JP2578646B2 - Non-aqueous secondary battery - Google Patents

Non-aqueous secondary battery

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Publication number
JP2578646B2
JP2578646B2 JP63178803A JP17880388A JP2578646B2 JP 2578646 B2 JP2578646 B2 JP 2578646B2 JP 63178803 A JP63178803 A JP 63178803A JP 17880388 A JP17880388 A JP 17880388A JP 2578646 B2 JP2578646 B2 JP 2578646B2
Authority
JP
Japan
Prior art keywords
active material
manganese dioxide
positive electrode
secondary battery
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63178803A
Other languages
Japanese (ja)
Other versions
JPH0227660A (en
Inventor
修弘 古川
俊之 能間
祐司 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Denki Co Ltd
Original Assignee
Sanyo Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Denki Co Ltd filed Critical Sanyo Denki Co Ltd
Priority to JP63178803A priority Critical patent/JP2578646B2/en
Publication of JPH0227660A publication Critical patent/JPH0227660A/en
Application granted granted Critical
Publication of JP2578646B2 publication Critical patent/JP2578646B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/36—Selection of substances as active materials, active masses, active liquids
    • H01M4/48—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides
    • H01M4/50—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese
    • H01M4/505—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese of mixed oxides or hydroxides containing manganese for inserting or intercalating light metals, e.g. LiMn2O4 or LiMn2OxFy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries

Description

【発明の詳細な説明】 イ 産業上の利用分野 本発明はリチウム或いはリチウム合金を負極活物質と
する非水系二次電池に係り、特に正極の改良に関するも
のである。The present invention relates to a non-aqueous secondary battery using lithium or a lithium alloy as a negative electrode active material, and more particularly to an improvement in a positive electrode.

ロ 従来の技術 この種二次電池の正極活物質としては三酸化モリブデ
ン、五酸化バナジウム、チタン或いはニオブの硫化物な
どが提案されており、一部実用化されているものもあ
る。(B) Conventional technology Molybdenum trioxide, vanadium pentoxide, sulfide of titanium or niobium and the like have been proposed as a positive electrode active material of this type of secondary battery, and some of them have been put to practical use.

一方、非水系一次電池の正極活物質としては二酸化マ
ンガン、フッ化炭素などが代表的なものとして知られて
おり、且これらは既に実用化されている。On the other hand, manganese dioxide, fluorocarbon, and the like are known as typical examples of the positive electrode active material of the nonaqueous primary battery, and these have already been put to practical use.

ここで、特に二酸化マンガンは保存性に優れ、資源的
に豊富であり且安価であるという利点を有するものであ
る。Here, in particular, manganese dioxide has the advantage of being excellent in preservability, abundant in resources, and inexpensive.

上記せる点に着目し、二次電池の正極活物質として二
酸化マンガンを用いることが有益であると考えられる
が、二酸化マンガンは可逆性に難があり充放電サイクル
特性に問題があつた。Focusing on the above points, it is thought that it is beneficial to use manganese dioxide as the positive electrode active material of the secondary battery, but manganese dioxide has difficulty in reversibility and has a problem in charge / discharge cycle characteristics.

ハ 発明が解決しようとする課題 本発明は可逆性に優れたマンガン酸化物を正極活物質
に用いて非水系二次電池の充放電サイクル特性の向上を
図ることを目的とする。(C) Problems to be Solved by the Invention It is an object of the present invention to improve the charge / discharge cycle characteristics of a non-aqueous secondary battery using manganese oxide having excellent reversibility as a positive electrode active material.

ニ 課題を解決するための手段 本発明の要旨とするところは、Li2MnO3を含有する二
酸化マンガンと、Liを含有しCuKα線によるＸ線回折図
において２θ＝22゜、31.5゜、37゜、42゜及び55゜付近
にピークを有するマンガン酸化物との混合物を活物質と
する正極にある。D. Means for Solving the Problems The gist of the present invention is that the manganese dioxide containing Li2MnO3 and the Li-containing X-ray diffractogram by CuKα ray have 2θ = 22 °, 31.5 °, 37 °, 42 ° And a mixture with manganese oxide having a peak near 55 ° as an active material.

又、Li2MnO3含有二酸化マンガンとCuKα線によるＸ線
回折図において２θ＝22゜、31.5゜、37゜、42゜及び55
゜付近にピークを有するLi含有マンガン酸化物との混合
物を活物質とする正極と、リチウム或いはリチウム合金
を活物質とする負極とを備えた非水系二次電池にある。In addition, in the X-ray diffraction diagram of Li2MnO3 containing manganese dioxide and CuKα ray, 2θ = 22 °, 31.5 °, 37 °, 42 ° and 55 °
A non-aqueous secondary battery includes a positive electrode using a mixture of a Li-containing manganese oxide having a peak near 活 as an active material and a negative electrode using lithium or a lithium alloy as an active material.

ホ 作用 本出願人はLi2MnO3を含有する二酸化マンガンを正極
活物質に用いることを提案した（特願昭61−258940号参
照）。この正極活物質は二酸化マンガンとリチウム塩と
の混合物を300〜430℃の温度で熱処理して得られるもの
であり、二酸化マンガン中にLiが予じめ侵入しているた
め、Liの拡散通路が広がつており二酸化マンガンに比し
て可逆性が優れるものである。(E) Action The present applicant has proposed using manganese dioxide containing Li2MnO3 as the positive electrode active material (see Japanese Patent Application No. 61-258940). This positive electrode active material is obtained by heat-treating a mixture of manganese dioxide and a lithium salt at a temperature of 300 to 430 ° C. Since Li has penetrated into manganese dioxide in advance, the diffusion path of Li It is wide and has excellent reversibility compared to manganese dioxide.

又、本出願人はLiを含有しCuKα線によるＸ線回折図
において２θ＝22゜、31.5゜、37゜、42゜及び55゜付近
にピークを有するマンガン酸化物を正極活物質に用いる
ことを提案した（特願昭63−60785号参照）。この正極
活物質は二酸化マンガンとリチウム塩との混合物を300
℃より低い温度で熱処理して得られるものであり、この
場合にも二酸化マンガン中にLiが予じめ侵入しているた
め、Liの拡散通路が広がつており二酸化マンガンに比し
て可逆性に優れるものである。In addition, the present applicant has proposed that a manganese oxide containing Li and having peaks near 2θ = 22 °, 31.5 °, 37 °, 42 ° and 55 ° in an X-ray diffraction pattern by CuKα ray be used as a positive electrode active material. (See Japanese Patent Application No. 63-60785). This positive electrode active material contains a mixture of manganese dioxide and lithium salt in 300
It is obtained by heat treatment at a temperature lower than ℃. In this case also, Li has previously penetrated into manganese dioxide, so the diffusion path of Li is wide and reversible compared to manganese dioxide. It is excellent.

第１図は二酸化マンガンとリチウム塩との混合を各種
温度で熱処理した時のＸ線回折図を示す。FIG. 1 shows X-ray diffraction patterns when a mixture of manganese dioxide and a lithium salt is heat-treated at various temperatures.

二酸化マンガンとリチウム塩との混合物を300℃より
も低温で熱処理したLi含有二酸化マンガンは、300℃以
上で熱処理を行なつたLi2MnO3含有二酸化マンガンに比
して第１表に示す如く表面積が大きく、放電初期電圧が
高くなるという利点があり、比較的浅い深度での充放電
特性は優れるものの、深い深度での充放電サイクル、即
ち二酸化マンガン粒子の内部まで充放電反応を利用する
場合には結晶内部までLiが侵入していないため充放電サ
イクル特性は劣るものである。Li-containing manganese dioxide obtained by heat-treating a mixture of manganese dioxide and a lithium salt at a temperature lower than 300 ° C has a larger surface area as shown in Table 1 than Li2MnO3-containing manganese dioxide heat-treated at a temperature of 300 ° C or higher. It has the advantage that the discharge initial voltage is high, and the charge / discharge characteristics at a relatively shallow depth are excellent. The charge / discharge cycle characteristics are inferior because no Li has penetrated into the substrate.

そこで、本発明のように正極活物質としてLi2MnO3を
含有する二酸化マンガンと、Liを含有しCuKα線による
Ｘ線回折図において２θ＝22゜、31.5゜、37゜、42゜及
び55゜付近にピークを有するマンガン酸化物との混合物
を用いれば、夫々の利点が生かされ浅い深度においても
深い深度においても優れた充放電サイクル特性が得られ
る。Thus, as in the present invention, manganese dioxide containing Li2MnO3 as a positive electrode active material and Li-containing X-ray diffractogram by CuKα ray show peaks near 2θ = 22 °, 31.5 °, 37 °, 42 ° and 55 °. By using a mixture with a manganese oxide having the following characteristics, the respective advantages can be utilized and excellent charge / discharge cycle characteristics can be obtained both at a shallow depth and at a deep depth.

ヘ 実 施 例 以下本発明の実施例について詳述する。 F. Examples Hereinafter, examples of the present invention will be described in detail.

平均粒子径30μ以下の化学二酸化マンガン80gと水酸
化リチウム20gを乳鉢にて混合した後、空気中において3
70℃で20時間熱処理して第１の活物質粉末を得る。一方
平均粒子径30μ以下の化学二酸化マンガン80gと水酸化
リチウム20gを乳鉢にて混合した後、空気中において250
℃で20時間熱処理して第２の活物質粉末を得る。After mixing 80 g of chemical manganese dioxide having an average particle size of 30 μ or less and 20 g of lithium hydroxide in a mortar, 3
Heat treatment is performed at 70 ° C. for 20 hours to obtain a first active material powder. On the other hand, after mixing 80 g of chemical manganese dioxide and 20 g of lithium hydroxide having an average particle diameter of 30 μ or less in a mortar,
Heat treatment at 20 ° C. for 20 hours to obtain a second active material powder.

これら第１の活物質、第２の活物質、導電剤としての
アセチレンブラック及び結着剤としてのフッ素樹脂粉末
を重量比45:45:6:4の比率で混合して正極合剤とし、こ
の合剤を２トン/cm2で直径20mmに加圧成型したのち250
℃で熱処理して正極とする。The first active material, the second active material, acetylene black as a conductive agent and a fluororesin powder as a binder were mixed at a weight ratio of 45: 45: 6: 4 to form a positive electrode mixture. The mixture is pressed at 2 tons / cm 2 to a diameter of 20 mm and then 250
Heat treated at ℃ to make a positive electrode.

負極は所定厚みのリチウム板を直径20mmに打抜いたも
のである。The negative electrode is obtained by punching a lithium plate having a predetermined thickness to a diameter of 20 mm.

第２図は上記せる正負極を用いて組立てた扁平形非水
電解液二次電池の半断面図を示し、（１）（２）はステ
ンレス製の正負極罐であつてこれらはポリプロピレン製
の絶縁パッキング（３）により隔離されている。（４）
は本発明の要旨とする正極であつて、正極罐（１）の内
底面に固着せる正極集電体（５）に圧接されている。
（６）は負極であつて、負極罐（２）の内底面に固着せ
る負極集電体（７）に圧着されている。（８）はポリプ
ロピレン製微多孔性薄膜よりなるセパレータであり、プ
ロピレンカーボネートとジメトキシエタンとの混合溶媒
に過塩素酸リチウムを１モル／溶解した非水電解液が
含浸されている。電池寸法は直径24.0mm、厚み3.0mmで
あつた。この本発明電池を（Ａ）とする。FIG. 2 is a half sectional view of a flat non-aqueous electrolyte secondary battery assembled using the positive and negative electrodes described above. (1) and (2) are stainless steel positive and negative electrode cans, which are made of polypropylene. Insulated by insulating packing (3). (4)
A positive electrode is a gist of the present invention, and is pressed against a positive electrode current collector (5) fixed to the inner bottom surface of the positive electrode can (1).
Reference numeral (6) denotes a negative electrode, which is crimped to a negative electrode current collector (7) fixed to the inner bottom surface of the negative electrode can (2). (8) is a separator made of a polypropylene microporous thin film, in which a mixed solvent of propylene carbonate and dimethoxyethane is impregnated with a non-aqueous electrolyte obtained by dissolving lithium perchlorate at 1 mol / mol. The battery dimensions were 24.0 mm in diameter and 3.0 mm in thickness. This battery of the present invention is referred to as (A).

比較例１ 活物質として上記実施例における第１の活物質のみを
用い、この第１の活物質と導電剤としてのアセチレンブ
ラック及び結着剤としてのフッ素樹脂粉末とを重量比9
0:6:4の比率で混合して正極合剤とすることを除いて他
は上記実施例と同様の比較電池（B1）を作成した。Comparative Example 1 Only the first active material in the above example was used as an active material, and the first active material was mixed with acetylene black as a conductive agent and fluororesin powder as a binder in a weight ratio of 9
A comparative battery (B1) was prepared in the same manner as in the above example except that the mixture was mixed at a ratio of 0: 6: 4 to form a positive electrode mixture.

比較例２ 活物質として上記実施例における第２の活物質のみを
用い、この第２の活物質と導電剤としてのアセチレンブ
ラック及び結着剤としてのフッ素樹脂粉末とを重量比9
0:6:4の比率で混合して正極合剤とすることを除いて他
は上記実施例と同様の比較電池（B2）を作成した。Comparative Example 2 Only the second active material in the above example was used as the active material, and this second active material was mixed with acetylene black as a conductive agent and fluororesin powder as a binder in a weight ratio of 9
A comparative battery (B2) was made in the same manner as the above example except that the mixture was mixed at a ratio of 0: 6: 4 to form a positive electrode mixture.

第３図及び第４図はこれら電池の充放電サイクル特性
図を示し、第３図は充放電電流3mA、放電時間１時間、
充電終止電圧4.0Vの条件における浅い深度での特性であ
り、一方第４図は充放電電流3mA、放電時間12時間、充
電終止電圧4.0Vの条件における深い深度での特性であ
る。3 and 4 show charge / discharge cycle characteristics of these batteries, and FIG. 3 shows a charge / discharge current of 3 mA, a discharge time of 1 hour,
FIG. 4 shows the characteristics at a shallow depth under the condition of the charge end voltage of 4.0 V, while FIG. 4 shows the characteristics at a deep depth under the conditions of the charge / discharge current of 3 mA, the discharge time of 12 hours and the charge end voltage of 4.0 V.

第３図より比較的浅い深度の充放電サイクルにおい
て、本発明電池（Ａ）は比較電池（B1）よりも優れたサ
イクル特性を示し、且比較電池（B2）と略同等のサイク
ル特性を示すことがわかる。In the charge / discharge cycle at a relatively shallower depth than FIG. 3, the battery (A) of the present invention shows superior cycle characteristics to the comparative battery (B1), and shows substantially the same cycle characteristics as the comparative battery (B2). I understand.

又、第４図より比較的深い深度の充放電サイクルにお
いて、本発明電池（Ａ）は比較電池（B2）よりも優れた
サイクル特性を示し、且比較電池（B1）と略同等のサイ
クル特性を示すことがわかる。In addition, in the charge / discharge cycle at a relatively deeper depth than in FIG. 4, the battery of the present invention (A) shows better cycle characteristics than the comparative battery (B2), and has substantially the same cycle characteristics as the comparative battery (B1). It shows that it shows.

これら第３図及び第４図から本発明電池（Ａ）は浅い
深度においても深い深度においても優れた充放電サイク
ル特性を有する電池であると云える。From FIGS. 3 and 4, it can be said that the battery (A) of the present invention has excellent charge / discharge cycle characteristics at both shallow and deep depths.

尚、本発明の実施例で示したように、第１及び第２の
活物質を、二酸化マンガンとリチウム塩との混合物を熱
処理して得る場合にはリチウム塩としては実施例で示し
た水酸化リチウムに限定されず、炭酸リチウムや硝酸リ
チウムも適用することができ、又二酸化マンガンとリチ
ウム塩との混合比率は90:10〜30:70の範囲が好ましい。When the first and second active materials are obtained by heat-treating a mixture of manganese dioxide and a lithium salt, as described in the embodiment of the present invention, the lithium salt may be a hydroxide as described in the embodiment. Not limited to lithium, lithium carbonate and lithium nitrate can also be applied, and the mixing ratio of manganese dioxide and lithium salt is preferably in the range of 90:10 to 30:70.

ト 発明の効果 上述した如く、非水系二次電池において、正極活物質
としてLi2MnO3を含有する二酸化マンガンと、Liを含有
しCuKα線によるＸ線回折図において２θ＝22゜、31.5
゜37゜、42゜及び55゜付近にピークを有するマンガン酸
化物との混合物を用いることにより、浅い深度及び深い
深度のいずれにおいても充放電サイクル特性に優れた非
水系二次電池を得ることができるものであり、その工業
的価値は極めて大である。G Effect of the Invention As described above, in the nonaqueous secondary battery, in the X-ray diffraction diagram by CuKα ray containing manganese dioxide containing Li2MnO3 as the positive electrode active material and 2θ = 22 °, 31.5
By using a mixture with manganese oxide having peaks near {37}, 42 ° and 55 °, a non-aqueous secondary battery having excellent charge / discharge cycle characteristics at both shallow and deep depths can be obtained. It is possible and its industrial value is extremely large.

尚、本発明電池は実施例で示した非水電解液二次電池
に限定されず固体電解質二次電池にも適用することがで
きる。The battery of the present invention is not limited to the non-aqueous electrolyte secondary battery shown in the embodiment, but can be applied to a solid electrolyte secondary battery.

【図面の簡単な説明】[Brief description of the drawings]

第１図は二酸化マンガンと水酸化リチウムとの混合物を
各種温度で熱処理した時のＸ線回折図、第２図は本発明
電池の半断面図、第３図及び第４図は充放電サイクル特
性図であつて、第３図は浅い深度、第４図は深い深度の
場合を夫々示す。 （１）……正極罐、（２）……負極罐、（３）……絶縁
パッキング、（４）……正極、（６）……負極、（８）
……セパレータ。FIG. 1 is an X-ray diffraction diagram when a mixture of manganese dioxide and lithium hydroxide is heat-treated at various temperatures, FIG. 2 is a half sectional view of the battery of the present invention, and FIGS. 3 and 4 are charge / discharge cycle characteristics. 3 shows a case where the depth is shallow, and FIG. 4 shows a case where the depth is deep. (1) Positive electrode can, (2) Negative electrode can, (3) Insulating packing, (4) Positive electrode, (6) Negative electrode, (8)
... Separator.

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項１】Li2MnO3を含有する二酸化マンガンと、Li
を含有しCuKα線によるＸ線回折図において２θ＝22
゜、31.5゜、37゜、42゜及び55゜付近にピークを有する
マンガン酸化物との混合物を活物質とすることを特徴と
する非水系二次電池の正極。A manganese dioxide containing Li2MnO3 and Li
And 2θ = 22 in the X-ray diffraction diagram by CuKα ray.
A positive electrode for a non-aqueous secondary battery, characterized by using, as an active material, a mixture with manganese oxide having peaks in the vicinity of ゜, 31.5 ゜, 37 ゜, 42 ゜, and 55 ゜. 【請求項２】Li2MnO3含有二酸化マンガンとCuKα線によ
るＸ線回折図において２θ＝22゜、31.5゜、37゜、42゜
及び55゜付近にピークを有するLi含有マンガン酸化物と
の混合物を活物質とする正極と、リチウム或いはリチウ
ム合金を活物質とする負極とを備えた非水系二次電池。2. An active material comprising a mixture of Li2MnO3-containing manganese dioxide and a Li-containing manganese oxide having peaks near 2θ = 22 °, 31.5 °, 37 °, 42 ° and 55 ° in an X-ray diffraction pattern by CuKα ray. A non-aqueous secondary battery comprising a positive electrode as described above and a negative electrode using lithium or a lithium alloy as an active material.
JP63178803A 1988-07-18 1988-07-18 Non-aqueous secondary battery Expired - Fee Related JP2578646B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63178803A JP2578646B2 (en) 1988-07-18 1988-07-18 Non-aqueous secondary battery

Publications (2)

Publication Number Publication Date
JPH0227660A JPH0227660A (en) 1990-01-30
JP2578646B2 true JP2578646B2 (en) 1997-02-05

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Cited By (1)

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US6602647B2 (en) 1999-12-28 2003-08-05 Nec Corporation Sulfonium salt compound and resist composition and pattern forming method using the same

Families Citing this family (96)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5216135A (en) 1990-01-30 1993-06-01 Wako Pure Chemical Industries, Ltd. Diazodisulfones
JP2919142B2 (en) * 1990-12-27 1999-07-12 株式会社東芝 Photosensitive composition and pattern forming method using the same
US5403695A (en) * 1991-04-30 1995-04-04 Kabushiki Kaisha Toshiba Resist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groups
KR950002875B1 (en) * 1991-07-08 1995-03-27 가부시키가이샤 도시바 Photosensitive composition
US5506088A (en) * 1991-09-17 1996-04-09 Fujitsu Limited Chemically amplified resist composition and process for forming resist pattern using same
JP2590702B2 (en) * 1993-09-21 1997-03-12 日本電気株式会社 Method for manufacturing semiconductor device
US5688628A (en) * 1993-11-11 1997-11-18 Nippon Zeon Co., Ltd. Resist composition
JP3116751B2 (en) * 1993-12-03 2000-12-11 ジェイエスアール株式会社 Radiation-sensitive resin composition
JP3203995B2 (en) * 1993-12-24 2001-09-04 ジェイエスアール株式会社 Radiation-sensitive resin composition
JP2715881B2 (en) * 1993-12-28 1998-02-18 日本電気株式会社 Photosensitive resin composition and pattern forming method
US5866304A (en) * 1993-12-28 1999-02-02 Nec Corporation Photosensitive resin and method for patterning by use of the same
JP2776273B2 (en) * 1994-01-31 1998-07-16 日本電気株式会社 Monomer having vinyl group
US5558971A (en) 1994-09-02 1996-09-24 Wako Pure Chemical Industries, Ltd. Resist material
JP2856116B2 (en) * 1995-01-26 1999-02-10 日本電気株式会社 Vinyl monomer, polymer, photoresist composition and pattern forming method using the same
JP2907144B2 (en) * 1995-12-11 1999-06-21 日本電気株式会社 Acid derivative compound, polymer compound, photosensitive resin composition using the same, and pattern forming method
JP2845225B2 (en) * 1995-12-11 1999-01-13 日本電気株式会社 Polymer compound, photosensitive resin composition and pattern forming method using the same
WO1997027515A1 (en) 1996-01-26 1997-07-31 Nippon Zeon Co., Ltd. Resist composition
ATE199985T1 (en) 1996-02-09 2001-04-15 Wako Pure Chem Ind Ltd POLYMER AND RESIST MATERIAL
US5962180A (en) * 1996-03-01 1999-10-05 Jsr Corporation Radiation sensitive composition
JP3198915B2 (en) * 1996-04-02 2001-08-13 信越化学工業株式会社 Chemically amplified positive resist material
JP3125678B2 (en) * 1996-04-08 2001-01-22 信越化学工業株式会社 Chemically amplified positive resist material
JP3206440B2 (en) * 1996-06-28 2001-09-10 信越化学工業株式会社 Chemically amplified positive resist material
TW528932B (en) * 1997-01-24 2003-04-21 Shinetsu Chemical Co Polymers and chemically amplified positive resist compositions
TW530192B (en) * 1997-01-27 2003-05-01 Shinetsu Chemical Co Partially hydrogenated polymer compound and chemically sensitized positive resist material
US6030747A (en) * 1997-03-07 2000-02-29 Nec Corporation Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask
JP2943759B2 (en) 1997-04-16 1999-08-30 日本電気株式会社 (Meth) acrylate, polymer, photoresist composition and pattern forming method using the same
US6106998A (en) * 1997-06-19 2000-08-22 Nec Corporation Negative resist materials, pattern formation method making use thereof, and method of manufacturing semiconductor devices
JP3627465B2 (en) 1997-08-15 2005-03-09 Ｊｓｒ株式会社 Radiation sensitive resin composition
JP3228193B2 (en) * 1997-08-27 2001-11-12 日本電気株式会社 Negative photoresist composition and pattern forming method using the same
JP3055617B2 (en) * 1997-08-27 2000-06-26 日本電気株式会社 Negative photoresist composition and pattern forming method using the same
US6120972A (en) * 1997-09-02 2000-09-19 Jsr Corporation Radiation-sensitive resin composition
KR100489576B1 (en) * 1997-10-08 2005-12-21 신에쓰 가가꾸 고교 가부시끼가이샤 Resist material and pattern formation method
TW480370B (en) 1997-10-08 2002-03-21 Shinetsu Chemical Co Polystyrene-based polymer compound, chemical amplification positive type resist material and pattern formation
US6146806A (en) * 1998-04-06 2000-11-14 Nec Corporation Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same
JP3175697B2 (en) * 1998-06-18 2001-06-11 日本電気株式会社 Chemically amplified photoresist
WO2000001684A1 (en) 1998-07-03 2000-01-13 Nec Corporation (meth)acrylate derivatives bearing lactone structure, polymers, photoresist compositions and process of forming patterns with the same
TW487828B (en) * 1998-10-29 2002-05-21 Shinetsu Chemical Co Positive resist composition
US6437052B1 (en) 1998-11-02 2002-08-20 Nec Corporation Monomer having diol structure, polymer thereof, and negative photoresist composition and pattern forming method using the same
JP3680920B2 (en) 1999-02-25 2005-08-10 信越化学工業株式会社 Novel ester compound, polymer compound, resist material, and pattern forming method
TWI226339B (en) 1999-03-26 2005-01-11 Shinetsu Chemical Co High molecular weight compound and the method to prepare the same
US6455223B1 (en) 1999-03-26 2002-09-24 Shin-Etsu Chemical Co., Ltd. Resist compositions and patterning process
US6461789B1 (en) 1999-08-25 2002-10-08 Shin-Etsu Chemical Co., Ltd. Polymers, chemical amplification resist compositions and patterning process
TWI289568B (en) 1999-08-30 2007-11-11 Shinetsu Chemical Co Polymer compound, resist material, and pattern formation method
TW527363B (en) 1999-09-08 2003-04-11 Shinetsu Chemical Co Polymers, chemical amplification resist compositions and patterning process
US6369279B1 (en) 1999-09-08 2002-04-09 Shin-Etsu Chemical Co., Ltd. Styrene derivatives
TWI256409B (en) 1999-10-13 2006-06-11 Shinetsu Chemical Co Polymers, chemical amplification resist compositions and patterning process
KR100455538B1 (en) 1999-10-13 2004-11-15 신에쓰 가가꾸 고교 가부시끼가이샤 Styrene Derivatives
JP3755571B2 (en) 1999-11-12 2006-03-15 信越化学工業株式会社 Chemically amplified positive resist material and pattern forming method
TWI260673B (en) 1999-12-03 2006-08-21 Toyo Gosei Kogyo Kk Method for producing onium salt derivatives
EP1117003B1 (en) 2000-01-17 2012-06-20 Shin-Etsu Chemical Co., Ltd. Process of preparing a chemical amplification type resist composition
TWI294440B (en) 2000-02-16 2008-03-11 Shinetsu Chemical Co
US6579658B2 (en) 2000-02-17 2003-06-17 Shin-Etsu Chemical Co., Ltd. Polymers, resist compositions and patterning process
US6682869B2 (en) 2000-03-07 2004-01-27 Shin-Etu Chemical Co., Ltd. Chemical amplification, positive resist compositions
US6838224B2 (en) 2000-03-07 2005-01-04 Shi-Etsu Chemical Co., Ltd. Chemical amplification, positive resist compositions
US6737214B2 (en) 2000-03-09 2004-05-18 Shin-Etsu Chemical Co., Ltd. Chemical amplification resist compositions
EP1148044B1 (en) 2000-04-20 2004-01-07 Shin-Etsu Chemical Co., Ltd. Ester compounds, polymers, resist compositions and patterning process
US6878501B2 (en) 2000-04-27 2005-04-12 Shin-Etsu Chemical Co., Ltd. Polymer, chemically amplified resist composition and patterning process
TWI226519B (en) 2000-06-02 2005-01-11 Shinetsu Chemical Co Polymers, resist compositions and patterning process
JP4838437B2 (en) 2000-06-16 2011-12-14 Ｊｓｒ株式会社 Radiation sensitive resin composition
JP3386041B2 (en) 2000-07-25 2003-03-10 日本電気株式会社 Photoacid generator, photoresist composition containing the same, and method of forming a pattern using the composition
JP3712047B2 (en) 2000-08-14 2005-11-02 信越化学工業株式会社 Resist material and pattern forming method
EP1204001B1 (en) 2000-11-01 2013-09-11 Shin-Etsu Chemical Co., Ltd. Resist composition and patterning process
JP4378872B2 (en) 2000-11-15 2009-12-09 日本電気株式会社 Photoacid generator, chemically amplified resist composition, and pattern formation method using the same
JP3962893B2 (en) 2001-02-09 2007-08-22 信越化学工業株式会社 Polymer compound, resist material, and pattern forming method
JP3642316B2 (en) 2001-06-15 2005-04-27 日本電気株式会社 Chemically amplified resist monomer, chemically amplified resist polymer, chemically amplified resist composition, pattern formation method
JP3891257B2 (en) 2001-06-25 2007-03-14 信越化学工業株式会社 Polymer compound, resist material, and pattern forming method
TW584786B (en) 2001-06-25 2004-04-21 Shinetsu Chemical Co Polymers, resist compositions and patterning process
TWI245043B (en) 2001-06-25 2005-12-11 Shinetsu Chemical Co Novel ester compounds
JP2003034705A (en) 2001-07-24 2003-02-07 Nec Corp Fluorine-containing phenylmaleimide derivative, polymer, chemical amplifying resist composition and pattern formation method using it
JP4522628B2 (en) 2001-11-28 2010-08-11 信越化学工業株式会社 New ester compounds
JP4123920B2 (en) 2001-12-20 2008-07-23 Ｊｓｒ株式会社 Copolymer, polymer mixture and radiation-sensitive resin composition
JP3874092B2 (en) 2001-12-26 2007-01-31 信越化学工業株式会社 Polymer compound, resist material, and pattern forming method
JP3877605B2 (en) 2002-02-08 2007-02-07 信越化学工業株式会社 Negative resist material and pattern forming method using the same
JP3912516B2 (en) 2002-08-09 2007-05-09 信越化学工業株式会社 Polymer compound, resist material, and pattern forming method
TWI314943B (en) 2002-08-29 2009-09-21 Radiation-sensitive resin composition
US7005230B2 (en) 2003-01-16 2006-02-28 Jsr Corporation Radiation-sensitive resin composition
JP4068006B2 (en) 2003-05-07 2008-03-26 信越化学工業株式会社 Method for forming fine contact holes using thermal flow process
EP1641848B1 (en) 2003-06-26 2007-08-22 JSR Corporation Photoresist polymer compositions
JP4085034B2 (en) 2003-07-17 2008-04-30 信越化学工業株式会社 Compound, polymer compound, resist material, and pattern forming method
US7166418B2 (en) 2003-09-03 2007-01-23 Matsushita Electric Industrial Co., Ltd. Sulfonamide compound, polymer compound, resist material and pattern formation method
JP2005099683A (en) 2003-09-05 2005-04-14 Tokyo Ohka Kogyo Co Ltd Positive photoresist composition and method for forming resist pattern by using the same
US7169530B2 (en) 2003-10-02 2007-01-30 Matsushita Electric Industrial Co., Ltd. Polymer compound, resist material and pattern formation method
US7060775B2 (en) 2003-10-02 2006-06-13 Matsushita Electronic Industrial Co., Ltd. Polymer compound, resist material and pattern formation method
US7232641B2 (en) 2003-10-08 2007-06-19 Shin-Etsu Chemical Co., Ltd. Polymerizable compound, polymer, positive-resist composition, and patterning process using the same
US7189493B2 (en) 2003-10-08 2007-03-13 Shin-Etsu Chemical Co., Ltd. Polymer, positive resist composition, and patterning process using the same
JP3694692B2 (en) 2003-12-11 2005-09-14 丸善石油化学株式会社 Resist polymer solution and method for producing the same
JP4360264B2 (en) 2004-04-30 2009-11-11 Ｊｓｒ株式会社 Positive radiation sensitive resin composition
JP3978215B2 (en) 2004-05-25 2007-09-19 松下電器産業株式会社 Resist material and pattern forming method
JP3978217B2 (en) 2004-05-27 2007-09-19 松下電器産業株式会社 Resist material and pattern forming method
JP4544085B2 (en) 2004-09-28 2010-09-15 Ｊｓｒ株式会社 Positive radiation sensitive resin composition
JP2006225476A (en) 2005-02-16 2006-08-31 Shin Etsu Chem Co Ltd Positive type resist material and pattern formation method
JP4784753B2 (en) 2006-07-06 2011-10-05 信越化学工業株式会社 Polymerizable ester compound, polymer, resist material and pattern forming method
CN101827813A (en) 2007-10-15 2010-09-08 Jsr株式会社 Sulfone compound, sulfonic acid salt, and radiation-sensitive resin composition
JP4723557B2 (en) 2007-12-14 2011-07-13 Ａｚエレクトロニックマテリアルズ株式会社 Composition for forming surface antireflection film and pattern forming method using the same
CN102089709B (en) 2008-07-14 2013-10-30 Jsr株式会社 Radiation-sensitive resin composition
CN103073062A (en) * 2011-10-26 2013-05-01 上海纳米技术及应用国家工程研究中心有限公司 Preparation method of manganese-series positive electrode material used in lithium ion secondary battery

Cited By (1)

* Cited by examiner, † Cited by third party
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US6602647B2 (en) 1999-12-28 2003-08-05 Nec Corporation Sulfonium salt compound and resist composition and pattern forming method using the same

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