JP2670020B2 - 照明ユニット - Google Patents

照明ユニット

Info

Publication number
JP2670020B2
JP2670020B2 JP6296687A JP29668794A JP2670020B2 JP 2670020 B2 JP2670020 B2 JP 2670020B2 JP 6296687 A JP6296687 A JP 6296687A JP 29668794 A JP29668794 A JP 29668794A JP 2670020 B2 JP2670020 B2 JP 2670020B2
Authority
JP
Japan
Prior art keywords
lighting
illumination
housing
lighting unit
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP6296687A
Other languages
English (en)
Japanese (ja)
Other versions
JPH07201728A (ja
Inventor
カタリナ フベルタス ムルケンス ヨハネス
コルネリス ヨセフス アントニウス ファン ヘイニンヘン ニコラス
マリー ドミニカス ストゥエルデレーヤー ヤドカス
Original Assignee
アーエスエム リソグラフィ ベスローテン フェンノートシャップ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by アーエスエム リソグラフィ ベスローテン フェンノートシャップ filed Critical アーエスエム リソグラフィ ベスローテン フェンノートシャップ
Publication of JPH07201728A publication Critical patent/JPH07201728A/ja
Application granted granted Critical
Publication of JP2670020B2 publication Critical patent/JP2670020B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP6296687A 1993-12-03 1994-11-30 照明ユニット Expired - Fee Related JP2670020B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
BE9301333A BE1007851A3 (nl) 1993-12-03 1993-12-03 Belichtingseenheid met een voorziening tegen vervuiling van optische componenten en een fotolithografisch apparaat voorzien van een dergelijke belichtingseenheid.
BE09301333 1993-12-03

Publications (2)

Publication Number Publication Date
JPH07201728A JPH07201728A (ja) 1995-08-04
JP2670020B2 true JP2670020B2 (ja) 1997-10-29

Family

ID=3887602

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6296687A Expired - Fee Related JP2670020B2 (ja) 1993-12-03 1994-11-30 照明ユニット

Country Status (6)

Country Link
US (1) US5508528A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0663618B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JP2670020B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BE (1) BE1007851A3 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE69410428T2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
TW (1) TW289835B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6819396B1 (en) 1999-11-16 2004-11-16 Canon Kabushiki Kaisha Exposure apparatus, and device manufacturing method

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3094902B2 (ja) * 1996-03-27 2000-10-03 ウシオ電機株式会社 紫外線照射装置
KR100267155B1 (ko) 1996-09-13 2000-10-16 아끼구사 나오유끼 반도체 장치의 제조 방법 및 제조 장치
JPH10116766A (ja) 1996-10-11 1998-05-06 Canon Inc 露光装置及びデバイス製造方法
AU7552498A (en) * 1997-06-10 1998-12-30 Nikon Corporation Optical device, method of cleaning the same, projection aligner, and method of producing the same
US5973764A (en) * 1997-06-19 1999-10-26 Svg Lithography Systems, Inc. Vacuum assisted debris removal system
JP4534260B2 (ja) * 1997-07-22 2010-09-01 株式会社ニコン 露光方法、露光装置、その製造方法及び光洗浄方法
WO1999010717A1 (en) 1997-08-22 1999-03-04 Morlock Richard C Sensor housing for uv curing chamber
US6313953B1 (en) * 1999-01-15 2001-11-06 Donaldson Company, Inc. Gas chemical filtering for optimal light transmittance; and methods
DE10109031A1 (de) * 2001-02-24 2002-09-05 Zeiss Carl Optisches Strahlführungssystem und Verfahren zur Kontaminationsverhinderung optischer Komponenten hiervon
US6732856B2 (en) * 2001-02-27 2004-05-11 Maryland Wire Belts, Inc. Modular conveyor belt
KR100607179B1 (ko) * 2004-05-28 2006-08-01 삼성전자주식회사 웨이퍼 에지 노광장치
US7381950B2 (en) * 2004-09-29 2008-06-03 Texas Instruments Incorporated Characterizing dimensions of structures via scanning probe microscopy
JP2006222130A (ja) * 2005-02-08 2006-08-24 Nsk Ltd 露光装置
US8507879B2 (en) * 2006-06-08 2013-08-13 Xei Scientific, Inc. Oxidative cleaning method and apparatus for electron microscopes using UV excitation in an oxygen radical source
US20070284541A1 (en) * 2006-06-08 2007-12-13 Vane Ronald A Oxidative cleaning method and apparatus for electron microscopes using UV excitation in a oxygen radical source
NL1032674C2 (nl) * 2006-10-13 2008-04-15 Stichting Fund Ond Material Stralingsbron voor elektromagnetische straling met een golflengte in het extreem ultraviolet (XUV) golflengtegebied.
US8349125B2 (en) * 2009-07-24 2013-01-08 Xei Scientific, Inc. Cleaning device for transmission electron microscopes
US9453801B2 (en) 2012-05-25 2016-09-27 Kla-Tencor Corporation Photoemission monitoring of EUV mirror and mask surface contamination in actinic EUV systems
US9662688B2 (en) 2012-07-09 2017-05-30 Kla-Tencor Corporation Apparatus and method for cross-flow purge for optical components in a chamber

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3949258A (en) 1974-12-05 1976-04-06 Baxter Laboratories, Inc. Method and means for suppressing ozone generated by arc lamps

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4485123A (en) * 1982-02-12 1984-11-27 Union Carbide Corporation Process for producing textured coatings
JPS59178646U (ja) * 1983-05-16 1984-11-29 シャープ株式会社 露光装置
US5079187A (en) * 1987-12-07 1992-01-07 The Regents Of The University Of California Method for processing semiconductor materials
US5235995A (en) * 1989-03-27 1993-08-17 Semitool, Inc. Semiconductor processor apparatus with dynamic wafer vapor treatment and particulate volatilization
JP2783575B2 (ja) * 1989-02-10 1998-08-06 キヤノン株式会社 回路製造のための露光方法及び露光装置
NL8900991A (nl) * 1989-04-20 1990-11-16 Asm Lithography Bv Apparaat voor het afbeelden van een maskerpatroon op een substraat.
NL9000503A (nl) * 1990-03-05 1991-10-01 Asm Lithography Bv Apparaat en werkwijze voor het afbeelden van een maskerpatroon op een substraat.
DE4022981A1 (de) * 1990-07-19 1992-01-23 Philips Patentverwaltung Verfahren zur reduktion des farbkantenflackerns in farbfernsehsignalen
NL9100215A (nl) * 1991-02-07 1992-09-01 Asm Lithography Bv Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat.
NL9100410A (nl) * 1991-03-07 1992-10-01 Asm Lithography Bv Afbeeldingsapparaat voorzien van een focusfout- en/of scheefstandsdetectie-inrichting.
US5166530A (en) * 1991-12-20 1992-11-24 General Signal Corporation Illuminator for microlithographic integrated circuit manufacture
US5387800A (en) * 1992-08-19 1995-02-07 Dymax Corporation Prefocused lamp and reflector assembly

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3949258A (en) 1974-12-05 1976-04-06 Baxter Laboratories, Inc. Method and means for suppressing ozone generated by arc lamps

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6819396B1 (en) 1999-11-16 2004-11-16 Canon Kabushiki Kaisha Exposure apparatus, and device manufacturing method

Also Published As

Publication number Publication date
BE1007851A3 (nl) 1995-11-07
DE69410428T2 (de) 1998-11-26
TW289835B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1996-11-01
DE69410428D1 (de) 1998-06-25
US5508528A (en) 1996-04-16
EP0663618B1 (en) 1998-05-20
JPH07201728A (ja) 1995-08-04
EP0663618A1 (en) 1995-07-19

Similar Documents

Publication Publication Date Title
JP2670020B2 (ja) 照明ユニット
TWI230843B (en) Exposure method and device
EP0660188B1 (en) Lens system with lens elements arranged in a gas-filled holder, and photolithographic apparatus including such a system
CN101506737B (zh) 用于光刻设备的吸杂装置和清洁结构以及清洁表面的方法
KR100333235B1 (ko) 광학조사장치
US7518132B2 (en) Light source apparatus, exposure apparatus and device fabrication method
JPH1114876A (ja) 光学構造体、その光学構造体を組み込んだ投影露光用光学系及び投影露光装置
US20050157278A1 (en) Exposure apparatus and exposure method
US6795166B2 (en) Illuminator, exposure apparatus, and method for fabricating device using the same
US7116397B2 (en) Exposure apparatus and device manufacturing method
JP4035510B2 (ja) ガス洗浄システムを含むリソグラフィ装置
TW452851B (en) Exposure method and apparatus
US5166530A (en) Illuminator for microlithographic integrated circuit manufacture
JP2007517397A (ja) リソグラフィ装置及びデバイス製造方法
US6108126A (en) Illuminating apparatus
US20040189963A1 (en) Exposure apparatus and method
US7760323B2 (en) Exposure apparatus and method of manufacturing device
US7455880B2 (en) Optical element fabrication method, optical element, exposure apparatus, device fabrication method
JP2005064210A (ja) 露光方法、該露光方法を利用した電子デバイスの製造方法及び露光装置
WO2003105203A1 (ja) 露光装置及び露光方法
WO2000019271A1 (fr) Photomasque et procede d'exposition
TW559892B (en) Lens barrel, exposure device, and method of manufacturing device
WO2002065183A1 (fr) Barillet de lentille, dispositif d'exposition et procede de fabrication de ce dispositif
JP2001093796A (ja) 投影露光装置
JP2003115433A (ja) 露光方法及び露光装置

Legal Events

Date Code Title Description
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 19970603

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080704

Year of fee payment: 11

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080704

Year of fee payment: 11

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090704

Year of fee payment: 12

LAPS Cancellation because of no payment of annual fees