JPH0945130A - Conductor paste composite - Google Patents
Conductor paste compositeInfo
- Publication number
- JPH0945130A JPH0945130A JP21133995A JP21133995A JPH0945130A JP H0945130 A JPH0945130 A JP H0945130A JP 21133995 A JP21133995 A JP 21133995A JP 21133995 A JP21133995 A JP 21133995A JP H0945130 A JPH0945130 A JP H0945130A
- Authority
- JP
- Japan
- Prior art keywords
- pts
- conductor
- powder
- copper
- conductor paste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Parts Printed On Printed Circuit Boards (AREA)
- Conductive Materials (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は絶縁基板上に印刷焼成し
て厚膜配線板を形成するための導体ペースト組成物に関
するものであり、とくに導電成分として銅を用いた導体
ペースト組成物に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductor paste composition for printing and firing an insulating substrate to form a thick film wiring board, and more particularly to a conductor paste composition using copper as a conductive component. Is.
【0002】[0002]
【従来の技術】従来厚膜配線板は、96%アルミナから
なる絶縁基板上に銀又は銅を主成分とし無機結合剤と有
機バインダとを含有する導体ペースト組成物を印刷焼成
して導体を形成する物が一般的である。近年厚膜配線板
の小型化、高密度化の要請に合わせ、マイグレーション
発生の恐れが小さくかつ電気特性においても優れた導体
を形成できる銅ペーストへの注目が高まっている。導体
膜の半田特性にも厳しい条件が要求される所となってい
ることから種々の改良が試みられている。例えば金属酸
化物の添加に拠る改良の事例として、特開平3−223
06ではZnO粉末及びTiO2 の添加により半田濡れ
性と密着強度の向上を図っており、特公平2−5546
0は、レーザー加工したスルホール部用途でTiO2 を
7〜20重量%添加しているが半田濡れ性については考
慮していない。さらには、1μm以下の平均粒径をもっ
た銅粉末を使用して導体膜の緻密化により、高温放置後
の密着強度と導電性との向上を図る例も見られる。2. Description of the Related Art A conventional thick film wiring board is formed by printing and firing a conductor paste composition containing silver or copper as a main component and an inorganic binder and an organic binder on an insulating substrate made of 96% alumina. Those that do are common. In recent years, in response to the demands for downsizing and high density of thick film wiring boards, attention is being paid to a copper paste that can form a conductor that is less likely to cause migration and has excellent electrical characteristics. Various improvements have been attempted because severe conditions are required for the solder characteristics of the conductor film. For example, as an example of improvement based on addition of a metal oxide, JP-A-3-223
In No. 06, the addition of ZnO powder and TiO 2 improves solder wettability and adhesion strength.
In No. 0, 7 to 20% by weight of TiO 2 was added for the purpose of laser processing through holes, but solder wettability was not considered. Further, there is also seen an example in which copper powder having an average particle diameter of 1 μm or less is used to densify the conductor film to improve the adhesion strength and conductivity after being left at high temperature.
【0003】[0003]
【発明が解決しようとする課題】しかし、銅ペーストは
基板への印刷後、微量の酸素を含有した窒素等の不活性
雰囲気で焼成されるが、その為ペースト中の有機成分の
バーンアウトが不充分になりやすい傾向にある。特に、
大量の基板を一度に焼成したり、基板上の銅導体パター
ン面積が大きい場合に有機成分の燃え残りが多くなり焼
成後の導体膜に悪影響をもたらす所となり、導体膜の変
色もしくは半田濡れ性の劣化として現れる。この傾向
は、焼成して得られる導体膜が緻密な場合に顕著とな
る。反面、導体の緻密度を落とした場合有機成分の残存
による特性低下は無くなるものの高温放置による密着強
度劣化が大きくなるという問題が残る。However, after the copper paste is printed on the substrate, the copper paste is fired in an inert atmosphere such as nitrogen containing a slight amount of oxygen, which causes burnout of the organic components in the paste. It tends to be sufficient. Especially,
When a large number of substrates are fired at once, or when the copper conductor pattern area on the substrates is large, the unburned residue of organic components increases, which adversely affects the conductor film after firing, causing discoloration of the conductor film or solder wettability. Appears as deterioration. This tendency becomes remarkable when the conductor film obtained by firing is dense. On the other hand, when the density of the conductor is reduced, the deterioration of the characteristics due to the remaining organic components is eliminated, but the problem that the adhesion strength is greatly deteriorated when left at high temperature remains.
【0004】本発明は上記の問題を解決し、アルミナ基
板上に印刷後、大量に焼成した場合にも、変色のない外
観と良好な半田濡れ性を有し、同時に高温放置後の密着
強度劣化も小さい導体膜を形成するための銅導体ペース
ト組成物を提供する事を目的とする。The present invention solves the above problems and has a discoloration-free appearance and good solder wettability even when printed on an alumina substrate and baked in large quantities, and at the same time, deteriorates adhesion strength after being left at high temperature. The object is to provide a copper conductor paste composition for forming a small conductor film.
【0005】[0005]
【課題を解決するための手段】本発明は、銅粉末と無機
結合剤とを有機ビヒクルに分散させてなる導体ペースト
組成物に、一次粒子サイズが0.05μm以下のTiO
2 の超微粉を添加したものである。0.05μmを越え
るサイズのTiO2 では膜質コントロールの効果が現れ
にくいためである。又、TiO2 超微粉の添加量は銅粉
末100重量部に対し0.2重量部を越えない量とする
ことが必要である。0.2重量部を越えて添加すると半
田濡れ性が劣化すると共に導体抵抗値が増大するためで
ある。The present invention provides a conductor paste composition comprising a copper powder and an inorganic binder dispersed in an organic vehicle, and a TiO having a primary particle size of 0.05 μm or less.
It is the one to which the ultrafine powder of 2 was added. This is because the effect of controlling the film quality is difficult to appear with TiO 2 having a size exceeding 0.05 μm. Further, it is necessary that the addition amount of TiO 2 ultrafine powder does not exceed 0.2 parts by weight with respect to 100 parts by weight of copper powder. This is because if the addition amount exceeds 0.2 parts by weight, the solder wettability deteriorates and the conductor resistance value increases.
【0006】本発明に使用される導電性粉末としては従
来導体ペーストに用いられている銅粉末を用いることが
できるが、比表面積0.5m2 /g前後の粗い粒径の銅
粉末と比表面積2.0m2 /g前後の細かい粒径の粉末
を混合して用いた場合、特に望ましい結果をもたらす。As the conductive powder used in the present invention, the copper powder conventionally used in the conductor paste can be used, but the copper powder having a specific surface area of about 0.5 m 2 / g and the specific surface area of the copper powder can be used. Particularly desirable results are obtained when powders having a fine particle size of about 2.0 m 2 / g are mixed and used.
【0007】本発明において無機結合剤としては、Pb
O−SiO2 −B2 O3 系、PbO−Al2 O3 −B2
O3 系、PbO−SiO2 −B2 O3 −ZnO系といっ
たガラスフリ ット及びCu2 O,Bi2 O3,MnO2
,CoO,NiO等の金属酸化物の中から選ばれる一
つ、もしくはそれらの混合物を用いることができる。こ
れら無機結合材の配合量は、銅粉末100重量部に対し
4〜9重量部とする事が必要である。4重量部未満では
密着強度が劣化し、9重量部を越えて配合すると半田濡
れ性が悪化するからである。In the present invention, the inorganic binder is Pb.
O-SiO 2 -B 2 O 3 system, PbO-Al 2 O 3 -B 2
Glass frit such as O 3 system and PbO—SiO 2 —B 2 O 3 —ZnO system and Cu 2 O, Bi 2 O 3 , MnO 2
, Metal oxides such as CoO and NiO, or a mixture thereof can be used. The blending amount of these inorganic binders needs to be 4 to 9 parts by weight with respect to 100 parts by weight of copper powder. This is because if the amount is less than 4 parts by weight, the adhesion strength deteriorates, and if the amount exceeds 9 parts by weight, the solder wettability deteriorates.
【0008】本発明において、有機ビヒクルとしてはエ
チルセルロースやポリイソブチルメタクリレート等の樹
脂をターピネオール、ブチルカルビトールアセテート、
2,2,4トリメチルペンタンジオールモノイソブチレ
ート等の有機溶剤に溶解したものが好ましく用いられ
る。In the present invention, as the organic vehicle, resins such as ethyl cellulose and polyisobutyl methacrylate are used as terpineol, butyl carbitol acetate,
Those dissolved in an organic solvent such as 2,2,4 trimethylpentanediol monoisobutyrate are preferably used.
【0009】[0009]
【実施例】エチルセルロース樹脂を2,2,4トリメチ
ルペンタンジオールモノイソブチレートに溶解したビヒ
クル中に、銅粉末、ガラスフリット(重量組成でPbO
54%、B2 O3 14%、SiO2 3%、ZnO 24
%、TiO2 5%)、酸化 銅粉末及びTiO2 超微粉
(一次粒子の粒径0.02μm)を表1に示す配合比
で混合し、混練分散して実施例、比較例及び従来例の導
体ペーストを作成した。表中、銅粉末Aは比表面積1.
8m2/g、銅粉末Bは比表面積0.6m2/gの物を用
いた。EXAMPLE In a vehicle prepared by dissolving ethyl cellulose resin in 2,2,4 trimethylpentanediol monoisobutyrate, copper powder and glass frit (PbO by weight composition) were used.
54%, B 2 O 3 14%, SiO 2 3%, ZnO 24
%, TiO 2 5%), copper oxide powder and TiO 2 ultrafine powder (particle diameter of primary particles 0.02 μm) are shown in Table 1.
Was mixed and kneaded and dispersed to prepare conductor pastes of Examples, Comparative Examples and Conventional Examples. In the table, the copper powder A has a specific surface area of 1.
8 m 2 / g, copper powder B having a specific surface area of 0.6 m 2 / g was used.
【0010】[0010]
【表1】 [Table 1]
【0011】こうして作成された導体ペーストを96%
Al2O3基板上に印刷乾燥後、コンベア炉を用いて90
0℃ピーク10分で窒素雰囲気焼成し、銅導体膜を有す
る評価試料を作成した。その際、導体印刷塗膜の総面積
がコンベア炉のベルト上の90%以上の面積を占めるよ
うに基板を並べて焼成を行った。尚、スクリーンは32
5メッシュのものを用いた。96% of the conductor paste prepared in this way
After printing and drying on an Al 2 O 3 substrate, 90 using a conveyor furnace
The sample was fired in a nitrogen atmosphere at 0 ° C. peak for 10 minutes to prepare an evaluation sample having a copper conductor film. At that time, the substrates were arranged and fired so that the total area of the conductor-printed coating film occupied 90% or more of the area on the belt of the conveyor furnace. The screen is 32
A 5-mesh one was used.
【0012】こうして作成した評価試料の外観を目視で
観察し、色むらの有無を調べた。色むらが見られない物
を○、全面に色むらが存在する物を×で表した。The appearance of the evaluation sample thus prepared was visually observed to check for the presence of color unevenness. The one in which the color unevenness is not seen is indicated by ◯, and the one in which the color unevenness exists is indicated by x.
【0013】次に作成された評価試料をロジンフラック
ス中に浸漬してから鉛−錫共晶半田に250℃5秒間浸
漬した後、2mm×2mmパッドに直径0.6mmの半
田メッキ銅線を半田ゴテで半田付けし、ピールテストに
より初期の密着強度を測定した。同様にして半田メッキ
銅線付けした試料を150℃恒温槽中に1000時間放
置し、室温に戻してからピールテストを行い、エージン
グ強度とした。Next, the prepared evaluation sample was dipped in rosin flux and then dipped in lead-tin eutectic solder at 250 ° C. for 5 seconds, and then a solder-plated copper wire having a diameter of 0.6 mm was soldered to a 2 mm × 2 mm pad. It was soldered with a iron and the initial adhesion strength was measured by a peel test. Similarly, the sample to which the solder-plated copper wire was attached was left to stand in a constant temperature bath of 150 ° C. for 1000 hours, returned to room temperature, and then subjected to a peel test to obtain the aging strength.
【0014】更に別の評価試料をロジンフラックスに浸
漬後220℃の鉛−錫共晶半田中に5秒浸漬してから冷
却し、5mm×5mm角パターンについて目視観察し、
半田濡れ性を調べた。評価に当たっては、濡れ面積95
%以上を○、85〜95%の物を△、85%未満を×と
した。これらの結果を表2にまとめた。Further, another evaluation sample was dipped in rosin flux, dipped in lead-tin eutectic solder at 220 ° C. for 5 seconds, cooled, and visually observed for a 5 mm × 5 mm square pattern.
The solder wettability was examined. Wet area 95
% Or more was evaluated as ◯, 85 to 95% as Δ, and less than 85% as x. The results are summarized in Table 2.
【0015】[0015]
【表2】 [Table 2]
【0016】表2より明らかな通り、本実施例の導体ペ
ーストによる評価試料は焼成外観、半田濡れ性、密着強
度のいずれも良好である。これに対し比較例の導体ペー
ストによる評価試料では、無機結合材の少ない場合エー
ジング強度が劣り、無機結合材が過剰な場合半田濡れ性
が劣る所となっている。また、TiO2 超微粉の添加量
が過剰な試料では半田濡れ性が劣り、TiO2 超微粉を
添加しない試料では、色むら発生する事がわかる。As is clear from Table 2, the evaluation sample using the conductor paste of this example has good firing appearance, solder wettability, and adhesion strength. On the other hand, in the evaluation sample using the conductor paste of the comparative example, the aging strength is poor when the inorganic binder is small, and the solder wettability is poor when the inorganic binder is excessive. Further, it can be seen that the solder wettability is poor in the sample in which the addition amount of the TiO 2 ultra-fine powder is excessive, and the color unevenness occurs in the sample in which the TiO 2 ultra-fine powder is not added.
【0017】[0017]
【発明の効果】以上説明したように、本発明の導体ペー
スト組成物は、セラミック基板上に印刷後、焼成炉に大
量に投入して焼成しても色むらの発生が見られず、しか
も半田濡れ性及びエージング強度に優れた導体膜を基板
表面に形成する事が可能となり量産性と導体の基本特性
の両方に優れた導体ペースト組成物である。As described above, the conductor paste composition of the present invention does not cause color unevenness even when printed on a ceramic substrate and then placed in a large amount in a firing furnace and fired. This is a conductor paste composition which is capable of forming a conductor film excellent in wettability and aging strength on the surface of a substrate and is excellent in both mass productivity and basic properties of a conductor.
Claims (1)
結合剤4〜9重量部と(c)一次粒子サイズが0.05
μm以下のTiO2 粉末0〜0.2重量部とを(e)有
機ビヒクルに分散させてなる導体ペースト組成物。1. (a) 100 parts by weight of copper powder, (b) 4 to 9 parts by weight of an inorganic binder, and (c) a primary particle size of 0.05.
A conductor paste composition comprising (e) an organic vehicle and 0 to 0.2 parts by weight of a TiO 2 powder having a particle size of not more than μm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21133995A JPH0945130A (en) | 1995-07-28 | 1995-07-28 | Conductor paste composite |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21133995A JPH0945130A (en) | 1995-07-28 | 1995-07-28 | Conductor paste composite |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0945130A true JPH0945130A (en) | 1997-02-14 |
Family
ID=16604330
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21133995A Pending JPH0945130A (en) | 1995-07-28 | 1995-07-28 | Conductor paste composite |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0945130A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1383361A2 (en) * | 2002-07-17 | 2004-01-21 | Ngk Spark Plug Co., Ltd | Copper paste, wiring board using the same, and production method of wiring board |
JP2004134378A (en) * | 2002-07-17 | 2004-04-30 | Ngk Spark Plug Co Ltd | Copper paste, and wiring board using the same |
EP1383362A3 (en) * | 2002-07-17 | 2006-01-04 | Ngk Spark Plug Co., Ltd | Copper paste and wiring board using the same |
JP2006066475A (en) * | 2004-08-25 | 2006-03-09 | Sumitomo Metal Mining Co Ltd | Composition for forming thick film resistor, process for forming thick film resistor, and thick film resistor |
JP2006302890A (en) * | 2005-04-14 | 2006-11-02 | E I Du Pont De Nemours & Co | Manufacturing method for semiconductor device and conductive composition used in it |
JP2010239136A (en) * | 2002-07-17 | 2010-10-21 | Ngk Spark Plug Co Ltd | Wiring board |
JP2016528134A (en) * | 2013-06-05 | 2016-09-15 | セラムテック ゲゼルシャフト ミット ベシュレンクテル ハフツングCeramTec GmbH | Metal coating on ceramic substrate |
-
1995
- 1995-07-28 JP JP21133995A patent/JPH0945130A/en active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1383361A2 (en) * | 2002-07-17 | 2004-01-21 | Ngk Spark Plug Co., Ltd | Copper paste, wiring board using the same, and production method of wiring board |
JP2004134378A (en) * | 2002-07-17 | 2004-04-30 | Ngk Spark Plug Co Ltd | Copper paste, and wiring board using the same |
EP1383361A3 (en) * | 2002-07-17 | 2006-01-04 | Ngk Spark Plug Co., Ltd | Copper paste, wiring board using the same, and production method of wiring board |
EP1383362A3 (en) * | 2002-07-17 | 2006-01-04 | Ngk Spark Plug Co., Ltd | Copper paste and wiring board using the same |
JP4528502B2 (en) * | 2002-07-17 | 2010-08-18 | 日本特殊陶業株式会社 | Wiring board |
JP2010239136A (en) * | 2002-07-17 | 2010-10-21 | Ngk Spark Plug Co Ltd | Wiring board |
EP2343956A1 (en) * | 2002-07-17 | 2011-07-13 | NGK Spark Plug Co., Ltd. | Copper paste and wiring board using the same |
JP2006066475A (en) * | 2004-08-25 | 2006-03-09 | Sumitomo Metal Mining Co Ltd | Composition for forming thick film resistor, process for forming thick film resistor, and thick film resistor |
JP2006302890A (en) * | 2005-04-14 | 2006-11-02 | E I Du Pont De Nemours & Co | Manufacturing method for semiconductor device and conductive composition used in it |
US8394297B2 (en) | 2005-04-14 | 2013-03-12 | E I Du Pont De Nemours And Company | Method of manufacture of semiconductor device and conductive compositions used therein |
JP2016528134A (en) * | 2013-06-05 | 2016-09-15 | セラムテック ゲゼルシャフト ミット ベシュレンクテル ハフツングCeramTec GmbH | Metal coating on ceramic substrate |
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