TW289835B - - Google Patents

Info

Publication number
TW289835B
TW289835B TW083110824A TW83110824A TW289835B TW 289835 B TW289835 B TW 289835B TW 083110824 A TW083110824 A TW 083110824A TW 83110824 A TW83110824 A TW 83110824A TW 289835 B TW289835 B TW 289835B
Authority
TW
Taiwan
Application number
TW083110824A
Original Assignee
Asm Lithography Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asm Lithography Bv filed Critical Asm Lithography Bv
Application granted granted Critical
Publication of TW289835B publication Critical patent/TW289835B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
TW083110824A 1993-12-03 1994-11-22 TW289835B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BE9301333A BE1007851A3 (nl) 1993-12-03 1993-12-03 Belichtingseenheid met een voorziening tegen vervuiling van optische componenten en een fotolithografisch apparaat voorzien van een dergelijke belichtingseenheid.

Publications (1)

Publication Number Publication Date
TW289835B true TW289835B (zh) 1996-11-01

Family

ID=3887602

Family Applications (1)

Application Number Title Priority Date Filing Date
TW083110824A TW289835B (zh) 1993-12-03 1994-11-22

Country Status (6)

Country Link
US (1) US5508528A (zh)
EP (1) EP0663618B1 (zh)
JP (1) JP2670020B2 (zh)
BE (1) BE1007851A3 (zh)
DE (1) DE69410428T2 (zh)
TW (1) TW289835B (zh)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3094902B2 (ja) * 1996-03-27 2000-10-03 ウシオ電機株式会社 紫外線照射装置
KR100267155B1 (ko) 1996-09-13 2000-10-16 아끼구사 나오유끼 반도체 장치의 제조 방법 및 제조 장치
JPH10116766A (ja) * 1996-10-11 1998-05-06 Canon Inc 露光装置及びデバイス製造方法
WO1998057213A1 (fr) * 1997-06-10 1998-12-17 Nikon Corporation Dispositif optique, son procede de nettoyage, dispositif d'alignement de projection et son procede de fabrication
US5973764A (en) * 1997-06-19 1999-10-26 Svg Lithography Systems, Inc. Vacuum assisted debris removal system
JP4534260B2 (ja) * 1997-07-22 2010-09-01 株式会社ニコン 露光方法、露光装置、その製造方法及び光洗浄方法
US6201250B1 (en) 1997-08-22 2001-03-13 Richard C. Morlock Sensor housing for UV curing chamber
US6313953B1 (en) * 1999-01-15 2001-11-06 Donaldson Company, Inc. Gas chemical filtering for optimal light transmittance; and methods
JP2001144003A (ja) 1999-11-16 2001-05-25 Canon Inc 露光装置およびデバイス製造方法
DE10109031A1 (de) * 2001-02-24 2002-09-05 Zeiss Carl Optisches Strahlführungssystem und Verfahren zur Kontaminationsverhinderung optischer Komponenten hiervon
US6732856B2 (en) * 2001-02-27 2004-05-11 Maryland Wire Belts, Inc. Modular conveyor belt
KR100607179B1 (ko) * 2004-05-28 2006-08-01 삼성전자주식회사 웨이퍼 에지 노광장치
US7381950B2 (en) * 2004-09-29 2008-06-03 Texas Instruments Incorporated Characterizing dimensions of structures via scanning probe microscopy
JP2006222130A (ja) * 2005-02-08 2006-08-24 Nsk Ltd 露光装置
US20070284541A1 (en) * 2006-06-08 2007-12-13 Vane Ronald A Oxidative cleaning method and apparatus for electron microscopes using UV excitation in a oxygen radical source
US8507879B2 (en) * 2006-06-08 2013-08-13 Xei Scientific, Inc. Oxidative cleaning method and apparatus for electron microscopes using UV excitation in an oxygen radical source
NL1032674C2 (nl) * 2006-10-13 2008-04-15 Stichting Fund Ond Material Stralingsbron voor elektromagnetische straling met een golflengte in het extreem ultraviolet (XUV) golflengtegebied.
US8349125B2 (en) * 2009-07-24 2013-01-08 Xei Scientific, Inc. Cleaning device for transmission electron microscopes
US9453801B2 (en) 2012-05-25 2016-09-27 Kla-Tencor Corporation Photoemission monitoring of EUV mirror and mask surface contamination in actinic EUV systems
US9662688B2 (en) 2012-07-09 2017-05-30 Kla-Tencor Corporation Apparatus and method for cross-flow purge for optical components in a chamber

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3949258A (en) * 1974-12-05 1976-04-06 Baxter Laboratories, Inc. Method and means for suppressing ozone generated by arc lamps
US4485123A (en) * 1982-02-12 1984-11-27 Union Carbide Corporation Process for producing textured coatings
JPS59178646U (ja) * 1983-05-16 1984-11-29 シャープ株式会社 露光装置
US5079187A (en) * 1987-12-07 1992-01-07 The Regents Of The University Of California Method for processing semiconductor materials
US5235995A (en) * 1989-03-27 1993-08-17 Semitool, Inc. Semiconductor processor apparatus with dynamic wafer vapor treatment and particulate volatilization
JP2783575B2 (ja) * 1989-02-10 1998-08-06 キヤノン株式会社 回路製造のための露光方法及び露光装置
NL8900991A (nl) * 1989-04-20 1990-11-16 Asm Lithography Bv Apparaat voor het afbeelden van een maskerpatroon op een substraat.
NL9000503A (nl) * 1990-03-05 1991-10-01 Asm Lithography Bv Apparaat en werkwijze voor het afbeelden van een maskerpatroon op een substraat.
DE4022981A1 (de) * 1990-07-19 1992-01-23 Philips Patentverwaltung Verfahren zur reduktion des farbkantenflackerns in farbfernsehsignalen
NL9100215A (nl) * 1991-02-07 1992-09-01 Asm Lithography Bv Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat.
NL9100410A (nl) * 1991-03-07 1992-10-01 Asm Lithography Bv Afbeeldingsapparaat voorzien van een focusfout- en/of scheefstandsdetectie-inrichting.
US5166530A (en) * 1991-12-20 1992-11-24 General Signal Corporation Illuminator for microlithographic integrated circuit manufacture
US5387800A (en) * 1992-08-19 1995-02-07 Dymax Corporation Prefocused lamp and reflector assembly

Also Published As

Publication number Publication date
DE69410428T2 (de) 1998-11-26
JPH07201728A (ja) 1995-08-04
US5508528A (en) 1996-04-16
JP2670020B2 (ja) 1997-10-29
DE69410428D1 (de) 1998-06-25
EP0663618A1 (en) 1995-07-19
EP0663618B1 (en) 1998-05-20
BE1007851A3 (nl) 1995-11-07

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