JP2537739Y2 - 静電吸着装置 - Google Patents
静電吸着装置Info
- Publication number
- JP2537739Y2 JP2537739Y2 JP1989135585U JP13558589U JP2537739Y2 JP 2537739 Y2 JP2537739 Y2 JP 2537739Y2 JP 1989135585 U JP1989135585 U JP 1989135585U JP 13558589 U JP13558589 U JP 13558589U JP 2537739 Y2 JP2537739 Y2 JP 2537739Y2
- Authority
- JP
- Japan
- Prior art keywords
- groove
- plate
- insulator
- wafer
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000012212 insulator Substances 0.000 claims description 39
- 239000011261 inert gas Substances 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
- 238000001312 dry etching Methods 0.000 claims description 3
- 238000001179 sorption measurement Methods 0.000 claims description 2
- 230000005684 electric field Effects 0.000 description 5
- 239000001307 helium Substances 0.000 description 3
- 229910052734 helium Inorganic materials 0.000 description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989135585U JP2537739Y2 (ja) | 1989-11-22 | 1989-11-22 | 静電吸着装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989135585U JP2537739Y2 (ja) | 1989-11-22 | 1989-11-22 | 静電吸着装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0373453U JPH0373453U (enrdf_load_stackoverflow) | 1991-07-24 |
JP2537739Y2 true JP2537739Y2 (ja) | 1997-06-04 |
Family
ID=31682846
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1989135585U Expired - Lifetime JP2537739Y2 (ja) | 1989-11-22 | 1989-11-22 | 静電吸着装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2537739Y2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4504174B2 (ja) * | 2004-12-15 | 2010-07-14 | 大日本印刷株式会社 | マチ付き封筒 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55115047U (enrdf_load_stackoverflow) * | 1979-02-06 | 1980-08-13 | ||
JPS5922340A (ja) * | 1982-07-29 | 1984-02-04 | Toshiba Corp | 静電チヤツク装置 |
JPH0622213B2 (ja) * | 1983-11-28 | 1994-03-23 | 株式会社日立製作所 | 試料の温度制御方法及び装置 |
JPH0719831B2 (ja) * | 1986-10-13 | 1995-03-06 | 日本電信電話株式会社 | 静電チヤツク |
JPH01200625A (ja) * | 1988-02-05 | 1989-08-11 | Toshiba Corp | 半導体ウェーハ処理装置 |
JPH01135585U (enrdf_load_stackoverflow) * | 1988-03-09 | 1989-09-18 | ||
JP2680338B2 (ja) * | 1988-03-31 | 1997-11-19 | 株式会社東芝 | 静電チャック装置 |
JP2900709B2 (ja) * | 1992-07-03 | 1999-06-02 | 日本電気株式会社 | 動画像フィルタ |
-
1989
- 1989-11-22 JP JP1989135585U patent/JP2537739Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0373453U (enrdf_load_stackoverflow) | 1991-07-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2680338B2 (ja) | 静電チャック装置 | |
KR100234661B1 (ko) | 이방성 에칭장치 | |
US4384918A (en) | Method and apparatus for dry etching and electrostatic chucking device used therein | |
US5946184A (en) | Electrostatic chuck, and method of and apparatus for processing sample | |
US4968374A (en) | Plasma etching apparatus with dielectrically isolated electrodes | |
JP2748127B2 (ja) | ウエハ保持方法 | |
JP4151749B2 (ja) | プラズマ処理装置およびその方法 | |
JPH0119253B2 (enrdf_load_stackoverflow) | ||
JPH10256360A (ja) | 静電チャックの改良型表面形状構造及びその製造方法 | |
JP3225850B2 (ja) | 静電吸着電極およびその製作方法 | |
IL123843A (en) | Method and device for electrostatic coupling for dielectric workers in vacuum processes | |
JPH11330215A (ja) | 基板温度制御方法及び装置 | |
JP3817414B2 (ja) | 試料台ユニットおよびプラズマ処理装置 | |
KR100188455B1 (ko) | 드라이 에칭방법 | |
JPH06349938A (ja) | 真空処理装置 | |
JP2000252261A (ja) | プラズマ処理装置 | |
JP2000317761A (ja) | 静電チャックおよび吸着方法 | |
JP2537739Y2 (ja) | 静電吸着装置 | |
JPH08186094A (ja) | プラズマ処理装置 | |
JPH01200625A (ja) | 半導体ウェーハ処理装置 | |
JPS62193141A (ja) | ウエハ−保持機構 | |
JPH06112302A (ja) | プラズマ処理装置及びその取扱方法 | |
JP4185179B2 (ja) | スパッタリング装置 | |
JP3977935B2 (ja) | プラズマ処理方法及び装置 | |
JP4602528B2 (ja) | プラズマ処理装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |