JP2626015B2 - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JP2626015B2
JP2626015B2 JP63334413A JP33441388A JP2626015B2 JP 2626015 B2 JP2626015 B2 JP 2626015B2 JP 63334413 A JP63334413 A JP 63334413A JP 33441388 A JP33441388 A JP 33441388A JP 2626015 B2 JP2626015 B2 JP 2626015B2
Authority
JP
Japan
Prior art keywords
film
semiconductor chip
connection
transparent conductive
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63334413A
Other languages
Japanese (ja)
Other versions
JPH02177547A (en
Inventor
茂 安田
耕次 西田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP63334413A priority Critical patent/JP2626015B2/en
Publication of JPH02177547A publication Critical patent/JPH02177547A/en
Application granted granted Critical
Publication of JP2626015B2 publication Critical patent/JP2626015B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation

Landscapes

  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Wire Bonding (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、透明導電膜から構成される液晶パネルに駆
動用の半導体チップを容易に、かつ信頼性良く直接実装
した液晶表示装置などに適用される半導体装置に関する
ものである。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is applied to, for example, a liquid crystal display device in which a semiconductor chip for driving is directly and easily and reliably mounted on a liquid crystal panel formed of a transparent conductive film. The present invention relates to a semiconductor device.

従来の技術 近年、透明導電膜が形成された2枚のガラス板の間隙
中に液晶物質を充填させた構成の液晶パネルに駆動用の
半導体チップを直接実装して薄形、軽量の液晶表示装置
による試みが盛んに行われている。この代表的な方法と
して、予め半導体チップの電極部分に、金めっきなどで
形成された突起形状の接続用金属電極と、ガラス板上に
透明導電膜が形成された接続用電極とを互いに対向させ
た状態(半導体チップがフエースダウン状態をなす)
で、この間に、導電性接着剤を介在させて電気的接続と
接着・固定を行う方法がある。このとき、導電性接着剤
は、予め、半導体チップの突起形状の接続用金属電極面
に転写法やディップ法などにより形成しておき、ガラス
板上の透明導電膜パターンに位置合わせして載置した
後、熱硬化することにより電気的に接続させるものであ
る。
2. Description of the Related Art In recent years, a thin and light-weight liquid crystal display device in which a driving semiconductor chip is directly mounted on a liquid crystal panel having a structure in which a liquid crystal material is filled in a gap between two glass plates having a transparent conductive film formed thereon. Has been actively conducted. As a typical method, a protruding connection metal electrode formed in advance by gold plating or the like on a semiconductor chip electrode portion and a connection electrode having a transparent conductive film formed on a glass plate are opposed to each other. State (semiconductor chip faces down)
In this case, there is a method of performing electrical connection and bonding / fixing with a conductive adhesive interposed therebetween. At this time, the conductive adhesive is previously formed on the protruding connection metal electrode surface of the semiconductor chip by a transfer method, a dipping method, or the like, and is placed in alignment with the transparent conductive film pattern on the glass plate. After that, it is electrically connected by thermosetting.

この液晶表示装置における導電性接着剤を用いた場合
の接続構造を第5図に示す。1a,1bは液晶パネルを構成
する2枚のガラス板であり、それぞれ透明導電膜4a,4b
が形成されガラス板1aには前記透明導電膜4aが外部に延
びて接続用電極4aとして図に示すように庇状に形成さ
れ、導電性接着剤5を介して、予め、突起形状の接続用
金属電極6が形成された半導体チップ7がフェースダウ
ンの状態で電気的に接続され、かつ接着・固定されてい
る。また、2は液晶、3はシール剤である。
FIG. 5 shows a connection structure in the case where a conductive adhesive is used in this liquid crystal display device. Reference numerals 1a and 1b denote two glass plates constituting a liquid crystal panel, which are transparent conductive films 4a and 4b, respectively.
On the glass plate 1a, the transparent conductive film 4a extends to the outside and is formed as a connecting electrode 4a in the shape of an eave as shown in the figure. The semiconductor chip 7 on which the metal electrode 6 is formed is electrically connected in a face-down state, and is adhered and fixed. Reference numeral 2 denotes a liquid crystal, and reference numeral 3 denotes a sealant.

発明が解決しようとする課題 前記の接着構造においては、第4図に示すように一般
的には庇状のガラス板1aの表面に形成された透明導電膜
4aからなる接続用電極4a上に直接半導体チップ7の突起
形状の接続用金属電極6がフェースダウンの状態で、導
電性接着剤5を介して電気的接続および接着・固定を行
うために、前記接続用電極4a′の大部分は露出状態にな
っている(半導体チップ7が載置されない部分も含
む)。そして透明電極に一般に使用される透明導電膜は
酸化物であるため乾燥大気中では安定であるが、水分が
存在すると分解し易く、さらに電圧を印加すると電解腐
食あるいは、隣接間ショートによる過大電流のために透
明導電膜の断線が生じることや、金属クズなどの導電性
のゴミや汗、だ液などのイオン性汚物が付着し、ショー
トや腐食の原因になるなど、液晶表示装置に適用した場
合に、品質、長期的接続信頼性に欠ける大きな問題を有
していた。この対策の1つとして、前記の接続用電極4
a′すなわち透明導電膜上に無電解めっき法などにより
ニッケルめっき、あるいはニッケルめっきした上に、さ
らに金めっきすることにより金属皮膜を施した構造が見
られる。この場合、透明導電膜表面のわずかな汚染等が
あれば、透明導電膜表面はめっき皮膜が均一、かつ完全
に被覆されず、多数のピンホールが発生する問題があ
る。さらに、透明導電膜の膜厚が通常300Å〜2000Åで
あり極めて薄いために、厚み方向、すなわち、透明導電
膜の側面においては、めっき皮膜の密着が非常に悪い状
態で形成されるなどの問題があり前記のように水分の存
在などによりめっき皮膜のピンホールや、透明導電膜と
めっき皮膜との界面から水分が侵入し、電圧を印加する
ことによって電解腐食を生ずるなど恒久的な対策にはな
っていない。
Problems to be Solved by the Invention In the above-mentioned bonding structure, as shown in FIG. 4, a transparent conductive film generally formed on the surface of an eave-shaped glass plate 1a
In order to perform electrical connection and bonding / fixing via the conductive adhesive 5 in a state in which the protruding connection metal electrode 6 of the semiconductor chip 7 is face-down directly on the connection electrode 4a made of 4a, Most of the connection electrode 4a 'is exposed (including a portion where the semiconductor chip 7 is not mounted). Transparent conductive films generally used for transparent electrodes are oxides and are stable in dry air because they are oxides.However, they are easily decomposed in the presence of moisture, and when a voltage is applied, electrolytic corrosion or short-circuit between adjacent electrodes causes excessive current. When applied to a liquid crystal display device, such as disconnection of the transparent conductive film, or adhesion of conductive dust such as metal scraps or ionic contaminants such as sweat or saliva, which may cause short-circuit or corrosion In addition, there were major problems that lacked quality and long-term connection reliability. As one of the measures, the connection electrode 4
a ', that is, a structure in which nickel plating is applied to the transparent conductive film by electroless plating or the like, and a metal film is applied by further gold plating. In this case, if there is slight contamination on the surface of the transparent conductive film, the surface of the transparent conductive film is not uniformly and completely covered with the plating film, and there is a problem that many pinholes are generated. Furthermore, since the thickness of the transparent conductive film is usually 300 to 2000 mm and extremely thin, there is a problem that the plating film is formed in an extremely poor state in the thickness direction, that is, on the side surface of the transparent conductive film. As described above, permanent measures such as the intrusion of moisture from the pinholes of the plating film or the interface between the transparent conductive film and the plating film due to the presence of moisture and the occurrence of electrolytic corrosion by applying a voltage are provided. Not.

本発明は、このような課題を解決するものであり、異
方導電性接着剤を用いて半導体チップをフェースダウン
状態で液晶パネル上に直接実装した液晶表示装置などに
おける透明導電膜の保護を完全に達成し、高品質、高信
頼性の液晶表示装置に適用できる半導体装置を提供する
ものである。
The present invention solves such a problem, and completely protects a transparent conductive film in a liquid crystal display device or the like in which a semiconductor chip is directly mounted on a liquid crystal panel in a face-down state using an anisotropic conductive adhesive. And a semiconductor device which can be applied to a high quality and high reliability liquid crystal display device.

課題を解決するための手段 前記の課題を解決するために本発明の半導体装置は、
絶縁性基板上に、上部層が金属皮膜で、下部層が透明導
電膜である接続用電極上に、合成樹脂からなる保護膜を
設け、突起形状の接続用金属電極を設けた半導体チップ
が、前記絶縁性基板上に設けた接続用電極と互いに対向
するように配置し、前記半導体チップの接続用金属電極
を異方導電性接着剤を介して、熱圧着により、前記保護
膜を突き破り、前記接続用電極と電気的に接続されるよ
うに取付けた構成とするものである。
Means for Solving the Problems To solve the above problems, a semiconductor device of the present invention
On an insulating substrate, a semiconductor chip provided with a protective film made of a synthetic resin on a connection electrode whose upper layer is a metal film and a lower layer is a transparent conductive film, and provided with a protruding connection metal electrode, The connection electrode provided on the insulating substrate is disposed so as to face each other, and the connection metal electrode of the semiconductor chip is pierced through the protective film by thermocompression bonding via an anisotropic conductive adhesive. It is configured to be mounted so as to be electrically connected to the connection electrode.

作用 この構成によれば、絶縁性基板上に、上部層が金属皮
膜で、下部層が透明導電膜である接続用電極上に、さら
に合成樹脂からなる保護膜が形成されたものであり、突
起形状の接続用金属電極を設けた半導体チップと前記絶
縁性基板上に設けた接続用電極との電気的接続において
前記保護膜は、半導体チップの熱圧着時に溶融し加圧力
により、半導体チップに設けた突起形状の接続用金属電
極で突き破られるとともに接続用金属電極以外の周縁部
に大半が排除されることにより電気的接続が得られるも
のである。しかも、前記のように絶縁性基板上に上部層
に金属皮膜を設けることにより、下部層の透明導電膜を
予め、大まかに保護したうえに、前記半導体チップにお
ける接続用金属電極が電気的に接続されない部分の接続
用電極、および半導体チップ以外の部分(半導体チップ
が載置されていない露出部分)に保護膜が残存している
ために、2重に保護されていることになり、湿気、ゴミ
などを遮断でき、結果的に接続用電極が完全に外気から
保護された状態を保持し、高品質、高信頼性の半導体装
置を得ることができる。
According to this configuration, a protective film made of a synthetic resin is further formed on a connection electrode having an upper layer made of a metal film and a lower layer made of a transparent conductive film on the insulating substrate, and In the electrical connection between the semiconductor chip provided with the connection metal electrode having a shape and the connection electrode provided on the insulating substrate, the protective film is melted at the time of thermocompression of the semiconductor chip and provided on the semiconductor chip by a pressing force. The electrical connection can be obtained by being pierced by the protruding connection-shaped metal electrode and being largely removed at the peripheral portion other than the connection metal electrode. Moreover, by providing a metal film on the upper layer on the insulating substrate as described above, the transparent conductive film of the lower layer is roughly protected in advance, and the metal electrodes for connection in the semiconductor chip are electrically connected. Since the protective film remains on the connection electrode in the portion that is not covered and the portion other than the semiconductor chip (exposed portion where the semiconductor chip is not mounted), the protection film is doubly protected. And the like, and as a result, a state in which the connection electrode is completely protected from the outside air can be maintained, and a semiconductor device with high quality and high reliability can be obtained.

実施例 以下、本発明の一実施例を図面を用いて説明する。第
2図aにおいて、11a,11bは液晶パネルを構成する2枚
の絶縁性基板としてのガラス板であり、それぞれ透明導
電膜14a,14a′,14bが形成され、ガラス板11aには前記透
明導電膜14a′が外部に延び庇状に露出している。な
お、12は液晶、13はシール剤である。15は前記透明導電
膜14a′上に設けた金属皮膜であり、前記透明導電膜14
a′と金属皮膜15とにより接続用電極として構成されて
いる。16は前記金属皮膜15上に設けた合成樹脂からなる
保護膜であり、前記透明導電膜14a′上には、金属皮膜1
5と、合成樹脂16の2重の保護膜が設けられている。な
お、金属皮膜15として、本実施例では、無電解めっき法
により膜厚0.8μmのニッケルめっき皮膜を形成した
後、さらに無電解めっき法により0.05μmの金めっき皮
膜を形成したものを用いたが、その他として、金,銀,
銅,クロム,白金,パラジウム,アルミニウム,半田等
の単層皮膜、さらには、これらの多層皮膜,合金皮膜な
どを無電解めっき法,電解めっき法,スパッタリング
法,蒸着法等を用いて形成した金属皮膜なども有効であ
る。また、合成樹脂からなる保護膜16として、本実施例
では、半導体チップの熱圧着による接続において、容易
に溶融し、かつ接着強度の高い熱可塑性ポリエステル樹
脂を用い、前記透明導電膜14a′上に形成された金属皮
膜15とを完全に覆うために、全面にコーティングを行い
保護膜とした。その他、前記保護膜として、アクリル,
ポリビニールブチラール,オリスチレン等の熱可塑性樹
脂,スチレン−ブタジエン共重合体ゴム等の熱可塑性ゴ
ム,未硬化液状のフェノール樹脂,エポキシ樹脂,エポ
キシ変性フェノール樹脂,シリコン樹脂等の硬化性樹
脂,未硬化液状のエポキシアクリレートオリゴマー,ア
クリレートモノマー等の光硬化性樹脂等の単体もしく
は、混合物なども有効である。なお第2図bは、前記第
2図aにおけるA−A′部分の断面図であり、ガラス板
11a上に形成した透明導電膜を14a′と、さらには、その
上に形成した金属皮膜15とから構成される接続用電極、
および、前記接続用電極以外の余白部分を含む全面に保
護膜16を形成した状態を示すものである。
Embodiment Hereinafter, an embodiment of the present invention will be described with reference to the drawings. In FIG. 2a, reference numerals 11a and 11b denote glass plates as two insulating substrates constituting a liquid crystal panel, on which transparent conductive films 14a, 14a 'and 14b are formed, respectively. The film 14a 'extends to the outside and is exposed like an eave. In addition, 12 is a liquid crystal and 13 is a sealant. Reference numeral 15 denotes a metal film provided on the transparent conductive film 14a ',
a ′ and the metal film 15 constitute a connection electrode. Reference numeral 16 denotes a protective film made of a synthetic resin provided on the metal film 15, and a metal film 1 on the transparent conductive film 14a '.
5 and a double protective film of a synthetic resin 16 are provided. In the present embodiment, as the metal film 15, a nickel plating film having a thickness of 0.8 μm was formed by an electroless plating method, and then a gold plating film having a thickness of 0.05 μm was formed by an electroless plating method. , And others, gold, silver,
Single-layer coatings of copper, chromium, platinum, palladium, aluminum, solder, etc., as well as metals formed by electroless plating, electrolytic plating, sputtering, vapor deposition, etc. of these multilayers, alloys, etc. Coatings are also effective. Further, in the present embodiment, as the protective film 16 made of a synthetic resin, in the connection by thermocompression bonding of the semiconductor chip, a thermoplastic polyester resin which easily melts and has a high adhesive strength is used, and the protective film 16 is formed on the transparent conductive film 14a '. In order to completely cover the formed metal film 15, the entire surface was coated to form a protective film. In addition, acrylic,
Thermoplastic resins such as polyvinyl butyral and polystyrene, thermoplastic rubbers such as styrene-butadiene copolymer rubber, uncured liquid phenolic resin, epoxy resin, epoxy-modified phenolic resin, curable resin such as silicone resin, uncured liquid Of epoxy acrylate oligomers, acrylate monomers, and other photo-curable resins, or a mixture thereof is also effective. FIG. 2B is a cross-sectional view taken along the line AA ′ in FIG.
A connection electrode composed of a transparent conductive film 14a ′ formed on 11a and a metal film 15 formed thereon,
Also, a state is shown in which a protective film 16 is formed on the entire surface including a blank portion other than the connection electrodes.

次いで、第3図に示すように、予め半導体チップ18の
電極部分に、金めっきにより突起形状の接続用金属電極
17を形成し、前記接続用金属電極17を含む半導体チップ
18の表面に合成樹脂19中に導電粉末20を分散させてなる
異方導電性接着剤層21を形成した。この構成について詳
述するならば、前記半導体チップ18における突起形状の
接続用金属電極17として、本実施例では金を用いたが、
その他として、半田,銀,銅,白金,パラジウム,ニッ
ケル,クロム等の単体、もしくは複合したものを用いて
も良い。
Next, as shown in FIG. 3, the electrode portions of the semiconductor chip 18 are previously formed with gold-plated connecting metal electrodes for projection.
17 is a semiconductor chip including the connection metal electrode 17
An anisotropic conductive adhesive layer 21 formed by dispersing conductive powder 20 in synthetic resin 19 was formed on the surface of 18. If this structure is described in detail, gold is used in the present embodiment as the protruding connection metal electrode 17 on the semiconductor chip 18, but
Alternatively, a simple substance or a composite substance of solder, silver, copper, platinum, palladium, nickel, chromium, etc. may be used.

また、異方導電性接着剤21を構成する合成樹脂19とし
ては、前記保護膜16と同様のものが良好であり、本実施
例では熱可塑性ポリエステル樹脂を用いた。さらに導電
粉末20としては、本実施例では、1〜40μmの粒径のポ
リスチレン樹脂ボールに無電解ニッケルめっき皮膜した
後、さらに無電解金めっき皮膜を形成したものを用いた
が、合成樹脂19との兼ね合いにより、ニッケル,半田,
金,銀,銅等の金属粉末や、カーボン粉,グラファイト
粉等の導電性粉末を用いることもできる。
Further, as the synthetic resin 19 constituting the anisotropic conductive adhesive 21, the same as the protective film 16 is preferable, and in this embodiment, a thermoplastic polyester resin was used. Further, as the conductive powder 20, in the present embodiment, a polystyrene resin ball having a particle diameter of 1 to 40 μm, an electroless nickel plating film was used, and then an electroless gold plating film was further used. Nickel, solder,
Metal powders such as gold, silver, and copper, and conductive powders such as carbon powder and graphite powder can also be used.

なお、異方導電性接着剤21を得るために、本実施例で
は前記熱可塑性ポリエステル樹脂100重量部に、前記の
ようなめっき皮膜付スチレン樹脂ボール状の導電粉末24
重量部添加し、ボールミルで混合し異方導電性接着剤と
した。この異方導電性接着剤21はシート化し、80℃程度
の低温で、第3図のような前記接続用金属電極を含む半
導体チップ18の表面に熱圧着により仮固定した。さらに
は本実施例では、前記のように半導体チップ18の表面に
異方導電接着剤21を形成したが、これに限ることなく、
第4図に示すように、ガラス板11a上(透明導電膜14
a′,金属皮膜15,保護膜16を含む)に予め異方導電性接
着剤(シート)21を形成しても本発明には何ら支障をき
たすものではない。
In this embodiment, in order to obtain the anisotropic conductive adhesive 21, 100 parts by weight of the thermoplastic polyester resin is added to the conductive powder 24 in the form of a styrene resin ball having a plating film as described above.
Parts by weight were added and mixed by a ball mill to obtain an anisotropic conductive adhesive. The anisotropic conductive adhesive 21 was formed into a sheet and temporarily fixed at a low temperature of about 80 ° C. to the surface of the semiconductor chip 18 including the connecting metal electrodes as shown in FIG. 3 by thermocompression bonding. Furthermore, in the present embodiment, the anisotropic conductive adhesive 21 is formed on the surface of the semiconductor chip 18 as described above, but is not limited thereto.
As shown in FIG. 4, on the glass plate 11a (the transparent conductive film 14)
a ', including the metal film 15 and the protective film 16), the anisotropic conductive adhesive (sheet) 21 formed in advance does not hinder the present invention.

次いで、第1図に示すように、予め金からなる突起形
状の接続用金属電極17と異方導電性接着剤21とが形成さ
れた半導体チップ18における接続用金属電極17と前記ガ
ラス板11a上に形成した接続用電極とを互いに対向させ
た状態(半導体チップ18がフェースダウン状態をなす)
で位置合わせし、半導体チップ18の裏面から140℃加熱
ツールと3kg/cm2の圧力で30秒間押え電気的に接続、固
定し液晶表示装置とした。このような接続構造によれ
ば、前記第1図に示すように保護膜16は半導体チップ18
の熱圧着時に溶融し加圧力により、半導体チップ18に形
成された突起形状の接続用金属電極17で突き破られると
ともに、流動し接続用金属電極17以外の周縁部に、大半
は排除され、同時に、異方導電性接着剤21中の導電粉末
20が半導体チップ18の接続用金属電極17と、ガラス板11
a上の接続用電極との間に挟まり、電気的接続が得られ
るものである。また半導体チップ18のうち、接続用金属
電極17の以外の部分も保護膜16と異方導電性接着剤21を
構成する合成樹脂19が熱圧着により混在する形で全面接
着されるために接着強度が著しく向上できる。さらに
は、接続用電極において半導体チップ18が載置されない
部分には保護膜16が残存し外気と遮断し防湿効果を得る
ことができる。ちなみに、本実施例により得た液晶表示
装置の防湿効果を確認するために、前記液晶表示装置10
側について、それぞれ印加電圧DC15Vを印加しながら、6
0℃で90〜95%RHの恒温恒湿雰囲気中に投入し、耐電食
性試験を行った。これにより得た結果を次の表に示し
た。
Next, as shown in FIG. 1, the connection metal electrode 17 and the glass plate 11a on the semiconductor chip 18 on which the protruding connection metal electrode 17 made of gold and the anisotropic conductive adhesive 21 are formed in advance. (The semiconductor chip 18 is in a face-down state) with the connection electrodes formed on the other side facing each other.
The semiconductor chip 18 was pressed from the back surface of the semiconductor chip 18 with a 140 ° C. heating tool at a pressure of 3 kg / cm 2 for 30 seconds, and was electrically connected and fixed to obtain a liquid crystal display device. According to such a connection structure, as shown in FIG.
During the thermocompression bonding, the metal is melted and pierced by the protruding connection metal electrode 17 formed on the semiconductor chip 18 by the pressurizing force, and at the same time, flows to the peripheral portion other than the connection metal electrode 17, and is mostly removed, and at the same time, , Conductive powder in anisotropic conductive adhesive 21
Reference numeral 20 denotes a metal electrode 17 for connection of a semiconductor chip 18 and a glass plate 11
It is sandwiched between the connection electrodes on a and electrical connection is obtained. In addition, since the protective film 16 and the synthetic resin 19 constituting the anisotropic conductive adhesive 21 are bonded over the entire surface of the semiconductor chip 18 except for the connecting metal electrode 17 by thermocompression bonding, the bonding strength is increased. Can be significantly improved. Furthermore, the protective film 16 remains in a portion of the connection electrode where the semiconductor chip 18 is not mounted, and is shielded from the outside air, so that a moisture-proof effect can be obtained. Incidentally, in order to confirm the moisture-proof effect of the liquid crystal display device obtained according to the present embodiment, the liquid crystal display device 10 was used.
Side, while applying the applied voltage DC15V each, 6
The sample was put in a constant temperature and humidity atmosphere of 90 to 95% RH at 0 ° C. to perform an electric corrosion resistance test. The results obtained are shown in the following table.

さらに比較例1,2として従来技術により液晶表示装置
を作製した。
Further, as Comparative Examples 1 and 2, liquid crystal display devices were manufactured by a conventional technique.

比較例1 第5図に示すように2枚のガラス板1a,1bにはそれぞ
れ透明導電膜4a,4bを形成し、ガラス板1aには、前記透
明導電膜4aが外部に延び接続用電極4aとして庇状に露出
させた液晶パネルを作製した。そしてこの液晶パネルの
庇状部分に形成した前記透明導電膜4aと、予め半導体チ
ップ7の電極部分に、金めっきで形成した突起形状の接
続用金属電極6に、銀粉末をエポキシ樹脂中に分散させ
て得た導電性接着剤をディップ法により形成したものと
を互いに対向させ、位置整合し、載置した後、150℃で
熱硬化し電気的に接続・固定し液晶表示装置を得た。
COMPARATIVE EXAMPLE 1 As shown in FIG. 5, transparent conductive films 4a and 4b are formed on two glass plates 1a and 1b, respectively. As a result, a liquid crystal panel exposed like an eave was manufactured. Silver powder is dispersed in an epoxy resin on the transparent conductive film 4a formed on the eaves-like portion of the liquid crystal panel, on the connecting metal electrode 6 having a protruding shape formed by gold plating on the electrode portion of the semiconductor chip 7 in advance. The conductive adhesive obtained by the dip method was opposed to each other, aligned, mounted, and then thermoset at 150 ° C., electrically connected and fixed to obtain a liquid crystal display device.

比較例2 比較例2として、比較例1における液晶パネルの庇状
に露出させた透明導電膜4aからなる接続用電極4a上に、
本実施例と同様に0.8μm厚のニッケルめっき皮膜を形
成した後、さらに0.05μm厚の金めっき皮膜を形成し、
前記比較例1と同様の方法で、半導体チップを電気的に
接続・固定し液晶表示装置を得た。
Comparative Example 2 As Comparative Example 2, on the connection electrode 4a made of the transparent conductive film 4a exposed in an eaves shape of the liquid crystal panel in Comparative Example 1,
After forming a nickel plating film having a thickness of 0.8 μm in the same manner as in this example, a gold plating film having a thickness of 0.05 μm was further formed,
A semiconductor chip was electrically connected and fixed in the same manner as in Comparative Example 1 to obtain a liquid crystal display device.

これら比較例1,2において本実施例と同様に、それぞ
れ液晶表示装置10個づつについて、耐電食性試験を行な
った。これにより得た結果を次の表に示した。
In Comparative Examples 1 and 2, similarly to the present example, an electrolytic corrosion resistance test was performed on each of ten liquid crystal display devices. The results obtained are shown in the following table.

前記表に示すとおり、本実施例における液晶表示装置
は、耐電食性試験において、電食断線不良は全く発生し
なかった。
As shown in the above table, in the liquid crystal display device of the present example, in the electric corrosion resistance test, no electric corrosion breakage failure occurred at all.

発明の効果 本発明のように構成した半導体装置は、絶縁性基板上
に設けた透明導電膜上に、金属皮膜と合成樹脂からなる
保護膜を形成した2重の保護膜構成により、半導体チッ
プが載置されない部分の透明導電膜の耐湿性、防塵性を
著しく向上できるとともに、半導体チップをフェースダ
ウン状で電気的に接続・固定において、その電気的接続
は、突起形状の接続用金属電極が、異方導電性接着剤を
介して、合成樹脂からなる保護膜を突き破り、透明導電
膜上に設けた金属皮膜に、異方導電性接着剤中の多数導
電粉末によりオーミックな接続が得られる。また、この
状態で、合成樹脂からなる保護膜で半導体チップの接続
用金属電極以外の部分が全面接着・固定されるため接続
信頼性を著しく向上できる。さらには、液晶表示装置に
おけるクロストーク防止のために、抵抗値を低減する目
的で透明導電膜上に金属皮膜を設ける試みも、従来は、
電食断線が完全に防止できなかったが、本発明の構成に
より、達成できるなど、半導体チップ実装タイプの液晶
表示装置として、高信頼性,高品位のものが得られるな
ど極めて工業的価値の大なるものである。
Effect of the Invention The semiconductor device configured as in the present invention has a semiconductor chip having a double protective film configuration in which a protective film made of a metal film and a synthetic resin is formed on a transparent conductive film provided on an insulating substrate. The moisture resistance and dust resistance of the transparent conductive film in the part where it is not mounted can be remarkably improved, and when the semiconductor chip is electrically connected and fixed in a face-down manner, the electrical connection is made by a protruding connection metal electrode, Through the anisotropic conductive adhesive, the protective film made of a synthetic resin is pierced, and an ohmic connection can be obtained to the metal film provided on the transparent conductive film by the multiple conductive powders in the anisotropic conductive adhesive. In this state, the entire surface of the semiconductor chip other than the connection metal electrodes is adhered and fixed by the protective film made of synthetic resin, so that the connection reliability can be significantly improved. Furthermore, in order to prevent crosstalk in a liquid crystal display device, an attempt to provide a metal film on a transparent conductive film for the purpose of reducing the resistance value has been conventionally performed.
Although the electrolytic corrosion disconnection could not be completely prevented, it can be achieved by the configuration of the present invention. As a result, a highly reliable and high-quality liquid crystal display device of a semiconductor chip mounting type is obtained. It becomes.

【図面の簡単な説明】[Brief description of the drawings]

第1図は、本発明の一実施例の半導体装置の部分断面
図、第2図a,bは、本発明の一実施例の構成を説明する
ための部分断面図、第3図は、本発明の一実施例に用い
た突起形状の接続用金属電極を設けた半導体チップ表面
に、異方導電性接着剤を設けた状態を示す部分断面図、
第4図は、本発明の他の実施例を示す要部の断面図、第
5図は従来の半導体装置の接続状態を示す部分断面図で
ある。 11a,11b……絶縁性基板、12……液晶、13……シール
剤、14a,14a′,14b……透明導電膜、15……金属皮膜、1
6……保護膜、17……接続用金属電極、18……半導体チ
ップ、19……合成樹脂、20……導電粉末、21……異方導
電性接着剤。
FIG. 1 is a partial cross-sectional view of a semiconductor device according to one embodiment of the present invention, FIGS. 2a and 2b are partial cross-sectional views illustrating the configuration of one embodiment of the present invention, and FIG. Partial cross-sectional view showing a state in which an anisotropic conductive adhesive is provided on the surface of a semiconductor chip provided with a protruding connection metal electrode used in an embodiment of the present invention,
FIG. 4 is a sectional view of a main part showing another embodiment of the present invention, and FIG. 5 is a partial sectional view showing a connection state of a conventional semiconductor device. 11a, 11b: insulating substrate, 12: liquid crystal, 13: sealant, 14a, 14a ', 14b ... transparent conductive film, 15: metal film, 1
6 ... Protective film, 17 ... Metal electrode for connection, 18 ... Semiconductor chip, 19 ... Synthetic resin, 20 ... Conductive powder, 21 ... Anisotropic conductive adhesive.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】絶縁性基板上に、上部層が金属皮膜で、下
部層が透明導電膜である接続用電極上に、合成樹脂から
なる保護膜を設け、突起形状の接続用金属電極を設けた
半導体チップを、前記絶縁性基板上に設けた接続用電極
と互いに対向するように配置し、前記半導体チップの接
続用金属電極を異方導電性接着剤を介して、熱圧着によ
り、前記保護膜を突き破り、前記接続用電極と電気的に
接続されるように取付けた半導体装置。
A protective film made of a synthetic resin is provided on a connection electrode having an upper layer made of a metal film and a lower layer made of a transparent conductive film, and a projection-shaped connection metal electrode is provided on an insulating substrate. The semiconductor chip is disposed so as to face the connection electrode provided on the insulating substrate, and the connection metal electrode of the semiconductor chip is protected by the thermocompression bonding via an anisotropic conductive adhesive. A semiconductor device mounted so as to penetrate a film and be electrically connected to the connection electrode.
JP63334413A 1988-12-28 1988-12-28 Semiconductor device Expired - Fee Related JP2626015B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63334413A JP2626015B2 (en) 1988-12-28 1988-12-28 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63334413A JP2626015B2 (en) 1988-12-28 1988-12-28 Semiconductor device

Publications (2)

Publication Number Publication Date
JPH02177547A JPH02177547A (en) 1990-07-10
JP2626015B2 true JP2626015B2 (en) 1997-07-02

Family

ID=18277098

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63334413A Expired - Fee Related JP2626015B2 (en) 1988-12-28 1988-12-28 Semiconductor device

Country Status (1)

Country Link
JP (1) JP2626015B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3016888B2 (en) * 1990-10-31 2000-03-06 株式会社リコー Liquid crystal display
JP2002116455A (en) * 2000-08-01 2002-04-19 Kyodo Printing Co Ltd Liquid crystal display device, electrode substrate for the same device and method of manufacturing the same device
JP7470535B2 (en) 2020-03-10 2024-04-18 デクセリアルズ株式会社 Repair part having micro LED chip, manufacturing method thereof, repair method, and manufacturing method of light-emitting device

Also Published As

Publication number Publication date
JPH02177547A (en) 1990-07-10

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