JP2537007B2 - Copper composition for low temperature firing - Google Patents
Copper composition for low temperature firingInfo
- Publication number
- JP2537007B2 JP2537007B2 JP5073844A JP7384493A JP2537007B2 JP 2537007 B2 JP2537007 B2 JP 2537007B2 JP 5073844 A JP5073844 A JP 5073844A JP 7384493 A JP7384493 A JP 7384493A JP 2537007 B2 JP2537007 B2 JP 2537007B2
- Authority
- JP
- Japan
- Prior art keywords
- composition
- firing
- low temperature
- copper
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Non-Insulated Conductors (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Conductive Materials (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明はフェライト基材との密着
性が良好でハンダ濡れ性に優れた導電性被膜、その製法
および該被膜を形成しうる低温焼成用銅組成物に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductive coating having good adhesion to a ferrite base material and excellent solder wettability, a method for producing the same, and a copper composition for low temperature firing which can form the coating.
【0002】[0002]
【従来の技術】電気絶縁基板などの基材上に導電性の被
膜を形成して導体として利用することが広く行なわれて
いる。こうした導電性被膜を形成する方法の1つとし
て、金属銅を主成分としガラスフリットが配合された銅
ペーストを基材にスクリーン印刷などにより塗布したの
ち焼成する方法が知られている。2. Description of the Related Art It is widely practiced to form a conductive coating on a base material such as an electrically insulating substrate and use it as a conductor. As one of the methods for forming such a conductive coating, there is known a method in which a copper paste containing metallic copper as a main component and containing glass frit is applied to a base material by screen printing or the like and then baked.
【0003】銅ペーストを焼成する方法として高温焼成
法と低温焼成法があるが、高温焼成法では焼成を900
〜1000℃という高温で行なうため、基材にも耐熱性
が要求され、現実的にはアルミナ基材に限られている。There are a high temperature firing method and a low temperature firing method as a method of firing the copper paste.
Since it is performed at a high temperature of up to 1000 ° C., heat resistance is required for the base material, and it is practically limited to the alumina base material.
【0004】一方、500〜800℃で行なう低温焼成
法は基材の選定という点では有利であるが、ガラス成分
を多く含む組成であるため、えられる導電性被膜は殆ん
どハンダ付けできず実用上問題がある。ハンダ濡れ性を
改善するためにCdOやBi2 O3 、Sb2 O3 を添加
する試みもあるが、それぞれ毒性の点、低融点であるた
めにパターンから滲み出す点、および揮発性であるため
に焼成炉や焼成被膜を汚染する点などの欠点がある。On the other hand, the low temperature firing method carried out at 500 to 800 ° C. is advantageous from the viewpoint of selecting a base material, but since the composition contains a large amount of glass components, the obtained conductive coating can hardly be soldered. There are practical problems. Attempts have been made to add CdO, Bi 2 O 3 and Sb 2 O 3 in order to improve the solder wettability, but they are toxic, they ooze out from the pattern due to their low melting point, and they are volatile. There are drawbacks such as the fact that it contaminates the firing furnace and the fired coating.
【0005】[0005]
【発明が解決しようとする課題】本発明は、フェライト
基材との密着性とハンダ濡れ性に優れた焼成被膜を与え
かつ前記のような焼成時の欠点のない低温焼成用銅組成
物を提供することを目的とする。[0008] The present invention provides a baked film having excellent adhesiveness and solderability of a ferrite <br/> substrate and the low temperature fired copper flawless during firing, such as It is intended to provide a composition.
【0006】[0006]
【課題を解決するための手段】本発明の低温焼成用銅組
成物は、金属銅粉末およびニッケル粉末からなる金属成
分100重量部と低いガラス転移点を有するガラスフリ
ット10〜40重量部とを含む組成物に酸化タングステ
ンが配合されてなり、フェライト基材用でかつ酸素2〜
50ppmを含む雰囲気下での低温焼成用銅組成物に関
する。The copper composition for low temperature firing of the present invention contains 100 parts by weight of a metal component consisting of metallic copper powder and nickel powder and 10 to 40 parts by weight of a glass frit having a low glass transition point. Ri Na and tungsten oxide is incorporated into the composition, and oxygen 2 a ferrite substrate
The present invention relates to a copper composition for low temperature firing under an atmosphere containing 50 ppm .
【0007】また本発明は、前記組成物を用いた導電性
被膜およびその製法に関する。 The present invention also provides a conductive material using the above composition.
The present invention relates to a coating and a method for producing the coating.
【0008】本発明において、金属成分は導電性を焼成
被膜に与える成分であり、金属銅粉末およびニッケル粉
末の混合物である。前記ニッケル粉末の量は金属成分の
40重量%以下、特に5〜40重量%が好ましい。前記
ニッケル粉末を配合することにより導電性、接着性、ハ
ンダ濡れ性、耐ハンダ喰われ性などがさらに改善され
る。[0008] In the present invention, the metal component is a component that gives electrical conductivity to the sintered film, is a mixture of gold Shokudo powder and nickel powder <br/> end. The amount of the nickel powder is 40 wt% of the metal components below, particularly 5 to 40% by weight. The above
By blending the nickel powder , the conductivity, adhesiveness, solder wettability, solder erosion resistance and the like are further improved.
【0009】焼成被膜でバインダーとして働くガラスフ
リットは被膜とフェライト基材との密着性を確保する。
本発明の組成物は低温焼成法に適用するものであるか
ら、ガラスフリットは少なくとも低温焼成時(600〜
700℃)に軟化あるいは溶融していることを要する。
そのようなガラスフリットとしては400〜500℃と
いう低いガラス転移点をもつものが好ましい。ガラス転
移点が低すぎると焼成時に流れてしまうことがあり、高
すぎると焼成が不充分となりフェライト基材との密着性
が低下する傾向にある。好ましいガラスフリットとして
は、たとえば酸化鉛、酸化亜鉛などを含有する硼硅酸鉛
ガラス、硼珪酸亜鉛ガラス、硼珪酸鉛亜鉛ガラスなどの
低融点ガラスとして知られているものがあげられる。ガ
ラスフリットは金属成分100部(重量部、以下同様)
に対して10〜40部、好ましくは10〜20部配合さ
れ、この範囲内で特に優れた密着性とハンダ濡れ性を焼
成被膜に与える。The glass frit, which acts as a binder in the fired coating, ensures the adhesion between the coating and the ferrite substrate.
Since the composition of the present invention is applied to the low-temperature firing method, the glass frit is used at least during low-temperature firing (600-
It must be softened or melted to 700 ° C.
As such a glass frit, one having a low glass transition point of 400 to 500 ° C. is preferable. If the glass transition point is too low, flow may occur during firing, and if it is too high, firing tends to be inadequate and adhesion to the ferrite substrate tends to decrease. Examples of preferable glass frits include those known as low-melting glass such as lead borosilicate glass containing lead oxide and zinc oxide, zinc borosilicate glass and lead zinc borosilicate glass. Glass frit is 100 parts of metal component (weight part , the same below)
10 to 40 parts by weight, preferably 10 to 20 parts by weight, and within this range, the fired coating has particularly excellent adhesion and solder wettability.
【0010】本発明の組成物には、焼成被膜のハンダ濡
れ性を改善するために酸化タングステンが配合される。
酸化タングステンは毒性はなく、焼成温度範囲での揮発
性は殆んどなく、融点も1473℃と高く、焼成処理お
よび焼成被膜に悪影響を与えることはない。酸化タング
ステンは金属成分100部に対し、0.1〜5部、特に
0.2〜1.0部配合するのが好ましい。The composition of the present invention contains tungsten oxide in order to improve the solder wettability of the fired coating.
Tungsten oxide is not toxic, has almost no volatility in the firing temperature range, has a high melting point of 1473 ° C., and does not adversely affect the firing treatment and the firing coating. Tungsten oxide is preferably added in an amount of 0.1 to 5 parts, particularly 0.2 to 1.0 part, per 100 parts of the metal component.
【0011】本発明の組成物は、通常、ペースト状とさ
れフェライト基材に塗布される。ペースト化のためには
有機ビヒクルが配合される。この有機ビヒクルとして
は、たとえばエチルセルロースのターピネオール溶液、
アクリル酸エステル樹脂のブチルカルビトール酢酸エス
テル溶液など従来公知のものが使用でき、その量は金属
成分100部に対し30部程度、好ましい印刷適性粘度
になるように添加する。The composition of the present invention is usually made into a paste and applied to a ferrite substrate. An organic vehicle is added for forming a paste. Examples of the organic vehicle include a solution of ethyl cellulose in terpineol,
A conventionally known one such as a butyl carbitol acetic acid ester solution of an acrylic acid ester resin can be used, and the amount thereof is about 30 parts with respect to 100 parts of the metal component, and is added so as to obtain a preferable printability viscosity.
【0012】本発明の銅組成物は従来公知の方法により
塗布・焼成することができる。たとえば有機ビヒクルを
加えて混練してペースト化したのち、フェライト基材に
塗布する。焼成被膜をパターン化するばあいには、たと
えばスクリーン印刷法などによりフェライト基材に塗布
すればよい。膜厚は通常8μm〜50μmである。フェ
ライト基材に塗布後、乾燥させ焼成する。焼成はピーク
温度600〜700℃という低温でキープ時間2〜10
分間行なう。焼成雰囲気はチッ素雰囲気が好ましく、ま
た、有機ビヒクルを熱分解させるため、酸素を2〜50
ppm混入させる。The copper composition of the present invention can be applied and fired by a conventionally known method. For example, an organic vehicle is added and kneaded to form a paste, which is then applied to a ferrite base material. When patterning the fired coating, it may be applied to the ferrite substrate by, for example, a screen printing method. The film thickness is usually 8 μm to 50 μm. Fe
After being applied to the light base material, it is dried and baked. The firing temperature is as low as a peak temperature of 600 to 700 ° C. and the keeping time is 2 to 10
Do it for a minute. Firing atmosphere is preferably nitrogen atmosphere, also an organic vehicle for thermally decomposing the oxygen 2-50
ppm Ru is mixed.
【0013】焼成後えられる被膜は導電性であり、フェ
ライト基材への密着性に優れ、ハンダ濡れ性も優れたも
のである。[0013] coatings for example after firing is electrically conductive, Fe
It has excellent adhesion to the light base material and excellent solder wettability.
【0014】フェライト基材としては焼成温度である6
00〜700℃の温度に耐えられるものが好ましい。The ferrite base material has a firing temperature of 6
Those capable of withstanding a temperature of 00 to 700 ° C. are preferable .
【0015】つぎに本発明を実施例に基づいて説明する
が、本発明はかかる実施例のみに限られるものではな
い。Next, the present invention will be described based on examples, but the present invention is not limited to such examples.
【0016】参考例1 表1に示す金属成分と酸化タングステン(WO3 )とガ
ラス転移点490℃のガラスフリットとを表1に示す量
配合し、エチルセルロース溶液を加え、3本ロールミル
により粘度25万cPsの銅ペーストをえた。この銅ペ
ーストをスクリーン印刷により93%アルミナ基板に厚
さ30μmに印刷し、乾燥後、チッ素雰囲気(O2 を8
ppm含有)中で700℃にて10分間焼成し、導電性
の焼成被膜をえた。 Reference Example 1 The metal components shown in Table 1, tungsten oxide (WO 3 ) and glass frit having a glass transition point of 490 ° C. were blended in the amounts shown in Table 1, ethyl cellulose solution was added, and the viscosity was 250,000 with a three-roll mill. A copper paste of cPs was obtained. This copper paste was printed by screen printing on a 93% alumina substrate to a thickness of 30 μm, and after drying, a nitrogen atmosphere (O 2
(containing ppm) was fired at 700 ° C. for 10 minutes to obtain a conductive fired film.
【0017】えられた焼成被膜のハンダ濡れ性および基
材への密着性をつぎの方法で調べた。The solder wettability and the adhesion to the substrate of the obtained fired coating were examined by the following methods.
【0018】結果を表1に示す。The results are shown in Table 1.
【0019】(ハンダ濡れ性) 試料をフラックス(R5003、日本アルファメタルズ
(株)製)に浸したのち、温度230±5℃の静止ハン
ダ槽(JIS Z 3238 H60Aハンダ使用)中
に10±2秒間浸漬し、ハンダによる試料表面の隠蔽率
を調べる。(Solder wettability) After immersing the sample in a flux (R5003, manufactured by Nippon Alpha Metals Co., Ltd.), it was placed in a static solder bath (using JIS Z 3238 H60A solder) at a temperature of 230 ± 5 ° C. for 10 ± 2 seconds. Immerse and check the hiding ratio of the sample surface with solder.
【0020】◎は隠蔽率95%以上、○は隠蔽率90%
以上ないし95%未満、△は隠蔽率70%以上ないし9
0%未満、×は隠蔽率70%未満を示す。◎ indicates a hiding rate of 95% or more, and ○ indicates a hiding rate of 90%
It is not on more than less than 95%, △ it is to no contrast ratio of 70% or more 9
Less than 0%, x indicates less than 70% hiding rate.
【0021】(密着性) 試料をハンダ濡れ性評価の条件で、予備ハンダ付けし、
310±20℃のハンダコテを用いて測定箇所にφ0.
6mmのスズメッキ軟銅線を基板と垂直にハンダ付けす
る。つぎに軟銅線を基板に対し、垂直に引っ張り、剥離
時の強度を記録する。引っ張り速度は10mm/min
とする。測定箇所は2mm×2mmの正方形とする。(Adhesion) The sample was pre-soldered under the condition of solder wettability evaluation,
Use a soldering iron with a temperature of 310 ± 20 ° C to measure φ0.
A 6 mm tin-plated annealed copper wire is soldered vertically to the substrate. Next, the annealed copper wire is pulled perpendicular to the substrate and the strength at peeling is recorded. Tensile speed is 10mm / min
And The measurement location is a 2 mm × 2 mm square.
【0022】[0022]
【表1】 [Table 1]
【0023】参考例2 ガラス転移点410℃または490℃のガラスフリット
を用いたほかは参考例1と同様にして表2に示す組成物
から粘度25万cPsの銅ペーストを調製し、参考例1
と同様にして96%アルミナ基板に厚さ25μmとなる
よう印刷し、乾燥後焼成(700℃、キープ時間5分
間)して焼成被膜をえた。[0023] Reference Example 2 except for using a glass frit having a glass transition point of 410 ° C. or 490 ° C. was prepared copper paste viscosity 250,000 cPs from in the same manner as in Reference Example 1 composition shown in Table 2, Example 1
In the same manner as above, a 96% alumina substrate was printed to have a thickness of 25 μm, dried and baked (700 ° C., keep time 5 minutes) to obtain a baked coating.
【0024】えられた焼成被膜のハンダ濡れ性と密着性
を参考例1と同様にして調べた。The solder wettability and adhesion of the obtained fired coating were examined in the same manner as in Reference Example 1.
【0025】結果を表2に示す。The results are shown in Table 2.
【0026】[0026]
【表2】 [Table 2]
【0027】実施例1 ガラスフリットとしてガラス転移点410℃のものを用
い、金属成分および基材として表3に示すものを用い、
焼成温度を600℃としたほかは参考例1と同様にして
表3に示す組成物から焼成被膜をえた。Example 1 A glass frit having a glass transition point of 410 ° C. was used, and a metal component and a base material shown in Table 3 were used.
A fired film was obtained from the composition shown in Table 3 in the same manner as in Reference Example 1 except that the firing temperature was 600 ° C.
【0028】えられた焼成被膜のハンダ濡れ性と密着性
を参考例1と同様にして調べた。The solder wettability and adhesion of the obtained fired coating were examined in the same manner as in Reference Example 1.
【0029】結果を表3に示す。The results are shown in Table 3.
【0030】[0030]
【表3】 [Table 3]
【0031】[0031]
【発明の効果】本発明の低温焼成用銅組成物は、安全か
つ容易にハンダ濡れ性およびフェライト基材との密着性
に優れた導電性の焼成被膜を形成することができる。 Low temperature fired copper compositions of the present invention according to the present invention can be formed safely and easily solder wettability and excellent conductivity of the fired film adhesion to the ferrite substrate.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H05K 1/09 7511−4E H05K 1/09 Z 3/12 7511−4E 3/12 B (56)参考文献 特開 昭64−81106(JP,A) 実開 昭59−117672(JP,U) 特公 昭43−12858(JP,B1)─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical indication H05K 1/09 7511-4E H05K 1/09 Z 3/12 7511-4E 3/12 B (56) References Japanese Unexamined Patent Publication No. Sho 64-81106 (JP, A) Actual Development Sho 59-117672 (JP, U) Japanese Patent Publication Sho 43-12858 (JP, B1)
Claims (6)
金属成分100重量部と低いガラス転移点を有するガラ
スフリット10〜40重量部とを含む組成物に酸化タン
グステン0.1〜5重量部が配合されてなるフェライト
基材用の低温焼成用銅組成物。1. A composition containing 100 parts by weight of a metal component consisting of metallic copper powder and nickel powder and 10 to 40 parts by weight of a glass frit having a low glass transition point, and 0.1 to 5 parts by weight of tungsten oxide. Ferrite
A copper composition for low temperature firing for a base material .
〜500℃である請求項1記載の組成物。2. A glass frit having a glass transition point of 400.
Ru to 500 ° C. der composition of claim 1.
%含んでなる請求項1または2記載の組成物。3. Nickel powder is 5 to 40 parts by weight of metal component.
The composition according to claim 1 or 2, wherein the composition comprises% .
銅組成物を酸素を2〜50ppm含むチッ素雰囲気中で
600〜700℃にてフェライト基材上に焼成する導電
性被膜の製法。4. Low temperature firing according to claim 1, 2 or 3.
Copper composition in a nitrogen atmosphere containing 2 to 50 ppm of oxygen
Conductive firing on ferrite substrate at 600-700 ° C
Method of forming a protective film .
スクリーン印刷法により塗布してパターンを形成し、つ
いで焼成する請求項4記載の製法。5. A ferrite base material comprising a copper composition for low temperature firing
Apply by screen printing to form a pattern,
The method according to claim 4, wherein the baking is performed .
ライト基材上に焼成してえられる導電性被膜。6. A manufacturing method according to claim 4 or 5.
A conductive coating obtained by firing on a light base material .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5073844A JP2537007B2 (en) | 1993-03-31 | 1993-03-31 | Copper composition for low temperature firing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5073844A JP2537007B2 (en) | 1993-03-31 | 1993-03-31 | Copper composition for low temperature firing |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH06290634A JPH06290634A (en) | 1994-10-18 |
JP2537007B2 true JP2537007B2 (en) | 1996-09-25 |
Family
ID=13529863
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5073844A Expired - Lifetime JP2537007B2 (en) | 1993-03-31 | 1993-03-31 | Copper composition for low temperature firing |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2537007B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7303854B2 (en) | 2003-02-14 | 2007-12-04 | E.I. Du Pont De Nemours And Company | Electrode-forming composition for field emission type of display device, and method using such a composition |
WO2016017239A1 (en) * | 2014-07-28 | 2016-02-04 | 株式会社村田製作所 | Electrically conductive paste, and glass article |
JPWO2017006714A1 (en) * | 2015-07-03 | 2018-03-08 | 株式会社村田製作所 | Conductive paste and glass article |
JP6588174B1 (en) * | 2019-01-11 | 2019-10-09 | Jx金属株式会社 | Method for producing a composite of ceramic and conductor |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6481106A (en) * | 1987-09-22 | 1989-03-27 | Sumitomo Metal Mining Co | Composition for forming conductive film |
-
1993
- 1993-03-31 JP JP5073844A patent/JP2537007B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH06290634A (en) | 1994-10-18 |
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