JPH02177547A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH02177547A
JPH02177547A JP63334413A JP33441388A JPH02177547A JP H02177547 A JPH02177547 A JP H02177547A JP 63334413 A JP63334413 A JP 63334413A JP 33441388 A JP33441388 A JP 33441388A JP H02177547 A JPH02177547 A JP H02177547A
Authority
JP
Japan
Prior art keywords
film
transparent conductive
semiconductor chip
connection
protective film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63334413A
Other languages
Japanese (ja)
Other versions
JP2626015B2 (en
Inventor
Shigeru Yasuda
茂 安田
Koji Nishida
耕次 西田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP63334413A priority Critical patent/JP2626015B2/en
Publication of JPH02177547A publication Critical patent/JPH02177547A/en
Application granted granted Critical
Publication of JP2626015B2 publication Critical patent/JP2626015B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation

Abstract

PURPOSE:To contrive the improvement of the humidity resistance and the dust-proof property of a part, on which a semiconductor chip is not mounted, of a transparent conductive film by a method wherein a device is formed into a double protective film constitution, in which a protective film consisting of a metal film and a synthetic resin is formed on the transparent conductive film provided on an insulative substrate. CONSTITUTION:A metal film 15 provided on a transparent conductive film 14a' constitutes an electrode for connection use along with the film 14a'. A double protective film consisting of the film 15 and a synthetic resin 16 is provided on the film 14a'. Protrusion-shaped metallic electrodes 17 for connection use are formed on electrode parts of a semiconductor chip 18 and an anisotropic conductive bonding agent layer obtainable by dispersing conductive powder 20 in a synthetic resin 19 is formed on the surface of the chip 18 including the electrodes 17. Moreover, when a thermocompression bonding is performed from the rear of the chip 18 to a substrate, the protective film 16 is fused, broken through by the electrodes 17 and an electrical connection is obtained. Thereby, moisture, dust and the like can be intercepted and the electrode for connection use can be held in a state that it is completely protected from the air.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、透明導電膜から構成される液晶パネルに駆動
用の半導体チップを容易に、かつ信頼性良く直接実装し
た液晶表示装置などに適用される半導体装置に関するも
のである。
[Detailed Description of the Invention] Industrial Application Field The present invention is applied to liquid crystal display devices, etc., in which a driving semiconductor chip is easily and reliably mounted directly on a liquid crystal panel made of a transparent conductive film. The present invention relates to semiconductor devices.

従来の技術 近年、透明導電膜が形成された2枚のガラス板の間隙中
に液晶物質を充填させた構成の液晶パネルに駆動用の半
導体チップを直接実装して薄形、軽量の液晶表示装置に
する試みが盛んに行われている。この代表的な方法とし
て、予め半導体チップの電極部分に、金めつきなどで形
成された突起形状の接続用金属電極と、ガラス板上に透
明導電膜が形成された接続用電極とを互いに対向させた
状態(半導体チップがフェースダウン状態をなす)で、
この間に、導電性接着剤を介在させて電気的接続と接着
・固定を行う方法がある。このとき、導電性接着剤は、
予め、半導体チップの突起形状の接続用金属電極面に転
写法やデイツプ法などにより形成しておき、ガラス板上
の透明導電膜パターンに位置合わせして載置した後、熱
硬化することにより電気的に接続させるものである。
Conventional technology In recent years, thin and lightweight liquid crystal display devices have been developed in which a driving semiconductor chip is directly mounted on a liquid crystal panel in which a liquid crystal material is filled in the gap between two glass plates on which transparent conductive films are formed. There are many attempts to do so. A typical method for this is to place a metal connection electrode in the shape of a protrusion, which is formed by gold plating or the like on the electrode part of a semiconductor chip in advance, and a connection electrode, which has a transparent conductive film formed on a glass plate, facing each other. (the semiconductor chip is in a face-down state),
During this time, there is a method of interposing a conductive adhesive to perform electrical connection, adhesion, and fixation. At this time, the conductive adhesive is
Formed in advance on the protrusion-shaped connecting metal electrode surface of a semiconductor chip by a transfer method or dip method, and placed on a transparent conductive film pattern on a glass plate in alignment with the surface, electrical conductivity is formed by heat curing. It is intended to connect the

この液晶表示装置における導電性接着剤を用いた場合の
接続構造を第6図に示す。11L、1bは液晶パネルを
構成する2枚のガラス板であり、それぞれ透明導電膜4
iL、4bが形成されガラス板1aには前記透明導電膜
4aが外部に延びて接続用電極4aとして図に示すよう
に庇状に形成され、導電性接着剤6を介して、予め、突
起形状の接続用金属電極6が形成された半導体チップ7
がフェースダウンの状態で電気的に接続され、かつ接着
・固定されている。また、2は液晶、3はシール剤であ
る。
FIG. 6 shows a connection structure using a conductive adhesive in this liquid crystal display device. 11L and 1b are two glass plates constituting the liquid crystal panel, each of which is coated with a transparent conductive film 4.
iL, 4b is formed, and the transparent conductive film 4a is extended to the outside of the glass plate 1a to form an eave-like connection electrode 4a as shown in the figure. A semiconductor chip 7 on which a connecting metal electrode 6 is formed.
are electrically connected face-down and glued and fixed. Further, 2 is a liquid crystal, and 3 is a sealant.

発明が解決しようとする課題 前記の接続構造においては、第4図に示すように一般的
には庇状のガラス板1&の表面に形成された透明導電膜
4aからなる接続用電極4&上に直接半導体チップTの
突起形状の接続用金属電極6が7エースダウンの状態で
、導電性接着剤6を介して電気的接続および接着・固定
を行うために、前記接続用電極41L’の大部分は露出
状態になっている(半導体チップ7が載置されない部分
も含む)0そして透明電極に一般に使用される透明導電
膜は酸化物であるため乾燥大気中では安定であるが、水
分が存在すると分解し易く、さらに電圧を印加すると電
解腐食あるいは、隣接間シクートによる過大電流のため
に透明導電膜の断線が生じることや、金属クズなどの導
電性のゴミや汗、だ液などのイオン性汚物が付着し、シ
ッートや腐食の原因になるなど、液晶表示装置に適用し
た場合に、品質、長期的接続信頼性に欠ける大きな問題
を有していた。この対策の1つとして、前記の接続用電
極4&′すなわち透明導電膜上に無電解めっき法などに
よシニッケルめっき、あるいはニッケルめっきした上に
、さらに金めつきすることにより金属皮膜を施した構造
が見られる。この場合、透明導電膜表面のわずかな汚染
等があれば、透明導電膜表面はめっき皮膜が均一、かつ
完全に被覆されず、多数のピンホールが発生する問題が
ある。さらに、透明導電膜の膜厚が通常300人〜20
00人であり極めて薄いために、厚み方向、すなわち、
透明導電膜の側面においては、めっき皮膜の密着が非常
に悪い状態で形成されるなどの問題があり前記のように
水分の存在などによりめっき皮膜のピンホールや、透明
導電膜とめつき皮膜との界面から水分が侵入し、電圧を
印加することによって電解腐食を生ずるなど恒久的な対
策にはなっていない0 本発明は、このような課題を解決するものであり、異方
導電性接着剤を用いて半導体チップを7エースダウン状
態で液晶パネル上に直接実装した液晶表示装置などにお
ける透明導電膜の保護を完全に達成し、高品質、高信頼
性の液晶表示装置に適用できる半導体装置を提供するも
のである。
Problems to be Solved by the Invention In the above-mentioned connection structure, as shown in FIG. In order to perform electrical connection, adhesion, and fixation via the conductive adhesive 6 when the protrusion-shaped connection metal electrode 6 of the semiconductor chip T is in the 7 ace down state, most of the connection electrode 41L' is The transparent conductive film commonly used for transparent electrodes is exposed (including the part where the semiconductor chip 7 is not mounted) and is stable in dry air because it is an oxide, but decomposes in the presence of moisture. Furthermore, when voltage is applied, the transparent conductive film may be disconnected due to electrolytic corrosion or excessive current caused by adjacent lines, and conductive dirt such as metal scraps and ionic dirt such as sweat and saliva may be generated. When applied to liquid crystal display devices, there were major problems such as a lack of quality and long-term connection reliability, such as adhesion and causing sheeting and corrosion. One of the countermeasures against this problem is to have a structure in which the connection electrode 4&', that is, the transparent conductive film, is plated with nickel by electroless plating, or is plated with nickel and then further plated with gold to form a metal film. can be seen. In this case, if there is slight contamination or the like on the surface of the transparent conductive film, the surface of the transparent conductive film will not be uniformly and completely coated with a plating film, causing a problem that many pinholes will occur. Furthermore, the thickness of the transparent conductive film is usually 300 to 20
00 and is extremely thin, the thickness direction, that is,
On the side surfaces of the transparent conductive film, there are problems such as the plating film being formed with very poor adhesion, and as mentioned above, the presence of moisture can cause pinholes in the plating film and the formation of contact between the transparent conductive film and the plating film. Moisture enters from the interface and electrolytic corrosion occurs when voltage is applied, so there is no permanent solution to this problem.The present invention solves these problems and uses an anisotropically conductive adhesive. This technology completely protects the transparent conductive film in liquid crystal display devices in which semiconductor chips are directly mounted on liquid crystal panels in the 7 ace down state, and provides a semiconductor device that can be applied to high-quality, highly reliable liquid crystal display devices. It is something to do.

課題を解決するための手段 前記の課題を解決す石ために本発明の半導体装置は、絶
縁性基板上に、上部層が金属皮膜で、下部層が透明導電
膜である接続用電極上に、合成樹脂からなる保護膜を設
け、突起形状の接続用金属電極を設けた半導体チップが
、前記絶縁性基板上に設けた接続用電極と互いに対向す
るように配置し、前記半導体チップの接続用金属電極を
異方導電性接着剤を介して、熱圧着により、前記保護膜
を突き破り、前記接続用電極と電気的に接続されるよう
に取付けた構成とするものである。
Means for Solving the Problems In order to solve the above-mentioned problems, the semiconductor device of the present invention includes a semiconductor device on an insulating substrate, on a connecting electrode in which the upper layer is a metal film and the lower layer is a transparent conductive film. A semiconductor chip provided with a protective film made of synthetic resin and provided with a protrusion-shaped connection metal electrode is arranged so as to face the connection electrode provided on the insulating substrate, and the connection metal of the semiconductor chip is disposed so as to face the connection electrode provided on the insulating substrate. The electrode is attached by thermocompression bonding via an anisotropic conductive adhesive so as to break through the protective film and be electrically connected to the connection electrode.

作用 この構成によれば、絶縁性基板上に、上部層が金属皮膜
で、下部層が透明導電膜である接続用電極上に、さらに
合成樹脂からなる保護膜が形成されたものであシ、突起
形状の接続用金属電極を設けた半導体チップと前記絶縁
性基板上に設けた接続用電極との電気的接続において前
記保護膜は、半導体チップの熱圧着時に溶融し加圧力に
よシ、半導体チップに設けた突起形状の接続用金属電極
で突き破られるとともに接続用金属電極以外の周縁部に
大半が排除されることによシミ気的接続が得られるもの
である。しかも、前記のように絶縁性基板上に上部層に
金属皮膜を設けることにより、下部層の透明導電膜を予
め、大まかに保護したうえに、前記半導体チップにおけ
る接続用金属電極が電気的に接続されない部分の接続用
電極、および半導体チップ以外の部分(半導体チップが
載置されていない露出部分)に保護膜が残存しているた
めに、2重に保護されていることになり、湿気、ゴミな
どを遮断でき、結果的に接続用電極が完全に外気から保
護された状態を保持し、高品質、高信頼性の半導体装置
を得ることができる。
According to this structure, a protective film made of a synthetic resin is further formed on an insulating substrate, on a connection electrode whose upper layer is a metal film and whose lower layer is a transparent conductive film. In the electrical connection between the semiconductor chip provided with the protrusion-shaped connection metal electrode and the connection electrode provided on the insulating substrate, the protective film melts during thermocompression bonding of the semiconductor chip and is damaged by the pressure force. A stain-free connection is obtained by being pierced by a protrusion-shaped connection metal electrode provided on the chip and removing most of it to the peripheral area other than the connection metal electrode. Moreover, by providing the metal film on the upper layer on the insulating substrate as described above, the transparent conductive film on the lower layer is roughly protected in advance, and the metal electrodes for connection on the semiconductor chip are electrically connected. Since the protective film remains on the connection electrodes on the parts that are not exposed, and on the parts other than the semiconductor chip (exposed parts where the semiconductor chip is not mounted), there is double protection, and moisture and dirt are removed. As a result, the connecting electrodes can be kept completely protected from the outside air, and a high quality and highly reliable semiconductor device can be obtained.

実施例 以下、本発明の一実施例を図面を用いて説明する。第2
図aにおいて、11&、・11bは液晶パネルを構成す
る2枚の絶縁性基板としてのガラス板であり、それぞれ
透明導電膜141L、141L’。
EXAMPLE Hereinafter, an example of the present invention will be described with reference to the drawings. Second
In Figure a, 11&, 11b are glass plates serving as two insulating substrates constituting the liquid crystal panel, and have transparent conductive films 141L and 141L', respectively.

14bが形成され、ガラス板111Lには前記透明導電
膜14&′が外部に延び庇状に露出している。
14b is formed, and the transparent conductive film 14&' extends outward from the glass plate 111L and is exposed in the shape of an eave.

なお、12は液晶、13はシール剤である。16は前記
透明導電膜141′上に設けた金属皮膜であシ、前記透
明導電膜141L’と金属皮膜15とにより接続用電極
として構成されている。16は前記金属皮膜15上に設
けた合成樹脂からなる保護膜であり、前記透明導電膜1
4a′上には、金属皮膜16と、合成樹脂16の2重の
保護膜が設けられている。なお、金属皮膜15として、
本実施例では、無電解めっき法により膜厚0.8μmの
ニッケルめっき皮膜を形成した後、さらに無電解めっき
法によりOlOSμmの金めつき皮膜を形成したものを
用いたが、その他として、金、銀、銅、クロム、白金、
パラジウム、アルミニウム、半田等の単層皮膜、さらに
は、これらの多層皮膜2合金皮膜などを無電解めっき法
、電解めっき法、スパッタリング法、蒸着法等を用いて
形成した金属皮膜なども有効である。また、合成樹脂か
らなる保護膜16として、本実施例では、半導体チップ
の熱圧着による接続において、容易に溶融し、かつ接着
強度の高い熱可塑性ポリエステル樹脂を用い、前記透明
導電膜141L’上に形成された金属皮膜15とを完全
に覆うために、全面にコーティングを行い保護膜とした
。その他、前記保護膜として、アクリル、ポリビニール
ブチラール、ポリスチレン等の熱可塑性樹脂、スチレン
ープタジエ/共重合体ゴム等の熱可塑性ゴム、未硬化液
状の7エノール樹脂、エポキシ樹脂、エポキシ変性フェ
ノール樹脂、シリコン樹脂等の硬化性樹脂、未硬化液状
のエポキシアクリレートオリゴマー、アクリレートモノ
マー等の光硬化性樹脂等の単体もしくは、混合物なども
有効である。なお第2図すは、前記第2図1におけるム
ー五′部分の断面図であり、ガラス板11a上に形成し
た透明導電膜を14a′と、さらには、その上に形成し
た金属皮膜15とから構成される接続用電極、および、
前記接続用電極以外の余白部分を含む全面に保護膜16
を形成した状態を示すものである。
Note that 12 is a liquid crystal, and 13 is a sealant. Reference numeral 16 denotes a metal film provided on the transparent conductive film 141', and the transparent conductive film 141L' and the metal film 15 constitute a connection electrode. 16 is a protective film made of synthetic resin provided on the metal film 15, and the transparent conductive film 1
A double protective film of a metal film 16 and a synthetic resin 16 is provided on 4a'. In addition, as the metal film 15,
In this example, after forming a nickel plating film with a thickness of 0.8 μm by electroless plating, a gold plating film of OLOS μm was further formed by electroless plating. silver, copper, chrome, platinum,
Single-layer films of palladium, aluminum, solder, etc., as well as multi-layer films of these two alloy films, etc., formed using electroless plating, electrolytic plating, sputtering, vapor deposition, etc., are also effective. . Further, in this embodiment, as the protective film 16 made of synthetic resin, a thermoplastic polyester resin that is easily melted and has high adhesive strength is used in the connection of semiconductor chips by thermocompression bonding, and is used as the protective film 16 on the transparent conductive film 141L'. In order to completely cover the formed metal film 15, the entire surface was coated to form a protective film. In addition, as the protective film, thermoplastic resins such as acrylic, polyvinyl butyral, and polystyrene, thermoplastic rubbers such as styrene-butadiene/copolymer rubber, uncured liquid 7-enol resin, epoxy resin, and epoxy-modified phenol resin. , curable resins such as silicone resins, uncured liquid epoxy acrylate oligomers, photocurable resins such as acrylate monomers, etc. alone or in mixtures are also effective. FIG. 2 is a cross-sectional view of the 5' portion of FIG. a connection electrode consisting of;
A protective film 16 is applied to the entire surface including the blank area other than the connection electrode.
This figure shows the state in which .

次いで、第3図に示すように、予め半導体チップ18の
電極部分に、金めつきにより突起形状の接続用金属電極
17を形成し、前記接続用金属電極17を含む半導体チ
ップ18の表面に合成樹脂19中に導電粉末2oを分散
させてなる異方導電性接着剤層21を形成した。この構
成について詳述するならば、前記半導体チップ18にお
ける突起形状の接続用金属電極17として、本実施例で
は金を用いたが、その他として、半田、銀、銅。
Next, as shown in FIG. 3, protrusion-shaped connection metal electrodes 17 are formed in advance on the electrode portions of the semiconductor chip 18 by gold plating, and the surface of the semiconductor chip 18 including the connection metal electrodes 17 is synthesized. An anisotropic conductive adhesive layer 21 was formed by dispersing conductive powder 2o in resin 19. To explain this structure in detail, in this embodiment, gold was used as the protrusion-shaped connection metal electrode 17 on the semiconductor chip 18, but solder, silver, and copper may also be used.

白金、パラジウム、ニッケル、クロム等の単体、もしく
は複合したものを用いても良い。
Single or composite materials such as platinum, palladium, nickel, and chromium may be used.

また、異方導電性接着剤21を構成する合成樹脂19と
しては、前記保護膜16と同様のものが良好であり、本
実施例では熱可塑性ポリエステル樹脂を用いた。さらに
導電粉末20としては、本実施例では、1〜40μmの
粒径のポリスチレン樹脂ボールに無電解ニッケルめっき
皮膜した後、さらに無電解金めっき皮膜を形成したもの
を用いたが、合成樹脂19との兼ね合いにより、ニッケ
ル、半田、金、銀、銅等の金属粉末や、カーボン粉、グ
ラ7フイト粉等の導電性粉末を用いることもできる。
Furthermore, as the synthetic resin 19 constituting the anisotropically conductive adhesive 21, the same resin as that for the protective film 16 is suitable, and in this example, a thermoplastic polyester resin was used. Furthermore, as the conductive powder 20, in this example, a polystyrene resin ball with a particle size of 1 to 40 μm was coated with an electroless nickel plating film, and then an electroless gold plating film was further formed. Depending on the balance, metal powders such as nickel, solder, gold, silver, and copper, and conductive powders such as carbon powder and graphite powder may also be used.

なお、異方導電性接着剤21を得るために、本実施例で
は前記熱可塑性ポリエステル樹脂100重量部に、前記
のようなめっき皮膜付スチレン樹脂ボール状の導電粉末
24重量部添加し、ボールミルで混合し異方導電性接着
剤とした。この異方導電性接着剤21はシート化し、8
0℃程度の低温で、第3図のような前記接続用金属電極
を含む半導体チップ18の表面に熱圧着により仮固定し
た。さらには本実施例では、前記のように半導体チップ
18の表面に異方導電接着剤21を形成したが、これに
限ることなく、第4図に示すように、ガラス板11&上
(透明導電膜141L’、金属皮膜16、保護膜16を
含む)に予め異方導電性接着剤(シート)21を形成し
ても本発明には何ら支障をきたすものではない。
In order to obtain the anisotropic conductive adhesive 21, in this example, 24 parts by weight of the above-described conductive powder in the form of styrene resin balls with a plating film were added to 100 parts by weight of the thermoplastic polyester resin, and the mixture was milled in a ball mill. They were mixed to form an anisotropically conductive adhesive. This anisotropic conductive adhesive 21 is made into a sheet,
At a low temperature of about 0.degree. C., it was temporarily fixed to the surface of the semiconductor chip 18 including the connection metal electrodes as shown in FIG. 3 by thermocompression bonding. Further, in this embodiment, the anisotropic conductive adhesive 21 is formed on the surface of the semiconductor chip 18 as described above, but the present invention is not limited to this, and as shown in FIG. 141L', the metal film 16, and the protective film 16)), there is no problem in the present invention even if the anisotropically conductive adhesive (sheet) 21 is formed in advance on the film 141L', the metal film 16, and the protective film 16.

次いで、第1図に示すように、予め金からなる突起形状
の接続用金属電極17と異方導電性接着剤21とが形成
された半導体チップ18における接続用金属電極17と
前記ガラス板11a上に形成した接続用電極とを互いに
対向させた状態(半導体チップ18がフェースダウン状
態をなす)で位置合わせし、半導体チップ18の裏面か
ら140’C加熱ツールと3 kq々の圧力で30秒間
押え電気的に接続、固定し液晶表示装置とした。
Next, as shown in FIG. 1, the connection metal electrodes 17 in the semiconductor chip 18 on which the protrusion-shaped connection metal electrodes 17 made of gold and the anisotropically conductive adhesive 21 have been formed in advance are placed on the glass plate 11a. The connecting electrodes formed in the above are aligned so that they face each other (the semiconductor chip 18 is in a face-down state), and the semiconductor chip 18 is pressed from the back side with a 140'C heating tool and a pressure of 3 kq for 30 seconds. It was electrically connected and fixed to form a liquid crystal display device.

このような接続構造によれば、前記第1図に示すように
保護膜16は半導体チップ18の熱圧着時に溶融し加圧
力により、半導体チップ1Bに形成された突起形状の接
続用金属電極17で突き破られるとともに、流動し接続
用金属電極17以外の周縁部に、大半は排除され、同時
に、異方導電性接着剤21中の導電粉末20が半導体チ
ップ18の接続用金属電極17と、ガラス板11&上の
接続用電極との間に挟まり、電気的接続が得られるもの
である。また半導体チップ18のうち、接続用金属電極
17の以外の部分も保護膜16と異方導電性接着剤21
を構成する合成樹脂19が熱圧着により混在する形で全
面接着されるために接着強度が著しく向上できる。さら
には、接続用電極において半導体チップ18が載置され
ない部分には保護膜16が残存し外気と遮断し防湿効果
を得ることができる。ちなみに、本実施例により得た液
晶表示装置の防湿効果を確認するために、前記液晶表示
装置10個について、それぞれ印加電圧DC1sVを印
加しながら、60’Cで90〜954RHの恒温恒湿雰
囲気中に投入し、耐電食性試験を行った。これにより得
た結果を次の表に示した。
According to such a connection structure, as shown in FIG. 1, the protective film 16 melts during thermocompression bonding of the semiconductor chip 18, and due to the pressure, the protrusion-shaped connection metal electrode 17 formed on the semiconductor chip 1B. As it is pierced, most of the conductive powder 20 in the anisotropic conductive adhesive 21 flows and is removed to the peripheral area other than the connection metal electrode 17, and at the same time, the conductive powder 20 in the anisotropic conductive adhesive 21 connects to the connection metal electrode 17 of the semiconductor chip 18 and the glass. It is sandwiched between the plate 11 and the connection electrode on the plate 11 to establish an electrical connection. In addition, parts of the semiconductor chip 18 other than the connecting metal electrodes 17 are also covered with the protective film 16 and the anisotropically conductive adhesive 21.
Since the synthetic resin 19 constituting the composite resin 19 is bonded to the entire surface in a mixed manner by thermocompression bonding, the adhesive strength can be significantly improved. Furthermore, the protective film 16 remains in the portion of the connection electrode where the semiconductor chip 18 is not placed, and is shielded from the outside air to provide a moisture-proofing effect. Incidentally, in order to confirm the moisture-proofing effect of the liquid crystal display device obtained in this example, each of the 10 liquid crystal display devices was placed in a constant temperature and humidity atmosphere of 90 to 954 RH at 60'C while applying an applied voltage of 1 sV DC. and conducted an electrolytic corrosion resistance test. The results obtained are shown in the following table.

さらに比較例1.2として従来技術によシ液晶表示装置
を作製した。
Further, as Comparative Example 1.2, a liquid crystal display device was manufactured using a conventional technique.

比較例1 第5図に示すように2枚のガラス板1m、1bにはそれ
ぞれ透明導電膜4m、4bを形成し、ガラス板1&には
、前記透明導電膜4aが外部に延び接続用電極41Lと
して庇状に露出させた液晶パネルを作製した。そしてこ
の液晶パネルの庇状部分に形成した前記透明導電膜41
Lと、予め半導体チップ7の電極部分に、金めつきで形
成した突起形状の接続用金属電極6に、銀粉末をエポキ
シ樹脂中に分散させて得た導電性接着剤をディソデ法に
より形成したものとを互いに対向させ、位置整合し、載
置した後、150’Cで熱硬化し電気的に接続・固定し
液晶表示装置を得た。
Comparative Example 1 As shown in FIG. 5, transparent conductive films 4m and 4b were formed on two glass plates 1m and 1b, respectively, and on glass plate 1&, the transparent conductive film 4a was extended to the outside and a connection electrode 41L was formed. As a result, we fabricated a liquid crystal panel exposed in the shape of an eave. The transparent conductive film 41 formed on the eave-like portion of this liquid crystal panel
A conductive adhesive obtained by dispersing silver powder in an epoxy resin was applied to the connection metal electrode 6 in the shape of a protrusion, which was previously formed by gold plating on the electrode portion of the semiconductor chip 7, using the disode method. After the components were placed facing each other, aligned, and placed, they were thermally cured at 150'C, electrically connected and fixed, and a liquid crystal display device was obtained.

比較例2 比較例2として、比較例1における液晶パネルの庇状に
露出させた透明導電膜4!Lからなる接続用電極4&上
に、本実施例と同様に0.8μm厚のニッケルめっき皮
膜を形成した後、さらに0.06μm厚の金めつき皮膜
を形成し、前記比較例1と同様の方法で、半導体チップ
を電気的に接続・固定し液晶表示装置を得た。
Comparative Example 2 As Comparative Example 2, the transparent conductive film 4 exposed in the eaves of the liquid crystal panel in Comparative Example 1! After forming a nickel plating film with a thickness of 0.8 μm on the connection electrode 4& consisting of Using this method, semiconductor chips were electrically connected and fixed to obtain a liquid crystal display device.

これら比較例1,2において本実施例と同様に、それぞ
れ液晶表示装置10個づつについて、耐電食性試験を行
なった。これにより得だ結果を次の表に示した。
In Comparative Examples 1 and 2, electrolytic corrosion resistance tests were conducted on 10 liquid crystal display devices each in the same manner as in the present example. The results obtained are shown in the table below.

表 前記表に示すとおり、本実施例における液晶表示装置は
、耐電食性試験において、電食断線不良は全く発生しな
かった。
Table As shown in the table above, the liquid crystal display device of this example did not have any electrical corrosion disconnection defects in the electrical corrosion resistance test.

発明の効果 本発明のように構成した半導体装置は、絶縁性基板上に
設けた透明導電膜上に、金属皮膜と合成樹脂からなる保
護膜を形成した2重の保護膜構成により、半導体チップ
が載置されない部分の透明導電膜の耐湿性、防塵性を著
しく向上できるとともに、半導体チップをフェースダウ
ン状で電気的に接続・固定において、その電気的接続は
、突起形状の接続用金属電極が、異方導電性接着剤を介
して、合成樹脂からなる保護膜を突き破り、透明導電膜
上に設けた金属皮膜に、異方導電性接着剤中の多数導電
粉末によりオーミックな接続が得られる。また、この状
態で、合成樹脂からなる保護膜で半導体チップの接続用
金属電極以外の部分が全面接着・固定されるため接続信
頼性を著しく向上できる。さらには、液晶表示装置にお
けるクロストーク防止のために、抵抗値を低減する目的
で透明導電膜上に金属皮膜を設ける試みも、従来は、電
食断線が完全に防止できなかったが、本発明の構成によ
り、達成できるなど、半導体チップ実装タイプの液晶表
示装置として、高信頼性、高品位のものが得られるなど
極めて工業的価値の大なるものである。
Effects of the Invention The semiconductor device constructed as in the present invention has a double protective film structure in which a protective film made of a metal film and a synthetic resin is formed on a transparent conductive film provided on an insulating substrate, so that the semiconductor chip is The moisture resistance and dust resistance of the transparent conductive film on the parts that are not placed can be significantly improved, and when semiconductor chips are electrically connected and fixed in a face-down manner, the electrical connections are made using protrusion-shaped connecting metal electrodes. The protective film made of synthetic resin is penetrated through the anisotropically conductive adhesive, and an ohmic connection is obtained by the multi-conductive powder in the anisotropically conductive adhesive to the metal film provided on the transparent conductive film. Furthermore, in this state, the entire surface of the semiconductor chip other than the connecting metal electrodes is adhered and fixed by the protective film made of synthetic resin, so that connection reliability can be significantly improved. Furthermore, attempts to provide a metal film on a transparent conductive film for the purpose of reducing resistance in order to prevent crosstalk in liquid crystal display devices have not been able to completely prevent electrical corrosion, but the present invention With this configuration, it is possible to obtain a semiconductor chip mounting type liquid crystal display device with high reliability and high quality, which is of great industrial value.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明の一実施例の半導体装置の部分断面図
、第2図a、bは、本発明の一実施例の構成を説明する
だめの部分断面図、第3図は、本発明の一実施例に用い
た突起形状の接続用金属電極を設けた半導体チップ表面
に、異方導電性接着剤を設けた状態を示す部分断面図、
第4図は、本発明の他の実施例を示す要部の断面図、第
5図は従来の半導体装置の接続状態を示す部分断面図で
ある0 111L、11b・・・・・・絶縁性基板、12・・・
・・・液晶、13・・・・・・シール剤、14&、14
&’、14b・・・・・・透明導電膜、16・・・・・
・金属皮膜、16・・・・・・保護膜、17・・・・・
・接続用金属電極、18・・・・・・半導体チップ、1
9・・・・−・合成樹脂、2o・・・・・・導電粉末、
21・・・・・・異方導電性接着剤。 代理人の氏名 弁理士 粟 野 重 孝 ほか1名//
a、 lfb −?e! #ca基板基板1麦− l毎, I41L′. 746−透明導電膜ts−&)
I4友項 16 −−−イ呆ガ1 積 Iγ−接涜用衾属を鈑 Iδ・・−半導不トテップ・ 19−・−令へ謝腸 112図 (6しン I3  図 17・・穆り免用金鷹1極 18・・−牛導伯1テッ7゛ t(? =− 4 1C I’! 11mm・−埠を粉
FIG. 1 is a partial sectional view of a semiconductor device according to an embodiment of the present invention, FIGS. 2a and 2b are partial sectional views illustrating the structure of an embodiment of the present invention, and FIG. A partial cross-sectional view showing a state in which an anisotropic conductive adhesive is provided on the surface of a semiconductor chip provided with a protrusion-shaped connecting metal electrode used in an embodiment of the invention,
FIG. 4 is a sectional view of a main part showing another embodiment of the present invention, and FIG. 5 is a partial sectional view showing a connection state of a conventional semiconductor device. Board, 12...
...Liquid crystal, 13...Sealant, 14 &, 14
&', 14b...Transparent conductive film, 16...
・Metal film, 16...Protective film, 17...
・Metal electrode for connection, 18... Semiconductor chip, 1
9...Synthetic resin, 2o... Conductive powder,
21...Anisotropic conductive adhesive. Name of agent: Patent attorney Shigetaka Awano and 1 other person//
a, lfb-? e! #ca board board 1 wheat - every 1, I41L'. 746-Transparent conductive film ts-&)
I4 Friend Section 16 ---I'm sorry for the 1 product Iγ-Sacrilegious use of the genus Iδ...-Semi-conducting totep 19--Rei to Xie-cho 112 Figures (6 Shin I3 Figure 17...Mu Rimenyo Kintaka 1 Pole 18...-Ushido Haku 1 Tet 7゛t(? =- 4 1C I'! 11mm--Powder the Bu

Claims (1)

【特許請求の範囲】[Claims] 絶縁性基板上に、上部層が金属皮膜で、下部層が透明導
電膜である接続用電極上に、合成樹脂からなる保護膜を
設け、突起形状の接続用金属電極を設けた半導体チップ
を、前記絶縁性基板上に設けた接続用電極と互いに対向
するように配置し、前記半導体チップの接続用金属電極
を異方導電性接着剤を介して、熱圧着により、前記保護
膜を突き破り、前記接続用電極と電気的に接続されるよ
うに取付けた半導体装置。
On an insulating substrate, a protective film made of synthetic resin is provided on a connection electrode whose upper layer is a metal film and a lower layer is a transparent conductive film, and a semiconductor chip is provided with a protrusion-shaped connection electrode. The connection electrodes provided on the insulating substrate are arranged to face each other, and the connection metal electrodes of the semiconductor chip are bonded by thermocompression through an anisotropic conductive adhesive to break through the protective film. A semiconductor device installed to be electrically connected to a connecting electrode.
JP63334413A 1988-12-28 1988-12-28 Semiconductor device Expired - Fee Related JP2626015B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63334413A JP2626015B2 (en) 1988-12-28 1988-12-28 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63334413A JP2626015B2 (en) 1988-12-28 1988-12-28 Semiconductor device

Publications (2)

Publication Number Publication Date
JPH02177547A true JPH02177547A (en) 1990-07-10
JP2626015B2 JP2626015B2 (en) 1997-07-02

Family

ID=18277098

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63334413A Expired - Fee Related JP2626015B2 (en) 1988-12-28 1988-12-28 Semiconductor device

Country Status (1)

Country Link
JP (1) JP2626015B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04212934A (en) * 1990-10-31 1992-08-04 Ricoh Co Ltd Liquid crystal display device
JP2002116455A (en) * 2000-08-01 2002-04-19 Kyodo Printing Co Ltd Liquid crystal display device, electrode substrate for the same device and method of manufacturing the same device
KR20220137966A (en) 2020-03-10 2022-10-12 데쿠세리아루즈 가부시키가이샤 Repair parts having micro LED chip and manufacturing method thereof, repair method, light emitting device manufacturing method and light emitting device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04212934A (en) * 1990-10-31 1992-08-04 Ricoh Co Ltd Liquid crystal display device
JP2002116455A (en) * 2000-08-01 2002-04-19 Kyodo Printing Co Ltd Liquid crystal display device, electrode substrate for the same device and method of manufacturing the same device
KR20220137966A (en) 2020-03-10 2022-10-12 데쿠세리아루즈 가부시키가이샤 Repair parts having micro LED chip and manufacturing method thereof, repair method, light emitting device manufacturing method and light emitting device

Also Published As

Publication number Publication date
JP2626015B2 (en) 1997-07-02

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