JPH064499B2 - Method for manufacturing gradient index flat lens - Google Patents
Method for manufacturing gradient index flat lensInfo
- Publication number
- JPH064499B2 JPH064499B2 JP10466885A JP10466885A JPH064499B2 JP H064499 B2 JPH064499 B2 JP H064499B2 JP 10466885 A JP10466885 A JP 10466885A JP 10466885 A JP10466885 A JP 10466885A JP H064499 B2 JPH064499 B2 JP H064499B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- opening
- ion diffusion
- metal film
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は屈折率分布型平板レンズの製造方法に関する。TECHNICAL FIELD The present invention relates to a method of manufacturing a graded-index flat lens.
本発明は屈折率分布型平板レンズの製造方法において、 イオン拡散防止用の金属膜上に保護膜を形成し、これら
の保護膜と金属膜とをレンズ形成後の遮光層として利用
することにより、 屈折率分布型平板レンズの製造を簡単にしたものであ
る。The present invention, in the method of manufacturing a graded index flat lens, by forming a protective film on the metal film for preventing ion diffusion, by using these protective film and the metal film as a light-shielding layer after lens formation, This is a method for simplifying the manufacture of a gradient index flat lens.
従来の屈折率分布型平板レンズの製造方法においては、
ガラス基板にレンズ部を拡散形成した後、この基板表面
にカーボンブラックを蒸着させたり、Cr、Al若しくはこ
れら金属の酸化物をスパッタリング等で付着させること
により遮光層を形成していた。In the conventional method of manufacturing a gradient index flat lens,
After forming a lens portion on a glass substrate by diffusion, carbon black is vapor-deposited on the surface of the substrate, or a light shielding layer is formed by depositing Cr, Al or an oxide of these metals by sputtering or the like.
第４図（ａ）〜（ｃ）にその概略を示す。The outline is shown in FIGS. 4 (a) to (c).
先ず、第４図（ａ）に示すように、ガラス基板１の表面
にイオン拡散防止マスク２を形成し、このイオン拡散防
止マスク２に円形開口３を形成する。次いで、このイオ
ン拡散防止マスク３の形成された側を、屈折率への寄与
の大きいイオンを含む高温溶融塩に浸漬し、円形開口３
を通じて屈折率への寄与の大きいイオンをガラス基板１
中に拡散させる。そして半球形のレンズ部４を拡散領域
として形成する。First, as shown in FIG. 4A, an ion diffusion preventing mask 2 is formed on the surface of the glass substrate 1, and a circular opening 3 is formed in the ion diffusion preventing mask 2. Next, the side on which the ion diffusion preventing mask 3 is formed is immersed in a high temperature molten salt containing ions that make a large contribution to the refractive index, and the circular opening 3 is formed.
Ions that make a large contribution to the refractive index through the glass substrate 1
Spread inside. Then, the hemispherical lens portion 4 is formed as a diffusion region.
次に、第４図（ｂ）に示すように、イオン拡散防止マス
ク２をエッチング等によって取り除き、ガラス基板１の
表面を研磨する。Next, as shown in FIG. 4B, the ion diffusion preventing mask 2 is removed by etching or the like, and the surface of the glass substrate 1 is polished.
しかる後、第４図（ｃ）に示すように、ガラス基板１の
表面にカーボンブラック等を蒸着し、更にフォトリソグ
ラフィーの技術を用いてレンズ部４の位置に窓あけを行
ない、レンズ部以外の部分に遮光層５を形成する。After that, as shown in FIG. 4 (c), carbon black or the like is vapor-deposited on the surface of the glass substrate 1, and a window is opened at the position of the lens portion 4 by using a photolithography technique. The light shielding layer 5 is formed on the portion.
しかしながら従来の方法では、レンズ形成後にイオン拡
散防止マスク２の開口部３をレンズ径の大きさに広げて
これを遮光層として利用しようとしても、イオン交換或
いは電界印加によるイオン拡散の際にイオン拡散防止マ
スク２の表面層が高温溶融塩と反応してしまい、この為
に開口部の円形形状を正確に保持しながらエッチングす
ることは不可能であった。それ故、従来はイオン拡散防
止マスク２と遮光層５とを別々に形成する必要が有っ
た。However, in the conventional method, even if the opening portion 3 of the ion diffusion preventing mask 2 is expanded to the lens diameter after the lens is formed and it is used as a light shielding layer, the ion diffusion is performed during the ion diffusion by the ion exchange or the electric field application. The surface layer of the prevention mask 2 reacts with the high temperature molten salt, which makes it impossible to perform etching while accurately maintaining the circular shape of the opening. Therefore, conventionally, it was necessary to separately form the ion diffusion preventing mask 2 and the light shielding layer 5.
このようにイオン拡散防止マスク２と遮光層５とを別々
に形成する場合には、イオン拡散防止マスク２を取除い
た後、ガラス基板１の表面を研磨する必要が有り、特
に、直径が２００μｍ程度以下の微小口径レンズの場合
には研磨工程での研磨量を数μｍ以下に制御しなげれば
ならず、この為レンズ径を制御することが困難であっ
た。When the ion diffusion preventing mask 2 and the light shielding layer 5 are separately formed as described above, it is necessary to remove the ion diffusion preventing mask 2 and then polish the surface of the glass substrate 1, particularly, the diameter is 200 μm. In the case of a small-diameter lens having a size of not more than a certain degree, it is necessary to control the polishing amount in the polishing process to several μm or less, which makes it difficult to control the lens diameter.
本発明は上述の問題点に鑑みてなされたものであって、 （ａ）、透明ガラス基板の一面にイオン拡散防止用の金
属膜を形成する工程、 （ｂ）、上記金属膜上に保護膜を形成する工程、 （ｃ）、上記保護膜及び上記金属膜にイオン拡散用の開
口部を形成する工程、 （ｄ）、屈折率への寄与の大きなイオンを含有した高温
溶融塩に上記開口部を接触させ、上記開口部を通じて上
記屈折率への寄与の大きなイオンを上記透明ガラス基板
中に拡散させ、レンズ部を形成する工程、 （ｅ）、上記レンズ部の大きさに略対応する大きさの開
口を形成させる為に上記開口部近傍の上記保護膜及び上
記金属膜をエッチング除去する工程、 を夫々設け、エッチング除去されなかった上記保護膜及
び上記金属膜を遮光層として残すことを特徴とする屈折
率分布型平板レンズの製造方法である。The present invention has been made in view of the above problems, and includes (a) a step of forming a metal film for preventing ion diffusion on one surface of a transparent glass substrate, (b) a protective film on the metal film. (C), the step of forming an opening for ion diffusion in the protective film and the metal film, (d), the opening in the high temperature molten salt containing ions that greatly contribute to the refractive index. Contacting each other and diffusing ions having a large contribution to the refractive index through the opening into the transparent glass substrate to form a lens portion, (e), a size substantially corresponding to the size of the lens portion. A step of etching and removing the protective film and the metal film in the vicinity of the opening to form the opening, and leaving the protective film and the metal film not removed by etching as a light-shielding layer. Refractive index distribution A method for producing a planar lens.
以下本発明の実施例を第１図〜第３図を参照して説明す
る。An embodiment of the present invention will be described below with reference to FIGS.
第１図（ａ）に示すように、Na+、K+等のイオンを含む
厚さ５mmのほうけい酸ガラスを用い、このガラス基板１
１の上下の面を平行且つ平坦に仕上げ、このガラス基板
１１の一面にTiを高周波スパッタ法で２μｍ程度の膜厚
に形成して、イオン拡散防止マスク用のTi膜１２とし
た。As shown in FIG. 1 (a), a borosilicate glass having a thickness of 5 mm and containing ions such as Na + and K + was used.
The upper and lower surfaces of 1 were finished to be parallel and flat, and Ti was formed on one surface of the glass substrate 11 by a high frequency sputtering method to a film thickness of about 2 μm to form a Ti film 12 for an ion diffusion preventing mask.
次いで、このTi膜１２の上にSiO2１６を0.2μｍ程度の
膜厚に形成する。Then, SiO 2 16 is formed on the Ti film 12 to a film thickness of about 0.2 μm.
そしてフォトリソグラフィーの技術を用いて、開口部１
３を、その直径が0.1mm程度の円形パターンとなるよう
にTi膜１２及びSiO2膜１６をエッチングして設け、これ
らの膜１２，１６をイオン拡散防止マスクとする。Then, using the technique of photolithography, the opening 1
3 is provided by etching the Ti film 12 and the SiO 2 film 16 so as to form a circular pattern having a diameter of about 0.1 mm, and these films 12 and 16 are used as an ion diffusion preventing mask.
次いで、第２図又は第３図に示すように、ガラス基板１
１のTi膜１２及びSiO2膜１６の設けられた側の面を、屈
折率への寄与の大きい例えばTl+イオンを含む高温溶融
塩１７に浸漬し、この屈折率への寄与の大きいイオンを
開口部１３を通じてガラス基板１１中に拡散させる。第
２図は自然拡散（熱による拡散）によるイオン交換法を
示し、第３図は電解加拡散によるイオン交換法を示して
いる。このようにして、第１図（ｃ）に示すように、屈
折率への寄与の大きい例えばTl+イオンの濃度分布に応
じた屈折率分布を有し且つ断面が半円状のレンズ部１４
がガラス基板１１中に形成される。Then, as shown in FIG. 2 or 3, the glass substrate 1
The surface of the No. 1 on which the Ti film 12 and the SiO 2 film 16 are provided is immersed in a high-temperature molten salt 17 containing, for example, Tl + ions, which has a large contribution to the refractive index, and the ions having a large contribution to the refractive index are It is diffused into the glass substrate 11 through the opening 13. FIG. 2 shows an ion exchange method by natural diffusion (diffusion by heat), and FIG. 3 shows an ion exchange method by electrolytic addition diffusion. Thus, as shown in FIG. 1 (c), the lens portion 14 having a semicircular cross section and having a refractive index distribution that has a large contribution to the refractive index, for example, according to the concentration distribution of Tl + ions.
Are formed in the glass substrate 11.
レンズ部１４の形成されたガラス基板１１は高温溶融塩
１７から取出されて洗浄される。そして第１図（ｂ）〜
（ｅ）に示すように、フォトリソグラフィーの技術を用
いて遮光層が形成される。The glass substrate 11 on which the lens portion 14 is formed is taken out from the high temperature molten salt 17 and washed. And FIG. 1 (b)-
As shown in (e), the light shielding layer is formed by using the photolithography technique.
即ち、先ず、第１図（ｂ）に示すように、Ti膜１２とSi
O2膜１６とが形成されたガラス基板１１の表面にフォト
レジスト１８を塗布する。That is, first, as shown in FIG. 1 (b), Ti film 12 and Si
A photoresist 18 is applied to the surface of the glass substrate 11 on which the O 2 film 16 is formed.
次に、第１図（ｃ）に示すように、このフォトレジスト
１８に対してマスクアライメント装置により高精度の位
置合わせを行ない、露光・現像後、レンズ部１４と略同
じ大きさの開口部１９をフォトレジスト１８に設ける。Next, as shown in FIG. 1C, the photoresist 18 is aligned with high precision by a mask alignment device, and after exposure / development, an opening portion 19 having substantially the same size as the lens portion 14 is formed. Are provided on the photoresist 18.
次に、第１図（ｄ）に示すように、Ti膜１２及びSiO2膜
１６の露出部分を熱リン酸でエッチング除去し、レンズ
部１４の大きさに対応した大きさの開口部２０を形成す
る。Next, as shown in FIG. 1D, the exposed portions of the Ti film 12 and the SiO 2 film 16 are removed by etching with hot phosphoric acid to form an opening 20 having a size corresponding to the size of the lens part 14. Form.
しかる後、第１図（ｅ）に示すように、フォトレジスト
１８を取り除き、エッチング除去されなかったTi膜１２
及びSiO2膜１６を遮光層として残す。Thereafter, as shown in FIG. 1 (e), the photoresist 18 is removed, and the Ti film 12 not removed by etching.
And the SiO 2 film 16 is left as a light shielding layer.
この後、ガラス基板１１を研磨し、露出しているレンズ
部１４を平坦にする。この時、ガラス基板１１上に形成
されているTi膜１２及びSiO2膜１６が壁として機能する
ので、微小径レンズのレンズ径を正確に制御する効果が
有る。Then, the glass substrate 11 is polished to flatten the exposed lens portion 14. At this time, since the Ti film 12 and the SiO 2 film 16 formed on the glass substrate 11 function as walls, there is an effect of accurately controlling the lens diameter of the minute diameter lens.
以上説明した例では、イオン拡散防止用の金属膜として
Ti膜を用いたが、これはCr膜であっても良い。又保護膜
としてSiO2膜を用いたが、他の無機質ガラス膜であって
も良い。又開口部１３，２０は円形以外に、得ようとす
るレンズの平面形状に合わせてライン状など任意の形状
とすることができる。In the example described above, as a metal film for preventing ion diffusion
Although a Ti film was used, this may be a Cr film. Although the SiO 2 film is used as the protective film, another inorganic glass film may be used. Further, the openings 13 and 20 may have any shape such as a line shape in accordance with the planar shape of the lens to be obtained, other than the circular shape.
本発明によれば、レンズ形成に使用したイオン拡散防止
マスクに単に穴あけを行うだけで、これを遮光層として
利用できるので、従来のようにイオン拡散防止マスクと
遮光層とを別々に形成する必要が無く、従って非常に簡
単になる。According to the present invention, the ion diffusion preventing mask used for forming the lens can be used as the light shielding layer by simply making a hole. Therefore, it is necessary to separately form the ion diffusion preventing mask and the light shielding layer as in the conventional case. There is no and therefore very easy.
又、レンズ形成後にガラス基板を研磨する際、レンズ径
の制御を容易且つ正確に行うことができるので、特に微
小径レンズの製造に効果的である。Further, when the glass substrate is polished after the lens is formed, the lens diameter can be easily and accurately controlled, which is particularly effective for manufacturing a minute diameter lens.
第１図（ａ）〜（ｅ）は本発明の一実施例による屈折率
分布型平板レンズの製造方法を工程順に示す縦断面図、
第２図はイオン拡散工程を示す概略縦断面図、第３図は
別法によるイオン拡散工程を示す概略縦断面図、第４図
（ａ）〜（ｃ）は従来の製造方法を工程順に示す縦断面
図である。 なお図面に用いた符号において、 １１……………ガラス基板 １２……………Ti膜 １４……………レンズ部 １６……………SiO2 である。1 (a) to 1 (e) are longitudinal sectional views showing a method of manufacturing a gradient index flat lens according to an embodiment of the present invention in the order of steps,
FIG. 2 is a schematic vertical sectional view showing an ion diffusion step, FIG. 3 is a schematic vertical sectional view showing an ion diffusion step by another method, and FIGS. 4 (a) to 4 (c) show a conventional manufacturing method in the order of steps. FIG. In the reference numerals used in the drawings, 11 is a glass substrate 12 is a Ti film 14 is a lens portion 16 is SiO 2 .
Claims (2)
散防止用の金属膜を形成する工程、 （ｂ）、上記金属膜上に保護膜を形成する工程、 （ｃ）、上記保護膜及び上記金属膜にイオン拡散用の開
口部を形成する工程、 （ｄ）、屈折率への寄与の大きなイオンを含有した高温
溶融塩に上記開口部を接触させ、上記開口部を通じて上
記屈折率への寄与の大きなイオンを上記透明ガラス基板
中に拡散させ、レンズ部を形成する工程、 （ｅ）、上記レンズ部の大きさに略対応する大きさの開
口を形成させる為に上記開口部近傍の上記保護膜及び上
記金属膜をエッチング除去する工程、 を夫々具備し、エッチング除去されなかった上記保護膜
及び上記金属膜を遮光層として残すことを特徴とする屈
折率分布型平板レンズの製造方法。1. (a), a step of forming a metal film for preventing ion diffusion on one surface of a transparent glass substrate, (b), a step of forming a protective film on the metal film, (c), the protective film And a step of forming an opening for ion diffusion in the metal film, (d) bringing the opening into contact with a high temperature molten salt containing ions having a large contribution to the refractive index, and increasing the refractive index through the opening. A step of diffusing ions having a large contribution to the transparent glass substrate to form a lens portion, (e), in order to form an opening having a size substantially corresponding to the size of the lens portion, And a step of etching away the protective film and the metal film, wherein the protective film and the metal film that have not been removed by etching are left as a light shielding layer.
ン又はクロムを用い、上記保護膜として二酸化ケイ素又
は無機質のガラスを用いることを特徴とする特許請求の
範囲第１項に記載の方法。2. The method according to claim 1, wherein titanium or chromium is used as the metal film for preventing ion diffusion, and silicon dioxide or inorganic glass is used as the protective film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10466885A JPH064499B2 (en) | 1985-05-16 | 1985-05-16 | Method for manufacturing gradient index flat lens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10466885A JPH064499B2 (en) | 1985-05-16 | 1985-05-16 | Method for manufacturing gradient index flat lens |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61261239A JPS61261239A (en) | 1986-11-19 |
| JPH064499B2 true JPH064499B2 (en) | 1994-01-19 |
Family
ID=14386842
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10466885A Expired - Lifetime JPH064499B2 (en) | 1985-05-16 | 1985-05-16 | Method for manufacturing gradient index flat lens |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH064499B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4521938B2 (en) * | 2000-06-19 | 2010-08-11 | キヤノン株式会社 | Imaging device |
-
1985
- 1985-05-16 JP JP10466885A patent/JPH064499B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61261239A (en) | 1986-11-19 |
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|---|---|---|---|
| EXPY | Cancellation because of completion of term |