JPH10228032A - Active matrix type liquid crystal display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve the display quality by making a common electrode low in resistance and reducing reflected light from a light shield member, and preventing switching characteristics from decreasing and the voltage of the common electrode from varying. SOLUTION: While reflected light of a light shield film 24 is reduced by interposing an insulating film 46 between the light shield film 24 and common electrode 50 to prevent characteristics of a TFT 22 from decreasing owing to a light leak current, the coupling capacity between the light shield film 24 and common electrode 50 is increased and then the resistance value of the common electrode 50 is reduced by electrically connecting the light shield film 24 and common electrode 50 to each other at the peripheral part of a display area 'A' to prevent the potential of the common electrode 50 from varying owing to coupling with a signal line, thereby suppressing an uneven display due to crosstalk, etc.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a thin film transistor (hereinafter abbreviated as TFT) arranged in a matrix.
The present invention relates to an active matrix type liquid crystal display device in which a liquid crystal composition is held between an active matrix substrate having a driving element and a counter substrate.

[0002]

2. Description of the Related Art In recent years, an active matrix type liquid crystal display device which achieves high performance and high definition while having high density and large capacity has been put to practical use.

Among such active matrix type liquid crystal display devices, an active matrix type liquid crystal display device having a TFT as a control element has a structure similar to the first conventional example shown in FIG. There is something.

That is, the active matrix substrate 1 includes a gate electrode 2a, a gate insulating film 2b, an amorphous silicon (hereinafter abbreviated as a-Si) layer 2c, and an n ⁺ -type a-Si layer 2d doped with phosphorus (P). , Channel protective film 2
e, TF comprising source electrode 2f and drain electrode 2g
T2 and Indium Tin Oxide (hereinafter referred to as IT
Abbreviated as O. And an ITO substrate formed on the upper surface of the array substrate 4 having a predetermined pattern covering at least the upper part of the TFT 2 via a light shielding film 6 and a coloring layer 7 and a protective film 8. A liquid crystal composition 12 is held in a gap between a counter substrate 11 having an electrode 10.

However, in such an active matrix substrate 1, as the size of the screen increases, the resistance of the common electrode 10 made of ITO increases, the time constant increases, and the display quality deteriorates due to crosstalk and the like. There has been a problem that a desired display cannot be obtained.

For this reason, the resistance value of the common electrode is reduced to reduce the crosstalk.
The technology disclosed in Japanese Patent Publication No. 3 (JP-A) No. 3 has been developed. That is, as shown in the second conventional example of FIG. 7, in the counter substrate 13, the light-shielding film 14 is formed from a conductive material such as a metal material having a lower resistance value than ITO, while the colored layer on the light-shielding film 14 is formed. 16 and a part of the protective layer 17 are removed, and the common electrode 1 is removed.
8 is in contact with the light-shielding film 14, and the common electrode 1 is
8 is applied with a bias. Thereby, the light shielding film 14
This reduces the resistance value of the common electrode 18 integrated with the above, thereby suppressing non-uniform display due to crosstalk or the like.

[0007]

However, in such a structure in which the light-shielding film and the common electrode are directly contacted in order to reduce the resistance value of the common electrode, reflection of light at the interface between the light-shielding film and the common electrode is performed. Due to the high efficiency, light incident from the array substrate side is reflected at this interface and irradiates the TFT, causing a leak current in the TFT, deteriorating switching characteristics and deteriorating display quality. I was

Moreover, in the conventional structure, the potential of the common electrode fluctuates due to the coupling generated between the signal line for inputting image information to the TFT and the common electrode, and a display defect such as crosstalk occurs. There was also a problem.

In view of the above, the present invention has been made in order to solve the above-mentioned problem. In an active matrix substrate using a TFT as a driving element, the resistance of a common electrode is reduced in order to eliminate a display defect due to crosstalk or the like. It is an object of the present invention to provide an active matrix type liquid crystal display device having a high display quality by preventing a display failure by suppressing a voltage fluctuation of a common electrode due to coupling with a signal line without deteriorating a switching function. .

[0010]

According to the present invention, as a means for solving the above problems, a matrix connected to a switching element arranged at an intersection of a scanning line and a signal line wired so as to intersect the scanning line is provided. An array substrate having pixels composed of pixel electrodes arranged in a matrix, and a counter substrate having a conductive light-blocking member and a common electrode covering at least the upper part of the switching element and facing the array substrate with a gap therebetween. An active matrix type liquid crystal display device comprising a liquid crystal composition sealed between the array substrate and the opposing substrate, wherein the common electrode and the light blocking member are disposed in an active region of the array substrate via an insulating member. And electrically connect in the periphery of the active area.

According to the present invention, as a means for solving the above-mentioned problem, a scanning line and a switching element arranged at an intersection of a signal line intersecting the scanning line are arranged in a matrix. An array substrate having pixels composed of pixel electrodes, a conductive light-shielding member insulated by an insulating member and covering at least the upper part of the switching element, and the matrix via a protective film on an upper surface of the light-shielding member insulated by the insulating member A counter substrate having a common electrode formed in common with the pixel electrodes arranged in a matrix, and disposed opposite to the array substrate with a gap therebetween, and a liquid crystal composition sealed between the array substrate and the counter substrate. In the active matrix type liquid crystal display device comprising: the light shielding member via the insulating member in the active area of the array substrate By removing a part of the protective film formed on the other side, the light shielding member and the common electrode form a capacitor through the insulating member and are coupled to each other, and the light shielding member is formed around the active area of the array substrate. The light shielding member and the common electrode are electrically connected by removing a part of the protective film and the insulating member formed above.

According to the present invention, as a means for solving the above-mentioned problem, a scanning line and a switching element arranged at an intersection of a signal line intersecting the scanning line are arranged in a matrix. An array substrate having pixels composed of pixel electrodes, a conductive light-blocking member covering at least the upper part of the switching element, a coloring member provided at a position corresponding to the pixel electrode, and a gap between the array substrate having a common electrode In an active matrix type liquid crystal display device including a counter substrate disposed to face and a liquid crystal composition sealed between the array substrate and the counter substrate, the common electrode and the light blocking member are
In the display area of the array substrate, they are laminated via an insulating member, and are electrically connected around the display area.

According to the present invention, as a means for solving the above-mentioned problems, a scanning line and a switching element arranged at an intersection of a signal line intersecting with the scanning line are connected and arranged in a matrix. An array substrate having pixels formed of pixel electrodes, a conductive light-blocking member insulated by an insulating member and covering at least the upper side of the switching element, a coloring member provided at a position corresponding to the pixel electrode, and insulating to the insulating member A counter substrate having a common electrode formed on the upper surface of the light shielding member corresponding to the pixel electrode via a protective film, the counter substrate being opposed to the array substrate with a gap therebetween, and the array substrate and the counter substrate An active matrix type liquid crystal display device comprising a liquid crystal composition enclosed between the active region and the active region of the array substrate. By removing a part of the protective film formed above the light-shielding member via the insulating member, the light-shielding member and the common electrode form a capacitor via the insulating member and are coupled to each other, and Around the active area, the light shielding member and the common electrode are electrically connected by removing a part of the protective film and the insulating member formed above the light shielding member.

According to the present invention, an insulating member is interposed between the light shielding member and the common electrode, and light incident from the array substrate is scattered by the insulating member.
The light leakage current of the TFT due to the light reflected from the surface of the light shielding member is reduced, and the common electrode and the light shielding member are conducted around the active area to reduce the resistance value of the common electrode, thereby reducing the time constant of the common electrode to reduce crosstalk. In addition, the coupling capacitance between the common electrode and the light-shielding member is increased by interposing the insulating member, the potential fluctuation of the common electrode due to the coupling between the signal line and the common electrode is reduced, and the occurrence of display failure due to crosstalk or the like is reduced. This is intended to prevent the display quality and improve the display quality.

[0015]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a first embodiment of the present invention will be described with reference to FIGS. An active matrix type liquid crystal display device 20 includes an array substrate 23 using a TFT 22 as a switching element of a pixel electrode 21 made of ITO arranged in a matrix, and a light shielding film 24 having a predetermined pattern as a light shielding member. A red (R), green (G), and blue (B) colored layer 26 is formed in a stripe or matrix in accordance with the positions of the pixel electrodes 21 and the TFTs 22, and a common electrode made of ITO is provided. A liquid crystal composition 28 is sandwiched between the opposing substrates 27.

Here, the array substrate 23 is formed by depositing a metal material such as tantalum (Ta), molybdenum (Mo), chromium (Cr), etc. on an insulating substrate 30 made of transparent glass by sputtering. Scan line Y for supplying signal
A gate insulating film 32 made of silicon oxide (SiOx) is coated on the gate electrode 31 formed integrally with j (j = 1, 2, 3,...) by a plasma CVD method or the like. Above the gate electrode 31 via
A-Si layer 33 and channel protective film 3 by CVD
4, a source region 36 and a drain region 37 made of an n ⁺ -type a-Si layer doped with phosphorus (P) ions to obtain a good ohmic contact are patterned, and a pixel electrode is formed on the source region 36. A source electrode 38 connected to the TFT 21 is formed, and a TFT 22 including a drain electrode 40 integrated with a signal line Xi (i = 1, 2, 3,...) For supplying a display signal is formed on the drain region 37. I have. Further, the upper surfaces of the pixel electrodes 21 and the TFTs 22 are covered with a protective film 41 made of silicon nitride (SiNx) or the like.

On the other hand, the opposing substrate 27 is formed by molybdenum (Mo) and tantalum (T) on an insulating substrate 42 made of transparent glass.
a), a metal such as chromium (Cr) is deposited by a sputtering method, and thereafter, a light shielding film 24 in the form of a black matrix is patterned by photolithography and etching as shown in FIG. The surface of the light-shielding film 24 is oxidized to form an insulating film 46. Further, in the peripheral portion of the display region [A] on the counter substrate 27 which is the peripheral portion of the active region, after removing the insulating film 46 on the light shielding film 24, the portion corresponding to the pixel electrode 21 is placed by an electrodeposition method or the like. ,
Forming red (R), green (G), and blue (B) colored layers 26;
A protective film 47 made of silicon oxide is deposited on the upper surface of the through hole 48 where the coloring layer 26 has been removed.

Thereafter, the protective film 47 on the upper surface of the light-shielding film 24 is removed by etching or the like to form a through-hole 48, and then the common electrode 5 made of ITO opposed to the pixel electrode 21 is formed.
No. 0 is formed, and a protective film 51 made of silicon nitride (SiNx) is further covered. Thus, in the display area [A], the insulating film 46 is interposed between the common electrode 50 and the light-shielding film 24 in the through hole 48, while the common electrode 50 and the light-shielding light are shielded in the periphery of the display area [A]. The membrane 24 is in direct contact and is electrically conductive. Further, the common electrode 50 is connected to an AC power supply (not shown) via an organic conductive material 60 and a pad 61 serving as a common electrode voltage power supply electrode in the periphery of the display area [A].

After the alignment films 53 and 54 made of polyimide are applied to the entire surface of the array substrate 23 and the counter substrate 27 on the pixel electrode 21 side and the common electrode 50 side by printing and rubbing, the two substrates 23 and 27 are assembled facing each other to form a cell, and a liquid crystal composition 28 is injected into the gap and sealed. Then, the insulating substrates 30, 42 of the two substrates 23, 27
The polarizing plates 57 and 58 are attached to the sides to complete the liquid crystal display device 20.

In the liquid crystal display device 20, light incident on the light shielding film 24 from the array substrate 23 side is
Since it is scattered on the surface of the insulating film 46 formed on the surface,
The surface reflected light incident on the TFT 22 from the light shielding film 24 is reduced, and the TFT 22 can reduce the occurrence of light leakage current. At the same time, the common electrode 50 is formed around the light-shielding film 2 made of a metal material having a low resistance value in the peripheral portion of the display area [A].
4 and the resistance value is reduced compared to the conventional one.
The time constant can be reduced and crosstalk can be suppressed.

On the other hand, the equivalent circuit of the liquid crystal display device 20 is as shown in FIG.
2 is connected to the source electrode 38, the gate electrode 31 of the TFT 22 is connected to the scanning line Yj, and the drain electrode 4
0 is connected to the signal line Xi. Further, the liquid crystal composition 28
Between the pixel electrode 21 and the common electrode 50 sandwiching
lc is formed, and a coupling capacitance Cth is formed between the common electrode 50 and the light shielding film 24 via the insulating film 46.

In the display area [A], the common electrode 5
0 is connected by a resistor R _{ITO (i, j)} , and the light-shielding film 24 is connected by a resistor R _{BM (i, j)} , while the common electrode 50 and The light-shielding film 24 is conducted, and an AC voltage _Vcom is applied to the light-shielding film 24 and the common electrode 50 via the pad 61 and the organic conductive material 60.

The liquid crystal display device 2 having such an equivalent circuit
At 0, a parasitic capacitance is formed between the signal line Xi and the common electrode 50, and the potential of the common electrode 50 fluctuates due to a change in the display signal input to the signal line Xi. When viewed in a region [B] shown by a dotted line in FIG. 4, the change is most greatly affected by a change in a display signal input to the signal lines Xi on both sides of each pixel electrode 21. That is, assuming that the capacitance between the signal line Xi + 1 and the common electrode 50 is Csig1 and the capacitance between the signal line Xi + 2 and the common electrode 50 is Csig2, the potential variation ΔVcom of the common electrode 50 in the region [B] is It is represented as

[0024]

(Equation 1) In the equation (1), the potential variation ΔVcom of the common electrode depends on the coupling capacitance Cth, and the potential variation ΔVcom decreases as the coupling capacitance Cth increases.
In this case, the protective film 47 on the light-shielding film 24 is removed, the low-resistance light-shielding film 24 and the common electrode 50 are coupled with a large capacitance via the insulating film 46, and the AC voltage V is applied to the common electrode 50.
When com is applied, the distortion of the common electrode potential waveform is smaller than in the case where the AC voltage is applied only to the conventional common electrode. Note that as the coupling capacitance between the light-shielding film 24 and the common electrode 50 is sufficiently increased, the potential fluctuation of the common electrode 50 due to the coupling between the signal line Xi and the common electrode 50 becomes smaller. For example, the size of the pixel electrode 21 becomes smaller. 180 μm × 6
0 μm, the area of the through hole 48 is 6500 μm ² , and the thickness of the insulating film 46 of silicon oxide (SiO ₂ ) is 1500
If the sheet resistance of the light-shielding film 24 made of molybdenum tantalum (MoTa) is 1.2 Q / □, the resistivity of the common electrode 50 made of ITO is 1.5 × 10 ⁻⁴ Ωcm, and the film thickness is 1500 Å, the common electrode The distortion of the potential waveform is reduced to about １ ／ compared with the related art, and the signal line X
Common electrode 50 by coupling between i and common electrode 50
Is reduced to about 1/6.

With this configuration, since the insulating film 46 is formed on the light-shielding film 24, the light incident from the array substrate 23 is scattered on the surface of the light-shielding film 24. 24, the reflected light from the surface is reduced.
The occurrence of light leakage current in the FT 22 can be suppressed, the switching characteristics of the TFT 22 can be improved, and the display quality can be improved. Further, since the light-shielding film 24 is formed of a metal material having a lower resistance than the common electrode made of ITO, the resistance of the common electrode 50 is reduced by conducting with this, so that the time constant of the common electrode 50 can be reduced. The display quality can be improved by preventing crosstalk and the like. Moreover, the common electrode 50 is formed in the through hole 48 from which the protective film 47 is removed.
By interposing an insulating film 46 between the common electrode 50 and the light-shielding film 24, the coupling capacitance between the common electrode 50 and the light-shielding film 24 can be increased as compared with the conventional case, and the potential fluctuation of the common electrode 50 due to coupling with the signal line Xi Therefore, the display quality can be improved by preventing display defects due to crosstalk and the like.

Next, a second embodiment of the present invention will be described with reference to FIG. In this embodiment, the region where the protective film is removed in the through hole in the first embodiment is enlarged, and the common electrode is in a stepped contact with the colored layer and the protective film on the light shielding film. The other parts are the same as those of the first embodiment, so the same parts are denoted by the same reference numerals and description thereof will be omitted.

That is, the surface of the light-shielding film 24 patterned on the insulating substrate 42 is anodized to form the insulating film 46 on the counter substrate 66 facing the array substrate 23, while the periphery of the display area [A] is formed. Insulating film 4 on light-shielding film 24 in section
After removing 6, a colored layer 67 is formed, a protective film 68 is deposited on its upper surface, and a through hole 70 is further formed.
When the common electrode 50 is formed, a through hole 70 having a larger area where the protective film 68 is removed than the area where the colored layer 67 is removed is formed, and the common electrode 50 is formed on the light-shielding film 24 as the colored layer 67 and the protective film 68. The contact is made in a stepped manner.

With this configuration, similarly to the first embodiment, optically, the reflected light incident on the TFT 22 from the surface of the light shielding film 24 is reduced, and the display quality can be improved by reducing the light leakage current. . In addition, it is possible to electrically prevent a display defect such as crosstalk from occurring due to a decrease in the time constant due to a decrease in the resistance value of the common electrode 50, and to establish a connection between the common electrode 50 and the light shielding film through the insulating film 46 in the through hole 70. 24 can be increased, and the potential fluctuation of the common electrode 50 due to the coupling with the signal line Xi can be reduced, so that a display failure due to crosstalk or the like can be prevented, and the display quality can be improved. Further, the through holes 70 are formed in steps on the coloring layer 67 and the protective film 68, and the common electrode 50 formed on the light-shielding film 24 has a gentle slope as a whole. Compared with the embodiment, when rubbing the alignment film 54, the entire surface can be rubbed more uniformly, and better light distribution characteristics can be obtained.

The present invention is not limited to the above embodiment, but can be modified without departing from the spirit thereof. For example, a method of forming an insulating member interposed between a common electrode and a light shielding member It is not limited to the anodic oxidation, chromium oxide (CrO), chromium dioxide (Cr ₂ O), silicon dioxide (SiO _2), tantalum oxide (Ta
₂ O ₅ ), silicon tetranitride (Si ₃ N ₄ ), or the like may be formed by a plasma CVD method, a sputtering method, an electron beam evaporation method, or the like. In addition, the size of the through hole is arbitrary, and the coupling capacitance between the common electrode and the light shielding member is also arbitrary. However, as the coupling capacitance is increased, the potential of the common electrode fluctuates due to coupling with the signal line. Is made smaller.

[0030]

As described above, according to the present invention, by interposing an insulating member between the common electrode and the light shielding member, the incident light is scattered on the surface of the insulating member, and the incident light on the surface of the light shielding member is scattered. Can be prevented, the reflected light from the light-shielding member incident on the switching element can be reduced as compared with the related art, and the characteristics of the switching element can be improved by reducing the light leakage current, so that better display quality can be obtained. Also, the common electrode is
Since the light shielding member having a low resistance value is conducted in the peripheral portion to reduce the resistance value and reduce the time constant, it is possible to prevent uneven display due to crosstalk or the like. Moreover, since the coupling capacity between the common electrode and the light shielding member is increased by interposing the insulating member, the fluctuation of the potential of the common electrode due to the coupling with the signal line can be reduced, and non-uniform display due to crosstalk or the like can be prevented. Good display quality can be obtained from what can be done.

[Brief description of the drawings]

FIG. 1 is a schematic explanatory view showing a counter substrate according to a first embodiment of the present invention.

FIG. 2 is a schematic cross-sectional view illustrating the liquid crystal display device according to the first embodiment of the present invention at a position corresponding to line AA ′ in FIG.

FIG. 3 is a schematic cross-sectional view illustrating the liquid crystal display device according to the first embodiment of the present invention at a position corresponding to line BB ′ in FIG.

FIG. 4 is a partial equivalent circuit diagram illustrating a configuration of the liquid crystal display device according to the first embodiment of the present invention.

FIG. 5 is a schematic cross-sectional view illustrating a liquid crystal display device according to a second embodiment of the present invention at a position corresponding to line AA ′ in FIG.

FIG. 6 is a partial schematic cross-sectional view showing a first conventional liquid crystal display device.

FIG. 7 is a partial schematic cross-sectional view showing a second conventional liquid crystal display device.

[Explanation of symbols]

 Reference Signs List 20 liquid crystal display device 21 pixel electrode 22 TFT 23 array substrate 24 light-shielding film 26 coloring layer 27 counter substrate 28 liquid crystal composition 46 insulating film 47 protective film 48 through hole 50 common electrode 53 , 54 ... Orientation film 60 ... Organic conductive material 61 ... Pad

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Rinko Kitazawa 8 Shinsugita-cho, Isogo-ku, Yokohama-shi, Kanagawa Prefecture Inside the Toshiba Yokohama Office (72) Inventor Tetsuya Iizuka 7-1-1 Nisshincho, Kawasaki-ku, Kawasaki-shi, Kanagawa Shiba Electronics Engineering Co., Ltd.

Claims (7)

[Claims] 1. An array substrate having pixels including pixel electrodes arranged in a matrix and connected to switching elements arranged at intersections of scanning lines and signal lines wired to intersect the scanning lines, and A counter substrate having a conductive light-blocking member and a common electrode covering the upper side of the switching element and facing the array substrate with a gap therebetween; and a liquid crystal composition sealed between the array substrate and the counter substrate. Wherein the common electrode and the light shielding member are laminated via an insulating member in an active region of the array substrate, and are electrically connected in a periphery of the active region. An active matrix type liquid crystal display device characterized by the above-mentioned. 2. An insulating substrate, comprising: an array substrate having pixels formed of pixel electrodes arranged in a matrix connected to switching elements arranged at intersections of scanning lines and signal lines arranged to intersect the scanning lines; A conductive light-shielding member insulated by a member and covering at least an upper portion of the switching element; and a common light-shielding member formed on the upper surface of the light-shielding member insulated by the insulating member and interposed between the pixel electrodes arranged in a matrix through a protective film. An active matrix type liquid crystal display device comprising: a counter substrate having a common electrode and disposed opposite to the array substrate with a gap therebetween; and a liquid crystal composition sealed between the array substrate and the counter substrate. Removing a part of the protective film formed above the light shielding member via the insulating member in the active area of the array substrate; Accordingly, the light shielding member and the common electrode form a capacitor via the insulating member and are coupled to each other, and a portion of the protection film and the insulating member formed above the light shielding member around an active area of the array substrate. The active matrix type liquid crystal display device characterized in that the light shielding member and the common electrode are electrically connected by removing the liquid crystal. 3. An array substrate having pixels consisting of pixel electrodes arranged in a matrix and connected to switching elements arranged at intersections of scanning lines and signal lines arranged to intersect the scanning lines, and A conductive light-shielding member that covers the upper side of the switching element, a coloring member provided at a position corresponding to the pixel electrode, and a counter substrate having a common electrode and facing the array substrate with a gap therebetween, In an active matrix type liquid crystal display device including a liquid crystal composition sealed between an array substrate and the counter substrate, the common electrode and the light blocking member are stacked via an insulating member in a display region of the array substrate. An active matrix type liquid crystal display device is characterized in that electrical connection is made around the display area. 4. An insulating substrate connected to a scanning line and a switching element arranged at an intersection of a signal line intersecting the scanning line and having an array of pixels formed of pixel electrodes arranged in a matrix, A conductive light-shielding member insulated by a member and covering at least the upper part of the switching element; a coloring member provided at a position corresponding to the pixel electrode; and a protective film provided on the upper surface of the light-shielding member insulated by the insulating member. A counter substrate having a common electrode formed corresponding to the pixel electrode and facing the array substrate with a gap therebetween; and a liquid crystal composition sealed between the array substrate and the counter substrate. In the active matrix type liquid crystal display device, the liquid crystal display device is formed above the light shielding member via the insulating member in the active area of the array substrate. By removing a part of the protective film, the light shielding member and the common electrode form a capacitor via the insulating member and are coupled to each other, and are formed above the light shielding member around the active area of the array substrate. An active matrix liquid crystal display device, wherein the light shielding member and the common electrode are electrically connected by removing a part of the protective film and a part of the insulating member. 5. An insulating substrate connected to a scanning line and a switching element arranged at an intersection of a scanning line and a signal line intersecting the scanning line, the array substrate having pixels formed of pixel electrodes arranged in a matrix, and an insulating substrate. A conductive light-shielding member insulated by a member and covering at least the upper part of the switching element; a coloring member provided at a position corresponding to the pixel electrode; and a protective film provided on the upper surface of the light-shielding member insulated by the insulating member. A counter substrate having a common electrode formed corresponding to the pixel electrode and facing the array substrate with a gap therebetween; and a liquid crystal composition sealed between the array substrate and the counter substrate. In the active matrix type liquid crystal display device, the liquid crystal display device is formed above the light shielding member via the insulating member in the active area of the array substrate. By removing a part of the colored member and a part of the protective film, the light shielding member and the common electrode form a capacitor via the insulating member and are coupled to each other, and around the active region of the array substrate, An active matrix type liquid crystal display device, wherein the light shielding member and the common electrode are electrically connected by removing a part of the protective film and the insulating member formed above the light shielding member. 6. A region of the coloring member removed above the light shielding member is smaller than a region of the protective film removed above the light shielding member, and the common electrode is provided above the light shielding member with the coloring member and the insulating member. The active matrix type liquid crystal display device according to claim 5, wherein the active matrix type liquid crystal display device is in contact with the liquid crystal display device. 7. The active matrix type liquid crystal display device according to claim 3, wherein the light shielding member has a black matrix shape for shielding an upper part of a gap between the pixel electrodes.