1. A circuit conductor made of copper is formed on an outer surface of an insulating substrate provided with a wiring conductor made of an aluminum nitride sintered body and made of at least one of tungsten and molybdenum. Wherein the insulating substrate has an oxide film on at least a surface on which the wiring conductor is to be deposited, and nickel, cobalt, or the like is provided at a contact portion between the wiring conductor and the circuit conductor. And an intermediate metal layer made of an alloy of at least one of tungsten and molybdenum.
【請求項2】前記中間金属層はタングステン、モリブデ
ンの少なくとも1種の合計重量がニッケル、コバルトの
少なくとも1種の合計重量100 に対し、2.0 乃至50.0%
であることを特徴とする請求項1 に記載の回路基板。
2. The intermediate metal layer according to claim 1, wherein the total weight of at least one of tungsten and molybdenum is 2.0 to 50.0% based on 100 of the total weight of at least one of nickel and cobalt.
The circuit board according to claim 1, wherein
【請求項3】前記中間金属層の厚みが0.1 乃至10.0μm
であることを特徴とする請求項1に記載の回路基板。
3. The intermediate metal layer has a thickness of 0.1 to 10.0 μm.
The circuit board according to claim 1, wherein
JP21198691A 1991-08-23 1991-08-23 Circuit board Expired - Lifetime JP2703426B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21198691A JP2703426B2 (en) 1991-08-23 1991-08-23 Circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21198691A JP2703426B2 (en) 1991-08-23 1991-08-23 Circuit board

Publications (2)

Publication Number Publication Date
JPH0555718A JPH0555718A (en) 1993-03-05
JP2703426B2 true JP2703426B2 (en) 1998-01-26

Family

ID=16615001

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21198691A Expired - Lifetime JP2703426B2 (en) 1991-08-23 1991-08-23 Circuit board

Country Status (1)

Country Link
JP (1) JP2703426B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000182682A (en) 1998-12-18 2000-06-30 Sumitomo Wiring Syst Ltd Electric junction box
JP4858632B1 (en) * 2010-07-02 2012-01-18 パナソニック株式会社 Water heater
JP4858633B1 (en) * 2010-07-23 2012-01-18 パナソニック株式会社 Water heater

Also Published As

Publication number Publication date
JPH0555718A (en) 1993-03-05

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