JP2527723B2 - Semiconductor integrated circuit device - Google Patents

Semiconductor integrated circuit device

Info

Publication number
JP2527723B2
JP2527723B2 JP61266347A JP26634786A JP2527723B2 JP 2527723 B2 JP2527723 B2 JP 2527723B2 JP 61266347 A JP61266347 A JP 61266347A JP 26634786 A JP26634786 A JP 26634786A JP 2527723 B2 JP2527723 B2 JP 2527723B2
Authority
JP
Japan
Prior art keywords
integrated circuit
circuit device
conductivity type
mos transistor
semiconductor integrated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP61266347A
Other languages
Japanese (ja)
Other versions
JPS63120438A (en
Inventor
隆彦 荒川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP61266347A priority Critical patent/JP2527723B2/en
Publication of JPS63120438A publication Critical patent/JPS63120438A/en
Application granted granted Critical
Publication of JP2527723B2 publication Critical patent/JP2527723B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/10Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
    • H01L27/118Masterslice integrated circuits
    • H01L27/11898Input and output buffer/driver structures

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、論理ゲート数に対して比較的多くの入力
/出力(I/O)ピン数を必要とする論理回路をも搭載す
ることのできるCMOSマスタスライス大規模集積回路装置
(LSI)のI/Oバツフアの構成に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention is also equipped with a logic circuit which requires a relatively large number of input / output (I / O) pins with respect to the number of logic gates. The present invention relates to the configuration of the I / O buffer of a possible CMOS master slice large scale integrated circuit device (LSI).

〔従来の技術〕[Conventional technology]

第3図は、従来のCMOSマスタスライスLSIを示す平面
図であり、図において、(1)は従来のLSIチツプ、
(2)はpチヤネルMOSトランジスタとnチヤネルMOSト
ランジスタとからなり論理ゲートを構成すべき基本セル
を規則的に配列した基本セル列、(3)は論理ゲート間
を接続するための配線帯領域、(4)はチツプ(1)の
周縁に設けられたI/Oバツフアセル領域、(5)は基本
セル列(2)に電源を供給するための電源配線、(6)
は半導体チツプ(1)の周縁に設けられた電源パツド及
びI/Oパツドである。
FIG. 3 is a plan view showing a conventional CMOS master slice LSI. In FIG. 3, (1) is a conventional LSI chip,
(2) is a basic cell row in which basic cells, which are composed of p-channel MOS transistors and n-channel MOS transistors, and which form a logic gate are regularly arranged; (4) is an I / O buffer cell area provided on the periphery of the chip (1), (5) is power supply wiring for supplying power to the basic cell row (2), (6)
Are a power supply pad and an I / O pad provided on the periphery of the semiconductor chip (1).

従来のCMOSマスタスライスLSIでは、I/Oバツフア
(4)は半導体チツプ(1)の周縁に配列されており、
LSI外部とインターフエースをとるためのI/Oパツド
(6)もチツプ(1)の周縁に並べられている。I/Oバ
ツフア領域(4)には電源配線が施こされており、基本
セルが配列されている内部領域への電源供給は、I/Oバ
ツフア領域(4)上の電源配線と接続された内部領域用
電源配線(5)によつて供給される。
In the conventional CMOS master slice LSI, the I / O buffer (4) is arranged on the periphery of the semiconductor chip (1),
I / O pads (6) for interfacing with the outside of the LSI are also arranged on the periphery of the chip (1). Power wiring is applied to the I / O buffer area (4), and the power supply to the internal area where the basic cells are arranged is connected to the power wiring on the I / O buffer area (4). It is supplied by the internal area power supply wiring (5).

第3図にIVで示した部分を拡大したのが第4図であ
る。内部領域用電源配線(7),(8)によつて、内部
領域の基本セル列(2)に電源が供給される。(7)は
GND、(8)はVDDラインである。
FIG. 4 is an enlarged view of the portion indicated by IV in FIG. Power is supplied to the basic cell row (2) in the internal region by the internal region power supply wirings (7) and (8). (7) is
GND, (8) is the V DD line.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

従来のCMOSマスタスライスLSIは以上のように構成さ
れているので、チツプ周縁にI/Oバツフアを並べるだけ
ではその数に限界があり、I/Oピン数を増やすためにチ
ツプサイズを大きくするとチツプコストが高くなるなど
の問題点があつた。
Since the conventional CMOS master slice LSI is configured as described above, the number of I / O buffers is limited only by arranging them on the periphery of the chip. There was a problem such as high price.

この発明は上記のような問題点を解消するためになさ
れたもので、チツプサイズを大きくすることなくI/Oピ
ン数を増加させることができるCMOSマスタスライスLSI
を得ることを目的とする。
The present invention has been made to solve the above problems, and a CMOS master slice LSI capable of increasing the number of I / O pins without increasing the chip size.
Aim to get.

〔問題点を解決するための手段〕[Means for solving problems]

この発明に係る半導体集積回路は、内部セル領域に電
源を供給する集積回路装置内部の論理ゲート領域に設け
られた一定幅の電源配線層の下にも基本セルを配列し、
その基本セルを利用して、I/Oバッファを構成したもの
である。
In the semiconductor integrated circuit according to the present invention, basic cells are arranged under a power supply wiring layer of a constant width provided in a logic gate region inside an integrated circuit device that supplies power to an internal cell region.
The basic cell is used to form an I / O buffer.

〔作用〕[Action]

集積回路装置内部の論理ゲート領域に設けられた一定
幅の電源配線層の下に配列された基本セルのpチャネル
MOSトランジスタとnチャネルMOSトランジスタとを組み
合わせてI/Oバッファを構成する。これらのI/Oバッファ
とチップ周縁のI/Oバッファとから、チップ周縁のI/Oパ
ッドもしくはチップ上に設けられたバンプを通して、LS
I外部と信号のやりとりをする。
P channel of a basic cell arranged under a power supply wiring layer of a constant width provided in a logic gate region inside an integrated circuit device
An I / O buffer is configured by combining a MOS transistor and an n-channel MOS transistor. From these I / O buffers and I / O buffers on the periphery of the chip, through the I / O pads on the periphery of the chip or bumps provided on the chip, LS
I Exchange signals with the outside world.

〔発明の実施例〕Example of Invention

第1図はこの発明の一実施例を示す平面図で、(1a)
はこの実施例のICチツプであり、第3図の従来例と同一
符号は同等部分を示し、その説明は重複を避ける。第1
図において、(9)は基本セル列(2)の基本セルを用
いて構成したI/Oバツフア領域である。
FIG. 1 is a plan view showing an embodiment of the present invention (1a)
Is the IC chip of this embodiment, and the same reference numerals as those in the conventional example of FIG. 3 indicate the same parts, and the description thereof will be omitted. First
In the figure, (9) is an I / O buffer area configured by using the basic cells of the basic cell row (2).

チツプ(1a)周縁に配設されたI/Oバツフア領域
(4)上の電源配線から内部領域への電源を供給するた
めの電源配線(5)の下に基本セルを配列し、基本セル
列(2)の上を電源配線(5)が通るように配置する。
電源配線(5)と基本セル列(2)とが交わつた領域
(9)にある基本セルのpチヤネルMOSトランジスタと
nチヤネルMOSトランジスタとを組み合わせて入力また
は出力バツフアを構成する。第1図にIIで示した部分を
拡大した図が第2図である。第2図において、(7)は
GND、(8)はVDDラインであり、(9)はI/Oバツフア
が構成される領域である。
Basic cells are arranged under the power wiring (5) for supplying power from the power wiring on the I / O buffer area (4) arranged on the periphery of the chip (1a) to the internal area. The power supply wiring (5) is arranged above (2).
An input or output buffer is formed by combining the p-channel MOS transistor and the n-channel MOS transistor of the basic cell in the region (9) where the power supply wiring (5) and the basic cell column (2) intersect. FIG. 2 is an enlarged view of the portion indicated by II in FIG. In Figure 2, (7) is
GND and (8) are V DD lines, and (9) is an area where I / O buffers are configured.

〔発明の効果〕〔The invention's effect〕

以上のように、この発明によれば、集積回路装置内部
の論理ゲート領域に設けられた一定幅の電源ラインの下
にも基本セルを配列し、その基本セルを用いて本来のI/
Oバッファセル領域以外にもI/Oバッファを構成したの
で、チップサイズを大きくすることなく、またデータ数
を減少させることもなく、多くのI/Oバッファを搭載す
ることが出来る。
As described above, according to the present invention, the basic cells are arranged under the power supply line of the constant width provided in the logic gate region inside the integrated circuit device, and the basic I /
Since I / O buffers are configured in areas other than the O buffer cell area, many I / O buffers can be mounted without increasing the chip size and reducing the number of data.

【図面の簡単な説明】[Brief description of drawings]

第1図はこの発明の一実施例を示す平面図、第2図は第
1図にIIとして示した部分の拡大図、第3図は従来のCM
OSマスタスライスLSIの平面図、第4図は第3図にIVと
して示した部分の拡大図である。 図において、(1a)はICチツプ、(2)は基本セル列、
(4)はI/Oバツフアセル領域、(5)は電源配線、
(9)は基本セルで構成した入力および出力(I/O)バ
ツフア領域である。 なお、図中同一符号は同一、または相当部分を示す。
FIG. 1 is a plan view showing an embodiment of the present invention, FIG. 2 is an enlarged view of a portion indicated by II in FIG. 1, and FIG. 3 is a conventional CM.
FIG. 4 is a plan view of the OS master slice LSI, and FIG. 4 is an enlarged view of a portion indicated by IV in FIG. In the figure, (1a) is an IC chip, (2) is a basic cell row,
(4) is the I / O buffer cell area, (5) is the power supply wiring,
(9) is an input and output (I / O) buffer area composed of basic cells. The same reference numerals in the drawings indicate the same or corresponding parts.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】複数個の第1の導電型MOSトランジスタと
上記第1の導電型とは反対の第2の導電型MOSトランジ
スタとのペアからなり論理ゲートを構成すべき基本セル
が規則正しく配列されたマスタスライス方式の相補型MO
S半導体集積回路装置において、 入力/出力バッファセル及び上記論理ゲートに供給する
集積回路装置内部の論理ゲート領域に設けられた一定幅
の電源配線層と半導体基板との間にも複数個の上記基本
セルを配列し、 該基本セル内の第1の導電型MOSトランジスタと第2の
導電型MOSトランジスタとを利用して入力及び出力バッ
ファを構成したことを特徴とする半導体集積回路装置。
1. A basic cell, which comprises a plurality of pairs of a first conductivity type MOS transistor and a second conductivity type MOS transistor opposite to the first conductivity type, and which constitutes a logic gate, is regularly arranged. Master slice type complementary MO
In the semiconductor integrated circuit device, a plurality of the above basic elements are provided between the semiconductor substrate and the power supply wiring layer of a constant width provided in the logic gate region inside the integrated circuit device for supplying to the input / output buffer cells and the logic gate. A semiconductor integrated circuit device, wherein cells are arranged, and input and output buffers are configured by using a first conductivity type MOS transistor and a second conductivity type MOS transistor in the basic cell.
JP61266347A 1986-11-08 1986-11-08 Semiconductor integrated circuit device Expired - Fee Related JP2527723B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61266347A JP2527723B2 (en) 1986-11-08 1986-11-08 Semiconductor integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61266347A JP2527723B2 (en) 1986-11-08 1986-11-08 Semiconductor integrated circuit device

Publications (2)

Publication Number Publication Date
JPS63120438A JPS63120438A (en) 1988-05-24
JP2527723B2 true JP2527723B2 (en) 1996-08-28

Family

ID=17429672

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61266347A Expired - Fee Related JP2527723B2 (en) 1986-11-08 1986-11-08 Semiconductor integrated circuit device

Country Status (1)

Country Link
JP (1) JP2527723B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3299260B2 (en) * 1990-10-10 2002-07-08 株式会社日立製作所 Semiconductor integrated circuit device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6080250A (en) * 1983-10-07 1985-05-08 Hitachi Ltd Semiconductor device
JPH0770597B2 (en) * 1985-02-22 1995-07-31 株式会社日立製作所 Semiconductor integrated circuit device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
日経マイクロデバイス、13(1986)P.111−126

Also Published As

Publication number Publication date
JPS63120438A (en) 1988-05-24

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