JP2511250Y2 - Immersion type substrate processing equipment - Google Patents

Description

[Detailed Description of the Invention] << Industrial Application Field >> This invention is a thin substrate to be processed (hereinafter simply referred to as a substrate) such as a semiconductor substrate or a glass substrate for liquid crystal, which is required to be subjected to a required treatment such as a chemical treatment or a cleaning treatment. The present invention relates to an immersion type substrate processing apparatus used for performing the process.

<< Prior Art >> As a device of this type, a device disclosed in, for example, JP-A-64-14
The one disclosed in Japanese Patent No. 923 is known.

This is because the bottom of the processing tank is supported horizontally by a plurality of up-and-down adjustment supports, the processing liquid is stored in the processing tank and overflows from the upper side of the processing tank, and the substrate to be processed is stored in the stored processing liquid. Is soaked to surface-treat the substrate.

Incidentally, in recent years, in order to improve the processing quality of the substrate, the processing tank is made of a quartz material.

<< Problems to be Solved by the Invention >> On the other hand, in recent years, the size of the substrate to be processed has become large, so that a large processing tank has become necessary. However, in the above-mentioned conventional example, when the processing tank is made of a quartz material, the processing tank in which a large amount of processing liquid should be stored cannot be made so large. This is because the processing tank made of quartz material is vulnerable to excessive hydraulic pressure and concentrated supporting load.

That is, the processing tank formed by welding the quartz plate is very fragile and easily damaged. In addition, when the lower part of the processing tank is supported by the elevating support so that the lower part of the processing tank can be adjusted horizontally, an excessive concentrated supporting load locally acts on the bottom surface of the processing tank due to a slight adjustment error, which leads to the destruction of the processing tank. In particular, in order to improve the quality of the semiconductor cleaning process, it is necessary to evenly rectify the processing liquid in the tank and make it overflow as uniformly as possible from the upper side of the processing tank. There is also a circumstance in which leveling with a support is essential.

Therefore, it is conceivable that the thickness of the quartz plate forming the processing tank is made sufficiently thick to increase the strength, but in that case, the manufacturing cost of the processing tank increases because the quartz plate is expensive.

The present invention was made in consideration of such circumstances,
It is a technical subject to enable the size increase of a quartz processing tank that can cope with an increase in the size of a substrate to be processed and to provide a quartz processing tank at a low cost.

<< Means for Solving the Problems >> The present invention is configured as follows to solve the above problems.

That is, the bottom of the processing tank made of a quartz material is supported horizontally by an elevating adjustment support, the processing solution is stored in the processing tank and overflows from the upper side of the processing tank, and is stored in the stored processing solution. In an immersion type substrate processing apparatus configured to immerse a substrate to be processed for surface treatment of the substrate, a reinforcing plate formed of a corrosion resistant material is formed on at least the bottom surface of the bottom wall of the processing tank by a corrosion resistant adhesive having elasticity after bonding. It is characterized in that it is structured such that it is adhered and that the reinforcing plate is supported by the lifting adjustment support tool.

<Operation> In the present invention, the lower surface of the bottom wall of the quartz processing tank is supported by the up-and-down adjustment support through the reinforcing plate, and when adjusting the support, an excessive concentrated supporting load causes a bottom wall of the quartz processing tank. To prevent local action on.

Further, the reinforcing plate is made of a thick plate such as tempered glass and has a sufficiently high strength, and even if the bottom wall of the quartz treatment tank is thin,
Fully reinforce its strength.

Moreover, since this reinforcing plate is adhered to at least the bottom surface of the bottom wall of the processing tank with a corrosion-resistant adhesive having elasticity after bonding, even if there is some unevenness on the bottom surface of the processing tank, the entire surface is evenly spread through the adhesive. And a difference in thermal expansion between the bottom wall and the reinforcing plate is absorbed, and an excessive strain load is not generated on the bottom wall of the quartz processing tank.

<< Embodiment >> FIG. 1 is a vertical sectional side view showing an embodiment of the immersion type substrate processing apparatus according to the present invention, and FIG. 2 is a vertical sectional front view thereof.

In this substrate processing apparatus, a quartz cleaning treatment tank 3 is arranged in a drainage tank 1, and the bottom of the cleaning treatment tank 3 is lifted and adjusted by a supporting tool.
It is supported so that it can be horizontally adjusted at 10, and the pure water cleaning liquid Q is stored in the cleaning processing tank 3 and overflows from the upper side of the cleaning processing tank 3, and is stored in the stored pure water cleaning liquid Q in the substrate housing cassette 6. The substrate W is cleaned by immersing the processed plurality of substrates W to be processed.

The drainage tank 1 is provided with a drain 2, and the cleaning treatment tank 3
The more overflowed cleaning liquid Q flows down from the drain 2, is refined by a refining device attached to a circulation channel (not shown), and is reused.

Inside the cleaning processing tank 3, a cleaning liquid supply unit 3A is arranged at the bottom and a cleaning processing tank 3B for immersing the substrate W is arranged above the cleaning liquid supply unit 3A, and the cleaning liquid supply unit 3A and the cleaning processing unit 3B are provided with a rectifying porous plate 4 respectively.
The pure water cleaning liquid Q is supplied through the water supply port 5 that is partitioned by the above and is piped to the cleaning liquid supply unit 3A, and is stored so that it can overflow.

The straightening perforated plate 4 has a constant positive pressure inside the cleaning liquid supply section 3A on the lower side, and the pure water cleaning liquid Q heated up to near 100 ° C. and an upward flow of N ₂ gas or the like supplied thereto as necessary. Is uniformly rectified, and a large number of substrates W accommodated in the cassette 6 can be uniformly cleaned by this upward flow. The bottom wall 3a of the quartz cleaning treatment tank 3 has a gentle slope toward the water supply port 5 side, and a drain port for maintenance (not shown) is provided below the water supply port 5.

On the lower surface of the bottom wall 3a of the quartz cleaning treatment tank 3, as shown in FIG. 3, a reinforcing plate 8 formed of a corrosion-resistant tempered glass plate is used.
Is attached with a corrosion-resistant adhesive 7, and the cleaning treatment tank 3
Is supported by four lifting adjustment supports 10 via a reinforcing plate 8 so as to be horizontally adjustable.

By the way, as the corrosion-resistant adhesive 7, "silicone adhesive" made by Toray Silicon Co., Ltd., which has elasticity even after adhesion, is suitable, and as the reinforcing plate, for example, "Pyrex glass (registered trademark)" (made by Corning Glass Co., Ltd.) Silicate glass) is used. As a result, the quartz cleaning treatment tank 3
Even if the bottom wall 3a is thin, the strength can be sufficiently reinforced by using the thick reinforcing plate 8. Further, since the corrosion-resistant adhesive 7 having elasticity even after the adhesion is interposed between the bottom wall 3a and the reinforcing plate 8, even if the lower surface of the cleaning treatment tank 3 has some irregularities, the adhesive 7 A uniform contact load is created over the entire surface, and the difference in thermal expansion between the bottom wall 3a and the reinforcing plate is absorbed by this adhesive 7, and an excessive strain load is applied to the bottom wall of the quartz cleaning treatment tank 3. It is configured so that it does not occur.

As the reinforcing plate 8, any material can be used as long as the material has a predetermined strength and corrosion resistance that have been transferred, but a corrosion-resistant tempered glass having a thermal expansion coefficient close to that of the quartz material is used. It is preferable.

Each of the above-mentioned lifting adjustment support tools 10 is provided with a lifting guide nut 11 that is vertically installed and fixed to the bottom wall 1a of the drainage tank 1, a bolt 12 with an operation handle screwed into the nut 11, and a handle for bolting. It is composed of a nut 13, and by adjusting the bolt 12, the reinforcing plate 8 is adjusted so as to be able to move up and down via the tip pin portion 12a of the bolt 12, and the cleaning liquid Q overflows evenly from the upper side of the cleaning treatment tank 3. Is configured to.

Although the reinforcing plate 8 is attached only to the bottom wall 3a of the cleaning treatment tank 3 in the above embodiment, the reinforcing plate is also attached to the side wall of the cleaning treatment tank 3 so that the cleaning treatment tank
The strength of the entire 3a may be improved.

Further, although the substrate cleaning processing apparatus is exemplified in the above embodiment, the present invention is not limited to this and can be widely applied to the immersion type substrate processing apparatus.

Further, in the above-described embodiment, the case where the cleaning liquid uniformly overflows from the four upper side portions of the cleaning treatment tank 3 is illustrated, but it is sufficient if the cleaning liquid overflows from at least the left and right upper side portions.

Further, in the above embodiment, the reinforcing plate 8 is attached to the lower surface of the bottom wall 3a of the cleaning treatment tank 3, but the reinforcing plate is attached to the side surface of the treatment tank.

Further, in the above-described embodiment, the case where the reinforcing plate 8 is supported in a scattered manner by the plurality of lifting adjustment support members 10 has been exemplified, but the one in which the reinforcing plate 8 is supported in a plane is not excluded.

<Effect of the Invention> As is clear from the above description, in the present invention, the reinforcing plate is adhered to at least the bottom surface of the bottom wall of the processing tank with a corrosion-resistant adhesive having elasticity after bonding, and the reinforcing plate is also used for the lifting adjustment support device. Since it is configured to be supported by, and the strength of the quartz processing tank is strengthened with the reinforcing plate even if the bottom wall of the processing tank is thin, it prevents excessive distortion and concentrated support load on the bottom wall. The quartz processing tank can be made larger, and the quartz processing tank can be provided at low cost.

[Brief description of drawings]

FIG. 1 is a vertical sectional side view of an immersion type substrate processing apparatus showing an embodiment of the present invention, FIG. 2 is a vertical sectional front view thereof, and FIG. 3 is an enlarged view of a portion III in FIG. 3 ... Quartz treatment tank (cleaning treatment tank), 3a ... Quartz treatment tank bottom wall, 7 ... Corrosion-resistant adhesive, 8 ... Reinforcing plate, 10 ... Elevating / adjusting support, Q ... Treatment liquid (pure water washing liquid), W ... substrate.

 ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-1-14923 (JP, A) JP-A-4-48629 (JP, A) SAI 63-93633 (JP, U)

Claims (1)

(57) [Scope of utility model registration request] 1. A bottom of a processing tank made of a quartz material is supported horizontally by an elevating adjustment support, a processing liquid is stored in the processing tank and overflowed from the upper side of the processing tank, and the stored processing is carried out. In an immersion type substrate processing apparatus configured to immerse a substrate to be processed in a liquid for surface treatment of the substrate, a reinforcing plate made of a corrosion resistant material is attached to at least the bottom surface of the bottom wall of the processing tank. An immersion-type substrate processing apparatus characterized in that the reinforcing plate is adhered with an adhesive and the reinforcing plate is supported by a lifting adjustment support tool.