JP2524916Y2 - 電子衝撃磁場偏向型蒸発源装置 - Google Patents
電子衝撃磁場偏向型蒸発源装置Info
- Publication number
- JP2524916Y2 JP2524916Y2 JP4621790U JP4621790U JP2524916Y2 JP 2524916 Y2 JP2524916 Y2 JP 2524916Y2 JP 4621790 U JP4621790 U JP 4621790U JP 4621790 U JP4621790 U JP 4621790U JP 2524916 Y2 JP2524916 Y2 JP 2524916Y2
- Authority
- JP
- Japan
- Prior art keywords
- evaporation source
- magnet
- magnetic field
- crucible
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001704 evaporation Methods 0.000 title claims description 51
- 230000008020 evaporation Effects 0.000 title claims description 49
- 238000010894 electron beam technology Methods 0.000 claims description 12
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 7
- 239000000498 cooling water Substances 0.000 description 5
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- PTVDYARBVCBHSL-UHFFFAOYSA-N copper;hydrate Chemical compound O.[Cu] PTVDYARBVCBHSL-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4621790U JP2524916Y2 (ja) | 1990-04-28 | 1990-04-28 | 電子衝撃磁場偏向型蒸発源装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4621790U JP2524916Y2 (ja) | 1990-04-28 | 1990-04-28 | 電子衝撃磁場偏向型蒸発源装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH047650U JPH047650U (enrdf_load_stackoverflow) | 1992-01-23 |
| JP2524916Y2 true JP2524916Y2 (ja) | 1997-02-05 |
Family
ID=31561106
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4621790U Expired - Lifetime JP2524916Y2 (ja) | 1990-04-28 | 1990-04-28 | 電子衝撃磁場偏向型蒸発源装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2524916Y2 (enrdf_load_stackoverflow) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5538426B2 (ja) | 2008-12-23 | 2014-07-02 | エフ．ホフマン−ラ ロシュ アーゲー | 自己免疫疾患及び炎症性疾患の処置のための医薬として有用なジヒドロピリドンアミド |
-
1990
- 1990-04-28 JP JP4621790U patent/JP2524916Y2/ja not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5538426B2 (ja) | 2008-12-23 | 2014-07-02 | エフ．ホフマン−ラ ロシュ アーゲー | 自己免疫疾患及び炎症性疾患の処置のための医薬として有用なジヒドロピリドンアミド |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH047650U (enrdf_load_stackoverflow) | 1992-01-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |