JP2667149B2 - LCD panel - Google Patents

LCD panel

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Publication number
JP2667149B2
JP2667149B2 JP8533786A JP8533786A JP2667149B2 JP 2667149 B2 JP2667149 B2 JP 2667149B2 JP 8533786 A JP8533786 A JP 8533786A JP 8533786 A JP8533786 A JP 8533786A JP 2667149 B2 JP2667149 B2 JP 2667149B2
Authority
JP
Japan
Prior art keywords
transparent
common electrode
film
ito film
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP8533786A
Other languages
Japanese (ja)
Other versions
JPS62240933A (en
Inventor
修司 近藤
勇 北廣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP8533786A priority Critical patent/JP2667149B2/en
Publication of JPS62240933A publication Critical patent/JPS62240933A/en
Application granted granted Critical
Publication of JP2667149B2 publication Critical patent/JP2667149B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】 産業上の利用分野 本発明は液晶表示パネル(以下、LCDパネルと略称す
る。)、特にTFT等を用いたアクティブマトリックス方
式の大型LCD表示パネルに関するものである。 従来の技術 TFT等を用いたアクティブマトリックス方式LCDパネル
は、第4図,第5図に示すように、主面上に透明な画素
電極2、同画素電極2を制御するTFT等の制御素子3、
さらに制御素子群を選択駆動するための走査信号線パタ
ーン4、及び画像信号線パターン5を有するガラス等か
らなる透明主基板1と、ガラス等の透明基板の主面全域
に透明導電性膜、所謂ITO膜6を被着した共通電極用透
明基板7を10μm前後の間隔で近接配置し、両基板1,7
の間隙部8に液晶9を注入封止することによって得てい
る。なお、図中において10はカラー表示パネルの場合の
カラーフィルター、11,12はそれぞれ走査信号線パター
ン4及び画像信号線パターン5の外部引き出し用電極端
子部である。 発明が解決しようとする問題点 LCDパネルに用いる透明な対向共通電極は、一般的に
は前述のように透明基板7上に透明導電性薄膜としてIT
O膜6を使用するが、このITO膜6は光透過性を考慮した
場合薄く形成することが好ましく、通常100Å〜1000Å
程度の膜厚で形成してあり、そのシート抵抗は数10〜数
100Ω/□程度である。また、対向共通電極であるITO膜
6の外部回路との接続電極部分は、LCDパネルの構成
上、そのパネルのコーナ部分等の隅部に設けられること
が多い。 LCDパネルのサイズが小さい場合には、上記のような
方法で対向共通電極を構成しても、ITO膜6内での拡が
り抵抗の影響は実用上差し障りはないが、LCDパネルの
サイズが大型化するに従って、ITO膜6内における拡が
り抵抗が画像品質に悪影響を及ぼす要因となる。即ち、
外部回路接続電極部の近傍と、同部から最も離れた部位
では膜抵抗が異なり、上記ITO膜6を対向共通電極とし
た場合同膜面内の電位に差が生じ、LCDパネル内の各単
位画素部の表示特性にむらができ、均一な画素像を有す
るLCDパネルの提供に支障をきたすことになる。特に、
第6図のように複数枚の大型のLCDパネル13を用い、LCD
パネル相互間を電気的物理的に接合し、接合後に外周部
位にある電極端子部11,12、及び対向共通電極の外部接
続用端子部14を、外部制御駆動回路と接続して構成する
超大型LCD表示システムでは、その構成上対向共通電極
の外部接続部位が限定されるため、前述のITO膜6の膜
抵抗がより大きな問題となる。 この問題を解決するための手段として、ITO膜6のシ
ート抵抗を下げることが考えられる。しかし、シート抵
抗を下げるためにはITO膜6の膜厚を厚くするか、もし
くはITO膜6の組成即ち膜質を変える等の方策を講じる
必要があり、何れの場合にも通常はITO膜6の光透過率
を下げるため、透明導電性膜としての一方の機能を損な
うことになる。そこで本発明はITO膜6の光透過率を下
げることなく、そのシート抵抗を下げることを目的とす
る。 問題点を解決するための手段 そしてこの目的を達成するために本発明は、透明主基
板と、この透明主基板に所定間隔をおいて対向配置した
共通電極用透明基板と、これらの透明主基板と共通電極
用透明基板間に封入した液晶とを備え、前記透明主基板
の液晶側の面には、複数の透明な画素電極と、これらの
画素電極の制御を行う制御素子とを設け、前記共通電極
用透明基板の液晶側の面には、全面に透明導電膜を設
け、この透明導電膜の前記制御素子に対向する部分の膜
厚を、画素電極に対向する部分の膜厚より厚くしたもの
である。 作用 以上の構成とすれば透明導電膜に膜厚の厚い部分を設
けるので全体的なシート抵抗を下げることができ、その
結果としてパネルの表示特性のむらが発生せず、またこ
の膜厚の厚い部分は画素電極を制御する制御素子に対向
する部分で本来非透光部となっている部分であるので光
透過率を低下させることもない。 実施例 第1図は本発明の一実施例品のLCDパネルの完成時の
断面構造を示す部分断面拡大図である。また、第2図A
〜Dは本発明の対向共通透明電極の製造法を示す拡大断
面図である。なお、各図面はそれぞれ説明の便宜上、寸
法は任意に拡大してある。また、従来例と同一箇所には
同一番号を付してある。 以下、図面により詳述する。 まず、第2図Aのように共通電極用透明基板7の主面
には透明な対向共通電極としてITO膜6を全面に数1000
Å以上の膜厚で被着する。次に、第2図Bのように通常
の写真食刻プロセスと同様の手法により上記ITO膜6上
にホトレジストパターン15を形成する。この時、ホトレ
ジストパターン15のパターン巾Wiは、第1図(第5図)
に示す主基板1上に形成したTFT等の制御素子3を含む
X列及びY行の制御配線パターンが形成する非透光部の
巾Wp、あるいはカラーフィルター10のブラックストライ
プ16の巾Wbと同等、もしくはWp、Wb>Wiに設定する。ま
た、パターンピッチPiは同じく主基板1上のX列及びY
行の制御配線パターンのピッチP1,P2(第5図)と同一
となるように、換言すれば第5図の主基板1上の平面パ
ターン形状と同一形状の格子状パターンをホトレジスト
パターン15で形成する。 次に、第2図Cのようにホトレジストパターン15をマ
スクとして透光領域となる部位のITO膜6の膜厚を選択
的に減少せしめ、同部位ITO膜を1000Å以下の膜厚の薄
膜層ITO膜6A化した後、ホトレジストパターン15を除去
すればITO膜6は第2図Dのように、光透過を重視した
薄膜層のITO膜6A、領域と導電性を重視した厚膜層のITO
膜6領域の2層からなるITO膜電極とすることができ
る。 尚、格子状の低抵抗化ITO膜(薄膜層)6Aは上記の例
のように格子状に配置する以外に、LCDパネルの形状に
応じて縦あるいは横の縞状に配置したものであってもよ
い。 以上のようにして製造した透明対向共通電極(ITO
膜)6,6Aを有する共通電極用透明基板7を、第1図に示
すようにスペーサ17を介して10μm程度の間隙で機能素
子をその主面に形成してある透明主基板1上に近接載置
し、同間隙部8に液晶9を注入封止することによりLCD
パネルが得られる。第1図でも明らかなように本発明の
製造法による共通電極用透明基板7を用いたLCDパネル
では、光源(図示せず)からの透過光18を制御する画素
領域19の透明対向共通電極のITO膜6Aは薄いため、同部
での透過光の吸収による損失を低くすることができると
共に、制御素子3部等が形成する非透過領域20に対向す
る部位のITO膜6は厚膜の低抵抗化層として形成してあ
るため、透明対向共通電極膜の面抵抗は低くすることが
できる。 さらに、より簡易化した構成の実施例としては、共通
電極用透明基板7の主面全域に1000Å以下のITO膜を形
成し、このITO膜の外周辺域、即ち共通電極用透明基板
7の外周辺部の光の非透過領域部には、数1000Å以上の
膜厚の高導電性ITO膜層を形成した2層構造のITO膜電極
となすことにより、前述の実施例1,2に比較すれば、面
抵抗は高くなるが、外周部に高導電性電極を有する構造
の共通電極用透明電極となるため、従来例に比較して膜
面抵抗は減少し、画質の向上を図ることができる。 第3図A〜Eは本発明の他の実施例の対向共通電極
(ITO膜6)の製造法を示す断面略図である。 まず、共通電極用透明基板7の主面全面にITO膜6を
数1000Å以上の膜厚で被着する(第3図A)。次に、先
の実施例と同様に上記ITO膜6上に所定のパターン形状
によるホトレジストパターン15を形成し(第3図B)、
同ホトレジストパターン15をマスクとしてITO膜6をエ
ッチングした後(第3図C)、ホトレジストパターン15
を除去し主面上に所定の形状の厚膜ITO膜6パターンを
形成する(第3図D)。 しかる後、再度共通電極用透明基板7の主面にITO膜6
Aを数100Å〜1000Å程度の膜厚で全面に被着すれば、第
3図Eのように共通電極用透明基板7の主面上には膜厚
の異なる2種のITO膜6,6Aが形成される。そして、以降
第1の実施例と同様に上記共通電極用透明基板7を用い
てLEDパネルを製造すれば、先の実施例と同じ効果を持
ったLCDパネルと為すことができる。 発明の効果 以上のように本発明は、透明主基板と、この透明主基
板に所定間隔をおいて対向配置した共通電極用透明基板
と、これらの透明主基板と共通電極用透明基板間に封入
した液晶とを備え、前記透明主基板の液晶側の面には、
複数の透明な画素電極と、これらの画素電極の制御を行
う制御素子とを設け、前記共通電極用透明基板の液晶側
の面には、全面に透明導電膜を設け、この透明導電膜の
前記制御素子に対向する部分の膜厚を、画素電極に対向
する部分の膜厚より厚くしたものである。 そして以上の構成とすれば透明導電膜に膜厚の厚い部
分を設けるので全体的なシート抵抗を下げることがで
き、その結果としてパネルの表示特性のむらが発生せ
ず、またこの膜厚の厚い部分は画素電極を制御する制御
素子に対向する部分で本来非透光部となっている部分で
あるので光透過率を低下させることもない。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display panel (hereinafter abbreviated as an LCD panel), and particularly to an active matrix type large LCD display panel using a TFT or the like. 2. Description of the Related Art As shown in FIG. 4 and FIG. 5, an active matrix type LCD panel using a TFT or the like has a transparent pixel electrode 2 on a main surface and a control element 3 such as a TFT for controlling the pixel electrode 2. ,
Further, a transparent main substrate 1 made of glass or the like having a scanning signal line pattern 4 and an image signal line pattern 5 for selectively driving the control element group, and a transparent conductive film, so-called, on the entire main surface of the transparent substrate such as glass. A transparent substrate 7 for a common electrode on which an ITO film 6 is adhered is closely arranged at an interval of about 10 μm.
Is obtained by injecting and sealing a liquid crystal 9 into the gap portion 8 of FIG. In the drawing, reference numeral 10 denotes a color filter in the case of a color display panel, and reference numerals 11 and 12 denote external lead electrode terminal portions of the scanning signal line pattern 4 and the image signal line pattern 5, respectively. Problems to be Solved by the Invention A transparent common electrode used for an LCD panel is generally formed on a transparent substrate 7 by a transparent conductive thin film as described above.
Although an O film 6 is used, it is preferable that the ITO film 6 is formed thin in consideration of light transmittance.
It is formed with a film thickness of about
It is about 100Ω / □. In addition, a connection electrode portion of the ITO film 6 which is an opposing common electrode with an external circuit is often provided at a corner portion such as a corner portion of the panel due to the configuration of the LCD panel. When the size of the LCD panel is small, even if the opposing common electrode is configured by the above method, the spread resistance in the ITO film 6 does not hinder the practical use, but the size of the LCD panel increases. As a result, the spreading resistance in the ITO film 6 becomes a factor that adversely affects image quality. That is,
The film resistance is different between the vicinity of the external circuit connection electrode portion and the portion farthest from the external circuit connection electrode portion. When the ITO film 6 is used as a counter common electrode, a difference occurs in the electric potential in the same film surface, and each unit in the LCD panel is different. The display characteristics of the pixel portion are uneven, which hinders the provision of an LCD panel having a uniform pixel image. Especially,
Using a plurality of large LCD panels 13 as shown in FIG.
An ultra-large panel that electrically connects the panels electrically and physically, and connects the electrode terminals 11 and 12 on the outer periphery and the external connection terminal 14 of the opposing common electrode to an external control drive circuit after bonding. In the LCD display system, since the external connection portion of the opposing common electrode is limited due to its configuration, the above-described film resistance of the ITO film 6 becomes a larger problem. As a means for solving this problem, it is conceivable to lower the sheet resistance of the ITO film 6. However, in order to reduce the sheet resistance, it is necessary to increase the thickness of the ITO film 6, or to take a measure such as changing the composition of the ITO film 6, that is, the film quality. In order to reduce the light transmittance, one function as a transparent conductive film is impaired. Therefore, an object of the present invention is to reduce the sheet resistance of the ITO film 6 without lowering the light transmittance. Means for Solving the Problems And in order to achieve this object, the present invention provides a transparent main substrate, a transparent substrate for a common electrode, which is disposed facing the transparent main substrate at a predetermined interval, and a transparent main substrate And a liquid crystal sealed between the transparent substrates for the common electrode, and a plurality of transparent pixel electrodes and a control element for controlling these pixel electrodes are provided on the liquid crystal side surface of the transparent main substrate, On the liquid crystal side surface of the common electrode transparent substrate, a transparent conductive film was provided on the entire surface, and the film thickness of the portion of the transparent conductive film facing the control element was made larger than the film thickness of the portion facing the pixel electrode. Things. With the above structure, a thick portion is provided in the transparent conductive film, so that the overall sheet resistance can be reduced. As a result, the display characteristics of the panel do not become uneven, and the thick portion has a large thickness. Is a portion facing the control element for controlling the pixel electrode and is originally a non-light-transmitting portion, so that the light transmittance does not decrease. Embodiment FIG. 1 is an enlarged partial cross-sectional view showing a cross-sectional structure of an LCD panel according to an embodiment of the present invention when the LCD panel is completed. FIG. 2A
1 to D are enlarged cross-sectional views illustrating a method for manufacturing the opposed common transparent electrode of the present invention. Each drawing is arbitrarily enlarged for convenience of explanation. The same parts as those in the conventional example are denoted by the same reference numerals. The details will be described below with reference to the drawings. First, as shown in FIG. 2A, the main surface of the transparent substrate for common electrode 7 is coated with an ITO film 6 as a transparent counter electrode on the entire surface for several thousand times.
Å Deposit with a film thickness of at least. Next, as shown in FIG. 2B, a photoresist pattern 15 is formed on the ITO film 6 by a method similar to a normal photolithography process. At this time, the pattern width Wi of the photoresist pattern 15 is as shown in FIG. 1 (FIG. 5).
Equivalent to the width Wp of the non-translucent part formed by the control wiring pattern of the X column and the Y row including the control element 3 such as the TFT formed on the main substrate 1 shown in FIG. 2 or the width Wb of the black stripe 16 of the color filter 10. Or, set Wp, Wb> Wi. Also, the pattern pitch Pi is the same as the X row and the Y row on the main substrate 1.
A grid pattern having the same shape as the planar pattern shape on the main substrate 1 in FIG. 5 is formed so as to have the same pitch P 1 , P 2 (FIG. 5) of the control wiring pattern in the row. Formed. Next, as shown in FIG. 2C, the photoresist film 15 is used as a mask to selectively reduce the film thickness of the ITO film 6 in the light-transmitting region, and the ITO film in the same region is formed into a thin film ITO film having a thickness of 1000 Å or less. After forming the film 6A, if the photoresist pattern 15 is removed, the ITO film 6 becomes a thin film ITO film 6A that emphasizes light transmission, and a thick film ITO film that emphasizes area and conductivity, as shown in FIG. 2D.
It can be an ITO film electrode composed of two layers in the film 6 region. Incidentally, the lattice-shaped low-resistance ITO film (thin film layer) 6A is arranged in a vertical or horizontal stripe depending on the shape of the LCD panel in addition to being arranged in a lattice as in the above example. Is also good. The transparent opposing common electrode (ITO
A transparent substrate 7 for a common electrode having films 6 and 6A is placed close to a transparent main substrate 1 having a functional element formed on its main surface with a gap of about 10 μm via a spacer 17 as shown in FIG. The liquid crystal 9 is injected into the gap portion 8 and sealed by sealing.
A panel is obtained. As is clear from FIG. 1, in the LCD panel using the transparent substrate 7 for a common electrode according to the manufacturing method of the present invention, the transparent counter common electrode in the pixel region 19 for controlling the transmitted light 18 from a light source (not shown). Since the ITO film 6A is thin, the loss due to absorption of transmitted light at the same portion can be reduced, and the ITO film 6 at the portion facing the non-transmissive region 20 formed by the control element 3 and the like has a low thickness. Since the transparent common electrode film is formed as a resistance layer, the surface resistance of the transparent common electrode film can be reduced. Furthermore, as an embodiment of a more simplified configuration, an ITO film of 1000 ° or less is formed over the entire main surface of the common electrode transparent substrate 7, and the outer peripheral area of this ITO film, that is, the outer side of the common electrode transparent substrate 7 is formed. By forming an ITO film electrode having a two-layer structure in which a highly conductive ITO film layer having a thickness of several thousand mm or more is formed in the light non-transmissive region in the peripheral portion, compared to the above-described Examples 1 and 2, If this is the case, the sheet resistance increases, but the transparent electrode for the common electrode has a structure having a highly conductive electrode on the outer periphery. Therefore, the film sheet resistance is reduced as compared with the conventional example, and the image quality can be improved. . 3A to 3E are schematic cross-sectional views showing a method of manufacturing a common electrode (ITO film 6) according to another embodiment of the present invention. First, an ITO film 6 is deposited on the entire main surface of the common electrode transparent substrate 7 to a thickness of several thousand degrees or more (FIG. 3A). Next, a photoresist pattern 15 having a predetermined pattern shape is formed on the ITO film 6 as in the previous embodiment (FIG. 3B).
After etching the ITO film 6 using the photoresist pattern 15 as a mask (FIG. 3C), the photoresist pattern 15
Is removed to form a thick ITO film 6 pattern of a predetermined shape on the main surface (FIG. 3D). Thereafter, the ITO film 6 is again applied to the main surface of the common electrode transparent substrate 7.
If A is applied over the entire surface with a thickness of several hundreds to 1000 degrees, two types of ITO films 6, 6A having different thicknesses are formed on the main surface of the common electrode transparent substrate 7 as shown in FIG. 3E. It is formed. Then, if an LED panel is manufactured using the transparent substrate for common electrode 7 in the same manner as in the first embodiment, an LCD panel having the same effects as in the previous embodiment can be obtained. Effect of the Invention As described above, the present invention provides a transparent main substrate, a transparent substrate for a common electrode which is disposed to face the transparent main substrate at a predetermined interval, and sealing between the transparent main substrate and the transparent substrate for the common electrode. And a liquid crystal side of the transparent main substrate,
A plurality of transparent pixel electrodes and a control element for controlling these pixel electrodes are provided.A transparent conductive film is provided on the entire surface of the common electrode transparent substrate on the liquid crystal side. The thickness of the portion facing the control element is larger than the thickness of the portion facing the pixel electrode. With the above structure, the transparent conductive film is provided with a thick portion, so that the overall sheet resistance can be reduced. As a result, the display characteristics of the panel do not become uneven, and the thick portion is formed. Is a portion facing the control element for controlling the pixel electrode and is originally a non-light-transmitting portion, so that the light transmittance does not decrease.

【図面の簡単な説明】 第1図は本発明の一実施例によるLCDパネル完成時の拡
大断面図、第2図A〜Dは本発明による対向共通電極用
透明基板の製造法を示す拡大断面図、第3図A〜Eは本
発明の他の実施例による対向共通電極用透明基板の製造
法を示す拡大断面図、第4図は従来例によるLCDパネル
の拡大断面図、第5図はLCDパネルの主基板の平面形状
例を示す平面図、第6図は複数枚LCDパネルを貼り合わ
せた構成の大型表示パネルの概念を示す斜視図である。 1……透明主基板、2……画素電極、3……TFT等の制
御素子、4……走査信号パターン、5……画像信号パタ
ーン、6,6A……透明導電性膜(ITO膜)、7……共通電
極用透明基板、8……間隙部、9……液晶、10……カラ
ーフィルター、11……走査信号パターン引出し電極端子
部、12……画像信号パターン引出し電極端子部、13……
マルチパネルLCD、14……対向共通電極の外部接続用端
子部、15……ホトレジストパターン単位画素領域、16…
…ブラックストライプ、17……スペーサ、18……透過
光、19……画素領域、20……非透過領域。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is an enlarged cross-sectional view of an LCD panel according to an embodiment of the present invention when a LCD panel is completed, and FIGS. 2A to 2D are enlarged cross-sectional views showing a method of manufacturing a transparent substrate for a counter common electrode according to the present invention. FIGS. 3A to 3E are enlarged sectional views showing a method of manufacturing a transparent substrate for a counter common electrode according to another embodiment of the present invention, FIG. 4 is an enlarged sectional view of a conventional LCD panel, and FIG. FIG. 6 is a plan view showing an example of the planar shape of the main substrate of the LCD panel, and FIG. 6 is a perspective view showing the concept of a large display panel having a configuration in which a plurality of LCD panels are bonded. 1 ... Transparent main substrate, 2 ... Pixel electrode, 3 ... Control element such as TFT, 4 ... Scanning signal pattern, 5 ... Image signal pattern, 6,6A ... Transparent conductive film (ITO film), 7 ... Transparent substrate for common electrode, 8 ... Gap, 9 ... Liquid crystal, 10 ... Color filter, 11 ... Scan signal pattern lead-out electrode terminal portion, 12 ... Image signal pattern lead-out electrode terminal portion, 13 ... …
Multi-panel LCD, 14 ... External connection terminal of counter common electrode, 15 ... Photoresist pattern unit pixel area, 16 ...
... black stripe, 17 ... spacer, 18 ... transmitted light, 19 ... pixel area, 20 ... non-transmission area.

Claims (1)

(57)【特許請求の範囲】 1.透明主基板と、この透明主基板に所定間隔をおいて
対向配置した共通電極用透明基板と、これらの透明主基
板と共通電極用透明基板間に封入した液晶とを備え、前
記透明主基板の液晶側の面には、複数の透明な画素電極
と、これらの画素電極の制御を行う制御素子とを設け、
前記共通電極用透明基板の液晶側の面には、全面に透明
導電膜を設け、この透明導電膜の前記制御素子に対向す
る部分の膜厚を、画素電極に対向する部分の膜厚より厚
くした液晶表示パネル。
(57) [Claims] A transparent main substrate, a transparent substrate for a common electrode disposed opposite to the transparent main substrate at a predetermined interval, and a liquid crystal sealed between the transparent main substrate and the transparent substrate for the common electrode; On the surface on the liquid crystal side, a plurality of transparent pixel electrodes and a control element for controlling these pixel electrodes are provided,
A transparent conductive film is provided on the entire surface of the common electrode transparent substrate on the liquid crystal side, and a film thickness of a portion of the transparent conductive film facing the control element is larger than a film thickness of a portion facing the pixel electrode. Liquid crystal display panel.
JP8533786A 1986-04-14 1986-04-14 LCD panel Expired - Fee Related JP2667149B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8533786A JP2667149B2 (en) 1986-04-14 1986-04-14 LCD panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8533786A JP2667149B2 (en) 1986-04-14 1986-04-14 LCD panel

Publications (2)

Publication Number Publication Date
JPS62240933A JPS62240933A (en) 1987-10-21
JP2667149B2 true JP2667149B2 (en) 1997-10-27

Family

ID=13855826

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8533786A Expired - Fee Related JP2667149B2 (en) 1986-04-14 1986-04-14 LCD panel

Country Status (1)

Country Link
JP (1) JP2667149B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2601932B2 (en) * 1990-04-13 1997-04-23 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン Liquid crystal display device and manufacturing method thereof
JPH05196911A (en) * 1992-01-21 1993-08-06 Komatsu Ltd Liquid crystal element for laser marker
JP2009294447A (en) * 2008-06-05 2009-12-17 Fujitsu Ltd Transparent electrode substrate of dot matrix display device, liquid crystal display element and reflective display element

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58116574A (en) * 1981-12-29 1983-07-11 セイコーエプソン株式会社 Liquid crystal display
JPS5924882A (en) * 1982-08-03 1984-02-08 日本電信電話株式会社 Matrix type liquid crystal display unit
JPS5960469A (en) * 1982-09-30 1984-04-06 セイコーエプソン株式会社 Liquid crystal display body unit

Also Published As

Publication number Publication date
JPS62240933A (en) 1987-10-21

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