JP2612606B2 - Method for producing photosensitive glass patterned article - Google Patents

Description

Description: FIELD OF THE INVENTION The present invention relates to a method for manufacturing a photosensitive glass pattern processed article having a highly accurate processing dimension.

The processed article of the photosensitive glass pattern obtained by the present invention is used as a substrate for positioning electronic components such as light-emitting diodes.

[Prior Art] A photosensitive glass pattern processed article is obtained by adhering a mask made of a metal such as Cr having a predetermined pattern onto a photosensitive glass, and irradiating ultraviolet rays from the mask to expose the photosensitive glass. Forming a latent image corresponding to the exposed portion in the non-conductive glass, then heat-treating the photosensitive glass to crystallize the exposed portion, and removing the crystallized portion by etching with an HF solution. Can be

Half etching, which etches the crystallized part from one surface of the photosensitive glass to a certain depth, covers the other surface of the photosensitive glass with a coating that is not eroded by HF solution with paraffin, and from one surface to a predetermined depth After the etching, the photosensitive glass is heated, and the coating is melted and removed with paraffin. By the etching, a photosensitive glass pattern processed article having a groove having a predetermined pattern and a depth is obtained.

[Problems to be Solved by the Invention] In the etching of photosensitive glass, the accuracy of a pattern applied to the photosensitive glass can be generally increased by improving the accuracy of a mask. And the etching in the depth direction when etching is stopped at a constant depth is difficult to obtain. This is because as the etching proceeds, the circulation speed of the etchant varies depending on the groove width and the hole diameter of the pattern to be etched, resulting in a difference in the etching speed.

When a photosensitive glass substrate A for an electronic component substrate as shown in FIGS. 6 and 7 is manufactured, the etching rate of the narrow groove portion 62 of the photosensitive glass 61 is lower than that of the wide groove portion 63. . This is because the circulation of the etching solution in the narrow groove portion 62 is slower than the circulation of the etching solution in the wide groove portion 63. Further, a similar phenomenon occurs between the corner portion 64 and the bottom portion 65, and the corner portion 64 where the circulation of the etching solution is slow is rounded.

Optical components and electronic components such as light-emitting diodes need to be accurately positioned and incorporated into a substrate. Therefore, in this case, the pattern groove formed by performing the above-described processing on the photosensitive glass has a difference in depth and a rounded corner due to the shape of the groove, and accurately positions optical components and electronic components on the substrate, respectively. Cannot be incorporated.

Therefore, conventionally, after the etching process, the etched bottom surface 65 and the corner portion 64 are milled to make the depth of the groove constant, and the corner portion 64 is rounded to improve the accuracy of the etched portion.

However, a great advantage of making a patterned substrate by etching a photosensitive glass is that a complicated pattern can be easily applied by ultraviolet light exposure and etching, and more substrates can be formed from one large photosensitive glass plate. Although it can be made at once by exposure, etching, and cutting, milling each of the obtained substrates is a very troublesome operation,
In addition, there is a problem that the manufacturing cost increases.

SUMMARY OF THE INVENTION It is an object of the present invention to solve the above-mentioned problems and to provide a method for easily manufacturing a highly accurate photosensitive glass pattern processed article at low cost.

[Means for Solving the Problems] The present invention has been made to achieve the above object, and the method for producing a patterned photosensitive glass article of the present invention comprises the steps of: Contacting a mask having a pattern, irradiating ultraviolet rays from above the mask to expose the photosensitive glass, and forming a latent image corresponding to the exposed portion in the photosensitive glass; (B) the step (A) (C) etching the treated glass after the step (B), dissolving and removing the crystallized exposed portion, and penetrating the front and back; (D) A) polishing the treated glass after the step (C); and (E) laminating a plurality of patterned treated glasses after the step (D), or after the step (D).
A step of laminating at least one treated glass having a pattern and a photosensitive glass polished without being subjected to the steps (A) to (D), followed by heating and heat-sealing. It is characterized by.

 Hereinafter, the present invention will be described in detail.

Step (A) First, a photosensitive glass used as starting material contains a photosensitive component, can be used either as long as it exhibits photosensitivity, for example weight%, SiO ₂ 55~85%, Al _{Two
O 3 2~20%, Li 2 O} 5~15%, SiO 2 + Al 2 O 3 + Li 2 O> 85%
With 0.001 to 0.05% Au, 0.001 to 0.5 Ag
%, Cu ₂ O 0.001 to 1% as the photosensitive metal component, and further Ce
It is preferable to use a photosensitive glass containing 0.001 to 0.2% of O ₂ as a photosensitizer.

The mask used for forming the pattern of the photosensitive glass may be any mask as long as it has a predetermined pattern and is in close contact with the photosensitive glass to enable selective exposure of the photosensitive glass. However, for example, a mask formed by forming a pattern made of a chromium film on a transparent thin glass can also be used.

When this mask is brought into close contact with the photosensitive glass and exposed from above the mask, a photosensitive metal (Ag, Au, etc.)
A nucleus composed of particles of the above is formed, and a latent image is formed. As this exposure means, it is preferable to irradiate ultraviolet rays for a predetermined time (for example, 10 seconds to 2 minutes) using a mercury lamp, a mercury-xenon lamp, or the like.

Step (B) The glass on which the latent image has been formed, obtained in step (A), is heat-treated. This heat treatment is preferably performed at a temperature between 550 ° C and 610 ° C. The reason that this temperature range is preferable is that if the temperature is lower than 550 ° C., the temperature is too low and the heat treatment is not effective,
This is because shrinkage occurs and the dimensional accuracy decreases at a temperature exceeding. Further, the time for this heat treatment is preferably 30 minutes to 5 hours.

By this heat treatment, lithium metasilicate crystals grow with the photosensitive metal particles present in the exposed portions (latent images) as nuclei. Since the lithium metasilicate crystal has a property of being easily dissolved in an acid, etching in the subsequent step (C) can be smoothly performed.

Step (C) The glass obtained in the step (B) is etched with, for example, dilute hydrofluoric acid to dissolve and remove the acid-soluble lithium metasilicate crystal in the exposed portion to penetrate the front and back to obtain a glass having a desired pattern. obtain. The concentration and temperature of dilute hydrofluoric acid,
The etching time and the like are appropriately determined according to the type and thickness of the glass used. NH ₄ H instead of dilute hydrofluoric acid
A solution in which a salt containing F such as F ₂ , NaHF ₂ , KHT ₂ and K ₂ SiF ₆ is dissolved in an acid may be used as an etching solution.

Step (D) One or both sides of the glass obtained in the step (C) are polished. This polishing is for sharpening the edges of the grooves and holes of the pattern to improve the dimensional accuracy and for facilitating the thermal fusion performed in the next step (E).

Step (E) The glass obtained in the above step is laminated, preferably
Heat to a temperature of 500 ° C to 610 ° C and heat-bond to each other. There are various cases for such lamination depending on the shape required for the photosensitive glass pattern processed article to be manufactured.

For example, by laminating a predetermined plurality of the treated glasses, it is possible to obtain a photosensitive glass pattern processed article having a stepped groove, and according to the number of the treated glasses to be laminated, having a corresponding number of stepped grooves. A photosensitive glass pattern component can be obtained. The combination of the patterns of the treated glass to be laminated may be different patterns, the same pattern, or a combination including the same pattern. In addition, if the treated glass and the photosensitive glass polished without being subjected to the processes (A) to (D) are laminated, a photosensitive film having a predetermined pattern and a groove having a constant depth can be obtained. The processed glass article can be obtained. In addition, instead of the photosensitive glass considered the polishing, transition point, yield point,
Glasses other than photosensitive glass can also be used as long as the glass has similar thermal properties such as expansion coefficient.

Furthermore, the reason why the heat fusion temperature is preferably 500 ° C. to 610 ° C. is because heat fusion is not sufficiently performed at a temperature lower than 500 ° C., and deformation and shrinkage occur at a temperature higher than 610 ° C., resulting in poor dimensional accuracy.

The grooves and holes of the pattern of the photosensitive glass processed article obtained in this way are different from those obtained by the prior art in that the corners have no roundness, high verticality and flatness, and high positional accuracy. Was.

[Examples] Hereinafter, the present invention will be further described with reference to Examples, but the present invention is not limited to these Examples.

Example 1 (see FIGS. 1 to 4) Step (A): SiO ₂ , LiCO ₃ , K ₂ CO ₃ ,
_{Al (OH) 3, Na 2} CO 3, ZnO, Sb 2 O 3, CeO 2, AgCl , and AuCl
· 2H ₂ O After the blended in a predetermined ratio, melted at a temperature 1350 ° C., defoaming, after refining, it was molded into a plate to obtain a mother glass having the following composition.

SiO ₂ 79.5 (% by weight) Li ₂ O 10.2 K ₂ O 4.0 Al ₂ O ₃ 4.0 Na ₂ O 1.0 ZnO 1.0 Sb ₂ O ₃ 0.4 CeO ₂ 0.01 Ag 0.08 Au 0.003 The thermal properties of this mother glass are as follows: At ~ 300 ° C, 84 × 10 ^-7 / ° C, transition point is 465 ° C, and yield point is 515 ° C.

The mother glass was cut out, and two flat plates of 20 mm × 20 mm × 3 mm were polished on both sides to prepare an upper glass 1 and a lower glass 35, and a flat plate of 20 mm × 20 mm × 1 mm was polished on both sides to prepare a middle glass 21.

Next, the upper glass 1 having a thickness of 3 mm obtained above and the thickness 1
The masks 2 and 22 each having a pattern made of a chromium film are adhered to each of the middle glass layers 21 mm (FIGS. 1 and 2).
See figure), 1000W mercury-xenon lamp, mask 2,2
2 Irradiate UV light from above for 10 seconds to expose photosensitive metal A
A nucleus consisting of g and Au particles was generated to form a latent image.

Step (B): The glass 1, 21 after the formation of the latent image is heat-treated at 580 ° C. for 3 hours, and the exposed portions 3, 23 (latent image) of the photosensitive metal Ag, Au are exposed.
As a nucleus, a lithium metasilicate crystal readily soluble in an acid was precipitated.

Step (C): The treated glass 1, 21 is treated with dilute hydrofluoric acid to dissolve the crystal part easily soluble in acid and penetrate the front and back, thereby corresponding to the pattern of the masks 2, 22. An upper glass 1 and a middle glass 21 having a pattern were obtained.

Step (D): The lower surface of the upper glass 1 and the both surfaces of the middle glass 21 are polished, each has a predetermined thickness, the corners of the etched portions 33 and 34 are vertical, and the edge of the pattern groove is rounded. Was.

Step (E): The intermediate glass 21 and the upper glass 1 are laminated in this order on the lower glass 35 having a thickness of 3 mm only subjected to polishing and not subjected to the processing of the steps (A) to (D) ( A flat weight (not shown) is placed on the upper glass 1 and heat-treated at 550 ° C. for 2 hours, and each glass is heat-fused. I let it.

Next, it was cut vertically along dotted lines 36 and 37, and unnecessary parts were cut off to obtain a desired photosensitive glass pattern processed article.

Example 2 (see FIG. 5) Step (A): A mother glass having the same composition as in Example 1 was cut out to prepare three 20 mm × 20 mm × 3 mm double-side polished flat plates, each having an upper glass layer 51 and a middle layer. Glass 52 and lower glass 53 were used.

Next, the upper glass 51, the middle glass 52, and the lower glass 53
A mask having a chromium film pattern having a hole diameter of 10 mm, 5 mm, and 1 mm, respectively, was brought into close contact with the center of, and exposed in the same manner as in Example 1 to form a latent image.

Upper glass 51, middle glass in steps B, C and D
The treatment of 52 and the lower glass 53 was carried out in the same manner as in Example 1, and was carried out in the order of steps B, C and D as in Example 1.

Step E: On the lower glass 53, the middle glass 52 and the upper glass 51 are laminated in this order, a flat weight (not shown) is placed on the upper glass 51, and heat-treated at 550 ° C. for 2 hours. Was thermally fused to obtain a photosensitive glass pattern processed article having three concentric holes with different diameters.

[Effects of the Invention] According to the method of the present invention, since the etching treatment in the step (C) completely dissolves the crystallized portion and penetrates the front and back, the influence of the difference in etching rate due to the difference in pattern shape is reduced. Without being subjected, the depth of the etching groove becomes constant. Further, since the glass to be laminated is polished in the step (D), the edge formed in the etched portion is vertical, and the corner formed by the lamination is also vertical.

Therefore, it is possible to easily and at low cost obtain a photosensitive glass pattern processed article having extremely high processing accuracy, in which an optical component or an electronic component can be accurately positioned and incorporated into a substrate.

[Brief description of the drawings]

FIGS. 1, 2, 3, 4 and 5 are illustrations of the method of the present invention, and FIGS. 6 and 7 are illustrations of the conventional method. 1,51 …… upper glass, 21,52 …… middle glass, 35,53 ……
Lower glass, 2,22 …… Mask, 3,23 …… Exposed part, 33,3
4 ... Etching part.

Claims (1)

(57) [Claims] (A) A mask having a predetermined pattern is brought into close contact with a photosensitive glass, and the photosensitive glass is exposed by irradiating ultraviolet rays from above the mask to correspond to the exposed portion in the photosensitive glass. A step of forming a latent image; (B) a step of heat-treating the treated glass after the step (A) to crystallize the exposed portion; and (C) an etching treatment of the treated glass after the step (B). (D) a step of polishing the treated glass after the step (C), and (E) a step of polishing the treated glass having a pattern after the step (D). After lamination or after the step (D),
A step of laminating at least one treated glass having a pattern and a photosensitive glass polished without being subjected to the steps (A) to (D), followed by heating and heat-sealing. A method for producing a patterned photosensitive glass article, comprising: